WO1999028969A1 - Integrated circuit chip package and method of making the same - Google Patents

Integrated circuit chip package and method of making the same Download PDF

Info

Publication number
WO1999028969A1
WO1999028969A1 PCT/US1998/025673 US9825673W WO9928969A1 WO 1999028969 A1 WO1999028969 A1 WO 1999028969A1 US 9825673 W US9825673 W US 9825673W WO 9928969 A1 WO9928969 A1 WO 9928969A1
Authority
WO
WIPO (PCT)
Prior art keywords
inte
inteφoser
wirebond
åoser
die
Prior art date
Application number
PCT/US1998/025673
Other languages
French (fr)
Inventor
James Hayward
Quang Nguyen
Original Assignee
Advanced Micro Devices, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices, Inc. filed Critical Advanced Micro Devices, Inc.
Publication of WO1999028969A1 publication Critical patent/WO1999028969A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49833Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • the present invention relates to an integrated circuit chip package and a method of fabricating the same.
  • a conventional chip package is a flex/tape-BGA package, wliich includes a semiconductor die directly attached to an interposer.
  • the flex tape-BGA package allows for a constant package body and a constant solder ball pattern independent of the size of the die to some extent.
  • the flex/tape-BGA package requires a rigid connection between the die and the inte ⁇ oser, thereby resulting in a problem of decreased solder joint reliability.
  • Examples of the flex/tape-BGA package include Texas Instruments Microstar®, Fujitsu FBGA and Amkor FlexBGA® packages.
  • Another type of a conventional chip package is a microBGA® package, an example of wliich is developed by Tessera Inc.
  • the microBGA® package generally has an improved solder joint reliability compared to the flex/tape-BGA package.
  • the microBGA® package includes tab-like bonds for providing electrical connection between the semiconductor die and solder balls outside the inte ⁇ oser.
  • the design of the inte ⁇ oser in the microBGA® package is governed by the die size and the bond pad position, and is very sensitive to changes in the die size.
  • a different inte ⁇ oser design with a different tab bond and solder ball pattern is usually required for any change in die size.
  • an integrated circuit chip package generally comprises:
  • the chip package further includes a wirebond pad on the inside surface of the top inte ⁇ oser and a tab bond including a first portion in direct contact with the wirebond pad and a second portion in direct contact with the outside surface of the bottom inte ⁇ oser.
  • the wirebond is directly connected to the wirebond pad which establishes an electrically conductive path between the wirebond and the tab bond.
  • a solder ball is directly connected to the second portion of the tab bond
  • a spacer is provided on the inside surface of the bottom inte ⁇ oser to support the die, such that the die and the wirebond are spaced apart from the bottom inte ⁇ oser.
  • the step of attaching the first assembly includes providing a spacer between the first assembly and the bottom inte ⁇ oser to space the die and the wirebond apart from the bottom inte ⁇ oser.
  • an elastomeric material is flooded into the intermediate volume between the top and the bottom inte ⁇ osers to fill the volume.
  • the present invention provides an integrated circuit chip package that is expected to provide an improved solder joint reliability.
  • Mother advantage of the invention is that it is expected to allow a single inte ⁇ oser design with the same solder ball pattern to accommodate different die sizes and wirebond positions.
  • Fig. 1 is a sectional side view of an embodiment of an integrated circuit chip package with a first assembly including a plurality of wirebonds in accordance with the present invention
  • Fig. 2 is a sectional side view of the first assembly of Fig. 1;
  • Fig. 3 is a simplified top plan view of the first assembly of Fig. 2;
  • Fig. 4 is a sectional side view of another embodiment of an integrated circuit chip pacl age with a first assembly including a plurahty of flipchip connectors in accordance with the present invention;
  • Fig. 5 is a sectional side view of the first assembly of the integrated circuit chip package of Fig. 4;
  • Fig. 6 is a simplified top plan view of the first assembly of Fig. 5;
  • Fig. 7 is a block diagram showing an embodiment of the process of fabricating the integrated circuit chip package of Fig. 1 according to the present invention.
  • the present invention provides an integrated circuit chip package that is expected to improve the solder joint reliability without the need to customize the design of the inte ⁇ oser to accommodate different die sizes.
  • Fig. 1 is a section ⁇ side view of an integrated circuit chip package according to the present invention, with a top inte ⁇ oser 2 and a bottom inte ⁇ oser 4, both made of an insulating material, spaced apart from each other.
  • the top inte ⁇ oser 2 has an inside surface 6 and an outside surface 8
  • the bottom inte ⁇ oser 4 has an inside surface 10 and an outside surface 12.
  • ./M-hough Fig. 1 shows the top and bottom inte ⁇ osers 2 and 4 being of the same size, the top inte ⁇ oser 2 may be smaller than the bottom inte ⁇ oser 4.
  • the top and bottom inte ⁇ osers 2 and 4 are generally parallel to each other.
  • an example of which is a silicon die is suirounded by an encapsulant 16, such as one made of an elastomeric material, connected between the inside surface 6 of the top inte ⁇ oser 2 and the inside surface 10 of the bottom inte ⁇ oser 4.
  • the die 14 is positioned on the inside surface 6 of the top inte ⁇ oser 2.
  • a conductive wirebond 18, such as one made of a metal, is connected between the semiconductor die 14 and the top inte ⁇ oser 2. Connection of the wirebond 18 between the die 14 and the top inte ⁇ oser 2 can be made by using a conventional wirebonding method that is apparent to a person skilled in the art.
  • a plurahty of wirebonds are usually provided to connect the integrated circuit (not shown) embedded in the semiconductor die 14 and the inte ⁇ oser 2.
  • Fig. 1 shows an additional wirebond pad 28 on the inside surface 6 of the top inte ⁇ oser 2 and an additional wirebond 20 connected between a different portion of the semiconductor die 14 and the additional wirebond pad 28.
  • the integrated circuit chip package according to the present invention also includes a conductive tab bond 22, such as one made of a metal, connected between the top and bottom inte ⁇ osers 2 and 4.
  • the tab bond includes a first portion 22a that is in direct contact with the wirebond pad 26 on the inside surface 6 of the top inte ⁇ oser 2, and a second portion 22b that is in direct contact with the outside surface 12 of the bottom inte ⁇ oser 4.
  • the tab bond 24 may be attached to the top inte ⁇ oser 2 by thermosonic, ultrasonic, solder reflow or other means.
  • the tab bond 22 provides a structural support for the top and the bottom inte ⁇ osers 2 and 4, and an electrical connection from the wirebond pad 26 to outside the chip package.
  • a semiconductor chip package includes a plurality of tab bonds to provide structural integrity to the package assembly and a plurality of electrical connections.
  • Fig. 1 shows an additional tab bond 24 including a first portion 24a in direct contact with the additional wirebond pad 28 on the inside surface 6 of the top inte ⁇ oser 2 and a second portion 24b in direct contact with the outside surface 12 of the bottom inte ⁇ oser 4.
