WO1998018156A1 - Substrate treatment device - Google Patents

Substrate treatment device Download PDF

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Publication number
WO1998018156A1
WO1998018156A1 PCT/EP1997/005413 EP9705413W WO9818156A1 WO 1998018156 A1 WO1998018156 A1 WO 1998018156A1 EP 9705413 W EP9705413 W EP 9705413W WO 9818156 A1 WO9818156 A1 WO 9818156A1
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WO
WIPO (PCT)
Prior art keywords
substrate holder
treatment fluid
substrates
container
area
Prior art date
Application number
PCT/EP1997/005413
Other languages
German (de)
French (fr)
Inventor
John Oshinowo
Original Assignee
Steag Microtech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Microtech Gmbh filed Critical Steag Microtech Gmbh
Publication of WO1998018156A1 publication Critical patent/WO1998018156A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/10Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Definitions

  • the invention relates to a device for treating substrates in a container containing a treatment fluid, into which the treatment fluid flows from below, and the substrates are arranged on at least one substrate holder designed as a web.
  • Such devices are used in particular in the treatment of wafers and are known, for example, from DE 44 13 077 AI, DE 195 46 990.9 AI, which goes back to the applicant of the present patent, and also in the unpublished German patent applications DE 196 16 402.8, DE 196 15 969.5 or
  • JP 8-64572 A2 and US 5 370 142 devices for treating substrates are known, in which the treatment fluid is introduced via openings on holder elements which are provided for holding the substrates in the fluid container.
  • a device for wet cleaning of afer is also known, in which the afer are arranged in a cassette which is inserted into the fluid container.
  • Flow control devices in the form of plates projecting transversely into the fluid container are provided on the side walls of the fluid container in order to guide the treatment fluid introduced from above via a pipe and guided onto the container bottom into the cassette and thus to the wafers to be treated.
  • wafer treatment devices are known in which ultrasound is used to improve the treatment process in the fluid container.
  • the invention has for its object to provide a device in which the flow conditions in the container over the entire container cross-section and in particular also in the area of the substrate holder are as uniform as possible in order to be able to treat the substrates regardless of their position in the container and all substrate areas uniformly.
  • the object is achieved according to the invention in that guide elements are provided which guide the treatment fluid in or around the area of the substrate holder.
  • guide elements are provided which guide the treatment fluid in or around the area of the substrate holder.
  • the treatment fluid flowing into the container from below is guided with corresponding guide elements, for example guide plates, in the region of the substrate holder in such a way that even flow conditions also occur in these regions.
  • Another alternative or additional embodiment of the invention consists in providing in the area or in the vicinity of the substrate holder inlet nozzles in the tank bottom which introduce the treatment fluid into the tank area above the substrate holder. This results in even flow conditions in or above the substrate holder area.
  • the substrate holder has outlet openings.
  • the treatment fluid is introduced directly in the area of the substrate support onto the substrate holder and thereby additionally improves the flow conditions in the area and above the substrate holder.
  • At least one channel connected to a treatment fluid supply line is formed in the substrate holder.
  • the outlet openings are connected to the channel, so that uniform outflow and thus flow conditions in the container are ensured over the entire length of the substrate holder.
  • the channel cross-sectional area decreases from the supply point of the treatment fluid to the channel end of the substrate holder.
  • a conical tube is advantageously used as the channel.
  • the treatment fluid can be introduced into the substrate holder from the underside thereof. The treatment fluid is introduced into the substrate holder at one or more points or over the entire length of the substrate holder, and is guided upwards to the outlet openings via fluid guides.
  • the outlet openings are preferably holes, slots and / or nozzles depending on the type of treatment fluid, the type of substrate holder or the flow conditions, in order to match the flow conditions in the area of the substrate holder as evenly as possible to those in the other area of the container.
  • the substrate holder is a knife-like web, as is used in the publications mentioned at the beginning, edge regions of the substrates resting on the knife-like web.
  • the substrate holder in such a way that it has at least one holding region which is adapted to the edge shape of the substrates, as is shown and described, for example, in the unpublished DE 196 40 848.2, in particular also rectangular or square wafers in the fluid container to hold securely and reliably.
  • the knife-like webs usually have incisions evenly spaced along their length for holding the substrates at equidistant intervals.
  • the mounting areas matched to the edge shape of the substrates have equally spaced grooves in which the substrate edges lie.
  • outlet openings are provided between the regions of the substrate holder on which the edges of the substrates rest.
  • the substrate holders are preferably movable in the vertical direction in order to lower the substrates into the container and lift them out of the container.
  • the treatment fluid is preferably at least one chemical liquid, in particular a rinsing liquid.
  • at least one gas for example ozone, as the treatment fluid.
  • the ultrasound source should be arranged in the substrate holder in such a way that, in particular in the case of containers made of plastic, as far as possible no sound reaches the bottom wall in the vicinity of the ultrasound source and in order to prevent the floor from heating up.
  • the use of ultrasound sources supports and significantly shortens the cleaning process of the substrates during the rinsing process.
  • the substrate holder has, alternatively or also cumulatively, outlet openings for the treatment fluid, guide elements for the treatment fluid and / or ultrasound sources.
  • substrates is not only to be understood as wafers, but also a wide variety of objects, the surfaces of which must be treated and / or cleaned, so that the term substrates in particular includes semiconductor wafers, CD's, masks, LED display devices etc.
  • Figure 1 is a schematic representation of a substrate holder designed as a knife-like web with an integrated channel in a perspective view.
  • FIG. 2 shows a reduced, schematic cross section through the substrate holder shown in FIG. 1;
  • Fig. 3 is a schematic cross-sectional view of a
  • Substrate holder in which the treatment fluid is introduced into the substrate holder from below and is guided upward in the substrate holder to the outlet openings;
  • FIG. 4 shows a schematic cross-sectional illustration of an embodiment in which guide elements for the treatment fluid are provided around the substrate holder
  • FIG. 5 shows a schematic cross-sectional illustration of an embodiment in which the substrate holder has ultrasound sources in addition to outlet openings.
