WO1996022506A1 - An optical device and a method of utilizing such device for optically examining objects - Google Patents
An optical device and a method of utilizing such device for optically examining objects Download PDFInfo
- Publication number
- WO1996022506A1 WO1996022506A1 PCT/US1996/000791 US9600791W WO9622506A1 WO 1996022506 A1 WO1996022506 A1 WO 1996022506A1 US 9600791 W US9600791 W US 9600791W WO 9622506 A1 WO9622506 A1 WO 9622506A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- diffraction
- optical device
- examined
- further including
- collimated
- Prior art date
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/60—Systems using moiré fringes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0228—Testing optical properties by measuring refractive power
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
Definitions
- the present invention relates to optical devices and also to a method of utilizing such devices for optically examining objects.
- a more recent approach for optically examining objects is based on moire deflectometry.
- a collimated beam deflected from the object is used to generate a moire pattern by directing the collimated beam through first and second gratings at a preselected angular orientation and separation with respect to one another, the moire pattern so produced providing an
- the present invention provides an optical device, and a method of testing utilizing such optical device, which combine the high accuracy of interferometry with the tunable sensitivity and the high stability of the moire
- an optical device characterized in that it includes a diffraction phase grating
- the evanescent wave phenomenon and cancellation of the zero order are both well known phenomena; see for example "Introduction to Fourier Optics", by Joseph Goodman, pages 50-51 and 69-70.
- the invention as will be described more particularly below, resides in the combination of the above two effects to produce a grating with just two
- the optical device described below includes two such diffraction gratings in tandem.
- the optical device is a shearing interferometer, or more
- Such an interferometer provides a number of important advantages when used for optically examining objects as will be
- Fig. 1 is a diagram illustrating the operation of a classic moire deflectometer
- Fig. 2 illustrates the diffraction orders of one grid as observed on the second grid in the moire
- Fig. 3 illustrates the diffraction orders in a shearing interferometer
- Fig. 4 is a diagram illustrating a square wave phase grating
- Fig. 5 is a diagram illustrating the diffraction orders produced by two gratings having a pitch of between two and three wavelengths;
- Fig. 6 is a diagram illustrating a clean
- Fig. 7 illustrates one form of shearing device constructed in accordance with the present invention
- Figs. 8-10 illustrate three further forms of shearing devices constructed in accordance with the
- the moire deflectometer (Patent No. USA 4,459,027, French Patent 8,120,331) is a practical tool for examining optical components and other phase objects in the medium to low accuracy range.
- the most basic configuration comprises two square-wave transmission gratings perpendicular to the optical axis with a gap "d" between them (Fig. 1).
- a simple description ignoring diffraction effects considers the geometric shadow of grating G1 on grating G2 observed with a collimated beam incident on grating G1 from the left.
- grating G2 is slightly rotated around the optical axis with respect to grating G1, a pattern of straight equidistant fringes (called tilt
- fringes normal to the bisector of the angle between the directions of gratings G1 and G2 will be seen. Insertion of a test object, such as a lens or an imperfect glass sheet, will spoil the beam collimation causing various rays to propagate in different directions thus producing distorted fringes. Analysis of the fringe data provides valuable information on the optical properties and aberrations of the test object. Many applications of this technique, including testing of reflective surfaces, are reported in the literature.
- a serious disadvantage of the moire deflectometer is the effect of diffraction.
- a wave description of the system considers grating G1 as a source of multiple beams travelling in the directions of the various diffraction orders.
- the field at grating G2 is dominated by
- the fringe contrast is not perfect and depends locally on the number of diffraction orders contributing at each point.
- the fringe shifts are the phase differences between two points separated by the shear distance 2 ⁇ d/p [or with large angles 2 ⁇ d(p 2 - ⁇ 2 ) -1/2 ] , which is the spatial resolution of the method. It is seen here that the sensitivity cannot be increased indefinitely since when the shear is larger than the aperture, the circular areas will no longer overlap. This constraint is called the diffraction limited
- the fringes of the shearing interferometer do not suffer from the multiple diffraction effects because they are formed by just two beams.