  • the wirebond pad 26 such as one made of a metallic material or a conductive polymer, is provided on the inside surface 6 of the top inte ⁇ oser 2 such that an electrically conductive path is established between the integrated circuit (not shown) on the die 14 and the second portion 22b outside the bottom inte ⁇ oser 4. Namely, the wirebond 18 is in direct contact with the integrated circuit and the wirebond pad 26, and the first portion 22a of the tab bond 22 is in direct contact with the wirebond pad 26 and the second portion 22b.
  • a plurality of wirebond pads are provided in the chip package.
  • a separate wirebond pad is provided for each wirebond, and a separate tab bond is directly connected to each wirebond pad.
  • Fig. 1 shows the additional wirebond pad 28 to which the wirebond 20 is directly connected, ⁇ n a manner similar to the connection of the tab bond 22, the first portion 24a of the tab bond 24 is in direct contact with the additional wirebond pad 28.
  • the integrated circuit chip package according to the present invention further includes a solder ball 30 directly connected to the second portion 22b of the tab bond 22 by soldeiing. In a similar manner, an additional solder ball 32 is directly soldered to the second portion 24b of the tab bond 24.
  • At least one additional solder ball 34 can be provided on the bottom inte ⁇ oser 4 to provide additional electrical connection and structural support for the chip package.
  • a metallic layer 36 with a thickness the same as that of the second portions 22b and 24b of the tab bonds 22 and 24 can be provided on the outside surface 12 of the bottom inte ⁇ oser 4, and the solder ball 34 may be directly soldered to the metallic layer 36.
  • Additional solder balls similar to the solder ball 34, which do not have any electrical contact with any of the wirebonds connected to the semiconductor die 14, may be provided for structural support; however, they are not critical to the present invention.
  • the solder balls 30 and 32 serve as electrical contacts because they are electrically connected to the wirebonds 18 and 20 through the tab bonds 22 and 24 and the wirebond pads 26 and 28, respectively.
  • the integrated circuit chip package according to the present invention further includes a spacer 38 of an insulating material, such as an elastomeric material, on the inside surface of one of the inte ⁇ osers or on the die surface.
  • a spacer 38 of an insulating material such as an elastomeric material
  • the integrated circuit chip package according to the present invention further includes a spacer 38 of an insulating material, such as an elastomeric material, on the inside surface of one of the inte ⁇ osers or on the die surface.
  • a spacer 38 of an insulating material, such as an elastomeric material, on the inside surface of one of the inte ⁇ osers or on the die surface.
  • the encapsulant 16 may be flooded into the intermediate volume 40 to fill the remaining space between the top and bottom inte ⁇ osers 2 and 4.
  • An elastomeric materi can be used as the encapsulant 16.
  • the spacer 38 can also be used to separate the semiconductor die 14 from the inside surface 10 of the bottom inte ⁇ oser 4 so that the wirebond 18 is spaced apart from the inside surface 10 of the bottom inte ⁇ oser 4. hi some applications, it is desirable to avoid a direct contact between the wirebond 18 and the inside surface 10 of the bottom inte ⁇ oser 4. As shown in Fig. 1, the wirebonds 18 and
  • the spacer 38 can be provided, for example, by attaching a plurality of columns of an elastomeric material onto the inside surface 10 of the bottom inte ⁇ oser 4 before attaching the die 14 to the spacer 38 or by using a pad of an elastomeric material on the surface of the die 14.
  • the present invention also provides a method of fabricating the integrated circuit chip package described above in accordance with the present invention. The method roughly comprises the steps of:
  • a wirebond pad 26 is attached to the inside surface 6 of the top inte ⁇ oser 2.
  • the assembly of the semiconductor die 14 to the top inte ⁇ oser 2 can be made by using a conventional die attachment method which is apparent to a person skilled in the art.
  • the wirebond 18 is then connected between the integrated circuit (not shown) embedded in the semiconductor die 14 and the wirebond pad 26.
  • the wirebond connections can be made by a conventional wirebond process which is apparent to a person skilled in the art.
  • the flipchip connections can be made by a conventional flipchip process wliich is known to a person skilled in the art.
  • a spacer 38 such as one made of an elastomeric material, is provided on the inside surface 10 of the bottom inte ⁇ oser 4 or on the surface of the die 14, and the first assembly 42 is then attached to the bottom inte ⁇ oser
  • the spacer 38 which spaces the top and bottom inte ⁇ osers 2 and 4 apart by an intermediate volume 40, also allows the wirebond 18 to be suspended from the semiconductor die 14 the wirebond pad 26 before the encapsulant 16 is injected such that there is no direct contact between the wirebond 18 and the inside surface 10 of the bottom inte ⁇ oser 4.
  • the tab bond 22 between the top and bottom inte ⁇ osers 2 and 4 is then made with the first portion 22a of the tab bond 22 in direct contact with the wirebond pad 26 and the second portion 22b in direct contact with the outside surface 12 of the bottom inte ⁇ oser 4.
  • the tab bond 22 is formed and assembled to penetrate through the bottom inte ⁇ oser 4 such that an electrical connection is established by the tab bond 22 from the wirebond 18 through the wirebond pad 26 to an electrical contact outside the chip package, such as the solder ball 30.
  • the tab bonds 22 and 24 can be fabricated by using a conventional tab bonding method that is apparent to a person skilled in the art.
  • the remaining intermediate volume 40 between the inside surfaces 6 and 10 of the top and bottom inte ⁇ osers 2 and 4 is filled with an encapsulant 16, for example, by flooding the intermediate volume 40 with an elastromeric material.
  • Fig. 2 shows a sectional side view of the first assembly 42 of Fig. 1 before it is assembled with the bottom inte ⁇ oser 4.
  • the sectional view of Fig. 2 is opposite the view of the first assembly 42 in Fig. 1 with respect to the top and bottom.
  • the inside surface 6 of the top inte ⁇ oser 2 is usually positioned upward when the wirebond pads 26 and 28 and the silicon die 14 are attached to the inside surface 6 of the top inte ⁇ oser 2.
  • the wirebonds 18 and 20 are connected between the semiconductor die 14 and the wirebond pads 26 and 28, respectively, when the inside surface 6 of the top inte ⁇ oser 2 is positioned to face upward.
  • Fig.3 is a simplified top plan view of the first assembly 42 of Fig. 2 showing the silicon die 14 on the inside surface 6 of the top inte ⁇ oser 2, wirebond pads 26 and 28 on the surface 6, and wirebonds 18 and 20 connected between the semiconductor die 14 and the wirebond pads 26 and 28, respectively.
  • a plurality of conductive tab pads 44 and 46 which have direct electrical connections with the wirebond pads 26 and 28, respectively, can be provided on the inside surface 6 of the top inte ⁇ oser 2 to which the first portions 22a and 24 a of the tab bonds 22 and 24 of Fig. 1 can be directly attached, respectively.
