WO2000014775A3 - Multi-lamp cone reflector for semiconductor wafer heating - Google Patents

Multi-lamp cone reflector for semiconductor wafer heating Download PDF

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Publication number
WO2000014775A3
WO2000014775A3 PCT/IB1999/001710 IB9901710W WO0014775A3 WO 2000014775 A3 WO2000014775 A3 WO 2000014775A3 IB 9901710 W IB9901710 W IB 9901710W WO 0014775 A3 WO0014775 A3 WO 0014775A3
Authority
WO
WIPO (PCT)
Prior art keywords
light energy
heating cone
reflector
semiconductor wafer
wafer
Prior art date
Application number
PCT/IB1999/001710
Other languages
French (fr)
Other versions
WO2000014775A2 (en
Inventor
Kevin Hathaway
Original Assignee
Steag Rtp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Rtp Systems Inc filed Critical Steag Rtp Systems Inc
Priority to JP2000569426A priority Critical patent/JP2002524871A/en
Priority to EP99968736A priority patent/EP1116262A2/en
Publication of WO2000014775A2 publication Critical patent/WO2000014775A2/en
Publication of WO2000014775A3 publication Critical patent/WO2000014775A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Abstract

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating cone (52) which contains an assembly of light energy sources for emitting light energy onto a wafer (14). The heating cone (52) of the present invention includes a circular reflector (54) that can be conically-shaped. A plurality of lamps (26) are contained within the reflector. The light energy sources can be vertically oriented or can be tilted slightly towards the central axis of the heating cone. In this arrangement the heating cone produces a uniform irradiance distribution over a wafer (14) being heated on a rotating support. Preferably, the lamp powers are individually controlled by a controller (25) using signals from multiple temperature sensory (30).
PCT/IB1999/001710 1998-09-09 1999-09-08 Multi-lamp cone reflector for semiconductor wafer heating WO2000014775A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000569426A JP2002524871A (en) 1998-09-09 1999-09-08 Heating apparatus including a multi-lamp cone for heating a semiconductor wafer
EP99968736A EP1116262A2 (en) 1998-09-09 1999-09-08 Heating device containing a multi-lamp cone for heating semiconductor wafers

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/150,280 US6210484B1 (en) 1998-09-09 1998-09-09 Heating device containing a multi-lamp cone for heating semiconductor wafers
US09/150,280 1998-09-09

Publications (2)

Publication Number Publication Date
WO2000014775A2 WO2000014775A2 (en) 2000-03-16
WO2000014775A3 true WO2000014775A3 (en) 2000-05-25

Family

ID=22533828

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB1999/001710 WO2000014775A2 (en) 1998-09-09 1999-09-08 Multi-lamp cone reflector for semiconductor wafer heating

Country Status (6)

Country Link
US (1) US6210484B1 (en)
EP (1) EP1116262A2 (en)
JP (1) JP2002524871A (en)
KR (1) KR100629016B1 (en)
TW (1) TW419752B (en)
WO (1) WO2000014775A2 (en)

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