- the gap "d" between the gratings may be arbitrary, and the fringes are sharp and well-defined even when the object exhibits severe
- the spatial resolution of the moire deflectometer is limited from below by the pitch "p” , which suggests the use of gratings with the smallest possible "p".
- pitch "p" is below about 25 microns
- the Talbot planes become so close together such as to make the position of grating G2 at an exact Talbot plane very difficult.
- the aberrations of the test object cause the Talbot plane to distort because of local deviations, such that the
- the shearing interferometer is free from this limitation, and one can select any shear (or sensitivity) value from zero (touching gratings) to the diffraction limit.
- any shear (or sensitivity) value from zero (touching gratings) to the diffraction limit.
- interferometer is that there is no known configuration which attains all the advantages of the moire deflectometer, especially the ease of construction, tunable sensitivity and tilt, and low susceptibility to noise.
- the commercial uses of the shearing interferometer are practically null compared to the widespread use of the moire deflectometer, especially in the ophthalmic industry.
- the present invention achieves the flexibility of the moire deflectometer with gratings of pitch (p) much smaller than hitherto possible, limited from below only by the wavelength ⁇ of the radiation used.
- the new technique eliminates also unwanted orders from the second grating, so that the interference pattern can be observed directly without the diffusive screen.
- a square wave phase grating (Fig. 4) has a phase difference ⁇ ⁇ between the two half-periods proportional to the optical path difference determined by the height
- the phase difference between the half periods is " ⁇ ".
- the wavefront is described by a square wave extending from - ⁇ /2 to + ⁇ /2, this contrasts the situation with an amplitude transmission square wave grating, whose two sections are given by ⁇ and 0.
- the average value of the phase grating wavefront is zero, while that of the amplitude grating is ⁇ /2.
- phase grating produces no zero order.
- Zero order cancellation can be achieved not only by square waves, but also with other phase profiles, such as a sine wave.
- the two effects namely the evanescent wave phenomenon, and zero order cancellation by a phase grating. combine to produce a novel kind of diffraction grating, which produces two diffration orders exclusively. These two orders are of equal magnitude, and propagate symmetrically on either side of the optical axis.
- a second beam corresponding to -1 and +1, respectively, also travels in the forward direction and combines with the first to produce the desired interference pattern (Fig. 6).
- the interference fringes produced by this device are the loci of points whose wavefront values at the two points separated by the distance s, differ by an amount equal to an integral number of wavelengths.
- one fringe shift corresponds to a sutation
- fringes are contours where the derivative is:
- the new shearcmeter is at least twice as sensitive as the standard moire deflectometer.
- the ease with which the sensitivity and tilt can be tuned is preserved.
- the moire deflectometer employs a diffusive screen attached to grating G2 to prevent diffraction effects originating in that grating.
- the camera used to view the pattern must be focused on the screen.
- the diffusive screen should be optically conjugate to the object.
- Fig. 7 illustrates, for purposes of example, one form of shearing device constructed in accordance with the present invention.
- the device illustrated in Fig. 7 is a configuration where the shearometer module (which comprises the two phase gratings in tandem as described above) is used to characterize the optical parameters of transparent objects.
- the shearing device illustrated in Fig. 7 includes a diode laser 2 producing a beam of coherent light which is expanded by a beam expander 4.
- the expanded collimated beam is directed toward the tested object which may be a sheet of glass, a lens, or any transparent object which may change the degree of beam collimation.
- the beam coming out of the tested object is directed toward the shearometer module, including a pair of diffraction gratings G 1 , G 2 , which produce an output in the form of a fringe pattern recorded in camera 10. Analysis of the fringe pattern indicates the extent to which the tested object has changed the beam collimation, and thereby indicates the optical properties of the tested object.