  • a typical integrated circuit chip assembly usually includes more wirebonds and wirebonds pads than those which are shown in Fig. 3, and the wirebond and tab pads may have a variety of patterns on the inside surface 6 of the top inte ⁇ oser 2.
  • Fig. 3 shows the wirebond connections from two sides of the semiconductor die 14, wirebond connections can also be made from all four sides of the die 14. They are nonetheless within the scope of the present invention.
  • FIG. 4 shows a sectional side view of another embodiment of the present invention in which a plurality of flipchip connectors 52 and 54 are provided between the semiconductor die 14 and the conductive pads 26 and 28, respectively, instead of the wirebond connections 18 and 20 of Fig. 1.
  • the semiconductor die 14 is not directly attached to the inside surface 6 of the top inte ⁇ oser 2.
  • the flipchip connectors 52 and 54 provide direct electrical connections between the integrated circuit embedded on the semiconductor die 14 and the pads 26 and 28, respectively.
  • Flipchip connectors 52 and 54 are usually solder ball connectors but may also be metal-coated polymer balls or electrically conductive adhesives.
  • the tab bonds 22 and 24 are assembled to provide electrical connections between the pads 26 and 28 and the solder balls 30 and 32, respectively, outside the bottom inte ⁇ oser 4, in a manner similar to that which is shown in
  • a plurality of spacers 38 may be provided to space the semiconductor die 14 apart from the inside surface 10 of the bottom inte ⁇ oser 4, although the spacers 38 are optional and are used to provide structural support to the first assembly 42 when the encapsulant 16 is flooded to fill the intermediate volume 40 between the top and the bottom inte ⁇ osers 2 and 4 during the assembly process.
  • Fig. 5 shows a sectional side view of the first assembly 42 of Fig. 4 with the flipchip connectors 52 and 54 before the first assembly 42 is attached to the bottom inte ⁇ oser 4.
  • the orientation of the first assembly 42 in Fig. 5 is opposite that of the first assembly 42 in Fig.4 with respect to the top and bottom.
  • the inside surface 6 of the top inte ⁇ oser 2 is usually positioned upward when the conductive pads 26 and 28 are attached to the inside surface 6.
  • the flipchip connectors 52 and 54 are then positioned on the conductive pads 26 and 28, respectively, and the silicon die 14 is attached to the flipchip connectors 52 and 54, such that proper electrical connections are made between the integrated circuit embedded on the semiconductor die 14 and the conductive pads 26 and 28.
  • the flipchip connectors 52 and 54 can be provided on the die 14 prior to attachment to the conductive pads 26 and 28.
  • the first assembly 42 is made according to Fig. 5, it is attached to the bottom inte ⁇ oser 4 with the tab bonds 22 and 24 and the encapsulant 16 to foim the integrated circuit chip package as shown in Fig. 4.
  • the first assembly 42 is usually positioned on top of the bottom inte ⁇ oser 4 when the assembly process is finished.
  • Fig. 6 is a simplified top plan view of the first assembly 42 of Fig. 5, with the semiconductor die 14 shown in a dashed rectangle as if it is transparent to expose the flipchip connectors 52 and 54.
  • the flipchip connectors 52 and 54 are directly attached to the conductive pads 26 and 28 and the die 14, respectively.
  • a plurality of tab pads 44 and 46 are usually provided on the inside surface 6 of the top inte ⁇ oser 2 with direct electrical connections to the conductive pads 26 and 28, respectively.
  • a plurality of pads more than those which are shown in Fig. 6 may be provided in an integrated circuit package, and a variety of conductive pad patterns may be provided on the inside surface 6 of the top inte ⁇ oser 2.
  • Fig. 6 shows the flipchip connections from two sides of the semiconductor die 14, flipchip connections can also be made from all four sides of the die
  • FIG. 7 An embodiment of a method of making the integrated chip package of Fig. 1 according to the present invention is illustrated by the flowchart of Fig. 7. The method includes the steps of:
  • the spacer 38 and the encapsulant 16 both comprise an elastomeric material.
  • the encapsulant 16 can be provided to fill the intermediate volume 40 between the top and bottom inte ⁇ osers 2 and 4 by flooding the elastomeric material into the remaimng intermediate volume 40 after the first assembly 42 is attached to the bottom inte ⁇ oser 4 and the tab bonds 22 and 24 are made.
  • a flipchip connector 52 is used to connect the die 14 with the pad 26 as shown in Figs. 4-6, instead of the wirebond 18 as shown in Figs. 1-3.
  • the method of fabrication described above and illustrated in the flowchart of Fig. 7 is only one of several embodiments of fabricating the chip package.
  • the integrated circuit chip package according to the present invention is not limited to that which is fabricated by using the method described above; it will be appreciated that other methods of fabrication are also possible to produce the chip package according to the present invention.
  • An advantage of the chip package according to the present invention is that the design of the tab bonds 22 and 24 and the pattern of the solder balls 30, 32 and 34 can be made constant and independent of the size of the semiconductor die 14 as long as adequate space is provided for the semiconductor die 14 -and the wirebonds 18 and 20. Since the size of the chip package is mainly determined by the tab bonds and the solder ball pattern, a chip package with a fixed overall dimension can accommodate a variety of different die sizes.
  • a fiirther advantage of using two inte ⁇ osers 2 and 4 is that one inte ⁇ oser, such as the top inte ⁇ oser 2, can be used for direct attachment of the die 14 while a second inte ⁇ oser, such as the bottom inte ⁇ oser 4, can be used for supporting solder joint connections, such as the solder balls 30 and 32, through the second portions 22b and 24b of the tab bonds 22 and 24.
  • This configuration avoids the necessity for a rigid connection between the semiconductor die 14 and the bottom inte ⁇ oser 4. Therefore, solder joint reliability of the solder balls 30 and 32 is improved.
  • the integrated circuit chip pac.kage according to the present invention is applicable for the packaging of a wide variety of semiconductor integrated circuits, and more particularly, for the packaging of semiconductor dies with a variety of die sizes.
  • the chip package is believed to be superior to the flex/tape-BGA packages in that it is expected to provide an improved solder joint reliability by avoiding a rigid connection between the die and the inte ⁇ oser to which the solder balls are connected.
  • the chip package according to the present invention is believed to be superior to the microBGA package in that a single package design with the same tab bond and solder ball pattern can accommodate a variety of die sizes.
  • the method according to the present invention is applicable for the fabrication of the semiconductor chip package of the present invention.
  • the chip package according to the present invention is not limited by the method of fabrication described in the Modes for Carrying Out the Invention; other methods of fabrication are also possible.

