US6890244B2 - Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles - Google Patents
Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles Download PDFInfo
- Publication number
- US6890244B2 US6890244B2 US10/664,735 US66473503A US6890244B2 US 6890244 B2 US6890244 B2 US 6890244B2 US 66473503 A US66473503 A US 66473503A US 6890244 B2 US6890244 B2 US 6890244B2
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- United States
- Prior art keywords
- soluble
- pad
- polishing
- component
- work
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 104
- 239000002245 particle Substances 0.000 title claims abstract description 52
- 239000002002 slurry Substances 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 title claims abstract description 23
- 239000000126 substance Substances 0.000 title description 8
- 239000011159 matrix material Substances 0.000 claims abstract description 31
- 229920000642 polymer Polymers 0.000 claims abstract description 19
- 239000011800 void material Substances 0.000 claims abstract description 14
- 239000004065 semiconductor Substances 0.000 claims abstract description 12
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 239000004094 surface-active agent Substances 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 28
- 229920001577 copolymer Chemical class 0.000 claims description 14
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 12
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 12
- 239000012790 adhesive layer Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 8
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 8
- 239000011976 maleic acid Substances 0.000 claims description 8
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 8
- 229920002125 Sokalan® Polymers 0.000 claims description 7
- 150000004676 glycans Chemical class 0.000 claims description 7
- 239000004584 polyacrylic acid Substances 0.000 claims description 7
- 229920001282 polysaccharide Polymers 0.000 claims description 7
- 239000005017 polysaccharide Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000004793 Polystyrene Substances 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 229920002223 polystyrene Polymers 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229920000058 polyacrylate Polymers 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 150000002689 maleic acids Chemical class 0.000 claims 2
- 239000011146 organic particle Substances 0.000 claims 2
- 230000003750 conditioning effect Effects 0.000 claims 1
- 239000000654 additive Substances 0.000 abstract description 8
- 238000006748 scratching Methods 0.000 abstract description 5
- 230000002393 scratching effect Effects 0.000 abstract description 5
- 239000000835 fiber Substances 0.000 description 41
- 239000000463 material Substances 0.000 description 25
- 239000011148 porous material Substances 0.000 description 18
- 235000012431 wafers Nutrition 0.000 description 16
- 239000002131 composite material Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 238000004090 dissolution Methods 0.000 description 8
- 239000002657 fibrous material Substances 0.000 description 6
- 239000002609 medium Substances 0.000 description 6
- 239000012736 aqueous medium Substances 0.000 description 4
- -1 electrochemical Substances 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004831 Hot glue Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 238000007521 mechanical polishing technique Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000003716 rejuvenation Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
Definitions
- Semiconductor devices are formed from a flat, thin wafer of a semiconductor material, such as silicon.
- the wafer must be polished to achieve a sufficiently flat surface with no or minimal defects.
- a variety of chemical, electrochemical, and chemical mechanical polishing techniques are employed to polish the wafers.
- CMP chemical mechanical polishing
- a polishing pad made of a urethane material is used in conjunction with a slurry to polish the wafers.
- the slurry comprises abrasive particles, such as aluminum oxide, cerium oxide, or silica particles, dispersed in an aqueous medium.
- the abrasive particles generally range in size from 100 to 200 nm.
- Other agents such as surface acting agents, oxidizing agents, or pH regulators, are typically present in the slurry.
- the urethane pad is textured, such as with channels or perforations, to aid in the distribution of the slurry across the pad and wafer and removal of the slurry and grindings therefrom.
- hollow, spherical microelements are distributed throughout the urethane material. As the surface of the pad is worn away through use, the microelements provide a continually renewable surface texture.
- the present invention relates to a polishing pad for polishing a substrate in the presence of a slurry comprising abrasive particles and a dispersive agent.
- the polishing pad uses a component, preferably fibrous, within a polymer matrix component.
- the fibrous component is soluble in the slurry, such that fibers present at the polishing surface of the pad dissolve upon contact with the slurry to provide a void structure on the polishing surface.
- the void structure provides pores that enhance the polishing rate and uniformity by increasing the mobility of the abrasive particles in the slurry while reducing scratching of the polished surface.
- the pores act as temporary storage areas for the abrasive particles, thus reducing highly frictional contact between the abrasive particles and the polished surface.
- the polishing pad comprises a first layer having a polishing surface and a backing surface.
- the first layer is formed of the fibrous component in the polymer matrix component.
- the fibrous component comprises fibers soluble in the slurry sufficiently to provide a void structure in the polishing surface.
- the solvent may be either the dispersive phase of the abrasive particles or another material added to the slurry during polishing.
- the polishing pad also comprises a backing structure comprising an adhesive layer or layers fixed to the backing surface of the first layer, so that the polishing pad may be affixed to a tool.
- the nature of the void structure on the polishing surface of the polishing pad is determined by parameters such as the rate of dissolution of the fibers in the solvent, the ratio of fibers to matrix, the shape and size of the fibers, the orientation of the fibers, the density of the fibers both in area and volume, and the presence and amount of any insoluble fibers.
- Suitable fibers for semiconductor wafer polishing, which are soluble in an aqueous slurry, include polyvinyl alcohol and maleic acid and their derivatives or copolymers.
- Additives that further enhance polishing and/or assist in the removal of residues generated during polishing may be incorporated in the fibrous component or be applied as a topographic coating to the fibrous component. These additives are released at a controlled rate during polishing.
- the polishing pad applies to a diversity of applications including semiconductor wafer polishing known as chemical mechanical polishing (CMP) and other polishing applications for metal, ceramic, glass, wafers, hard disks etc., that use a liquid medium to carry and disperse the abrasive particles.
- CMP chemical mechanical polishing
- FIG. 1 is a partial cross-sectional view of a polishing pad in accordance with the invention
- FIG. 2 is a partial top view of the polishing pad of FIG. 1 during use
- FIG. 3 is a partial cross-sectional view along line B—B of the polishing pad of FIG. 2 ;
- FIG. 4 is a partial cross-sectional view of a further embodiment of a polishing pad in accordance with the invention.
- FIG. 5 is a schematic illustration of a polishing pad in accordance with the invention in conjunction with a tool and polishing slurry and substrate to be polished.
- the present invention relates to a polishing pad 10 that is utilized in conjunction with a polishing slurry 40 comprising a liquid medium that carries and disperses abrasive particles between the polishing pad and the surface 42 being polished. See FIG. 5 .
- the preferred embodiment of the polishing pad incorporates a layer 12 of a composite polishing material comprising a soluble fibrous component 14 encapsulated or embedded in a polymeric matrix component 16 .
- the fibrous component is soluble in water or another solvent present in the polishing slurry at a rate sufficient to leave voids on the polishing surface of the pad.
- the solvent may be the dispersive phase of the abrasives or may be another material added to the slurry.
- the slurry is typically an aqueous medium, and the solvent is thus water.
- Useful polymeric materials for the matrix component include most common structural polymers, such as polyurethanes, polyacrylates, polystyrenes, polyimides, polyamides, polycarbonates, and epoxies. Other polymers that have a rigidity sufficient to support the fibrous component may be used.
- An adhesive backing structure 18 is attached to the underside or backing surface 19 of the composite polishing material layer 12 , so that the polishing pad may be affixed to a tool.
- the surface 20 of the polishing material is smooth, as illustrated in FIG. 1 . Although fibers are exposed at the surface, no dissolution has occurred to roughen the surface. Once the solvent contacts the fibrous component at the surface, the fibrous component begins to dissolve, forming a void structure of pores 22 in the surface, as illustrated schematically in FIGS. 2 and 3 .
- the pores on the surface of the polishing substance enhance the polishing rate and uniformity by increasing the mobility of the abrasives while reducing scratching of the polished surface.
- the pores act as temporary storage areas for the abrasive particles, thus reducing highly frictional contact between the abrasive particles and the polished surface.
- the fibrous component may be formed of any suitable soluble fiber material, such as polyvinyl alcohol (PVAc), maleic acid, polyacrylic acid, various polysaccharides and gums, or derivatives of these materials. Copolymers of these polymers may also be used.
- PVAc polyvinyl alcohol
- the particular fiber material is selected depending on the particular solvent to be used and the intended polishing application. In semiconductor wafer polishing, the slurry typically uses an aqueous medium as the dispersive phase for the abrasive particles. Thus, water is typically the preferred solvent for this application, and PVAc, copolymers of PVAc, maleic acid, and derivatives of these materials are suitable for the fibrous component. Other solvents and fiber materials may be used, however, depending on the application.
- the fiber material is preferably chosen such that the rate of dissolution of the fibrous component in the dissolving medium is as fast as possible.
- the fiber component dissolves as soon as it contacts the dissolving medium, so that no delay is needed before polishing can begin.
- PVAc and maleic acid and their derivatives dissolve suitably quickly in water.
- the rate of dissolution can be controlled by the particular material chosen.
- the salt of a compound can render the compound more or less hydrolyzable by an aqueous medium.
- Polymerization can also be used to control the dissolution rate. For example, increasing the molecular weight can slow the rate of dissolution.
- the fibrous material may be prepared by any suitable process, such as by nonwoven techniques, for example, chemical, mechanical, or thermal bonding of fibers or the laying down of a loose mat of fibers or filaments, as well as by weaving or knitting techniques, as would be known in the art.
- a nonwoven material is usually preferred, because it gives a more random orientation of pore structure.
- the orientation of the fibers relative to the polishing surface may be controlled to affect the size of the pores on the polishing surface. If the fibers are oriented predominantly parallel to the surface, the resulting void structure will have more channel-shaped or elongated pores. If the fibers are oriented predominantly orthogonally to the surface, the resulting void structure will have more pores of a smaller diameter.
- a greater density of pores over the polishing surface can be achieved with an orthogonal orientation of the fibers.
- Continuous fibers or cut fibers having a fiber length of 0.5 mm to 15 mm, may be used. Cut fibers provide more fiber ends, resulting in a void structure with more holes.
- the diameters of the fibers are selected such that the pore size after dissolution is complementary to the particle size of the abrasive particles in the slurry, which typically range in size from 100 to 200 nm. If the pores are too large, the slurry particles may stagnate in the pores, resulting in loss of their polishing effect. Also the location of the particles cannot be adequately controlled, leading to nonuniformities in polishing. If the pores are too small, the particles may become stuck in the pores, leading to scratching of the substrate to be polished.
- a fiber diameter range of 20 to 200 ⁇ m, and preferably 30 to 100 ⁇ m, has been found to provide a suitable range of pore sizes for the typical range of abrasive particles used in CMP slurries.
- the ratio of the fiber component to the matrix component can vary from 90% fiber/10% matrix to 10% fiber/90% matrix by volume.
- a higher fiber component yields a softer, more compressible polishing material that is more suitable for polishing softer features, such as aluminum, tungsten, or copper wiring present on the substrate.
- a polishing material with a fiber content as high as 90% has a very fibrous structure, with fibers that are incompletely coated with the matrix material.
- a higher matrix component yields a harder polishing material that is more suitable for polishing a harder substrate, such as a silicon oxide layer.
- a polishing material with a fiber content as little as 10% is very solid and less compressible.
- the composite material layer may also have a layered structure, such as an upper layer having a higher ratio of fibers to matrix and a lower layer having a lower ratio of fibers to matrix.
- the upper layer provides mobility of the slurry particles on the surface while the lower layer provides greater rigidity to enhance planarity.
- the lower layer may have no fibers.
- a gradation of the ratio of fibers to matrix or of other properties may be provided from the polishing surface to the backing surface.
- the fibrous component may also include some insoluble fiber material.
- the insoluble fiber acts as a sweep, isolating the hard surface of the matrix component from scratching the substrate to be polished.
- the amount of insoluble fiber may range up to 90% by mass.
- the soluble material may be particulate in nature, such as a powder.
- the powder dissolves at the surface upon contact with the solvent to form a void structure on the surface. In the interior of the pad, the powder provides a solid structure.
- the thickness of the layer 12 of the composite polishing material ranges from 0.005 inch to 0.150 inch.
- the thickness of the layer determines the life of the pad.