  • Fig. 1 shows a substrate holder 1, which is designed as a knife-like web is. 1 with its lower region in a shaft or in a trough 2 of the bottom 3 of a container 4, and thus in a position in which substrates 5 'for treatment are located in the container 4.
  • the substrates 5 are held parallel to one another on a knife-like edge 6 of the substrate holder 1.
  • the knife edge 6 can have notches which are evenly spaced from one another for receiving and for equidistantly holding the substrates 5.
  • a channel 8 extends in its longitudinal direction over its length.
  • the position, the width or the number of the slots 9, 10, 11 can be selected depending on the special circumstances in order to achieve optimal and, in particular, uniform flow conditions for the treatment fluid in the container 4 in the region of the substrate holder 1 and thereby the substrates 5 independently of them To be able to apply or flow around the treatment fluid evenly to the layer and its substrate areas.
  • FIG. 1 shows a schematic cross section shown in FIG. 2 through the substrate holder according to FIG. 1 showing a channel 8 which is conical in the longitudinal direction of the substrate holder 1 and which causes a uniform pressure, a uniform flow volume and a uniform flow over the entire length of the substrate holder 1 Flow velocity in the outlet openings 9, 10, 11 is guaranteed over the entire length of the substrate holder 1.
  • the treatment fluid is introduced into the substrate holder 1 via an arm 12, which can be moved up and down together with the substrate holder 1 in order to lift the substrates 5 into and out of the container 4.
  • the substrate holder 1 is again partially in one
  • the treatment fluid is introduced into the container 1 on the underside of the trough 2 and flows upwards on the one hand between a trough web 13 and the substrate holder 1 and on the other hand through at least one inlet opening 14 into the substrate holder 1 and becomes over fluid guides 15 provided in the interior of the substrate holder 1 are guided to outlet openings 9, 10, 11 in the upper region of the substrate holder 1, from which the treatment fluid then flows out in a corresponding manner, as described in connection with FIG. 1.
  • the substrate holder 1, shown schematically in cross section in FIG. 4, is also located in the trough 2 in the central region of the bottom 3 of the container 4, but has no channels or guides for the treatment fluid in its interior. Instead, are in the area of the substrate holder 1 guide elements 16 are provided which guide the treatment fluid flowing out of the bottom 3 of the container 4 and optionally also out of the trough 2 in the area of the substrate holder 1 such that it optimally also the area to be treated in the area of the substrate holder 1 itself Flows around substrates 5, whereby even flow conditions are created in the critical area of the substrate holder 1.
  • FIG. 5 shows an exemplary embodiment of the substrate holder according to the invention in a schematic cross-sectional view, in which the substrate holder 1 is essentially round and in turn is at least partially located in a correspondingly designed depression 2 on the bottom 3 of the container 4.
  • the substrate holder cross section there are two ultrasound sources 17, 18, between which a slot or channels 19 run or run, which connect the outlet openings 20 to a channel 21, through which, as in the case of the exemplary embodiment according to FIG. 1 and 2, the treatment fluid flows.
  • the area on which the substrates 3 rest on the substrate holder 1 is formed in the embodiment shown in FIG. 5 by two spaced apart webs 22, 23 through which the treatment fluid flowing out of the outlet openings 20 is guided.
  • the treatment fluid is a rinsing fluid
  • the treatment of the substrates with ultrasound or megasound contributes to an acceleration and improvement of the cleaning process.
  • the ultrasound source 17, 18 is arranged as far as possible in the central region of the container bottom 3, because this results in the sonication of the substrates 5 being most uniform.

Abstract

The invention relates to a device for the treatment of substrates (5) comprising a treatment fluid container (4). The treatment liquid flows upwards into said container from a container bottom, the substrates (5) being placed on at least one substrate support (1). When the substrate support (1) is fitted with discharge openings (9, 10, 11), specially uniform flow conditions are achieved in the entire container area (4), particularly in the area of the substrate supports (1) thereby bringing about a better and more uniform treatment of the substrates (5). It is additionally or alternatively advantageous to also include guiding elements in or near the area of the substrate support (1) to guide the treatment fluid so as to achieve a uniform flow distribution in the fluid container. It is advantageous to integrate at least one ultrasound source in the substrate support (1) specially in connection with the cleaning of the substrate.

Description

Vorrichtung zum Behandeln von Substraten Device for treating substrates
Die Erfindung betrifft eine Vorrichtung zum Behandeln von Substraten in einem ein Behandlungsfluid enthaltenden Behälter, in den das Behandlungsfluid von unten einströmt, und die Substrate auf wenigstens einem als Steg ausgebildeten Substrathalter angeordnet sind.The invention relates to a device for treating substrates in a container containing a treatment fluid, into which the treatment fluid flows from below, and the substrates are arranged on at least one substrate holder designed as a web.
Derartige Vorrichtungen werden insbesondere bei der Behandlung von Wafern eingesetzt und sind beispielsweise aus den auf die Anmelderin des vorliegenden Patents zurückgehenden DE 44 13 077 AI, DE 195 46 990.9 AI bekannt und auch in den nicht vorveröffentlichten deutschen Pa- tentanmeldungen DE 196 16 402.8, DE 196 15 969.5 oderSuch devices are used in particular in the treatment of wafers and are known, for example, from DE 44 13 077 AI, DE 195 46 990.9 AI, which goes back to the applicant of the present patent, and also in the unpublished German patent applications DE 196 16 402.8, DE 196 15 969.5 or
DE 196 37 875.3 derselben Anmelderin beschrieben. Derartige Vorrichtungen weisen große Vorteile auf. Im Bereich der Substrathalter, die vornehmlich als messerartige Stege ausgebildet sind, sind die Strömungsverhältnisse je- doch nicht optimal, da der Substrathalter selbst dieDE 196 37 875.3 described by the same applicant. Such devices have great advantages. In the area of the substrate holders, which are primarily designed as knife-like webs, the flow conditions are not optimal, however, since the substrate holder itself
Strömung in diesem Bereich durch Abschattungen oder Strömungsverdrängungen stört und um den Substrathalter herum andere Strömungsgeschwindigkeiten, Strömungsvolumina oder ein anderer Druck als in anderen Bereichen des Behälters auftreten. Dadurch ist ein gleichmäßiges Strömungsverhalten des Behandlungsfluids im Behälter nicht möglich, so daß'die einzelnen Substrate bzw. unterschiedliche Bereiche der Substrate nicht gleichmäßig behandelt, beispielsweise gespült werden und dadurch die Behandlungsausbeute zu wünschen übrig läßt.Flow in this area interferes with shadows or flow displacements and other flow velocities, flow volumes or a different pressure occur around the substrate holder than in other areas of the container. As a result, a uniform flow behavior of the treatment fluid in the container is not possible, so that the individual substrates or different areas of the substrates are not treated uniformly, for example rinsed, and as a result the treatment yield leaves something to be desired.