- Fig. 8 illustrates an example wherein the tested object 6' is a diverging (negative) lens. This lens
- the shearometer converts the collimated beam into a diverging spherical beam.
- the shearometer responds to this spherical beam by tilting the fringes so that they form an angle with respect to the direction of the unperturbed fringes displayed when the beam is collimated.
- the slope of the fringes is
- Fig. 8 also illustrates the alternative wherein the diode laser light source can be moved backward, e.g., by a motor schematically indicated at M 1 , until a point is reached where the beam exiting the tested lens and entering the shearometer is once again collimated.
- the distance by which the source has moved is used to calculate the power of the lens.
- the correct position is detected by observing the fringes and noting the location where the fringes return to the original position. Any difference betwen the resulting fringes and the unperturbed fringes (such as curved as opposed to the straight equidistant unperturbed fringes) is indicatative of aberrations or imperfections in the tested lens.
- a reference fringe pattern is recovered by moving the source forward to the position where the beam entering the shearometer is once again collimated.
- the shearometer can detect non-parallelism in a nominally flat transparent sheet, non-iniformities in the material, etc.
- Fig. 9 illustrates the use of the shearometer to measure deviations of reflective surfaces from a flat surface, such as roughness, waviness and strain.
- the collimated expanded beam from the light source 12 and beam expander 14 is directed toward a beam splitter 15.
- the part of the beam that passes through is reflected by the tested surface 16.
- the reflected beam is once again divided by the beam splitter 15 into a part which continues in the original direction, and a second part reflected at right angles.
- the latter part is directed toward the shearometer module, including the part of diffraction gratings G 1 , G 2 , and the camera 20. Any changes in fringe postion is proportional to the local slope of the tested object.
- the surface is slightly curved in the form of a spherical section with a small curvature.
- the reflected beam is diverging or converging instead of parallel, and the
- Fig. 10 illustrates another apparatus based on the same principle used to measure the curvatures of spherical or near spherical surfaces.
- the collimated beam from the light source 22 and beam expander 24 exiting from the beam splitter 25 is converged by an objective lens 23 and is directed toward the tested surface 26.
- the shearometer unit can be used to measure the optical transfer function (OTF) or its modulus
- MTF modulation transfer function
- FIG. 8 An example for the operation of an OTF measuring instrument can be described with reference to Fig. 8 above.
- the only modifications required to the setup of Fig. 8 is the addition of a means (such as a motor shown schematically at M 2 ) for continuously changing the gap d between the two gratings G 1 , G 2 in the shearometer module. Motor M 2 may also change the angle between the gratings.
- the OTF is constructed by evaluating the intensity over the overlap area as a function of d.
- a related quantity, called through focus MTF can be calculated by fixing d to a prescribed value, and sliding the laser source around the point where the beam entering the shearometer is recollimated.
- the MTF value is lower, so that the best focus is found at the maximum of the through focus MTF curve.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8522418A JPH10512955A (en) | 1995-01-19 | 1996-01-19 | Optical device and method for using the device for optical inspection of objects |
AU49006/96A AU4900696A (en) | 1995-01-19 | 1996-01-19 | An optical device and a method of utilizing such device for optically examining objects |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL112395 | 1995-01-19 | ||
IL11239595A IL112395A (en) | 1995-01-19 | 1995-01-19 | Optical device and a method of utilizing such device for optically examining objects |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1996022506A1 true WO1996022506A1 (en) | 1996-07-25 |
Family
ID=11067016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1996/000791 WO1996022506A1 (en) | 1995-01-19 | 1996-01-19 | An optical device and a method of utilizing such device for optically examining objects |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH10512955A (en) |
AU (1) | AU4900696A (en) |
IL (1) | IL112395A (en) |
WO (1) | WO1996022506A1 (en) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6704112B1 (en) | 2000-10-17 | 2004-03-09 | The Regents Of The University Of California | Application of the phase shifting diffraction interferometer for measuring convex mirrors and negative lenses |
WO2004093667A1 (en) * | 2003-03-25 | 2004-11-04 | Bausch & Lomb Incorporated | Moiré aberrometer |
CN102494872A (en) * | 2011-11-15 | 2012-06-13 | 中国科学院紫金山天文台 | Method for measuring pointing error of astronomical telescope in real time |
US8333474B2 (en) | 2007-10-19 | 2012-12-18 | Wavetec Vision Systems, Inc. | Optical instrument alignment system |
US8876290B2 (en) | 2009-07-06 | 2014-11-04 | Wavetec Vision Systems, Inc. | Objective quality metric for ocular wavefront measurements |
US9072462B2 (en) | 2012-09-27 | 2015-07-07 | Wavetec Vision Systems, Inc. | Geometric optical power measurement device |
US9107612B2 (en) | 2004-04-20 | 2015-08-18 | Wavetec Vision Systems, Inc. | Integrated surgical microscope and wavefront sensor |
US9168127B2 (en) | 2003-04-10 | 2015-10-27 | Wavetec Vision Systems, Inc. | Intraoperative estimation of intraocular lens power |
US9259149B2 (en) | 2009-07-14 | 2016-02-16 | Wavetec Vision Systems, Inc. | Ophthalmic surgery measurement system |
US9295381B2 (en) | 2007-10-31 | 2016-03-29 | Wavetec Vision Systems, Inc. | Wavefront sensor |
US9307904B2 (en) | 2008-11-06 | 2016-04-12 | Wavetec Vision Systems, Inc. | Optical angular measurement system for ophthalmic applications and method for positioning of a toric intraocular lens with increased accuracy |
CN105842197A (en) * | 2016-03-21 | 2016-08-10 | 南京信息工程大学 | Luminous flow field diagnostic system and structure display and parameter measurement method |
US9554697B2 (en) | 2009-07-14 | 2017-01-31 | Wavetec Vision Systems, Inc. | Determination of the effective lens position of an intraocular lens using aphakic refractive power |
CN106767542A (en) * | 2016-12-28 | 2017-05-31 | 中国科学院长春光学精密机械与物理研究所 | A kind of contactless torsion angle measuring system and measuring method |
WO2017099843A1 (en) * | 2015-12-08 | 2017-06-15 | Kla-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
Families Citing this family (3)
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EP1590696A2 (en) * | 2003-01-28 | 2005-11-02 | Oraxion | Full-filled optical measurements of surface properties of panels, substrates and wafers |
JP4629372B2 (en) * | 2004-06-29 | 2011-02-09 | パナソニック株式会社 | Lens wavefront aberration inspection method and lens wavefront aberration inspection apparatus used therefor |
US9784570B2 (en) * | 2015-06-15 | 2017-10-10 | Ultratech, Inc. | Polarization-based coherent gradient sensing systems and methods |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US4670646A (en) * | 1985-06-12 | 1987-06-02 | Western Research Corporation | Laser wavefront measurement device utilizing crossed Ronchi gratings |
US5046843A (en) * | 1989-08-11 | 1991-09-10 | Rotlex Optics Ltd. | Method and apparatus for measuring the three-dimensional orientation of a body in space |
US5122903A (en) * | 1989-03-15 | 1992-06-16 | Omron Corporation | Optical device and optical pickup device using the same |
-
1995
- 1995-01-19 IL IL11239595A patent/IL112395A/en not_active IP Right Cessation
-
1996
- 1996-01-19 AU AU49006/96A patent/AU4900696A/en not_active Abandoned
- 1996-01-19 WO PCT/US1996/000791 patent/WO1996022506A1/en active Application Filing
- 1996-01-19 JP JP8522418A patent/JPH10512955A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670646A (en) * | 1985-06-12 | 1987-06-02 | Western Research Corporation | Laser wavefront measurement device utilizing crossed Ronchi gratings |
US5122903A (en) * | 1989-03-15 | 1992-06-16 | Omron Corporation | Optical device and optical pickup device using the same |
US5046843A (en) * | 1989-08-11 | 1991-09-10 | Rotlex Optics Ltd. | Method and apparatus for measuring the three-dimensional orientation of a body in space |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6704112B1 (en) | 2000-10-17 | 2004-03-09 | The Regents Of The University Of California | Application of the phase shifting diffraction interferometer for measuring convex mirrors and negative lenses |
WO2004093667A1 (en) * | 2003-03-25 | 2004-11-04 | Bausch & Lomb Incorporated | Moiré aberrometer |
US9168127B2 (en) | 2003-04-10 | 2015-10-27 | Wavetec Vision Systems, Inc. | Intraoperative estimation of intraocular lens power |
US9445890B2 (en) | 2003-04-10 | 2016-09-20 | Wavetec Vision Systems, Inc. | Intraoperative estimation of intraocular lens power |
US9420949B2 (en) | 2004-04-20 | 2016-08-23 | Wavetec Vision Systems, Inc. | Integrated surgical microscope and wavefront sensor |
US9107612B2 (en) | 2004-04-20 | 2015-08-18 | Wavetec Vision Systems, Inc. | Integrated surgical microscope and wavefront sensor |
US9713420B2 (en) | 2007-10-19 | 2017-07-25 | Novartis Ag | Optical instrument alignment system |
US8333474B2 (en) | 2007-10-19 | 2012-12-18 | Wavetec Vision Systems, Inc. | Optical instrument alignment system |
US9295381B2 (en) | 2007-10-31 | 2016-03-29 | Wavetec Vision Systems, Inc. | Wavefront sensor |
US9307904B2 (en) | 2008-11-06 | 2016-04-12 | Wavetec Vision Systems, Inc. | Optical angular measurement system for ophthalmic applications and method for positioning of a toric intraocular lens with increased accuracy |
US8876290B2 (en) | 2009-07-06 | 2014-11-04 | Wavetec Vision Systems, Inc. | Objective quality metric for ocular wavefront measurements |
US9603516B2 (en) | 2009-07-06 | 2017-03-28 | Wavetec Vision Systems, Inc. | Objective quality metric for ocular wavefront measurements |
US9554697B2 (en) | 2009-07-14 | 2017-01-31 | Wavetec Vision Systems, Inc. | Determination of the effective lens position of an intraocular lens using aphakic refractive power |
US9259149B2 (en) | 2009-07-14 | 2016-02-16 | Wavetec Vision Systems, Inc. | Ophthalmic surgery measurement system |
CN102494872A (en) * | 2011-11-15 | 2012-06-13 | 中国科学院紫金山天文台 | Method for measuring pointing error of astronomical telescope in real time |
US9339180B2 (en) | 2012-09-27 | 2016-05-17 | Wavetec Vision Systems, Inc. | Geometric optical power measurement device |
US9072462B2 (en) | 2012-09-27 | 2015-07-07 | Wavetec Vision Systems, Inc. | Geometric optical power measurement device |
WO2017099843A1 (en) * | 2015-12-08 | 2017-06-15 | Kla-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
US10337991B2 (en) | 2015-12-08 | 2019-07-02 | Kla-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
CN105842197A (en) * | 2016-03-21 | 2016-08-10 | 南京信息工程大学 | Luminous flow field diagnostic system and structure display and parameter measurement method |
CN106767542A (en) * | 2016-12-28 | 2017-05-31 | 中国科学院长春光学精密机械与物理研究所 | A kind of contactless torsion angle measuring system and measuring method |
CN106767542B (en) * | 2016-12-28 | 2019-02-01 | 中国科学院长春光学精密机械与物理研究所 | The contactless torsion angle measuring system of one kind and measurement method |
Also Published As
Publication number | Publication date |
---|---|
IL112395A0 (en) | 1995-03-30 |
IL112395A (en) | 1998-09-24 |
AU4900696A (en) | 1996-08-07 |
JPH10512955A (en) | 1998-12-08 |
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