US6328785B1 - Method of degassing aqueous coating solution - Google Patents

Method of degassing aqueous coating solution Download PDF

Info

Publication number
US6328785B1
US6328785B1 US09/459,563 US45956399A US6328785B1 US 6328785 B1 US6328785 B1 US 6328785B1 US 45956399 A US45956399 A US 45956399A US 6328785 B1 US6328785 B1 US 6328785B1
Authority
US
United States
Prior art keywords
degassing
coating solution
aqueous coating
resin film
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US09/459,563
Inventor
Kenji Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Assigned to FUJI PHOTO FILM CO., LTD. reassignment FUJI PHOTO FILM CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HAYASHI, KENJI
Application granted granted Critical
Publication of US6328785B1 publication Critical patent/US6328785B1/en
Assigned to FUJIFILM CORPORATION reassignment FUJIFILM CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/0068General arrangements, e.g. flowsheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/0021Degasification of liquids by bringing the liquid in a thin layer

Definitions

  • This invention relates to a method of degassing an aqueous solution for the prevention of coating troubles in a process of delivering the aqueous solution and applying it to a web.
  • Japanese Patent KOKAI 6-335623 comprises using a composite membrane which is a hollow fiber composed of a porous membrane (4-methylpentene-based polymer) and a nonporous membrane.
  • Japanese Patent KOKOKU 51-35259 discloses a continuous degassing apparatus comprising introducing a high viscosity liquid into a reduced pressure chamber, reducing the viscosity temporarily by heating, streaming it on a wetting wall having a surface area gradually increasing from the top to the underside in a tower to decrease membrane pressure, and degassing by sucking the reduced pressure chamber by a vacuum pump.
  • Japanese Patent KOKAI 64-38105 discloses a treating of silver halide emulsion for photograph which comprises passing the emulsion containing dissolved air and microbubbles on the outside of a porous polymer membrane tube to be stored in a jacket, and removing the dissolved air and microbubbles while sucking the inside of the tube and pressuring the emulsion.
  • Japanese Patent KOKAI 9-225206 discloses a degassing apparatus using a membrane of tetrafluoroethylene-hexafluoropropylene copolymer.
  • degassing apparatus was developed in order to solve a problem of a conventional degassing apparatus using a porous polymer membrane in degassing solvent solutions, oils, fats, and solutions containing surfactant which tends to permeate liquid to wet, and thereby, loses degassing ability.
  • An object of the invention is to provide a degassing method of an aqueous coating solution capable of avoiding coating troubles caused by dissolved air and bubbles, even in the case of a high viscosity solution.
  • the inventors investigated a method of not inducing coating troubles caused by dissolved air and bubbles even in the case of a high viscosity solution, and found that fluoro resin films are particularly suitable as the degassing membrane for the above object, and it is possible to degas up to a desired degassed level of a viscous aqueous coating solution without generating microbubbles.
  • the present invention provides a method of degassing an aqueous coating solution having a viscosity of 1 centipoise or more which comprises using a fluoro resin film.
  • FIG. 1 is a schematic flow diagram illustrating a degassing apparatus to which the method of the invention can be applied.
  • the degassing membrane is formed of a fluoro resin film, preferably tetrafluoroethylene-hexafluoropropylene copolymer resin film, tetrafluoroethylene-perfluoroalkoxyethylene copolymer resin film or tetrafluoroethylene-ethylene copolymer resin.
  • the fluoro resin film is nonporous film.
  • a suitable thickness of the fluoro resin film is about 10 to 100 ⁇ m, preferably about 20 to 50 ⁇ m.
  • the aqueous coating solution to be degassed is viscous, and contains a water-soluble polymer, such as vinyl-based polymers, e.g. polyvinyl alcohol, polyvinyl acetate, polyvinyl pyrrolidone, etc., an acrylic acid-based or methacrylic acid-based polymer e.g. polyacrylic acid, polymethacrylic acid, acrylic acid-based copolymers, and the like.