Abstract

A semiconductor integrated circuit chip package includes top and bottom interposers (2) and (4), a semiconductor die (14) attached to the top interposer (2), a wirebond (18) or a flipchip connector (52) connected between the die (14) and the top interposer (2), and a tab bond (22) providing an electrical connection from the wirebond (18) or the flipchip connector (52) to outside the bottom interposer (4). A method of making the chip package includes providing top and bottom interposers (2) and (4), attaching a semiconductor die (14) to the top interposer (2), providing a wirebond (18) or a flipchip connector (52) between the die (14) and the top interposer (2), providing a tab bond (22) between the top and bottom interposers (2) and (4), and providing an encapsulant (16) to fill the intermediate volume (40) between the top and bottom interposers (2) and (4).

Description

INTEGRATED CIRCUIT CHIP PACKAGE AND METHOD OF MAKING THE SAME
TECHNICAL FIELD
The present invention relates to an integrated circuit chip package and a method of fabricating the same.
BACKGROUND ART The semiconductor chip industry has developed "chip scale" packages for protecting an integrated circuit on a semiconductor die and for providing wire connections from the integrated circuit to other circuits outside the chip. ^ example of a conventional chip package is a flex/tape-BGA package, wliich includes a semiconductor die directly attached to an interposer. The flex tape-BGA package allows for a constant package body and a constant solder ball pattern independent of the size of the die to some extent.
However, the flex/tape-BGA package requires a rigid connection between the die and the inteφoser, thereby resulting in a problem of decreased solder joint reliability. Examples of the flex/tape-BGA package include Texas Instruments Microstar®, Fujitsu FBGA and Amkor FlexBGA® packages. Another type of a conventional chip package is a microBGA® package, an example of wliich is developed by Tessera Inc. The microBGA® package generally has an improved solder joint reliability compared to the flex/tape-BGA package. The microBGA® package includes tab-like bonds for providing electrical connection between the semiconductor die and solder balls outside the inteφoser. However, the design of the inteφoser in the microBGA® package is governed by the die size and the bond pad position, and is very sensitive to changes in the die size. In a conventional microBGA® package, a different inteφoser design with a different tab bond and solder ball pattern is usually required for any change in die size.
Therefore, there is a need for an integrated circuit chip package that simultaneously provides both a good solder joint reliability and a single inteφoser design with a constant tab bond and solder ball pattern that can accommodate a variety of die sizes. DISCLOSURE OF THE INVENTION
The present invention satisfies these needs. In accordance with the present invention, an integrated circuit chip package generally comprises:
(a) a bottom inteφoser having an inside surface and an outside surface;
(b) a top inteφoser spaced apart from the bottom inteφoser, the top inteφoser having an inside surface and an outside surface;
(c) an encapsulant connected between the inside suifaces of the top and bottom inteφosers;
(d) a die surrounded by the encapsulant and one of the inteφosers; and
(e) a wirebond connected between the die and one of the inteφosers.
In an embodiment, the chip package further includes a wirebond pad on the inside surface of the top inteφoser and a tab bond including a first portion in direct contact with the wirebond pad and a second portion in direct contact with the outside surface of the bottom inteφoser. The wirebond is directly connected to the wirebond pad which establishes an electrically conductive path between the wirebond and the tab bond.
In an additional embodiment, a solder ball is directly connected to the second portion of the tab bond, in a further embodiment, a spacer is provided on the inside surface of the bottom inteφoser to support the die, such that the die and the wirebond are spaced apart from the bottom inteφoser. The present invention further provides a method of fabricating the integrated circuit chip package, the method generally comprising the steps of:
(a) providing a top inteφoser;
(b) attaching a semiconductor die to the top inteφoser; (c) providing a wirebond or a flipchip connector between the silicon die and the top inteφoser, the top inteφoser and the silicon die forming a first assembly;
(d) providing a bottom inteφoser;
(e) attaching the first assembly to the bottom inteφoser, the top and bottom inteφosers spaced apart by an intermediate volume;
(f) providing a tab bond between the top and bottom inteφoser; and
(g) providing an encapsulant to fill the intermediate volume between the top and the bottom inteφosers.
In an embodiment, the step of attaching the first assembly includes providing a spacer between the first assembly and the bottom inteφoser to space the die and the wirebond apart from the bottom inteφoser. In a fiirther embodiment, an elastomeric material is flooded into the intermediate volume between the top and the bottom inteφosers to fill the volume.
Advantageously, the present invention provides an integrated circuit chip package that is expected to provide an improved solder joint reliability. Mother advantage of the invention is that it is expected to allow a single inteφoser design with the same solder ball pattern to accommodate different die sizes and wirebond positions.
BRIEF DESCRIPTION OF THE DRAWINGS
The present invention will be described with respect to particular embodiments thereof, and references will be made to the drawings in which:
Fig. 1 is a sectional side view of an embodiment of an integrated circuit chip package with a first assembly including a plurality of wirebonds in accordance with the present invention;
Fig. 2 is a sectional side view of the first assembly of Fig. 1; Fig. 3 is a simplified top plan view of the first assembly of Fig. 2; Fig. 4 is a sectional side view of another embodiment of an integrated circuit chip pacl age with a first assembly including a plurahty of flipchip connectors in accordance with the present invention;
Fig. 5 is a sectional side view of the first assembly of the integrated circuit chip package of Fig. 4;
Fig. 6 is a simplified top plan view of the first assembly of Fig. 5; and
Fig. 7 is a block diagram showing an embodiment of the process of fabricating the integrated circuit chip package of Fig. 1 according to the present invention.
MODES FOR CARRYING OUT THE INVENTION
The present invention provides an integrated circuit chip package that is expected to improve the solder joint reliability without the need to customize the design of the inteφoser to accommodate different die sizes.
Fig. 1 is a section^ side view of an integrated circuit chip package according to the present invention, with a top inteφoser 2 and a bottom inteφoser 4, both made of an insulating material, spaced apart from each other. The top inteφoser 2 has an inside surface 6 and an outside surface 8, and the bottom inteφoser 4 has an inside surface 10 and an outside surface 12. ./M-hough Fig. 1 shows the top and bottom inteφosers 2 and 4 being of the same size, the top inteφoser 2 may be smaller than the bottom inteφoser 4. The top and bottom inteφosers 2 and 4 are generally parallel to each other. A semiconductor die
14, an example of which is a silicon die, is suirounded by an encapsulant 16, such as one made of an elastomeric material, connected between the inside surface 6 of the top inteφoser 2 and the inside surface 10 of the bottom inteφoser 4. The die 14 is positioned on the inside surface 6 of the top inteφoser 2. A conductive wirebond 18, such as one made of a metal, is connected between the semiconductor die 14 and the top inteφoser 2. Connection of the wirebond 18 between the die 14 and the top inteφoser 2 can be made by using a conventional wirebonding method that is apparent to a person skilled in the art. A conductive wirebond pad 26, such as a metallic pad, is usually provided on the inside surface 6 of the top inteφoser 2, and the wirebond 18 is directly connected to the wirebond pad 26. In a semiconductor chip pacl<-age, a plurahty of wirebonds are usually provided to connect the integrated circuit (not shown) embedded in the semiconductor die 14 and the inteφoser 2. As an illustrative example, Fig. 1 shows an additional wirebond pad 28 on the inside surface 6 of the top inteφoser 2 and an additional wirebond 20 connected between a different portion of the semiconductor die 14 and the additional wirebond pad 28. The integrated circuit chip package according to the present invention also includes a conductive tab bond 22, such as one made of a metal, connected between the top and bottom inteφosers 2 and 4. In an embodiment, the tab bond includes a first portion 22a that is in direct contact with the wirebond pad 26 on the inside surface 6 of the top inteφoser 2, and a second portion 22b that is in direct contact with the outside surface 12 of the bottom inteφoser 4. The tab bond 24 may be attached to the top inteφoser 2 by thermosonic, ultrasonic, solder reflow or other means.
