US6146489A - Method and apparatus for depositing scintillator material on radiation imager - Google Patents

Method and apparatus for depositing scintillator material on radiation imager Download PDF

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US6146489A
US6146489A US09/195,656 US19565698A US6146489A US 6146489 A US6146489 A US 6146489A US 19565698 A US19565698 A US 19565698A US 6146489 A US6146489 A US 6146489A
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array
assembly
mask
detector array
accordance
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US09/195,656
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Reinhold Franz Wirth
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General Electric Co
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General Electric Co
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Assigned to GENERAL ELECTRIC COMPANY reassignment GENERAL ELECTRIC COMPANY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: WIRTH, REINHOLD F.
Priority to CA002288468A priority patent/CA2288468C/en
Priority to JP11321869A priority patent/JP2000180556A/en
Priority to DE69927228T priority patent/DE69927228T2/en
Priority to EP99309232A priority patent/EP1003226B1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0232Optical elements or arrangements associated with the device
    • H01L31/02322Optical elements or arrangements associated with the device comprising luminescent members, e.g. fluorescent sheets upon the device

Definitions

  • This invention relates generally to solid state radiation imagers, and more particularly to depositing scintillator material on x-ray detector arrays.
  • Solid state radiation imaging devices typically include an array of photosensors coupled to a scintillator. Radiation incident on the scintillator is absorbed, resulting in the generation of optical photons which, in turn, are detected by the photosensor array to generate a corresponding electrical signal. A key factor in imager performance relates to the effective disposition and coupling of the scintillator to the photosensor array.
  • a typical scintillator material in radiation imaging arrays is Cesium Iodide (CsI).
  • CsI Cesium Iodide
  • the cesium iodide is disposed over the detector array the active portion of the detector array, that is, the area in which incident X-ray beams are absorbed and detected.
  • a cover plate typically is located over the array electrical contact portion to prevent x-ray beams from impinging on electrical conductors outside of the active area of the array.
  • the cover plate typically is secured to the detector array by an adhesive applied between the array active portion and the electrical contact portion.
  • the electrical conductors are coated with CsI, such coating can adversely affect image generation. Particularly, the electrical characteristics of the conductors could be impacted by the coating, and the signals obtained from the coated conductors may not accurately represent the characteristics of an attenuated x-ray beam which impinges on the array active portion.
  • CsI is applied to the area of the detector array to receive the adhesive, i.e., at the interface between the active portion and the electrical conductors, such CsI can affect the integrity of the bond between the adhesive and the detector array.
  • shadow masks typically are used.
  • the shadow mask is intended to facilitate coating the entire array active portion with CsI while simultaneously preventing any migration of CsI into the inactive portion of the array, i.e., the portion of the array to receive the adhesive and the electrical contact portion.
  • Shadow masks typically are frame-like members with an inner periphery having substantially the same or slightly larger dimensions as the outer periphery of the array active portion.
  • the frame member covers the array inactive portion.
  • the shadow mask Prior to coating the active portion of the detector, the shadow mask is positioned over the detector array so that an inner periphery of the frame member is substantially aligned with an outer periphery of the array active portion.
  • the mask covers both the electrical contact portion and the area designated to receive the adhesive, i.e., the array inactive portion.
  • the mask and detector array assembly is then located in an evaporator, and CsI is deposited on the assembly.
  • An apparatus for depositing scintillator material on a detector array includes a cover mask configured to be positively positioned (also referred to as registered) on a detector array to ensure proper alignment of the mask with the array so that an entire active portion of the detector array may be coated with the scintillator material without having any scintillator material on the adhesive and electrical contact portion of the detector array.
  • a cover mask configured to be positively positioned (also referred to as registered) on a detector array to ensure proper alignment of the mask with the array so that an entire active portion of the detector array may be coated with the scintillator material without having any scintillator material on the adhesive and electrical contact portion of the detector array.
  • an adhesive or epoxy rim on the array and between the array active portion and the electrical conductors substantially prevents migration of scintillator material from the active portion to the electrical conductors.
  • the cover mask includes a mask and a clamp frame that is adapted to be coupled to a pallet.
  • the mask is substantially centered within the clamp frame and an inner periphery of the mask has substantially the same dimensions as the outer periphery of the detector array active portion.
  • the clamp frame and mask have precise alignment openings extending therethrough, and the alignment openings substantially align with pins on a pallet.
  • the pallet comprises a recess sized to match the dimensions of the active array and adhesive rim disposed on the substrate.
  • a method to deposit scintillator material on the detector array using a cover mask, the detector array including an active area includes the steps of forming an adhesive rim on the detector array; positioning the mask over the detector array so that the adhesive rim is at least partially positioned within the mask; and depositing the scintillator material on the array.
  • FIG. 1 is a perspective view of a detector array in one embodiment of the present invention.
  • FIG. 2 is an enlarged view of the portion of the detector array which is circumscribed by circle A in FIG. 1.
  • FIG. 3 is a perspective view of a clamp frame and shadow mask in accordance with one embodiment of the present invention.
  • FIG. 4 is an exploded view of the detector array shown in FIG. 1 and the shadow mask with clamp frame shown in FIG. 3 aligned with a pallet.