  • the content of the water-soluble polymer is, in general, about 40 wt. % or less, particularly 10 to 40 wt. %.
  • the viscosity of the aqueous coating solution for which the method of the invention is effective is 1 centipoise or more, preferably 5 centipoises or more, particularly preferably 10 centipoises or more.
  • the upper end of the viscosity depends on the permeability of the coating solution through the fluoro resin film, and practically about 40 centipoises.
  • the aqueous coating solution is for forming a photographic photosensitive layer, a photosensitive printing plate or the like.
  • the fluoro resin film is mounted in an airtight casing, and supplied to use as a degassing apparatus.
  • a conventional microfiltration apparatus or ultrafiltration apparatus can be used as the degassing apparatus.
  • Commercial microfiltration apparatus equipped with the fluoro resin film are also available.
  • the aqueous coating solution flows on the fluoro resin film while only dissolved air and bubbles pass through the fluoro resin film.
  • the degassing pressure (in the exhaust gas chamber) is preferably 30 torr (mmHg) or less, more preferably 10 torr or less.
  • the degassing temperature is not limited so far as not denaturing the aqueous coating solution, and may be 10 to 70 C.
  • a suitable degassing degree varies according to products, particularly delivered volume of the aqueous coating solution, coating method and tendency of the occurrence of troubles, in general, a suitable degassing degree is 90% or less, preferably 80% or less.
  • the degassing degree (ppm after degassing/ppm before degassing) ⁇ 100.
  • a suitable residual amount of dissolved air and bubbles after the degassing varies according to products, and in the case of photographic emulsion, 6 ppm or less, preferably 4 ppm or less, as oxygen amount.
  • the degassed aqueous coating solution is subjected to application.
  • the coating layer may be single layer or multilayer, and a multilayer coater is usable.
  • the web material to be coated with the aqueous coating solution may be aluminum web, polyester web, such as PET web, or the like.
  • FIG. 1 An apparatus for carrying out the method of the invention is illustrated in FIG. 1 .
  • the apparatus is composed of a tank 10 for storing the aqueous coating solution, a membrane degassing apparatus 30 connected to the tank 10 through a delivery pump 20 , a filtration apparatus 50 connected to the outlet of the degassing apparatus 30 , a vacuum pump 40 also connected to the degassing apparatus 30 , and a coater 60 connected to the filtration apparatus 50 .
  • the degassing apparatus 30 is equipped with a fluoro resin film as the degassing membrane.
  • the filtration apparatus is provided for the removal of foreign materials, such as solid particles and coagulated matters.
  • the aqueous coating solution stored in the tank 10 is delivered by the pump 20 to the membrane degassing apparatus, the filtration apparatus 50 and then the coater 60 . Meanwhile, dissolved air and bubbles in the aqueous coating solution permeates the degassing membrane while passing through the degassing apparatus 30 , and are removed.
  • the method of the invention even in the case of degassing an aqueous coating solution having a high viscosity, microbubbles do not generate, and accordingly, the aqueous coating solution delivered to the coater does not contain bubbles, thereby preventing coating troubles caused by bubbles.
  • a period for defoaming to stabilize degassing degree (waiting period) can be omitted upon starting of coating.
  • the degassing membrane used was a tetrafluoroethylene-hexafluoropropylene copolymer resin film having a thickness of 25 ⁇ m, and degassing was carried out under the following conditions:
  • Aqueous coating solution Water 94 wt. %

Abstract

The method of degassing an aqueous coating solution having a viscosity of 1 centipoise or more comprises using a fluoro resin film as the degassing membrane and can degas fast without the generation of microbubbles which causes coating troubles even in the case of the solutions having a high viscosity.

