WO1995022186A1 - Passively q-switched picosecond microlaser - Google Patents

Passively q-switched picosecond microlaser Download PDF

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Publication number
WO1995022186A1
WO1995022186A1 PCT/US1995/001701 US9501701W WO9522186A1 WO 1995022186 A1 WO1995022186 A1 WO 1995022186A1 US 9501701 W US9501701 W US 9501701W WO 9522186 A1 WO9522186 A1 WO 9522186A1
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Prior art keywords
laser
mirror
gain medium
saturable absorber
pulses
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PCT/US1995/001701
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French (fr)
Inventor
John J. Zayhowski
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Massachusetts Institute Of Technology
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Application filed by Massachusetts Institute Of Technology filed Critical Massachusetts Institute Of Technology
Priority to CA002182368A priority Critical patent/CA2182368C/en
Priority to EP95910965A priority patent/EP0744089B1/en
Priority to DE69504475T priority patent/DE69504475T2/en
Priority to JP52134995A priority patent/JP3843374B2/en
Publication of WO1995022186A1 publication Critical patent/WO1995022186A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0627Construction or shape of active medium the resonator being monolithic, e.g. microlaser
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/08Generation of pulses with special temporal shape or frequency spectrum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • H01S3/0604Crystal lasers or glass lasers in the form of a plate or disc
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094049Guiding of the pump light
    • H01S3/094053Fibre coupled pump, e.g. delivering pump light using a fibre or a fibre bundle
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109Frequency multiplication, e.g. harmonic generation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123Q-switching
    • H01S3/113Q-switching using intracavity saturable absorbers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/1601Solid materials characterised by an active (lasing) ion
    • H01S3/1603Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1611Solid materials characterised by an active (lasing) ion rare earth neodymium

Abstract

An apparatus and method for a passively Q-switched microlaser (10) for producing high-peak-power pulses of light of extremely short duration are disclosed. The apparatus comprises a gain medium (12) and saturable absorber (14) disposed within a laser cavity (16, 18). When the cavity (16, 18) is pumped, the saturable absorber (14) prevents the onset of lasing until the inversion density within the cavity (16, 18) reaches a critical value. The length of the cavity (16, 18), the material parameters, and the reflectivities of the mirrors (16, 18) are selected such that pulses of duration less than about 1 ns and of peak power in excess of about 10 kW are obtained. The invention has application in high-precision optical radar, nonlinear optics, micromachining, microsurgery, robotic vision, and other technologies requiring high-peak-power laser pulses of extremely short duration.