  • the present invention is described below in the context of an array panel for a solid state radiation imager (that is, the incident radiation is ultimately detected by solid state devices that generate an electrical signal representative of the radiation incident on the array).
  • the present invention can be utilized in connection with detectors utilized in a variety of applications, such as x-ray signal detection for computed tomography, radiography, fluoroscopy, or the like, for use in medical, research, or industrial applications.
  • the generation of high resolution, low noise images necessitates that the detector panels used in solid state radiation imagers be efficient collectors of the incident energy.
  • the detector panels thus are designed and fabricated to reduce to the extent appropriate potential sources of electrical noise that might be introduced in the detector panel itself or in connections between the panel and readout electronics. For this reason, the disposition of materials, such as scintillator material, over the detector array is critical to imager performance. Other components, such as a cover plate disposed over the detector panel, are similarly important to protect the panel and minimize external sources of electrical noise.
  • a shadow mask is used to facilitate coating the entire active portion of a detector array without coating the array inactive portion, i.e., the adhesive and electrical contact portion of the detector array.
  • a detector panel 50 includes a substrate 52 providing a surface on which an active array portion 54 and an inactive portion 56 are disposed.
  • Active array portion 54 includes a plurality of detector pixels used for generating electrical signals representative of a pattern of radiation incident on the detector.
  • the active area of the detector panel comprises a matrix arrangement of photosensor pixels, with each pixel comprising a photosensor, such as a photodiode, and a respective switching element, to couple the pixel to readout electronics located off of the panel.
  • Inactive portion 56 on the detector panel 50 comprises a plurality of electrical conductors that provide the electrical connection between address lines coupled to the active portion of the array and control and readout electronics located off of the panel 50.
  • Inactive portion 56 also includes a raised adhesive rim 58 which is disposed on detector array surface 52 so as to surround array active portion 54. More particularly, rim 58 extends from an interface 60 between active portion 54 and the electrical conductors, and thus serves to separate active portion 54 from the electrical conductors.
  • Adhesive rim 58 is bonded to substrate surface 52 to provide a seal to prevent leakage or migration of scintillator material being deposited from the active area of the array to the inactive area of the array.
  • Adhesive rim 58 is typically formed with a bead of glue or epoxy applied to substrate surface 52.
  • the bead of glue (or epoxy) commonly is applied with a computer controlled dispenser and planarized with a planarizing fixture and cured.
  • the applied adhesive is typically shaped to have dimensions of about 10 mils (0.010 inches or 0.254 mm) in height (above the panel surface on which it is disposed), with a flattened (planarized) top surface, and a width in the range between about 120 mils and about 150 mils (0.012 inches (0.254 mm) to 0.15 inches (0.305).
  • Rim 58 typically comprises a commercially available epoxy, such as Armstrong 661 type epoxy.
  • FIG. 2 is an enlarged view of a portion of detector panel 50 outlined by circle A in FIG. 3.
  • glue rim 58 surrounds detector array active portion 54 and has a planar upper surface 62 (typically flat within plus or minus 0.001" (0.025 mm)).
  • Rim 58 also includes substantially smooth side surfaces 64, that is the surfaces lack holes, bubbles, and other similar irregularities in surface texture.
  • a clamp frame and mask 66 in accordance with one embodiment of the present invention includes a clamp frame 68 and a mask 70.
  • Mask 70 is substantially centered within clamp frame 68 and an inner periphery 72 of plate 70 has substantially the same dimensions (that is, length and width) as the outer periphery of detector array active portion 54.
  • Clamp frame 68 and mask 70 have precise alignment openings 74 extending therethrough, and alignment openings 74 substantially align with pins on a pallet as described below in more detail.
  • Mask 70 typically is fabricated, for example, from aluminum, alloys coated with a nickel plating (e.g., iron-nickel-cobalt alloys referred to by the trade name of "Kovar"), or tetrafluroethylene (TFE, also known by the trade name Teflon).
  • Frame 68 and plate 70 can be integral (that is, formed of one piece of material), or alternatively, fabricated separately and assembled together.
  • mask 66 is aligned with detector array 50 so that mask plate inner periphery substantially aligns (that is, within about ⁇ 0.005" or 0.127 mm) with the outer periphery of array active portion 54 (e.g., as illustrated in FIG. 2).
  • Glue rim 58 is at least partially located (that is within ⁇ 0.030" or 0.762 mm) within mask 70.
  • Substrate 52 (with adhesive rim 58) disposed in the pallet pocket provides registration with mask and clamp frame assembly 66.
  • This positive alignment facilitates ensuring that mask 70 covers detector inactive portion 56 while exposing the active portion 54 so that scintillator material is deposited only over the active portion and is not deposited on the inactive portion 56. .
  • Detector array active portion 56 is not covered by mask 66.
  • carrier pallet 80 includes a pocket 82 which is sized so that when detector array 50 is positioned in pocket 82, detector array 50 is substantially flush (that is, about plus 0.003" (0.076 mm) and minus 0.00") with an upper surface 84 of carrier pallet 80.
  • the pocket also provides accurate registration (e.g., within ⁇ 0.005" (0.127 mm)) of array within the pocket in correspondence with the line of the adhesive rim.
  • a perimeter 86 of carrier pallet pocket 82 commonly is lined with a material 88 such as TFE (tradename of Teflon) to facilitate the CsI deposition by maintaining substrate position.
  • Pallet 80 also includes pins 90 which, when assembly 66 is aligned and positioned on pallet 80, extend through alignment openings 74 in assembly 66. Carrier pallet 80, assembly 66 and detector array 50 are then positioned in an evaporator and scintillator material (such as cesium iodide, selenium or the like is deposited on active portion 56.
  • scintillator material such as cesium iodide, selenium or the like is deposited on active portion 56.

