WO1999012190A2 - Sealed capsule opening and unloading system - Google Patents

Sealed capsule opening and unloading system Download PDF

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Publication number
WO1999012190A2
WO1999012190A2 PCT/US1998/018394 US9818394W WO9912190A2 WO 1999012190 A2 WO1999012190 A2 WO 1999012190A2 US 9818394 W US9818394 W US 9818394W WO 9912190 A2 WO9912190 A2 WO 9912190A2
Authority
WO
WIPO (PCT)
Prior art keywords
capsule
door
load
sealed
wafers
Prior art date
Application number
PCT/US1998/018394
Other languages
French (fr)
Other versions
WO1999012190A3 (en
Inventor
George E. Niemirowski
John M. Harrell
P. V. Pateh
Original Assignee
Novus Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Novus Corporation filed Critical Novus Corporation
Publication of WO1999012190A2 publication Critical patent/WO1999012190A2/en
Publication of WO1999012190A3 publication Critical patent/WO1999012190A3/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Definitions

  • the present invention relates generally to semiconductor wafer
  • the invention relates to an opening
  • Semiconductor wafer production typically involves the handling of
  • capsules are usually standardized devices used in the
  • Wafer fabrication requires extremely clean working environments
  • the wafers are exposed to the
  • the wafers are subject to potential particulate and
  • vents and associated valves typically include a complex arrangements of vents and associated valves.
  • Contaminants are purged from the capsule by selectively opening the
  • valves to introduce nitrogen in one vent and to remove it by applying
  • a primary object of the invention is to provide a sealed capsule
  • Another object of the invention is to provide a system for purging
  • a further object of the invention is to provide a sealed capsule
  • the mechanism having a load door.
  • the capsule is positioned adjacent the
  • FIGURE 1 is a front perspective view of a sealed capsule opening
  • FIGURE 2 is a rear perspective view of the FIGURE 1 apparatus
  • FIGURE 3 is a front perspective view of a sealed capsule opening
  • FIGURE 4 is a rear perspective view of the inventive apparatus
  • FIGURE 5 is a top view of the inventive apparatus illustrating
  • FIGURE 6 is front view of the capsule door opening mechanism in
  • FIGURE 7 is a top view of the door opening mechanism .
  • FIGURES 1 and 2 Prior art is shown in FIGURES 1 and 2.
  • the apparatus 10 is typically
  • a wafer processing facility located between different areas of a wafer processing facility, e.g.,
  • FIG.URE 2 shows the reverse or capsule side of the apparatus 1 0.
  • the apparatus 1 0 is to transfer wafers between rooms (or areas)
  • a sealed capsule 1 2 containing a plurality of wafers 14 is
  • the apparatus 1 0 includes a hinged
  • the load door 24 is mounted at the
  • robotic loading arms (not shown) can be used to remove the wafers 14
  • Such capsules typically include a complex
  • FIGURES 3-6 illustrate an inventive apparatus 1 00 for opening
  • FIGURES 3 and 4 illustrate front and
  • the apparatus 1 00 will ordinarily be located between different areas
  • the apparatus 1 00 may be located to transfer wafers from a clean room processing area to a
  • Class 1 clean room having a nitrogen environment and suitable tools
  • the apparatus 100 includes a frame 102 containing a conventional
  • platform 104 for supporting the capsule 106 extends outwardly from the
  • platform 104 includes a movable carriage 108 therein.
  • the front side of the apparatus 100 shown in FIGURE 3 includes a
  • a load door 114 (shown in FIGURE 5) is
  • a sealed capsule or cassette 106 containing wafers 111 is
  • Pins 116 on the platform 104 are preferably
  • the capsule 106 is preferably locked to the carriage 108 by means
  • the capsule 106 is moved by the carriage 108
  • the seal 122 extends
  • the present invention accomplishes purging with greater
  • the capsule door 1 26 is partially opened to allow the interior of the capsule door 1 26
  • capsule 1 06 to be purged, e.g., with a nitrogen gas.
  • a nitrogen gas e.g., a nitrogen gas.
  • Nitrogen is preferred, however, given the nitrogen environment
  • chamber member 1 1 0 is then lowered out of the way, thereby exposing
  • FIG. 5 shows the capsule door 1 26 is its partially-opened state
  • outlet ports 1 30, 1 32 of the purging system are open to the interior of
  • FIGURES 5-7 show how the capsule door 1 26 is locked, partially
  • load door 1 1 4 is activated (moved left to right in FIGURE 6) to lock the
  • cam follower 140 moves linearly by a
  • FIGURE 5 Such movement occurs via guide rails 140. Then the purging
  • transfer chamber member 1 1 0 is then lowered out of the way so a robot

