WO1988002553A2 - Integrated circuit packaging configuration for rapid customized design and unique test capability - Google Patents
Integrated circuit packaging configuration for rapid customized design and unique test capability Download PDFInfo
- Publication number
- WO1988002553A2 WO1988002553A2 PCT/US1987/002497 US8702497W WO8802553A2 WO 1988002553 A2 WO1988002553 A2 WO 1988002553A2 US 8702497 W US8702497 W US 8702497W WO 8802553 A2 WO8802553 A2 WO 8802553A2
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- WO
- WIPO (PCT)
- Prior art keywords
- chips
- integrated circuit
- substrate
- package
- interconnect pads
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/317—Testing of digital circuits
- G01R31/3181—Functional testing
- G01R31/3185—Reconfiguring for testing, e.g. LSSD, partitioning
- G01R31/318505—Test of Modular systems, e.g. Wafers, MCM's
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5382—Adaptable interconnections, e.g. for engineering changes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
Definitions
- the present invention is generally directed to a packaging configuration for integrated circuit chips which guarantees routability of interconnection lines and which may be rapidly configured in accordance with a given engineering design. More particularly, the present invention is related to a packaging method in which polymer film overlays are provided with metallization patterns as a means for configuring an integrated circuit chip or chips in an operating arrangement which is customized yet may be produced in a very short time, typically less than one day.
- the packaging configuration of the present invention also permits the utilization of a novel macrocell chip design which is particularly useful for the testing of chip functional blocks.
- the generic problem to be solved herein is the fabrication of an electronic system from a given engineering design in an economical and expeditious fashion.
- a second, related problem is to provide a method of testing which quickly isolates faults and provides a very high degree of assurance that the tests have been thorough and complete.
- the testing method should be done in an expeditious and economical fashion.
- Prior art systems include: interconnecting of packaged chips by wire wrap and printed circuit techniques, gate arrays, programmable logic arrays and fully customized integrated circuit fabrication.
- Interconnecting packaged chips has been the main method to provide many electronic systems over the past 20 years.
- sockets with wire wraps are provided and logic chips to be interconnected are placed in these sockets. Subsequently, interconnections are provided by wrapping wires around wire wrap pins according to a wire list. This can be done by automatic or manual machinery.
- the major drawback of wire wrap is the length of time required to wrap a single board which precludes this method from being economic for all but prototyping applications.
- wire wrap boards cannot be checked for accuracy of wiring both in interconnect and shorts except by using expensive, dedicated machinery.
- wire wrap provides a relatively low performance interconnect since runs are long and since they suffer from high capacitance loading effects.
- wire wrap prototyping boards are expensive because they contain a large number of holes and each wire wrap socket must supply long pins for wire wrapping.
- Printed circuit boards are another method of interconnecting packaged chips.
- a printed circuit board typically comprises copper runs adhered to a glass-epoxy substrate. Packaged chips are mounted on the substrate and package pins are soldered to runs on the board. In terms of prototyping, the time from completion of the circuit definition until populated board are received can be quite long.
- Layout for the printed circuit boards can require two weeks to a month for a fairly complicated circuit board containing 100-200 chips. Even with computer aided layout, the amount of computer time required to route the board is substantial for a complicated board. In addition, complicated boards require multiple circuit layers which makes design and fabrication of printed circuit board a time consuming process. A typical short turn around time can be on the order of two weeks. In addition, special tooling must be provided in order to test that all the connections are made on the board and that no undesired short circuits exist. At this point it is still necessary to populate the board with chips and to solder them in place.
- Chip population is generally done in different plant locations than board fabrication because a large number of chips must be kept in inventory and are specific to the needs of a particular operating department, while board fabrication is more generic in nature.
- the problem of testing the finished assembly is the same as with a wire wrap method in that a fully interconnected assembly generally requires a large array of complex test vectors in order to derive a high degree of assurance that the system will work under all desired conditions.
- a gate array is also a solution to the problem of providing an electronic chip system.
- a gate array is primarily a medium to high volume device.
- arrays of P- channel and N- channel transistors are fabricated in an array structure on integrated circuit wafers. These circuits are completely fabricated with the exception of the last metallization step.
- Logic designs are achieved by custom connecting the P channel and N channel transistors with the last metallization layer. This method makes relatively efficient use of silicon and utilizes computer aided layout directly from circuit definitions. Time is required to fabricate masks for the last metallization step and to finish the processing of the wafers. Typical time for the steps of automatic layout mask generation and chip fabrication requires at least two weeks.
- a programmable logic array can be used to provide an electronic system economically in low volume for some applications.