Abstract

An apparatus to align the deposition of scintillator material on a radiation detector array includes a cover mask assembly configured to be positively positioned on a detector array and underlying pallet assembly to provide proper alignment of the mask with the array so that the active portion of the detector array may be coated with scintillator material without having the scintillator material on the adhesive and electrical contact portion of the detector array. An adhesive rim is disposed around the periphery of the active portion of the array and sized to provide the desired precise alignment of the mask over the detector array and form a seal with the array substrate and the pallet assembly to prevent migration of the scintillator material beyond the active area to be coated.

Description

BACKGROUND OF THE INVENTION
This invention relates generally to solid state radiation imagers, and more particularly to depositing scintillator material on x-ray detector arrays.
Solid state radiation imaging devices typically include an array of photosensors coupled to a scintillator. Radiation incident on the scintillator is absorbed, resulting in the generation of optical photons which, in turn, are detected by the photosensor array to generate a corresponding electrical signal. A key factor in imager performance relates to the effective disposition and coupling of the scintillator to the photosensor array.
A typical scintillator material in radiation imaging arrays is Cesium Iodide (CsI). The cesium iodide is disposed over the detector array the active portion of the detector array, that is, the area in which incident X-ray beams are absorbed and detected. A cover plate typically is located over the array electrical contact portion to prevent x-ray beams from impinging on electrical conductors outside of the active area of the array. The cover plate typically is secured to the detector array by an adhesive applied between the array active portion and the electrical contact portion.
If the electrical conductors are coated with CsI, such coating can adversely affect image generation. Particularly, the electrical characteristics of the conductors could be impacted by the coating, and the signals obtained from the coated conductors may not accurately represent the characteristics of an attenuated x-ray beam which impinges on the array active portion. In addition, if CsI is applied to the area of the detector array to receive the adhesive, i.e., at the interface between the active portion and the electrical conductors, such CsI can affect the integrity of the bond between the adhesive and the detector array.
In an attempt to apply the CsI coating to only the active portion of the detector array, shadow masks typically are used. The shadow mask is intended to facilitate coating the entire array active portion with CsI while simultaneously preventing any migration of CsI into the inactive portion of the array, i.e., the portion of the array to receive the adhesive and the electrical contact portion.
Shadow masks typically are frame-like members with an inner periphery having substantially the same or slightly larger dimensions as the outer periphery of the array active portion. The frame member covers the array inactive portion.
Prior to coating the active portion of the detector, the shadow mask is positioned over the detector array so that an inner periphery of the frame member is substantially aligned with an outer periphery of the array active portion. The mask covers both the electrical contact portion and the area designated to receive the adhesive, i.e., the array inactive portion. The mask and detector array assembly is then located in an evaporator, and CsI is deposited on the assembly.
Systems presently used provide no positive registration or positioning of the shadow mask on the array, and thus precise location of the mask is highly dependent upon the skill of the operator. Even when using the shadow mask, if the substrate is not precisely located, CsI may be deposited on the inactive portion of the detector array, e.g., the CsI may migrate into the inactive portion. Similarly, misalignment between the shadow mask and the array may result in a section of the detector array active portion not being coated with CsI, which also is undesirable.
It would be desirable to provide methods and apparatus for facilitating the deposition of CsI on only the active portion of a detector array and for preventing deposition of CsI on the array inactive portion. It also would be desirable for such methods and apparatus to be simple to implement and utilize.
BRIEF SUMMARY OF THE INVENTION
An apparatus for depositing scintillator material on a detector array includes a cover mask configured to be positively positioned (also referred to as registered) on a detector array to ensure proper alignment of the mask with the array so that an entire active portion of the detector array may be coated with the scintillator material without having any scintillator material on the adhesive and electrical contact portion of the detector array. In addition, an adhesive or epoxy rim on the array and between the array active portion and the electrical conductors substantially prevents migration of scintillator material from the active portion to the electrical conductors.
The cover mask includes a mask and a clamp frame that is adapted to be coupled to a pallet. The mask is substantially centered within the clamp frame and an inner periphery of the mask has substantially the same dimensions as the outer periphery of the detector array active portion. The clamp frame and mask have precise alignment openings extending therethrough, and the alignment openings substantially align with pins on a pallet. The pallet comprises a recess sized to match the dimensions of the active array and adhesive rim disposed on the substrate.
A method to deposit scintillator material on the detector array using a cover mask, the detector array including an active area, includes the steps of forming an adhesive rim on the detector array; positioning the mask over the detector array so that the adhesive rim is at least partially positioned within the mask; and depositing the scintillator material on the array.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a perspective view of a detector array in one embodiment of the present invention.
FIG. 2 is an enlarged view of the portion of the detector array which is circumscribed by circle A in FIG. 1.
FIG. 3 is a perspective view of a clamp frame and shadow mask in accordance with one embodiment of the present invention.
FIG. 4 is an exploded view of the detector array shown in FIG. 1 and the shadow mask with clamp frame shown in FIG. 3 aligned with a pallet.
DETAILED DESCRIPTION OF THE INVENTION
The present invention is described below in the context of an array panel for a solid state radiation imager (that is, the incident radiation is ultimately detected by solid state devices that generate an electrical signal representative of the radiation incident on the array). The present invention can be utilized in connection with detectors utilized in a variety of applications, such as x-ray signal detection for computed tomography, radiography, fluoroscopy, or the like, for use in medical, research, or industrial applications.
The generation of high resolution, low noise images necessitates that the detector panels used in solid state radiation imagers be efficient collectors of the incident energy. The detector panels thus are designed and fabricated to reduce to the extent appropriate potential sources of electrical noise that might be introduced in the detector panel itself or in connections between the panel and readout electronics. For this reason, the disposition of materials, such as scintillator material, over the detector array is critical to imager performance. Other components, such as a cover plate disposed over the detector panel, are similarly important to protect the panel and minimize external sources of electrical noise.
In one embodiment of the present invention, a shadow mask is used to facilitate coating the entire active portion of a detector array without coating the array inactive portion, i.e., the adhesive and electrical contact portion of the detector array. As illustrated in FIG. 1, a detector panel 50 includes a substrate 52 providing a surface on which an active array portion 54 and an inactive portion 56 are disposed. Active array portion 54 includes a plurality of detector pixels used for generating electrical signals representative of a pattern of radiation incident on the detector. Commonly the active area of the detector panel comprises a matrix arrangement of photosensor pixels, with each pixel comprising a photosensor, such as a photodiode, and a respective switching element, to couple the pixel to readout electronics located off of the panel.
Inactive portion 56 on the detector panel 50 comprises a plurality of electrical conductors that provide the electrical connection between address lines coupled to the active portion of the array and control and readout electronics located off of the panel 50. Inactive portion 56 also includes a raised adhesive rim 58 which is disposed on detector array surface 52 so as to surround array active portion 54. More particularly, rim 58 extends from an interface 60 between active portion 54 and the electrical conductors, and thus serves to separate active portion 54 from the electrical conductors. Adhesive rim 58 is bonded to substrate surface 52 to provide a seal to prevent leakage or migration of scintillator material being deposited from the active area of the array to the inactive area of the array.
Adhesive rim 58 is typically formed with a bead of glue or epoxy applied to substrate surface 52. The bead of glue (or epoxy) commonly is applied with a computer controlled dispenser and planarized with a planarizing fixture and cured. The applied adhesive is typically shaped to have dimensions of about 10 mils (0.010 inches or 0.254 mm) in height (above the panel surface on which it is disposed), with a flattened (planarized) top surface, and a width in the range between about 120 mils and about 150 mils (0.012 inches (0.254 mm) to 0.15 inches (0.305). Rim 58 typically comprises a commercially available epoxy, such as Armstrong 661 type epoxy.
FIG. 2 is an enlarged view of a portion of detector panel 50 outlined by circle A in FIG. 3. As shown in FIG. 4, glue rim 58 surrounds detector array active portion 54 and has a planar upper surface 62 (typically flat within plus or minus 0.001" (0.025 mm)). Rim 58 also includes substantially smooth side surfaces 64, that is the surfaces lack holes, bubbles, and other similar irregularities in surface texture.
As illustrated in FIG. 3, a clamp frame and mask 66 in accordance with one embodiment of the present invention includes a clamp frame 68 and a mask 70. Mask 70 is substantially centered within clamp frame 68 and an inner periphery 72 of plate 70 has substantially the same dimensions (that is, length and width) as the outer periphery of detector array active portion 54. Clamp frame 68 and mask 70 have precise alignment openings 74 extending therethrough, and alignment openings 74 substantially align with pins on a pallet as described below in more detail. Mask 70 typically is fabricated, for example, from aluminum, alloys coated with a nickel plating (e.g., iron-nickel-cobalt alloys referred to by the trade name of "Kovar"), or tetrafluroethylene (TFE, also known by the trade name Teflon). Frame 68 and plate 70 can be integral (that is, formed of one piece of material), or alternatively, fabricated separately and assembled together.
In preparation for deposition of scintillator material on detector array, mask 66 is aligned with detector array 50 so that mask plate inner periphery substantially aligns (that is, within about ±0.005" or 0.127 mm) with the outer periphery of array active portion 54 (e.g., as illustrated in FIG. 2). Glue rim 58 is at least partially located (that is within ±0.030" or 0.762 mm) within mask 70. Substrate 52 (with adhesive rim 58) disposed in the pallet pocket provides registration with mask and clamp frame assembly 66. This positive alignment facilitates ensuring that mask 70 covers detector inactive portion 56 while exposing the active portion 54 so that scintillator material is deposited only over the active portion and is not deposited on the inactive portion 56. . Detector array active portion 56 is not covered by mask 66.
Mask and clamp frame assembly 66 and detector array 50 are then secured to a carrier pallet 80. Particularly, carrier pallet 80 includes a pocket 82 which is sized so that when detector array 50 is positioned in pocket 82, detector array 50 is substantially flush (that is, about plus 0.003" (0.076 mm) and minus 0.00") with an upper surface 84 of carrier pallet 80. The pocket also provides accurate registration (e.g., within ±0.005" (0.127 mm)) of array within the pocket in correspondence with the line of the adhesive rim. A perimeter 86 of carrier pallet pocket 82 commonly is lined with a material 88 such as TFE (tradename of Teflon) to facilitate the CsI deposition by maintaining substrate position. Additionally, the flush fit between the pallet and the adhesive rim of the array provides a seal to prevent leakage of scintillator material being deposited on the active array to the inactive portion of the array. Pallet 80 also includes pins 90 which, when assembly 66 is aligned and positioned on pallet 80, extend through alignment openings 74 in assembly 66. Carrier pallet 80, assembly 66 and detector array 50 are then positioned in an evaporator and scintillator material (such as cesium iodide, selenium or the like is deposited on active portion 56.
Although the invention has been described and illustrated in detail, it is to be clearly understood that the same is intended by way of illustration and example only and is not to be taken by way of limitation. Accordingly, the spirit and scope of the invention are to be limited only by the terms of the appended claims.