Abstract

A system is provided for transferring a semiconductor wafer (111) supported in a sealed capsule (106) from a first stored position to a second working position using an opening mechanism having a load door (114). The capsule (106) is positioned adjacent the load door (114) to form a sealed environment between the capsule (106) and the opening mechanism. The load door (114) is then locked to the capsule door (126). Next, the load door (114) and the capsule door (126) are moved a predetermined distance while retaining the sealed environment between the opening mechanism and the capsule (106). Thereafter, the capsule (106) is purged with a gas. The load door (114) and the capsule door (126) are then moved a further distance to open the capsule (106), allowing the semiconductor wafer (111) to be retrieved.

Description

SEALED CAPSULE OPENING AND UNLOADING SYSTEM
BACKGROUND OF THE INVENTION
Technical Field
The present invention relates generally to semiconductor wafer
fabrication and, more particularly, to methods and apparatus for
transferring wafers between various processing locations during
fabrication. Even more specifically, the invention relates to an opening
and unloading system for sealed capsules or cassettes containing wafers.
Description of the Related Art
Semiconductor wafer production typically involves the handling of
cassettes or capsules containing batches of semiconductor wafers.
These capsules are usually standardized devices used in the
semiconductor manufacturing industry for holding and moving
semiconductor wafers among different machining processes or locations.
Wafer fabrication requires extremely clean working environments
because contamination ordinarily results in costly production loss.
A problem associated with prior art sealed capsule handling
systems is that wafer contamination has been known to occur when
sealed capsules containing wafers are opened by the capsule handling
equipment to allow the wafers to be unloaded for some processing.
During the capsule opening process, the wafers are exposed to the
handling equipment, which ordinarily includes lubricated mechanical
elements. As a result, the wafers are subject to potential particulate and
gaseous contamination. To address this problem, it is known in the prior art to purge
contaminants in a semiconductor capsule prior to transfer of the capsule
and the wafers from one part of the wafer processing facility to another
(e.g., from an opening/unloading station in one area of the facility to a
robot assembly within a Class I clean room area) . Such capsules
typically include a complex arrangements of vents and associated valves.
Contaminants are purged from the capsule by selectively opening the
valves to introduce nitrogen in one vent and to remove it by applying
suction at the second vent. Different capsule manufacturers have
different venting arrangements. This approach requires specialized and
costly capsule construction, and it has not provided acceptable results.
Thus, a need exists for a sealed capsule opening and unloading
system that effectively purges the capsule of contaminants and that
reduces exposure of the wafers to contamination from the capsule
handling system.
BRIEF SUMMARY OF THE INVENTION
A primary object of the invention is to provide a sealed capsule
opening and unloading system that effectively purges the interior of the
capsule of contaminants prior to wafer removal from the capsule.
Another object of the invention is to provide a system for purging
the interior of a capsule that does not require specialized capsule
construction. A further object of the invention is to provide a sealed capsule
opening and unloading system that greatly reduces potential
contamination of wafers removed from the capsule.
These and other objects are accomplished by an inventive system
for transferring semiconductor wafers supported in a sealed capsule from
a first stored position to a second working position using an opening
mechanism having a load door. The capsule is positioned adjacent the
load door and a sealed environment is formed between the capsule and
the opening mechanism. The load door is then locked to the capsule
door. Next, the load door and the capsule door are moved a
predetermined distance to an intermediate position while retaining the
sealed environment between the opening mechanism and the capsule.
Thereafter, the capsule is purged with a gas. The load door and the
capsule door are then moved a further distance to open the capsule,
allowing the semiconductor wafers to be retrieved.
The foregoing has outlined some of the more pertinent objects and
features of the present invention. These objects should be construed to
be merely illustrative of some of the more prominent features and
applications of the invention. Many other beneficial results can be