- the major disadvantage of logic arrays is that they make inefficient use of silicon because the logic array must provide for all possible Boolean functions in "AND/OR" configurations. In those few applications where this type of Boolean logic is required the logic array can be programmed for the desired Boolean functions. Most systems, however, require a large number of logic arrays to achieve the desired function and this is not economical except possibly for the very first prototype.
- Full custom integrated circuits can generally provide about two to three times the functionality available in the same area from a gate array, but the processing cost and non-recurring cost is substantially increased. Layout must now involve all layers of the chip and processing must also involve all layers of the chip. Three month turnaround times are typical for the processing associated with a fully custom integrated circuit chip. Test vectors and probe cards are also special. This means that substantial volume must be involved before the fully custom chip is economical. As a rule of thumb, volumes over 10,000 units per year are generally required.
- TTL logic or “TTL functions” refer to a set of functional blocks generally referred to as the 7400 series and described in the text "The TTL Data Book for Design Engineers" by Texas Instruments, Inc. This function of interconnecting, buffering and tying together the primary components of the system is generally referred to as a "glue logic function".
- an integrated circuit package comprises a substrate together with a plurality of integrated circuit chips disposed on the substrate so as to define a channel between the chips.
- the chips possess interconnect pads for intra- and intercircuit connections.
- An overlay layer is disposed over the chips and the substrate and possesses a metallization pattern which includes a plurality of interrupted conductors extending along the channel.
- the overlay layer also includes apertures therein which are in alignment with at least some of the interconnect pads.
- the aforementioned package may then subsequently be provided with a second overlay layer to achieve a customizing function.
- the second overlying layer also has apertures aligned with at least some of the interconnect pads and also includes a second metallization pattern which connects, through the apertures, select interconnect pads.
- the second metallization pattern also includes at least some apertures therein positioned over the interrupted metallization pattern and includes metallization patterns thereon for connecting to and for bridging select ones of said interrupted conductors.
- a customized integrated circuit chip particularly one performing a glue logic function, is readily fabricated, typically in less than a day.
- the circuit and metallization pattern arrangements also ensure that routing for the second metallization pattern is readily providable without complicated or time consuming routing algorithms.
- a multifunction digital circuit includes a plurality of functional digital circuit blocks having input and output lines. Decoding means for selecting one of the functional blocks is also provided. Shift register means are also provided for storing test data and for storing output data from the output lines of the digital circuit blocks in response to test data presented. Such a multifunctional digital circuit may be repeated many times on a given integrated circuit die. Such a circuit is not only flexible, but is also readily testable both before and after customization.
- the fabrication of customized integrated circuit chips is achieved with very fast turn around time by combining high density interconnect methods described in related patent documents (referred to below) with a novel integrated circuit.
- the integrated circuit is configured with a large number of small pads which are interconnected by the high density interconnect method.
- the chip is divided into multiplicity of blocks which contains standard TTL functions such as latches, counters, gates, adders, etc.
- On-chip switches provide the ability to select a given logic function.
- a novel shift register circuit provides connections to all inputs and to all outputs on the chips for the purpose of testing. Testing can be accomplished both at the wafer level and uniquely at the system level where simple selection of switches can test any logic and any interconnects for opens and shorts.
- Blocks of logic elements and selection switches are iterated many times on a single chip.
- a single chip which is 128 mils on a side, can replace the function of 50 logic chips and, additionally, provide capability for testing each separate logic block together with the capability for testing all system wiring for proper connection and freedom from short circuits.
- Another object of the present invention is to provide an electronic system that is testable at all stages of fabrication using simple test vectors and simple procedures; these stages include testing at the wafer level, and testing with a high degree of assurance at the finished assembly level.
- a further object of the present invention is to provide an electronic system which eliminates the need for a printed circuit board.
- a still further object of the present invention is to provide a general purpose low power logic replacement for a multiplicity of TTL logic chips.
- Yet another object of the present invention is to provide an electronic system which can accommodate primary system components such as random access memory, ready only memory, microprocessors, and analog conversion devices, by interconnecting them with a glue logic function provided by a minimum number of fully tested chips with a large number of interconnect pads.
- Yet a further object of the present invention is to provide a single chip which has the functionality of a large number of TTL chips such that a multiplicity of chip types need not be inventoried.
- Yet another object of the present invention is to provide a structure in which very small chip pads are practical so that the chip can be interconnected by the small pads and the chip can be completely tested by conventional probing techniques at the wafer level.
- Another object of the present invention is to provide a structure which allows a simple high speed algorithm to automatically define interconnects according to the circuit design provided, and, additionally provide a structure in which the simple routing algorithm guarantees that 100% of the interconnections can be made.
- an object of the present invention is to provide an electronic system structure which can take optimal advantage of the increased connection density afforded by direct interconnection according to the high density interconnection methods disclosed in related patent documents.