The tab bond 22 provides a structural support for the top and the bottom inteφosers 2 and 4, and an electrical connection from the wirebond pad 26 to outside the chip package. In general, a semiconductor chip package includes a plurality of tab bonds to provide structural integrity to the package assembly and a plurality of electrical connections. As an illustrative example, Fig. 1 shows an additional tab bond 24 including a first portion 24a in direct contact with the additional wirebond pad 28 on the inside surface 6 of the top inteφoser 2 and a second portion 24b in direct contact with the outside surface 12 of the bottom inteφoser 4. The wirebond pad 26, such as one made of a metallic material or a conductive polymer, is provided on the inside surface 6 of the top inteφoser 2 such that an electrically conductive path is established between the integrated circuit (not shown) on the die 14 and the second portion 22b outside the bottom inteφoser 4. Namely, the wirebond 18 is in direct contact with the integrated circuit and the wirebond pad 26, and the first portion 22a of the tab bond 22 is in direct contact with the wirebond pad 26 and the second portion 22b.
In a further embodiment, a plurality of wirebond pads are provided in the chip package. In general, a separate wirebond pad is provided for each wirebond, and a separate tab bond is directly connected to each wirebond pad. As an illustrative example, Fig. 1 shows the additional wirebond pad 28 to which the wirebond 20 is directly connected, ϊn a manner similar to the connection of the tab bond 22, the first portion 24a of the tab bond 24 is in direct contact with the additional wirebond pad 28. In an additional embodiment, the integrated circuit chip package according to the present invention further includes a solder ball 30 directly connected to the second portion 22b of the tab bond 22 by soldeiing. In a similar manner, an additional solder ball 32 is directly soldered to the second portion 24b of the tab bond 24. Furthermore, at least one additional solder ball 34 can be provided on the bottom inteφoser 4 to provide additional electrical connection and structural support for the chip package. For example, a metallic layer 36 with a thickness the same as that of the second portions 22b and 24b of the tab bonds 22 and 24 can be provided on the outside surface 12 of the bottom inteφoser 4, and the solder ball 34 may be directly soldered to the metallic layer 36. Additional solder balls similar to the solder ball 34, which do not have any electrical contact with any of the wirebonds connected to the semiconductor die 14, may be provided for structural support; however, they are not critical to the present invention. On the other hand, the solder balls 30 and 32 serve as electrical contacts because they are electrically connected to the wirebonds 18 and 20 through the tab bonds 22 and 24 and the wirebond pads 26 and 28, respectively.
In a further embodiment, the integrated circuit chip package according to the present invention further includes a spacer 38 of an insulating material, such as an elastomeric material, on the inside surface of one of the inteφosers or on the die surface. For example, in the chip package wherein the semiconductor die 14 is directly attached to the inside surface 6 of the top inteφoser 2, a plurality of spacers 38 can be connected between the semiconductor die 14 and the inside surface 10 of the bottom inteφoser 4, as shown in Fig. 1. The spacer 38 provides structural support for the semiconductor die 14 and leaves an intermediate volume 40 between the inside surfaces 6 and 10 of the top and bottom inteφosers 2 and 4. The encapsulant 16 may be flooded into the intermediate volume 40 to fill the remaining space between the top and bottom inteφosers 2 and 4. An elastomeric materi can be used as the encapsulant 16. The spacer 38 can also be used to separate the semiconductor die 14 from the inside surface 10 of the bottom inteφoser 4 so that the wirebond 18 is spaced apart from the inside surface 10 of the bottom inteφoser 4. hi some applications, it is desirable to avoid a direct contact between the wirebond 18 and the inside surface 10 of the bottom inteφoser 4. As shown in Fig. 1, the wirebonds 18 and
20, which are suspended from the semiconductor die 14, are spaced apart from the bottom inteφoser 4. The spacer 38 can be provided, for example, by attaching a plurality of columns of an elastomeric material onto the inside surface 10 of the bottom inteφoser 4 before attaching the die 14 to the spacer 38 or by using a pad of an elastomeric material on the surface of the die 14. The present invention also provides a method of fabricating the integrated circuit chip package described above in accordance with the present invention. The method roughly comprises the steps of:
• providing a top inteφoser 2;
• attaching a semiconductor die 14 to the top inteφoser 2;
• providing a wirebond 18 or a flipchip connector 52 between the semiconductor die 14 and the top inteφoser 2 to form a first assembly 42;
• attaching the first assembly 42 to the bottom inteφoser 4, the top and bottom inteφosers 2 and 4 spaced apart by an intermediate volume 40;
• providing a tab bond 22 between the top and bottom inteφosers 2 and 4; and
• providing an encapsulant 16 to fill the intermediate volume 40 between the top and bottom inteφosers 2 and 4.
Furthermore, a wirebond pad 26 is attached to the inside surface 6 of the top inteφoser 2. The assembly of the semiconductor die 14 to the top inteφoser 2 can be made by using a conventional die attachment method which is apparent to a person skilled in the art. The wirebond 18 is then connected between the integrated circuit (not shown) embedded in the semiconductor die 14 and the wirebond pad 26. The wirebond connections can be made by a conventional wirebond process which is apparent to a person skilled in the art. hi another embodiment in which flipchip connections are used, the flipchip connections can be made by a conventional flipchip process wliich is known to a person skilled in the art.
.After the first assembly 42 is made, a spacer 38, such as one made of an elastomeric material, is provided on the inside surface 10 of the bottom inteφoser 4 or on the surface of the die 14, and the first assembly 42 is then attached to the bottom inteφoser
4 by attaching the semiconductor die 14 directly to the spacer 38. The spacer 38, which spaces the top and bottom inteφosers 2 and 4 apart by an intermediate volume 40, also allows the wirebond 18 to be suspended from the semiconductor die 14 the wirebond pad 26 before the encapsulant 16 is injected such that there is no direct contact between the wirebond 18 and the inside surface 10 of the bottom inteφoser 4.
The tab bond 22 between the top and bottom inteφosers 2 and 4 is then made with the first portion 22a of the tab bond 22 in direct contact with the wirebond pad 26 and the second portion 22b in direct contact with the outside surface 12 of the bottom inteφoser 4. The tab bond 22 is formed and assembled to penetrate through the bottom inteφoser 4 such that an electrical connection is established by the tab bond 22 from the wirebond 18 through the wirebond pad 26 to an electrical contact outside the chip package, such as the solder ball 30. The tab bonds 22 and 24 can be fabricated by using a conventional tab bonding method that is apparent to a person skilled in the art. Subsequently, the remaining intermediate volume 40 between the inside surfaces 6 and 10 of the top and bottom inteφosers 2 and 4 is filled with an encapsulant 16, for example, by flooding the intermediate volume 40 with an elastromeric material.
