WO1997038810A1 - Method of manufacturing a sintered structure on a substrate - Google Patents
Method of manufacturing a sintered structure on a substrate Download PDFInfo
- Publication number
- WO1997038810A1 WO1997038810A1 PCT/IB1997/000281 IB9700281W WO9738810A1 WO 1997038810 A1 WO1997038810 A1 WO 1997038810A1 IB 9700281 W IB9700281 W IB 9700281W WO 9738810 A1 WO9738810 A1 WO 9738810A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid
- layer
- substrate
- laser
- sintered
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/22—Direct deposition of molten metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
- B29C67/02—Moulding by agglomerating
- B29C67/04—Sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/0036—Laser treatment
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4867—Applying pastes or inks, e.g. screen printing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Definitions
- the invention relates to a method of manufacturing a sintered structure on a substrate, in which method a liquid which is charged with particles is provided on said substrate by means of an ink jet printer, whereafter the liquid is evaporated and the particles present in said liquid are sintered.
- a method can very advantageously be used in the manufacture of thin sintered layers or composite structures whose shape and size are well- defined. It is alternatively possible, however, to use such a method in the additive manufacture of 3-dimensional sintered products, such as multilayer structures and ceramic multilayer components.
- a method of the type mentioned in the opening paragraph is known per se from J. Mat. Sci. Lett. 14 (22), 1562-1565 (1995). Said document more particularly describes a method of manufacturing a sintered ceramic layer comprising predominantly zirconium oxide by means of ink jet technology.
- a ceramic powder comprising yttrium-containing zirconium-oxide particles is mixed with a binder, a dispersing agent and a solvent.
- Ten thin layers of this liquid are ink jet printed onto a substrate to form a multilayer. After evaporation of the liquid, the resultant layer of powder particles is sintered in a furnace at a temperature ranging from 500 to 1600 °C for one hour.
- the known method has an important drawback, namely that the dimensional accuracy of the sintered (multi)layer is relatively small.
- the 3-dimensional sintered products manufactured by means of the known method may be subject to 15% shrinkage or more.
- this shrinkage effect is increasingly being regarded as very disadvantageous.
- the invention more particularly aims at a method of manufacturing structured layers in which the problem of shrinkage is substantially reduced and brought under control.
- the method in accordance with the invention should enable sintered, shaped products, such as multilayer components, to be manufactured with a high degree of dimensional accuracy.
- the invention is based on the recognition that a sintering process which is carried out layer by layer leads to much less shrinkage in the plane of the layer than a process in which a complete, 3-dimensional product is sintered.
- shrinkage takes place predominantly in the direction at right angles to the plane of the substrate on which the layer of charged liquid is provided, whereas shrinkage in the directions parallel to the surface of the substrate is much smaller.
- Droplets provided by means of an ink jet printer typically have sectional and height dimensions of, respectively, 50 microns or less and approximately 5 microns. After evaporation and sintering, the sectional dimension of the droplets is substantially unchanged, whereas the height dimension has decreased by 80-95%.
- the sinter time of the individual droplets is less than approximately 1 millisecond.
- the method in accordance with the invention enables complete products to be manufactured in an economically acceptable manner. For example, it has been found that arbitrarily shaped ceramic layers can be provided on a substrate at a rate of 5 cm 2 /s and more by means of the method in accordance with the invention.
- the line width of the layers is 50 microns and the accuracy with which they are provided is 5 microns.
- the method in accordance with the invention can be carried out by means of various types of lasers. A CO 2 laser yields good results if ceramic layers are manufactured.
- metallic layers use is preferably made of an Nd:YAG laser to evaporate the liquid and sinter the particles contained therein.
- the necessary power is at least 1 kW/cm 2 .
- various types of substrates can be used.
- the use of non-adhering substrates is preferred.
- Said substrates are especially advantageous if the ultimately formed product has to be detached from the substrate.
- CMAs ceramic multilayer actuators
- CMTs ceramic multilayer transformers
- CMCs ceramic multilayer capacitors
- a preferred embodiment of the method in accordance with the invention is characterized in that for evaporating the liquid use is also made of a laser. It is noted that the liquid can also be evaporated in other ways, for example, by means of IR radiation. It is alternatively possible to employ heated substrates, which cause the liquid to evaporate immediately after it has been provided. However, evaporation of the liquid by means of a laser proves to be more efficient.