Claims (13)

What is claimed is:
1. A method for depositing CsI on a detector array utilizing a cover mask, the detector array including an active portion and an inactive portion, and a pallet device having a recess therein, the method comprising the steps of:
forming an adhesive rim on the detector array;
positioning the cover mask assembly over the detector array so that the adhesive rim is aligned within the mask through registration with the pallet device; and
depositing scintillator material on the array.
2. A method in accordance with claim 1 wherein forming an adhesive rim on the detector array comprises the steps of applying a bead of adhesive to the array, shaping the rim, and curing the adhesive.
3. A method in accordance with claim 1 further comprising the step of securing the detector array and cover mask to said pallet device.
4. A method in accordance with claim 1 wherein said scintillator material consists of a material selected from the group consisting of cesium iodide and selenium.
5. An assembly for fabricating a solid state radiation detector comprising:
a detector array having an active portion and an inactive portion;
said array further comprising an adhesive rim disposed on said inactive portion of said array so as to surround said active portion of said array;
a cover mask assembly having a structure corresponding to the dimensions of said inactive portion of said array, and
a pallet assembly adapted to be coupled to said cover mask assembly and receive said array so that said array is aligned in said pallet in correspondence with said adhesive rim.
6. An assembly in accordance with claim 5 wherein said detector array active portion comprises a plurality of radiation detection pixels, and wherein said inactive portion comprises a plurality of electrical conductors electrically connected to respective pixels.
7. An assembly in accordance with claim 5 wherein said cover mask assembly comprises a clamp frame and a shadow mask, said mask being substantially centered within said clamp frame, an inner periphery of said mask having substantially the same dimensions as an outer periphery of said detector array active portion.
8. An assembly in accordance with claim 7 wherein said pallet assembly receives said array so as to accurately maintain the position said array in cooperation with said adhesive rim.
9. An assembly in accordance with claim 8 wherein said adhesive rim is at least partially located within said shadow mask.
10. An assembly in accordance with claim 8 wherein said the upper surface of said adhesive rim on said array is disposed to be substantially flush with an upper surface of said pallet assembly so as to form a seal to prevent leakage between said adhesive rim and said pallet assembly of scintillator material being deposited over said array.
11. An assembly in accordance with claim 5 wherein said pallet assembly comprises a plurality of alignment pins, and said cover mask comprises a plurality of alignment openings, said alignment pins extending into said alignment openings.
12. An assembly in accordance with claim 5 wherein said cover mask consists of a material selected from the group consisting of aluminum and metal alloy material.
13. An assembly in accordance with claim 5 wherein said adhesive rim is bonded to a substrate surface on which said array is disposed so as to provide a seal to prevent leakage between said adhesive rim and said substrate of scintillator material being deposited over said array.
US09/195,656 1998-11-19 1998-11-19 Method and apparatus for depositing scintillator material on radiation imager Expired - Fee Related US6146489A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US09/195,656 US6146489A (en) 1998-11-19 1998-11-19 Method and apparatus for depositing scintillator material on radiation imager
CA002288468A CA2288468C (en) 1998-11-19 1999-11-04 Methods and apparatus for depositing scintillator material on radiation imager
JP11321869A JP2000180556A (en) 1998-11-19 1999-11-12 Method and device for depositing scintillator material on detector array
DE69927228T DE69927228T2 (en) 1998-11-19 1999-11-19 Method and apparatus for applying a scintillation material to a radiation imaging device
EP99309232A EP1003226B1 (en) 1998-11-19 1999-11-19 Methods and assembly for depositing scintillator material on radiation imager

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US09/195,656 US6146489A (en) 1998-11-19 1998-11-19 Method and apparatus for depositing scintillator material on radiation imager

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Cited By (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368897B1 (en) 1997-09-23 2002-04-09 Micron Technology, Inc. Method for manufactoring and using stencil/screen
US6475287B1 (en) * 2001-06-27 2002-11-05 Eastman Kodak Company Alignment device which facilitates deposition of organic material through a deposition mask
US6541774B1 (en) * 2000-11-03 2003-04-01 General Electric Company Radiation imager cover
US20030101932A1 (en) * 2001-12-05 2003-06-05 Samsung Nec Mobile Display Co., Ltd. Tension mask assembly for use in vacuum deposition of thin film of organic electroluminescent device
US20030108805A1 (en) * 2001-12-10 2003-06-12 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing oled devices
US6589382B2 (en) * 2001-11-26 2003-07-08 Eastman Kodak Company Aligning mask segments to provide a stitched mask for producing OLED devices
US6642524B2 (en) * 2002-01-09 2003-11-04 Ge Medical Systems Global Technology Company, Llc Scintillator sealing for solid state X-ray detector
US6645299B2 (en) * 2001-09-18 2003-11-11 General Electric Company Method and assembly for masking
US6657201B2 (en) * 2001-06-29 2003-12-02 General Electric Company Cover plate having spacer lip with hermetic barrier for radiation imager and method of manufacturing same
US6720561B2 (en) 2001-12-06 2004-04-13 General Electric Company Direct CsI scintillator coating for improved digital X-ray detector assembly longevity
US6739751B2 (en) 2001-04-10 2004-05-25 Ge Medical Systems Global Technology Company, Llc X-ray system alignment method and apparatus
US20040123799A1 (en) * 2002-12-31 2004-07-01 Eastman Kodak Company Flexible frame for mounting a deposition mask
US6770885B2 (en) 2001-08-29 2004-08-03 General Electric Company Systems and methods for detecting ionizing radiation with an imaging system
US20040202821A1 (en) * 2003-03-27 2004-10-14 Samsung Sdi Co., Ltd. Deposition mask for display device and method for fabricating the same
US6805780B1 (en) * 1999-04-06 2004-10-19 Allmedicus Co., Ltd. Electrochemical biosensor test strip, fabrication method thereof and electrochemical biosensor
US6866720B2 (en) * 2000-11-28 2005-03-15 Lg Electronics Inc. Mask for fabricating display panel
US20060033031A1 (en) * 2004-08-10 2006-02-16 Canon Kabushiki Kaisha Radiation detecting apparatus, producing method therefor and radiation image pickup system
US7053381B2 (en) 2001-12-06 2006-05-30 General Electric Company Dual para-xylylene layers for an X-ray detector
US20070096041A1 (en) * 2004-03-31 2007-05-03 Fuji Photo Film Co., Ltd. Stimulable phosphor panel and method of producing stimulable phosphor panel
US20070298433A1 (en) * 2003-12-31 2007-12-27 President And Fellows Of Harvard College Assay Device and Method
US20080038839A1 (en) * 2004-01-26 2008-02-14 Vincent Linder Fluid Delivery System And Method
US20080121808A1 (en) * 2006-11-24 2008-05-29 Tower Semiconductor Ltd. High Resolution Integrated X-Ray CMOS Image Sensor
US20080273918A1 (en) * 2007-05-04 2008-11-06 Claros Diagnostics, Inc. Fluidic connectors and microfluidic systems
CN100464440C (en) * 2002-06-03 2009-02-25 三星移动显示器株式会社 Mask frame assembly of thin layer vacuum evaporation for organic electroluminescent device
US20090266421A1 (en) * 2008-04-25 2009-10-29 Claros Diagnostics, Inc. Flow control in microfluidic systems
US20110120562A1 (en) * 2009-11-24 2011-05-26 Claros Diagnostics, Inc. Fluid mixing and delivery in microfluidic systems
USD645971S1 (en) 2010-05-11 2011-09-27 Claros Diagnostics, Inc. Sample cassette
US8221700B2 (en) 2009-02-02 2012-07-17 Opko Diagnostics, Llc Structures for controlling light interaction with microfluidic devices
US20120211162A1 (en) * 2008-07-14 2012-08-23 International Business Machines Corporation Transmission electron microscopy sample etching fixture
CN102683618A (en) * 2011-03-15 2012-09-19 三星移动显示器株式会社 Deposition mask
US8389272B2 (en) 2004-01-26 2013-03-05 President And Fellows Of Harvard College Fluid delivery system and method
US8501416B2 (en) 2005-04-19 2013-08-06 President And Fellows Of Harvard College Fluidic structures including meandering and wide channels
US20130276978A1 (en) * 2012-04-19 2013-10-24 Intevac, Inc. Dual-mask arrangement for solar cell fabrication
US8580569B2 (en) 2010-04-16 2013-11-12 Opko Diagnostics, Llc Feedback control in microfluidic systems
US8591829B2 (en) 2008-12-18 2013-11-26 Opko Diagnostics, Llc Reagent storage in microfluidic systems and related articles and methods
US20140284486A1 (en) * 2013-03-19 2014-09-25 Canon Kabushiki Kaisha Radiation detecting apparatus and radiation detecting system
US9255866B2 (en) 2013-03-13 2016-02-09 Opko Diagnostics, Llc Mixing of fluids in fluidic systems
US9502276B2 (en) 2012-04-26 2016-11-22 Intevac, Inc. System architecture for vacuum processing
US9543114B2 (en) 2014-08-05 2017-01-10 Intevac, Inc. Implant masking and alignment system with rollers
US20170023682A1 (en) * 2015-07-23 2017-01-26 General Electric Company X-ray detector with directly applied scintillator
US20170062258A1 (en) * 2012-04-19 2017-03-02 Intevac, Inc. Wafer plate and mask arrangement for substrate fabrication
USD804682S1 (en) 2015-08-10 2017-12-05 Opko Diagnostics, Llc Multi-layered sample cassette
KR101821339B1 (en) 2012-12-13 2018-01-23 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. Mask alignment system and mask alignment method
KR101847394B1 (en) 2013-07-26 2018-04-10 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. A system and method for aligning a plurality of masks to a plauality of workpieces
US20180220684A1 (en) * 2014-09-19 2018-08-09 Ginny McCormick Stencil holder apparatus and method
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
US10279345B2 (en) 2014-12-12 2019-05-07 Opko Diagnostics, Llc Fluidic systems comprising an incubation channel, including fluidic systems formed by molding
US10672503B2 (en) 2012-03-05 2020-06-02 Opko Diagnostics, Llc Methods and apparatuses for conducting analyses
US10852310B2 (en) 2015-12-11 2020-12-01 Opko Diagnostics, Llc Fluidic systems involving incubation of samples and/or reagents