attained by applying the disclosed invention in a different manner or
modifying the invention as will be described. Accordingly, other objects
and a fuller understanding of the invention may be had by referring to the
following Detailed Description of the Preferred Embodiment. BRIEF DESCRIPTION OF THE DRAWINGS
For a more complete understanding of the present invention and
the advantages thereof, reference should be made to the following
Detailed Description taken in connection with the accompanying
drawings, in which:
FIGURE 1 is a front perspective view of a sealed capsule opening
and unloading apparatus in accordance with the prior art;
FIGURE 2 is a rear perspective view of the FIGURE 1 apparatus;
FIGURE 3 is a front perspective view of a sealed capsule opening
and unloading apparatus in accordance with the present invention;
FIGURE 4 is a rear perspective view of the inventive apparatus;
FIGURE 5 is a top view of the inventive apparatus illustrating
purging of the capsule;
FIGURE 6 is front view of the capsule door opening mechanism in
the inventive apparatus; and
FIGURE 7 is a top view of the door opening mechanism .
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
A sealed capsule opening apparatus 1 0 in accordance with the
prior art is shown in FIGURES 1 and 2. The apparatus 10 is typically
located between different areas of a wafer processing facility, e.g.,
between a tool side Class 1 clean room and another processing area or
room such as a less stringent clean room. In FIGURE 1 , the less
stringent clean room is located behind the apparatus 1 0 and the Class 1
clean room into which the wafers are to be unloaded for further processing (e.g., by a robot apparatus) is in front of the apparatus 1 0.
(FIGURE 2 shows the reverse or capsule side of the apparatus 1 0.) The
goal of the apparatus 1 0 is to transfer wafers between rooms (or areas)
and limit contamination in the process.
In use, a sealed capsule 1 2 containing a plurality of wafers 14 is
placed on a movable carriage 1 6 on the apparatus 1 0. Pins 1 8 help
properly locate the capsule 1 2 on the carriage 1 6. A locking lug 20 on
the carriage 1 8 rotates to engage a slot on the bottom of the capsule 1 2,
locking it in position on the carriage 1 6. The movable carriage 1 6 is then
moved in the direction indicated by arrow 22 to a location just below a
load door 24 in the apparatus 1 0 such that the capsule door 26 contacts
the apparatus load door 24 with pads 28 on the capsule door 26 aligned
with vacuum ports 30 on the load door 24. The capsule door 26 is then
unlatched from the capsule 1 2 by lugs 32 on the load door 24 acting on
corresponding locks 34 on the capsule door 26.
As shown in FIGURE 1 , the apparatus 1 0 includes a hinged
assembly 36 pivotally mounted on a port frame 40. The hinged assembly
36 is hinged about a pivot pin 38. The load door 24 is mounted at the
upper portion 42 of the assembly 36. The capsule door 26, which is
held by vacuum to the load door 24, is pulled away from the rest of the
capsule 1 2 as the hinged assembly 36 is swung about the pin 38 away
from the port frame 40 to a retracted position indicated in phantom by
36a. Thereafter, the upper portion 42a of the hinged assembly 36,
which includes the load door 24 having the capsule door 26 attached thereto, is lowered by means of telescoping members 46 into a position
indicated by 42b. The capsule 1 2 is now open and the wafers 1 4 therein
are accessible from the interior side of the port frame 40. Thereafter,
robotic loading arms (not shown) can be used to remove the wafers 14
from the open capsule 1 2.
These steps are reversed to reload the wafers 1 4 into the capsule
1 2 to reseal the capsule 1 2 for removal from the apparatus 1 0.
As discussed, it is known in the prior art to purge contaminants in
the capsule 1 2 prior to transfer of wafers 1 4 to the tool side of the
fabrication facility. Such capsules typically include a complex
arrangement of vents and associated valves (not shown) . Contaminants
are purged from the capsule 1 2 by selectively opening the valves and
introducing nitrogen in one vent and removing it by applying suction at
the second vent. Different capsule manufacturers have different venting
arrangements. This approach requires specialized and costly capsule
construction and has not been found to provide suitable results. In
particular, when the capsule 1 2 is opened, the wafers 1 4 are exposed to
potential contamination from the lubricated mechanical elements of the
apparatus (e.g., the telescoping members 46) .
FIGURES 3-6 illustrate an inventive apparatus 1 00 for opening and
unloading sealed wafer capsules. FIGURES 3 and 4 illustrate front and
rear sides of the apparatus, respectively. As with the prior art apparatus