- a further preferred embodiment of the method in accordance with the invention is characterized in that for evaporating the liquid and sintering the particles use is made of the same laser.
- the coupling-optical system of the laser should be such that the laser beam is split into a relatively low-energy beam for the evaporation of the liquid and a relatively high-energy beam for the sintering of the particles.
- the liquid comprises particles of glass, ceramics or metal compounds in the form of a sol-gel solution or a colloidal sol.
- the liquid comprises particles of glass, ceramics or metal compounds in the form of a sol-gel solution or a colloidal sol.
- use can be made of a suspension of a fine powder of metal compounds, such as metal oxides and/or metal nitrides.
- the use of such a powder has die disadvantage that agglomerations of powder particles can be formed in such suspensions. These agglomerations may obstruct the nozzle.
- a sol-gel solution or a colloidal sol of the material to be sintered Such a solution or sol is characterized in that it comprises particles which are in an aqueous and/or organic matrix. Such a solution or sol is stabilized with respect to precipitation or agglomeration by mutual repulsion of the particles, for example, due to the presence of auxiliary substances in the liquid or charge repulsion. This considerably reduces the risk of obstruction of the nozzle of an ink jet printer.
- the average particle size should be below 1000 nm.
- Such sols are available, for example, from Merck.
- the colloidal sols used preferably contain 1-5 vol. % of sinterable material. They also contain salts, stabilizers and fluxes.
- a further preferred embodiment of the method in accordance with the invention is characterized in that an ink jet printer having a multiple print head is used. This has the advantage that many products can be manufactured simultaneously. This measure can very advantageously be used in mass-production processes.
- the method in accordance with the invention can very advantageously be used in the manufacture of multilayer components, such as CMCs, CMTs and CMAs.
- the method in accordance with the invention can also be used to accurately and rapidly apply thin wear-resistant layers to a substrate, for example, of metal.
- wear-resistant blades for example, for shavers.
- Fig. 1 schematically shows the principle of the method in accordance with the invention.
- FIG. 1 A droplet 3 of a liquid charged with particles is provided by means of an ink jet printer (not shown) on a surface 2 of a substrate, for example, of stainless steel or aluminium oxide. This situation is shown in Fig. 1-a.
- the liquid of the droplet is evaporated by means of a laser pulse 4 (typically 0.1-10 millisecond, 2-10 J/cm 2 ) originating from a laser (not shown), whereafter a relatively min layer 5 of particles remains on the substrate (Fig. 1-b).
- a laser pulse 4 typically 0.1-10 millisecond, 2-10 J/cm 2
- the powder layer is sintered instantaneously by means of a more powerful laser pulse 6 (0.01-1 millisecond, 50-200 J/cm 2 ) to form a thin, ceramic layer 7 (Fig. 1-c).
- shrinkage of the layer during sintering takes place mainly in a direction at right angles to the substrate.
- the degree of shrinkage of the layer in a direction parallel to the substrate surface 2 is negligibly small. It is noted that the energy and times used in the inventive method depend from the liquid and particles used.
- a second droplet 8 is provided by means of the ink jet printer (Fig. 1-d). Also this droplet is dried and sintered immediately after it has been provided, so that a thin ceramic layer 9 is formed which blends properly with the layer 7, which has already been sintered (Fig. 1-e). By repeating this process a number of times, a relatively large surface can be provided with a thin ceramic layer.
- the thickness of such a layer provided by means of the method in accordance with the invention typically ranges from 0.1 to 1 micrometer.
- This sintered layer can subsequently be provided with a second layer.
- a droplet 10 is provided on the first layer (Fig. 1-f). which droplet is also dried and sintered in order to form a thin ceramic layer 11 (Fig. 1-g).
- a continuous layer of a ceramic material is obtained by repeating the provision, drying and sintering steps a number of times.
- the liquid used may contain another type of particles.
- a multilayer structure can be obtained by alternately providing layers of metal particles (for example, Pd) and layers of metal-oxide particles (for example doped BaTiO j ). Dependent upon the type of particles, a ceramic multilayer capacitor, a ceramic multilayer transformer or a ceramic multilayer actuator can be produced in this manner.