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4398065B2 (en) * 2000-05-19 2010-01-13 浜松ホトニクス株式会社 Radiation detector
KR100708654B1 (en) * 2004-11-18 2007-04-18 삼성에스디아이 주식회사 Mask assembly and mask frame assembly using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
EP0637084A1 (en) * 1993-07-29 1995-02-01 General Electric Company Solid state radiation imager having a barrier layer
FR2758630A1 (en) * 1997-01-21 1998-07-24 Thomson Tubes Electroniques METHOD OF SEALING A SOLID STATE RADIATION DETECTOR AND DETECTOR OBTAINED BY THIS METHOD

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09297181A (en) * 1996-05-07 1997-11-18 Canon Inc Radiation image pick-up device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
EP0637084A1 (en) * 1993-07-29 1995-02-01 General Electric Company Solid state radiation imager having a barrier layer
FR2758630A1 (en) * 1997-01-21 1998-07-24 Thomson Tubes Electroniques METHOD OF SEALING A SOLID STATE RADIATION DETECTOR AND DETECTOR OBTAINED BY THIS METHOD

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
European Search Report. *
Patent Abstracts of Japan, 09297181, Nov. 18, 1997, Toshikazu. *

Cited By (124)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6669781B2 (en) 1997-09-23 2003-12-30 Micron Technology, Inc. Method and apparatus for improving stencil/screen print quality
US20040107902A1 (en) * 1997-09-23 2004-06-10 Micron Technology, Inc. Stencil/screen print apparatus
US6521287B2 (en) * 1997-09-23 2003-02-18 Micron Technology, Inc. Method for manufacturing improved stencil/screen
US20040089171A1 (en) * 1997-09-23 2004-05-13 Micron Technology, Inc. Apparatus for improving stencil/screen print quality
US7476277B2 (en) 1997-09-23 2009-01-13 Micron Technology, Inc. Apparatus for improving stencil/screen print quality
US20050145169A1 (en) * 1997-09-23 2005-07-07 Micron Technology, Inc. Apparatus for improving stencil/screen print quality
US6599365B1 (en) 1997-09-23 2003-07-29 Micron Technology, Inc. Apparatus for improving stencil/screen print quality
US6607599B1 (en) 1997-09-23 2003-08-19 Micron Technology, Inc. Apparatus for improving stencil/screen print quality
US6641669B1 (en) 1997-09-23 2003-11-04 Micron Technology, Inc. Method and apparatus for improving stencil/screen print quality
US6368897B1 (en) 1997-09-23 2002-04-09 Micron Technology, Inc. Method for manufactoring and using stencil/screen
US6805780B1 (en) * 1999-04-06 2004-10-19 Allmedicus Co., Ltd. Electrochemical biosensor test strip, fabrication method thereof and electrochemical biosensor
US6541774B1 (en) * 2000-11-03 2003-04-01 General Electric Company Radiation imager cover
US6866720B2 (en) * 2000-11-28 2005-03-15 Lg Electronics Inc. Mask for fabricating display panel
US6739751B2 (en) 2001-04-10 2004-05-25 Ge Medical Systems Global Technology Company, Llc X-ray system alignment method and apparatus
US6475287B1 (en) * 2001-06-27 2002-11-05 Eastman Kodak Company Alignment device which facilitates deposition of organic material through a deposition mask
US6657201B2 (en) * 2001-06-29 2003-12-02 General Electric Company Cover plate having spacer lip with hermetic barrier for radiation imager and method of manufacturing same
US6770885B2 (en) 2001-08-29 2004-08-03 General Electric Company Systems and methods for detecting ionizing radiation with an imaging system
US6645299B2 (en) * 2001-09-18 2003-11-11 General Electric Company Method and assembly for masking
US6589382B2 (en) * 2001-11-26 2003-07-08 Eastman Kodak Company Aligning mask segments to provide a stitched mask for producing OLED devices
CN1312782C (en) * 2001-11-26 2007-04-25 伊斯曼柯达公司 Position mask part of combine mask provided for producing organic luminous diode
KR100870799B1 (en) * 2001-11-26 2008-11-27 이스트맨 코닥 캄파니 Aligning mask segments to provide a stitched mask for producing oled devices
US6858086B2 (en) * 2001-12-05 2005-02-22 Samsung Oled Co., Ltd. Tension mask assembly for use in vacuum deposition of thin film of organic electroluminescent device
