US6821692B1 - Kind of thin films for microsystem technology and microstructuring and their use - Google Patents
Kind of thin films for microsystem technology and microstructuring and their use Download PDFInfo
- Publication number
- US6821692B1 US6821692B1 US09/230,975 US23097599A US6821692B1 US 6821692 B1 US6821692 B1 US 6821692B1 US 23097599 A US23097599 A US 23097599A US 6821692 B1 US6821692 B1 US 6821692B1
- Authority
- US
- United States
- Prior art keywords
- biopolymer
- layer
- thin layer
- gelatin
- enzymatically degradable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
- C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
- C12Q1/001—Enzyme electrodes
- C12Q1/002—Electrode membranes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00497—Features relating to the solid phase supports
- B01J2219/00527—Sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Definitions
- the present invention relates to novel thin layers for microsystem techniques and microstructuring which may be employed within the range of such technologies in various manners.
- the thin layers heretofore employed according to the state of art in the microsystem technique and in microstructuring, as for example for manufacturing membranes, sandwiched system contacts and circuits are based on the use of inorganic layers, such as layers of SiO 2 , Si 3 N 4 , and Al 2 O 3 frequently employed, and metal layers and metal layer systems, respectively.
- Poisonous chemicals and such being harmful to health as for example strong acids, alkalies, and oxidants, are employed to produce the desired structures, or extremely expensive processes, such as reactive ion etching and plasma etching, respectively, are required therefor (refer to S. Büittgenbach, Mikromechanik, B. G. Teubner, Stuttgart, 1994).
- the only organic layers which are to be used in structuring processes are photoresists which after the desired structure being imparted to the layer to be structurized are removed, as a rule.
- biopolymer films also within the range of thickness relevant for the thin layer techniques of from 30 nm to 3 ⁇ m to satisfy very high quality standards.
- certain dyestuffs or photoactivatable groups effect a cross-linking of the biopolymer layer subsequent to a photochemical activation so that their enzymatic decomposition rate considerably slows down compared to unexposed layer ranges.
- the layer thicknesses are reproducible within a range of a few 10 nm from solutions with a solids content from 1 to 30% by spin coating which itself is known. Layers applied in such a manner are even in such an extremely thin layer range unexpectedly homogeneous and free of defects. They also resist tempering steps of up to 250° C. without any problems and without any signs of degradation during the further process of microstructuring.
- a hydrosoluble gelatin changes to a water-insoluble material after a cross-linkage in that molecules are enclosed therein or, alternatively, are bound thereto covalently or non-covalently.
- the proposed thin layers in the field of application concerned, can be used to various ends.
- the entire sandwich assembly is inserted into a receptacle containing an enzymic bath.
- the enzymic bath preferably consists of a protease K-buffer substantially constituted of 10% SDS, 10 mM NaCl, 10 mM EDTA and Tris-HCl, and to which 10 mg/ml protease K is added.
- the pH-value of said bath is set to 8.5.
- a gelatin layer of about 200 nm thickness is entirely degraded at ambient temperature within about 8 h.
- the biopolymer layer was used as a sacrificial layer for generating a self-supporting novolac structure.
- diazo-naphthoquinone which is in AZ-photoresists a usual photosensitive component, binds to OH-groups of the gelatin and, hence, inhibits a protease applied in a buffer solution of being degraded.
- diazo-naphthoquinone is converted into a carboxyl acid which is salified and separated from the gelatin. At such locations the degradation can take place uninhibited.
- di-acidostilbene being dissolved in water and having its maximum sensitivity at about 345 nm, is employed as a photoactive component with a spectral sensitivity in the visible or in the ultraviolet spectral range, wherein a sodium salt of 4,4-di-acidostilbene-2,2-sulpho acid which has been dissolved in water at a mixing ratio of from 1:50 to 1:100 has proven as particularly advantageous.
- a solid gelatin for example Quality Bloom 60 made of pigskin is added to the aqueous di-acidostilbene solution at a quantity ratio of from 10:1 to 100:1, depending on the desired degree of cross-linking in the biopolymeric layer to be produced. In the present example, about 40 mg gelatin per ml.