1 0, the apparatus 1 00 will ordinarily be located between different areas
or rooms of a wafer fabrication facility. For example, the apparatus 1 00 may be located to transfer wafers from a clean room processing area to a
Class 1 clean room having a nitrogen environment and suitable tools
(e.g., a robot apparatus for removing the wafers from the capsule for
subsequent processing).
The apparatus 100 includes a frame 102 containing a conventional
purging system described in detail below with respect to FIGURE 5 . A
platform 104 for supporting the capsule 106 extends outwardly from the
frame 102 on the rear or capsule side of the apparatus 100. The
platform 104 includes a movable carriage 108 therein.
The front side of the apparatus 100 shown in FIGURE 3 includes a
transfer chamber member 110 and a mechanism 112 to lower the
transfer chamber 110 as will be described in detail below. The movable
parts of the mechanism 112 are sealed as shown in the drawing to
ensure against contamination. A load door 114 (shown in FIGURE 5) is
located adjacent to the transfer chamber member 110.
In use, a sealed capsule or cassette 106 containing wafers 111 is
placed on the platform 104. Pins 116 on the platform 104 are preferably
used to help properly locate the capsule 106 on the movable carriage
108. The capsule 106 is preferably locked to the carriage 108 by means
of a locking lug 120. The capsule 106 is moved by the carriage 108
toward the load door 114, and a seal 122 is provided between the outer
flange 124 of the capsule 106 and the frame 102. The seal 122 extends
around the periphery of the capsule door 126. Next, the interior of the capsule 1 06 is purged, preferably with
nitrogen gas. The present invention accomplishes purging with greater
efficiently and without requiring that the capsule 1 06 have special purge
vents. Briefly, the load door 1 1 4 of the apparatus 1 00 is locked against
the capsule door 1 26 such that these doors may move together. Then,
the capsule door 1 26 is partially opened to allow the interior of the
capsule 1 06 to be purged, e.g., with a nitrogen gas. The particular gas
used to purge the capsule (and the transfer mechanism) is not an aspect
of the present invention and any suitable gas can be used for this
purpose. Nitrogen is preferred, however, given the nitrogen environment
of the tool side clean room area. After purging occurs, the load door
(together with the attached capsule door) is fully retracted into the
chamber 1 28 of the transfer chamber member 1 1 0. The transfer
chamber member 1 1 0 is then lowered out of the way, thereby exposing
the interior of the capsule and allowing the wafers in the capsule 1 06 to
be accessed (e.g., using a robot arm assembly situated on the tool side) .
Figure 5 shows the capsule door 1 26 is its partially-opened state,
i.e., in an intermediate position. When in this position, the inlet and
outlet ports 1 30, 1 32 of the purging system are open to the interior of
the capsule 1 06 to allow purging. Note that the seal 1 22 between the
capsule 1 06 and the frame 1 02 prevents leakage of the purging gas.
FIGURES 5-7 show how the capsule door 1 26 is locked, partially
opened (in the intermediate position), and then fully retracted. Element
1 34 of the load door 1 14 (shown in FIGURE 6) mates with a corresponding slot in the capsule door 1 26. Then, a linkage 1 36 in the
load door 1 1 4 is activated (moved left to right in FIGURE 6) to lock the
capsule door 1 26 to the load door 1 1 4. Cam 1 38 in the load door 1 1 4
rotates 90 degrees, causing cam follower 140 to move linearly by a
predetermined distance. This causes the load door 1 1 4 (with the capsule
door 1 26 locked thereto) to move into the intermediate position shown in
FIGURE 5. Such movement occurs via guide rails 140. Then the purging
takes place as shown in FIGURE 5 with the nitrogen introduced through
the inlet port 1 30 and removed under suction through the outlet port
1 32. Thereafter, the cam 1 38 is rotated another 90 degrees, causing the
load door 1 1 4 (with the capsule door 1 26 locked thereto) to continue
moving back into the chamber 1 28 of the transfer chamber member 1 1 0.
Thereafter, the mechanism 1 1 2 is used to move the transfer chamber
member 1 1 0, opening seal 1 44 (shown in FIGURE 5) which exists
between the frame 1 02 and the transfer chamber member 1 1 0. The
transfer chamber member 1 1 0 is then lowered out of the way so a robot
arm (not shown) can remove the wafers 1 1 1 in the capsule 1 06.
One of ordinary skill will appreciate that the frame 1 02 is smaller
than the corresponding frame in known prior art systems because of the
more compact mechanism 1 1 2.
Having thus described our invention, what we claim as new and
desire to secure by Letters Patent is set forth in the following claims.

