WO1999034939A8 - Wafer container washing apparatus - Google Patents

Wafer container washing apparatus

Info

Publication number
WO1999034939A8
WO1999034939A8 PCT/US1999/000446 US9900446W WO9934939A8 WO 1999034939 A8 WO1999034939 A8 WO 1999034939A8 US 9900446 W US9900446 W US 9900446W WO 9934939 A8 WO9934939 A8 WO 9934939A8
Authority
WO
WIPO (PCT)
Prior art keywords
wafer carrier
sprayer
aperture
washing apparatus
wafer container
Prior art date
Application number
PCT/US1999/000446
Other languages
French (fr)
Other versions
WO1999034939A1 (en
WO1999034939A9 (en
Inventor
David L Halbmaier
Original Assignee
Fluoroware Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fluoroware Inc filed Critical Fluoroware Inc
Priority to EP99901383.2A priority Critical patent/EP1075337B1/en
Priority to KR1020007007611A priority patent/KR100560077B1/en
Priority to JP2000527372A priority patent/JP4447165B2/en
Publication of WO1999034939A1 publication Critical patent/WO1999034939A1/en
Publication of WO1999034939A9 publication Critical patent/WO1999034939A9/en
Publication of WO1999034939A8 publication Critical patent/WO1999034939A8/en
Priority to HK02108130.2A priority patent/HK1046660B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Abstract

A wafer carrier (10) cleaner which comprises a base (24) having a first aperture (16) and a second aperture (26). The wafer cleaner (10) includes a first sprayer (30), and a second sprayer (50), with the first sprayer (30) configured to direct a series of cleaning fluids about the exterior surface of a wafer carrier (C), and the second sprayer (50) configured to direct a series of cleaning fluids about the interior surface of a wafer carrier (C). The expended fluids used to clean the exterior surface of the wafer carrier (C) are directed through the first aperture (16) and into a first fluidic circuit, and the expended fluids used to clean the interior surface of the wafer carrier (C) are directed through the second aperture (26) and into a second fluidic circuit. The provision of dedicated fluidic circuits for the exterior and interior cleaning fluids reduces cross contamination.
PCT/US1999/000446 1998-01-09 1999-01-08 Wafer container washing apparatus WO1999034939A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP99901383.2A EP1075337B1 (en) 1998-01-09 1999-01-08 System and method for cleaning a wafer carrier
KR1020007007611A KR100560077B1 (en) 1998-01-09 1999-01-08 Container washing apparatus
JP2000527372A JP4447165B2 (en) 1998-01-09 1999-01-08 Container cleaning device
HK02108130.2A HK1046660B (en) 1998-01-09 2002-11-08 An apparatus and a method for cleaning a wafer carrier

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7245898P 1998-01-09 1998-01-09
US60/072,458 1998-01-09

Publications (3)

Publication Number Publication Date
WO1999034939A1 WO1999034939A1 (en) 1999-07-15
WO1999034939A9 WO1999034939A9 (en) 1999-09-30
WO1999034939A8 true WO1999034939A8 (en) 2001-05-31

Family

ID=22107714

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/000446 WO1999034939A1 (en) 1998-01-09 1999-01-08 Wafer container washing apparatus

Country Status (7)