- the droplets spread on the surface of the substrate until they cover a surface area having a sectional dimension of approximately 200 micrometers.
- the thickness of the spread droplets is substantially homogeneous and, dependent upon the exact composition of the liquid, ranges between 1 and 10 micrometers.
- the substrate is mounted on an x,y-table so that the area to be patterned may be larger than the range of the printer.
- the substrate is locally heated, i.e. at the location where the droplet is provided, by means of a CO 2 laser having a power density of 100 W/cm 2 . Irradiation with the laser causes the temperature of the droplet to be increased to the boiling point. As a result, the droplet of solvent (water) evaporates very rapidly, i.e.
- the average thickness of the dried droplet is of the order of 1 micrometer.
- the dried droplet has a porous structure. Dependent upon the size of the laser spot, more than one droplet can be dried at the same time. It is noted that other ways of drying the droplets are also possible, such as heating of the entire substrate or irradiation, for example, with an IR source.
- the resultant porous layer is sintered by means of a laser.
- a laser For this sintering process use is made of a higher energy density than for laser drying. Typical sinter values are 50-100 kW/cm 2 .
- the layer After sintering a reduction of the layer thickness to approximately 0.2 micron is observed. The sectional dimension of the layer is substantially equal to that of the originally provided droplet. After sintering, a viscous layer is obtained, which is a typical property of SiC ⁇ . The layer actually consists of a continuous, non-porous quartz-glass layer.
- a commercially available ink jet printer, as described in example 1, is used to form a pattern of a particle-charged liquid on a glass substrate.
- Said liquid comprises a sol-gel solution of TEOTi (tetraethyl orthotitanate) in ethanol, which hydrolyzes slowly, thereby forming particles. Evaporation of the liquid takes place by previously heating the support to a temperature of 95 °C.
- the amorphous, dried layer has a thickness of approximately 0.25 micrometer and consists of a porous network.
- the layer is sintered with a CO 2 pulse laser having an energy density of approximately 10 kW/cm 2 for approximately 10 microseconds. In this process, a crystalline TiO 2 layer is formed, whose thickness has decreased to approximately 0.04 micrometer. The porosity of the layer decreases to only a few percent.
- the invention relates to a method of manufacturing a sintered structure on a substrate.
- a particle-charged liquid is provided on the substrate by means of a (multiple print head) ink jet printer.
- the liquid is evaporated and the particles contained therein are sintered layer by layer.
- Said layer-by-layer laser sintering enables 3-dimensional products having a relatively high dimensional accuracy to be manufactured.
- evaporation of the liquid also takes place by means of (the same or) a laser.
- the liquid preferably comprises particles of glass, ceramics or metal compounds in the form of a sol-gel solution or a colloidal sol.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE69700945T DE69700945T2 (en) | 1996-04-17 | 1997-03-21 | METHOD FOR PRODUCING A SINTERED STRUCTURE ON A SUBSTRATE |
JP53689697A JP4346684B2 (en) | 1996-04-17 | 1997-03-21 | Method for manufacturing sintered body on substrate |
EP97906829A EP0847314B1 (en) | 1996-04-17 | 1997-03-21 | Method of manufacturing a sintered structure on a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96201003 | 1996-04-17 | ||
EP96201003.9 | 1996-04-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1997038810A1 true WO1997038810A1 (en) | 1997-10-23 |
Family
ID=8223874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB1997/000281 WO1997038810A1 (en) | 1996-04-17 | 1997-03-21 | Method of manufacturing a sintered structure on a substrate |