- di-acidostilbene solution are added. After the gelatin has dissolved the solution is filtered through a microfilter to 200 nm. The solution obtained in this way is spun onto a substrate, for example, consisting of a metal, a polymer, silicon, coated silicon or glass, as common use in microlithography. In this manner according to the present example a plane homogeneous gelatin layer having a thickness of about 100 nm is formed on a silicon substrate. The thin layer is provided with a mask adapted to a subsequent and desired structure and is subjected to an UV-exposure at a wavelength of 360 nm for about 400 s.
- the degradation rates obtainable in the present example lie at about 20-30 nm/min. According to the manner described hereinabove, it is feasible to produce sizes of structures down to 1 ⁇ m.
- biopolymers to provide defined functions for covalent but also non-covalent coupling to further molecules (so, for example, it is feasible to couple to a gelatin layer by way of amino-, carboxy-, hydroxy-and thio-functions but also by way of hydrogen bridge linkage), can be particularly advantageously exploited in thin layer structures suitably structurized and generated according to the above specifications for a special application, as will be described in the following.
- Local reaction spaces are defined by way of structurized gelatin pads. Due to the chemical diversity of the functional groups of the collagen polymer it is feasible to bind diverse molecules after a specific activation. In other words, the same matrix can be utilized for coupling molecules having a diversity of functional groups, the expensive modification of the molecules for immobilization is omitted.
Abstract
Description
Claims (27)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19634120A DE19634120A1 (en) | 1996-08-23 | 1996-08-23 | Thin film for microsystem technology and microstructuring |
DE19634120 | 1996-08-23 | ||
DE19705909 | 1997-02-15 | ||
DE19705909A DE19705909A1 (en) | 1996-08-23 | 1997-02-15 | Novel thin films for microsystem technology and microstructuring as well as their use |
PCT/EP1997/004582 WO1998008086A1 (en) | 1996-08-23 | 1997-08-22 | New kind of thin films for microsystem technology and microstructuring and their use |
Publications (1)
Publication Number | Publication Date |
---|---|
US6821692B1 true US6821692B1 (en) | 2004-11-23 |
Family
ID=26028675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/230,975 Expired - Fee Related US6821692B1 (en) | 1996-08-23 | 1997-08-22 | Kind of thin films for microsystem technology and microstructuring and their use |
Country Status (6)
Country | Link |
---|---|
US (1) | US6821692B1 (en) |
EP (1) | EP0920618B1 (en) |
JP (1) | JP3624382B2 (en) |
AT (1) | ATE313078T1 (en) |
DE (2) | DE19705909A1 (en) |
WO (1) | WO1998008086A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060244118A1 (en) * | 2001-01-31 | 2006-11-02 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
US20060277778A1 (en) * | 2005-06-10 | 2006-12-14 | Mick Stephen E | Reusable template for creation of thin films; method of making and using template; and thin films produced from template |
CN103528866A (en) * | 2013-10-18 | 2014-01-22 | 江苏蓝拓生物科技有限公司 | Preparation method of carbon supporting film |
WO2021038058A1 (en) | 2019-08-30 | 2021-03-04 | Westfaelische Wilhelms-Universitaet Muenster | Method for manufacturing a holey film, in particular for electron microscopy applications |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6797393B2 (en) | 2001-11-30 | 2004-09-28 | Eastman Kodak Company | Method for making biochip substrate |
JP2009207381A (en) * | 2008-03-03 | 2009-09-17 | Kaneka Corp | Device for capturing monocyte |
Citations (27)
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FR2245009A1 (en) | 1973-09-21 | 1975-04-18 | Kodak Pathe | Protein contng photo resist compsn with photoisomerisable cpd - which on exposure has greater enzyme inhibiting power |