Country Link
US (1) US6248177B1 (en)
EP (1) EP1075337B1 (en)
JP (1) JP4447165B2 (en)
KR (1) KR100560077B1 (en)
CN (1) CN1165385C (en)
HK (1) HK1046660B (en)
WO (1) WO1999034939A1 (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3563789B2 (en) * 1993-12-22 2004-09-08 キヤノン株式会社 Method for producing electrophotographic photoreceptor and jig used in the method
US6432214B2 (en) 1998-07-10 2002-08-13 Semitool, Inc. Cleaning apparatus
US6904920B2 (en) * 1998-07-10 2005-06-14 Semitool, Inc. Method and apparatus for cleaning containers
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system
WO2002015255A1 (en) * 2000-08-11 2002-02-21 Chem Trace Corporation System and method for cleaning semiconductor fabrication equipment parts
WO2003006183A2 (en) * 2001-07-12 2003-01-23 Semitool, Inc. Method and apparatus for cleaning semiconductor wafers and other flat media
US6635409B1 (en) 2001-07-12 2003-10-21 Advanced Micro Devices, Inc. Method of strengthening photoresist to prevent pattern collapse
US20040000327A1 (en) * 2002-06-26 2004-01-01 Fabio Somboli Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
US20070026171A1 (en) * 2002-09-03 2007-02-01 Extrand Charles W High temperature, high strength, colorable materials for use with electronics processing applications
KR20050039871A (en) * 2002-09-03 2005-04-29 엔테그리스, 아이엔씨. High temperature, high strength, colorable materials for use with electronics processing applications
TWI290118B (en) * 2002-10-09 2007-11-21 Entegris Inc High temperature, high strength, colorable materials for device processing systems
US6830057B2 (en) * 2002-11-01 2004-12-14 Semitool, Inc. Wafer container cleaning system
US6923188B2 (en) * 2003-04-29 2005-08-02 Powerchip Semiconductor Corp. Method of sampling contaminants of semiconductor wafer carrier
CN1324647C (en) * 2003-04-29 2007-07-04 力晶半导体股份有限公司 A contamination sampling process inside carrier of semiconductor wafer
US7344030B2 (en) 2003-11-07 2008-03-18 Entegris, Inc. Wafer carrier with apertured door for cleaning
US7073522B2 (en) * 2004-04-05 2006-07-11 Quantum Global Technologies, Llc Apparatus for applying disparate etching solutions to interior and exterior surfaces
KR100615603B1 (en) * 2004-10-18 2006-08-25 삼성전자주식회사 Cleaning method for the diffusion furnace of the semi-conductor fabricating facility and the assist member for the same
DE102005030275A1 (en) * 2005-06-21 2006-12-28 Dynamic Microsystems Semiconductor Equipment Gmbh Method for cleaning or drying pot-like hollow bodies involves flushing head with outer shape, which is largely complementary to the inner shape of the interior is introduced into the interior
US8225804B2 (en) * 2007-03-02 2012-07-24 Safety-Kleen Systems, Inc. Multipurpose aqueous parts washer
US9514972B2 (en) * 2008-05-28 2016-12-06 Air Products And Chemicals, Inc. Fixture drying apparatus and method
CN102834911B (en) * 2010-06-11 2016-10-12 泰尔Fsi公司 Clean the method being used for processing the tool surfaces in the instrument of microelectronic workpiece
CN103170469B (en) * 2011-12-22 2016-02-03 中芯国际集成电路制造(上海)有限公司 For cleaning the device and method with dry wafer cassette
US20160303622A1 (en) * 2013-10-23 2016-10-20 Brooks Ccs Gmbh Cleaning Systems and Methods for Semiconductor Substrate Storage Articles
CN107433274A (en) * 2016-05-25 2017-12-05 上海新昇半导体科技有限公司 The cleaning method of quartz chamber body
FR3054474B1 (en) * 2017-02-16 2018-08-17 Sidel Participations DEVICE AND METHOD FOR DEFLUSTING THE INTERIOR OF AT LEAST ONE PREFORM
US11699609B2 (en) * 2018-09-28 2023-07-11 Taiwan Semiconductor Manufacturing Company, Ltd. Automated nozzle cleaning system
HUE062701T2 (en) * 2019-12-16 2023-11-28 Lvp Eng & Constructions Bvba Device and method for cleaning containers
WO2021207311A1 (en) * 2020-04-08 2021-10-14 Pintek Solutions Corporation Sample carrier cleaner

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1661602A (en) 1926-03-05 1928-03-06 Dary Samuel Milk-can-washing machine
US3092120A (en) * 1960-04-01 1963-06-04 Harry B Hilger Washer for cups and the like
GB1498795A (en) 1974-03-21 1978-01-25 Jackson J Method and apparatus for cleaning containers
US4133340A (en) 1977-04-18 1979-01-09 Ballard Thomas B Cleaning machine for simultaneously cleaning the interior and exterior of hollow articles
US4381016A (en) 1981-07-07 1983-04-26 Douglas Robin S Cleaning fluid distribution head
US4785836A (en) 1987-07-17 1988-11-22 Soichiro Yamamoto Spray washer
US5137043A (en) 1991-05-02 1992-08-11 Wickham Iii Ward E Vehicle for cleaning intermediate bulk containers
US5363867A (en) 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5224503A (en) 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5409545A (en) 1993-03-04 1995-04-25 Environmental Sampling Supply, Inc. Apparatus and method for cleaning containers
US5616208A (en) 1993-09-17 1997-04-01 Tokyo Electron Limited Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
US5522410A (en) 1994-12-22 1996-06-04 Meilleur; Michel Portable single-cup washer
SE509676C2 (en) * 1995-05-26 1999-02-22 Bengt Arne Ohlson Washing device for interior and exterior washing of sprayed barrels
US5603342A (en) 1995-06-29 1997-02-18 Coulter Corporation Apparatus for cleaning a fluid sample probe

Also Published As

Publication number Publication date
EP1075337B1 (en) 2015-11-18
EP1075337A1 (en) 2001-02-14
JP2002500101A (en) 2002-01-08
CN1356930A (en) 2002-07-03
KR20010040331A (en) 2001-05-15
EP1075337A4 (en) 2004-05-19
KR100560077B1 (en) 2006-03-13
HK1046660B (en) 2005-07-08
HK1046660A1 (en) 2003-01-24
WO1999034939A1 (en) 1999-07-15
JP4447165B2 (en) 2010-04-07
CN1165385C (en) 2004-09-08
WO1999034939A9 (en) 1999-09-30
US6248177B1 (en) 2001-06-19

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