Fig. 2 shows a sectional side view of the first assembly 42 of Fig. 1 before it is assembled with the bottom inteφoser 4. The sectional view of Fig. 2 is opposite the view of the first assembly 42 in Fig. 1 with respect to the top and bottom. During the process of malcing the first assembly 42, the inside surface 6 of the top inteφoser 2 is usually positioned upward when the wirebond pads 26 and 28 and the silicon die 14 are attached to the inside surface 6 of the top inteφoser 2. The wirebonds 18 and 20 are connected between the semiconductor die 14 and the wirebond pads 26 and 28, respectively, when the inside surface 6 of the top inteφoser 2 is positioned to face upward. .After the first assembly 42 is completed, it is attached to the bottom inteφoser 4 with the encapsulant 16 and the tab bonds 22 and 24, thereby resulting in an integrated circuit chip package with the fϊr.st assembly 42 on top of the bottom inteφoser 4 as shown in Fig. 1 and described above. Fig.3 is a simplified top plan view of the first assembly 42 of Fig. 2 showing the silicon die 14 on the inside surface 6 of the top inteφoser 2, wirebond pads 26 and 28 on the surface 6, and wirebonds 18 and 20 connected between the semiconductor die 14 and the wirebond pads 26 and 28, respectively. A plurality of conductive tab pads 44 and 46, which have direct electrical connections with the wirebond pads 26 and 28, respectively, can be provided on the inside surface 6 of the top inteφoser 2 to which the first portions 22a and 24 a of the tab bonds 22 and 24 of Fig. 1 can be directly attached, respectively. A typical integrated circuit chip assembly usually includes more wirebonds and wirebonds pads than those which are shown in Fig. 3, and the wirebond and tab pads may have a variety of patterns on the inside surface 6 of the top inteφoser 2. For example, whereas Fig. 3 shows the wirebond connections from two sides of the semiconductor die 14, wirebond connections can also be made from all four sides of the die 14. They are nonetheless within the scope of the present invention. Fig. 4 shows a sectional side view of another embodiment of the present invention in which a plurality of flipchip connectors 52 and 54 are provided between the semiconductor die 14 and the conductive pads 26 and 28, respectively, instead of the wirebond connections 18 and 20 of Fig. 1. m this embodiment, the semiconductor die 14 is not directly attached to the inside surface 6 of the top inteφoser 2. The flipchip connectors 52 and 54 provide direct electrical connections between the integrated circuit embedded on the semiconductor die 14 and the pads 26 and 28, respectively. Flipchip connectors 52 and 54 are usually solder ball connectors but may also be metal-coated polymer balls or electrically conductive adhesives. The tab bonds 22 and 24 are assembled to provide electrical connections between the pads 26 and 28 and the solder balls 30 and 32, respectively, outside the bottom inteφoser 4, in a manner similar to that which is shown in
Fig. 1 and described above. A plurality of spacers 38 may be provided to space the semiconductor die 14 apart from the inside surface 10 of the bottom inteφoser 4, although the spacers 38 are optional and are used to provide structural support to the first assembly 42 when the encapsulant 16 is flooded to fill the intermediate volume 40 between the top and the bottom inteφosers 2 and 4 during the assembly process.
Fig. 5 shows a sectional side view of the first assembly 42 of Fig. 4 with the flipchip connectors 52 and 54 before the first assembly 42 is attached to the bottom inteφoser 4. The orientation of the first assembly 42 in Fig. 5 is opposite that of the first assembly 42 in Fig.4 with respect to the top and bottom. During the process of making the first assembly 42, the inside surface 6 of the top inteφoser 2 is usually positioned upward when the conductive pads 26 and 28 are attached to the inside surface 6. The flipchip connectors 52 and 54 are then positioned on the conductive pads 26 and 28, respectively, and the silicon die 14 is attached to the flipchip connectors 52 and 54, such that proper electrical connections are made between the integrated circuit embedded on the semiconductor die 14 and the conductive pads 26 and 28. Alternatively, the flipchip connectors 52 and 54 can be provided on the die 14 prior to attachment to the conductive pads 26 and 28. After the first assembly 42 is made according to Fig. 5, it is attached to the bottom inteφoser 4 with the tab bonds 22 and 24 and the encapsulant 16 to foim the integrated circuit chip package as shown in Fig. 4. The first assembly 42 is usually positioned on top of the bottom inteφoser 4 when the assembly process is finished. Fig. 6 is a simplified top plan view of the first assembly 42 of Fig. 5, with the semiconductor die 14 shown in a dashed rectangle as if it is transparent to expose the flipchip connectors 52 and 54. The flipchip connectors 52 and 54 are directly attached to the conductive pads 26 and 28 and the die 14, respectively. .In a manner similar to that which is shown in Fig. 3 and described above, a plurality of tab pads 44 and 46 are usually provided on the inside surface 6 of the top inteφoser 2 with direct electrical connections to the conductive pads 26 and 28, respectively. In general, a plurality of pads more than those which are shown in Fig. 6 may be provided in an integrated circuit package, and a variety of conductive pad patterns may be provided on the inside surface 6 of the top inteφoser 2. For example, whereas Fig. 6 shows the flipchip connections from two sides of the semiconductor die 14, flipchip connections can also be made from all four sides of the die
14. They are nonetheless within the scope of the present invention.
An embodiment of a method of making the integrated chip package of Fig. 1 according to the present invention is illustrated by the flowchart of Fig. 7. The method includes the steps of:
• providing a top inteφoser 2; • providing a wirebond pad 26 on the top inteφoser 2;
• attaching a semiconductor die 14 to the top inteφoser 2;
• providing a wirebond 18 between the semiconductor die 14 and the wirebond pad 26, the top inteφoser 2, the wirebond pad 26, the semiconductor die 14 and the wirebond 18 forming a first assembly 42;
• providing a bottom inteφoser 4;
• attaching the first assembly 42 to the bottom inteφoser 4 with a spacer 38 spacing the semiconductor die 14 and the wirebond 18 apart from the bottom inteφoser 4, the top and bottom inteφosers 2 and 4 substantially parallel to each other and spaced apart by an intermediate volume 40;
• providing a tab bond 22 between the top and bottom inteφosers 2 and 4, the tab bond 22 including a first portion 22a in direct contact with the wirebond pad 26 and a second portion 22b in direct contact with the bottom inteφoser 4 ;
• providing an encapsulant 16 to fill the intermediate volume 40 between the top and bottom inteφosers 2 and 4; and
• providing a solder ball 30 directly connected to the second portion 22b of the tab bond 22.
Furthermore, the spacer 38 and the encapsulant 16 both comprise an elastomeric material. The encapsulant 16 can be provided to fill the intermediate volume 40 between the top and bottom inteφosers 2 and 4 by flooding the elastomeric material into the remaimng intermediate volume 40 after the first assembly 42 is attached to the bottom inteφoser 4 and the tab bonds 22 and 24 are made. In another embodiment, a flipchip connector 52 is used to connect the die 14 with the pad 26 as shown in Figs. 4-6, instead of the wirebond 18 as shown in Figs. 1-3.
The method of fabrication described above and illustrated in the flowchart of Fig. 7 is only one of several embodiments of fabricating the chip package. The integrated circuit chip package according to the present invention is not limited to that which is fabricated by using the method described above; it will be appreciated that other methods of fabrication are also possible to produce the chip package according to the present invention.
An advantage of the chip package according to the present invention is that the design of the tab bonds 22 and 24 and the pattern of the solder balls 30, 32 and 34 can be made constant and independent of the size of the semiconductor die 14 as long as adequate space is provided for the semiconductor die 14 -and the wirebonds 18 and 20. Since the size of the chip package is mainly determined by the tab bonds and the solder ball pattern, a chip package with a fixed overall dimension can accommodate a variety of different die sizes. A fiirther advantage of using two inteφosers 2 and 4 is that one inteφoser, such as the top inteφoser 2, can be used for direct attachment of the die 14 while a second inteφoser, such as the bottom inteφoser 4, can be used for supporting solder joint connections, such as the solder balls 30 and 32, through the second portions 22b and 24b of the tab bonds 22 and 24. This configuration avoids the necessity for a rigid connection between the semiconductor die 14 and the bottom inteφoser 4. Therefore, solder joint reliability of the solder balls 30 and 32 is improved.
INDUSTRIAL APPLICABILITY
The integrated circuit chip pac.kage according to the present invention is applicable for the packaging of a wide variety of semiconductor integrated circuits, and more particularly, for the packaging of semiconductor dies with a variety of die sizes. The chip package is believed to be superior to the flex/tape-BGA packages in that it is expected to provide an improved solder joint reliability by avoiding a rigid connection between the die and the inteφoser to which the solder balls are connected. Moreover, the chip package according to the present invention is believed to be superior to the microBGA package in that a single package design with the same tab bond and solder ball pattern can accommodate a variety of die sizes.
The method according to the present invention is applicable for the fabrication of the semiconductor chip package of the present invention. However, the chip package according to the present invention is not limited by the method of fabrication described in the Modes for Carrying Out the Invention; other methods of fabrication are also possible.
The invention has been described with respect to particular embodiments thereof, and numerous modifications can be made which are within the scope of the invention as set forth in the claims.