Aus den Druckschriften JP 5-182946 A2 , JP 8-64572 A2 und US 5 370 142 sind Vorrichtungen zum Behandeln von Substraten bekannt, bei denen das Behandlungsfluid über Öffnungen an Halterungselementen eingeleitet wird, die zur Halterung der Substrate im Fluidbehälter vorgesehen sind. Aus der JP 7-22371 A2 ist weiterhin eine Vorrichtung zur Naßreinigung von afern bekannt, bei der die afer in einer Kassette angeordnet sind, die in den Fluidbehälter eingesetzt wird. An den Seitenwandungen des Fluidbehäl- ters sind Strömungssteuereinrichtungen in Form von quer in den Fluidbehälter hineinragenden Platten vorgesehen, um das über ein Rohr von oben eingeleitete und auf den Behälterboden geführte Behandlungsfluid in die Kassette und damit zu den zu behandelnden Wafern zu leiten.From the documents JP 5-182946 A2, JP 8-64572 A2 and US 5 370 142 devices for treating substrates are known, in which the treatment fluid is introduced via openings on holder elements which are provided for holding the substrates in the fluid container. From JP 7-22371 A2 a device for wet cleaning of afer is also known, in which the afer are arranged in a cassette which is inserted into the fluid container. Flow control devices in the form of plates projecting transversely into the fluid container are provided on the side walls of the fluid container in order to guide the treatment fluid introduced from above via a pipe and guided onto the container bottom into the cassette and thus to the wafers to be treated.
Aus den Druckschriften JP 63-110640 A2 , JP 62-382430 A2 und US 5 100 476 sind Wafer-Behandlungsvorrichtungen bekannt, bei denen Ultraschall zur Verbesserung des Behand- lungsvorgangs im Fluidbehälter verwendet wird.From the publications JP 63-110640 A2, JP 62-382430 A2 and US 5 100 476, wafer treatment devices are known in which ultrasound is used to improve the treatment process in the fluid container.
Der Erfindung liegt die Aufgabe zugrunde, eine Vorrichtung zu schaffen, bei der die Strömungsverhältnisse im Behälter über den gesamten Behälterquerschnitt und insbesondere auch im Bereich der Substrathalter möglichst gleichmäßig sind, um die Substrate unabhängig von ihrer Lage im Behälter und sämtliche Substratbereiche gleichmäßig behandeln zu können.The invention has for its object to provide a device in which the flow conditions in the container over the entire container cross-section and in particular also in the area of the substrate holder are as uniform as possible in order to be able to treat the substrates regardless of their position in the container and all substrate areas uniformly.
Die gestellte Aufgabe wird erfindungsgemäß dadurch gelöst, daß Führungselemente vorgesehen sind, die das Behandlungsfluid in oder um den Bereich des Substrathalters führen. Auf diese Weise ist es möglich, auch im direkten Bereich des Substrathalters optimale Strömungsverhält- nisse im Hinblick auf die Substrate zu schaffen und die sonst üblichen Nachteile durch die Störung der Strömungsverhältnisse durch den Substrathalter aufzuheben. Es ergeben sich dadurch sehr gleichmäßige Strömungsverhältnisse im Behälter mit der Folge einer gleichmäßigen Be- handlung der Substrate unabhängig von deren Substratbereichen und deren Lage im Behälter. Gemäß der Erfindung wird das von unten in den Behälter einströmende Behandlungsfluid mit entsprechenden Fuhrungselementen, beispielsweise Führungsblechen, so im Bereich des Substrathalters geführt, daß auch in diesen Bereichen gleichmäßige Strö ungsverhältnisse auftreten.The object is achieved according to the invention in that guide elements are provided which guide the treatment fluid in or around the area of the substrate holder. In this way it is possible to create optimal flow conditions with regard to the substrates also in the direct area of the substrate holder and to overcome the otherwise usual disadvantages due to the disturbance of the flow conditions by the substrate holder. This results in very uniform flow conditions in the container, with the result that the substrates are treated uniformly regardless of their substrate regions and their position in the container. According to the invention, the treatment fluid flowing into the container from below is guided with corresponding guide elements, for example guide plates, in the region of the substrate holder in such a way that even flow conditions also occur in these regions.
Eine weitere alternative oder zusätzliche Ausführungsform der Erfindung besteht darin, im Bereich oder in der Nähe des Substrathalters Einlaßdüsen im Behälterboden vorzu- sehen, die das Behandlungsfluid in den Behälterbereich über dem Substrathalter einführen. Dadurch ergeben sich auch im oder über dem Substrathalterbereich gleichmäßige Strömungsverhältnisse .Another alternative or additional embodiment of the invention consists in providing in the area or in the vicinity of the substrate holder inlet nozzles in the tank bottom which introduce the treatment fluid into the tank area above the substrate holder. This results in even flow conditions in or above the substrate holder area.
Gemäß einer sehr vorteilhaften Ausführungsform der Erfindung weist der Substrathalter Auslaßöffnungen auf. Dadurch wird das Behandlungsfluid direkt im Bereich der Substratauflage auf den Substrathalter eingeleitet und verbessert dadurch zusätzlich die Strömungsverhältnisse im Bereich und oberhalb des Substrathalters.According to a very advantageous embodiment of the invention, the substrate holder has outlet openings. As a result, the treatment fluid is introduced directly in the area of the substrate support onto the substrate holder and thereby additionally improves the flow conditions in the area and above the substrate holder.