Description

PASSIVELY O-SWITCHED PICOSECOND MICROLASER
Background of the Invention
This invention relates to the field of lasers. Many applications require the generation of extremely short, high-peak-power pulses of light from a laser. (For the purpose of this discussion, extremely short will refer to pulse durations of about l ns or less; high peak power will refer to peak powers of about 10 kW or greater.) One method for producing extremely short pulses is to mode lock the laser. In mode locking, several longitudinal modes of a laser are locked together such that a periodic train of extremely short pulses is produced. The period between pulses is the round-trip time of light in the laser cavity, typically 10 ns. Because of the large number of pulses produced each second, even lasers with high average power (10 Watts - 100 Watts or greater) cannot produce pulses with high peak powers.
High-peak-power pulses can be produced by Q switching a laser. In Q switching, the "quality" or "Q" of the laser cavity is changed in order to generate a pulse. The size of conventional Q-switched lasers, along with the physics of the device, precludes the production of extremely short pulses.
Extremely short, high-peak-power pulses can be obtained from either Q-switched mode-locked lasers or amplified mode-locked lasers. Both of these approaches require large (typically several feet long) , complicated (requiring daily supervision by a qualified laser technician) , power-hungry (several kilowatts of electrical power) , and therefore expensive devices. It has recently been shown that coupled-cavity Q- switched microlasers can produce pulses of less than 300-ps duration with peak powers in excess of 25 kW.
Zayhowski, J.J. and Dill III, C. , "Diode- Pumped Microchip Lasers Electro-Optically Q- Switched at High Pulse Repetition Rates," Optics Letters, Vol. 17, No. 17, 1201-1203, (April 23, 1992).
Thus, picosecond Q-switched microlasers can produce output pulses as short as large mode-locked lasers with peak powers as high as commercially available Q- switched systems. And, the entire device can fit into a package approximately the size of a standard diode- laser package with the possibility of battery-powered operation.
While coupled-cavity Q-switched microlasers outperform larger conventional devices in every way except average power, there is still room for improvement. In order to obtain proper Q-switching of the coupled-cavity microlaser, high-speed high-voltage electronics are required. The size, performance, and power consumption of the electronics limit the size, performance, and power efficiency of the coupled-cavity Q-switched microlaser system. In addition, the performance of the coupled-cavity laser relies on maintaining interferometric control of the relative lengths of the two constituent cavities, placing tight tolerances on the manufacture of the device and on the temperature control of the device during use. The passively Q-switched microlaser does not require switching electronics, thereby reducing the size and complexity of the total system, and improving the power efficiency. In addition, there is no need for interferometric control of cavity dimensions, simplifying production of the device and greatly relaxing the tolerances on the temperature control of the device during use. The result is a potentially less expensive, smaller, more robust, and more reliable Q-switched system with performance comparable to that of coupled-cavity Q-switched microlasers. With this combination of attributes, passively Q-switched picosecond microiasers are very attractive for a large range of applications. including micromachining, microsurgery, high-precision ranging, robotic vision, automated production, environmental monitoring, ionization spec,troscopy, and nonlinear frequency generation.
In the current state-of-the-art, passively Q- switched lasers typically have a pulse length of tens of nanoseconds, although recently pulses of 3.5-ns duration have been demonstrated using a miniature laser constructed from a gain medium which simultaneously acts as a saturable absorber, as described in
Zhou, S., et al., "Monolithic Self-Q-Switched Cr,Nd:YAG Laser", Optics Letters , Vol. 18, •No. 7, 511-512, (April 1, 1993).
Summary of the Invention
The device reported by Zhou had a pulsewidth that is more than 3 times the value that would have been obtained if the cavity length, the laser gain, the intracavity saturable loss, and the reflectivity of the mirrors had been properly selected (based on numbers reported in the manuscript) . As a result, the peak power obtained (less than 3 kW for a 1-W continuous wave pump) was also significantly less than it could have been. Furthermore, a complete understanding of the interaction of the laser parameters will allow laser designers to select materials and components for diode-pumped passively Q-switched devices which outperform the current state-of-the-art devices in pulsewidth and peak power by more than an order of magnitude.
The present invention is directed to an apparatus and method for obtaining high-peak-power pulses of laser light of extremely short duration through the proper selection of components for a passively Q- switched laser system. The apparatus of the invention comprises a gain medium and a saturable absorber disposed within a resonant cavity. When appropriately pumped, an optical pulse begins to form. During the early stages of/the pulse development, the saturable absorber is bleached, increasing the Q of the resonator and resulting in a short optical pulse. The length of the cavity, the laser gain, the intracavity saturable loss, and the reflectivities of the mirrors are selected such that pulses of less than about 1 ns duration are generated with peak powers in excess of 10,000 times the pump power (for example, 10 kW for a 1 W pump) .
Brief Description of the Drawings
The foregoing and other objects, features, and advantages of the invention will be apparent from the following more particular description of preferred embodiments of the invention, as illustrated in the accompanying drawings in which like reference characters refer to the same parts throughout the different views. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the invention. FIG. 1 is a perspective view of a passively Q- switched picosecond microlaser embodying the present invention.
FIG. 2 is a perspective view of a preferred embodiment of the present invention wherein a passively Q-switched picosecond microlaser is pumped by the unfocused output of an optical fiber, and the laser output frequency is quadrupled by a pair of frequency- doubling crystals.
Detailed Description of Preferred Embodiments
Referring to FIG. 1, one embodiment of the passively Q-switched picosecond microlaser 10 comprises a short piece of gain medium 12, for example Nd3+:YAG, bonded to a saturable-absorber crystal 14, for example Cr4+:YAG. Both materials are polished flat and parallel on the two faces normal to the optic axis A. The pump-side face 16 of the gain medium 12 is coated dielectrically to transmit the pump light 22 and to be highly reflecting at the oscillating frequency j,. The facets at the interface 20 between the gain medium 12 and saturable-absorber crystal 14 are coated dielectrically such that the interface 20 is totally transmitting at the oscillating frequency and highly reflecting at the frequency of the pump 22. The output face 18 of the saturable absorber 14 is coated to be partially reflecting at the oscillating frequency (reflectivity R) and provides the optical output 24 from the device.
The principle behind the operation of the passively Q-switched microlaser 10 is that the saturable absorber 14 prevents the onset of lasing until the average inversion density within the cavity (N0) reaches a value of (γ εat.xt i pax. τt ι op' (1)