Claims

CLAIMSWhat is claimed is:
1. An integrated circuit chip package, comprising:
(a) a first inteφoser (4) having an inside surface (10) and an outside surface (12);
(b) a second inteφoser (2) spaced apart from the first inteφoser (4), the second inteφoser (2) having an inside surface (6) and an outside surface (8);
(c) an encapsulant (16) connected between the inside surfaces (10, 6) of the first and second inteφosers (4, 2);
(d) a die (14) surrounded by the encapsulant (16); and
(e) a wirebond (18) connected between the die (14) and one of the inteφosers (2, 4).
2. The package of claim 1, further comprising a wirebond pad (26) on the inside surface (6) of the second inteφoser (2).
3. A package as in one of claims 1-2, further comprising a tab bond (22) connected between the first and second inteφosers (4, 2).
4. The package of claim 3, wherein the tab bond (22) includes a first portion
(22a) in direct contact with the wirebond pad (26) and a second portion (22b) in direct contact with the outside surface (12) of the first inteφoser (4).
5. A package as in one of claims 1-4, further comprising a solder ball (30) directly connected to the second portion (22b) of the tab bond (22).
6. A package as in one of claims 1-5, further including a spacer (38) on the inside surface (6, 10) of one of the inteφosers (2, 4).
7. ni integrated circuit chip package, comprising:
(a) a bottom inteφoser (4) having an inside surface (10) and an outside surface (12);
(b) a top inteφoser (2) spaced apart from the bottom inteφoser (4), the top inteφoser (2) having an inside surface (6) and an outside surface (8);
(c) an encapsulant (16) connected between the inside surfaces (6, 10) of the top and bottom inteφosers (2, 4);
(d) a semiconductor die (14) suirounded by the encapsulant (16);
(e) a flipchip connector (52) connected between the semiconductor die (14) and one of the inteφosers (2, 4); and
(f) a tab bond (22) connected between the top and bottom inteφosers (2, 4).
8. The package of claim 7, further comprising a conductive pad (26) on the inside surface (6) of the top inteφoser (2).
9. The package of claim 8, wherein the tab bond (22) includes a first portion (22a) directly connected to the pad (26) and a second portion (22b) in direct contact with the outside surface (12) of the bottom inteφoser (4).
10. A method of making an integrated circuit chip package, comprising the steps of:
(a) providing a top inteφoser (2);
(b) attaching a semiconductor die (14) to the top inteφoser (2);
(c) providing a wirebond (18) between the semiconductor die (14) and the top inteφoser (2), the top inteφoser (2), the semiconductor die (14) and the wirebond (18) foiming a first assembly (42);
(d) providing a bottom inteφoser (4);
(e) attaching the first assembly (42) to the bottom inteφoser (4), the top and bottom inteφosers (2, 4) spaced apart by an intermediate volume (40);
(f.) providing a tab bond (22) between the top and bottom inteφosers (2, 4); and
(g) providing an encapsulant (16) to fill the intermediate volume (40) between the top and bottom inteφosers (2, 4).
PCT/US1998/025673 1997-12-03 1998-12-03 Integrated circuit chip package and method of making the same WO1999028969A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/984,547 1997-12-03
US08/984,547 US6124546A (en) 1997-12-03 1997-12-03 Integrated circuit chip package and method of making the same

Publications (1)

Publication Number Publication Date
WO1999028969A1 true WO1999028969A1 (en) 1999-06-10

Family

ID=25530655

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/025673 WO1999028969A1 (en) 1997-12-03 1998-12-03 Integrated circuit chip package and method of making the same

Country Status (2)

Country Link
US (1) US6124546A (en)
WO (1) WO1999028969A1 (en)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040097996A1 (en) 1999-10-05 2004-05-20 Omnisonics Medical Technologies, Inc. Apparatus and method of removing occlusions using an ultrasonic medical device operating in a transverse mode
US6429534B1 (en) * 2000-01-06 2002-08-06 Lsi Logic Corporation Interposer tape for semiconductor package
WO2002070158A1 (en) * 2001-03-07 2002-09-12 Omnisonics Medical Technologies, Inc. Apparatus and method for manufacturing small diameter medical devices
US7182672B2 (en) * 2001-08-02 2007-02-27 Sv Probe Pte. Ltd. Method of probe tip shaping and cleaning
US7176506B2 (en) * 2001-08-28 2007-02-13 Tessera, Inc. High frequency chip packages with connecting elements
US6856007B2 (en) * 2001-08-28 2005-02-15 Tessera, Inc. High-frequency chip packages
DE10201204A1 (en) * 2002-01-14 2003-07-31 Infineon Technologies Ag Method for producing protection for chip edges and arrangement for protecting chip edges
US7754537B2 (en) * 2003-02-25 2010-07-13 Tessera, Inc. Manufacture of mountable capped chips
US6965245B2 (en) 2003-05-01 2005-11-15 K&S Interconnect, Inc. Prefabricated and attached interconnect structure
US7245022B2 (en) * 2003-11-25 2007-07-17 International Business Machines Corporation Semiconductor module with improved interposer structure and method for forming the same
US7794414B2 (en) 2004-02-09 2010-09-14 Emigrant Bank, N.A. Apparatus and method for an ultrasonic medical device operating in torsional and transverse modes
WO2006052616A1 (en) * 2004-11-03 2006-05-18 Tessera, Inc. Stacked packaging improvements
US8143095B2 (en) 2005-03-22 2012-03-27 Tessera, Inc. Sequential fabrication of vertical conductive interconnects in capped chips
US7253518B2 (en) * 2005-06-15 2007-08-07 Endicott Interconnect Technologies, Inc. Wirebond electronic package with enhanced chip pad design, method of making same, and information handling system utilizing same
US8058101B2 (en) * 2005-12-23 2011-11-15 Tessera, Inc. Microelectronic packages and methods therefor
US7936062B2 (en) 2006-01-23 2011-05-03 Tessera Technologies Ireland Limited Wafer level chip packaging
US8604605B2 (en) 2007-01-05 2013-12-10 Invensas Corp. Microelectronic assembly with multi-layer support structure
JP5330697B2 (en) * 2007-03-19 2013-10-30 株式会社リコー Functional element package and manufacturing method thereof
US8698306B2 (en) 2010-05-20 2014-04-15 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate contact opening
US9159708B2 (en) 2010-07-19 2015-10-13 Tessera, Inc. Stackable molded microelectronic packages with area array unit connectors
US8482111B2 (en) 2010-07-19 2013-07-09 Tessera, Inc. Stackable molded microelectronic packages
KR101075241B1 (en) 2010-11-15 2011-11-01 테세라, 인코포레이티드 Microelectronic package with terminals on dielectric mass
US20120146206A1 (en) 2010-12-13 2012-06-14 Tessera Research Llc Pin attachment
US8618659B2 (en) 2011-05-03 2013-12-31 Tessera, Inc. Package-on-package assembly with wire bonds to encapsulation surface
KR101128063B1 (en) 2011-05-03 2012-04-23 테세라, 인코포레이티드 Package-on-package assembly with wire bonds to encapsulation surface
US8872318B2 (en) 2011-08-24 2014-10-28 Tessera, Inc. Through interposer wire bond using low CTE interposer with coarse slot apertures
US8404520B1 (en) 2011-10-17 2013-03-26 Invensas Corporation Package-on-package assembly with wire bond vias
US8946757B2 (en) 2012-02-17 2015-02-03 Invensas Corporation Heat spreading substrate with embedded interconnects
US9349706B2 (en) 2012-02-24 2016-05-24 Invensas Corporation Method for package-on-package assembly with wire bonds to encapsulation surface
US8372741B1 (en) 2012-02-24 2013-02-12 Invensas Corporation Method for package-on-package assembly with wire bonds to encapsulation surface
US8835228B2 (en) 2012-05-22 2014-09-16 Invensas Corporation Substrate-less stackable package with wire-bond interconnect
US9391008B2 (en) 2012-07-31 2016-07-12 Invensas Corporation Reconstituted wafer-level package DRAM
US9502390B2 (en) 2012-08-03 2016-11-22 Invensas Corporation BVA interposer
US8975738B2 (en) 2012-11-12 2015-03-10 Invensas Corporation Structure for microelectronic packaging with terminals on dielectric mass
US8878353B2 (en) 2012-12-20 2014-11-04 Invensas Corporation Structure for microelectronic packaging with bond elements to encapsulation surface
US9136254B2 (en) 2013-02-01 2015-09-15 Invensas Corporation Microelectronic package having wire bond vias and stiffening layer
US9034696B2 (en) 2013-07-15 2015-05-19 Invensas Corporation Microelectronic assemblies having reinforcing collars on connectors extending through encapsulation
US9023691B2 (en) 2013-07-15 2015-05-05 Invensas Corporation Microelectronic assemblies with stack terminals coupled by connectors extending through encapsulation
US8883563B1 (en) 2013-07-15 2014-11-11 Invensas Corporation Fabrication of microelectronic assemblies having stack terminals coupled by connectors extending through encapsulation
US9167710B2 (en) 2013-08-07 2015-10-20 Invensas Corporation Embedded packaging with preformed vias
US9685365B2 (en) 2013-08-08 2017-06-20 Invensas Corporation Method of forming a wire bond having a free end
US20150076714A1 (en) 2013-09-16 2015-03-19 Invensas Corporation Microelectronic element with bond elements to encapsulation surface
US9082753B2 (en) 2013-11-12 2015-07-14 Invensas Corporation Severing bond wire by kinking and twisting
US9087815B2 (en) 2013-11-12 2015-07-21 Invensas Corporation Off substrate kinking of bond wire
US9263394B2 (en) 2013-11-22 2016-02-16 Invensas Corporation Multiple bond via arrays of different wire heights on a same substrate
US9583456B2 (en) 2013-11-22 2017-02-28 Invensas Corporation Multiple bond via arrays of different wire heights on a same substrate
US9379074B2 (en) 2013-11-22 2016-06-28 Invensas Corporation Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects
US9583411B2 (en) 2014-01-17 2017-02-28 Invensas Corporation Fine pitch BVA using reconstituted wafer with area array accessible for testing
US9214454B2 (en) 2014-03-31 2015-12-15 Invensas Corporation Batch process fabrication of package-on-package microelectronic assemblies
US10381326B2 (en) 2014-05-28 2019-08-13 Invensas Corporation Structure and method for integrated circuits packaging with increased density
US9646917B2 (en) 2014-05-29 2017-05-09 Invensas Corporation Low CTE component with wire bond interconnects
US9412714B2 (en) 2014-05-30 2016-08-09 Invensas Corporation Wire bond support structure and microelectronic package including wire bonds therefrom
US9735084B2 (en) 2014-12-11 2017-08-15 Invensas Corporation Bond via array for thermal conductivity
US9888579B2 (en) 2015-03-05 2018-02-06 Invensas Corporation Pressing of wire bond wire tips to provide bent-over tips
US9502372B1 (en) 2015-04-30 2016-11-22 Invensas Corporation Wafer-level packaging using wire bond wires in place of a redistribution layer
US9761554B2 (en) 2015-05-07 2017-09-12 Invensas Corporation Ball bonding metal wire bond wires to metal pads
US10490528B2 (en) 2015-10-12 2019-11-26 Invensas Corporation Embedded wire bond wires
US9490222B1 (en) 2015-10-12 2016-11-08 Invensas Corporation Wire bond wires for interference shielding
US10332854B2 (en) 2015-10-23 2019-06-25 Invensas Corporation Anchoring structure of fine pitch bva
US10181457B2 (en) 2015-10-26 2019-01-15 Invensas Corporation Microelectronic package for wafer-level chip scale packaging with fan-out
US10043779B2 (en) 2015-11-17 2018-08-07 Invensas Corporation Packaged microelectronic device for a package-on-package device
US9659848B1 (en) 2015-11-18 2017-05-23 Invensas Corporation Stiffened wires for offset BVA
US9984992B2 (en) 2015-12-30 2018-05-29 Invensas Corporation Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces
US9935075B2 (en) 2016-07-29 2018-04-03 Invensas Corporation Wire bonding method and apparatus for electromagnetic interference shielding
US10299368B2 (en) 2016-12-21 2019-05-21 Invensas Corporation Surface integrated waveguides and circuit structures therefor