Gemäß einer weiteren vorteilhaften Ausführungsform der Erfindung ist im Substrathalter wenigstens ein mit einer Behandlungsfluid-Versorgungsleitung verbundener Kanal ausgebildet. Die Auslaßöffnungen stehen dabei mit dem Kanal in Verbindung, so daß über die gesamte Länge des Substrathalters hinweg gleichmäßige Ausström- und damit Strömungsverhältnisse im Behälter gewährleistet sind.According to a further advantageous embodiment of the invention, at least one channel connected to a treatment fluid supply line is formed in the substrate holder. The outlet openings are connected to the channel, so that uniform outflow and thus flow conditions in the container are ensured over the entire length of the substrate holder.
Um über die gesamte Länge des Substrathalters hinweg möglichst gleichmäßige Druckverhältnisεe und Ausströmvolumi- na des Behandlungsfluids zu erreichen, nimmt die Kanal- Querschnittsflache von der Zuführungsstelle des Behandlungsfluids bis zum Kanalende des Substrathalters hin ab. Mit Vorteil wird als Kanal ein konusförmiges Rohr verwendet. Zusätzlich oder alternativ zur Ausbildung eines Kanals im Substrathalter ist es zur Lösung der gestellten Aufgabe weiterhin vorteilhaft, wenn das Behandlungsfluid von der Unterseite des Substrathalters in diesen einleitbar ist. Das Behandlungsfluid wird dabei an einer oder mehreren Stellen oder über die gesamte Länge des Substrathalters hinweg von unten in diesen eingeleitet und über Fluidfüh- rungen nach oben zu den Auslaßöffnungen geführt.In order to achieve pressure ratios and outflow volumes of the treatment fluid that are as uniform as possible over the entire length of the substrate holder, the channel cross-sectional area decreases from the supply point of the treatment fluid to the channel end of the substrate holder. A conical tube is advantageously used as the channel. In addition or as an alternative to the formation of a channel in the substrate holder, it is further advantageous to achieve the object if the treatment fluid can be introduced into the substrate holder from the underside thereof. The treatment fluid is introduced into the substrate holder at one or more points or over the entire length of the substrate holder, and is guided upwards to the outlet openings via fluid guides.
Die Auslaßöffnungen sind vorzugsweise Löcher, Schlitze und/oder Düsen je nach der Art des Behandlungsfluids, der Art des Substrathalters oder den Strömungsgegebenheiten, um die Strömungsverhältnisse auch im Bereich des Substrathalters möglichst gleichmäßig denen im übrigen Be- hälterbereich anzugleichen.The outlet openings are preferably holes, slots and / or nozzles depending on the type of treatment fluid, the type of substrate holder or the flow conditions, in order to match the flow conditions in the area of the substrate holder as evenly as possible to those in the other area of the container.
Gemäß einer besonders vorteilhaften Ausführungsform ist der Substrathalter ein messerartiger Steg, wie er in den eingangs genannten Druckschriften verwendet wird, wobei auf dem messerartigen Steg Kantenbereiche der Substrate aufliegen.According to a particularly advantageous embodiment, the substrate holder is a knife-like web, as is used in the publications mentioned at the beginning, edge regions of the substrates resting on the knife-like web.
Es ist jedoch auch möglich, die Substrathalter so auszubilden, daß sie wenigstens einen der Kantenform der Sub- strate angepaßten Halterungsbereich aufweisen, wie dies beispielsweise in der nicht vorveröffentlichten DE 196 40 848.2 dargestellt und beschrieben ist, um insbesondere auch rechteckige oder quadratische Wafer im Fluidbehälter sicher und zuverlässig zu haltern.However, it is also possible to design the substrate holder in such a way that it has at least one holding region which is adapted to the edge shape of the substrates, as is shown and described, for example, in the unpublished DE 196 40 848.2, in particular also rectangular or square wafers in the fluid container to hold securely and reliably.
Die messerartigen Stege weisen üblicherweise über ihre Länge hinweg gleichmäßig beabstandete Einschnitte zur Halterung der Substrate in äquidistanten Abständen auf. Ebenso weisen die der Kantenform der Substrate angepaßten Halterungsbereiche gleichmäßig beabstandete Rillen auf, in denen die Substratkanten liegen. Um zwischen den Substraten auch im Bereich der Substrathalter eine gleich- mäßige Strömung zu erreichen, ist es besonders vorteilhaft, wenn ausschließlich oder auch zusätzlich Auslaßöffnungen zwischen den Bereichen der Substrathalter vorgesehen sind, an denen die Kanten der Substrate aufliegen.The knife-like webs usually have incisions evenly spaced along their length for holding the substrates at equidistant intervals. Likewise, the mounting areas matched to the edge shape of the substrates have equally spaced grooves in which the substrate edges lie. In order to ensure a uniform To achieve moderate flow, it is particularly advantageous if exclusively or additionally, outlet openings are provided between the regions of the substrate holder on which the edges of the substrates rest.
Die Substrathalter sind vorzugsweise in vertikaler Richtung bewegbar, um die Substrate in den Behälter abzusenken und aus ihm herauszuheben.The substrate holders are preferably movable in the vertical direction in order to lower the substrates into the container and lift them out of the container.
Das Behandlungsfluid ist vorzugsweise wenigstens eine chemische Flüssigkeit, insbesondere eine Spülflüssigkeit. Es ist jedoch auch möglich, als Behandlungsfluid alternativ oder zusätzlich wenigstens ein Gas, beispielsweise Ozon, zu verwenden.The treatment fluid is preferably at least one chemical liquid, in particular a rinsing liquid. However, it is also possible alternatively or additionally to use at least one gas, for example ozone, as the treatment fluid.