Description

BACKGROUND OF THE INVENTION
This invention relates to a method of degassing an aqueous solution for the prevention of coating troubles in a process of delivering the aqueous solution and applying it to a web.
In general, when a coating solution containing dissolved air or bubbles is applied to a web, it is difficult to form a uniform coating membrane because of the occurrence of longitudinal streaks, pinholes and the like. Thereupon, in the case of precise coating membranes, the coating solutions therefor need to remove dissolved air and bubbles from them prior to coating.
Heretofore, various degassing methods have been proposed. For example, the degassing method disclosed in Japanese Patent KOKAI 6-335623 comprises using a composite membrane which is a hollow fiber composed of a porous membrane (4-methylpentene-based polymer) and a nonporous membrane. Japanese Patent KOKOKU 51-35259 discloses a continuous degassing apparatus comprising introducing a high viscosity liquid into a reduced pressure chamber, reducing the viscosity temporarily by heating, streaming it on a wetting wall having a surface area gradually increasing from the top to the underside in a tower to decrease membrane pressure, and degassing by sucking the reduced pressure chamber by a vacuum pump. Japanese Patent KOKAI 64-38105 discloses a treating of silver halide emulsion for photograph which comprises passing the emulsion containing dissolved air and microbubbles on the outside of a porous polymer membrane tube to be stored in a jacket, and removing the dissolved air and microbubbles while sucking the inside of the tube and pressuring the emulsion. Japanese Patent KOKAI 9-225206 discloses a degassing apparatus using a membrane of tetrafluoroethylene-hexafluoropropylene copolymer. Thus, degassing apparatus was developed in order to solve a problem of a conventional degassing apparatus using a porous polymer membrane in degassing solvent solutions, oils, fats, and solutions containing surfactant which tends to permeate liquid to wet, and thereby, loses degassing ability.
However, when a high viscosity aqueous coating solution is degassed by the degassing under reduced pressure, microbubbles are generated in the solution. Since the coating solution has a high viscosity, the generated microbubbles cannot be separated by flotation, and are delivered to a coater to cause coating troubles. The degassing apparatus using a membrane of tetrafluoroethylene-hexafluoroethylene copolymer were developed for degassing solutions having affinity to porous polymer membranes such as organic solvent solutions, oils, fats, surfactant solutions, and the patent application is quite silent about high viscosity solutions and solutions containing a water-soluble polymer.
SUMMARY OF THE INVENTION
An object of the invention is to provide a degassing method of an aqueous coating solution capable of avoiding coating troubles caused by dissolved air and bubbles, even in the case of a high viscosity solution.
The inventors investigated a method of not inducing coating troubles caused by dissolved air and bubbles even in the case of a high viscosity solution, and found that fluoro resin films are particularly suitable as the degassing membrane for the above object, and it is possible to degas up to a desired degassed level of a viscous aqueous coating solution without generating microbubbles.
Thus, the present invention provides a method of degassing an aqueous coating solution having a viscosity of 1 centipoise or more which comprises using a fluoro resin film.
BRIEF DESCRIPTION OF THE DRAWING
FIG. 1 is a schematic flow diagram illustrating a degassing apparatus to which the method of the invention can be applied.
10 . . . Tank
20 . . . Delivery pump
30 . . . Degassing apparatus
40 . . . Vacuum pump
50 . . . Filtration apparatus
60 . . . Coater
DETAILED DESCRIPTION OF THE INVENTION
In the degassing of an aqueous coating solution of the invention, the degassing membrane is formed of a fluoro resin film, preferably tetrafluoroethylene-hexafluoropropylene copolymer resin film, tetrafluoroethylene-perfluoroalkoxyethylene copolymer resin film or tetrafluoroethylene-ethylene copolymer resin. The fluoro resin film is nonporous film. A suitable thickness of the fluoro resin film is about 10 to 100 μm, preferably about 20 to 50 μm.
The aqueous coating solution to be degassed is viscous, and contains a water-soluble polymer, such as vinyl-based polymers, e.g. polyvinyl alcohol, polyvinyl acetate, polyvinyl pyrrolidone, etc., an acrylic acid-based or methacrylic acid-based polymer e.g. polyacrylic acid, polymethacrylic acid, acrylic acid-based copolymers, and the like. The content of the water-soluble polymer is, in general, about 40 wt. % or less, particularly 10 to 40 wt. %. The viscosity of the aqueous coating solution for which the method of the invention is effective is 1 centipoise or more, preferably 5 centipoises or more, particularly preferably 10 centipoises or more. The upper end of the viscosity depends on the permeability of the coating solution through the fluoro resin film, and practically about 40 centipoises. The aqueous coating solution is for forming a photographic photosensitive layer, a photosensitive printing plate or the like.
The fluoro resin film is mounted in an airtight casing, and supplied to use as a degassing apparatus. A conventional microfiltration apparatus or ultrafiltration apparatus can be used as the degassing apparatus. Commercial microfiltration apparatus equipped with the fluoro resin film are also available.
The aqueous coating solution flows on the fluoro resin film while only dissolved air and bubbles pass through the fluoro resin film. The degassing pressure (in the exhaust gas chamber) is preferably 30 torr (mmHg) or less, more preferably 10 torr or less. The degassing temperature is not limited so far as not denaturing the aqueous coating solution, and may be 10 to 70 C.
Although a suitable degassing degree varies according to products, particularly delivered volume of the aqueous coating solution, coating method and tendency of the occurrence of troubles, in general, a suitable degassing degree is 90% or less, preferably 80% or less. The degassing degree=(ppm after degassing/ppm before degassing)×100.
A suitable residual amount of dissolved air and bubbles after the degassing varies according to products, and in the case of photographic emulsion, 6 ppm or less, preferably 4 ppm or less, as oxygen amount.
The degassed aqueous coating solution is subjected to application. The coating layer may be single layer or multilayer, and a multilayer coater is usable. The web material to be coated with the aqueous coating solution may be aluminum web, polyester web, such as PET web, or the like.
An apparatus for carrying out the method of the invention is illustrated in FIG. 1. The apparatus is composed of a tank 10 for storing the aqueous coating solution, a membrane degassing apparatus 30 connected to the tank 10 through a delivery pump 20, a filtration apparatus 50 connected to the outlet of the degassing apparatus 30, a vacuum pump 40 also connected to the degassing apparatus 30, and a coater 60 connected to the filtration apparatus 50. The degassing apparatus 30 is equipped with a fluoro resin film as the degassing membrane. The filtration apparatus is provided for the removal of foreign materials, such as solid particles and coagulated matters. In the above apparatus, the aqueous coating solution stored in the tank 10 is delivered by the pump 20 to the membrane degassing apparatus, the filtration apparatus 50 and then the coater 60. Meanwhile, dissolved air and bubbles in the aqueous coating solution permeates the degassing membrane while passing through the degassing apparatus 30, and are removed.
According to the method of the invention, even in the case of degassing an aqueous coating solution having a high viscosity, microbubbles do not generate, and accordingly, the aqueous coating solution delivered to the coater does not contain bubbles, thereby preventing coating troubles caused by bubbles. A period for defoaming to stabilize degassing degree (waiting period) can be omitted upon starting of coating.
EXAMPLES
The degassing membrane used was a tetrafluoroethylene-hexafluoropropylene copolymer resin film having a thickness of 25 μm, and degassing was carried out under the following conditions:
Aqueous coating solution: Water 94 wt. %
Polyvinyl alcohol 5 wt. %
Surfactant 1 wt. %
Dissolved oxygen 8 ppm
Viscosity 10 c.p. at 25° C.
Flow rate: 1.0 l/min
Pressure on the reduced pressure side: 30 torr
The results are summarized in Table 1.
TABLE 1
Time Example Comparative
(min) Membrane Degassing Suction Degassing
10 None Generation of microbubbles
20 None Generation of microbubbles
30 None Generation of microbubbles
Generation of microbubbles were evaluated by the bubble inspection and the like.
As can be seen from Table 1, microbubbles did not generate at all, and liquid leakage was also not found.
Subsequently, degassing was carried out in a circulating system of the aqueous coating solution, and the residual dissolved oxygen was measured with time. The results are shown in Table 2.
TABLE 2
Residual Rate of Dissolved Oxygen (%)
Time Example Comparative
(min) Membrane Degassing Suction Degassing
0 100 100
10 88.9 92.6
20 51.9 87.7
30 40.7 85.2