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62101053A (en) * 1985-10-28 1987-05-11 Toshiba Corp Thin type electronic circuit unit
GB2204182A (en) * 1984-11-05 1988-11-02 Casio Computer Co Ltd Ic card
EP0297991A1 (en) * 1987-07-02 1989-01-04 CP8 Transac Method of fabricating an electronic microcircuit card
DE3912891A1 (en) * 1989-04-19 1990-11-08 Siemens Ag IC mount and contacts for credit card - with flush contacts for electronic reader and pref. PVC carrier foil
US5490324A (en) * 1993-09-15 1996-02-13 Lsi Logic Corporation Method of making integrated circuit package having multiple bonding tiers
FR2740906A1 (en) * 1995-11-07 1997-05-09 Solaic Sa Integrated circuit module for plastic card

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0797590B2 (en) * 1989-11-21 1995-10-18 株式会社東芝 Bipolar transistor manufacturing method
US5019673A (en) * 1990-08-22 1991-05-28 Motorola, Inc. Flip-chip package for integrated circuits
US5285352A (en) * 1992-07-15 1994-02-08 Motorola, Inc. Pad array semiconductor device with thermal conductor and process for making the same
JPH08335653A (en) * 1995-04-07 1996-12-17 Nitto Denko Corp Semiconductor device, its production and tape carrier for semiconductor device used for production of the semiconductor device
JPH08293524A (en) * 1995-04-21 1996-11-05 Toshiba Corp Semiconductor device and its manufacture
US5844315A (en) * 1996-03-26 1998-12-01 Motorola Corporation Low-profile microelectronic package

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2204182A (en) * 1984-11-05 1988-11-02 Casio Computer Co Ltd Ic card
JPS62101053A (en) * 1985-10-28 1987-05-11 Toshiba Corp Thin type electronic circuit unit
EP0297991A1 (en) * 1987-07-02 1989-01-04 CP8 Transac Method of fabricating an electronic microcircuit card
DE3912891A1 (en) * 1989-04-19 1990-11-08 Siemens Ag IC mount and contacts for credit card - with flush contacts for electronic reader and pref. PVC carrier foil
US5490324A (en) * 1993-09-15 1996-02-13 Lsi Logic Corporation Method of making integrated circuit package having multiple bonding tiers
FR2740906A1 (en) * 1995-11-07 1997-05-09 Solaic Sa Integrated circuit module for plastic card

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 011, no. 309 (E - 547) 8 October 1987 (1987-10-08) *

Also Published As

Publication number Publication date
US6124546A (en) 2000-09-26

Similar Documents

Publication Publication Date Title
US6124546A (en) Integrated circuit chip package and method of making the same
US6222259B1 (en) Stack package and method of fabricating the same
US8525322B1 (en) Semiconductor package having a plurality of input/output members
US6441495B1 (en) Semiconductor device of stacked chips
CN100576524C (en) Lead frame, semiconductor packages and manufacture method thereof
TWI495082B (en) Multi-layer semiconductor package
US6638790B2 (en) Leadframe and method for manufacturing resin-molded semiconductor device
US6414381B1 (en) Interposer for separating stacked semiconductor chips mounted on a multi-layer printed circuit board
US7772687B2 (en) Multiple electronic component containing substrate
US6087717A (en) Semiconductor device and manufacturing method
US6830955B2 (en) Semiconductor package and method for manufacturing the same
US8420452B2 (en) Fabrication method of leadframe-based semiconductor package
US20040150086A1 (en) Semiconductor package having reduced thickness
US6300685B1 (en) Semiconductor package
US6750080B2 (en) Semiconductor device and process for manufacturing the same
KR100240748B1 (en) Semiconductor chip package having substrate and manufacturing method thereof, and stack package
US6639308B1 (en) Near chip size semiconductor package
US6774479B2 (en) Electronic device having a semiconductor chip on a semiconductor chip connection plate and a method for producing the electronic device
US20060091516A1 (en) Flexible leaded stacked semiconductor package
US7355286B2 (en) Flip chip bonded package applicable to fine pitch technology
KR19990085107A (en) Semiconductor chip package and manufacturing method
US20020084519A1 (en) Semiconductor chip stack package and fabrication method thereof
US6198160B1 (en) Surface mounted type semiconductor device with wrap-around external leads
KR100218335B1 (en) Chip-sized package
KR100340862B1 (en) Stack package and its manufacturing method

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase