US7120031B2 - Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors - Google Patents

Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors Download PDF

Info

Publication number
US7120031B2
US7120031B2 US10/884,644 US88464404A US7120031B2 US 7120031 B2 US7120031 B2 US 7120031B2 US 88464404 A US88464404 A US 88464404A US 7120031 B2 US7120031 B2 US 7120031B2
Authority
US
United States
Prior art keywords
substrate
ceramic
die
coupled
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related, expires
Application number
US10/884,644
Other versions
US20040238942A1 (en
Inventor
Kishore K. Chakravorty
Paul H. Wermer
David G. Figueroa
Debabrata Gupta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intel Corp
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Priority to US10/884,644 priority Critical patent/US7120031B2/en
Publication of US20040238942A1 publication Critical patent/US20040238942A1/en
Priority to US11/466,351 priority patent/US7535728B2/en
Application granted granted Critical
Publication of US7120031B2 publication Critical patent/US7120031B2/en
Adjusted expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01077Iridium [Ir]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01087Francium [Fr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/023Reduction of cross-talk, noise or electromagnetic interference using auxiliary mounted passive components or auxiliary substances
    • H05K1/0231Capacitors or dielectric substances
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits
    • H05K1/141One or more single auxiliary printed circuits mounted on a main printed circuit, e.g. modules, adapters
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/182Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
    • H05K1/185Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/0929Conductive planes
    • H05K2201/09309Core having two or more power planes; Capacitive laminate of two power planes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10621Components characterised by their electrical contacts
    • H05K2201/10674Flip chip
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4602Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H05K3/4605Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated made from inorganic insulating material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4688Composite multilayer circuits, i.e. comprising insulating layers having different properties