Country Status (5)
Country | Link |
---|---|
US (1) | US6531191B1 (en) |
EP (1) | EP0847314B1 (en) |
JP (1) | JP4346684B2 (en) |
DE (1) | DE69700945T2 (en) |
WO (1) | WO1997038810A1 (en) |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GR1003732B (en) | 2000-12-29 | 2001-12-11 | Εταιρεια Στηριξης Ερευνας Τεχνολογιας & Εκπαιδευσης (Εσετε) | Method and system of automated indelible color decoration on ceramics and glass |
US6348295B1 (en) * | 1999-03-26 | 2002-02-19 | Massachusetts Institute Of Technology | Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging |
EP1266878A1 (en) * | 2001-06-15 | 2002-12-18 | Technische Universität Clausthal | Method and device for the manufacturing of ceramic bodies |
US6531191B1 (en) * | 1996-04-17 | 2003-03-11 | Koninklijke Philips Electronics N.V. | Method of manufacturing a sintered structure on a substrate |
EP1452326A2 (en) * | 2003-02-26 | 2004-09-01 | Seiko Epson Corporation | Method and apparatus for fixing a functional material onto a surface |
WO2004091834A1 (en) * | 2003-04-15 | 2004-10-28 | Petaejaejaervi Aila | Electronic component and its fabrication by selective laser sintering |
US6936181B2 (en) | 2001-10-11 | 2005-08-30 | Kovio, Inc. | Methods for patterning using liquid embossing |
US6957608B1 (en) | 2002-08-02 | 2005-10-25 | Kovio, Inc. | Contact print methods |
WO2007014631A2 (en) * | 2005-08-03 | 2007-02-08 | Schott Ag | Substrate comprising at least one entire surface or partial surface macrostructured layer, method for the production thereof and its use |
WO2007038950A1 (en) | 2005-09-28 | 2007-04-12 | Stichting Dutch Polymer Institute | Method for generation of metal surface structures and apparatus therefor |
WO2008132000A1 (en) * | 2007-04-30 | 2008-11-06 | Nokia Corporation | Method for forming a semiconductor structure |
WO2016130709A1 (en) * | 2015-02-10 | 2016-08-18 | Optomec, Inc. | Fabrication of three-dimensional structures by in-flight curing of aerosols |
EP3106247A1 (en) * | 2015-06-16 | 2016-12-21 | Seiko Epson Corporation | Three-dimensional manufacturing apparatus and three-dimensional manufacturing method |
US9607889B2 (en) | 2004-12-13 | 2017-03-28 | Optomec, Inc. | Forming structures using aerosol jet® deposition |
US10562805B2 (en) | 2015-06-23 | 2020-02-18 | AGC Inc. | Sintered formed body and manufacturing method thereof, article having sintered formed body, sintered formed body material, and pre-sintering formed body and manufacturing method thereof |
US10632746B2 (en) | 2017-11-13 | 2020-04-28 | Optomec, Inc. | Shuttering of aerosol streams |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5989945A (en) * | 1996-05-15 | 1999-11-23 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device |
US8568684B2 (en) * | 2000-10-17 | 2013-10-29 | Nanogram Corporation | Methods for synthesizing submicron doped silicon particles |
US20090075083A1 (en) | 1997-07-21 | 2009-03-19 | Nanogram Corporation | Nanoparticle production and corresponding structures |
US6599631B2 (en) | 2001-01-26 | 2003-07-29 | Nanogram Corporation | Polymer-inorganic particle composites |
US7226966B2 (en) | 2001-08-03 | 2007-06-05 | Nanogram Corporation | Structures incorporating polymer-inorganic particle blends |
US7765022B2 (en) * | 1998-06-30 | 2010-07-27 | The P.O.M. Group | Direct metal deposition apparatus utilizing rapid-response diode laser source |
JP4039035B2 (en) | 2001-10-31 | 2008-01-30 | セイコーエプソン株式会社 | Line pattern forming method, line pattern, electro-optical device, electronic device, non-contact card medium |
JP4068883B2 (en) * | 2002-04-22 | 2008-03-26 | セイコーエプソン株式会社 | Method for forming conductive film wiring, method for manufacturing film structure, method for manufacturing electro-optical device, and method for manufacturing electronic apparatus |
EP1613566B1 (en) * | 2003-04-04 | 2018-05-30 | Siemens Aktiengesellschaft | Method for producing ceramic molds and the molds formed by the method |