- the thickness also determines physical properties of the pad. For example, a thicker layer is stiffer and more resistant to bending. The actual thickness selected depends on the particular application.
- the backing structure 18 provides a medium for attaching the polishing pad to a tool and adds compressibility to complement the rigidity of the composite material layer.
- the rigidity of the composite material layer provides planarity on a small scale, that is, over a small region of the substrate to be polished.
- the compressibility of the backing structure provides uniformity of pressure over the entire substrate surface, for example over the 8 inch or 12 inch diameter of a semiconductor wafer. This ensures uniformity of polishing if, for example, the substrate is concavely or convexly curved or otherwise irregular.
- the backing structure 18 includes two layers 24 , 26 of adhesive with a compressible structural layer 28 therebetween.
- the thickness of the backing structure ranges from 0.005 to 0.070 inch.
- the first adhesive layer is bonded to the composite polishing material and is selected to provide a strong bond to the composite material layer.
- the second adhesive layer allows the entire pad to be fixed to a tool and is selected to provide good cohesion, so that the pad may be removed from the tool without leaving a residue on the tool. Any suitable adhesive material may be used, such as acrylic or butyl rubber types, a hot melt adhesive containing an acrylic, polyethylene, polyvinyl, polyester, or nylon, or a mixture thereof.
- the second adhesive layer is protected by a release liner 30 that is removed prior to affixing the polishing pad to a tool.
- the structural layer 28 is made of polymeric materials such as a film of polyester, or a foam of polyethylene, polystyrene, or derivatives or copolymers thereof. Other materials, such as extruded polyethylene or polystyrene sheets or a nonwoven polymer layer, may be used.
- the thickness of the structural layer is nominally 0.005 to 0.100 inch.
- the backing structure is composed of a single adhesive layer 32 affixed to the underside of the polishing material layer.
- a single adhesive layer may provide sufficient compressibility for the pad.
- the single adhesive layer is covered by a release liner 34 .
- the polymeric material of the matrix component shears or flows and forms a film over the surface of the pad, clogging the pores and diminishing the polishing effectiveness of the pad.
- the surface of the pad is conditioned or dressed by diamond polishing.
- the rate of dissolution of the fibrous component is preferably greater than the rate of wear of the matrix component caused by this dressing step.
- the polishing surface is rejuvenated and renewed as the matrix component is depleted or wears down, because new areas of the fibrous component are exposed and dissolved, thus forming new pores for enhanced polishing action.
- additives such as surfactants and removers to enhance the stability of the residue particles and prevent them from redepositing onto the polished surface of the substrate, may be included in the composite material layer.
- These additives may be incorporated into the fibrous component, for example, by doping the polymeric material of the fiber before the fiber is extruded, or may be applied as a topographic coating to the fibers. In this way, the additives are released at a controlled rate during polishing.
- Typical additives contain, for example, silicon oil or fluorocarbon type release agents or other agents that are known additives to polishing slurries.
- the polishing pad of the present invention is particularly suitable for the chemical mechanical polishing of semiconductor wafers.
- the polishing pad may, however, be used for polishing other substrates, such as metal, ceramic, glass, wafers, or hard disks, in polishing applications that use a liquid medium to carry and disperse abrasive particles between the polishing pad and the substrate being polished.