- Figure 1 is a schematic plan view illustrating the placement of functionally flexible and testable circuits on a single die
- Figure 2 is a schematic plan view illustrating a packaging and routing package configuration in accordance with the present invention
- Figure 3 is a view similar to Figure 2 but more particularly illustrating the placement of power buses on a lower level;
- Figure 4 is a schematic diagram illustrating a general block diagram of a repeatable logic structure for the functional blocks shown in Figure 1;
- Figure 5 illustrates a timing diagram for a sample test sequence.
- FIG. 1 shows a functional equivalent of a block diagram of a customizable integrated circuit chip 10 in accordance with the present invention. It is seen from the figure that a basic block 20 is repeated a number of times and includes a number of input pads and output pads connected to a functional block which can provide virtually any TTL function. It is noted that chip 10 in Figure 1 is merely a functional diagram. While the chip pads are preferably arranged on the chip in a regular order, it is not necessary that they be configured as shown in Figure 1.
- Figure 1 should not be read as suggesting that the central area is devoid of circuitry or chip pads.
- Figure 1 is merely illustrative of the fact that chip 10 may be provided with a plurality of duplicate functional block 20.
- Block 20 are essentially independent entities, except perhaps for power connections.
- a preferable circuit for functional block 20 (in the context of providing a glue logic function) is discussed below with specific reference to Figure 4.
- pads refers to a conductive area on an integrated circuit chip specifically designed and positioned for interconnection to other circuit elements. It is also noted that in conventional integrated circuit chip design, the pads are typically positioned around the periphery of a chip. However, the high density interconnection method is particularly amenable to the placement of interconnect pads anywhere on the chip.
- Figure 2 shows a layout of 8 of the chips from
- FIG 1 on a substrate approximately 2 inches on a side.
- chips 10 are preferably configured so as to define a horizontal channel in which periodically interrupted conductors 30 are disposed.
- vertical wiring is typically disposed within regions 35 defined by phantom lines as shown. It is also to be particularly noted with respect to Figure 2 that it represents a multilayer circuit in accordance with the high density interconnect method described in the aforementioned copending applications.
- Figure 2 is also important in that it shows that 100% connection routing is achievable. This is important because it guarantees that a computer can always complete routing once the circuit definition is provided.
- Main channel wiring 30 comprises conductors disposed on 1 mil (for example) centers oriented horizontally as shown. These conductors are interrupted as shown in the diagram between each pair of chips mounted on the substrate. This is a preferred embodiment. However, it is noted that the main channel wiring does not have to be straight nor do chips have to be disposed in pairs. Main channel wiring 30 is, however, preferably disposed on the same substrate as chips 10.
- an overlay layer (not shown specifically in Figure 2) is applied. Via holes are fabricated over select pads on chips 10 and over the desired interconnect lines in the main channel section of the substrate. Details of these processes are contained in the aforementioned related patent documents. Via holes also fabricated on the ends of the main channel interconnect conductors 30 where it is necessary to continue a given conductor to the next pair of chips. Metallization is now applied and patterned. The interconnect lines can be brought out in an orderly fashion as shown in Figure 2. Although only a few lines are shown for clarity, it can be seen that connections can be made to all pads of a given functional equivalent block on each chip. Further, each functional equivalent block can be connected to any other functional equivalent block on the same chip or on any other chip in the system.
- FIG. 2 Two completed interconnections are shown in Figure 2 with the specific conductor runs shown more darkly.
- a connection is made from a chip pad on chip No. 1 through a via opening is the overlay layer (not shown) to vertically disposed conductor L 1a which extends over the overlay layer (not visible) to via opening V 1 a and down therethrough to main conductorsegment L 1b (part of channel wiring 30) which extends horizontally at the substrate level to via opening V 1 b wherein metallization pattern L 1c connects thereto through via opening V 1 b.
- Conductive pattern L 1 c is disposed on the overlay layer and extends between via openings V 1 b and V 1 c so as to link main wiring segments L 1b and L 1d .
- Line L 1d extends to via opening V 1d in the overlay layer and thereby connects to link L 1e disposed on top of the overlay layer and connecting segment L 1d with L 1f by means of customizing link L 1 e Segment L 1f extends from via opening V 1 e to via opening V 1 f at which point it connects to vertically oriented metallization line pattern L 1g disposed on the upper overlay layer and connects to a select pad on chip 6.
- the overlay layer metallization typically includes vertical links such as L 1a , L 1g (and for linking chips 3 and 4, vertical segments L 2a and L 2d ).
- the overay layer also includes horizontal links L 1c and L 1e which serve to bridge select interruptions in main channel wiring segments 30.
- a second customizing link is also shown between chips 3 and 4. This link includes vertical segments L 2a and L 2 d together with horizontal bridge L 2c disposed on the customizing metallization layer. Similarly, this second example link also includes horizontal main wire segments L 2b and L 2 d While it might first appear that link L 2 d and link
- L 1d intersect so as to cause an undesired connection, it is noted that these two conductors are actually disposed on different layers which are insulated from one another.
- L 1d is preferably disposed on the substrate layer while vertical link L 2 d is disposed on the customizing or overlay layer.
- the main channel need only be 2 inches wide. This width assumes a 1 mil conductor pitch for purposes of example. It is also seen that the distance between adjacent chips need only be 0.5 inches, also assuming a 1 mil conductor pitch since each chip has a total of 512 total chip pads, so that one-half of those would come out on each side. This space is more than ample since approximately 128 conductors for each chip arise from the bottom of the chip. The extra space available may be used to route the wiring which connects to the pins of the package.
- Figure 3 shows the assembled package with main channel wiring 30, power supply wiring busses 16 and 18 and chip package wells 15.
- An insulating spacer is made of ceramic punched in the green state or laser cut to provide wells 15 for the chips.
- the top surface of ceramic 17 is metallized by direct-bond copper methods or other conventional means for metal deposition on ceramic.
- Power supply busses 16 and 18, as shown, are provided either by etching or are built up by semiadditive printed circuit methods which are well known in the art. Subsequently, a layer of polymer, for example DuPont PyralinTM polymer is sprayed and cured on the ceramic.
- Vacuum deposition methods may be used to apply metallization and ordinary photolithographic methods are employed to pattern the metallization to form main channel conductors 30. Then, the package is ready for the addition of chips 10 into wells 15. At this point, a polymer film overlay may be provided as described in the aforementioned incorporated documents. The resulting structure is now ready for metallization and customizing as described above.
- FIG. 4 shows a block diagram illustrating a single functional block 20. It should be noted that this functional block can be repeated as many times as the size of the chip allows. With each repetition, a totally new logic function is available for interconnection in an electronic system.
- transmission gates such as gates 25, 26 and 29.
- Each set of transmission gates is controlled by a single test line. For example line 23e for TEST 1 or line 24d for TEST 2. The test involved with these lines is more particularly described below.
- transmission gates 25 connect input pads 23b to the appropriate internal circuitry.
- the input pads are isolated and internal circuitry is used to exercise the appropriate function block.
- shift register SR2A reference number 24
- shift register SR1B is employed to receive output signals (shift register ER1B is designated by reference number 22) for use in testing and configuring each of the function blocks 21a, 21b, 21c, etc.
- shift register SR2A In the test mode, the output of shift register SR2A is connected so as to internally supply test vectors to the appropriate logic function.
- shift register SR1A When the inputs are disabled, shift register SR1A is connected to receive signals on the same set of lines and transmit these signals to pads 23b which also function as a means for providing test signal output.
- Shift register SR1B designated reference numeral 22, is connected to receive outputs from each of the individual function blocks and to transmit these signals to a test point (pad) 22b.
- a logic function is selected by turning on the appropriate group of selection gates. Each group of selection gates associated with each logic function is connected to a decoder 28. Decoder 28 is addressed either by connection to shift register SR2B (reference numeral 27) or by connection to jumpers which bridge configuration selection pads 28a.
- jumpers are wired when the customizing interconnection wiring is patterned. Note that when a particular logic function is not selected, minimum sized NMOS devices are gated on through inverters 22e to hold all of the inputs of that device at ground and therefore, at minimum power consumption.
- Figure 4 shows the inclusion of latch block 21c, counter block 21b and a block denoted "general" designated by reference numeral 21a.
- Other blocks which may be employed include adders, subtracters, multiplexers, multipliers and the like. Typically, such blocks are selected from the so-called 7400 series of logic functions.
- FIG 4 shows some sample logic functions interconnected according to the present invention.
- the actual logic functions in the labeled boxes are well known in the art and accordingly their implementations need not be provided herein.
- general box 21a which represents any desired logic function.
- Examples of other logic functions which fit the format of the general box also include flip flops and decoder configurations.
- logic functions such as latches, counters, adders, decoders, etc. are relatively simple functions on a per bit basis and therefore, in the example of a 128 mil square chip, as many as 16 different logic functions can be accommodated in one repeatable logic block.
- the listing given above incorporates more than 90% of the total logic functions available in the so-called 7400 logic series.
- the present invention relates also to a method and structure of selecting a particular logic function and of interconnecting these logic functions according to a custom interconnection pattern. Note that part of the custom interconnection includes selection of the configuration and application of 1 or 0 logic level to the appropriate preset and configuration nodes on the logic element.
- the embodiment of the present invention shown in Figure 4 presents a unique testing capability. Each shift register shown in the function block of Figure 4 is repeated as the function blocks are repeated. As many shift registers as desired can be coupled in series such that only a data and a shift clock pad are necessary for shift registers where data is shifted into a shift register.
- DATA, SHIFT and LOAD pads are necessary where data is loaded in parallel into a shift register and then is shifted out. As a result, only 5 pads are necessary to control the data to any given shift register chain.
- a typical configuration involves chaining together the test shift registers for all the blocks on one side of a chip resulting in four sets of shift registers.
- data is loaded into shift registers SR2A and SR2B.
- Shift register SR2A selects the test pattern and shift register SR2B selects the block to be exercised.
- Shift register SR2A can consist of three stages for each test event.
- shift register SR1B contains the resultant output response of the selected logic function corresponding to the transient test vector applied by shift register SR2A.
- Figure 5 shows a timing relation for a test of the latch function in Figure 4.
- Bits DO and Dl are toggled from a 1 to a 0, while bits D2 and D3 are toggle from. a 0 to 1.
- shift register SR2A is clocked to set the DO through D3 bits. After a settling time, the shift register is clocked rapidly two more times. First to set the data into the latch and second to control the latch. After the propagation delay time of the latch has passed, the data appears at the output of the latch and is loaded into shift register SR1B. Shift register SR1B can then be "read out" and its contents compared with the expected results.
- the testing procedure is essentially the same.
- the configuration is defined by the interconnect wiring.
- Interconnects are provided to hardwire the inputs to the decoder.
- interconnects are provided which can tie together the input and output of the test shift registers and tie as many pads as necessary to external pins in the package. In this way, signals applied externally can be used to check for opens and shorts in all interconnects in the system.
- the procedure for checking for proper operation of a given logic function is the same as before.
- the test mode is selected by isolating the input pads with the transmission gate associated with them.
- Shift registers SR2A and SR2B are loaded and clocked as previously described with the resultant function output being loaded into shift register SR1B.
- the contents of shift register SR2B are superfluous since the decoder is hardwired to select only one of the logic functions.
- a wire check proceeds as follows: outputs are defined as sources and inputs as destinations. The strategy is to set one single source in . the entire system to logic 1 while all other sources are set to logic 0. Then test all destinations to determine that the logic 1 appears only at the desired destination and at no other point. This checks both for connectivity and for unwanted short circuits.
- each functional logic block operates as desired and that all interconnections in the system including those on the chip, are properly made without short circuits. This then provides a very high degree of assurance that the circuits function properly when the original logic is correct. Put another way, assuming the basic logic circuit is free from human logic error, any circuit tested for interconnect and logic block functionality performs the complex functions desired with a high degree of assurance.
- the structure described is a multiplicity of identical or nearly identical logic chips interconnected to form a complex electronic system.
- the chip described above can also be used in electronic systems which utilize primary electronic devices such as random access memory, microprocessor, analog to digital conversion and the like.
- the specific structure described uses only one layer of metallization for interconnection because one layer can be applied and patterned in less time than additional layers. Additional layers can be used to increase packing density of the system and interconnect one or more of the chips described to use them as the glue logic in complex electronic systems.
- the packaging system and multifunctional integrated circuit block of the present invention satisfies all of the objectives stated above. It is further seen that the system of the present invention provides a very significant advance in the art of integrated circuit packaging and customization. It is further seen that the system of the present invention makes it possible to rapidly fabricate complex electronic systems in very short periods of time. It is also seen that the system of the present invention makes is possible to construct and test complex integrated circuit systems and electronic components in a reliable and highly efficient manner. While the invention has been described in detail herein in accord with certain preferred embodiment thereof, many modifications and changes therein may be effected by those skilled in the art. Accordingly, it is intended by the appended claims to cover all such modifications and changes as fall within the true spirit and scope of the invention.
- High density interconnect method to take advantage of a packaging arrangement in which full customization o integrated circuit chip package is providable in a single metallization layer.
- the integrated circuit chips (10) are positio to take full advantage of a wiring layer which includes a plurality of periodically interrupted conductor patterns (30). of the customization is provided in a single layer which may be readily fabricated and produced in a single day maki possible for extremely rapid turn around time in the design of complex integrated circuit systems, particularly those structed from readily available integrated circuit components including microprocessors, random access memory c decoders and the like.
- An integrated circuit is also disclosed for fully taking advantage of the capabilities of testing m available by the high density interconnect system.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1019880700594A KR880701972A (en) | 1986-09-26 | 1988-05-26 | Integrated circuit packaging configuration for high-speed custom design and test |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/912,457 US4866508A (en) | 1986-09-26 | 1986-09-26 | Integrated circuit packaging configuration for rapid customized design and unique test capability |
US912,457 | 1986-09-26 |
Publications (2)
Publication Number | Publication Date |
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WO1988002553A2 true WO1988002553A2 (en) | 1988-04-07 |
WO1988002553A3 WO1988002553A3 (en) | 1988-05-05 |
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PCT/US1987/002497 WO1988002553A2 (en) | 1986-09-26 | 1987-09-28 | Integrated circuit packaging configuration for rapid customized design and unique test capability |
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US (1) | US4866508A (en) |
EP (1) | EP0283515A1 (en) |
JP (1) | JPH01501033A (en) |
KR (1) | KR880701972A (en) |
WO (1) | WO1988002553A2 (en) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5191224A (en) * | 1987-04-22 | 1993-03-02 | Hitachi, Ltd. | Wafer scale of full wafer memory system, packaging method thereof, and wafer processing method employed therein |
US5008727A (en) * | 1988-01-22 | 1991-04-16 | Matsushita Electric Industrial Co., Ltd. | Standard cell having test pad for probing and semiconductor integrated circuit device containing the standard cells |
US5155570A (en) * | 1988-06-21 | 1992-10-13 | Sanyo Electric Co., Ltd. | Semiconductor integrated circuit having a pattern layout applicable to various custom ICs |
US6304987B1 (en) | 1995-06-07 | 2001-10-16 | Texas Instruments Incorporated | Integrated test circuit |
US5019997A (en) * | 1989-06-05 | 1991-05-28 | General Electric Company | Adaptive lithography accommodation of tolerances in chip positioning in high density interconnection structures |
JP2632731B2 (en) * | 1989-08-02 | 1997-07-23 | 三菱電機株式会社 | Integrated circuit device |
US5121135A (en) * | 1989-08-25 | 1992-06-09 | Sharp Kabushiki Kaisha | Thermal head having integral analog drive compensation |
US6675333B1 (en) * | 1990-03-30 | 2004-01-06 | Texas Instruments Incorporated | Integrated circuit with serial I/O controller |
JP3394542B2 (en) * | 1990-03-30 | 2003-04-07 | テキサス インスツルメンツ インコーポレイテツド | Serial data input / output test equipment |
US5031073A (en) * | 1990-05-02 | 1991-07-09 | Hewlett-Packard Company | Fault-isolating apparatus and method for connecting circuitry |
US5338975A (en) * | 1990-07-02 | 1994-08-16 | General Electric Company | High density interconnect structure including a spacer structure and a gap |
US5214657A (en) * | 1990-09-21 | 1993-05-25 | Micron Technology, Inc. | Method for fabricating wafer-scale integration wafers and method for utilizing defective wafer-scale integration wafers |
US5144747A (en) * | 1991-03-27 | 1992-09-08 | Integrated System Assemblies Corporation | Apparatus and method for positioning an integrated circuit chip within a multichip module |
US5091769A (en) * | 1991-03-27 | 1992-02-25 | Eichelberger Charles W | Configuration for testing and burn-in of integrated circuit chips |
US5250843A (en) * | 1991-03-27 | 1993-10-05 | Integrated System Assemblies Corp. | Multichip integrated circuit modules |
US5111278A (en) * | 1991-03-27 | 1992-05-05 | Eichelberger Charles W | Three-dimensional multichip module systems |
US5239747A (en) * | 1991-09-18 | 1993-08-31 | Sgs-Thomson Microelectronics, Inc. | Method of forming integrated circuit devices |
DE69226150T2 (en) * | 1991-11-05 | 1999-02-18 | Hsu Fu Chieh | Redundancy architecture for circuit module |
US5831467A (en) * | 1991-11-05 | 1998-11-03 | Monolithic System Technology, Inc. | Termination circuit with power-down mode for use in circuit module architecture |
US5576554A (en) * | 1991-11-05 | 1996-11-19 | Monolithic System Technology, Inc. | Wafer-scale integrated circuit interconnect structure architecture |
US5498990A (en) * | 1991-11-05 | 1996-03-12 | Monolithic System Technology, Inc. | Reduced CMOS-swing clamping circuit for bus lines |
US5854534A (en) * | 1992-08-05 | 1998-12-29 | Fujitsu Limited | Controlled impedence interposer substrate |
JPH08500687A (en) * | 1992-08-10 | 1996-01-23 | モノリシック・システム・テクノロジー・インコーポレイテッド | Fault-tolerant high speed bus devices and interfaces for wafer scale integration |