Claims

1 . A method of transferring a semiconductor wafer supported in a
sealed capsule from a first stored position to a second working position
using an opening mechanism having a load door, the capsule having a
capsule door, comprising the steps of:
(a) positioning the capsule adjacent the load door to form a sealed
environment between the capsule and the opening mechanism;
(b) locking the load door to the capsule door;
(c) moving the load door and the capsule door a predetermined
distance while retaining a sealed environment between the opening
mechanism and the capsule;
(d) purging the capsule with a gas;
(e) moving the load door and the capsule door a further distance to
expose the wafer; and
(f) retrieving the semiconductor wafer.
2. The method of Claim 1 further including the step of lowering
the load door and the capsule door away from the capsule after step (e) .
3. An apparatus for opening a sealed capsule containing wafers,
the capsule having a capsule door, comprising:
means for providing a seal between the capsule and the apparatus
around the capsule door; means for moving the capsule door to an intermediate position while
maintaining a sealed environment between the capsule and the apparatus;
means for purging the capsule while the capsule door is in said
intermediate position; and
means for then moving the capsule door to an opened position to
enable access to the wafers in the capsule.
PCT/US1998/018394 1997-09-03 1998-09-03 Sealed capsule opening and unloading system WO1999012190A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5631797P 1997-09-03 1997-09-03
US60/056,317 1997-09-03

Publications (2)

Publication Number Publication Date
WO1999012190A2 true WO1999012190A2 (en) 1999-03-11
WO1999012190A3 WO1999012190A3 (en) 2001-12-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/018394 WO1999012190A2 (en) 1997-09-03 1998-09-03 Sealed capsule opening and unloading system

Country Status (1)

Country Link
WO (1) WO1999012190A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000059004A1 (en) * 1999-03-26 2000-10-05 Asm America, Inc. Multi-stage single-drive foup door opening system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5433574A (en) * 1992-05-21 1995-07-18 Shinko Electric Co., Ltd. Gas purge unit for a portable container
US5607276A (en) * 1995-07-06 1997-03-04 Brooks Automation, Inc. Batchloader for substrate carrier on load lock
US5730573A (en) * 1994-02-22 1998-03-24 Tdk Corporation Clean transfer method and apparatus therefor
US6158946A (en) * 1996-04-24 2000-12-12 Tokyo Electron Limited Positioning apparatus for substrates to be processed

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5433574A (en) * 1992-05-21 1995-07-18 Shinko Electric Co., Ltd. Gas purge unit for a portable container
US5730573A (en) * 1994-02-22 1998-03-24 Tdk Corporation Clean transfer method and apparatus therefor
US5607276A (en) * 1995-07-06 1997-03-04 Brooks Automation, Inc. Batchloader for substrate carrier on load lock
US6158946A (en) * 1996-04-24 2000-12-12 Tokyo Electron Limited Positioning apparatus for substrates to be processed

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000059004A1 (en) * 1999-03-26 2000-10-05 Asm America, Inc. Multi-stage single-drive foup door opening system

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Publication number Publication date
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