Definitions

  • the present subject matter relates generally to electronics packaging. More particularly, the present subject matter relates to an electronic assembly that includes a ceramic/organic hybrid substrate having one or more embedded capacitors to reduce switching noise in a high speed integrated circuit, and to manufacturing methods related thereto.
  • Integrated circuits are typically assembled into packages by physically and electrically coupling them to a substrate made of organic or ceramic material.
  • One or more IC packages can be physically and electrically coupled to a printed circuit board (PCB) to form an “electronic assembly”.
  • the “electronic assembly” can be part of an “electronic system”.
  • An “electronic system” is broadly defined herein as any product comprising an “electronic assembly”.
  • Examples of electronic systems include computers (e.g., desktop, laptop, hand-held, server, etc.), wireless communications devices (e.g., cellular phones, cordless phones, pagers, etc.), computer-related peripherals (e.g., printers, scanners, monitors, etc.), entertainment devices (e.g., televisions, radios, stereos, tape and compact disc players, video cassette recorders, MP3 (Motion Picture Experts Group, Audio Layer 3 ) players, etc.), and the like.
  • computers e.g., desktop, laptop, hand-held, server, etc.
  • wireless communications devices e.g., cellular phones, cordless phones, pagers, etc.
  • computer-related peripherals e.g., printers, scanners, monitors, etc.
  • entertainment devices e.g., televisions, radios, stereos, tape and compact disc players, video cassette recorders, MP3 (Motion Picture Experts Group, Audio Layer 3 ) players, etc.
  • MP3 Motion Picture Experts Group
  • An IC substrate may comprise a number of insulated metal layers selectively patterned to provide metal interconnect lines (referred to herein as “traces”), and one or more electronic components mounted on one or more surfaces of the substrate.
  • the electronic component or components are functionally connected to other elements of an electronic system through a hierarchy of conductive paths that includes the substrate traces.
  • the substrate traces typically carry signals that are transmitted between the electronic components, such as ICs, of the system.
  • Some ICs have a relatively large number of input/output (I/O) terminals, as well as a large number of power and ground terminals. The large number of I/O, power, and ground terminals requires that the substrate contain a relatively large number of traces.
  • Some substrates require multiple layers of traces to accommodate all of the system interconnections.
  • Traces located within different layers can be connected electrically by vias formed in the substrate, which vias are referred to as “through-vias” if they go through substantially the entire substrate, or “blind vias” it they connect traces on only two or three layers.
  • a via can be made by making a hole through some or all layers of a substrate and then plating the interior hole surface or filling the hole with an electrically conductive material, such as copper or tungsten.
  • C4 controlled collapse chip connect
  • FIG. 1 is a block diagram of an electronic system incorporating at least one electronic assembly with embedded capacitors in accordance with one embodiment of the subject matter;
  • FIG. 2 illustrates a top-view of a die on a substrate
  • FIG. 3 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2 ;
  • FIG. 4 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2 , in accordance with an alternative embodiment
  • FIG. 5 is a flow diagram of a method of fabricating a substrate to package a die, in accordance with one embodiment of the subject matter.
  • an IC die or chip is directly mounted to a hybrid organic/ceramic multilayer substrate, of which a ceramic portion contains one or more embedded capacitors, and of which an organic portion includes suitable routing and fan-out of power, ground, and signal conductors.
  • the substrate portion contains a multi-layer stack of conductive plates separated by high dielectric layers for forming one or more high-valued integrated capacitors.
  • the overlying organic portion contains high density dielectric layers comprising metal interconnections. The organic layers are used for routing conductors and for transitioning from the die bump pitch on the die to the more relaxed pitch on the opposite surface of the substrate. Because the organic portion is relatively thin, the integrated decoupling capacitors of the ceramic portion can be kept relatively close to the die, resulting in relatively low reactive inductance when the IC is operating.
  • the use of a relatively rigid ceramic portion provides a desirable amount of stiffness to the package and significantly reduces the tendency of the organic/ceramic structure to bend or warp. Also, because the coefficient of thermal expansion (CTE) of the ceramic portion is close to that of the die, the use of the ceramic portion helps minimize thermal-induced mechanical stress in the die.
  • CTE coefficient of thermal expansion
  • FIG. 1 is a block diagram of an electronic system 1 incorporating at least one electronic assembly 4 with embedded capacitors in accordance with one embodiment of the subject matter.
  • Electronic system 1 is merely one example of an electronic system in which the present subject matter can be used.
  • electronic system 1 comprises a data processing system that includes a system bus 2 to couple the various components of the system.
  • System bus 2 provides communications links among the various components of the electronic system 1 and can be implemented as a single bus, as a combination of busses, or in any other suitable manner.
  • Electronic assembly 4 is coupled to system bus 2 .
  • Electronic assembly 4 can include any circuit or combination of circuits.
  • electronic assembly 4 includes a processor 6 which can be of any type.
  • processor means any type of computational circuit, such as but not limited to a microprocessor, a microcontroller, a complex instruction set computing (CISC) microprocessor, a reduced instruction set computing (RISC) microprocessor, a very long instruction word (VLIW) microprocessor, a graphics processor, a digital signal processor (DSP), or any other type of processor or processing circuit.
  • CISC complex instruction set computing
  • RISC reduced instruction set computing
  • VLIW very long instruction word
  • DSP digital signal processor
  • circuits that can be included in electronic assembly 4 are a custom circuit, an application-specific integrated circuit (ASIC), or the like, such as, for example, one or more circuits (such as a communications circuit 7 ) for use in wireless devices like cellular telephones, pagers, portable computers, two-way radios, and similar electronic systems.
  • ASIC application-specific integrated circuit
  • the IC can perform any other type of function.
  • Electronic system 1 can also include an external memory 10 , which in turn can include one or more memory elements suitable to the particular application, such as a main memory 12 in the form of random access memory (RAM), one or more hard drives 14 , and/or one or more drives that handle removable media 16 such as floppy diskettes, compact disks (CDs), digital video disk (DVD), and the like.
  • a main memory 12 in the form of random access memory (RAM)
  • hard drives 14 a hard drives
  • removable media 16 such as floppy diskettes, compact disks (CDs), digital video disk (DVD), and the like.
  • Electronic system 1 can also include a display device 8 , a speaker 9 , and a keyboard and/or controller 20 , which can include a mouse, trackball, game controller, voice-recognition device, or any other device that permits a system user to input information into and/or receive information from the electronic system 1 .
  • a display device 8 can also include a keyboard and/or controller 20 , which can include a mouse, trackball, game controller, voice-recognition device, or any other device that permits a system user to input information into and/or receive information from the electronic system 1 .
  • a keyboard and/or controller 20 which can include a mouse, trackball, game controller, voice-recognition device, or any other device that permits a system user to input information into and/or receive information from the electronic system 1 .
  • FIG. 2 illustrates a top-view of a die 60 on a substrate 50 , in accordance with one embodiment of the subject matter.
  • This die/substrate structure can form part of electronic assembly 4 shown in FIG. 1 .
  • Die 60 can be of any type.
  • die 60 is a processor.
  • die 60 comprises a plurality of signal conductors (not shown) that terminate in lands on the bottom surface of die 60 (not shown). These lands can be coupled to corresponding lands or signal nodes (not shown) on substrate 50 by appropriate connections such as solder bumps or solder balls 62 . Solder balls 62 are typically arranged in rows around the periphery of die 60 . In FIG. 2 we are looking through die 62 at the solder balls on the bottom surface of die 60 . The shaded balls represent signal nodes. The clear balls represent power supply nodes. As used herein, the term “power supply node” refers to either a ground node (e.g. Vss) or to a power node at a potential different from ground (e.g. Vcc).
  • Vss ground node
  • Vcc potential different from ground
  • die 60 also includes, in addition to signal conductors, a plurality of power and ground conductors (not shown) that terminate on lands on the bottom surface in the central core of die 60 (not shown). These lands can be coupled to corresponding lands (not shown) on substrate 50 by appropriate connections such as solder balls 64 and 66 .
  • solder balls 64 can be coupled to Vcc potential
  • solder balls 66 can be coupled to Vss potential.
  • present subject matter is not to be construed as limited to use in C4 packages, and it can be used with any other type of IC package where the herein-described features of the present subject matter provide an advantage.
  • FIG. 3 illustrates a cross-section of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2 , in accordance with one embodiment of the subject matter.
  • the multilayer substrate comprises an organic portion 80 and a ceramic portion 90 .
  • One important purpose of the subject matter is to provide relatively high capacitance, for example in the form of one or more capacitors embedded in ceramic portion 90 , relatively close to the die in order to reduce the effect of reactive inductive coupling when the IC is operating, particularly at high clock speeds.
  • organic portion 80 comprises a plurality of organic layers 81 – 83 .
  • Organic portion 80 provides a suitable medium for routing and fanning-out, if desired, conductive traces for I/O signals and/or for power supply potentials such as Vcc and Vss.
  • a signal conductor (not shown) on die 60 can be coupled to solder ball 62 , which in turn is coupled to land 101 , signal via 103 , conductive segment 105 , signal via 107 , and land 109 .
  • signal vias 111 and 113 extend from signal conductors on die 60 through appropriate conductive paths to their own respective lands 109 on the bottom surface of substrate 50 .
  • signal vias on the right-hand side of die 60 are routed and fanned-out from signal conductors (not shown) on die 60 to corresponding lands on the bottom surface of substrate 50 .
  • Lands 109 , 147 , and 157 on the bottom surface of substrate 50 can be coupled through suitable connectors (not shown), such as solder balls, to corresponding nodes or lands 201 , 203 , and 205 of a substrate 200 that is subjacent to substrate 50 .
  • the subjacent substrate 200 can be similar or identical to substrate 50 , or it can be a printed circuit board (PCB) or card, or other type of substrate.
  • PCB printed circuit board
  • the pitch of various conductors can optionally be increased, if desired, within the organic portion 80 from a relatively close die bump pitch on the upper surface of substrate 50 to a greater pitch of the signal and/or power supply lands on the bottom surface of substrate 50 .
  • Fan-out of signal conductors can aid in decreasing undesirable I/O capacitive coupling between signal conductors, particularly if they run through relatively thick embedded capacitors in ceramic portion 90 comprising relatively thick ceramic ply.
  • fan-out of the signal conductors may not be necessary if they run through relatively thin embedded capacitors comprising only a few layers of thin, high Dk ceramic sheets (e.g. 10 microns or less) and/or of high Dk thin film (e.g. 1 micron or less).
  • Ceramic portion 90 in one embodiment, comprises a plurality of ceramic layers 91 – 95 . Embedded within ceramic layers 91 – 95 , a single capacitor is illustrated, for the sake of simplicity of illustration and description, that includes a first pair of connected plates 141 at Vcc potential and a second pair of connected plates 151 at Vss potential. Between the plates 141 and 151 is an insulating layer of a high permittivity material.
  • Ceramic portion 90 provides a suitable medium for providing one or more high value capacitors having first and second terminals that are coupled to Vcc and Vss conductors, respectively, in the core of die 60 .
  • a Vcc conductor (not shown) on die 60 can be coupled to each solder ball 64 .
  • Each of solder balls 64 is coupled to a land 147 on the bottom surface of substrate 50 by a circuit that includes land 121 , Vcc via 115 , conductive plates 141 joined by via 143 , and Vcc via 145 .
  • a Vss conductor (not shown) on die 60 can be coupled to each solder ball 66 .
  • Each of solder balls 66 is coupled to a land 157 on the bottom surface of substrate 50 by a circuit that includes land 125 , Vss via 116 , conductive plates 151 joined by via 153 , and Vss via 155 .
  • Substrate 50 can include one or more reference planes, such as reference plane 85 , comprising a conductive layer of material.
  • reference plane 85 is fabricated as an upper layer of ceramic portion 90 ; however, it could alternatively be fabricated as part of organic portion 80 .
  • Substrate 50 can include multiple Vcc, Vss, and signal conductors, only a few of which are illustrated for the sake of simplicity.
  • the embedded capacitors each comprise a pair of capacitive plates, with high permittivity (Dk) layers between the capacitive plates.
  • a first terminal is coupled to one plate, and a second terminal is coupled to the other plate.
  • a “terminal” can either be the plate itself or a trace coupled to the plate.
  • a first pair of capacitive plates (e.g. plates 141 ) of one capacitor can be coupled to a Vcc terminal (not shown) on die 60 by way of solder ball 64 as well as to a Vcc terminal 147 on the lower surface of substrate 50 .
  • a second pair of capacitive plates (e.g. plates 151 ) of the capacitor can be coupled to a Vss terminal (not shown) on die 60 by way of solder ball 66 as well as to a Vss terminal 157 on the lower surface of substrate 50 .
  • ceramic portion 90 of substrate 50 can include one or more embedded capacitors each having only two plates or having more than two connected plates per polarity.
  • capacitors having different numbers of connected plates per polarity could also be used. For example, within one substrate one capacitor could have only one plate of each polarity, and another capacitor could have three connected plates per polarity.
  • the particular geometry of the embedded capacitors is very flexible in terms of the orientation, size, number, location, and composition of their constituent elements.
  • One or more discrete capacitors could be used instead of the capacitive structure illustrated in FIG. 3 .
  • high permittivity layer means a layer of high permittivity material such as a high permittivity ceramic ply such as titanate particles; a high permittivity dielectric film such as a titanate film that is deposited, for example, by Sol-Gel or metal-organic chemical vapor deposition (MOCVD) techniques; or a layer of any other type of high permittivity material.
  • Substrate 50 can be provided with one or more embedded capacitors of any suitable type.
  • Die 60 can comprise a relatively large number of Vss and Vcc die bumps distributed in the core regions of the die 60 .
  • This large parallel connectivity ensures very low inductance (e.g. ⁇ 1 pico-Henry) and enhances the current carrying ability of the overall IC packaging structure.
  • organic/ceramic hybrid substrate 50 can be implemented using known organic and ceramic substrate technology to fabricate the constituent structural elements.
  • the structure, including types of materials used, dimensions, number of layers, layout of power and signal conductors, and so forth, of substrate 50 can be built in a wide variety of embodiments, depending upon the requirements of the electronic assembly of which it forms a part.
  • Substrate 50 can be coupled to an additional packaging element through the lands on its lower surface, such as lands 109 , 147 , and 157 .
  • the additional packaging element can be any suitable device, such a secondary substrate 200 that is identical to, similar to, or different from substrate 50 .
  • Substrate 200 could be, for example, a printed circuit board (PCB) or card, a mother board, or any other type of packaging element.
  • PCB printed circuit board
  • the conductive plates 141 and 151 comprise conductive layers formed at the boundary between adjoining insulating layers of ceramic material.
  • a first pair of conductive plates 141 are formed between ceramic layers 91 / 92 and 93 / 94
  • a second pair of conductive plates 151 are formed between ceramic layers 92 / 93 and 94 / 95 .
  • the first pair of conductive plates 141 are joined by via 143 , and they are coupled to Vcc.
  • the second pair of conductive plates 151 are joined by via 153 , and they are coupled to Vss.
  • Conductive plates 141 and 151 can extend, if desired, throughout substantially the entire region between adjoining layers of ceramic material.
  • via 143 that electrically couples conductive layers or plates 141 will be seen to penetrate and pass through an adjacent one of the second pair of conductive plates 151 without electrically contacting same.
  • via 153 that electrically couples conductive layers or plates 151 will be seen to penetrate an adjacent one of the first pair of conductive plates 141 without electrically contacting it.
  • via 143 is perpendicular to and has a geometrical projection upon either or both of the first pair of conductive layers or plates 141 .
  • This geometrical projection of via 143 is surrounded by the corresponding conductive plate 141 . That is, the conductive plate extends in every direction from the location where the via 143 contacts the plate 141 .
  • via 153 is perpendicular to and has a geometrical projection upon either or both of the second pair of conductive layers or plates 151 . This geometrical projection of via 153 is surrounded by the corresponding conductive plate 151 .
  • FIG. 4 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2 , in accordance with an alternative embodiment.
  • conductive plates 341 and 351 comprise conductive layers formed within the layers of ceramic material.
  • a first pair of conductive plates 341 are formed within ceramic layers 91 and 93
  • a second pair of conductive plates 351 are formed within ceramic layers 92 and 94 .
  • the conductive layers can be formed, for example, within the layers of ceramic material when the ceramic layers are being built up.
  • the first pair of conductive plates 341 are joined by via 143 , and they are coupled to Vcc.
  • the second pair of conductive plates 351 are joined by via 153 , and they are coupled to Vss.
  • Conductive plates 341 and 351 can extend, if desired, throughout substantially the entire region between adjoining layers of ceramic material.
  • the structure of the substrate illustrated in FIG. 4 and the fabrication thereof, can be carried out with any or all of the variations mentioned above regarding the embodiment illustrated in FIG. 3 .
  • FIGS. 2–4 are merely representational and are not drawn to scale. Certain proportions thereof may be exaggerated, while others may be minimized. FIGS. 2–4 are intended to illustrate various implementations of the subject matter that can be understood and appropriately carried out by those of ordinary skill in the art.
  • the organic portion 80 of substrate 50 can be fabricated by conventional techniques, such as but not limited to conventional organic build-up techniques.
  • dielectric layers 81 – 83 can be fabricated from materials such as epoxies, acrylates, polyimides, polyurethanes, polysulfides, resin-glass weave (e.g. FR-4), nylons, and other similar materials.
  • the layers can be constructed using familiar equipment for extruding, coating, spinning on, spraying, screen-printing, stenciling, and doctor-blading. Coating equipment such as a meniscus coater or curtain coater could be used.
  • Ceramic portion 90 of substrate 50 can be fabricated by conventional techniques, such as but not limited to high temperature co-fired ceramic (HTCC) technology, high thermal coefficient of expansion (HITCE) technology, or glass ceramic technology.
  • HTCC high temperature co-fired ceramic
  • HITCE high thermal coefficient of expansion
  • ESR equivalent series resistance
  • Multilayer stacks of high Dk ply can be used in ceramic portion 50 .
  • High Dk ply is commercially available for fabricating ceramic chip capacitors, for example.
  • Suitable high Dk materials such as titanate particles, can be inserted into the conventional ceramic matrix.
  • Multilayer stacks of high Dk ply, such as BaTiO 3 in the present subject matter can provide capacitances as high as 10 ⁇ F/sq. cm.
  • layers of high Dk film such as a titanate film, e.g. (Ba X T 1-X )TiO 3 (BST) or PbZrTiO 3 (PZT) or Ta 2 O 5 or SrTiO 3
  • a titanate film e.g. (Ba X T 1-X )TiO 3 (BST) or PbZrTiO 3 (PZT) or Ta 2 O 5 or SrTiO 3
  • MOCVD metal-organic chemical vapor deposition
  • Sol-Gel process in which a sol, which is a colloidal suspension of solid particles in a liquid, transforms into a gel due to growth and interconnection of the solid particles.
  • high Dk material can be embedded at temperature ranges that are compatible with ceramic technology (e.g. 600–1000 degrees Centigrade).
  • Metal traces and vias can be formed in organic portion 80 and/or ceramic portion 90 using additive or subtractive techniques that are well known to those of ordinary skill in the art. For example, vias can be punched through each layer prior to stacking, and they can then be filled with metal paste prior to ceramic firing.
  • FIG. 5 is a flow diagram of a method of fabricating a substrate to package a die, in accordance with one embodiment of the subject matter. According to this method, a ceramic/organic hybrid substrate having at least one embedded capacitor is fabricated. The method begins at 251 .
  • a first portion 90 ( FIG. 3 ) of the substrate is formed using ceramic materials.
  • the first portion includes at least one signal node, such as signal conductor 107 ( FIG. 3 ).
  • the first portion also includes at least one capacitor having a first terminal, such as conductive plate 141 , and a second terminal, such as conductive plate 151 ( FIG. 3 ).
  • a second portion 80 ( FIG. 3 ) of the substrate is formed using organic materials.
  • the second portion has multiple conductors, such as vias 103 , 111 , 113 , 115 , and 116 ( FIG. 3 ).
  • the conductors include a first conductor, such as via 115 ( FIG. 3 ), that is coupled to the first terminal of the capacitor.
  • the conductors also include a second conductor, such as via 116 ( FIG. 3 ), that is coupled to the second terminal of the capacitor.
  • the conductors further include a third conductor, such as via 103 ( FIG. 3 ), that is coupled to the signal node 107 ( FIG. 3 ) within the first portion 90 ( FIG. 3 ) of the substrate.
  • a first number of lands such as lands 101 , 121 , and 125 ( FIG. 3 ), are formed on a surface of the second portion 80 ( FIG. 3 ) of the substrate.
  • the lands include a first land, such as land 121 , coupled to the first conductor 115 ( FIG. 3 ); a second land, such as land 125 , coupled to the second conductor 116 ( FIG. 3 ); and a third land, such as 101 , coupled to the third conductor 107 ( FIG. 3 ).
  • the first land 121 ( FIG. 3 ) is positioned to be coupled to a first power supply node (e.g. Vcc) of a die 60 ( FIG. 3 ) that is to be juxtaposed to the upper surface of the substrate 50 and physically affixed thereto.
  • the second land 125 ( FIG. 3 ) is positioned to be coupled to a second power supply node (e.g. Vss) of die 60 ( FIG. 3 ).
  • the third land 101 ( FIG. 3 ) is positioned to be coupled to a signal node of die 60 ( FIG. 3 ).
  • a second number of lands such as lands 109 , 147 , and 157 ( FIG. 3 ), are formed on a surface of the first portion 90 ( FIG. 3 ) of the substrate.
  • the lands include a fourth land, such as land 147 , coupled to the first terminal 141 ( FIG. 3 ); a fifth land, such as land 157 , coupled to the second terminal 151 ( FIG. 3 ); and a sixth land, such as 109 , coupled to the signal node 107 of the first portion 90 ( FIG. 3 ).
  • the fourth land 147 ( FIG. 3 ) is positioned to be coupled to a first power supply node 203 (e.g. Vcc) of a subjacent substrate 200 ( FIG. 3 ).
  • the fifth land 157 ( FIG. 3 ) is positioned to be coupled to a second power supply node 205 (e.g. Vss) of subjacent substrate 200 ( FIG. 3 ).
  • the sixth land 109 ( FIG. 3 ) is positioned to be coupled to a signal node 201 of subjacent substrate 200 ( FIG. 3 ).
  • some or all of the conductors of the second portion 80 are fanned out from a first, relatively tight pitch of the first number of lands (e.g. lands 101 , 121 , 125 ) to a second, relatively relaxed pitch of the second number of lands (e.g. lands 109 , 147 , 157 ).
  • This fan-out is fabricated primarily within second portion 80 of substrate 50 .
  • fan-out is not necessarily limited to second portion 80 , and some fan-out could also be performed within first portion 90 of substrate 50 .
  • the method ends at 263 .
  • the present subject matter provides for an electronic assembly and methods of manufacture thereof that minimize problems, such as switching noise, associated with high clock frequencies and high power delivery.
  • the present subject matter provides scalable high capacitance (e.g. >10 mF/square centimeter) by employing one or more embedded decoupling capacitors having low inductance which can satisfy the power delivery requirements of, for example, high performance processors.
  • the ceramic portion that comprises the decoupling capacitors can be positioned relatively close to the IC die, thus minimizing the inductance.
  • the ceramic portion lends itself well to the fabrication of high valued embedded capacitors and also provides requisite stiffening to the package to prevent warpage.
  • An electronic system that incorporates the present subject matter can operate reliably at higher clock frequencies and is therefore more commercially attractive.
  • the present subject matter can be implemented in a number of different embodiments, including a substrate, an electronic assembly, an electronic system, a data processing system, and methods for making a substrate.
  • a substrate an electronic assembly
  • an electronic system an electronic system
  • a data processing system and methods for making a substrate.
  • Other embodiments will be readily apparent to those of ordinary skill in the art.
  • the elements, materials, geometries, and dimensions can all be varied to suit particular packaging requirements.

Abstract

To reduce switching noise, the power supply terminals of an integrated circuit die are coupled to the respective terminals of at least one embedded capacitor in a multilayer ceramic/organic hybrid substrate. In one embodiment, a ceramic portion of the substrate includes at least one capacitor formed of a high permittivity layer sandwiched between conductive planes. An organic portion of the substrate includes suitable routing and fan-out of power and signal conductors. The organic portion includes a build-up of multiple layers of organic material overlying the ceramic portion. Also described are an electronic system, a data processing system, and various methods of manufacture.

Description

DIVISIONAL APPLICATION
The present application is a divisional of application U.S. Ser. No. 09/650,566, filed on Aug. 30, 2000, now issued as U.S. Pat. No. 6,775,150, which is incorporated herein by reference.
OTHER RELATED APPLICATIONS
The present application is related to the following applications which are assigned to the same assignee as the present application:
Ser. No. 09/631,037, entitled “Electronic Assembly Comprising Substrate with Embedded Capacitors”, now U.S. Pat. No. 6,611,419; and
Ser. No. 09/628,705, entitled “Electronic Assembly Comprising Interposer with Embedded Capacitors and Methods of Manufacture”.
TECHNICAL FIELD
The present subject matter relates generally to electronics packaging. More particularly, the present subject matter relates to an electronic assembly that includes a ceramic/organic hybrid substrate having one or more embedded capacitors to reduce switching noise in a high speed integrated circuit, and to manufacturing methods related thereto.
BACKGROUND INFORMATION
Integrated circuits (ICs) are typically assembled into packages by physically and electrically coupling them to a substrate made of organic or ceramic material. One or more IC packages can be physically and electrically coupled to a printed circuit board (PCB) to form an “electronic assembly”. The “electronic assembly” can be part of an “electronic system”. An “electronic system” is broadly defined herein as any product comprising an “electronic assembly”. Examples of electronic systems include computers (e.g., desktop, laptop, hand-held, server, etc.), wireless communications devices (e.g., cellular phones, cordless phones, pagers, etc.), computer-related peripherals (e.g., printers, scanners, monitors, etc.), entertainment devices (e.g., televisions, radios, stereos, tape and compact disc players, video cassette recorders, MP3 (Motion Picture Experts Group, Audio Layer 3) players, etc.), and the like.
In the field of electronic systems there is an incessant competitive pressure among manufacturers to drive the performance of their equipment up while driving down production costs. This is particularly true regarding the packaging of ICs on substrates, where each new generation of packaging must provide increased performance while generally being smaller or more compact in size.
An IC substrate may comprise a number of insulated metal layers selectively patterned to provide metal interconnect lines (referred to herein as “traces”), and one or more electronic components mounted on one or more surfaces of the substrate. The electronic component or components are functionally connected to other elements of an electronic system through a hierarchy of conductive paths that includes the substrate traces. The substrate traces typically carry signals that are transmitted between the electronic components, such as ICs, of the system. Some ICs have a relatively large number of input/output (I/O) terminals, as well as a large number of power and ground terminals. The large number of I/O, power, and ground terminals requires that the substrate contain a relatively large number of traces. Some substrates require multiple layers of traces to accommodate all of the system interconnections.
Traces located within different layers can be connected electrically by vias formed in the substrate, which vias are referred to as “through-vias” if they go through substantially the entire substrate, or “blind vias” it they connect traces on only two or three layers. A via can be made by making a hole through some or all layers of a substrate and then plating the interior hole surface or filling the hole with an electrically conductive material, such as copper or tungsten.
One of the conventional methods for mounting an IC on a substrate is called “controlled collapse chip connect” (C4). In fabricating a C4 package, the electrically conductive terminations or lands (generally referred to as “electrical contacts”) of an IC component are soldered directly to corresponding lands on the surface of the substrate using reflowable solder bumps or balls. The C4 process is widely used because of its robustness and simplicity.
As the internal circuitry of ICs, such as processors, operates at higher and higher clock frequencies, and as ICs operate at higher and higher power levels, switching noise can increase to unacceptable levels.
For the reasons stated above, and for other reasons stated below which will become apparent to those skilled in the art upon reading and understanding the present specification, there is a significant need in the art for a method and apparatus for packaging an IC on a substrate that minimize problems, such as switching noise, associated with high clock frequencies and high power delivery.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a block diagram of an electronic system incorporating at least one electronic assembly with embedded capacitors in accordance with one embodiment of the subject matter;
FIG. 2 illustrates a top-view of a die on a substrate;
FIG. 3 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2;
FIG. 4 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2, in accordance with an alternative embodiment; and
FIG. 5 is a flow diagram of a method of fabricating a substrate to package a die, in accordance with one embodiment of the subject matter.
DETAILED DESCRIPTION
In the following detailed description of embodiments of the subject matter, reference is made to the accompanying drawings which form a part hereof, and in which is shown by way of illustration specific preferred embodiments in which the subject matter may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice them, and it is to be understood that other embodiments may be utilized and that logical, mechanical and electrical changes may be made without departing from the spirit and scope of the present subject matter. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of embodiment of the present subject matter is defined only by the appended claims.
The present subject matter provides a solution to power delivery problems that are associated with prior art packaging of integrated circuits that operate at high clock speeds and high power levels by embedding one or more decoupling capacitors in a multilayer substrate. Various embodiments are illustrated and described herein. In one embodiment, an IC die or chip is directly mounted to a hybrid organic/ceramic multilayer substrate, of which a ceramic portion contains one or more embedded capacitors, and of which an organic portion includes suitable routing and fan-out of power, ground, and signal conductors.
The substrate portion contains a multi-layer stack of conductive plates separated by high dielectric layers for forming one or more high-valued integrated capacitors. The overlying organic portion contains high density dielectric layers comprising metal interconnections. The organic layers are used for routing conductors and for transitioning from the die bump pitch on the die to the more relaxed pitch on the opposite surface of the substrate. Because the organic portion is relatively thin, the integrated decoupling capacitors of the ceramic portion can be kept relatively close to the die, resulting in relatively low reactive inductance when the IC is operating.
In addition to the foregoing advantages, the use of a relatively rigid ceramic portion provides a desirable amount of stiffness to the package and significantly reduces the tendency of the organic/ceramic structure to bend or warp. Also, because the coefficient of thermal expansion (CTE) of the ceramic portion is close to that of the die, the use of the ceramic portion helps minimize thermal-induced mechanical stress in the die.
FIG. 1 is a block diagram of an electronic system 1 incorporating at least one electronic assembly 4 with embedded capacitors in accordance with one embodiment of the subject matter. Electronic system 1 is merely one example of an electronic system in which the present subject matter can be used. In this example, electronic system 1 comprises a data processing system that includes a system bus 2 to couple the various components of the system. System bus 2 provides communications links among the various components of the electronic system 1 and can be implemented as a single bus, as a combination of busses, or in any other suitable manner.
Electronic assembly 4 is coupled to system bus 2. Electronic assembly 4 can include any circuit or combination of circuits. In one embodiment, electronic assembly 4 includes a processor 6 which can be of any type. As used herein, “processor” means any type of computational circuit, such as but not limited to a microprocessor, a microcontroller, a complex instruction set computing (CISC) microprocessor, a reduced instruction set computing (RISC) microprocessor, a very long instruction word (VLIW) microprocessor, a graphics processor, a digital signal processor (DSP), or any other type of processor or processing circuit.
Other types of circuits that can be included in electronic assembly 4 are a custom circuit, an application-specific integrated circuit (ASIC), or the like, such as, for example, one or more circuits (such as a communications circuit 7) for use in wireless devices like cellular telephones, pagers, portable computers, two-way radios, and similar electronic systems. The IC can perform any other type of function.
Electronic system 1 can also include an external memory 10, which in turn can include one or more memory elements suitable to the particular application, such as a main memory 12 in the form of random access memory (RAM), one or more hard drives 14, and/or one or more drives that handle removable media 16 such as floppy diskettes, compact disks (CDs), digital video disk (DVD), and the like.
Electronic system 1 can also include a display device 8, a speaker 9, and a keyboard and/or controller 20, which can include a mouse, trackball, game controller, voice-recognition device, or any other device that permits a system user to input information into and/or receive information from the electronic system 1.
FIG. 2 illustrates a top-view of a die 60 on a substrate 50, in accordance with one embodiment of the subject matter. This die/substrate structure can form part of electronic assembly 4 shown in FIG. 1. Die 60 can be of any type. In one embodiment, die 60 is a processor.
In FIG. 2, die 60 comprises a plurality of signal conductors (not shown) that terminate in lands on the bottom surface of die 60 (not shown). These lands can be coupled to corresponding lands or signal nodes (not shown) on substrate 50 by appropriate connections such as solder bumps or solder balls 62. Solder balls 62 are typically arranged in rows around the periphery of die 60. In FIG. 2 we are looking through die 62 at the solder balls on the bottom surface of die 60. The shaded balls represent signal nodes. The clear balls represent power supply nodes. As used herein, the term “power supply node” refers to either a ground node (e.g. Vss) or to a power node at a potential different from ground (e.g. Vcc).
Still referring to FIG. 2, die 60 also includes, in addition to signal conductors, a plurality of power and ground conductors (not shown) that terminate on lands on the bottom surface in the central core of die 60 (not shown). These lands can be coupled to corresponding lands (not shown) on substrate 50 by appropriate connections such as solder balls 64 and 66. For example, solder balls 64 can be coupled to Vcc potential, and solder balls 66 can be coupled to Vss potential.
While an embodiment is shown in which signal traces are provided around the periphery and Vcc and Vss traces are provided at the die core, the subject matter is equally applicable to embodiments where signal traces occur other than at the periphery, and to embodiments where Vcc and Vss traces are provided anywhere on the die.
Further, the present subject matter is not to be construed as limited to use in C4 packages, and it can be used with any other type of IC package where the herein-described features of the present subject matter provide an advantage.
FIG. 3 illustrates a cross-section of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2, in accordance with one embodiment of the subject matter. The multilayer substrate comprises an organic portion 80 and a ceramic portion 90. One important purpose of the subject matter is to provide relatively high capacitance, for example in the form of one or more capacitors embedded in ceramic portion 90, relatively close to the die in order to reduce the effect of reactive inductive coupling when the IC is operating, particularly at high clock speeds.
In one embodiment, organic portion 80 comprises a plurality of organic layers 8183. Organic portion 80 provides a suitable medium for routing and fanning-out, if desired, conductive traces for I/O signals and/or for power supply potentials such as Vcc and Vss. For example, a signal conductor (not shown) on die 60 can be coupled to solder ball 62, which in turn is coupled to land 101, signal via 103, conductive segment 105, signal via 107, and land 109. Likewise, signal vias 111 and 113 extend from signal conductors on die 60 through appropriate conductive paths to their own respective lands 109 on the bottom surface of substrate 50. In similar fashion, signal vias on the right-hand side of die 60 (as viewed in FIG. 3) are routed and fanned-out from signal conductors (not shown) on die 60 to corresponding lands on the bottom surface of substrate 50.
Lands 109, 147, and 157 on the bottom surface of substrate 50 can be coupled through suitable connectors (not shown), such as solder balls, to corresponding nodes or lands 201, 203, and 205 of a substrate 200 that is subjacent to substrate 50. The subjacent substrate 200 can be similar or identical to substrate 50, or it can be a printed circuit board (PCB) or card, or other type of substrate.
The pitch of various conductors, whether signal or power supply conductors, can optionally be increased, if desired, within the organic portion 80 from a relatively close die bump pitch on the upper surface of substrate 50 to a greater pitch of the signal and/or power supply lands on the bottom surface of substrate 50. Fan-out of signal conductors can aid in decreasing undesirable I/O capacitive coupling between signal conductors, particularly if they run through relatively thick embedded capacitors in ceramic portion 90 comprising relatively thick ceramic ply. However, fan-out of the signal conductors may not be necessary if they run through relatively thin embedded capacitors comprising only a few layers of thin, high Dk ceramic sheets (e.g. 10 microns or less) and/or of high Dk thin film (e.g. 1 micron or less).
Ceramic portion 90, in one embodiment, comprises a plurality of ceramic layers 9195. Embedded within ceramic layers 9195, a single capacitor is illustrated, for the sake of simplicity of illustration and description, that includes a first pair of connected plates 141 at Vcc potential and a second pair of connected plates 151 at Vss potential. Between the plates 141 and 151 is an insulating layer of a high permittivity material.