US5490042A (en) * | 1992-08-10 | 1996-02-06 | Environmental Research Institute Of Michigan | Programmable silicon circuit board |
JPH0669306A (en) * | 1992-08-18 | 1994-03-11 | Sumitomo Kinzoku Ceramics:Kk | Sheetlike ceramic package |
US5216806A (en) * | 1992-09-01 | 1993-06-08 | Atmel Corporation | Method of forming a chip package and package interconnects |
US5329179A (en) * | 1992-10-05 | 1994-07-12 | Lattice Semiconductor Corporation | Arrangement for parallel programming of in-system programmable IC logical devices |
US6274391B1 (en) | 1992-10-26 | 2001-08-14 | Texas Instruments Incorporated | HDI land grid array packaged device having electrical and optical interconnects |
GB9223226D0 (en) | 1992-11-05 | 1992-12-16 | Algotronix Ltd | Improved configurable cellular array (cal ii) |
US5448165A (en) * | 1993-01-08 | 1995-09-05 | Integrated Device Technology, Inc. | Electrically tested and burned-in semiconductor die and method for producing same |
US5424589A (en) * | 1993-02-12 | 1995-06-13 | The Board Of Trustees Of The Leland Stanford Junior University | Electrically programmable inter-chip interconnect architecture |
US5396032A (en) * | 1993-05-04 | 1995-03-07 | Alcatel Network Systems, Inc. | Method and apparatus for providing electrical access to devices in a multi-chip module |
US5367763A (en) * | 1993-09-30 | 1994-11-29 | Atmel Corporation | TAB testing of area array interconnected chips |
US5455525A (en) * | 1993-12-06 | 1995-10-03 | Intelligent Logic Systems, Inc. | Hierarchically-structured programmable logic array and system for interconnecting logic elements in the logic array |
US5655113A (en) | 1994-07-05 | 1997-08-05 | Monolithic System Technology, Inc. | Resynchronization circuit for a memory system and method of operating same |
US5969538A (en) | 1996-10-31 | 1999-10-19 | Texas Instruments Incorporated | Semiconductor wafer with interconnect between dies for testing and a process of testing |
US6005406A (en) * | 1995-12-07 | 1999-12-21 | International Business Machines Corporation | Test device and method facilitating aggressive circuit design |
US5841193A (en) * | 1996-05-20 | 1998-11-24 | Epic Technologies, Inc. | Single chip modules, repairable multichip modules, and methods of fabrication thereof |
US5847450A (en) | 1996-05-24 | 1998-12-08 | Microchip Technology Incorporated | Microcontroller having an n-bit data bus width with less than n I/O pins |
US5731223A (en) * | 1996-09-24 | 1998-03-24 | Lsi Logic Corporation | Array of solder pads on an integrated circuit |
JP3166828B2 (en) * | 1997-05-06 | 2001-05-14 | 日本電気株式会社 | Semiconductor memory device |
US6405335B1 (en) | 1998-02-25 | 2002-06-11 | Texas Instruments Incorporated | Position independent testing of circuits |
US6294407B1 (en) | 1998-05-06 | 2001-09-25 | Virtual Integration, Inc. | Microelectronic packages including thin film decal and dielectric adhesive layer having conductive vias therein, and methods of fabricating the same |
US6225821B1 (en) * | 1998-05-18 | 2001-05-01 | Lattice Semiconductor Corporation | Package migration for related programmable logic devices |
US6111756A (en) * | 1998-09-11 | 2000-08-29 | Fujitsu Limited | Universal multichip interconnect systems |
US6245634B1 (en) | 1999-10-28 | 2001-06-12 | Easic Corporation | Method for design and manufacture of semiconductors |
US6236229B1 (en) | 1999-05-13 | 2001-05-22 | Easic Corporation | Integrated circuits which employ look up tables to provide highly efficient logic cells and logic functionalities |
US6194912B1 (en) * | 1999-03-11 | 2001-02-27 | Easic Corporation | Integrated circuit device |
US6331733B1 (en) | 1999-08-10 | 2001-12-18 | Easic Corporation | Semiconductor device |
US6445242B2 (en) * | 1999-11-23 | 2002-09-03 | Texas Instruments Incorporated | Fuse selectable pinout package |
US6728915B2 (en) | 2000-01-10 | 2004-04-27 | Texas Instruments Incorporated | IC with shared scan cells selectively connected in scan path |
US6769080B2 (en) | 2000-03-09 | 2004-07-27 | Texas Instruments Incorporated | Scan circuit low power adapter with counter |
US6707077B2 (en) | 2002-03-16 | 2004-03-16 | Memx, Inc. | Chip interconnect bus |
US20030173648A1 (en) | 2002-03-16 | 2003-09-18 | Sniegowski Jeffry Joseph | Multi-die chip and method for making the same |
US6919616B2 (en) * | 2002-03-16 | 2005-07-19 | Memx, Inc. | Chip with passive electrical contacts |
US6791162B2 (en) | 2002-03-16 | 2004-09-14 | Memx, Inc. | Unit cell architecture for electrical interconnects |