ES2246720B1 (en) * | 2004-08-02 | 2006-11-01 | Universitat De Valencia | PROCEDURE FOR WATERPROOFING OF SURFACES OF POROUS CERAMIC MATERIALS, THROUGH LASER RADIATION TREATMENT OF SUCH SURFACES PREVIOUSLY IMPREGNATED WITH A CHEMICAL PREPARING SOLUTION OF GLASS FORMING OXIDES. |
US20080258067A1 (en) * | 2004-08-20 | 2008-10-23 | Koninklijke Philips Electronics N.V. | Microelectronic System with a Passivation Layer |
CA2584104C (en) * | 2004-10-19 | 2012-12-11 | Rolls-Royce Corporation | Method and apparatus associated with anisotropic shrink in sintered ceramic items |
JP4311364B2 (en) * | 2005-03-18 | 2009-08-12 | セイコーエプソン株式会社 | Droplet discharge device |
JP4609846B2 (en) * | 2005-03-25 | 2011-01-12 | 古河電気工業株式会社 | Method for producing metal fired body, metal particle firing material used therefor, and wiring pattern obtained thereby |
GB0511460D0 (en) * | 2005-06-06 | 2005-07-13 | Univ Liverpool | Process |
DE102006030822A1 (en) * | 2006-06-30 | 2008-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Metal for fabricating metal contact structure of solar cell, involves strengthening metallic contact structure in electrolytic bath |
US20070193675A1 (en) * | 2006-02-22 | 2007-08-23 | Abhijit Gurav | Process of manufacturing a multilayer device and device manufactured thereby |
DE102006015014B4 (en) * | 2006-03-31 | 2008-07-24 | Uibel, Krishna, Dipl.-Ing. | Process for producing three-dimensional ceramic shaped bodies |
WO2008085806A1 (en) * | 2007-01-03 | 2008-07-17 | Nanogram Corporation | Nanoparticle inks based on silicon/germanium, doped particles, printing and processes for semiconductor applications |
EP1993228B1 (en) * | 2007-05-18 | 2012-05-23 | Huawei Technologies Co., Ltd. | Message sending method, message sending device and message transmission system |
US20090004368A1 (en) * | 2007-06-29 | 2009-01-01 | Weyerhaeuser Co. | Systems and methods for curing a deposited layer on a substrate |
US8447530B2 (en) * | 2008-01-11 | 2013-05-21 | The Boeing Company | High density structural health monitoring system and method |
US8463116B2 (en) | 2008-07-01 | 2013-06-11 | Tap Development Limited Liability Company | Systems for curing deposited material using feedback control |
US8991211B1 (en) | 2009-11-01 | 2015-03-31 | The Exone Company | Three-dimensional printing glass articles |
JP5184584B2 (en) * | 2010-06-21 | 2013-04-17 | 古河電気工業株式会社 | Method for forming metal wiring pattern, metal wiring pattern, metal wiring board, and metal particles and substrate for forming metal wiring pattern |
US8895962B2 (en) | 2010-06-29 | 2014-11-25 | Nanogram Corporation | Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods |
CN103189164B (en) | 2010-11-01 | 2016-07-06 | 3M创新有限公司 | For preparing the laser method of shaped ceramic abrasive particle, shaped ceramic abrasive particle and abrasive product |
ITRM20110184A1 (en) * | 2011-04-12 | 2012-10-13 | Dyepower | PROCESS OF SINTERIZATION OF METALLIC OXID BASED FORMULATIONS. |
JP5891782B2 (en) * | 2011-12-27 | 2016-03-23 | 株式会社リコー | Thin film manufacturing apparatus, thin film manufacturing method, liquid droplet ejection head, and ink jet recording apparatus |
US9475695B2 (en) | 2013-05-24 | 2016-10-25 | Nanogram Corporation | Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents |
CN103407296A (en) * | 2013-07-29 | 2013-11-27 | 南京鼎科纳米技术研究所有限公司 | Method for achieving high-melting-point material 3D printing through nanometer ink together with laser melting |
IL294425B2 (en) | 2013-10-17 | 2023-09-01 | Xjet Ltd | Support ink for three dimensional (3d) printing |
JP6478212B2 (en) * | 2013-10-24 | 2019-03-06 | 株式会社リコー | Three-dimensional structure modeling method and three-dimensional structure modeling apparatus |
JP6060911B2 (en) * | 2014-01-21 | 2017-01-18 | トヨタ自動車株式会社 | Stator manufacturing method |
CN104226997A (en) * | 2014-09-12 | 2014-12-24 | 徐海锋 | 3D (three-dimensional) metal printing method |
US20170348903A1 (en) * | 2015-02-10 | 2017-12-07 | Optomec, Inc. | Fabrication of Three-Dimensional Materials Gradient Structures by In-Flight Curing of Aerosols |
DE102015110360A1 (en) * | 2015-06-26 | 2016-12-29 | Bundesrepublik Deutschland, Vertreten Durch Den Bundesminister Für Wirtschaft Und Energie, Dieser Vertreten Durch Den Präsidenten Der Bundesanstalt Für Materialforschung Und -Prüfung (Bam) | Method for laser-induced additive production of a green body by means of slip casting |
JP6994295B2 (en) | 2015-12-17 | 2022-01-14 | セイコーエプソン株式会社 | 3D model manufacturing method and 3D model manufacturing equipment |
DE102016219088B4 (en) | 2016-09-30 | 2019-10-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for the additive production of components or the formation of coatings on surfaces of components |
US20180127297A1 (en) * | 2016-11-10 | 2018-05-10 | Goodrich Corporation | Powder bed additive manufacturing of low expansion glass |
US10798783B2 (en) * | 2017-02-15 | 2020-10-06 | Continuous Composites Inc. | Additively manufactured composite heater |
TWI615448B (en) * | 2017-05-25 | 2018-02-21 | Donbon Paints Industrial Co Ltd | Method for preparing metal colloid for laser sintering molding |
CN107473570A (en) * | 2017-08-11 | 2017-12-15 | 西安工业大学 | Colloidal sol prepares device of optical element and preparation method thereof |
JP2020100885A (en) * | 2018-12-25 | 2020-07-02 | エルジー・ケム・リミテッド | Molding apparatus and production method of molded body |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4665492A (en) * | 1984-07-02 | 1987-05-12 | Masters William E | Computer automated manufacturing process and system |
US5204055A (en) * | 1989-12-08 | 1993-04-20 | Massachusetts Institute Of Technology | Three-dimensional printing techniques |
US5284695A (en) * | 1989-09-05 | 1994-02-08 | Board Of Regents, The University Of Texas System | Method of producing high-temperature parts by way of low-temperature sintering |
US5302412A (en) * | 1989-02-03 | 1994-04-12 | The Boc Group, Inc. | Single atmosphere for firing compatible thick film material |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH068493B2 (en) * | 1986-04-22 | 1994-02-02 | 三菱電機株式会社 | Noble metal coating method |
US5076869A (en) * | 1986-10-17 | 1991-12-31 | Board Of Regents, The University Of Texas System | Multiple material systems for selective beam sintering |
US4997809A (en) * | 1987-11-18 | 1991-03-05 | International Business Machines Corporation | Fabrication of patterned lines of high Tc superconductors |
US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
BE1004844A7 (en) * | 1991-04-12 | 1993-02-09 | Laude Lucien Diego | Metallisation methods surface using metal powder. |
US5188902A (en) * | 1991-05-30 | 1993-02-23 | Northern Illinois University | Production of PT/PZT/PLZI thin films, powders, and laser `direct write` patterns |
US5314003A (en) * | 1991-12-24 | 1994-05-24 | Microelectronics And Computer Technology Corporation | Three-dimensional metal fabrication using a laser |
FR2688803B1 (en) * | 1992-03-23 | 1994-05-06 | European Gas Turbines Sa | METHOD FOR COATING A NOTCH OF A NICKEL ALLOY PIECE BY LASER. |
US5688564A (en) * | 1992-07-23 | 1997-11-18 | Institut Polytechnique De Sevenans | Process for the preparation and coating of a surface |
DE69700945T2 (en) * | 1996-04-17 | 2000-07-20 | Koninkl Philips Electronics Nv | METHOD FOR PRODUCING A SINTERED STRUCTURE ON A SUBSTRATE |
-
1997
- 1997-03-21 DE DE69700945T patent/DE69700945T2/en not_active Expired - Lifetime
- 1997-03-21 WO PCT/IB1997/000281 patent/WO1997038810A1/en active IP Right Grant
- 1997-03-21 EP EP97906829A patent/EP0847314B1/en not_active Expired - Lifetime
- 1997-03-21 JP JP53689697A patent/JP4346684B2/en not_active Expired - Lifetime
- 1997-04-16 US US08/834,410 patent/US6531191B1/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4665492A (en) * | 1984-07-02 | 1987-05-12 | Masters William E | Computer automated manufacturing process and system |