No = σlrt
where σ is the emission cross section at the oscillating frequency, ln is the round-trip path length of light within the cavity, ysαt rt = -ln(l - Tsαt rt) is the round-trip saturable loss constant, r^^ is the roUnd- trip saturable loss, ypαr>rt = -ln(l - Tpαr rt) is the round-trip unsaturable intracavity parasitic loss constant, T rt is the round-trip unsaturable intracavity parasitic loss, and y = -ln(R) is the output-coupling loss constant. The onset of lasing, at this point (invention density = N0) , produces a high intracavity optical field which quickly saturates the saturable component of the loss, increasing the cavity Q and resulting in a Q-switched output pulse. If the cross section of the saturable absorber (σsαt = Υmmm-.Tt t'sαr-rt' whe e N Sαt is the average density of saturable absorber sites within the cavity) is much greater than the cross section of the lasing transition, then the change in the cavity Q can be modeled as instantaneous. In this case, the minimum possible pulsewidth
5.5trt • sat. zt
where tn is the round-trip time of light within the laser cavity, is obtained when the reflectivity of the output coupler is chosen to be iϊ=exp (γ-^ _t-κγ ' sat.xt' ' (3 )
where K = 0.47 (but may vary from 0.0 to 1.5 without changing the pulsewidth by more than a factor of 2) . The amount of absorbed pump power required to reach threshold is
_ O . l nysαtjrt r .2~ lm hvp ( 4 )
^αbs , thresh ~ ~r- '
where rlm is the radius of the lasing mode, hv is the energy of a photon of pump radiation, and T is the spontaneous lifetime of the gain medium 12. Once threshold is reached, the invention, when pumped by a diode laser 22, will produce a train of pulses, with the temporal spacing of the pulses given by
TP -P ' ( 0 )
where Pαbs is the total amount of pump power absorbed within the lasing mode volume.
There are several factors that potentially limit the minimum pulsewidth obtainable from a microlaser. Gain-medium-dependent factors include the maximum inversion density (gain) obtainable for the available pump power and the gain bandwidth. The unsaturable parasitic component of the intracavity loss may make it impossible to realize Equation 3, in which case the required laser efficiency will dictate the choice of output coupler (reflectivity R) . Finally, the large pulses may damage the gain medium 12, saturable absorber 14, interface layer 20, or mirrors 16, 18. None of these factors, however, become limiting until the duration of the output pulse from the microlaser is less than several hundred picoseconds. Those skilled in the art will know how to apply Equation 3 subject to these additional restrictions in order to obtain the minimum pulsewidth from a passively Q-switched microlaser. A preferred embodiment of the present invention is shown in FIG. 2,, wherein a gain medium 12, for example Nd3+:YAG, is diffusion bonded to a saturable-absorber material 14, for example Cr4+:YAG. The faces of the combination normal to the optic axis A are polished flat and parallel. The pump-side face 16 of the gain medium 12 is coated dielectrically to transmit pump light 40 and to be highly reflecting at the oscillating frequency vl. The output face 18 of the saturable absorber 14 is coated to be partially reflecting at the oscillating frequency (reflectivity R) and provides for laser output 42. The resonant cavity of the laser including both the saturable absorber 14 and the gain medium 12 is preferably of length less than 2 mm. The output of the optical fiber 30 provides sufficient pump intensity 40 for the laser 10 to reach (and exceed) threshold, without the need for focusing optics. This embodiment lends itself to the generation of extremely short, high-peak-power pulses of light at the remote end of a fiber transmitting low-power continuous wave (cw) light.
A frequency-doubling crystal 32, for example KTP(KTiOP04) , is disposed in the path of the laser output beam 42 for generating light 44 at the second harmonic of the oscillating frequency. For example, laser light at an infrared wavelength of 1.064 μ , may be converted by the frequency-doubling crystal into green light at 532 nm.
Frequency-doubling crystals may be stacked for generating light at a frequency which is the fourth harmonic of the laser output 42. A second crystal 34, for example BBO (/3-BaB204) , is placed adjacent to the first frequency-doubling crystal 32. The laser output 42 is frequency doubled by the first frequency-doubling crystal 32. The output 44 of the first frequency- doubling crystal 32 passes through the second frequency-doubling crystal 34, and is transformed into light 46 at the fourth harmonic of the laser output 42. With this embodiment, diode light 50, transmitted over an optical fiber 30, may be converted by the passively Q-switched picosecond microlaser 10 into laser light 42, which is subsequently quadrupled in frequency by the frequency-doubling crystals 32 and 34 into ultraviolet light 46, which could not be efficiently transmitted using currently available fibers. Thus, ultraviolet light 46 may be generated several kilometers away from a pump diode 50, at the opposite end of a fiber optic cable 30.
The saturable-absorber material 14 and gain medium 12 may both be contained within a common material, as in the case of Nd3+,Cr4+:YAG. In another embodiment, the saturable-absorber material 14 and gain medium 12 are two different crystals compromised of dopants in a common host, such as Nd3+:YAG and Cr4+:YAG (where YAG is the common host) and are diffusion-bonded, eliminating the need for an interface dielectric 20. In yet other embodiments, the saturable absorber is epitaxially grown on the gain medium, or the gain medium is epitaxially grown on the saturable absorber. medium is epitaxially grown on the saturable absorber. The gain medium may alεo comprise Nd3+:YV04, while the saturable absorber may comprise LiF:F2", a semiconductor material, or a semiconductor-doped-glass material.
If a saturable-absorber material 14 is chosen which is non-absorbing of light at the pump frequency, then the placement of the gain medium 12 and saturable- absorber material 14 may be reversed so that the gain medium 12 is disposed adjacent to the output face 18 and the saturable-absorber material is disposed adjacent to the pump-side face 16.
To illustrate the capabilities of a passively Q- switched microlaser, consider a 0.5-mm-long piece of gain medium 12 comprising Nd3+:YAG (gain cross section σ = 4.6 x 10*19 cm"2, spontaneous lifetime T = 240 μs, refractive index n = 1.82) bonded to a 0.5-mm-long saturable absorber 14 comprising Cr4+:YAG (refractive index n •= 2.14) with a saturable absorption coefficient of 5.7 cm"1. With a lasing-mode radius of 150 μm, the threshold is « 0.6 W of absorbed pump power and the pulsewidth is « 100 ps. If we conservatively assume an efficiency of 10 percent, the pulse energy is 14 μJ, with a peak power of 124 kW (using the theoretical pulse shape) and a peak (unfocused) output intensity of 0.17 GW/cm2. Laboratory experiments using a commercially obtained cw laser diode to pump a passively Q-switched microlaser have already demonstrated pulses of less than 300 ps, with peak powers in excess of 25 kW. The output intensity is sufficient to result in efficient nonlinear frequency generation in an appropriate nonlinear crystal without focussing the output beam of the laser. The focussed peak powers are sufficient for ionization of many materials, with applications in micromachining, microsurgery, and ionization spectroscopy. The extremely short pulses make the device attractive for high-precision optical ranging, with applications in robotic vision and automated production.
While this invention has been particularly εhown and described with references to preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims

CLAIMSI claim:
1. A passively Q-switched laser comprising: a) a resonant cavity formed between a first mirror (16) and a second mirror (18) ; b) a gain medium (12) disposed within said resonant cavity for producing laser gain; c) a pump source (22) for energizing said gain medium (12) ; and d) a saturable absorber (14) disposed within said resonant cavity; characterized in that: said saturable absorber (14) , said second mirror (18) , and said laser gain are selected so that output pulses (24) are generated, said pulses having a duration of less than about l nanosecond.
2. A passively Q-switched laser comprising: a) a resonant cavity formed between a first mirror (16) and a second mirror (18) ; b) a gain medium (12) disposed within said resonant cavity for producing laser gain; c) a pump source (22) for energizing said gain medium (12) ; and d) a saturable absorber (14) disposed within said resonant cavity; characterized in that: said saturable absorber (14) , said second mirror (18) , and said laser gain are selected so that output pulses (24) are generated, said pulses having a peak power greater than about 10 kilowatts.
3. A passively Q-switched laser comprising: a) a resonant cavity formed between a first mirror (16) and a second mirror (18) ; b) a gain medium (12) disposed within said resonant cavity for producing laser gain; c) a pump source (22) for energizing said gain medium (12) ; and d) a saturable absorber (14) disposed within said resonant cavity; characterized in that: said saturable absorber (14) , said second mirror (18) , and said laser gain are selected so that output pulses (24) are generated, said pulses having a peak power greater than about 10,000 times said pump source (22) power.
4. A laser as claimed in any preceding claim wherein said second mirror (18) is an output coupler having reflectivity R, where
R = exp(7/,Λrr -κ7jar r), K is in the range from 0.0 to 1.5, ysaI rt is the round-trip intracavity saturable loss constant, and ypar rt is the round-trip intracavity unsaturable parasitic loss constant.
5. A laser as claimed in any preceding claim wherein said gain medium (12) and said saturable absorber (14) are two separate materials comprised of dopants in a common host and wherein said gain medium (12) and said saturable absorber (14) are joined by diffusion bonding.
6. A laser as claimed in any preceding claim wherein said gain medium (12) and said saturable absorber (14) are the same crystal.
7. A laser as claimed in any preceding claim wherein said gain medium (12) is epitaxially grown on said saturable absorber (14) or wherein said saturable absorber (14) is epitaxially grown on said gain medium (12) .
8. A laser as claimed in any preceding claim wherein said pump source (22) comprises an optical fiber for transmitting pump light energy; said optical fiber being optically coupled to said first mirror (16) for pumping said gain medium (12) with said light energy.
9. A laser as claimed in any preceding claim further comprising nonlinear optical crystals disposed in .proximity with said second mirror (18) for frequency conversion of said pulses (24) emitted by said laser.
10. A laser as claimed in any preceding claim wherein said resonant cavity is less than 2 mm in length.
11. A laser as claimed in any preceding claim wherein said saturable absorber (14) is disposed adjacent said gain medium (12) at an interface (20) which is highly transmissive of light at said output pulse (24) wavelength and which is highly reflective to light emitted by said pump source (22) .
12. A method of generating light pulses with a passively Q-switched laser comprising the steps of: a) forming a resonant cavity between a first mirror (16) and a second mirror (18) ; b) disposing a gain medium (12) within said resonant cavity for producing laser gain; c) energizing said gain medium (12) with a pump source (22) ; and d) disposing a saturable absorber (14) within said resonant cavity; characterized in that said saturable absorber (14) , said second mirror, and said laser gain are selected so that output pulses (24) are generated, said pulses having a duration of less than about 1 nanosecond.
13. A method of generating light pulses with a passively Q-switched laser comprising the steps of: a) forming a resonant cavity between a first mirror (16) and a second mirror (18) ; b) disposing a gain medium (12) within said resonant cavity for producing laser gain; c) energizing said gain medium (12) with a pump source (22) ; and d) disposing a saturable absorber (14) within said resonant cavity; characterized in that said saturable absorber (14) , said second mirror, and said laser gain are selected so that output pulses (24) are generated, said pulses having a peak power greater than about 10 kilowatts.
14. A method of generating light pulses with a passively Q-switched laser comprising the steps of: a) forming a resonant cavity between a first mirror (16) and a second mirror (18) ; b) disposing a gain medium (12) within said resonant cavity for producing laser gain; c) energizing said gain medium (12) with a pump source (22) ; and dj disposing a saturable absorber (14) within said resonant cavity; characterized in that said saturable absorber (14) , said second mirror, and said laser gain are selected so that output pulses (24) are generated, said pulses having a peak power greater than about 10,000 times said pump (22) power.
15. A method as claimed in any one of Claims 12 to 14 wherein said second mirror (18) is an output coupler having reflectivity R, where
K is in the range from 0.0 to 1.5, ysat rt is the round-trip intracavity saturable loss constant, and ypar rt is the round-trip intracavity unsaturable parasitic loss constant.
16. A method as claimed in any one of Claims 12 to 15 further comprising the step of diffusion bonding said gain medium (12) and said saturable absorber (14) wherein said gain medium (12) and said saturable absorber (14) are two separate materials comprised of dopants in a common host.
17. A method as claimed in any one of Claims 12 to 16 wherein said gain medium (12) and said saturable absorber (14) are the same crystal.
18. A method as claimed in any one of Claims 12 to 17 further comprising the step of epitaxially growing said gain medium (12) on said saturable absorber (14) or growing said saturable absorber (14) on said gain medium (12) .
19. A method as claimed in any one of Claims 12 to 18 wherein said pump source (22) comprises an optical fiber for transmitting pump light energy; said optical fiber being optically coupled to said first mirror (16) for pumping said gain medium (12) with said light energy.
20. A method as claimed in any one of Claims 12 to 19 further comprising the step of disposing nonlinear optical crystals in proximity with said second mirror (18) for frequency conversion of said pulses (24) emitted by said laser.
21. A method as claimed in any one of Claims 12 to 20 further comprising the step of disposing said saturable absorber (14) adjacent said gain medium (12) at an interface 20 which is highly transmissive of light at said output pulse (24) wavelength and which is highly reflective to light emitted by said pump source (22) .
PCT/US1995/001701 1994-02-08 1995-02-08 Passively q-switched picosecond microlaser WO1995022186A1 (en)