Claims (5)

What is claimed is:
1. A method of degassing an aqueous coating solution containing a water-soluble polymer having a viscosity of 1 centipoise or more which comprises
flowing the aqueous coating solution on one side of a nonporous fluoro resin film having a thickness of 10 to 100 μm, and
reducing the pressure on the opposite side of the film to pass dissolved air and bubbles in the aqueous coating solution through the fluoro resin film,
wherein the water-soluble polymer is selected from the group consisting of a vinyl-based polymer, an acrylic acid-based polymer and a methacrylic acid-based polymer.
2. The method of claim 1 wherein the fluoro resin film is a tetrafluoroethylene-hexafluoroethylene copolymer resin film.
3. The method of claim 1 wherein the water-soluble polymer is a member selected from the group consisting of polyvinyl alcohol, polyvinyl acetate, polyvinyl pyrrolidone, polyacrylic acid, polymethacrylic acid and acrylic acid-based copolymers.
4. The method of claim 1, wherein the water-soluble polymer has a viscosity of 5 to 40 centipoises.
5. The method of claim 1, wherein the reduced pressure is 30 torr or less.
US09/459,563 1998-12-11 1999-12-13 Method of degassing aqueous coating solution Expired - Fee Related US6328785B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10-352223 1998-12-11
JP10352223A JP2000176261A (en) 1998-12-11 1998-12-11 Method for deaerating water-based coating liquid

Publications (1)

Publication Number Publication Date
US6328785B1 true US6328785B1 (en) 2001-12-11

Family

ID=18422605

Family Applications (1)

Application Number Title Priority Date Filing Date
US09/459,563 Expired - Fee Related US6328785B1 (en) 1998-12-11 1999-12-13 Method of degassing aqueous coating solution

Country Status (2)

Country Link
US (1) US6328785B1 (en)
JP (1) JP2000176261A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040060436A1 (en) * 2001-02-07 2004-04-01 Bipin Parekh Process for degassing an aqueous plating solution
US20040198190A1 (en) * 2003-03-27 2004-10-07 Basol Bulent M Method and apparatus for reduction of defects in wet processed layers
GB2489964A (en) * 2011-04-13 2012-10-17 Palintest Ltd Device for removing a dissolved gas or volatile component from a liquid sample
US20160315200A1 (en) * 2015-04-21 2016-10-27 Incheon University Industry Academic Cooperation Foundation Method of manufacturing amorphous igzo tft-based transient semiconductor
US10121685B2 (en) * 2015-03-31 2018-11-06 Tokyo Electron Limited Treatment solution supply method, non-transitory computer-readable storage medium, and treatment solution supply apparatus

Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135259A (en) 1974-09-20 1976-03-25 Hitachi Ltd CHENSOCHI
US4257257A (en) * 1978-03-13 1981-03-24 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Method and apparatus for measuring concentrations of gaseous or volatile substances in liquids
US4539113A (en) * 1983-07-08 1985-09-03 Sumitomo Electric Industries, Ltd. Fluororesin filter
US4702102A (en) * 1983-12-28 1987-10-27 Polaroid Corporation Direct readout dissolved gas measurement apparatus
US4729773A (en) * 1986-03-04 1988-03-08 Erma Inc. Unit for degassing liquids
JPS647916A (en) * 1987-06-30 1989-01-11 Fuji Photo Film Co Ltd Treatment of photosensitive coating solution
DE3822093A1 (en) * 1987-06-30 1989-01-19 Fuji Photo Film Co Ltd Degassing and defoaming method and apparatus for carrying out this method
JPS6438105A (en) * 1987-08-05 1989-02-08 Fuji Photo Film Co Ltd Process and apparatus for treating photographic silver halide emulsion
JPH01215312A (en) * 1988-02-22 1989-08-29 Takuma Co Ltd Method for removing dissolved gas in liquid
US4869732A (en) * 1988-12-23 1989-09-26 Texaco Inc. Deoxygenation of aqueous polymer solutions used in enhanced oil recovery processes
JPH01299612A (en) * 1988-05-30 1989-12-04 Akuasu Kk Method for reducing dissolved oxygen
EP0376638A2 (en) * 1988-12-29 1990-07-04 Japan Gore-Tex, Inc. A degassing tube for solvents
JPH02290201A (en) * 1989-04-28 1990-11-30 Nitto Denko Corp Deaeration of liquid
JPH03154601A (en) * 1989-11-10 1991-07-02 Ebara Infilco Co Ltd Removal of dissolving oxygen in water
JPH06335623A (en) 1993-05-28 1994-12-06 Dainippon Ink & Chem Inc Deaerating film and deaerating method
US5425803A (en) * 1992-11-16 1995-06-20 Novellus Systems, Inc. Device for removing dissolved gas from a liquid
US5762684A (en) * 1995-11-30 1998-06-09 Dainippon Screen Mfg. Co., Ltd. Treating liquid supplying method and apparatus
US5788742A (en) * 1995-12-11 1998-08-04 Dainippon Screen Mfg. Co., Ltd. Method and apparatus for degassing processing solution for substrates
US5830261A (en) * 1996-02-26 1998-11-03 Japan Gore-Tex, Inc. Assembly for deaeration of liquids
US5888275A (en) * 1996-02-26 1999-03-30 Japan Gore-Tex, Inc. Assembly for deaeration of liquids
US5981614A (en) * 1996-09-13 1999-11-09 Adiletta; Joseph G. Hydrophobic-oleophobic fluoropolymer compositions
US6033475A (en) * 1994-12-27 2000-03-07 Tokyo Electron Limited Resist processing apparatus
US6086768A (en) * 1998-09-08 2000-07-11 Porocrit L.L.C. Method for demulsification of emulsions containing dense gas and liquid and a surfactant
US6126725A (en) * 1997-02-07 2000-10-03 Tokyo Electron Limited Deaerating apparatus and treatment apparatus with gas permeable films
US6168648B1 (en) * 1997-12-25 2001-01-02 Nitto Denko Corporation Spiral wound type membrane module, spiral wound type membrane element and running method thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01155910A (en) * 1987-12-15 1989-06-19 Fuji Photo Film Co Ltd Deairing and debubbling device
JPS647915A (en) * 1987-06-30 1989-01-11 Fuji Photo Film Co Ltd Treatment of photosensitive coating solution
JPH01199607A (en) * 1988-02-02 1989-08-11 Fuji Photo Film Co Ltd Treatment of photosensitive coating solution
JPH0557108A (en) * 1991-08-29 1993-03-09 Fuji Photo Film Co Ltd Method and apparatus for degassing photosensitive coating solution
JPH0596103A (en) * 1991-10-03 1993-04-20 Fuji Photo Film Co Ltd Deaerating and defoaming method
JPH06254304A (en) * 1993-02-26 1994-09-13 Fuji Photo Film Co Ltd Method and device for deaerating photosensitive coating liquid
JP3521364B2 (en) * 1995-03-06 2004-04-19 日東電工株式会社 Degassing device and degassing method
JPH10192669A (en) * 1997-01-16 1998-07-28 Dainippon Ink & Chem Inc Deaeration membrane
JPH10202074A (en) * 1997-01-21 1998-08-04 Nitto Denko Corp Asymmetric structural fluororesin tube, production thereof, deaerating method using the tube and device therefor
JPH11188202A (en) * 1997-12-26 1999-07-13 Fuji Photo Film Co Ltd Deaeration of photosensitive coating liquid
JP2000084368A (en) * 1998-09-08 2000-03-28 Mitsubishi Rayon Co Ltd Multiple hollow fiber membrane for liquid chemical deaeration

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135259A (en) 1974-09-20 1976-03-25 Hitachi Ltd CHENSOCHI
US4257257A (en) * 1978-03-13 1981-03-24 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Method and apparatus for measuring concentrations of gaseous or volatile substances in liquids
US4539113A (en) * 1983-07-08 1985-09-03 Sumitomo Electric Industries, Ltd. Fluororesin filter
US4702102A (en) * 1983-12-28 1987-10-27 Polaroid Corporation Direct readout dissolved gas measurement apparatus
US4729773A (en) * 1986-03-04 1988-03-08 Erma Inc. Unit for degassing liquids
JPS647916A (en) * 1987-06-30 1989-01-11 Fuji Photo Film Co Ltd Treatment of photosensitive coating solution
DE3822093A1 (en) * 1987-06-30 1989-01-19 Fuji Photo Film Co Ltd Degassing and defoaming method and apparatus for carrying out this method
JPS6438105A (en) * 1987-08-05 1989-02-08 Fuji Photo Film Co Ltd Process and apparatus for treating photographic silver halide emulsion
JPH01215312A (en) * 1988-02-22 1989-08-29 Takuma Co Ltd Method for removing dissolved gas in liquid
JPH01299612A (en) * 1988-05-30 1989-12-04 Akuasu Kk Method for reducing dissolved oxygen
US4869732A (en) * 1988-12-23 1989-09-26 Texaco Inc. Deoxygenation of aqueous polymer solutions used in enhanced oil recovery processes
EP0376638A2 (en) * 1988-12-29 1990-07-04 Japan Gore-Tex, Inc. A degassing tube for solvents
JPH02290201A (en) * 1989-04-28 1990-11-30 Nitto Denko Corp Deaeration of liquid
JPH03154601A (en) * 1989-11-10 1991-07-02 Ebara Infilco Co Ltd Removal of dissolving oxygen in water
US5425803A (en) * 1992-11-16 1995-06-20 Novellus Systems, Inc. Device for removing dissolved gas from a liquid
JPH06335623A (en) 1993-05-28 1994-12-06 Dainippon Ink & Chem Inc Deaerating film and deaerating method
US6033475A (en) * 1994-12-27 2000-03-07 Tokyo Electron Limited Resist processing apparatus
US5762684A (en) * 1995-11-30 1998-06-09 Dainippon Screen Mfg. Co., Ltd. Treating liquid supplying method and apparatus
US5788742A (en) * 1995-12-11 1998-08-04 Dainippon Screen Mfg. Co., Ltd. Method and apparatus for degassing processing solution for substrates
US5830261A (en) * 1996-02-26 1998-11-03 Japan Gore-Tex, Inc. Assembly for deaeration of liquids
US5888275A (en) * 1996-02-26 1999-03-30 Japan Gore-Tex, Inc. Assembly for deaeration of liquids
US5981614A (en) * 1996-09-13 1999-11-09 Adiletta; Joseph G. Hydrophobic-oleophobic fluoropolymer compositions
US6126725A (en) * 1997-02-07 2000-10-03 Tokyo Electron Limited Deaerating apparatus and treatment apparatus with gas permeable films
US6168648B1 (en) * 1997-12-25 2001-01-02 Nitto Denko Corporation Spiral wound type membrane module, spiral wound type membrane element and running method thereof
US6086768A (en) * 1998-09-08 2000-07-11 Porocrit L.L.C. Method for demulsification of emulsions containing dense gas and liquid and a surfactant