US3884703A (en) * | 1972-04-17 | 1975-05-20 | Hitachi Ltd | Bisazide sensitized photoresistor composition with diacetone acrylamide |
US4106938A (en) * | 1977-05-23 | 1978-08-15 | Eastman Kodak Company | Vesicular composition, element and process utilizing a diol |
US4251620A (en) * | 1975-02-19 | 1981-02-17 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate process |
US4451568A (en) * | 1981-07-13 | 1984-05-29 | Battelle Memorial Institute | Composition for binding bioactive substances |
EP0116361A2 (en) | 1983-02-07 | 1984-08-22 | Fuji Photo Film Co., Ltd. | Analytical element for dry analysis |
US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
DE3602486A1 (en) | 1986-01-29 | 1987-07-30 | Sanyo Kokusaku Pulp Co | METHOD FOR PRODUCING A COLOR FILTER |
EP0246602A2 (en) | 1986-05-20 | 1987-11-25 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Device having a thin film of a polymer |
EP0286118A2 (en) | 1987-04-09 | 1988-10-12 | Nova Biomedical Corporation | Glucose electrode and method of determining glucose |
JPH01241541A (en) * | 1988-03-23 | 1989-09-26 | Nippon Kayaku Co Ltd | Colored pattern forming method |
DD275538A1 (en) | 1988-09-12 | 1990-01-24 | Feutron Greiz Veb | METHOD FOR PRODUCING A CAPACITIVE SORPTION HUMID SENSOR |
US4923948A (en) * | 1987-09-24 | 1990-05-08 | Japan Synthetic Rubber Co., Ltd. | Curable composition |
US4943512A (en) * | 1987-11-12 | 1990-07-24 | Chisso Corporation | Photocurable and dyeable resin composition with bisazide and dyeable acrylic copolymer |
US4960722A (en) * | 1985-08-29 | 1990-10-02 | Matsushita Electric Industrial Co., Ltd. | Sensor using a field effect transistor and method of fabricating the same |
US5041570A (en) * | 1988-08-03 | 1991-08-20 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive 4,4'-diazidostilbene derivative |
US5053225A (en) * | 1988-03-18 | 1991-10-01 | Fuji Photo Film Co., Ltd. | Functional organic thin film chemically bonded to biologically active agent |
DD298268A5 (en) | 1989-03-02 | 1992-02-13 | Zentralinstitut Fuer Molekularbiologie,De | PROCESS FOR IMMOBILIZING BIOLOGICAL ACTIVE MATERIALS |
US5154808A (en) * | 1987-06-26 | 1992-10-13 | Fuji Photo Film Co., Ltd. | Functional organic thin film and process for producing the same |
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-
1997
- 1997-02-15 DE DE19705909A patent/DE19705909A1/en not_active Ceased
- 1997-08-22 AT AT97941958T patent/ATE313078T1/en active
- 1997-08-22 WO PCT/EP1997/004582 patent/WO1998008086A1/en active IP Right Grant
- 1997-08-22 DE DE59712525T patent/DE59712525D1/en not_active Expired - Lifetime
- 1997-08-22 JP JP51043098A patent/JP3624382B2/en not_active Expired - Fee Related
- 1997-08-22 EP EP97941958A patent/EP0920618B1/en not_active Expired - Lifetime
- 1997-08-22 US US09/230,975 patent/US6821692B1/en not_active Expired - Fee Related
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US3884703A (en) * | 1972-04-17 | 1975-05-20 | Hitachi Ltd | Bisazide sensitized photoresistor composition with diacetone acrylamide |
FR2245009A1 (en) | 1973-09-21 | 1975-04-18 | Kodak Pathe | Protein contng photo resist compsn with photoisomerisable cpd - which on exposure has greater enzyme inhibiting power |
US4251620A (en) * | 1975-02-19 | 1981-02-17 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate process |
US4288526A (en) * | 1975-02-19 | 1981-09-08 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plates with discontinuous over-coating |
US4106938A (en) * | 1977-05-23 | 1978-08-15 | Eastman Kodak Company | Vesicular composition, element and process utilizing a diol |
US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
US4451568A (en) * | 1981-07-13 | 1984-05-29 | Battelle Memorial Institute | Composition for binding bioactive substances |