Abstract
Description
Claims (42)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/664,735 US6890244B2 (en) | 1999-04-13 | 2003-09-18 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12904899P | 1999-04-13 | 1999-04-13 | |
US09/545,982 US6656018B1 (en) | 1999-04-13 | 2000-04-10 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
US10/664,735 US6890244B2 (en) | 1999-04-13 | 2003-09-18 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/545,982 Continuation US6656018B1 (en) | 1999-04-13 | 2000-04-10 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Publications (2)
Publication Number | Publication Date |
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US20040072507A1 US20040072507A1 (en) | 2004-04-15 |
US6890244B2 true US6890244B2 (en) | 2005-05-10 |
Family
ID=26827184
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US09/545,982 Expired - Lifetime US6656018B1 (en) | 1999-04-13 | 2000-04-10 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
US10/664,735 Expired - Lifetime US6890244B2 (en) | 1999-04-13 | 2003-09-18 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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US09/545,982 Expired - Lifetime US6656018B1 (en) | 1999-04-13 | 2000-04-10 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Country Status (8)
Country | Link |
---|---|
US (2) | US6656018B1 (en) |
EP (2) | EP1046466B1 (en) |
JP (1) | JP2001047357A (en) |
AT (1) | ATE459453T1 (en) |
CA (1) | CA2305106C (en) |
DE (1) | DE60043913D1 (en) |
SG (1) | SG87892A1 (en) |
TW (1) | TW440495B (en) |
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US20040180611A1 (en) * | 2003-02-12 | 2004-09-16 | Hirokazu Tajima | Glass substrate for data recording medium, manufacturing method thereof and polishing pad used in the method |
US20040238121A1 (en) * | 2001-09-28 | 2004-12-02 | Hisashi Masumura | Grinding work holding disk, work grinding device and grinding method |
US20050085169A1 (en) * | 2001-03-08 | 2005-04-21 | Cooper Richard D. | Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same |
US20060223424A1 (en) * | 2004-05-11 | 2006-10-05 | Jean Vangsness | Polishing Pad |
US20070049169A1 (en) * | 2005-08-02 | 2007-03-01 | Vaidya Neha P | Nonwoven polishing pads for chemical mechanical polishing |
US20090170410A1 (en) * | 2007-12-31 | 2009-07-02 | Innopad, Inc. | Chemical-mechanical planarization pad |
US20090270019A1 (en) * | 2008-04-29 | 2009-10-29 | Rajeev Bajaj | Polishing pad composition and method of manufacture and use |
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US6652764B1 (en) * | 2000-08-31 | 2003-11-25 | Micron Technology, Inc. | Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
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US6488767B1 (en) | 2001-06-08 | 2002-12-03 | Advanced Technology Materials, Inc. | High surface quality GaN wafer and method of fabricating same |
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JP4266579B2 (en) * | 2002-06-28 | 2009-05-20 | 株式会社ノリタケカンパニーリミテド | Polishing body and method for producing the same |
JP2005539398A (en) * | 2002-09-25 | 2005-12-22 | ピーピージー インダストリーズ オハイオ, インコーポレイテッド | Polishing pad for flattening |
US7435165B2 (en) | 2002-10-28 | 2008-10-14 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
US7267607B2 (en) | 2002-10-28 | 2007-09-11 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
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US20050085169A1 (en) * | 2001-03-08 | 2005-04-21 | Cooper Richard D. | Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same |
US20040238121A1 (en) * | 2001-09-28 | 2004-12-02 | Hisashi Masumura | Grinding work holding disk, work grinding device and grinding method |
US8268114B2 (en) * | 2001-09-28 | 2012-09-18 | Shin-Etsu Handotai Co., Ltd. | Workpiece holder for polishing, workpiece polishing apparatus and polishing method |
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US20040180611A1 (en) * | 2003-02-12 | 2004-09-16 | Hirokazu Tajima | Glass substrate for data recording medium, manufacturing method thereof and polishing pad used in the method |
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US20060223424A1 (en) * | 2004-05-11 | 2006-10-05 | Jean Vangsness | Polishing Pad |
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US20090270019A1 (en) * | 2008-04-29 | 2009-10-29 | Rajeev Bajaj | Polishing pad composition and method of manufacture and use |
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Also Published As
Publication number | Publication date |
---|---|
US20040072507A1 (en) | 2004-04-15 |
ATE459453T1 (en) | 2010-03-15 |
EP1046466A2 (en) | 2000-10-25 |
CA2305106A1 (en) | 2000-10-13 |
EP2266757A1 (en) | 2010-12-29 |
EP1046466B1 (en) | 2010-03-03 |
DE60043913D1 (en) | 2010-04-15 |
CA2305106C (en) | 2008-07-08 |
US6656018B1 (en) | 2003-12-02 |
EP2266757B1 (en) | 2013-10-02 |
SG87892A1 (en) | 2002-04-16 |
EP1046466A3 (en) | 2003-10-08 |
JP2001047357A (en) | 2001-02-20 |
TW440495B (en) | 2001-06-16 |
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