Ceramic portion 90 provides a suitable medium for providing one or more high value capacitors having first and second terminals that are coupled to Vcc and Vss conductors, respectively, in the core of die 60. For example, a Vcc conductor (not shown) on die 60 can be coupled to each solder ball 64. Each of solder balls 64 is coupled to a land 147 on the bottom surface of substrate 50 by a circuit that includes land 121, Vcc via 115, conductive plates 141 joined by via 143, and Vcc via 145. Likewise, a Vss conductor (not shown) on die 60 can be coupled to each solder ball 66. Each of solder balls 66 is coupled to a land 157 on the bottom surface of substrate 50 by a circuit that includes land 125, Vss via 116, conductive plates 151 joined by via 153, and Vss via 155.
Substrate 50 can include one or more reference planes, such as reference plane 85, comprising a conductive layer of material. In one embodiment, reference plane 85 is fabricated as an upper layer of ceramic portion 90; however, it could alternatively be fabricated as part of organic portion 80.
Substrate 50 can include multiple Vcc, Vss, and signal conductors, only a few of which are illustrated for the sake of simplicity.
As mentioned above, in one embodiment, the embedded capacitors each comprise a pair of capacitive plates, with high permittivity (Dk) layers between the capacitive plates. A first terminal is coupled to one plate, and a second terminal is coupled to the other plate. A “terminal” can either be the plate itself or a trace coupled to the plate.
A first pair of capacitive plates (e.g. plates 141) of one capacitor can be coupled to a Vcc terminal (not shown) on die 60 by way of solder ball 64 as well as to a Vcc terminal 147 on the lower surface of substrate 50. Likewise, a second pair of capacitive plates (e.g. plates 151) of the capacitor can be coupled to a Vss terminal (not shown) on die 60 by way of solder ball 66 as well as to a Vss terminal 157 on the lower surface of substrate 50.
In other embodiments, ceramic portion 90 of substrate 50 can include one or more embedded capacitors each having only two plates or having more than two connected plates per polarity. Moreover, within one substrate, capacitors having different numbers of connected plates per polarity could also be used. For example, within one substrate one capacitor could have only one plate of each polarity, and another capacitor could have three connected plates per polarity.
The particular geometry of the embedded capacitors is very flexible in terms of the orientation, size, number, location, and composition of their constituent elements. One or more discrete capacitors could be used instead of the capacitive structure illustrated in FIG. 3. Reference may be made to Related Applications 1 and 2 above for further details on the structure and composition of the embedded capacitors.
The expression “high permittivity layer” as used herein means a layer of high permittivity material such as a high permittivity ceramic ply such as titanate particles; a high permittivity dielectric film such as a titanate film that is deposited, for example, by Sol-Gel or metal-organic chemical vapor deposition (MOCVD) techniques; or a layer of any other type of high permittivity material. Substrate 50 can be provided with one or more embedded capacitors of any suitable type.
Die 60 can comprise a relatively large number of Vss and Vcc die bumps distributed in the core regions of the die 60. This large parallel connectivity ensures very low inductance (e.g. <1 pico-Henry) and enhances the current carrying ability of the overall IC packaging structure.
Various embodiments of organic/ceramic hybrid substrate 50 can be implemented using known organic and ceramic substrate technology to fabricate the constituent structural elements. The structure, including types of materials used, dimensions, number of layers, layout of power and signal conductors, and so forth, of substrate 50 can be built in a wide variety of embodiments, depending upon the requirements of the electronic assembly of which it forms a part.
Substrate 50 can be coupled to an additional packaging element through the lands on its lower surface, such as lands 109, 147, and 157. The additional packaging element can be any suitable device, such a secondary substrate 200 that is identical to, similar to, or different from substrate 50. Substrate 200 could be, for example, a printed circuit board (PCB) or card, a mother board, or any other type of packaging element.
In FIG. 3, the conductive plates 141 and 151 comprise conductive layers formed at the boundary between adjoining insulating layers of ceramic material. For example, a first pair of conductive plates 141 are formed between ceramic layers 91/92 and 93/94, and a second pair of conductive plates 151 are formed between ceramic layers 92/93 and 94/95. The first pair of conductive plates 141 are joined by via 143, and they are coupled to Vcc. The second pair of conductive plates 151 are joined by via 153, and they are coupled to Vss. Conductive plates 141 and 151 can extend, if desired, throughout substantially the entire region between adjoining layers of ceramic material.
Still referring to FIG. 3, via 143 that electrically couples conductive layers or plates 141 will be seen to penetrate and pass through an adjacent one of the second pair of conductive plates 151 without electrically contacting same. Similarly, via 153 that electrically couples conductive layers or plates 151 will be seen to penetrate an adjacent one of the first pair of conductive plates 141 without electrically contacting it.
With further reference to an embodiment shown in FIG. 3, via 143 is perpendicular to and has a geometrical projection upon either or both of the first pair of conductive layers or plates 141. This geometrical projection of via 143 is surrounded by the corresponding conductive plate 141. That is, the conductive plate extends in every direction from the location where the via 143 contacts the plate 141. Similarly, via 153 is perpendicular to and has a geometrical projection upon either or both of the second pair of conductive layers or plates 151. This geometrical projection of via 153 is surrounded by the corresponding conductive plate 151.
FIG. 4 illustrates a cross-sectional representation of the die/substrate structure of FIG. 2 taken along line 70 of FIG. 2, in accordance with an alternative embodiment. In this embodiment, conductive plates 341 and 351 comprise conductive layers formed within the layers of ceramic material. For example, a first pair of conductive plates 341 are formed within ceramic layers 91 and 93, and a second pair of conductive plates 351 are formed within ceramic layers 92 and 94. The conductive layers can be formed, for example, within the layers of ceramic material when the ceramic layers are being built up.
The first pair of conductive plates 341 are joined by via 143, and they are coupled to Vcc. The second pair of conductive plates 351 are joined by via 153, and they are coupled to Vss. Conductive plates 341 and 351 can extend, if desired, throughout substantially the entire region between adjoining layers of ceramic material. The structure of the substrate illustrated in FIG. 4, and the fabrication thereof, can be carried out with any or all of the variations mentioned above regarding the embodiment illustrated in FIG. 3.
FIGS. 2–4 are merely representational and are not drawn to scale. Certain proportions thereof may be exaggerated, while others may be minimized. FIGS. 2–4 are intended to illustrate various implementations of the subject matter that can be understood and appropriately carried out by those of ordinary skill in the art.
FABRICATION
The organic portion 80 of substrate 50 (FIG. 3) can be fabricated by conventional techniques, such as but not limited to conventional organic build-up techniques. For example, dielectric layers 8183 can be fabricated from materials such as epoxies, acrylates, polyimides, polyurethanes, polysulfides, resin-glass weave (e.g. FR-4), nylons, and other similar materials. The layers can be constructed using familiar equipment for extruding, coating, spinning on, spraying, screen-printing, stenciling, and doctor-blading. Coating equipment such as a meniscus coater or curtain coater could be used.
Ceramic portion 90 of substrate 50 can be fabricated by conventional techniques, such as but not limited to high temperature co-fired ceramic (HTCC) technology, high thermal coefficient of expansion (HITCE) technology, or glass ceramic technology.
To ensure low equivalent series resistance (ESR) values, a low temperature silver or copper compatible co-fired ceramic technology may be used. The resulting thin ceramic sheets have a typical thickness of below 10 microns and a Dk value in the range of 2000–5000.
Multilayer stacks of high Dk ply can be used in ceramic portion 50. High Dk ply is commercially available for fabricating ceramic chip capacitors, for example. Suitable high Dk materials, such as titanate particles, can be inserted into the conventional ceramic matrix. Multilayer stacks of high Dk ply, such as BaTiO3, in the present subject matter can provide capacitances as high as 10 μF/sq. cm.
In an alternative embodiment, layers of high Dk film, such as a titanate film, e.g. (BaXT1-X)TiO3 (BST) or PbZrTiO3 (PZT) or Ta2O5 or SrTiO3, can be formed in the ceramic portion 50 by known techniques such as a metal-organic chemical vapor deposition (MOCVD) process, or a Sol-Gel process, in which a sol, which is a colloidal suspension of solid particles in a liquid, transforms into a gel due to growth and interconnection of the solid particles.
In either case, high Dk material can be embedded at temperature ranges that are compatible with ceramic technology (e.g. 600–1000 degrees Centigrade).
Metal traces and vias can be formed in organic portion 80 and/or ceramic portion 90 using additive or subtractive techniques that are well known to those of ordinary skill in the art. For example, vias can be punched through each layer prior to stacking, and they can then be filled with metal paste prior to ceramic firing.
FIG. 5 is a flow diagram of a method of fabricating a substrate to package a die, in accordance with one embodiment of the subject matter. According to this method, a ceramic/organic hybrid substrate having at least one embedded capacitor is fabricated. The method begins at 251.
In 253, a first portion 90 (FIG. 3) of the substrate is formed using ceramic materials. The first portion includes at least one signal node, such as signal conductor 107 (FIG. 3). The first portion also includes at least one capacitor having a first terminal, such as conductive plate 141, and a second terminal, such as conductive plate 151 (FIG. 3).
In 255, a second portion 80 (FIG. 3) of the substrate is formed using organic materials. The second portion has multiple conductors, such as vias 103, 111, 113, 115, and 116 (FIG. 3). The conductors include a first conductor, such as via 115 (FIG. 3), that is coupled to the first terminal of the capacitor. The conductors also include a second conductor, such as via 116 (FIG. 3), that is coupled to the second terminal of the capacitor. The conductors further include a third conductor, such as via 103 (FIG. 3), that is coupled to the signal node 107 (FIG. 3) within the first portion 90 (FIG. 3) of the substrate.
In 257, a first number of lands, such as lands 101, 121, and 125 (FIG. 3), are formed on a surface of the second portion 80 (FIG. 3) of the substrate. The lands include a first land, such as land 121, coupled to the first conductor 115 (FIG. 3); a second land, such as land 125, coupled to the second conductor 116 (FIG. 3); and a third land, such as 101, coupled to the third conductor 107 (FIG. 3).
Still with regard to 257 in FIG. 4, the first land 121 (FIG. 3) is positioned to be coupled to a first power supply node (e.g. Vcc) of a die 60 (FIG. 3) that is to be juxtaposed to the upper surface of the substrate 50 and physically affixed thereto. The second land 125 (FIG. 3) is positioned to be coupled to a second power supply node (e.g. Vss) of die 60 (FIG. 3). The third land 101 (FIG. 3) is positioned to be coupled to a signal node of die 60 (FIG. 3).
In 259, a second number of lands, such as lands 109, 147, and 157 (FIG. 3), are formed on a surface of the first portion 90 (FIG. 3) of the substrate. The lands include a fourth land, such as land 147, coupled to the first terminal 141 (FIG. 3); a fifth land, such as land 157, coupled to the second terminal 151 (FIG. 3); and a sixth land, such as 109, coupled to the signal node 107 of the first portion 90 (FIG. 3).
Still with regard to 259 in FIG. 4, the fourth land 147 (FIG. 3) is positioned to be coupled to a first power supply node 203 (e.g. Vcc) of a subjacent substrate 200 (FIG. 3). The fifth land 157 (FIG. 3) is positioned to be coupled to a second power supply node 205 (e.g. Vss) of subjacent substrate 200 (FIG. 3). The sixth land 109 (FIG. 3) is positioned to be coupled to a signal node 201 of subjacent substrate 200 (FIG. 3).
In 261, some or all of the conductors of the second portion 80 (FIG. 3) are fanned out from a first, relatively tight pitch of the first number of lands (e.g. lands 101, 121, 125) to a second, relatively relaxed pitch of the second number of lands (e.g. lands 109, 147, 157). This fan-out is fabricated primarily within second portion 80 of substrate 50. However, fan-out is not necessarily limited to second portion 80, and some fan-out could also be performed within first portion 90 of substrate 50. The method ends at 263.
The operations described above with respect to the methods illustrated in FIG. 5 can be performed in a different order from those described herein. For example, it will be understood by those of ordinary skill that 261 will preferably be carried out during the fabrication of second portion 80 in 255. Also, 259 could be carried out during the fabrication of the first portion 90 in 253.
CONCLUSION
The present subject matter provides for an electronic assembly and methods of manufacture thereof that minimize problems, such as switching noise, associated with high clock frequencies and high power delivery. The present subject matter provides scalable high capacitance (e.g. >10 mF/square centimeter) by employing one or more embedded decoupling capacitors having low inductance which can satisfy the power delivery requirements of, for example, high performance processors. By using a thin organic portion for conductor routing, the ceramic portion that comprises the decoupling capacitors can be positioned relatively close to the IC die, thus minimizing the inductance. The ceramic portion lends itself well to the fabrication of high valued embedded capacitors and also provides requisite stiffening to the package to prevent warpage. An electronic system that incorporates the present subject matter can operate reliably at higher clock frequencies and is therefore more commercially attractive.
As shown herein, the present subject matter can be implemented in a number of different embodiments, including a substrate, an electronic assembly, an electronic system, a data processing system, and methods for making a substrate. Other embodiments will be readily apparent to those of ordinary skill in the art. The elements, materials, geometries, and dimensions can all be varied to suit particular packaging requirements.
Although specific embodiments have been illustrated and described herein, any arrangement which is calculated to achieve the same purpose may be substituted for the specific embodiments shown. This application is intended to cover any adaptations or variations of the present subject matter. Therefore, it is manifestly intended that embodiments of this subject matter be limited only by the claims and the equivalents thereof.

Claims (3)

1. A data processing system comprising:
a bus coupling components in the data processing system;
a display coupled to the bus;
external memory coupled to the bus; and
a processor coupled to the bus and comprising an electronic assembly including:
a die comprising first and second power supply nodes and a first signal node; and
a multilayer substrate comprising:
a ceramic portion comprising a second signal node and at least one embedded capacitor having a first terminal and a second terminal; and
an organic portion comprising a plurality of conductors, including a first conductor coupling the first power supply node to the first terminal, a second conductor coupling the second power supply node to the second terminal, and a third conductor coupling the first signal node to the second signal node.
2. The data processing system recited in claim 1, wherein the plurality of conductors are fanned out within the organic portion.
3. The data processing system recited in claim 1, wherein the organic portion comprises a plurality of layers, each comprising a portion of the plurality of conductors.
US10/884,644 2000-08-30 2004-07-02 Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors Expired - Fee Related US7120031B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/884,644 US7120031B2 (en) 2000-08-30 2004-07-02 Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors
US11/466,351 US7535728B2 (en) 2000-08-30 2006-08-22 Electronic assemblies comprising ceramic/organic hybrid substrate with embedded capacitors

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/650,566 US6775150B1 (en) 2000-08-30 2000-08-30 Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture
US10/884,644 US7120031B2 (en) 2000-08-30 2004-07-02 Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US09/650,566 Division US6775150B1 (en) 2000-08-30 2000-08-30 Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/466,351 Continuation US7535728B2 (en) 2000-08-30 2006-08-22 Electronic assemblies comprising ceramic/organic hybrid substrate with embedded capacitors

Publications (2)

Publication Number Publication Date
US20040238942A1 US20040238942A1 (en) 2004-12-02
US7120031B2 true US7120031B2 (en) 2006-10-10

Family

ID=24609420

Family Applications (3)

Application Number Title Priority Date Filing Date
US09/650,566 Expired - Fee Related US6775150B1 (en) 2000-08-30 2000-08-30 Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture
US10/884,644 Expired - Fee Related US7120031B2 (en) 2000-08-30 2004-07-02 Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors
US11/466,351 Expired - Fee Related US7535728B2 (en) 2000-08-30 2006-08-22 Electronic assemblies comprising ceramic/organic hybrid substrate with embedded capacitors

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US09/650,566 Expired - Fee Related US6775150B1 (en) 2000-08-30 2000-08-30 Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture

Family Applications After (1)

Application Number Title Priority Date Filing Date
US11/466,351 Expired - Fee Related US7535728B2 (en) 2000-08-30 2006-08-22 Electronic assemblies comprising ceramic/organic hybrid substrate with embedded capacitors

Country Status (6)

Country Link
US (3) US6775150B1 (en)
EP (1) EP1314200A2 (en)
CN (1) CN1284234C (en)
AU (1) AU2001286857A1 (en)
MY (1) MY128632A (en)
WO (1) WO2002019430A2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050194669A1 (en) * 2004-03-05 2005-09-08 Joong-Ho Kim Integrated circuit package with chip-side signal connections
US20060012966A1 (en) * 2000-07-31 2006-01-19 Intel Corporation Electronic assemblies and systems comprising interposer with embedded capacitors
US20060081977A1 (en) * 2003-12-26 2006-04-20 Norio Sakai Ceramic multilayer substrate
US20070145560A1 (en) * 2005-12-28 2007-06-28 Tessera, Inc. Packaged chip having features for improved signal transmission on the package
US20080180926A1 (en) * 2005-10-20 2008-07-31 Murata Manufacturing Co., Ltd. Circuit module and circuit device including circuit module
US20090200074A1 (en) * 2008-02-12 2009-08-13 International Business Machines Corporation Circuit Substrate Having Post-Fed Die Side Power Supply Connections
US7576995B2 (en) * 2005-11-04 2009-08-18 Entorian Technologies, Lp Flex circuit apparatus and method for adding capacitance while conserving circuit board surface area
US20090251872A1 (en) * 2008-04-08 2009-10-08 Faraday Technology Corp. Power supply architecture for structural asic
US20100155119A1 (en) * 2006-11-30 2010-06-24 Matsushita Electric Industrial Co., Ltd. Passive component incorporating interposer
US20160260795A1 (en) * 2015-03-03 2016-09-08 Renesas Electronics Corporation Method of manufacturing semiconductor device
US10424571B2 (en) 2016-12-30 2019-09-24 Samsung Electronics Co., Ltd. Electronic device package

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6775150B1 (en) * 2000-08-30 2004-08-10 Intel Corporation Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture
JP3967108B2 (en) * 2001-10-26 2007-08-29 富士通株式会社 Semiconductor device and manufacturing method thereof
WO2003100800A1 (en) * 2002-05-24 2003-12-04 Philips Intellectual Property & Standards Gmbh Decoupling module for decoupling high-frequency signals from a power supply line
US7422921B2 (en) * 2002-11-27 2008-09-09 Abc Taiwan Electronics Corp. Micromesh material and micromesh mono-crystal high frequency capacitor and its producing method
JP5000071B2 (en) * 2003-02-26 2012-08-15 新光電気工業株式会社 Semiconductor device substrate and semiconductor device
CN1317923C (en) * 2003-09-29 2007-05-23 财团法人工业技术研究院 A base plate structure having built-in capacitor
US7265446B2 (en) * 2003-10-06 2007-09-04 Elpida Memory, Inc. Mounting structure for semiconductor parts and semiconductor device
EP1673808B1 (en) * 2003-10-10 2020-01-01 Taiwan Semiconductor Manufacturing Co., Ltd. Electronic device and carrier substrate
US8569142B2 (en) * 2003-11-28 2013-10-29 Blackberry Limited Multi-level thin film capacitor on a ceramic substrate and method of manufacturing the same
JP4195883B2 (en) * 2004-02-04 2008-12-17 インターナショナル・ビジネス・マシーンズ・コーポレーション Multilayer module
JP2005310814A (en) * 2004-04-16 2005-11-04 Alps Electric Co Ltd Substrate with built-in capacitor
US20060000542A1 (en) * 2004-06-30 2006-01-05 Yongki Min Metal oxide ceramic thin film on base metal electrode
DE102004037826B4 (en) * 2004-08-04 2006-06-14 Infineon Technologies Ag Semiconductor device with interconnected semiconductor devices
US7290315B2 (en) * 2004-10-21 2007-11-06 Intel Corporation Method for making a passive device structure
US20060099803A1 (en) * 2004-10-26 2006-05-11 Yongki Min Thin film capacitor
US20060091495A1 (en) * 2004-10-29 2006-05-04 Palanduz Cengiz A Ceramic thin film on base metal electrode
US7480648B2 (en) * 2004-12-06 2009-01-20 International Business Machines Corporation Research rapidity and efficiency improvement by analysis of research artifact similarity
US7205652B2 (en) * 2005-03-23 2007-04-17 Delphi Technologies, Inc Electronic assembly including multiple substrates
US7629269B2 (en) * 2005-03-31 2009-12-08 Intel Corporation High-k thin film grain size control
US20060220177A1 (en) * 2005-03-31 2006-10-05 Palanduz Cengiz A Reduced porosity high-k thin film mixed grains for thin film capacitor applications
US7375412B1 (en) * 2005-03-31 2008-05-20 Intel Corporation iTFC with optimized C(T)
US7297613B1 (en) 2005-06-09 2007-11-20 The United States Of America As Represented By The National Security Agency Method of fabricating and integrating high quality decoupling capacitors
US7453144B2 (en) * 2005-06-29 2008-11-18 Intel Corporation Thin film capacitors and methods of making the same
US7435627B2 (en) * 2005-08-11 2008-10-14 International Business Machines Corporation Techniques for providing decoupling capacitance
US7521705B2 (en) * 2005-08-15 2009-04-21 Micron Technology, Inc. Reproducible resistance variable insulating memory devices having a shaped bottom electrode
US7875808B2 (en) 2005-09-19 2011-01-25 Industrial Technology Research Institute Embedded capacitor device having a common coupling area
US8829661B2 (en) * 2006-03-10 2014-09-09 Freescale Semiconductor, Inc. Warp compensated package and method
US20070212813A1 (en) * 2006-03-10 2007-09-13 Fay Owen R Perforated embedded plane package and method
US7336501B2 (en) * 2006-06-26 2008-02-26 Ibiden Co., Ltd. Wiring board with built-in capacitor
KR101100557B1 (en) 2007-04-18 2011-12-29 이비덴 가부시키가이샤 Multilayer printed wiring board and method for manufacturing the same
US7646082B2 (en) 2007-05-22 2010-01-12 International Business Machines Corporation Multi-layer circuit substrate and method having improved transmission line integrity and increased routing density
DE602007009375D1 (en) * 2007-07-27 2010-11-04 Fujitsu Semiconductor Ltd Low-noise flip-chip packaging and flip chips for it
US8455766B2 (en) * 2007-08-08 2013-06-04 Ibiden Co., Ltd. Substrate with low-elasticity layer and low-thermal-expansion layer
US8564967B2 (en) * 2007-12-03 2013-10-22 Cda Processing Limited Liability Company Device and method for reducing impedance
TWI345797B (en) * 2007-12-21 2011-07-21 Ind Tech Res Inst Hybrid capacitor
US7821796B2 (en) 2008-01-17 2010-10-26 International Business Machines Corporation Reference plane voids with strip segment for improving transmission line integrity over vias
KR101169531B1 (en) * 2009-07-03 2012-07-27 가부시키가이샤 테라미크로스 Semiconductor construct and manufacturing method thereof as well as semiconductor device and manufacturing method thereof
US8035218B2 (en) * 2009-11-03 2011-10-11 Intel Corporation Microelectronic package and method of manufacturing same
US20110278739A1 (en) * 2010-05-11 2011-11-17 Yi-Shao Lai Semiconductor Package
DE102010035453A1 (en) 2010-08-26 2012-03-01 Conti Temic Microelectronic Gmbh Multi-level PCB for high-frequency applications
US8891245B2 (en) * 2011-09-30 2014-11-18 Ibiden Co., Ltd. Printed wiring board
US9035194B2 (en) * 2012-10-30 2015-05-19 Intel Corporation Circuit board with integrated passive devices
US9552977B2 (en) * 2012-12-10 2017-01-24 Intel Corporation Landside stiffening capacitors to enable ultrathin and other low-Z products
US20140167900A1 (en) 2012-12-14 2014-06-19 Gregorio R. Murtagian Surface-mount inductor structures for forming one or more inductors with substrate traces
US20140374877A1 (en) * 2013-06-21 2014-12-25 Altera Corporation Integrated Circuits With On-Die Decoupling Capacitors
US9093295B2 (en) 2013-11-13 2015-07-28 Qualcomm Incorporated Embedded sheet capacitor
TWI529906B (en) * 2013-12-09 2016-04-11 矽品精密工業股份有限公司 Manufacturing method of semiconductor package
US20150170996A1 (en) * 2013-12-18 2015-06-18 International Business Machines Corporation Through-mesh-plane vias in a multi-layered package
US9935052B1 (en) * 2014-11-26 2018-04-03 Altera Corporation Power line layout in integrated circuits
US10068181B1 (en) 2015-04-27 2018-09-04 Rigetti & Co, Inc. Microwave integrated quantum circuits with cap wafer and methods for making the same
US10477684B2 (en) * 2015-09-25 2019-11-12 Intel Corporation Apparatus, system, and method including a bridge device for interfacing a package device with a substrate
JP6750462B2 (en) 2016-11-04 2020-09-02 Tdk株式会社 Substrate with built-in thin film capacitors and electronic components
JP2018098369A (en) * 2016-12-14 2018-06-21 株式会社オートネットワーク技術研究所 Circuit structure
US11121301B1 (en) 2017-06-19 2021-09-14 Rigetti & Co, Inc. Microwave integrated quantum circuits with cap wafers and their methods of manufacture
US11158580B2 (en) * 2019-10-18 2021-10-26 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor devices with backside power distribution network and frontside through silicon via
US11503704B2 (en) 2019-12-30 2022-11-15 General Electric Company Systems and methods for hybrid glass and organic packaging for radio frequency electronics
US11715755B2 (en) * 2020-06-15 2023-08-01 Taiwan Semiconductor Manufacturing Co., Ltd. Structure and method for forming integrated high density MIM capacitor
US11817392B2 (en) * 2020-09-28 2023-11-14 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit

Citations (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4567542A (en) 1984-04-23 1986-01-28 Nec Corporation Multilayer ceramic substrate with interlayered capacitor
EP0359513A2 (en) 1988-09-14 1990-03-21 Hitachi, Ltd. Semiconductor chip carrier and method of making it
US4926241A (en) 1988-02-19 1990-05-15 Microelectronics And Computer Technology Corporation Flip substrate for chip mount
US5027253A (en) 1990-04-09 1991-06-25 Ibm Corporation Printed circuit boards and cards having buried thin film capacitors and processing techniques for fabricating said boards and cards
US5060116A (en) 1990-04-20 1991-10-22 Grobman Warren D Electronics system with direct write engineering change capability
US5177670A (en) 1991-02-08 1993-01-05 Hitachi, Ltd. Capacitor-carrying semiconductor module
US5177594A (en) 1991-01-09 1993-01-05 International Business Machines Corporation Semiconductor chip interposer module with engineering change wiring and distributed decoupling capacitance
US5271150A (en) 1992-04-06 1993-12-21 Nec Corporation Method for fabricating a ceramic multi-layer substrate
US5281151A (en) 1991-07-05 1994-01-25 Hitachi, Ltd. Semiconductor chip carrier, module having same chip carrier mounted therein, and electronic device incorporating same module
US5321583A (en) 1992-12-02 1994-06-14 Intel Corporation Electrically conductive interposer and array package concept for interconnecting to a circuit board
US5354955A (en) 1992-12-02 1994-10-11 International Business Machines Corporation Direct jump engineering change system
US5377139A (en) 1992-12-11 1994-12-27 Motorola, Inc. Process forming an integrated circuit
JPH07142867A (en) 1993-11-15 1995-06-02 Murata Mfg Co Ltd Manufacture of multilayer substrate
EP0656658A1 (en) 1993-11-03 1995-06-07 International Business Machines Corporation High density memory structure
US5469324A (en) 1994-10-07 1995-11-21 Storage Technology Corporation Integrated decoupling capacitive core for a printed circuit board and method of making same
US5488542A (en) 1993-08-18 1996-01-30 Kabushiki Kaisha Toshiba MCM manufactured by using thin film multilevel interconnection technique
JPH08172274A (en) 1994-12-20 1996-07-02 Murata Mfg Co Ltd Ceramic multilayer board
US5639989A (en) 1994-04-19 1997-06-17 Motorola Inc. Shielded electronic component assembly and method for making the same
US5691568A (en) 1996-05-31 1997-11-25 Lsi Logic Corporation Wire bondable package design with maxium electrical performance and minimum number of layers
WO1997050123A1 (en) 1996-06-24 1997-12-31 Intel Corporation A power-ground plane for a c4 flip-chip substrate
US5714801A (en) 1995-03-31 1998-02-03 Kabushiki Kaisha Toshiba Semiconductor package
US5736448A (en) 1995-12-04 1998-04-07 General Electric Company Fabrication method for thin film capacitors
US5745335A (en) 1996-06-27 1998-04-28 Gennum Corporation Multi-layer film capacitor structures and method
JPH10163447A (en) 1996-12-02 1998-06-19 Nec Corp Thin film capacitor, its manufacture and working method of electrode
US5777345A (en) 1996-01-03 1998-07-07 Intel Corporation Multi-chip integrated circuit package
US5786630A (en) 1996-08-07 1998-07-28 Intel Corporation Multi-layer C4 flip-chip substrate
US5796587A (en) 1996-06-12 1998-08-18 International Business Machines Corporation Printed circut board with embedded decoupling capacitance and method for producing same
WO1998039784A1 (en) 1997-03-06 1998-09-11 Sarnoff Corporation Ceramic multilayer printed circuit boards with embedded passive components
US5818699A (en) 1995-07-05 1998-10-06 Kabushiki Kaisha Toshiba Multi-chip module and production method thereof
US5840382A (en) 1992-05-28 1998-11-24 Murata Mfg. Co., Ltd. Electronic part with laminated substrates having different dielectric constants
US5867148A (en) * 1991-07-12 1999-02-02 Hitachi, Ltd. Space-saving information processing apparatus
US5870274A (en) 1992-04-06 1999-02-09 Hadco Santa Clara, Inc. Capacitive PCB with internal capacitive laminate
US5870289A (en) 1994-12-15 1999-02-09 Hitachi, Ltd. Chip connection structure having diret through-hole connections through adhesive film and wiring substrate
US5889652A (en) 1997-04-21 1999-03-30 Intel Corporation C4-GT stand off rigid flex interposer
US5920120A (en) 1997-12-19 1999-07-06 Intel Corporation Assembly for dissipatating heat from a semiconductor chip wherein a stress on the semiconductor chip due to a thermally conductive member is partially relieved
US5929510A (en) 1996-10-31 1999-07-27 Sarnoff Corporation Integrated electronic circuit
US5939782A (en) 1998-03-03 1999-08-17 Sun Microsystems, Inc. Package construction for integrated circuit chip with bypass capacitor
US5949654A (en) 1996-07-03 1999-09-07 Kabushiki Kaisha Toshiba Multi-chip module, an electronic device, and production method thereof
US5991161A (en) 1997-12-19 1999-11-23 Intel Corporation Multi-chip land grid array carrier
WO2000021133A1 (en) 1998-10-02 2000-04-13 Raytheon Company Embedded capacitor multi-chip modules
US6061228A (en) 1998-04-28 2000-05-09 Harris Corporation Multi-chip module having an integral capacitor element
US6072690A (en) 1998-01-15 2000-06-06 International Business Machines Corporation High k dielectric capacitor with low k sheathed signal vias
US6075427A (en) 1998-01-23 2000-06-13 Lucent Technologies Inc. MCM with high Q overlapping resonator
US6097609A (en) 1998-12-30 2000-08-01 Intel Corporation Direct BGA socket
US6104599A (en) 1997-03-19 2000-08-15 Tdk Corporation Chip type laminated ceramic capacitor
WO2001000573A1 (en) 1999-06-25 2001-01-04 Aventis Pharma Deutschland Gmbh Indanyl-substituted benzole carbonamide, method for the production of the same, use thereof as a medicament and pharmaceutical preparations containing the same
US6183669B1 (en) 1999-03-25 2001-02-06 Murata Manufacturing Co., Ltd. Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate
US6214445B1 (en) * 1998-12-25 2001-04-10 Ngk Spark Plug Co., Ltd. Printed wiring board, core substrate, and method for fabricating the core substrate
US6218729B1 (en) 1999-03-11 2001-04-17 Atmel Corporation Apparatus and method for an integrated circuit having high Q reactive components
US6252761B1 (en) 1999-09-15 2001-06-26 National Semiconductor Corporation Embedded multi-layer ceramic capacitor in a low-temperature con-fired ceramic (LTCC) substrate
WO2002011206A2 (en) 2000-07-31 2002-02-07 Intel Corporation Electronic assembly comprising interposer with embedded capacitors and methods of manufacture
US6369443B1 (en) * 1999-07-21 2002-04-09 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with stacked vias
US6407929B1 (en) 2000-06-29 2002-06-18 Intel Corporation Electronic package having embedded capacitors and method of fabrication therefor
US6446317B1 (en) 2000-03-31 2002-09-10 Intel Corporation Hybrid capacitor and method of fabrication therefor
US6452776B1 (en) 2000-04-06 2002-09-17 Intel Corporation Capacitor with defect isolation and bypass
US6532143B2 (en) 2000-12-29 2003-03-11 Intel Corporation Multiple tier array capacitor
US6755150B2 (en) 2001-04-20 2004-06-29 Applied Materials Inc. Multi-core transformer plasma source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW256013B (en) * 1994-03-18 1995-09-01 Hitachi Seisakusyo Kk Installation board
JP2842378B2 (en) * 1996-05-31 1999-01-06 日本電気株式会社 High-density mounting structure for electronic circuit boards
US6724638B1 (en) * 1999-09-02 2004-04-20 Ibiden Co., Ltd. Printed wiring board and method of producing the same
US6775150B1 (en) 2000-08-30 2004-08-10 Intel Corporation Electronic assembly comprising ceramic/organic hybrid substrate with embedded capacitors and methods of manufacture

Patent Citations (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4567542A (en) 1984-04-23 1986-01-28 Nec Corporation Multilayer ceramic substrate with interlayered capacitor
US4926241A (en) 1988-02-19 1990-05-15 Microelectronics And Computer Technology Corporation Flip substrate for chip mount
EP0359513A2 (en) 1988-09-14 1990-03-21 Hitachi, Ltd. Semiconductor chip carrier and method of making it
US5027253A (en) 1990-04-09 1991-06-25 Ibm Corporation Printed circuit boards and cards having buried thin film capacitors and processing techniques for fabricating said boards and cards
US5060116A (en) 1990-04-20 1991-10-22 Grobman Warren D Electronics system with direct write engineering change capability
US5177594A (en) 1991-01-09 1993-01-05 International Business Machines Corporation Semiconductor chip interposer module with engineering change wiring and distributed decoupling capacitance
US5177670A (en) 1991-02-08 1993-01-05 Hitachi, Ltd. Capacitor-carrying semiconductor module
US5281151A (en) 1991-07-05 1994-01-25 Hitachi, Ltd. Semiconductor chip carrier, module having same chip carrier mounted therein, and electronic device incorporating same module
US5867148A (en) * 1991-07-12 1999-02-02 Hitachi, Ltd. Space-saving information processing apparatus
US5271150A (en) 1992-04-06 1993-12-21 Nec Corporation Method for fabricating a ceramic multi-layer substrate
US5870274A (en) 1992-04-06 1999-02-09 Hadco Santa Clara, Inc. Capacitive PCB with internal capacitive laminate
US5840382A (en) 1992-05-28 1998-11-24 Murata Mfg. Co., Ltd. Electronic part with laminated substrates having different dielectric constants
US5321583A (en) 1992-12-02 1994-06-14 Intel Corporation Electrically conductive interposer and array package concept for interconnecting to a circuit board
US5354955A (en) 1992-12-02 1994-10-11 International Business Machines Corporation Direct jump engineering change system
US5377139A (en) 1992-12-11 1994-12-27 Motorola, Inc. Process forming an integrated circuit
US5488542A (en) 1993-08-18 1996-01-30 Kabushiki Kaisha Toshiba MCM manufactured by using thin film multilevel interconnection technique
EP0656658A1 (en) 1993-11-03 1995-06-07 International Business Machines Corporation High density memory structure
JPH07142867A (en) 1993-11-15 1995-06-02 Murata Mfg Co Ltd Manufacture of multilayer substrate
US5639989A (en) 1994-04-19 1997-06-17 Motorola Inc. Shielded electronic component assembly and method for making the same
US5469324A (en) 1994-10-07 1995-11-21 Storage Technology Corporation Integrated decoupling capacitive core for a printed circuit board and method of making same
US5870289A (en) 1994-12-15 1999-02-09 Hitachi, Ltd. Chip connection structure having diret through-hole connections through adhesive film and wiring substrate
JPH08172274A (en) 1994-12-20 1996-07-02 Murata Mfg Co Ltd Ceramic multilayer board
US5714801A (en) 1995-03-31 1998-02-03 Kabushiki Kaisha Toshiba Semiconductor package
US5818699A (en) 1995-07-05 1998-10-06 Kabushiki Kaisha Toshiba Multi-chip module and production method thereof
US5736448A (en) 1995-12-04 1998-04-07 General Electric Company Fabrication method for thin film capacitors
US5777345A (en) 1996-01-03 1998-07-07 Intel Corporation Multi-chip integrated circuit package
US5691568A (en) 1996-05-31 1997-11-25 Lsi Logic Corporation Wire bondable package design with maxium electrical performance and minimum number of layers
US5796587A (en) 1996-06-12 1998-08-18 International Business Machines Corporation Printed circut board with embedded decoupling capacitance and method for producing same
WO1997050123A1 (en) 1996-06-24 1997-12-31 Intel Corporation A power-ground plane for a c4 flip-chip substrate
US5745335A (en) 1996-06-27 1998-04-28 Gennum Corporation Multi-layer film capacitor structures and method
US5949654A (en) 1996-07-03 1999-09-07 Kabushiki Kaisha Toshiba Multi-chip module, an electronic device, and production method thereof
US5786630A (en) 1996-08-07 1998-07-28 Intel Corporation Multi-layer C4 flip-chip substrate
US5929510A (en) 1996-10-31 1999-07-27 Sarnoff Corporation Integrated electronic circuit
JPH10163447A (en) 1996-12-02 1998-06-19 Nec Corp Thin film capacitor, its manufacture and working method of electrode
WO1998039784A1 (en) 1997-03-06 1998-09-11 Sarnoff Corporation Ceramic multilayer printed circuit boards with embedded passive components
US6104599A (en) 1997-03-19 2000-08-15 Tdk Corporation Chip type laminated ceramic capacitor
US5889652A (en) 1997-04-21 1999-03-30 Intel Corporation C4-GT stand off rigid flex interposer
US6088915A (en) 1997-04-21 2000-07-18 Intel Corporation C4-GT stand off rigid flex interposer method
US5920120A (en) 1997-12-19 1999-07-06 Intel Corporation Assembly for dissipatating heat from a semiconductor chip wherein a stress on the semiconductor chip due to a thermally conductive member is partially relieved
US5991161A (en) 1997-12-19 1999-11-23 Intel Corporation Multi-chip land grid array carrier
US6097611A (en) 1997-12-19 2000-08-01 Intel Corporation Multi-chip land grid array carrier
US6072690A (en) 1998-01-15 2000-06-06 International Business Machines Corporation High k dielectric capacitor with low k sheathed signal vias
US6075427A (en) 1998-01-23 2000-06-13 Lucent Technologies Inc. MCM with high Q overlapping resonator
US5939782A (en) 1998-03-03 1999-08-17 Sun Microsystems, Inc. Package construction for integrated circuit chip with bypass capacitor
US6061228A (en) 1998-04-28 2000-05-09 Harris Corporation Multi-chip module having an integral capacitor element
WO2000021133A1 (en) 1998-10-02 2000-04-13 Raytheon Company Embedded capacitor multi-chip modules
US6214445B1 (en) * 1998-12-25 2001-04-10 Ngk Spark Plug Co., Ltd. Printed wiring board, core substrate, and method for fabricating the core substrate
US6097609A (en) 1998-12-30 2000-08-01 Intel Corporation Direct BGA socket
US6218729B1 (en) 1999-03-11 2001-04-17 Atmel Corporation Apparatus and method for an integrated circuit having high Q reactive components
US6183669B1 (en) 1999-03-25 2001-02-06 Murata Manufacturing Co., Ltd. Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate
WO2001000573A1 (en) 1999-06-25 2001-01-04 Aventis Pharma Deutschland Gmbh Indanyl-substituted benzole carbonamide, method for the production of the same, use thereof as a medicament and pharmaceutical preparations containing the same
US6369443B1 (en) * 1999-07-21 2002-04-09 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with stacked vias
US6252761B1 (en) 1999-09-15 2001-06-26 National Semiconductor Corporation Embedded multi-layer ceramic capacitor in a low-temperature con-fired ceramic (LTCC) substrate
US6446317B1 (en) 2000-03-31 2002-09-10 Intel Corporation Hybrid capacitor and method of fabrication therefor
US6452776B1 (en) 2000-04-06 2002-09-17 Intel Corporation Capacitor with defect isolation and bypass
US6407929B1 (en) 2000-06-29 2002-06-18 Intel Corporation Electronic package having embedded capacitors and method of fabrication therefor
WO2002011206A2 (en) 2000-07-31 2002-02-07 Intel Corporation Electronic assembly comprising interposer with embedded capacitors and methods of manufacture
US6970362B1 (en) 2000-07-31 2005-11-29 Intel Corporation Electronic assemblies and systems comprising interposer with embedded capacitors
US20060012966A1 (en) 2000-07-31 2006-01-19 Intel Corporation Electronic assemblies and systems comprising interposer with embedded capacitors
US6532143B2 (en) 2000-12-29 2003-03-11 Intel Corporation Multiple tier array capacitor
US6755150B2 (en) 2001-04-20 2004-06-29 Applied Materials Inc. Multi-core transformer plasma source