EP0116361A2 (en) | 1983-02-07 | 1984-08-22 | Fuji Photo Film Co., Ltd. | Analytical element for dry analysis |
US5157018A (en) * | 1984-06-08 | 1992-10-20 | Hoechst Aktiengesellschaft | Perfluoroalkyl group-containing polymers and reproduction layers produced therefrom |
US4960722A (en) * | 1985-08-29 | 1990-10-02 | Matsushita Electric Industrial Co., Ltd. | Sensor using a field effect transistor and method of fabricating the same |
DE3602486A1 (en) | 1986-01-29 | 1987-07-30 | Sanyo Kokusaku Pulp Co | METHOD FOR PRODUCING A COLOR FILTER |
EP0246602A2 (en) | 1986-05-20 | 1987-11-25 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Device having a thin film of a polymer |
EP0286118A2 (en) | 1987-04-09 | 1988-10-12 | Nova Biomedical Corporation | Glucose electrode and method of determining glucose |
US5154808A (en) * | 1987-06-26 | 1992-10-13 | Fuji Photo Film Co., Ltd. | Functional organic thin film and process for producing the same |
US4923948A (en) * | 1987-09-24 | 1990-05-08 | Japan Synthetic Rubber Co., Ltd. | Curable composition |
US4943512A (en) * | 1987-11-12 | 1990-07-24 | Chisso Corporation | Photocurable and dyeable resin composition with bisazide and dyeable acrylic copolymer |
US5053225A (en) * | 1988-03-18 | 1991-10-01 | Fuji Photo Film Co., Ltd. | Functional organic thin film chemically bonded to biologically active agent |
JPH01241541A (en) * | 1988-03-23 | 1989-09-26 | Nippon Kayaku Co Ltd | Colored pattern forming method |
US5041570A (en) * | 1988-08-03 | 1991-08-20 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive 4,4'-diazidostilbene derivative |
DD275538A1 (en) | 1988-09-12 | 1990-01-24 | Feutron Greiz Veb | METHOD FOR PRODUCING A CAPACITIVE SORPTION HUMID SENSOR |
DD298268A5 (en) | 1989-03-02 | 1992-02-13 | Zentralinstitut Fuer Molekularbiologie,De | PROCESS FOR IMMOBILIZING BIOLOGICAL ACTIVE MATERIALS |
US5202227A (en) * | 1989-06-03 | 1993-04-13 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Control of cell arrangement |
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EP1104883A2 (en) | 1992-10-01 | 2001-06-06 | Australian Membrane And Biotechnology Research Institute | Improved sensor membranes |
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US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060244118A1 (en) * | 2001-01-31 | 2006-11-02 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
US7489031B2 (en) * | 2001-01-31 | 2009-02-10 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
US20060277778A1 (en) * | 2005-06-10 | 2006-12-14 | Mick Stephen E | Reusable template for creation of thin films; method of making and using template; and thin films produced from template |
US7713053B2 (en) | 2005-06-10 | 2010-05-11 | Protochips, Inc. | Reusable template for creation of thin films; method of making and using template; and thin films produced from template |
US20100221488A1 (en) * | 2005-06-10 | 2010-09-02 | Protochips, Inc. | Reusable template for creation of thin films; method of making and using template; and thin films produced from template |
CN103528866A (en) * | 2013-10-18 | 2014-01-22 | 江苏蓝拓生物科技有限公司 | Preparation method of carbon supporting film |
CN103528866B (en) * | 2013-10-18 | 2016-01-20 | 江苏蓝拓生物科技有限公司 | The preparation method of carbon supporting film |
WO2021038058A1 (en) | 2019-08-30 | 2021-03-04 | Westfaelische Wilhelms-Universitaet Muenster | Method for manufacturing a holey film, in particular for electron microscopy applications |
Also Published As
Publication number | Publication date |
---|---|
DE59712525D1 (en) | 2006-01-19 |
ATE313078T1 (en) | 2005-12-15 |
EP0920618A1 (en) | 1999-06-09 |
JP3624382B2 (en) | 2005-03-02 |
DE19705909A1 (en) | 1998-08-20 |
EP0920618B1 (en) | 2005-12-14 |
WO1998008086A1 (en) | 1998-02-26 |
JP2001501728A (en) | 2001-02-06 |
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