US5302412A (en) * | 1989-02-03 | 1994-04-12 | The Boc Group, Inc. | Single atmosphere for firing compatible thick film material |
US5284695A (en) * | 1989-09-05 | 1994-02-08 | Board Of Regents, The University Of Texas System | Method of producing high-temperature parts by way of low-temperature sintering |
US5204055A (en) * | 1989-12-08 | 1993-04-20 | Massachusetts Institute Of Technology | Three-dimensional printing techniques |
Non-Patent Citations (1)
Title |
---|
JOURNAL OF MATERIALS SCIENCE LETTERS, Volume 14, 1995, BLAZDELL P.F. et al., "The Computer Aided Manufacture of Ceramics Using Multilayer Jet Printing". * |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6531191B1 (en) * | 1996-04-17 | 2003-03-11 | Koninklijke Philips Electronics N.V. | Method of manufacturing a sintered structure on a substrate |
US6348295B1 (en) * | 1999-03-26 | 2002-02-19 | Massachusetts Institute Of Technology | Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging |
US6664027B2 (en) | 1999-03-26 | 2003-12-16 | Massachusetts Institute Of Technology | Methods and apparatus for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging |
GR1003732B (en) | 2000-12-29 | 2001-12-11 | Εταιρεια Στηριξης Ερευνας Τεχνολογιας & Εκπαιδευσης (Εσετε) | Method and system of automated indelible color decoration on ceramics and glass |
EP1266878A1 (en) * | 2001-06-15 | 2002-12-18 | Technische Universität Clausthal | Method and device for the manufacturing of ceramic bodies |
US6827988B2 (en) * | 2001-06-15 | 2004-12-07 | Technische Universitat Clausthal | Process and a device for producing ceramic molds |
US6936181B2 (en) | 2001-10-11 | 2005-08-30 | Kovio, Inc. | Methods for patterning using liquid embossing |
US6957608B1 (en) | 2002-08-02 | 2005-10-25 | Kovio, Inc. | Contact print methods |
EP1452326A2 (en) * | 2003-02-26 | 2004-09-01 | Seiko Epson Corporation | Method and apparatus for fixing a functional material onto a surface |
EP1452326A3 (en) * | 2003-02-26 | 2006-01-25 | Seiko Epson Corporation | Method and apparatus for fixing a functional material onto a surface |
WO2004091834A1 (en) * | 2003-04-15 | 2004-10-28 | Petaejaejaervi Aila | Electronic component and its fabrication by selective laser sintering |
US9607889B2 (en) | 2004-12-13 | 2017-03-28 | Optomec, Inc. | Forming structures using aerosol jet® deposition |
WO2007014631A3 (en) * | 2005-08-03 | 2008-03-13 | Schott Ag | Substrate comprising at least one entire surface or partial surface macrostructured layer, method for the production thereof and its use |
WO2007014631A2 (en) * | 2005-08-03 | 2007-02-08 | Schott Ag | Substrate comprising at least one entire surface or partial surface macrostructured layer, method for the production thereof and its use |
WO2007038950A1 (en) | 2005-09-28 | 2007-04-12 | Stichting Dutch Polymer Institute | Method for generation of metal surface structures and apparatus therefor |
US8575591B2 (en) | 2007-04-30 | 2013-11-05 | Nokia Corporation | Apparatus for forming a nanoscale semiconductor structure on a substrate by applying a carrier fluid |
WO2008132000A1 (en) * | 2007-04-30 | 2008-11-06 | Nokia Corporation | Method for forming a semiconductor structure |
WO2016130709A1 (en) * | 2015-02-10 | 2016-08-18 | Optomec, Inc. | Fabrication of three-dimensional structures by in-flight curing of aerosols |
US10994473B2 (en) | 2015-02-10 | 2021-05-04 | Optomec, Inc. | Fabrication of three dimensional structures by in-flight curing of aerosols |
EP3106247A1 (en) * | 2015-06-16 | 2016-12-21 | Seiko Epson Corporation | Three-dimensional manufacturing apparatus and three-dimensional manufacturing method |
US10376957B2 (en) | 2015-06-16 | 2019-08-13 | Seiko Epson Corporation | Three-dimensional forming apparatus and three-dimensional forming method |
US10625339B2 (en) | 2015-06-16 | 2020-04-21 | Seiko Epson Corporation | Three-dimensional forming apparatus and three-dimensional forming method |