Non-Patent Citations (17)

* Cited by examiner, † Cited by third party
Title
Amey, D.I. , et al., "Advances in MCM Ceramics", Solid State Technology, (1997),143-146.
Baniecki, J.D. , et al., "Dielectric Relaxation of Ba0.7 Sr0.3 TiO3 Thin Films from 1 mHz to 20 GHz", Appl. Phys. Letter 72 (4 ), 1998 American Institute of Physics,(Jan. 1998),198-500.
Capacitors and Resonators Using LTCC Technology for Mobile Communication Systems, 1998 IEEE MTT-S Digest, (1998),1285-1288.
Chan, Y.C. , et al., "Fabrication and Characterization of Multilayer Capacitors Buried in a Low Temperature Co-Fired Ceramic Substrate", Active and Passive Elec. Comp. vol. 20, (1998),215-224.
Choi, Kwang L., et al., "Characterization of Embedded Passives Using Macromodels in LTCC Technology", IEEE Transactions on Components, Packaging, and Manufacturing Technology, vol. 21, (Aug. 1998),258-268.
Eurskens, W. , et al., Design and Performance of UHF Band Inductors.
Koschmieder, Thomas , et al., "Ceramic Substrate Thickness, Test Board Thickness, and Part Spacing: A Screening Doe", Proceedings of SMTA International Conference, (Sep. 1999),6 pgs.
Mistler, Richard E., "Tape Casting: Past, Present, Potential", The American Ceramic Society Bulletin, (Oct. 1998),82-86.
Nishimura, T.B. , et al., "3.5 V Operation Driver-Amplifier MMIC Utilizing SrTiO3 Capacitors for 1.95 GHz Wide-Band CDMA Cellular Phones", 1998 IEEE MTT-S Digest, (1998),447-450.
Rector, Jr., John , et al., "Integrated and Integral Passive Components: A Technology Roadmap", 1997 Electronic Components and Technology Conference, (1997),713-723.
Scrantom, Steve , et al., "Manufacture of Embedded Integrated Passive Components into Low Temperature Co-Fired Ceramic Systems", 1998 International Symposium on Microelectronics, (1998),459-466.
Sugai, Kouichiro , et al., "Multilayer Alumina Substrates for ECU", 1998 IEEE/CPMT Berlin Int'l Electronics Manufacturing Technology Symposium, (1998),109-112.
Tok, Alfred I., et al., "Tape Casting of Composite Ceramic Substrates Using Hollow Micro-Speherical Powders", Processing and Fabrication of Advanced Materials VII, Proceedings of a Symposium organized by: The Minerals, Metals & Materials Society (TMS), Warrendale, PA, USA,(Oct. 1998),451-461.
Ueda, Tetsuzo , et al., "GaAs MMIC Chip-sets for Mobile Communication Systems with On-chip Ferroelectric Capacitors", Integrated Ferroelectrics, vol. 7, (1995),45-60.
Williamson, III, William , et al., "High Frequency Dielectric Properties of PLZT Thin Films", Integrated Ferroelectrics, vol. 17, (1997),197-203.
Yamasaki, Kozo , et al., "Solder Column Interposer Grid Array-Improved CBGA Reliability", 1-9.
Yao, Kui , et al., "Improved Preparation Procedure and Properties for a Multilayer Piezoelectric Thick-Film Actuator", Sensors and Actuators A 71, (1998),139-143.

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060012966A1 (en) * 2000-07-31 2006-01-19 Intel Corporation Electronic assemblies and systems comprising interposer with embedded capacitors
US7339798B2 (en) 2000-07-31 2008-03-04 Intel Corporation Electronic assemblies and systems comprising interposer with embedded capacitors
US20060081977A1 (en) * 2003-12-26 2006-04-20 Norio Sakai Ceramic multilayer substrate
US7649252B2 (en) 2003-12-26 2010-01-19 Murata Manufacturing Co., Ltd. Ceramic multilayer substrate
US7611924B2 (en) 2004-03-05 2009-11-03 Intel Corporation Integrated circuit package with chip-side signal connections
US20050194669A1 (en) * 2004-03-05 2005-09-08 Joong-Ho Kim Integrated circuit package with chip-side signal connections
US7345359B2 (en) * 2004-03-05 2008-03-18 Intel Corporation Integrated circuit package with chip-side signal connections
US20080131997A1 (en) * 2004-03-05 2008-06-05 Joong-Ho Kim Integrated circuit package with chip-side signal connections
US7450395B2 (en) * 2005-10-20 2008-11-11 Murata Manufacturing Co., Ltd. Circuit module and circuit device including circuit module
US20080180926A1 (en) * 2005-10-20 2008-07-31 Murata Manufacturing Co., Ltd. Circuit module and circuit device including circuit module
US7576995B2 (en) * 2005-11-04 2009-08-18 Entorian Technologies, Lp Flex circuit apparatus and method for adding capacitance while conserving circuit board surface area
US7332799B2 (en) * 2005-12-28 2008-02-19 Tessera, Inc. Packaged chip having features for improved signal transmission on the package
US20070145560A1 (en) * 2005-12-28 2007-06-28 Tessera, Inc. Packaged chip having features for improved signal transmission on the package
US7968800B2 (en) * 2006-11-30 2011-06-28 Panasonic Corporation Passive component incorporating interposer
US20100155119A1 (en) * 2006-11-30 2010-06-24 Matsushita Electric Industrial Co., Ltd. Passive component incorporating interposer
US20100330797A1 (en) * 2008-02-12 2010-12-30 International Business Machines Corporation Fabrication method for circuit substrate having post-fed die side power supply connections
US7863724B2 (en) * 2008-02-12 2011-01-04 International Business Machines Corporation Circuit substrate having post-fed die side power supply connections
US20090200074A1 (en) * 2008-02-12 2009-08-13 International Business Machines Corporation Circuit Substrate Having Post-Fed Die Side Power Supply Connections
US8586476B2 (en) 2008-02-12 2013-11-19 International Business Machines Corporation Fabrication method for circuit substrate having post-fed die side power supply connections
US8722536B2 (en) 2008-02-12 2014-05-13 International Business Machines Corporation Fabrication method for circuit substrate having post-fed die side power supply connections
US20090251872A1 (en) * 2008-04-08 2009-10-08 Faraday Technology Corp. Power supply architecture for structural asic
US8068349B2 (en) * 2008-04-08 2011-11-29 Faraday Technology Corp. Power supply architecture for structural ASIC
US20160260795A1 (en) * 2015-03-03 2016-09-08 Renesas Electronics Corporation Method of manufacturing semiconductor device
US10424571B2 (en) 2016-12-30 2019-09-24 Samsung Electronics Co., Ltd. Electronic device package
US11244938B2 (en) 2016-12-30 2022-02-08 Samsung Electronics Co., Ltd. Electronic device package

Also Published As

Publication number Publication date
CN1401138A (en) 2003-03-05
US7535728B2 (en) 2009-05-19
WO2002019430A3 (en) 2002-09-12
WO2002019430A2 (en) 2002-03-07
AU2001286857A1 (en) 2002-03-13
US20060279940A1 (en) 2006-12-14
US6775150B1 (en) 2004-08-10
EP1314200A2 (en) 2003-05-28
MY128632A (en) 2007-02-28
US20040238942A1 (en) 2004-12-02
CN1284234C (en) 2006-11-08

Similar Documents

Publication Publication Date Title
US7120031B2 (en) Data processing system comprising ceramic/organic hybrid substrate with embedded capacitors
EP1358675B1 (en) Electronic assembly comprising substrate with embedded capacitors and methods of manufacture
US6970362B1 (en) Electronic assemblies and systems comprising interposer with embedded capacitors
US6388207B1 (en) Electronic assembly with trench structures and methods of manufacture
US5635767A (en) Semiconductor device having built-in high frequency bypass capacitor
KR100550480B1 (en) Multiple tier array capacitor and methods of fabrication therefor
US6653574B2 (en) Multi-layered substrate with a built-in capacitor design and a method of making the same
US7133294B2 (en) Integrated circuit packages with sandwiched capacitors
US5412538A (en) Space-saving memory module
JP3138383B2 (en) Multi-chip module
KR20070048802A (en) Passive device structure
WO2006036282A1 (en) Circuit board assembly with reduced capacitive coupling
JP4479015B2 (en) Carrier substrate with built-in capacitor and method for manufacturing the same
EP0713358A2 (en) Circuit board
JP2531467B2 (en) Tape carrier package
JPH1154646A (en) Package for semiconductor element and production thereof
JP3272831B2 (en) Multilayer wiring board and semiconductor device using the same
zur Nieden Micro electronic packaging technologies: status and trends

Legal Events

Date Code Title Description
FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

FEPP Fee payment procedure

Free format text: MAINTENANCE FEE REMINDER MAILED (ORIGINAL EVENT CODE: REM.)

LAPS Lapse for failure to pay maintenance fees

Free format text: PATENT EXPIRED FOR FAILURE TO PAY MAINTENANCE FEES (ORIGINAL EVENT CODE: EXP.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20181010