US6706619B2 (en) | 2002-03-16 | 2004-03-16 | Memx, Inc. | Method for tiling unit cells |
US7132696B2 (en) * | 2002-08-28 | 2006-11-07 | Micron Technology, Inc. | Intermeshed guard bands for multiple voltage supply structures on an integrated circuit, and methods of making same |
US6835262B1 (en) * | 2003-06-19 | 2004-12-28 | Northrop Grumman Corporation | Positive pressure hot bonder |
US7203074B1 (en) | 2003-07-28 | 2007-04-10 | Intellect Lab, Llc | Electronic circuit building block |
JP2005123362A (en) * | 2003-10-16 | 2005-05-12 | Hitachi Ltd | Mounting substrate for connection, and mounting substrate for connection of disc array controller |
US7875010B2 (en) * | 2007-06-04 | 2011-01-25 | Frazier Latoya Nicole | Incontinence device |
US9599661B2 (en) | 2012-09-27 | 2017-03-21 | Intel Corporation | Testing device for validating stacked semiconductor devices |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0083406A2 (en) * | 1981-12-31 | 1983-07-13 | International Business Machines Corporation | Module for supporting electrical components |
EP0178227A2 (en) * | 1984-10-05 | 1986-04-16 | Fujitsu Limited | Integrated circuit semiconductor device formed on a wafer |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3290756A (en) * | 1962-08-15 | 1966-12-13 | Hughes Aircraft Co | Method of assembling and interconnecting electrical components |
US3702025A (en) * | 1969-05-12 | 1972-11-07 | Honeywell Inc | Discretionary interconnection process |
US3679941A (en) * | 1969-09-22 | 1972-07-25 | Gen Electric | Composite integrated circuits including semiconductor chips mounted on a common substrate with connections made through a dielectric encapsulator |
US3691628A (en) * | 1969-10-31 | 1972-09-19 | Gen Electric | Method of fabricating composite integrated circuits |
US4300153A (en) * | 1977-09-22 | 1981-11-10 | Sharp Kabushiki Kaisha | Flat shaped semiconductor encapsulation |
US4209356A (en) * | 1978-10-18 | 1980-06-24 | General Electric Company | Selective etching of polymeric materials embodying silicones via reactor plasmas |
DE3060913D1 (en) * | 1979-05-12 | 1982-11-11 | Fujitsu Ltd | Improvement in method of manufacturing electronic device having multilayer wiring structure |
US4479088A (en) * | 1981-01-16 | 1984-10-23 | Burroughs Corporation | Wafer including test lead connected to ground for testing networks thereon |
US4417393A (en) * | 1981-04-01 | 1983-11-29 | General Electric Company | Method of fabricating high density electronic circuits having very narrow conductors |
US4426773A (en) * | 1981-05-15 | 1984-01-24 | General Electric Ceramics, Inc. | Array of electronic packaging substrates |
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
US4613891A (en) * | 1984-02-17 | 1986-09-23 | At&T Bell Laboratories | Packaging microminiature devices |
US4677528A (en) * | 1984-05-31 | 1987-06-30 | Motorola, Inc. | Flexible printed circuit board having integrated circuit die or the like affixed thereto |
US4588468A (en) * | 1985-03-28 | 1986-05-13 | Avco Corporation | Apparatus for changing and repairing printed circuit boards |
US4617085A (en) * | 1985-09-03 | 1986-10-14 | General Electric Company | Process for removing organic material in a patterned manner from an organic film |
EP0228694A3 (en) * | 1985-12-30 | 1989-10-04 | E.I. Du Pont De Nemours And Company | Process using combination of laser etching and another etchant in formation of conductive through-holes in a dielectric layer |
-
1986
- 1986-09-26 US US06/912,457 patent/US4866508A/en not_active Expired - Lifetime
-
1987
- 1987-09-28 WO PCT/US1987/002497 patent/WO1988002553A2/en not_active Application Discontinuation
- 1987-09-28 JP JP62507119A patent/JPH01501033A/en active Pending
- 1987-09-28 EP EP87907691A patent/EP0283515A1/en not_active Ceased
-
1988
- 1988-05-26 KR KR1019880700594A patent/KR880701972A/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0083406A2 (en) * | 1981-12-31 | 1983-07-13 | International Business Machines Corporation | Module for supporting electrical components |
EP0178227A2 (en) * | 1984-10-05 | 1986-04-16 | Fujitsu Limited | Integrated circuit semiconductor device formed on a wafer |
Also Published As
Publication number | Publication date |
---|---|
US4866508A (en) | 1989-09-12 |
KR880701972A (en) | 1988-11-07 |
JPH01501033A (en) | 1989-04-06 |
WO1988002553A3 (en) | 1988-05-05 |
EP0283515A1 (en) | 1988-09-28 |
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