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CA002182368A CA2182368C (en) 1994-02-08 1995-02-08 Passively q-switched picosecond microlaser
EP95910965A EP0744089B1 (en) 1994-02-08 1995-02-08 Passively q-switched picosecond microlaser
DE69504475T DE69504475T2 (en) 1994-02-08 1995-02-08 PASSIVELY GOOD-SWITCHED PICOSE-CUSTOM MICRO LASER
JP52134995A JP3843374B2 (en) 1994-02-08 1995-02-08 Passive Q-switched picosecond microlaser

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US19378194A 1994-02-08 1994-02-08
US08/193,781 1994-02-08
US08/206,124 US5394413A (en) 1994-02-08 1994-03-04 Passively Q-switched picosecond microlaser
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013168587A1 (en) * 2012-05-09 2013-11-14 三菱電機株式会社 Passive q-switch element and passive q-switch laser device

Families Citing this family (98)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4336947A1 (en) * 1993-03-27 1995-05-04 Laser Medizin Zentrum Ggmbh Be Long pulse laser with resonator extension using an optical waveguide
FR2715514B1 (en) * 1994-01-21 1996-02-16 Commissariat Energie Atomique Laser with controllable beam direction.
FR2725279B1 (en) * 1994-10-04 1996-10-25 Commissariat Energie Atomique TELEMETRY DEVICE COMPRISING A MICROLASER
KR0149770B1 (en) * 1995-02-25 1998-12-01 심상철 Passivity q-switch laser having daul cavity structure
FR2734092B1 (en) * 1995-05-12 1997-06-06 Commissariat Energie Atomique TRIGGERED MONOLITHIC MICROLASER AND NON-LINEAR INTRACAVITY MATERIAL
FR2734094B1 (en) * 1995-05-12 1997-06-06 Commissariat Energie Atomique SOLID-STATE MONOLITHIC INFRARED TRANSMITTER PUMPED BY A SOLID TRIGGERED MICROLASER
FR2734096B1 (en) * 1995-05-12 1997-06-06 Commissariat Energie Atomique CAVITE MICROLASER AND SOLID IMPULSE MICROLASER WITH PASSIVE TRIGGER AND EXTERNAL CONTROL
FR2734093B1 (en) * 1995-05-12 1997-06-06 Commissariat Energie Atomique MONOLITHIC OPTICAL PARAMETRIC OSCILLATOR PUMPED BY A MICROLASER
FR2736217B1 (en) * 1995-06-27 1997-08-08 Commissariat Energie Atomique CAVITE MICROLASER AND SOLID PULSE MICROLASER WITH MICROMODULATOR ACTIVATION
US5610934A (en) * 1995-10-13 1997-03-11 Polaroid Corporation Miniaturized intracavity frequency-doubled blue laser
US5859867A (en) * 1995-11-30 1999-01-12 Massachusetts Institute Of Technology Microlaser
US5802083A (en) * 1995-12-11 1998-09-01 Milton Birnbaum Saturable absorber Q-switches for 2-μm lasers
SE9603288L (en) * 1996-02-20 1997-08-21 Geotronics Ab Stabilization of a pumped laser tube
US5642193A (en) * 1996-03-08 1997-06-24 Met One, Inc. Particle counter employing a solid-state laser with an intracavity view volume
US5988862A (en) 1996-04-24 1999-11-23 Cyra Technologies, Inc. Integrated system for quickly and accurately imaging and modeling three dimensional objects
FR2750539B1 (en) * 1996-06-28 1998-07-24 Commissariat Energie Atomique LASER MATERIALS AND MICROLASERS WITH HIGH CONCENTRATIONS IN ACTIVE IONS, AND METHODS OF MANUFACTURE
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
US5828452A (en) * 1996-12-31 1998-10-27 Dakota Technologies, Inc. Spectroscopic system with a single converter and method for removing overlap in time of detected emissions
US5832008A (en) * 1997-01-24 1998-11-03 Hughes Electronics Eyesafe laser system using transition metal-doped group II-VI semiconductor as a passive saturable absorber Q-switch
USRE38489E1 (en) * 1997-01-30 2004-04-06 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
US5840239A (en) * 1997-01-31 1998-11-24 3D Systems, Inc. Apparatus and method for forming three-dimensional objects in stereolithography utilizing a laser exposure system having a diode pumped frequency quadrupled solid state laser
US6420698B1 (en) * 1997-04-24 2002-07-16 Cyra Technologies, Inc. Integrated system for quickly and accurately imaging and modeling three-dimensional objects
SE9702175D0 (en) * 1997-06-06 1997-06-06 Geotronics Ab A laser
FR2765687B1 (en) * 1997-07-07 1999-07-30 Commissariat Energie Atomique RAMAN ANALYSIS DEVICE INCLUDING A MICROLASER
US5905746A (en) * 1997-08-01 1999-05-18 Litton Systems, Inc. Q-switch laser method and apparatus
FR2773000B1 (en) * 1997-12-24 2000-05-12 Commissariat Energie Atomique PASSIVE-TRIGGERED LASER CAVITY WITH CONTROLLED POLARIZATION, MICROLASER COMPRISING THIS CAVITY, AND METHOD OF MANUFACTURING THIS MICROLASER
US6173001B1 (en) 1998-02-18 2001-01-09 Massachusetts Institute Of Technology Output couplers for lasers
US6240113B1 (en) 1998-02-27 2001-05-29 Litton Systems, Inc. Microlaser-based electro-optic system and associated fabrication method
US6072815A (en) * 1998-02-27 2000-06-06 Litton Systems, Inc. Microlaser submount assembly and associates packaging method
US6256100B1 (en) 1998-04-27 2001-07-03 Active Impulse Systems, Inc. Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure
US6795198B1 (en) * 1998-05-28 2004-09-21 Martin Fuchs Method and device for measuring thin films and semiconductor substrates using reflection mode geometry
US6057871A (en) * 1998-07-10 2000-05-02 Litton Systems, Inc. Laser marking system and associated microlaser apparatus
US6239428B1 (en) 1999-03-03 2001-05-29 Massachusetts Institute Of Technology Ion mobility spectrometers and methods
US6373565B1 (en) 1999-05-27 2002-04-16 Spectra Physics Lasers, Inc. Method and apparatus to detect a flaw in a surface of an article
US6822978B2 (en) * 1999-05-27 2004-11-23 Spectra Physics, Inc. Remote UV laser system and methods of use
US6734387B2 (en) 1999-05-27 2004-05-11 Spectra Physics Lasers, Inc. Method and apparatus for micro-machining of articles that include polymeric materials
US6377593B1 (en) 1999-06-21 2002-04-23 Northrop Grumman Corporation Side pumped Q-switched microlaser and associated fabrication method
US6813285B2 (en) 1999-06-21 2004-11-02 Litton Systems, Inc. Q-switched microlaser
US6219361B1 (en) 1999-06-21 2001-04-17 Litton Systems, Inc. Side pumped, Q-switched microlaser
US20030039274A1 (en) * 2000-06-08 2003-02-27 Joseph Neev Method and apparatus for tissue treatment and modification
US6501772B1 (en) 2000-08-11 2002-12-31 Litton Systems, Inc. Microlaser assembly having a microresonator and aligned electro-optic components
EP1180832A3 (en) * 2000-08-11 2004-10-13 Litton Systems, Inc. Wedge-shaped microresonator and associated microlaser assembly
US6734965B2 (en) * 2000-09-18 2004-05-11 Douglas G. Talley Optical patternation method
US6512630B1 (en) * 2001-07-13 2003-01-28 The United States Of America As Represented By The Secretary Of The Air Force Miniature laser/amplifier system
US6701044B2 (en) 2001-08-10 2004-03-02 Lightwave Electronics Solid state laser generating UV radiation for writing fiber bragg gratings
US6909730B2 (en) * 2002-03-19 2005-06-21 Lightwave Electronics Corporation Phase-locked loop control of passively Q-switched lasers
US6891879B2 (en) 2002-09-23 2005-05-10 Litton Systems, Inc. Microlaser cavity assembly and associated packaging method
JP2004128139A (en) * 2002-10-01 2004-04-22 Sony Corp Laser beam generator and its manufacturing method
US7149231B2 (en) * 2002-10-04 2006-12-12 Spectra Systems Corporation Monolithic, side-pumped, passively Q-switched solid-state laser
US20040196354A1 (en) * 2003-04-02 2004-10-07 Hansen Steven K Laser marking/maging system
WO2005019811A2 (en) * 2003-08-26 2005-03-03 Blueshift Biotechnologies, Inc. Time dependent fluorescence measurements
SG114754A1 (en) * 2004-02-25 2005-09-28 Kulicke & Soffa Investments Laser cleaning system for a wire bonding machine
US7356054B2 (en) * 2004-12-17 2008-04-08 Nichia Corporation Light emitting device
US7203209B2 (en) * 2005-01-19 2007-04-10 Bae Systems Information And Electronic Systems Integration Inc. System and method for a passively Q-switched, resonantly pumped, erbium-doped crystalline laser
US20060219754A1 (en) * 2005-03-31 2006-10-05 Horst Clauberg Bonding wire cleaning unit and method of wire bonding using same
US7391794B2 (en) * 2005-05-25 2008-06-24 Jds Uniphase Corporation Injection seeding of frequency-converted Q-switched laser
JP2007059591A (en) * 2005-08-24 2007-03-08 Mitsubishi Heavy Ind Ltd Resonator and system for optically pumped disk type solid laser
US8031749B2 (en) 2005-09-20 2011-10-04 Jds Uniphase Corporation Passively Q-switched microlaser with controllable peak power density
US20070165216A1 (en) * 2006-01-17 2007-07-19 Honeywell International Inc. Out-of-fluid sensor
US7492462B2 (en) * 2006-01-17 2009-02-17 Honeywell International, Inc. Optochemical sensor
US20070280305A1 (en) * 2006-06-05 2007-12-06 Oved Zucker Q-switched cavity dumped laser array
WO2008054993A2 (en) * 2006-10-31 2008-05-08 Blue Sky Research Semiconductor diode pumped laser using heating-only power stabilization
WO2008120141A2 (en) * 2007-03-29 2008-10-09 Koninklijke Philips Electronics N.V. Method and device for generating a laser beam, a laser treatment device and a laser detection device
US7649920B2 (en) * 2007-04-03 2010-01-19 Topcon Corporation Q-switched microlaser apparatus and method for use
DE102007044009A1 (en) * 2007-09-14 2009-03-19 Robert Bosch Gmbh Laser device and operating method for this
US8004682B2 (en) * 2008-04-16 2011-08-23 Infineon Technologies Ag Methods and systems for analyzing a volume of gas
US8693894B2 (en) * 2008-04-28 2014-04-08 Hewlett-Packard Development Company, L.P. Gain clamped optical device for emitting LED mode light
EP3396416A1 (en) 2008-11-25 2018-10-31 Tetravue, Inc. Systems and methods of high resolution three-dimensional imaging
JP5281922B2 (en) * 2009-02-25 2013-09-04 浜松ホトニクス株式会社 Pulse laser equipment
EP2443707B1 (en) 2009-06-15 2015-09-30 Pantec Biosolutions AG A monolithic, side pumped solid-state laser and applications thereof
WO2010145855A1 (en) 2009-06-15 2010-12-23 Pantec Biosolutions Ag Monolithic, side pumped solid-state laser and method for operating the same
DE102010050860A1 (en) 2010-03-31 2011-10-06 Innolight Innovative Laser Und Systemstechnik Gmbh Micro-crystal laser for generating laser pulses
US9506166B1 (en) 2010-07-08 2016-11-29 Clemson University Research Foundation Method for forming heterogeneous single garnet based crystals for passive Q-switched lasers and microlasers
US9014228B1 (en) 2010-07-08 2015-04-21 Clemson University Research Foundation Hydrothermal growth of heterogeneous single crystals for solid state laser applications
US9493887B1 (en) 2010-07-08 2016-11-15 Clemson University Research Foundation Heterogeneous single vanadate based crystals for Q-switched lasers and microlasers and method for forming same
US20120140782A1 (en) 2010-12-07 2012-06-07 Raytheon Company Low timing jitter, single frequency, polarized laser
DE102012005492B4 (en) 2012-03-17 2023-03-23 Batop Gmbh Passively Q-switched microchip laser with a pulse control
US9711928B2 (en) 2012-06-22 2017-07-18 Clemson University Research Foundation Single crystals with internal doping with laser ions prepared by a hydrothermal method
US9469915B2 (en) 2012-06-22 2016-10-18 Clemson University Research Foundation Hydrothermal growth of heterogeneous single crystals exhibiting amplified spontaneous emission suppression
US9515448B2 (en) * 2012-09-26 2016-12-06 Raytheon Company Microchip laser with single solid etalon and interfacial coating
US8948220B2 (en) 2012-12-18 2015-02-03 Coherent Gmbh Wavelength-stabilized microcrystal laser
WO2015164868A1 (en) 2014-04-26 2015-10-29 Tetravue, Inc. Method and system for robust and extended illumination waveforms for depth sensing in 3d imaging
WO2016049011A1 (en) * 2014-09-22 2016-03-31 University Of Rochester Efficient lasing with excited-state absorption-impaired materials
US10156025B2 (en) 2015-05-04 2018-12-18 University Of South Carolina Monolithic heterogeneous single crystals with multiple regimes for solid state laser applications
JP2017005069A (en) * 2015-06-09 2017-01-05 浜松ホトニクス株式会社 Laser equipment
JPWO2017060967A1 (en) * 2015-10-06 2018-07-26 株式会社島津製作所 Wavelength converter
JPWO2017094778A1 (en) * 2015-12-02 2018-09-13 株式会社リコー Laser device, ignition device and internal combustion engine
DE102016106742B3 (en) 2015-12-18 2017-01-19 Rofin-Sinar Laser Gmbh Laser device with an optical resonator and method for adjusting the laser device
KR20190003480A (en) 2016-02-29 2019-01-09 테트라뷰 인코포레이티드 3D imaging system and method
KR20170123862A (en) * 2016-04-29 2017-11-09 주식회사 루트로닉 Laser beam apparatus and laser beam hand-piece having the same
US11212512B2 (en) 2017-12-28 2021-12-28 Nlight, Inc. System and method of imaging using multiple illumination pulses
US10622780B2 (en) * 2018-06-22 2020-04-14 Candela Corporation Handpiece with a microchip laser
US10732265B1 (en) 2019-04-11 2020-08-04 Analog Devices, Inc. Optical illuminator module and related techniques
CN111478166A (en) * 2020-04-21 2020-07-31 纬达星辰(深圳)科技有限公司 Solid pulse laser with high-energy picosecond output
US11532919B2 (en) * 2020-05-27 2022-12-20 Candela Corporation Fractional handpiece with a passively Q-switched laser assembly
CN112290367A (en) * 2020-10-29 2021-01-29 北京理工大学 Novel frequency-doubling complex transverse mode output micro laser device capable of directly generating pulse Q modulation
WO2024056390A1 (en) * 2022-09-12 2024-03-21 Montfort Laser Gmbh Short solid-state laser
CN116683268A (en) * 2023-07-31 2023-09-01 中国科学院长春光学精密机械与物理研究所 1.3 mu m wave band chip-level semiconductor/solid vertical integrated passive Q-switched laser

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985003171A1 (en) * 1983-12-30 1985-07-18 American Telephone & Telegraph Company Laser controlled by a multiple layer heterostructure
US4847851A (en) * 1988-05-19 1989-07-11 University Of South Florida Butt-coupled single transverse mode diode pumped laser
EP0571051A1 (en) * 1988-02-02 1993-11-24 Massachusetts Institute Of Technology Solid state microlaser

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3788742A (en) * 1971-06-24 1974-01-29 Westinghouse Electric Corp Gas monitoring system
US4723257A (en) * 1986-05-19 1988-02-02 Spectra-Physics, Inc. Laser diode pumped solid state laser with miniaturized laser head
US4827121A (en) * 1988-02-24 1989-05-02 Measurex Corporation System for detecting chemical changes in materials by embedding in materials an unclad fiber optic sensor section
US5049738A (en) * 1988-11-21 1991-09-17 Conoco Inc. Laser-enhanced oil correlation system
US5132977A (en) * 1989-09-07 1992-07-21 Massachusetts Institute Of Technology Coupled-cavity Q-switched laser
US4982405A (en) * 1989-09-07 1991-01-01 Massachusette Institute Of Technology Coupled-cavity Q-switched laser
US5084617A (en) * 1990-05-17 1992-01-28 Conoco Inc. Fluorescence sensing apparatus for determining presence of native hydrocarbons from drilling mud
US5054878A (en) * 1990-06-04 1991-10-08 Conoco Inc. Device for source compensating a fiber optic coupler output
US5119382A (en) * 1990-12-24 1992-06-02 Mcdonnell Douglas Corporation Tetravalent chromium doped passive Q-switch
US5315433A (en) * 1991-02-28 1994-05-24 Fuji Photo Film Co., Ltd. Optical wavelength converting apparatus
JP2704341B2 (en) * 1991-12-02 1998-01-26 富士写真フイルム株式会社 Optical wavelength converter
US5278855A (en) * 1992-05-11 1994-01-11 At&T Bell Laboratories Broadband semiconductor saturable absorber

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985003171A1 (en) * 1983-12-30 1985-07-18 American Telephone & Telegraph Company Laser controlled by a multiple layer heterostructure
EP0571051A1 (en) * 1988-02-02 1993-11-24 Massachusetts Institute Of Technology Solid state microlaser
US4847851A (en) * 1988-05-19 1989-07-11 University Of South Florida Butt-coupled single transverse mode diode pumped laser

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
J.A.MORRIS ET AL.: "PASSIVE Q SWITCHING OF A DIODE-PUMPED Nd:YAG LASER WITH A SATURABLE ABSORBER", OPTICS LETTERS., vol. 15, no. 8, 15 April 1990 (1990-04-15), NEW YORK US, pages 440 - 442 *
J.J.ZAYHOWSKI ET AL.: "DIODE-PUMPED PASSIVELY Q-SWITCHED PICOSECOND MICROCHIP LASERS", OPTICS LETTERS., vol. 19, no. 18, 15 September 1994 (1994-09-15), NEW YORK US, pages 1427 - 1429 *
S.DONG ET AL.: "220W AVERAGE OUTPUT POWER FROM A Q-SWITCHING Nd:YAG SLAB LASER WITH A LiF:F-2 CRYSTAL", OPTICS AND LASER TECHNOLOGY, vol. 25, no. 3, June 1993 (1993-06-01), HAYWARDS HEATH GB, pages 175 - 178 *
S.ZHOU ET AL.: "MONOLITHIC SELF-Q-SWITCHED Cr,Nd:YAG LASER", OPTICS LETTERS., vol. 18, no. 7, 1 April 1993 (1993-04-01), NEW YORK US, pages 511 - 512 *
V.A.ZYULKOV ET AL.: "NEW SOLID-STATE PASSIVE SWITCH FOR NEODYMIUM LASERS", SOVIET JOURNAL OF QUANTUM ELECTRONICS, vol. 22, no. 7, July 1992 (1992-07-01), NEW YORK US, pages 579 - 580 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013168587A1 (en) * 2012-05-09 2013-11-14 三菱電機株式会社 Passive q-switch element and passive q-switch laser device
JP5734511B2 (en) * 2012-05-09 2015-06-17 三菱電機株式会社 Passive Q switch element
US9337609B2 (en) 2012-05-09 2016-05-10 Mitsubishi Electric Corporation Passively Q-switched element and passively Q-switched laser device

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DE69504475T2 (en) 1999-04-22
JPH09508755A (en) 1997-09-02
ES2120733T3 (en) 1998-11-01
EP0744089B1 (en) 1998-09-02
US5394413A (en) 1995-02-28
JP3843374B2 (en) 2006-11-08
US5483546A (en) 1996-01-09
EP0744089A1 (en) 1996-11-27
CA2182368A1 (en) 1995-08-17
DE69504475D1 (en) 1998-10-08
CA2182368C (en) 2004-08-17

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