WO1999024992A1 - Polymer composites for overvoltage protection - Google Patents

Polymer composites for overvoltage protection Download PDF

Info

Publication number
WO1999024992A1
WO1999024992A1 PCT/US1998/023493 US9823493W WO9924992A1 WO 1999024992 A1 WO1999024992 A1 WO 1999024992A1 US 9823493 W US9823493 W US 9823493W WO 9924992 A1 WO9924992 A1 WO 9924992A1
Authority
WO
WIPO (PCT)
Prior art keywords
composition
particles
particle size
average particle
less
Prior art date
Application number
PCT/US1998/023493
Other languages
French (fr)
Inventor
Louis Rector
Hugh M. Hyatt
Original Assignee
Littelfuse, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Littelfuse, Inc. filed Critical Littelfuse, Inc.
Priority to JP2000519901A priority Critical patent/JP2001523040A/en
Priority to AU14511/99A priority patent/AU1451199A/en
Priority to DE19882807T priority patent/DE19882807T1/en
Publication of WO1999024992A1 publication Critical patent/WO1999024992A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/10Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
    • H01C7/12Overvoltage protection resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/10Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
    • H01C7/105Varistor cores
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256Heavy metal or aluminum or compound thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/259Silicic material

Definitions

  • the present invention generally relates to the use of polymer composite materials for the protection of electronic components against electrical overstress (EOS) transients.
  • EOS electrical overstress
  • EOS transients which can protect electronic circuits from EOS transients which produce high electric fields and usually high peak powers capable of destroying circuits or the highly sensitive electrical components in the circuits, rendering the circuits and the components non-functional, either temporarily or permanently.
  • the EOS transient can include transient voltage or current conditions capable of interrupting circuit operation or destroying the circuit outright.
  • EOS transients may arise, for example, from an electromagnetic pulse, an electrostatic discharge, lightening, or be induced by the operation of other electronic or electrical components. Such transients may rise to their maximum amplitudes in microsecond to subnanosecond timeframe and may be repetitive in nature.
  • a typical waveform of an electrical overstress transient is illustrated in FIG. 1.
  • the peak amplitude of the electrostatic discharge (ESD) transient wave may exceed 25,000 volts with currents of more than 100 amperes.
  • ESD electrostatic discharge
  • EOS materials Materials for the protection against EOS transients are designed to respond essentially instantaneously (i.e., ideally before the transient wave reaches its peak) to reduce the transmitted voltage to a much lower value and clamp the voltage at the lower value for the duration of the EOS transient.
  • EOS materials are characterized by high electrical resistance values at low or normal operating voltages and currents. In response to an EOS transient, the material switches essentially instantaneously to a low electrical resistance value. When the EOS threat has been mitigated these materials return to their high resistance value. These materials are capable of repeated switching between the high and low resistance states, allowing circuit protection against multiple EOS events. EOS materials are also capable of recovering essentially instantaneously to their original high resistance value upon termination of the EOS transient.
  • the high resistance state will be referred to as the "off-state” and the low resistance state will be referred to as the "on-state.”
  • FIG. 2 illustrates a typical electrical resistance versus d.c. voltage relationship for EOS materials.
  • Circuit components including EOS materials can shunt a portion of the excessive voltage or current due to the EOS transient to ground, thus, protecting the electrical circuit and its components.
  • the major portion of the threat transient is reflected back towards the source of the threat.
  • the reflected waive is either attenuated by the source, radiated away, or re-directed back to the surge protection device which responds with each return pulse until the threat energy is reduced to safe levels.
  • U.S. Patent No. 2,273,704 issued to Grisdale, discloses granular composites which exhibit non-linear current voltage relationships. These mixtures are comprised of granules of conductive and semiconductive granules that are coated with a thin insulative layer and are compressed and bonded together to provide a coherent body.
  • U.S. Patent No. 2,796,505 issued to Bocciarelli, discloses a non-linear voltage regulating element. The element is comprised of conductor particles having insulative oxide surface coatings that are bound in a matrix. The particles are irregular in shape and make point contact with one another.
  • U.S. Patent No. 4,726,991 issued to Hyatt et al., discloses an EOS protection material comprised of a mixture of conductive and semiconductive particles, all of whose surfaces are coated with an insulative oxide film. These particles are bound together in an insulative binder. The coated particles are preferably in point contact with each other and conduct preferentially in a quantum mechanical tunneling mode.
  • U.S. Patent No. 5,476,714, issued to Hyatt discloses EOS composite materials comprised of mixtures of conductor and semiconductor particles in the 10 to 100 micron range with a minimum proportion of 100 angstrom range insulative particles, bonded together in a insulative binder.
  • This invention includes a grading of particle sizes such that the composition causes the particles to take a preferential relationship to each other.
  • It is another object of the present invention to provide an EOS composition comprising a matrix formed of a mixture of an insulating binder, conductive particles having an average particle size less than 10 microns, and semiconductive particles having an average particle size less than 10 microns, and optionally, insulating particles in the 300-1000 angstrom size range.
  • Clamping voltages are dependent upon both material composition and device geometry. Voltage clamping reported above relates primarily to surge arrestors of small size with electrode spacing from .0015 inches to .0500 inches typically. Increasing the gap between electrodes provides an additional control on the clamping voltage. Devices using larger electrode gaps, electrode areas and higher material volumes will provide higher clamping voltages. It is possible to design surge arrestors with clamping voltages as great as 2kV or higher.
  • Figure 1 graphically illustrates a typical current waveform of an EOS transient.
  • Figure 2 graphically illustrates the electrical resistance versus d.c. voltage relationship of typical EOS materials.
  • Figure 3 illustrates a typical electronic circuit including a device having an
  • Figure 4 A illustrates a top view of the surface-mount electrical device configuration used to test the electrical properties of the EOS composition according to the present invention.
  • Figure 4B is a cross-sectional view taken along lines B-B of the electrical device configuration illustrated in Figure 4A.
  • electrical devices including compositions made according to the present invention provide electrical circuits and circuitry components with protection against incoming EOS transients.
  • the circuit load 5 in FIG. 3 normally operates at voltages less than a predetermined voltage V n .
  • EOS transient threats of more than two and three times the predetermined operating voltage V n with sufficient duration can damage the circuit and the circuit components.
  • EOS threats exceed the predetermined operating voltage by tens, hundreds, or even thousands of times the voltage seen in normal operation.
  • an EOS transient voltage 15 is shown entering the circuit 10 on electronic line 20.
  • the EOS transient voltage can result from an electromagnetic pulse, an electrostatic discharge or lightning.
  • the electrical overstress protection device 25 switches from the high resistance off-state to a low resistance on-state, thus clamping the EOS transient voltage 15 to a safe, low value and shunting a portion of the threat electrical current from the electronic line 20 to the system ground 30. The major portion of the threat current is reflected back towards the source of the threat.
  • the EOS switching material of the present invention utilizes small particle size conductive and semiconductive particles, and optionally insulating particles, dispersed in an insulating binder using standard mixing techniques.
  • the insulating binder is chosen to have a high dielectric breakdown strength, a high electrical resistivity and high tracking resistance.
  • the switching characteristics of the composite material are determined by the nature of the conductive, semiconductive, and insulative particles, the particle size and size distribution, and the interparticle spacing.
  • the interparticle spacing depends upon the percent loading of the conductive, semiconductive, and insulative particles and on their size and size distribution. In the compositions of the present invention, interparticle spacing will be generally greater than 1,000 angstroms.
  • the insulating binder must provide and maintain sufficient interparticle spacing between the conductive and semiconductive particles to provide a high off-state resistance.
  • the desired off-state resistance is also affected by the resistivity and dielectic strength of the insulating binder.
  • the insulating binder material should have a volume conductivity of at most 10 "6 (ohm-cm) " '.
  • Suitable insulative binders for use in the present invention include thermoset polymers, thermoplastic polymers, elastomers, rubbers, or polymer blends. The polymers may be cross-linked to promote material strength. Likewise, elastomers may be vulcanized to increase material strength.
  • the insulative binder comprises a silicone rubber resin manufactured by Dow Corning STI and marketed under the tradename Q4-2901. This silicone resin is cross-linked with a peroxide curing agent; for example, 2,5-bis-(t-butylperoxy)-2,5-dimethyl-l -3-hexyne, available from Aldrich Chemical.
  • a peroxide curing agent for example, 2,5-bis-(t-butylperoxy)-2,5-dimethyl-l -3-hexyne, available from Aldrich Chemical.
  • the choice of the peroxide curing agent is partially determined by desired cure times and temperatures. Nearly any binder will be useful as long as the material does not preferentially track in the presence of high interparticle current densities.
  • the insulative binder comprises silicone resin and is manufactured by General Electric and marketed under the tradename SLA7401-D1.
  • the conductive particles preferred for use in the present invention have bulk conductivities of greater than 10 (ohm-cm)'' and especially greater than 100 (ohm- cm) " ' .
  • the conductive powders preferably have a maximum average particle size less than 10 microns. Preferably 95% of the conductive particles have diameters no larger than 20 microns, more preferably 100% of the particles are less than 10 microns in diameter. Conductive particles with average particle sizes in the submicron range are also preferred. For example, conductive materials with average particle sizes in the 1 micron down to nanometer size range are useful.
  • the conductive particles which are suitable for use in the present invention are nickel, copper, aluminum, carbon black, graphite, silver, gold, zinc, iron, stainless steel, tin, brass, and metal alloys.
  • intrinsically conducting polymer powders such as polypyrrole or polyaniline may also be employed, as long as they exhibit stable electrical properties.
  • the conductive particles are nickel manufactured by
  • the conductive particles comprise aluminum and have an average particle size in the range of 1 -5 microns.
  • the semiconductive particles preferred for use in the present invention have an average particle size less than 5 microns and bulk conductivities in the range of 10 to 10 '6 (ohm-cm) 1 .
  • the average particle size of the semiconductive particles is preferably in a range of about 3 to about 5 microns, or even less than 1 micron.
  • semiconductive particle sizes down to the 100 nanometer range and less are also suitable for use in the present invention.
  • the preferred semiconductive material is silicon carbide.
  • the following semiconductive particle materials can also be used in the present invention: oxides of bismuth, copper, zinc, calcium, vanadium, iron, magnesium, calcium and titanium; carbides of silicon, aluminum, chromium, titanium, molybdenum, beryllium, boron, tungsten and vanadium; sulfides of cadmium, zinc, lead, molybdenum, and silver; nitrides such as boron nitride, silicon nitride and aluminum nitride; barium titanate and iron titanate; suicides of molybdenum and chromium; and borides of chromium, molybdenum, niobium and tungsten.
  • the semiconductive particles are silicon carbide manufactured by Agsco, #1200 grit, having an average particle size of approximately 3 microns, or silicon carbide manufactured by Norton, #10,000 grit, having an average particle size of approximately 0.3 microns.
  • the compositions of the present invention comprise semiconductive particles formed from mixtures of different semiconductive materials; e.g., silicon carbide and at least one of the following materials: barium titanate, magnesium oxide, zinc oxide, and boron nitride.
  • the insulating binder comprises from about 20 to about 60%, and preferably from about 25 to about 50%), by volume of the total composition.
  • the conductive particles may comprise from about 5 to about 50%), and preferably from about 10 to about 45%>, by volume of the total composition.
  • the semiconductive particles may comprise from about 2 to about 60%), and preferably from about 25 to about 50%), by volume of the total composition.
  • the EOS compositions further comprise insulative particles having an average particle size in a range of about 200 to about 1000 angstroms and bulk conductivities of less than 10 "6 (ohm-cm) "1 .
  • a suitable insulating particle is titanium dioxide having an average particle size from about 300 to about 400 angstroms produced by Nanophase Technologies.
  • suitable insulating particles include, oxides of iron, aluminum, zinc, titanium and copper and clay such as montmorillonite type produced by Nanocor, Inc. and marketed under the Nanomer tradename.
  • the insulating particles, if employed in the composition are preferably present in an amount from about 1 to about 15%>, by volume of the total composition.
  • compositions of the present invention generally can be tailored to provide a range of clamping voltages from about 30 volts to greater than 2,000 volts.
  • Preferred embodiments of the present invention for circuit board level protection exhibit clamping voltages in a range of 100-200 volts, preferably less than 100 volts, more preferably less than 50 volts, and especially exhibit clamping voltages in a range of about 25 to about 50 volts.
  • compositions have been prepared by mixing the components in a polymer compounding unit such as a Brabender or a Haake compounding unit.
  • compositions 100 were laminated into an electrode gap region 1 10 between electrodes 120, 130 and subsequently cured under heat and pressure.
  • TLP transmission line voltage pulse
  • MZ KeyTek Minizapper
  • the package stray capacitance and inductance are minimized in devices constructed from these materials.
  • Various gap widths were tested.
  • the compositions and responses are set forth in Table 1.
  • the electrical performance of EOS devices can be tailored by the choice of gap width.
  • the clamping voltage of formulation can be increased by increasing the electrode gap spacing.
  • the performance also is modified so that the TLP voltage threshold (level required to switch the device to its on-state) is now at least 2000 V.

Abstract

A composition and devices utilizing these compositions for providing protection against electrical overstress including a matrix formed of a mixture of an insulating binder, conductive particles having an average particle size of less than 10 microns, and semiconductive particles having an average particle size of less than 10 microns. The compositions exhibit improved clamping voltages in a range of about 30 volts to greater than 2,000 volts.

Description

POLYMER COMPOSITES FOR OVERVOLTAGE PROTECTION
DESCRIPTION
Cross-Reference To Related Applications
This application claims the benefit of U.S. provisional patent application no. 60/064,963 filed on November 8, 1997. Technical Field The present invention generally relates to the use of polymer composite materials for the protection of electronic components against electrical overstress (EOS) transients. Background of the Invention
There is an increased demand for electrical components which can protect electronic circuits from EOS transients which produce high electric fields and usually high peak powers capable of destroying circuits or the highly sensitive electrical components in the circuits, rendering the circuits and the components non-functional, either temporarily or permanently. The EOS transient can include transient voltage or current conditions capable of interrupting circuit operation or destroying the circuit outright. Particularly, EOS transients may arise, for example, from an electromagnetic pulse, an electrostatic discharge, lightening, or be induced by the operation of other electronic or electrical components. Such transients may rise to their maximum amplitudes in microsecond to subnanosecond timeframe and may be repetitive in nature. A typical waveform of an electrical overstress transient is illustrated in FIG. 1. The peak amplitude of the electrostatic discharge (ESD) transient wave may exceed 25,000 volts with currents of more than 100 amperes. There exist several standards which define the waveform of the EOS transient. These include IEC 1000-4-2, ANSI guidelines on ESD (ANSI C63.16), DO- 160, and FAA- 20-136. There also exist military standards, such as MIL STD 461/461 and MIL STD 883 part 3015.
Materials for the protection against EOS transients (EOS materials) are designed to respond essentially instantaneously (i.e., ideally before the transient wave reaches its peak) to reduce the transmitted voltage to a much lower value and clamp the voltage at the lower value for the duration of the EOS transient. EOS materials are characterized by high electrical resistance values at low or normal operating voltages and currents. In response to an EOS transient, the material switches essentially instantaneously to a low electrical resistance value. When the EOS threat has been mitigated these materials return to their high resistance value. These materials are capable of repeated switching between the high and low resistance states, allowing circuit protection against multiple EOS events. EOS materials are also capable of recovering essentially instantaneously to their original high resistance value upon termination of the EOS transient. For purposes of this application, the high resistance state will be referred to as the "off-state" and the low resistance state will be referred to as the "on-state." These materials which are subject of the claims herein have withstood thousands of ESD events and recovered to desired off-states after providing protection from each of the individual ESD events.
FIG. 2 illustrates a typical electrical resistance versus d.c. voltage relationship for EOS materials. Circuit components including EOS materials can shunt a portion of the excessive voltage or current due to the EOS transient to ground, thus, protecting the electrical circuit and its components. The major portion of the threat transient is reflected back towards the source of the threat. The reflected waive is either attenuated by the source, radiated away, or re-directed back to the surge protection device which responds with each return pulse until the threat energy is reduced to safe levels.
U.S. Patent No. 2,273,704, issued to Grisdale, discloses granular composites which exhibit non-linear current voltage relationships. These mixtures are comprised of granules of conductive and semiconductive granules that are coated with a thin insulative layer and are compressed and bonded together to provide a coherent body. U.S. Patent No. 2,796,505, issued to Bocciarelli, discloses a non-linear voltage regulating element. The element is comprised of conductor particles having insulative oxide surface coatings that are bound in a matrix. The particles are irregular in shape and make point contact with one another.
U.S. Patent No. 4,726,991 , issued to Hyatt et al., discloses an EOS protection material comprised of a mixture of conductive and semiconductive particles, all of whose surfaces are coated with an insulative oxide film. These particles are bound together in an insulative binder. The coated particles are preferably in point contact with each other and conduct preferentially in a quantum mechanical tunneling mode. U.S. Patent No. 5,476,714, issued to Hyatt, discloses EOS composite materials comprised of mixtures of conductor and semiconductor particles in the 10 to 100 micron range with a minimum proportion of 100 angstrom range insulative particles, bonded together in a insulative binder. This invention includes a grading of particle sizes such that the composition causes the particles to take a preferential relationship to each other. U.S. Patent No. 5,260,848, issued to Childers, discloses foldback switching materials which provide protection from transient overvoltages. These materials are comprised of mixtures of conductive particles in the 10 to 200 micron range. Semiconductor and insulative particles are also used in this invention. The spacing between conductive particles is at least 1000 angstroms.
Examples of prior EOS polymer composite materials are also disclosed in U.S. Patent Nos. 4,331,948, 4,726,991 , 4,977,357, 4,992,333, 5,142,263, 5,189,387, 5,294,374, 5,476,714, 5,669,381 , and 5,781,395. Summary of the Invention It is .an object of the present invention to provide a polymer composite material which provides a high electrical resistance to normal operating voltage values but in response to an EOS transient switches to a low electrical resistance and clamps the EOS transient voltage to a low level for the duration of the EOS transient.
It is another object of the present invention to provide an EOS composition comprising a matrix formed of a mixture of an insulating binder, conductive particles having an average particle size less than 10 microns, and semiconductive particles having an average particle size less than 10 microns, and optionally, insulating particles in the 300-1000 angstrom size range.
It is a final object of the present invention to provide an EOS composition which provides a clamping voltage in the range of 25 - 100 volts. Clamping voltages are dependent upon both material composition and device geometry. Voltage clamping reported above relates primarily to surge arrestors of small size with electrode spacing from .0015 inches to .0500 inches typically. Increasing the gap between electrodes provides an additional control on the clamping voltage. Devices using larger electrode gaps, electrode areas and higher material volumes will provide higher clamping voltages. It is possible to design surge arrestors with clamping voltages as great as 2kV or higher.
Other advantages and aspects of the present invention will become apparent upon reading the following description of the drawings and detailed description of the invention. Brief Description of the Drawings
Figure 1 graphically illustrates a typical current waveform of an EOS transient. Figure 2 graphically illustrates the electrical resistance versus d.c. voltage relationship of typical EOS materials. Figure 3 illustrates a typical electronic circuit including a device having an
EOS composition according to the present invention.
Figure 4 A illustrates a top view of the surface-mount electrical device configuration used to test the electrical properties of the EOS composition according to the present invention. Figure 4B is a cross-sectional view taken along lines B-B of the electrical device configuration illustrated in Figure 4A. Detailed Description of the Invention
While this invention is susceptible of embodiment in many different forms, there is shown in the drawings and will herein be described in detail a preferred embodiment of the invention with the understanding that the present disclosure is to be considered as an exemplification of the principles of the invention and is not intended to limit the broad aspect of the invention to the embodiments illustrated.
With reference to FIG. 3, electrical devices including compositions made according to the present invention provide electrical circuits and circuitry components with protection against incoming EOS transients. The circuit load 5 in FIG. 3 normally operates at voltages less than a predetermined voltage Vn. EOS transient threats of more than two and three times the predetermined operating voltage Vn with sufficient duration can damage the circuit and the circuit components. Typically, EOS threats exceed the predetermined operating voltage by tens, hundreds, or even thousands of times the voltage seen in normal operation. In FIG. 3, an EOS transient voltage 15 is shown entering the circuit 10 on electronic line 20. As previously mentioned the EOS transient voltage can result from an electromagnetic pulse, an electrostatic discharge or lightning. Upon application of the EOS transient voltage 15, the electrical overstress protection device 25 switches from the high resistance off-state to a low resistance on-state, thus clamping the EOS transient voltage 15 to a safe, low value and shunting a portion of the threat electrical current from the electronic line 20 to the system ground 30. The major portion of the threat current is reflected back towards the source of the threat.
The EOS switching material of the present invention utilizes small particle size conductive and semiconductive particles, and optionally insulating particles, dispersed in an insulating binder using standard mixing techniques. The insulating binder is chosen to have a high dielectric breakdown strength, a high electrical resistivity and high tracking resistance. The switching characteristics of the composite material are determined by the nature of the conductive, semiconductive, and insulative particles, the particle size and size distribution, and the interparticle spacing. The interparticle spacing depends upon the percent loading of the conductive, semiconductive, and insulative particles and on their size and size distribution. In the compositions of the present invention, interparticle spacing will be generally greater than 1,000 angstroms. Additionally, the insulating binder must provide and maintain sufficient interparticle spacing between the conductive and semiconductive particles to provide a high off-state resistance. The desired off-state resistance is also affected by the resistivity and dielectic strength of the insulating binder. Generally speaking the insulating binder material should have a volume conductivity of at most 10"6 (ohm-cm)"'. Suitable insulative binders for use in the present invention include thermoset polymers, thermoplastic polymers, elastomers, rubbers, or polymer blends. The polymers may be cross-linked to promote material strength. Likewise, elastomers may be vulcanized to increase material strength. In a preferred embodiment, the insulative binder comprises a silicone rubber resin manufactured by Dow Corning STI and marketed under the tradename Q4-2901. This silicone resin is cross-linked with a peroxide curing agent; for example, 2,5-bis-(t-butylperoxy)-2,5-dimethyl-l -3-hexyne, available from Aldrich Chemical. The choice of the peroxide curing agent is partially determined by desired cure times and temperatures. Nearly any binder will be useful as long as the material does not preferentially track in the presence of high interparticle current densities. In another preferred embodiment, the insulative binder comprises silicone resin and is manufactured by General Electric and marketed under the tradename SLA7401-D1.
The conductive particles preferred for use in the present invention have bulk conductivities of greater than 10 (ohm-cm)'' and especially greater than 100 (ohm- cm)"' . The conductive powders preferably have a maximum average particle size less than 10 microns. Preferably 95% of the conductive particles have diameters no larger than 20 microns, more preferably 100% of the particles are less than 10 microns in diameter. Conductive particles with average particle sizes in the submicron range are also preferred. For example, conductive materials with average particle sizes in the 1 micron down to nanometer size range are useful. Among the conductive particles which are suitable for use in the present invention are nickel, copper, aluminum, carbon black, graphite, silver, gold, zinc, iron, stainless steel, tin, brass, and metal alloys. In addition intrinsically conducting polymer powders, such as polypyrrole or polyaniline may also be employed, as long as they exhibit stable electrical properties. In a preferred embodiment, the conductive particles are nickel manufactured by
Novamet and marketed under the tradename Ni-4sp-10 and have an average particle size in the range of 4-8 microns. In another preferred embodiment, the conductive particles comprise aluminum and have an average particle size in the range of 1 -5 microns. The semiconductive particles preferred for use in the present invention have an average particle size less than 5 microns and bulk conductivities in the range of 10 to 10'6 (ohm-cm) 1. However, in order to maximize particle packing density and obtain optimum clamping voltages and switching characteristics, the average particle size of the semiconductive particles is preferably in a range of about 3 to about 5 microns, or even less than 1 micron. For example, semiconductive particle sizes down to the 100 nanometer range and less are also suitable for use in the present invention. The preferred semiconductive material is silicon carbide. However, the following semiconductive particle materials can also be used in the present invention: oxides of bismuth, copper, zinc, calcium, vanadium, iron, magnesium, calcium and titanium; carbides of silicon, aluminum, chromium, titanium, molybdenum, beryllium, boron, tungsten and vanadium; sulfides of cadmium, zinc, lead, molybdenum, and silver; nitrides such as boron nitride, silicon nitride and aluminum nitride; barium titanate and iron titanate; suicides of molybdenum and chromium; and borides of chromium, molybdenum, niobium and tungsten. In a preferred embodiment the semiconductive particles are silicon carbide manufactured by Agsco, #1200 grit, having an average particle size of approximately 3 microns, or silicon carbide manufactured by Norton, #10,000 grit, having an average particle size of approximately 0.3 microns. In another preferred embodiment the compositions of the present invention comprise semiconductive particles formed from mixtures of different semiconductive materials; e.g., silicon carbide and at least one of the following materials: barium titanate, magnesium oxide, zinc oxide, and boron nitride.
In the EOS compositions according to the present invention, the insulating binder comprises from about 20 to about 60%, and preferably from about 25 to about 50%), by volume of the total composition. The conductive particles may comprise from about 5 to about 50%), and preferably from about 10 to about 45%>, by volume of the total composition. The semiconductive particles may comprise from about 2 to about 60%), and preferably from about 25 to about 50%), by volume of the total composition. According to another embodiment of the present invention, the EOS compositions further comprise insulative particles having an average particle size in a range of about 200 to about 1000 angstroms and bulk conductivities of less than 10"6 (ohm-cm)"1. An example of a suitable insulating particle is titanium dioxide having an average particle size from about 300 to about 400 angstroms produced by Nanophase Technologies. Other examples of suitable insulating particles include, oxides of iron, aluminum, zinc, titanium and copper and clay such as montmorillonite type produced by Nanocor, Inc. and marketed under the Nanomer tradename. The insulating particles, if employed in the composition, are preferably present in an amount from about 1 to about 15%>, by volume of the total composition. Through the use of a suitable insulating binder and conductive, semiconductive and insulating particles having the preferred particle sizes and volume percentages, compositions of the present invention generally can be tailored to provide a range of clamping voltages from about 30 volts to greater than 2,000 volts. Preferred embodiments of the present invention for circuit board level protection exhibit clamping voltages in a range of 100-200 volts, preferably less than 100 volts, more preferably less than 50 volts, and especially exhibit clamping voltages in a range of about 25 to about 50 volts.
A number of compositions have been prepared by mixing the components in a polymer compounding unit such as a Brabender or a Haake compounding unit.
Referring to FIG. 4, the compositions 100 were laminated into an electrode gap region 1 10 between electrodes 120, 130 and subsequently cured under heat and pressure. The response of the materials to: (1) a transmission line voltage pulse (TLP) approximately 65 nanoseconds in duration; and, (2) an IEC 1000-4-2 EOS current transient generated by a KeyTek Minizapper (MZ) have been measured. The package stray capacitance and inductance are minimized in devices constructed from these materials. Various gap widths were tested. The compositions and responses are set forth in Table 1.
Figure imgf000012_0001
CO c
CO CO
H
H
C H m
CO
X m > m w r
30 c r* m r
Figure imgf000012_0002
co c
CD CO
H C H m
CO x r m m
H
© c r m-
Figure imgf000013_0001
Figure imgf000013_0002
Figure imgf000014_0001
CO c
CD CO
H C H m r co w x m m o
H ©
E3 c r- m σ>
Figure imgf000014_0002
CO
C CD CO
H
H C H o x m r m
H o c o a 10
Figure imgf000015_0001
r
o o B
Figure imgf000016_0001
It can be seen from Examples 109s60 in Table 1 that the electrical performance of EOS devices can be tailored by the choice of gap width. For example, the clamping voltage of formulation can be increased by increasing the electrode gap spacing. In this case the performance also is modified so that the TLP voltage threshold (level required to switch the device to its on-state) is now at least 2000 V. These types of variations are useful for higher clamping voltage and/or higher energy applications.
While the specific embodiments have been illustrated and described, numerous modifications come to mind without significantly departing from the spirit of the invention and the scope of protection is only limited by the scope of the accompanying Claims.

Claims

CLAIMSWE CLAIM:
1. A composition for providing protection against electrical overstress, the composition comprising: an insulating binder; conductive particles having an average particle size of less than 10 microns; and semiconductive particles having an average particle size of less than 10 microns.
2. The composition of Claim 1, wherein a volume percentage of the insulating binder is in the range of about 20-60%), a volume percentage of the conductive particles is in the range of about 5-50% and a volume percentage of the semiconductive particles is in the range of about 2-60%).
3. The composition of Claim 1 , wherein the insulating binder comprises a material selected from the group consisting of thermoset polymers, thermoplastic polymers, elastomers, rubbers, or polymer blends.
4. The composition of Claim 1 , wherein the insulating binder is cross- linked.
5. The composition of 1 wherein the insulating binder comprises a silicone resin.
6. The composition of Claim 5, wherein the silicone is cross-linked with a peroxide curing agent.
7. The composition of Claim 1 , wherein the conductive particles comprise a material selected from the group consisting of nickel, carbon black, aluminum, silver, gold, copper and graphite, zinc, iron, stainless steel, tin, brass, and alloys thereof.
8. The composition of Claim 1, wherein the semiconductive particles comprise a material selected from the group consisting of oxides of bismuth, zinc, calcium, vanadium, iron, copper, magnesium and titanium; carbides of silicon, aluminum, chromium, molybdenum, titanium, beryllium, boron, tungsten and vanadium; nitrides of silicon, aluminum, beryllium, boron, tungsten and vanadium; sulfides of cadmium, zinc, lead, molybdenum and silver; titanates of barium and iron; borides of chromium, molybdenum, niobium and tungsten; and suicides of molybdenum and chromium.
9. The composition of Claim 1 , wherein the semiconductive particles comprise silicon carbide.
10. The composition of Claim 1 , wherein the composition has a clamping voltage of less than 100 volts.
1 1. The composition of Claim 1 , wherein the composition has a clamping voltage of less than 50 volts.
12. The composition of Claim 1, wherein the semiconductive particles are comprised of a first and a second semiconductive material, the first semiconductive material being different than the second semiconductive material.
13. The composition of Claim 12, wherein the semiconductive particles comprised of the first semiconductive material have an average particle size in the micron range and the semiconductive particles comprised of the second semiconductive material have an average particle size in the submicron range.
14. The composition of Claim 1, wherein the conductive particles have a bulk conductivity greater than 10 (ohm-cm)"' .
15. The composition of Claim 1 , wherein the semiconductive particles have a bulk conductivity in a range of 10 to 10"6 (ohm-cm)"1.
16. A composition for providing protection against electrical overstress, the composition comprising: an insulative binder; conductive particles having an average particle size of less than 10 microns; semiconductive particles having an average particle size of less than 10 microns; and insulative particles having an average particle size in a range of about 200 angstroms to about 1,000 angstroms.
17. The composition of Claim 16, wherein the insulative particles comprise a material selected from the group consisting of oxides of iron, titanium, aluminum, zinc and copper.
18. The composition of Claim 16, wherein the insulative particles comprise clay.
19. The composition of Claim 16, wherein the composition has a clamping voltage of less than 100 volts.
20. The composition of Claim 16, wherein the composition has a clamping voltage of less than 50 volts.
21. The composition of Claim 16, wherein the conductive particles have an average particle size in a range of about 4 to about 8 microns.
22. The composition of Claim 16, wherein the conductive particles have an average particle size less than 4 microns.
23. The composition of Claim 16, wherein the semiconductive particles have an average particle size less than 5 microns.
24. The composition of Claim 16, wherein the insulative particles have a bulk conductivity of less than 10"6 (ohm-cm)"1.
25. A device for protecting a circuit against electrical overstress, the device comprising the composition of Claim 1.
26. A device for protecting against electrical overstress, the device comprising a pair of electrodes electrically connected by a composition, the composition comprising: an insulating binder; conductive particles having an average particle size of less than 10 microns and a bulk conductivity of greater than 10 (ohm cm)"1; and semiconductive particles having an average particle size of less than 10 microns and a bulk conductivity in a range of 10 to 10"6 (ohm cm)"1.
27. A device for protecting against electrical overstress, the device comprising a pair of electrodes electrically connected by a composition, the composition comprising: an insulating binder; conductive particles having an average particle size of less than 10 microns and a bulk conductivity of greater than 10 (ohm cm)"1; semiconductive particles having an average particle size of less than 10 microns and a bulk conductivity in a range of 10 to 10"6 (ohm cm)"1; and insulative particles having an average particle size in a range of about 200 angstroms to about 1,000 angstroms and a bulk conductivity less than 10"6 (ohm cm) '.
PCT/US1998/023493 1997-11-08 1998-11-04 Polymer composites for overvoltage protection WO1999024992A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000519901A JP2001523040A (en) 1997-11-08 1998-11-04 Overvoltage protection polymer composition
AU14511/99A AU1451199A (en) 1997-11-08 1998-11-04 Polymer composites for overvoltage protection
DE19882807T DE19882807T1 (en) 1997-11-08 1998-11-04 Polymer composite materials to protect against overvoltage

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US6496397P 1997-11-08 1997-11-08
US09/136,507 1998-08-19
US09/136,507 US6251513B1 (en) 1997-11-08 1998-08-19 Polymer composites for overvoltage protection
US60/064,963 1998-08-19

Publications (1)

Publication Number Publication Date
WO1999024992A1 true WO1999024992A1 (en) 1999-05-20

Family

ID=26745083

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/023493 WO1999024992A1 (en) 1997-11-08 1998-11-04 Polymer composites for overvoltage protection

Country Status (5)

Country Link
US (1) US6251513B1 (en)
JP (1) JP2001523040A (en)
AU (1) AU1451199A (en)
DE (1) DE19882807T1 (en)
WO (1) WO1999024992A1 (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003001594A2 (en) * 2001-06-25 2003-01-03 eupec Europäische Gesellschaft für Leistungshalbleiter mbH High-voltage module and method for producing the same
US6549114B2 (en) 1998-08-20 2003-04-15 Littelfuse, Inc. Protection of electrical devices with voltage variable materials
WO2003032335A1 (en) * 2001-10-11 2003-04-17 Littelfuse, Inc. Voltage variable substrate material
WO2008016859A1 (en) 2006-07-29 2008-02-07 Shocking Technologies, Inc. Voltage switchable dielectric material having high aspect ratio particles
WO2010033635A1 (en) * 2008-09-17 2010-03-25 Shocking Technologies, Inc. Voltage switchable dielectric material containing boron compound
US7695644B2 (en) 1999-08-27 2010-04-13 Shocking Technologies, Inc. Device applications for voltage switchable dielectric material having high aspect ratio particles
US7793236B2 (en) 2007-06-13 2010-09-07 Shocking Technologies, Inc. System and method for including protective voltage switchable dielectric material in the design or simulation of substrate devices
US7825491B2 (en) 2005-11-22 2010-11-02 Shocking Technologies, Inc. Light-emitting device using voltage switchable dielectric material
US7968015B2 (en) 2006-07-29 2011-06-28 Shocking Technologies, Inc. Light-emitting diode device for voltage switchable dielectric material having high aspect ratio particles
US8117743B2 (en) 1999-08-27 2012-02-21 Shocking Technologies, Inc. Methods for fabricating current-carrying structures using voltage switchable dielectric materials
US8163595B2 (en) 2006-09-24 2012-04-24 Shocking Technologies, Inc. Formulations for voltage switchable dielectric materials having a stepped voltage response and methods for making the same
US8203421B2 (en) 2008-04-14 2012-06-19 Shocking Technologies, Inc. Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration
US8206614B2 (en) 2008-01-18 2012-06-26 Shocking Technologies, Inc. Voltage switchable dielectric material having bonded particle constituents
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8310064B2 (en) 2005-11-22 2012-11-13 Shocking Technologies, Inc. Semiconductor devices including voltage switchable materials for over-voltage protection
US8362871B2 (en) 2008-11-05 2013-01-29 Shocking Technologies, Inc. Geometric and electric field considerations for including transient protective material in substrate devices
US8399773B2 (en) 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8968606B2 (en) 2009-03-26 2015-03-03 Littelfuse, Inc. Components having voltage switchable dielectric materials
US9053844B2 (en) 2009-09-09 2015-06-09 Littelfuse, Inc. Geometric configuration or alignment of protective material in a gap structure for electrical devices
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
US9208930B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductive core shelled particles
US9208931B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductor-on-conductor core shelled particles
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US9320135B2 (en) 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446030B2 (en) * 1999-08-27 2008-11-04 Shocking Technologies, Inc. Methods for fabricating current-carrying structures using voltage switchable dielectric materials
JP2004507096A (en) * 2000-08-18 2004-03-04 シーメンス アクチエンゲゼルシヤフト Organic field effect transistor (OFET), method of manufacturing the organic field effect transistor, integrated circuit formed from the organic field effect transistor, and use of the integrated circuit
US7875975B2 (en) * 2000-08-18 2011-01-25 Polyic Gmbh & Co. Kg Organic integrated circuit completely encapsulated by multi-layered barrier and included in RFID tag
DE10043204A1 (en) * 2000-09-01 2002-04-04 Siemens Ag Organic field-effect transistor, method for structuring an OFET and integrated circuit
DE10044842A1 (en) * 2000-09-11 2002-04-04 Siemens Ag Organic rectifier, circuit, RFID tag and use of an organic rectifier
US6764975B1 (en) 2000-11-28 2004-07-20 Saint-Gobain Ceramics & Plastics, Inc. Method for making high thermal diffusivity boron nitride powders
DE10061297C2 (en) * 2000-12-08 2003-05-28 Siemens Ag Procedure for structuring an OFET
DE10061299A1 (en) * 2000-12-08 2002-06-27 Siemens Ag Device for determining and / or forwarding at least one environmental influence, production method and use thereof
DE10063721A1 (en) * 2000-12-20 2002-07-11 Merck Patent Gmbh Organic semiconductor, manufacturing process therefor and uses
DE10105914C1 (en) * 2001-02-09 2002-10-10 Siemens Ag Organic field effect transistor with photo-structured gate dielectric and a method for its production
JP2005509200A (en) * 2001-03-26 2005-04-07 シーメンス アクチエンゲゼルシヤフト Device having at least two organic electronic component elements and manufacturing method for the device
JP2004525242A (en) * 2001-04-30 2004-08-19 サンーゴバン セラミックス アンド プラスティクス,インコーポレイティド Polymer processing aid and polymer processing method
DE10126859A1 (en) * 2001-06-01 2002-12-12 Siemens Ag Production of conducting structures used in organic FETs, illuminated diodes, organic diodes and integrated circuits comprises directly or indirectly forming conducting pathways
DE10126860C2 (en) * 2001-06-01 2003-05-28 Siemens Ag Organic field effect transistor, process for its manufacture and use for the construction of integrated circuits
US6645612B2 (en) 2001-08-07 2003-11-11 Saint-Gobain Ceramics & Plastics, Inc. High solids hBN slurry, hBN paste, spherical hBN powder, and methods of making and using them
DE10151036A1 (en) * 2001-10-16 2003-05-08 Siemens Ag Isolator for an organic electronic component
DE10151440C1 (en) * 2001-10-18 2003-02-06 Siemens Ag Organic electronic component for implementing an encapsulated partially organic electronic component has components like a flexible foil as an antenna, a diode or capacitor and an organic transistor.
DE10160732A1 (en) * 2001-12-11 2003-06-26 Siemens Ag OFET used e.g. in RFID tag, comprises an intermediate layer on an active semiconductor layer
DE10212640B4 (en) * 2002-03-21 2004-02-05 Siemens Ag Logical components made of organic field effect transistors
WO2003088356A1 (en) * 2002-04-08 2003-10-23 Littelfuse, Inc. Voltage variable material for direct application and devices employing same
US7183891B2 (en) * 2002-04-08 2007-02-27 Littelfuse, Inc. Direct application voltage variable material, devices employing same and methods of manufacturing such devices
US7132922B2 (en) * 2002-04-08 2006-11-07 Littelfuse, Inc. Direct application voltage variable material, components thereof and devices employing same
DE10226370B4 (en) * 2002-06-13 2008-12-11 Polyic Gmbh & Co. Kg Substrate for an electronic component, use of the substrate, methods for increasing the charge carrier mobility and organic field effect transistor (OFET)
WO2004017439A2 (en) 2002-07-29 2004-02-26 Siemens Aktiengesellschaft Electronic component comprising predominantly organic functional materials and method for the production thereof
EP1526902B1 (en) * 2002-08-08 2008-05-21 PolyIC GmbH & Co. KG Electronic device
JP2005537637A (en) * 2002-08-23 2005-12-08 ジーメンス アクツィエンゲゼルシャフト Organic components and related circuits for overvoltage protection
US20060118778A1 (en) * 2002-11-05 2006-06-08 Wolfgang Clemens Organic electronic component with high-resolution structuring and method for the production thereof
DE10253154A1 (en) * 2002-11-14 2004-05-27 Siemens Ag Biosensor, used to identify analyte in liquid sample, has test field with detector, where detector registers field changes as electrical signals for evaluation
DE50306538D1 (en) * 2002-11-19 2007-03-29 Polyic Gmbh & Co Kg ORGANIC ELECTRONIC SWITCHING WITH A STRUCTURED SEMICONDUCTIVE FUNCTIONAL LAYER AND MANUFACTURING METHOD THEREFOR
US20060035423A1 (en) * 2002-11-19 2006-02-16 Walter Fix Organic electronic component comprising the same organic material for at least two functional layers
DE10300521A1 (en) * 2003-01-09 2004-07-22 Siemens Ag Organoresistive memory
DE10302149A1 (en) * 2003-01-21 2005-08-25 Siemens Ag Use of conductive carbon black / graphite blends for the production of low-cost electronics
EP1586127B1 (en) * 2003-01-21 2007-05-02 PolyIC GmbH & Co. KG Organic electronic component and method for producing organic electronic devices
DE10330062A1 (en) * 2003-07-03 2005-01-27 Siemens Ag Method and device for structuring organic layers
DE10330064B3 (en) * 2003-07-03 2004-12-09 Siemens Ag Organic logic gate has load field effect transistor with potential-free gate electrode in series with switching field effect transistor
DE10338277A1 (en) * 2003-08-20 2005-03-17 Siemens Ag Organic capacitor with voltage controlled capacity
US7494635B2 (en) * 2003-08-21 2009-02-24 Saint-Gobain Ceramics & Plastics, Inc. Boron nitride agglomerated powder
DE10339036A1 (en) 2003-08-25 2005-03-31 Siemens Ag Organic electronic component with high-resolution structuring and manufacturing method
DE10340644B4 (en) * 2003-09-03 2010-10-07 Polyic Gmbh & Co. Kg Mechanical controls for organic polymer electronics
DE10340643B4 (en) * 2003-09-03 2009-04-16 Polyic Gmbh & Co. Kg Printing method for producing a double layer for polymer electronics circuits, and thereby produced electronic component with double layer
US20050096418A1 (en) * 2003-10-31 2005-05-05 Baranek Todd M. High density metal oxide fillers in rubber compounds
DE102004002024A1 (en) * 2004-01-14 2005-08-11 Siemens Ag Self-aligning gate organic transistor and method of making the same
US7190058B2 (en) * 2004-04-01 2007-03-13 Chippac, Inc. Spacer die structure and method for attaching
DE102004040831A1 (en) * 2004-08-23 2006-03-09 Polyic Gmbh & Co. Kg Radio-tag compatible outer packaging
DE102004059465A1 (en) * 2004-12-10 2006-06-14 Polyic Gmbh & Co. Kg recognition system
DE102004059467A1 (en) * 2004-12-10 2006-07-20 Polyic Gmbh & Co. Kg Gate made of organic field effect transistors
DE102004059464A1 (en) * 2004-12-10 2006-06-29 Polyic Gmbh & Co. Kg Electronic component with modulator
DE102004063435A1 (en) 2004-12-23 2006-07-27 Polyic Gmbh & Co. Kg Organic rectifier
US20060152334A1 (en) * 2005-01-10 2006-07-13 Nathaniel Maercklein Electrostatic discharge protection for embedded components
US7593203B2 (en) * 2005-02-16 2009-09-22 Sanmina-Sci Corporation Selective deposition of embedded transient protection for printed circuit boards
DE102005009820A1 (en) * 2005-03-01 2006-09-07 Polyic Gmbh & Co. Kg Electronic assembly with organic logic switching elements
DE102005009819A1 (en) 2005-03-01 2006-09-07 Polyic Gmbh & Co. Kg electronics assembly
DE102005017655B4 (en) * 2005-04-15 2008-12-11 Polyic Gmbh & Co. Kg Multilayer composite body with electronic function
DE102005031448A1 (en) 2005-07-04 2007-01-11 Polyic Gmbh & Co. Kg Activatable optical layer
US7567416B2 (en) * 2005-07-21 2009-07-28 Cooper Technologies Company Transient voltage protection device, material, and manufacturing methods
DE102005035589A1 (en) 2005-07-29 2007-02-01 Polyic Gmbh & Co. Kg Manufacturing electronic component on surface of substrate where component has two overlapping function layers
DE102005035590A1 (en) * 2005-07-29 2007-02-01 Polyic Gmbh & Co. Kg Electronic component has flexible substrate and stack of layers including function layer on substratesurface
DE102005042166A1 (en) * 2005-09-06 2007-03-15 Polyic Gmbh & Co.Kg Organic device and such a comprehensive electrical circuit
WO2007032240A1 (en) * 2005-09-13 2007-03-22 Matsushita Electric Industrial Co., Ltd. Static electricity countermeasure component
DE102005044306A1 (en) 2005-09-16 2007-03-22 Polyic Gmbh & Co. Kg Electronic circuit and method for producing such
EP2070095B1 (en) * 2006-10-06 2011-07-27 ABB Research LTD Microvaristor-based powder overvoltage protection devices and a method for producing a powder therefor
JP4844673B2 (en) * 2007-06-22 2011-12-28 株式会社村田製作所 Method for manufacturing ESD protection element
US20090050856A1 (en) * 2007-08-20 2009-02-26 Lex Kosowsky Voltage switchable dielectric material incorporating modified high aspect ratio particles
TWI476790B (en) * 2008-03-06 2015-03-11 Polytronics Technology Corp Variable impendance material
US20090224213A1 (en) * 2008-03-06 2009-09-10 Polytronics Technology Corporation Variable impedance composition
US20090231763A1 (en) * 2008-03-12 2009-09-17 Polytronics Technology Corporation Over-voltage protection device
TWI378960B (en) * 2008-03-20 2012-12-11 Ind Tech Res Inst Organic/inorganic hybrid material of dielectric composition with electrostatic discharge protection property
JP5359587B2 (en) * 2008-07-24 2013-12-04 Tdk株式会社 Electrostatic countermeasure element
KR101234493B1 (en) 2008-10-10 2013-02-18 쇼와 덴코 가부시키가이샤 Electrostatic discharge protector
CN102460867B (en) 2009-06-17 2013-09-18 昭和电工株式会社 Discharge-gap-filling composition, and electrostatic discharge-protector
KR101415477B1 (en) * 2009-11-26 2014-07-04 가마야 덴끼 가부시끼가이샤 Paste for electrostatic protection, electrostatic protection component, and method for producing same
US8974706B2 (en) * 2009-12-14 2015-03-10 3M Innovative Properties Company Dielectric material with non-linear dielectric constant
JP5378589B2 (en) * 2010-02-25 2013-12-25 釜屋電機株式会社 Static electricity protection component and method for manufacturing the same
WO2012105515A1 (en) 2011-02-02 2012-08-09 昭和電工株式会社 Composition for filling discharging gap and electrostatic discharge protector
KR20140128025A (en) * 2013-04-26 2014-11-05 삼성전기주식회사 Esd protection material and esd protection device using the same
KR102042480B1 (en) * 2013-07-18 2019-11-08 엘지이노텍 주식회사 Light emitting device, and lighting system
KR20150044258A (en) * 2013-10-16 2015-04-24 삼성전기주식회사 Static-protective components and static-protective compositions
KR101994736B1 (en) * 2014-07-16 2019-07-01 삼성전기주식회사 Paste for electrostatic protection and their manufacturing method
KR102105401B1 (en) * 2015-01-29 2020-04-28 삼성전기주식회사 ESD Paste and Method of the Same
KR102445531B1 (en) * 2015-10-21 2022-09-21 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 Light emitting device
CN110235208B (en) 2017-01-31 2021-05-11 3M创新有限公司 Multilayer stress control article and dry termination for medium and high voltage cable applications
JP6480969B2 (en) * 2017-03-17 2019-03-13 株式会社鷺宮製作所 Pressure sensor
WO2018205092A1 (en) * 2017-05-08 2018-11-15 Dongguan Littelfuse Electronics Co., Ltd. Electrical transient material and method for making same
US11178800B2 (en) 2018-11-19 2021-11-16 Kemet Electronics Corporation Ceramic overvoltage protection device having low capacitance and improved durability
US11393635B2 (en) 2018-11-19 2022-07-19 Kemet Electronics Corporation Ceramic overvoltage protection device having low capacitance and improved durability

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294374A (en) * 1992-03-20 1994-03-15 Leviton Manufacturing Co., Inc. Electrical overstress materials and method of manufacture
WO1995033278A1 (en) * 1994-06-01 1995-12-07 Raychem Corporation Telecommunications gas tube apparatus and composition for use therewith
WO1996041355A1 (en) * 1995-06-07 1996-12-19 Raychem Corporation Electrically non-linear composition and device
WO1997021230A1 (en) * 1995-12-07 1997-06-12 Raychem Corporation Electrical device
US5669381A (en) * 1988-11-18 1997-09-23 G & H Technology, Inc. Electrical overstress pulse protection

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2273704A (en) 1935-10-10 1942-02-17 Bell Telephone Labor Inc Electrical conducting material
US3685026A (en) 1970-08-20 1972-08-15 Matsushita Electric Ind Co Ltd Process of switching an electric current
US3685028A (en) 1970-08-20 1972-08-15 Matsushita Electric Ind Co Ltd Process of memorizing an electric signal
GB1433129A (en) 1972-09-01 1976-04-22 Raychem Ltd Materials having non-linear resistance characteristics
US4359414A (en) 1972-12-22 1982-11-16 E. I. Du Pont De Nemours And Company Insulative composition for forming polymeric electric current regulating junctions
US3976811A (en) 1975-03-03 1976-08-24 General Electric Company Voltage responsive switches and methods of making
US4331948A (en) 1980-08-13 1982-05-25 Chomerics, Inc. High powered over-voltage protection
US4726991A (en) 1986-07-10 1988-02-23 Eos Technologies Inc. Electrical overstress protection material and process
US5068634A (en) 1988-01-11 1991-11-26 Electromer Corporation Overvoltage protection device and material
US4977357A (en) 1988-01-11 1990-12-11 Shrier Karen P Overvoltage protection device and material
US5476714A (en) 1988-11-18 1995-12-19 G & H Technology, Inc. Electrical overstress pulse protection
US5099380A (en) 1990-04-19 1992-03-24 Electromer Corporation Electrical connector with overvoltage protection feature
JPH0746235B2 (en) * 1990-06-04 1995-05-17 株式会社巴川製紙所 Conductive support
US5260848A (en) 1990-07-27 1993-11-09 Electromer Corporation Foldback switching material and devices
US5142263A (en) 1991-02-13 1992-08-25 Electromer Corporation Surface mount device with overvoltage protection feature
US5183698A (en) 1991-03-07 1993-02-02 G & H Technology, Inc. Electrical overstress pulse protection
US5189387A (en) 1991-07-11 1993-02-23 Electromer Corporation Surface mount device with foldback switching overvoltage protection feature
JPH05247255A (en) * 1991-10-28 1993-09-24 Bridgestone Corp Electroresponsive elastic body
US5248517A (en) 1991-11-15 1993-09-28 Electromer Corporation Paintable/coatable overvoltage protection material and devices made therefrom
US5246388A (en) 1992-06-30 1993-09-21 Amp Incorporated Electrical over stress device and connector
US5278535A (en) 1992-08-11 1994-01-11 G&H Technology, Inc. Electrical overstress pulse protection
US5262754A (en) 1992-09-23 1993-11-16 Electromer Corporation Overvoltage protection element
US5393597A (en) 1992-09-23 1995-02-28 The Whitaker Corporation Overvoltage protection element
US5340641A (en) 1993-02-01 1994-08-23 Antai Xu Electrical overstress pulse protection
ATE227881T1 (en) 1994-07-14 2002-11-15 Surgx Corp METHOD FOR PRODUCING SINGLE AND MULTI-LAYER PROTECTIVE DEVICES AGAINST VARIABLE VOLTAGE

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5669381A (en) * 1988-11-18 1997-09-23 G & H Technology, Inc. Electrical overstress pulse protection
US5294374A (en) * 1992-03-20 1994-03-15 Leviton Manufacturing Co., Inc. Electrical overstress materials and method of manufacture
WO1995033278A1 (en) * 1994-06-01 1995-12-07 Raychem Corporation Telecommunications gas tube apparatus and composition for use therewith
WO1996041355A1 (en) * 1995-06-07 1996-12-19 Raychem Corporation Electrically non-linear composition and device
WO1997021230A1 (en) * 1995-12-07 1997-06-12 Raychem Corporation Electrical device

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6549114B2 (en) 1998-08-20 2003-04-15 Littelfuse, Inc. Protection of electrical devices with voltage variable materials
US6693508B2 (en) 1998-08-20 2004-02-17 Littelfuse, Inc. Protection of electrical devices with voltage variable materials
US7695644B2 (en) 1999-08-27 2010-04-13 Shocking Technologies, Inc. Device applications for voltage switchable dielectric material having high aspect ratio particles
US9144151B2 (en) 1999-08-27 2015-09-22 Littelfuse, Inc. Current-carrying structures fabricated using voltage switchable dielectric materials
US8117743B2 (en) 1999-08-27 2012-02-21 Shocking Technologies, Inc. Methods for fabricating current-carrying structures using voltage switchable dielectric materials
US7407836B2 (en) 2001-06-25 2008-08-05 Infineon Technologies Ag High-voltage module and method for producing same
WO2003001594A2 (en) * 2001-06-25 2003-01-03 eupec Europäische Gesellschaft für Leistungshalbleiter mbH High-voltage module and method for producing the same
US7078795B2 (en) 2001-06-25 2006-07-18 Eupec Europaische Gesellschaft Fur Leistungshalbleiter Gmbh & Co. Kg High voltage module and method for producing same
WO2003001594A3 (en) * 2001-06-25 2003-11-06 Eupec Gmbh & Co Kg High-voltage module and method for producing the same
WO2003032335A1 (en) * 2001-10-11 2003-04-17 Littelfuse, Inc. Voltage variable substrate material
US7258819B2 (en) 2001-10-11 2007-08-21 Littelfuse, Inc. Voltage variable substrate material
US7825491B2 (en) 2005-11-22 2010-11-02 Shocking Technologies, Inc. Light-emitting device using voltage switchable dielectric material
US8310064B2 (en) 2005-11-22 2012-11-13 Shocking Technologies, Inc. Semiconductor devices including voltage switchable materials for over-voltage protection
EP2437271A3 (en) * 2006-07-29 2013-05-01 Shocking Technologies, Inc. Voltage switchable dielectric material having conductive or semi-conductive organic material
US7968015B2 (en) 2006-07-29 2011-06-28 Shocking Technologies, Inc. Light-emitting diode device for voltage switchable dielectric material having high aspect ratio particles
US7968010B2 (en) 2006-07-29 2011-06-28 Shocking Technologies, Inc. Method for electroplating a substrate
US7968014B2 (en) 2006-07-29 2011-06-28 Shocking Technologies, Inc. Device applications for voltage switchable dielectric material having high aspect ratio particles
US7981325B2 (en) 2006-07-29 2011-07-19 Shocking Technologies, Inc. Electronic device for voltage switchable dielectric material having high aspect ratio particles
WO2008016859A1 (en) 2006-07-29 2008-02-07 Shocking Technologies, Inc. Voltage switchable dielectric material having high aspect ratio particles
WO2008016858A1 (en) * 2006-07-29 2008-02-07 Shocking Technologies Inc Voltage switchable dielectric material having conductive or semi-conductive organic material
EP2418657A3 (en) * 2006-07-29 2013-05-01 Shocking Technologies, Inc. Voltage Switchable dielectric material having high aspect ratio particles
US8163595B2 (en) 2006-09-24 2012-04-24 Shocking Technologies, Inc. Formulations for voltage switchable dielectric materials having a stepped voltage response and methods for making the same
US7793236B2 (en) 2007-06-13 2010-09-07 Shocking Technologies, Inc. System and method for including protective voltage switchable dielectric material in the design or simulation of substrate devices
US8206614B2 (en) 2008-01-18 2012-06-26 Shocking Technologies, Inc. Voltage switchable dielectric material having bonded particle constituents
US8203421B2 (en) 2008-04-14 2012-06-19 Shocking Technologies, Inc. Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration
WO2010033635A1 (en) * 2008-09-17 2010-03-25 Shocking Technologies, Inc. Voltage switchable dielectric material containing boron compound
US9208930B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductive core shelled particles
US9208931B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductor-on-conductor core shelled particles
US8362871B2 (en) 2008-11-05 2013-01-29 Shocking Technologies, Inc. Geometric and electric field considerations for including transient protective material in substrate devices
US8399773B2 (en) 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
US8968606B2 (en) 2009-03-26 2015-03-03 Littelfuse, Inc. Components having voltage switchable dielectric materials
US9053844B2 (en) 2009-09-09 2015-06-09 Littelfuse, Inc. Geometric configuration or alignment of protective material in a gap structure for electrical devices
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US9320135B2 (en) 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components

Also Published As

Publication number Publication date
AU1451199A (en) 1999-05-31
DE19882807T1 (en) 2001-05-10
JP2001523040A (en) 2001-11-20
US6251513B1 (en) 2001-06-26

Similar Documents

Publication Publication Date Title
US6251513B1 (en) Polymer composites for overvoltage protection
US6642297B1 (en) Polymer composite materials for electrostatic discharge protection
US7034652B2 (en) Electrostatic discharge multifunction resistor
US5189387A (en) Surface mount device with foldback switching overvoltage protection feature
US5260848A (en) Foldback switching material and devices
JP2755752B2 (en) Nonlinear material and overvoltage protection device using the same
US5142263A (en) Surface mount device with overvoltage protection feature
US6628498B2 (en) Integrated electrostatic discharge and overcurrent device
US5068634A (en) Overvoltage protection device and material
US6211554B1 (en) Protection of an integrated circuit with voltage variable materials
US4726991A (en) Electrical overstress protection material and process
JP4902944B2 (en) Voltage variable material for direct application and device using voltage variable material
US5669381A (en) Electrical overstress pulse protection
KR101293400B1 (en) Circuit protection device having thermally coupled mov overvoltage element and pptc overcurrent element
CA1331399C (en) Assemblies of ptc circuit protection devices
US7035072B2 (en) Electrostatic discharge apparatus for network devices
CA1125438A (en) Protective electrical discharge device
TW200939257A (en) Variable impendance material
JP2016157896A (en) Overvoltage protection component and overvoltage protection material for overvoltage protection component
AU613450B2 (en) Overvoltage protection device and material

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GD GE GH GM HR HU ID IL IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
ENP Entry into the national phase

Ref document number: 2000 519901

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: KR

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: CA

RET De translation (de og part 6b)

Ref document number: 19882807

Country of ref document: DE

Date of ref document: 20010510

WWE Wipo information: entry into national phase

Ref document number: 19882807

Country of ref document: DE

REG Reference to national code

Ref country code: DE

Ref legal event code: 8607