Zur Verbesserung der Behandlungseigenschaften der Substrate im Behälter ist es sowohl alternativ als auch zusätzlich zu den bereits genannten Merkmalen vorteilhaft, erfindungsgemäß wenigstens eine Ultraschall-Quelle, vorzugsweise einen Megasonic-Transducer , im Substrathalter zu integrieren. Die Ultraschall-Quelle (n) sollten dabei im Substrathalter so angeordnet sein, daß insbesondere bei Behältern aus Kunststoff möglichst kein Schall auf die Bodenwand in der Nähe der Ultraschall-Quelle gelangt, und um ein Aufheizen des Bodens zu verhindern. Die Verwendung von Ultraschall-Quellen unterstützt und verkürzt den Reinigungsvorgang der Substrate während des Spülprozesses wesentlich.To improve the treatment properties of the substrates in the container, it is both alternative and in addition to the features already mentioned advantageous to integrate at least one ultrasound source, preferably a megasonic transducer, in the substrate holder according to the invention. The ultrasound source (s) should be arranged in the substrate holder in such a way that, in particular in the case of containers made of plastic, as far as possible no sound reaches the bottom wall in the vicinity of the ultrasound source and in order to prevent the floor from heating up. The use of ultrasound sources supports and significantly shortens the cleaning process of the substrates during the rinsing process.
Gemäß vorteilhaften Ausführungen der Erfindung weist der Substrathalter entweder alternativ oder auch kumulativ Auslaßöffnungen für das Behandlungsfluid, Führungsele- mente für das Behandlungsfluid und/oder Ultraschall-Quel- len auf. Unter den Begriff Substrate sind nicht nur Wafer, sondern die verschiedensten Objekte zu verstehen, die bzw. deren Oberflächen behandelt und/oder gereinigt werden müssen, so daß der Begriff Substrate insbesonder Halbleiterwafer, CD's, Masken, LED-Anzeigeeinrichtungen usw. umfaßt.According to advantageous embodiments of the invention, the substrate holder has, alternatively or also cumulatively, outlet openings for the treatment fluid, guide elements for the treatment fluid and / or ultrasound sources. The term substrates is not only to be understood as wafers, but also a wide variety of objects, the surfaces of which must be treated and / or cleaned, so that the term substrates in particular includes semiconductor wafers, CD's, masks, LED display devices etc.
Die Erfindung sowie weitere Merkmale und Vorteile wird bzw. werden nachfolgend anhand bevorzugter Ausführungsbeispiele erläutert. Es zeigen:The invention and further features and advantages will be explained below with the aid of preferred exemplary embodiments. Show it:
Fig. 1 eine schematische Darstellung eines als messerartiger Steg ausgebildeten Substrathalters mit einem integrierten Kanal in perspektivischer Darstellung;Figure 1 is a schematic representation of a substrate holder designed as a knife-like web with an integrated channel in a perspective view.
Fig. 2 einen verkleinerten, schematischen Querschnitt durch den in Fig. 1 dargestellten Substrathalter;FIG. 2 shows a reduced, schematic cross section through the substrate holder shown in FIG. 1;
Fig. 3 eine schematische Querschnittsdarstellung einesFig. 3 is a schematic cross-sectional view of a
Substrathalters, bei der das Behandlungsfluid von unten in den Substrathalter eingeleitet und im Substrathalter nach oben zu den Auslaßöffnungen geführt wird;Substrate holder, in which the treatment fluid is introduced into the substrate holder from below and is guided upward in the substrate holder to the outlet openings;
Fig. 4 eine schematische Querschnittsdarstellung einer Ausführungsform, bei der um den Substrathalter herum Führungselemente für das Behandlungsfluid vorgesehen sind, und4 shows a schematic cross-sectional illustration of an embodiment in which guide elements for the treatment fluid are provided around the substrate holder, and
Fig. 5 eine schematische Querschnittsdarstellung einer Ausführungsform, bei der der Substrathalter zusätzlich zu Außlaßöffnungen Ultraschallquellen aufweist.5 shows a schematic cross-sectional illustration of an embodiment in which the substrate holder has ultrasound sources in addition to outlet openings.
Die in Fig. 1 dargestellte Ausführungsform zeigt einen Substrathalter 1, der als messerartiger Steg ausgebildet ist. Der Substrathalter 1 befindet sich gemäß Fig. 1 mit seinem unteren Bereich in einen Schacht oder in einer Mulde 2 des Bodens 3 eines Behälters 4 , und damit in einer Stellung, in der sich Substrate 5 'zur Behandlung im Behälter 4 befinden. Auf einer messerartigen Kante 6 des Substrathalters 1 sind die Substrate 5 parallel zueinander gehalten. Obgleich dies nicht dargestellt ist, kann die Messerkante 6 gleichmäßig zueinander beabstandete Kerben zur Aufnahme und zur äquidistanten Halterung der Substrate 5 aufweisen.The embodiment shown in Fig. 1 shows a substrate holder 1, which is designed as a knife-like web is. 1 with its lower region in a shaft or in a trough 2 of the bottom 3 of a container 4, and thus in a position in which substrates 5 'for treatment are located in the container 4. The substrates 5 are held parallel to one another on a knife-like edge 6 of the substrate holder 1. Although this is not shown, the knife edge 6 can have notches which are evenly spaced from one another for receiving and for equidistantly holding the substrates 5.
Innerhalb des Substrathalters 1 verläuft in dessen Längsrichtung ein Kanal 8 über seine Länge hinweg. Bei dem dargestellten Ausführungsbeispiel münden in diesen Kanal 8 seitliche Schlitze 9, 10 sowie ein senkrechter Schlitz 11, die die Auslaßöffnungen bilden, durch die das Behandlungsfluid aus dem Substrathalter 1 ausströmt.Within the substrate holder 1, a channel 8 extends in its longitudinal direction over its length. In the exemplary embodiment shown, lateral slots 9, 10 and a vertical slot 11, which form the outlet openings through which the treatment fluid flows out of the substrate holder 1, open into this channel 8.
Die Lage, die Breite oder die Zahl der Schlitze 9, 10, 11 ist je nach den speziellen Gegebenheiten wählbar, um auch im Bereich des Substrathalters 1 optimale und insbesondere gleichmäßige Strömungsverhältnisse für das Behandlungsfluid im Behälter 4zu erreichen und dadurch die Substrate 5 unabhängig von deren Lage und deren Substratbe- reiche gleichmäßig mit dem Behandlungsfluid beaufschlagen bzw. umströmen zu können.The position, the width or the number of the slots 9, 10, 11 can be selected depending on the special circumstances in order to achieve optimal and, in particular, uniform flow conditions for the treatment fluid in the container 4 in the region of the substrate holder 1 and thereby the substrates 5 independently of them To be able to apply or flow around the treatment fluid evenly to the layer and its substrate areas.
Obgleich dies in Fig. 1 nicht dargestellt ist, ist es auch möglich, statt der Schlitze 9, 10, 11 Löcher oder Düsen an geeigneten Stellen und in geeigneten Abständen im Substrathalter 1 vorzusehen. Auf der Messerkante 6 ist es insbesondere vorteilhaft, zwischen jeweils zwei Substraten eine Öffnung oder eine Düse vorzusehen, so daß die Strömung zwischen den Substraten über die gesamte Substratflache hinweg optimiert wird. Der in Fig. 2 dargestellte schematische Querschnitt durch den Substrathalter gemäß 1 zeigt einen in Längsrichtung des Substrathalters 1 konusförmigen Verlauf des Kanals 8, der bewirkt, daß über die gesamte Länge des Substrathal- ters 1 hinweg ein gleichmäßiger Druck, ein gleichmäßiges Strömungsvolumen und eine gleichmäßige Strömungsgeschwindigkeit in den Auslaßöffnungen 9,10,11 über die gesamte Länge des Substrathalters 1 hinweg gewährleistet ist. Das Behandlungsfluid wird über einen Arm 12 in den Substrat- halter 1 eingeleitet, der zusammen mit dem Substrathalter 1 auf und ab bewegbar ist, um die Substrate 5 in den Behälter 4 ein- und aus ihm auszuheben.Although this is not shown in FIG. 1, it is also possible to provide holes or nozzles instead of the slots 9, 10, 11 at suitable locations and at suitable intervals in the substrate holder 1. On the knife edge 6, it is particularly advantageous to provide an opening or a nozzle between two substrates, so that the flow between the substrates is optimized over the entire substrate area. The schematic cross section shown in FIG. 2 through the substrate holder according to FIG. 1 shows a channel 8 which is conical in the longitudinal direction of the substrate holder 1 and which causes a uniform pressure, a uniform flow volume and a uniform flow over the entire length of the substrate holder 1 Flow velocity in the outlet openings 9, 10, 11 is guaranteed over the entire length of the substrate holder 1. The treatment fluid is introduced into the substrate holder 1 via an arm 12, which can be moved up and down together with the substrate holder 1 in order to lift the substrates 5 into and out of the container 4.
Bei der in Fig. 3 dargestellten Ausführungsform befindet sich der Substrathalter 1 wiederum teilweise in einemIn the embodiment shown in FIG. 3, the substrate holder 1 is again partially in one
Schacht oder einer Mulde 2 im Mittelbereich des Bodens 3 im Behälter 4. Die vom Substrathalter 1 gehaltenen Substrate 3 befinden sich daher in ihrer Behandlungs-Stellung innerhalb des Behälters 4.Shaft or a trough 2 in the central region of the bottom 3 in the container 4. The substrates 3 held by the substrate holder 1 are therefore in their treatment position within the container 4.
Bei dem in Fig. 3 dargestellten Ausführungsbeispiel wird das Behandlungsfluid auf der Unterseite der Mulde 2 in den Behälter 1 eingeführt und strömt einerseits zwischen einer Muldenbahn 13 und dem Substrathalter 1 nach oben und andererseits durch wenigstens eine Einlaßöffnung 14 in den Substrathalter 1 hinein und wird über im Innern des Substrathalters 1 vorgesehenen Fluidführungen 15 zur Auslaßöffnungen 9, 10, 11 im oberen Bereich des Substrathalters 1 geleitet, aus denen dann das Behandlungsfluid in entsprechender Weise, wie dies im Zusammenhang mit Fig. 1 beschrieben ist, ausströmt.In the exemplary embodiment shown in FIG. 3, the treatment fluid is introduced into the container 1 on the underside of the trough 2 and flows upwards on the one hand between a trough web 13 and the substrate holder 1 and on the other hand through at least one inlet opening 14 into the substrate holder 1 and becomes over fluid guides 15 provided in the interior of the substrate holder 1 are guided to outlet openings 9, 10, 11 in the upper region of the substrate holder 1, from which the treatment fluid then flows out in a corresponding manner, as described in connection with FIG. 1.
Der in Fig. 4 schematisch im Querschnitt dargestellte Substrathalter 1 befindet sich ebenfalls in der Mulde 2 im Mittelbereich des Bodens 3 des Behälters 4, er weist jedoch keine Kanäle oder Führungen für das Behandlungs- fluid in seinem Innern auf. Stattdessen sind im Bereich des Substrathalters 1 Führungselemente 16 vorgesehen, die das aus dem Boden 3 des Behälters 4 und gegebenenfalls auch aus der Mulde 2 ausströmende Behandlungsfluid im Bereich des Substrathalters 1 so führen, daß es in optima- 1er Weise auch im Bereich des Substrathalters 1 selbst die zu behandelnden Substrate 5 umströmt, wodurch auch im kritischen Bereich des Substrathalters 1 gleichmäßige Strömungsverhältnisse geschaffen werden.The substrate holder 1, shown schematically in cross section in FIG. 4, is also located in the trough 2 in the central region of the bottom 3 of the container 4, but has no channels or guides for the treatment fluid in its interior. Instead, are in the area of the substrate holder 1 guide elements 16 are provided which guide the treatment fluid flowing out of the bottom 3 of the container 4 and optionally also out of the trough 2 in the area of the substrate holder 1 such that it optimally also the area to be treated in the area of the substrate holder 1 itself Flows around substrates 5, whereby even flow conditions are created in the critical area of the substrate holder 1.
Fig. 5 zeigt ein Ausführungsbeispiel des erfindungsgemäßen Substrathalters in schematischer Querschnittdarstellung, bei dem der Substrathalter 1 im wesentlichen rund ist und sich wiederum wenigstens teilweise in einer entsprechend ausgebildeten Mulde 2 am Boden 3 des Behälters 4 befindet. Am oberen Bereich des Substrathalterquerschnitts befinden sich zwei Ultraschall-Quellen 17, 18, zwischen denen ein Schlitz oder Kanäle 19 verläuft bzw. verlaufen, die die Auslaßöffnungen 20 mit einem Kanal 21 verbinden, durch den, wie im Falle des Ausführungsbei- spiels gemäß Fig. 1 und 2, das Behandlungsfluid strömt.FIG. 5 shows an exemplary embodiment of the substrate holder according to the invention in a schematic cross-sectional view, in which the substrate holder 1 is essentially round and in turn is at least partially located in a correspondingly designed depression 2 on the bottom 3 of the container 4. At the upper area of the substrate holder cross section there are two ultrasound sources 17, 18, between which a slot or channels 19 run or run, which connect the outlet openings 20 to a channel 21, through which, as in the case of the exemplary embodiment according to FIG. 1 and 2, the treatment fluid flows.
Der Bereich, auf den die Substrate 3 auf dem Substrathalter 1 aufliegen, ist bei der in Fig. 5 dargestellten Ausführungsform durch zwei voneinander beabstandete Stege 22, 23 gebildet, durch die das aus den Auslaßöffnungen 20 ausströmende Behandlungsfluid geführt wird.The area on which the substrates 3 rest on the substrate holder 1 is formed in the embodiment shown in FIG. 5 by two spaced apart webs 22, 23 through which the treatment fluid flowing out of the outlet openings 20 is guided.
Insbesondere beim Spülvorgang der Substrate, wenn das Behandlungsfluid ein Spülfluid ist, trägt die Behandlung der Substrate mit Ultraschall bzw. Megaschall zu einer Beschleunigung und Verbesserung des Reinigungsvorgangs bei. Dabei ist es besonders vorteilhaft, wenn die Ultraschall-Quelle 17,18 möglichst im Mittelbereich des Behäl- terbodens 3 angeordnet ist, weil dadurch die Beschallung der Substrate 5 am gleichmäßigsten erfolgt. Durch die In- tegration der Ultraschall-Quelle (n) 17, 18 in den Substrathalter 1 wird zusätzlich zu einer optimalen Strömungs- Verteilung des Spulfluids auch eine optimale Beschallung der zu reinigenden Substrate 5 mit Ultraschall erreicht.In particular during the rinsing process of the substrates, if the treatment fluid is a rinsing fluid, the treatment of the substrates with ultrasound or megasound contributes to an acceleration and improvement of the cleaning process. It is particularly advantageous if the ultrasound source 17, 18 is arranged as far as possible in the central region of the container bottom 3, because this results in the sonication of the substrates 5 being most uniform. By integrating the ultrasound source (s) 17, 18 into the substrate holder 1, in addition to an optimal flow Distribution of the winding fluid also achieved optimal sonication of the substrates 5 to be cleaned with ultrasound.
Die Erfindung wurde zuvor anhand bevorzugter Ausführungs- beispiele beschrieben. Dem Fachmann sind jedoch zahlreiche Abwandlungen und Ausgestaltungen möglich, ohne daß dadurch der Erfindungsgedanke verlassen wird. Beispielsweise sind die Merkmale der vorliegenden Erfindung auch im Zusammenhang mit Substrathaltern vorteilhaft einsetz- bar, die nicht nur messerartig ausgebildet sind, sondern bei denen auch andere Formen gewählt werden, wie dies beispielsweise in der nicht vorveröffentlichten DE 196 40 848.2 derselben Anmelderin beschrieben ist. Die jeweiligen Merkmale und Maßnahmen können auch in einer Vorrichtung mit Vorteil kombiniert werden. Beispielsweise ist es möglich, Substrathalter 1 mit Auslaßöffnungen zu verwenden und gleichzeitig Führungselemente 16 vorzusehen, wie dies beispielsweise im Zusammenhang mit dem Ausführungsbeispiel gemäß Fig. 4 beschrieben wurde. Bei der in Fig. 3 dargestellten Ausführungsform ist bereits eine derartige Kombination gegeben, nämlich dadurch, daß das Behandlungsfluid zusätzlich zu den Auslaßöffnungen 9, 10, 11 durch das Ausströmen aus der Mulde 2 in bestimmter Weise geführt ist. Auch die Kombination von Auslaßöffnun- gen 9, 10, 11, 20 im Substrathalter 1 und/oder der Führungselemente 16 mit Ultraschall-Quellen 17, 18 ist insbesondere bei für Reinigungsverfahren für Substrate 5 sehr vorteilhaft einsetzbar. The invention has been described above on the basis of preferred exemplary embodiments. However, numerous modifications and refinements are possible for the person skilled in the art without departing from the inventive idea. For example, the features of the present invention can also be used advantageously in connection with substrate holders which are not only knife-like, but in which other shapes are also selected, as described, for example, in the unpublished DE 196 40 848.2 by the same applicant. The respective features and measures can also advantageously be combined in one device. For example, it is possible to use substrate holder 1 with outlet openings and at the same time to provide guide elements 16, as was described, for example, in connection with the exemplary embodiment according to FIG. 4. In the embodiment shown in FIG. 3, such a combination already exists, namely in that the treatment fluid is guided in a certain way in addition to the outlet openings 9, 10, 11 by the outflow from the trough 2. The combination of outlet openings 9, 10, 11, 20 in the substrate holder 1 and / or the guide elements 16 with ultrasound sources 17, 18 can also be used very advantageously, in particular for cleaning processes for substrates 5.

Claims

Patentansprüche claims
1. Vorrichtung zum Behandeln von Substraten (5) mit einem ein Behandlungsfluid enthaltenden Behälter (4) , in den das Behandlungsfluid von unten einströmt und die Substrate (5) auf wenigstens einem als Steg ausgebildeten Substrathalter (1) angeordnet sind, gekennzeichnet durch Führungselemente (16) zum Führen des Behandlungsfluids im oder um den Bereich des Substrathalters (1) .1. Device for treating substrates (5) with a container (4) containing a treatment fluid, into which the treatment fluid flows from below and the substrates (5) are arranged on at least one substrate holder (1) designed as a web, characterized by guide elements ( 16) for guiding the treatment fluid in or around the area of the substrate holder (1).
2. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Führungselemente (16) so ausgebildet und/oder angeordnet sind, daß die Strömungsverhält- nisse des Behandlungsfluid auch in oder um den Bereich des Substrathalters (1) im wesentlichen dieselben wie in den übrigen Bereichen des Behälters (4) sind.2. Device according to claim 1, characterized in that the guide elements (16) are designed and / or arranged such that the flow conditions of the treatment fluid in or around the area of the substrate holder (1) are essentially the same as in the other areas of the container (4).
3. Vorrichtung nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß um den Bereich des Substrathalters (1) herum Einlaßdüsen im Boden des Behälter (4) vorgesehen sind, die das Behandlungsfluid in den Behälterbereich über dem Substrathalter (1) lenken.3. Apparatus according to claim 1 or 2, characterized in that around the area of the substrate holder (1) around inlet nozzles are provided in the bottom of the container (4) which direct the treatment fluid into the container area above the substrate holder (1).
4. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet , daß der Substrathalter (1) Auslaßöffnungen (9, 10, 11, 20) aufweist.4. Device according to one of the preceding claims, characterized in that the substrate holder (1) has outlet openings (9, 10, 11, 20).
5. Vorrichtung nach Anspruch 4, dadurch gekennzeichnet, daß im Substrathalter (1) wenigstens ein mit einer Behandlungsfluid-Versorgungsleitung verbundener Kanal (8, 21) ausgebildet ist, und die Auslaßöffnungen (9, 10, 11, 20) mit dem Kanal (8, 21) in Verbindung stehen. 5. The device according to claim 4, characterized in that in the substrate holder (1) at least one with a treatment fluid supply line channel (8, 21) is formed, and the outlet openings (9, 10, 11, 20) with the channel (8 , 21) are connected.
6. Vorrichtung nach Anspruch 5, dadurch gekennzeichnet, daß die Kanalquerschnittsflache von der Zuführungs- stelle des Behandlungsfluids bis zum Kanalende hin abnimmt.6. The device according to claim 5, characterized in that the channel cross-sectional area decreases from the supply point of the treatment fluid to the channel end.
7. Vorrichtung nach Anspruch 6, dadurch gekennzeichnet, daß der Kanal (8, 21) ein konusför iges Rohr ist.7. The device according to claim 6, characterized in that the channel (8, 21) is a konusför-shaped tube.
8. Vorrichtung nach einem der Ansprüche 4 bis 7, da- durch gekennzeichnet, daß das Behandlungsfluid von der Unterseite des Substrathalters (1) in diesen einleitbar ist.8. Device according to one of claims 4 to 7, characterized in that the treatment fluid from the underside of the substrate holder (1) can be introduced into this.
9. Vorrichtung nach einem der Ansprüche 4 bis 8, da- durch gekennzeichnet, daß die Öffnungen Löcher,9. Device according to one of claims 4 to 8, characterized in that the openings are holes,
Schlitze und/oder Düsen sind.There are slots and / or nozzles.
10. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß der wenigstens eine Sub- strathalter (1) ein messerartiger Steg ist, auf dem Kantenbereiche der Substrate (5) aufliegen.10. Device according to one of the preceding claims, characterized in that the at least one substrate holder (1) is a knife-like web on which edge regions of the substrates (5) rest.
11. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß der Substrathalter (1) einen der Kantenform der Substrate (5) angepaßten Halterungs-Bereich aufweist.11. The device according to any one of the preceding claims, characterized in that the substrate holder (1) has a mounting area adapted to the edge shape of the substrates (5).
12. Vorrichtung nach einem der Ansprüche 4 bis 11, dadurch gekennzeichnet, daß die Auslaßöffnungen (9, 10, 11, 20) zwischen den Bereichen der Substrathalter (1) vorgesehen sind, an denen die Kantenbereiche der Substrate (5) aufliegen.12. Device according to one of claims 4 to 11, characterized in that the outlet openings (9, 10, 11, 20) are provided between the regions of the substrate holder (1) on which the edge regions of the substrates (5) rest.
13. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß der Substrathalter (1) in vertikaler Richtung bewegbar ist. 13. Device according to one of the preceding claims, characterized in that the substrate holder (1) is movable in the vertical direction.
14. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß das Behandlungsfluid wenigstens eine chemische Flüssigkeit, eine Spül- flüssigkeit und/oder wenigstens ein Gas, insbeson- dere Ozon, ist.14. Device according to one of the preceding claims, characterized in that the treatment fluid is at least one chemical liquid, a rinsing liquid and / or at least one gas, in particular ozone.
15. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß im Substrathalter (1) wenigstens eine Ultraschall-Quelle (17, 18) inte- griert ist.15. Device according to one of the preceding claims, characterized in that at least one ultrasound source (17, 18) is integrated in the substrate holder (1).
16. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß der Substrathalter (1) Auslaßöffnungen (9, 10, 11, 20) für das Behandlungs- fiuid und/oder Führungselemente (16) für das Behandlungsfluid und/oder Ultraschall-Quellen (17, 18) aufweist. 16. Device according to one of the preceding claims, characterized in that the substrate holder (1) outlet openings (9, 10, 11, 20) for the treatment fluid and / or guide elements (16) for the treatment fluid and / or ultrasound sources ( 17, 18).
PCT/EP1997/005413 1996-10-24 1997-10-01 Substrate treatment device WO1998018156A1 (en)

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