US10562805B2 (en) | 2015-06-23 | 2020-02-18 | AGC Inc. | Sintered formed body and manufacturing method thereof, article having sintered formed body, sintered formed body material, and pre-sintering formed body and manufacturing method thereof |
US10632746B2 (en) | 2017-11-13 | 2020-04-28 | Optomec, Inc. | Shuttering of aerosol streams |
US10850510B2 (en) | 2017-11-13 | 2020-12-01 | Optomec, Inc. | Shuttering of aerosol streams |
Also Published As
Publication number | Publication date |
---|---|
DE69700945D1 (en) | 2000-01-20 |
EP0847314A1 (en) | 1998-06-17 |
DE69700945T2 (en) | 2000-07-20 |
US6531191B1 (en) | 2003-03-11 |
JPH11508326A (en) | 1999-07-21 |
EP0847314B1 (en) | 1999-12-15 |
JP4346684B2 (en) | 2009-10-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0847314B1 (en) | Method of manufacturing a sintered structure on a substrate | |
KR101530733B1 (en) | Laser Decal Transfer of Electronic Materials | |
EP2007698B1 (en) | Method for producing three-dimensional ceramic mouldings | |
EP1594625A1 (en) | Method for coating particles for generative prototyping processes | |
DE112015003337T5 (en) | ADDITIVE MANUFACTURE BY MEANS OF LASER AND GAS FLOW | |
DE19545455C1 (en) | Precious metal powder prodn. esp. for screen printing paste | |
DE2745581A1 (en) | METHOD FOR MANUFACTURING MULTI-LAYER CERAMIC SUBSTRATES | |
DE10018697A1 (en) | Production of inorganic glass or ceramic coated substrates, useful as optical or electronic components, comprises application of nanoscale particles and water soluble organic plasticizers | |
US20070247782A1 (en) | Dielectric device | |
TWI385220B (en) | Conductive pattern formation ink,conductive pattern and wiring substrate | |
EP1330841B1 (en) | Method for assembling planar workpieces | |
JP2000063901A (en) | Powder material, its production, thick film electrically conductive paste using the power material and laminated ceramic capacitor using the paste | |
EP0757025B1 (en) | Process for forming a film on a ceramic substrate | |
DE4446533C1 (en) | Ceramic composites prodn. with improved interlayer adhesion | |
DE10354964A1 (en) | Piezoelectric ceramic and method of manufacturing the same, actuator and method of manufacturing the same, printhead and ink jet printer | |
DE102015108646A1 (en) | Method for producing ceramic multilayer circuit carriers based on a slip-based additive manufacturing | |
Akedo et al. | Fine patterning of ceramic thick layer on aerosol deposition by lift-off process using photoresist | |
Mihara et al. | Controlling factors of film-thickness in improved aerosol deposition method | |
DE19643148C2 (en) | Manufacturing process for ceramic bodies with microstructure and uses | |
JP2008068258A (en) | Method for producing porous combined structure and porous fine particle to be used for the production | |
EP4010913A1 (en) | Method for producing a printed magnetic functional element, and printed magnetic functional element | |
JP3355372B2 (en) | Laser thin film formation method | |
KR100890006B1 (en) | PZT based piezoelectric thick film containing organic materials and nano pore, and preparation method thereof | |
DE10019422A1 (en) | Aqueous composition for application to a substrate in the electronic, ceramic or optical sectors, comprises a sol, a solvent having a b. pt. greater than 200 degrees centigrade and a compatible water-soluble polymer | |
KR101377743B1 (en) | Method of fabricating micro/nano dual structure on the subject surface using electric discharge machining |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): JP |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1997906829 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 1997 536896 Kind code of ref document: A Format of ref document f/p: F |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWP | Wipo information: published in national office |
Ref document number: 1997906829 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 1997906829 Country of ref document: EP |