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040060436A1 (en) * 2001-02-07 2004-04-01 Bipin Parekh Process for degassing an aqueous plating solution
US7014679B2 (en) * 2001-02-07 2006-03-21 Mykrolis Corporation Process for degassing an aqueous plating solution
US20040198190A1 (en) * 2003-03-27 2004-10-07 Basol Bulent M Method and apparatus for reduction of defects in wet processed layers
US7189146B2 (en) * 2003-03-27 2007-03-13 Asm Nutool, Inc. Method for reduction of defects in wet processed layers
US20070135022A1 (en) * 2003-03-27 2007-06-14 Basol Bulent M Apparatus for reduction of defects in wet procssed layers
US7503830B2 (en) 2003-03-27 2009-03-17 Novellus Systems, Inc. Apparatus for reduction of defects in wet processed layers
US20040222100A1 (en) * 2003-04-29 2004-11-11 Basol Bulent M Process and system for providing electrochemical processing solution with reduced oxygen and gas content
GB2489964A (en) * 2011-04-13 2012-10-17 Palintest Ltd Device for removing a dissolved gas or volatile component from a liquid sample
GB2489964B (en) * 2011-04-13 2017-12-13 Palintest Ltd A device for removing dissolved gas or volatile component from a liquid sample
US10121685B2 (en) * 2015-03-31 2018-11-06 Tokyo Electron Limited Treatment solution supply method, non-transitory computer-readable storage medium, and treatment solution supply apparatus
US20160315200A1 (en) * 2015-04-21 2016-10-27 Incheon University Industry Academic Cooperation Foundation Method of manufacturing amorphous igzo tft-based transient semiconductor
US10134913B2 (en) * 2015-04-21 2018-11-20 Incheon University Industry Academic Cooperation Foundation Method of manufacturing amorphous IGZO TFT-based transient semiconductor

Also Published As

Publication number Publication date
JP2000176261A (en) 2000-06-27

Similar Documents

Publication Publication Date Title
US6558450B2 (en) Method for debubbling an ink
US20130334128A1 (en) Separation membrane element
US5123937A (en) Deaerating film and deaerating method
KR101612578B1 (en) Composite semitransparent film and manufacturing method therefor
KR19980024624A (en) Resist processing method and resist processing apparatus
WO2006051807A1 (en) Hydrophilizing agent for hydrophobic porous film and methods of hydrophilizing and inspecting hydrophobic porous film with the same
US6328785B1 (en) Method of degassing aqueous coating solution
JP6576546B2 (en) Virus removal membrane and method for producing virus removal membrane
JPH07500283A (en) How to remove alcohol from liquid
JP2961665B2 (en) Degassing and degassing of liquid
JP2630481B2 (en) Method of feeding coating liquid
US20170326506A1 (en) Multilayer semipermeable membrane
TWI555568B (en) Membrane with multiple size fibers
US4127394A (en) Method and apparatus for deaeration of a liquid composition
US3969452A (en) Method for casting and handling ultra-thin reverse osmosis membranes
JP2001070707A (en) Degassing apparatus
JP2000262956A (en) Starting method of feeding liquid to coating head and device therefor
JP4341183B2 (en) Defoaming apparatus and defoaming method
JPS63158106A (en) Deaerating method
JPH059042Y2 (en)
JPH11188202A (en) Deaeration of photosensitive coating liquid
JPH04197479A (en) Drying method and apparatus using hot pure water
JPH1147670A (en) Liquid feeding method
JPS6223401A (en) Ultrafiltration membrane
JPH0478331B2 (en)

Legal Events

Date Code Title Description
AS Assignment

Owner name: FUJI PHOTO FILM CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HAYASHI, KENJI;REEL/FRAME:010450/0035

Effective date: 19991209

FPAY Fee payment

Year of fee payment: 4

AS Assignment

Owner name: FUJIFILM CORPORATION, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.);REEL/FRAME:018904/0001

Effective date: 20070130

Owner name: FUJIFILM CORPORATION,JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.);REEL/FRAME:018904/0001

Effective date: 20070130

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

FPAY Fee payment

Year of fee payment: 8

REMI Maintenance fee reminder mailed
LAPS Lapse for failure to pay maintenance fees
STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20131211