US20030101932A1 (en) * 2001-12-05 2003-06-05 Samsung Nec Mobile Display Co., Ltd. Tension mask assembly for use in vacuum deposition of thin film of organic electroluminescent device
US7053381B2 (en) 2001-12-06 2006-05-30 General Electric Company Dual para-xylylene layers for an X-ray detector
US6720561B2 (en) 2001-12-06 2004-04-13 General Electric Company Direct CsI scintillator coating for improved digital X-ray detector assembly longevity
US6749690B2 (en) * 2001-12-10 2004-06-15 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing OLED devices
US20030108805A1 (en) * 2001-12-10 2003-06-12 Eastman Kodak Company Aligning mask segments to provide an assembled mask for producing oled devices
US6642524B2 (en) * 2002-01-09 2003-11-04 Ge Medical Systems Global Technology Company, Llc Scintillator sealing for solid state X-ray detector
CN100464440C (en) * 2002-06-03 2009-02-25 三星移动显示器株式会社 Mask frame assembly of thin layer vacuum evaporation for organic electroluminescent device
US6926840B2 (en) * 2002-12-31 2005-08-09 Eastman Kodak Company Flexible frame for mounting a deposition mask
US20040123799A1 (en) * 2002-12-31 2004-07-01 Eastman Kodak Company Flexible frame for mounting a deposition mask
US20040202821A1 (en) * 2003-03-27 2004-10-14 Samsung Sdi Co., Ltd. Deposition mask for display device and method for fabricating the same
US8273179B2 (en) * 2003-03-27 2012-09-25 Samsung Mobile Display Co., Ltd. Deposition mask for display device and method for fabricating the same
US8574924B2 (en) 2003-12-31 2013-11-05 President And Fellows Of Harvard College Assay device and method
US20070298433A1 (en) * 2003-12-31 2007-12-27 President And Fellows Of Harvard College Assay Device and Method
US10082507B2 (en) 2003-12-31 2018-09-25 President And Fellows Of Harvard College Assay device and method
US20100279310A1 (en) * 2003-12-31 2010-11-04 President And Fellows Of Harvard College Assay device and method
US7736890B2 (en) 2003-12-31 2010-06-15 President And Fellows Of Harvard College Assay device and method
US20080038839A1 (en) * 2004-01-26 2008-02-14 Vincent Linder Fluid Delivery System And Method
US10048252B2 (en) 2004-01-26 2018-08-14 President And Fellows Of Harvard College Fluid delivery system and method
US9116148B2 (en) 2004-01-26 2015-08-25 President And Fellows Of Harvard College Fluid delivery system and method
US8030057B2 (en) 2004-01-26 2011-10-04 President And Fellows Of Harvard College Fluid delivery system and method
US8389272B2 (en) 2004-01-26 2013-03-05 President And Fellows Of Harvard College Fluid delivery system and method
US20070096041A1 (en) * 2004-03-31 2007-05-03 Fuji Photo Film Co., Ltd. Stimulable phosphor panel and method of producing stimulable phosphor panel
US20060033031A1 (en) * 2004-08-10 2006-02-16 Canon Kabushiki Kaisha Radiation detecting apparatus, producing method therefor and radiation image pickup system
US7391029B2 (en) * 2004-08-10 2008-06-24 Canon Kabushiki Kaisha Radiation detecting apparatus, producing method therefor and radiation image pickup system
US9683993B2 (en) 2005-04-19 2017-06-20 President And Fellows Of Harvard College Fluidic structures including meandering and wide channels
US8501416B2 (en) 2005-04-19 2013-08-06 President And Fellows Of Harvard College Fluidic structures including meandering and wide channels
US7608837B2 (en) 2006-11-24 2009-10-27 Tower Semiconductor Ltd. High resolution integrated X-ray CMOS image sensor
US8501573B2 (en) 2006-11-24 2013-08-06 Tower Semiconductor Ltd. High-resolution integrated X-ray CMOS image sensor
US20080121808A1 (en) * 2006-11-24 2008-05-29 Tower Semiconductor Ltd. High Resolution Integrated X-Ray CMOS Image Sensor
US8202492B2 (en) 2007-05-04 2012-06-19 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US10775369B2 (en) 2007-05-04 2020-09-15 Opko Diagnostics, Llc Fluidic systems for analyses
US8802445B2 (en) 2007-05-04 2014-08-12 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US8409527B2 (en) 2007-05-04 2013-04-02 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US8475737B2 (en) 2007-05-04 2013-07-02 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US20080273918A1 (en) * 2007-05-04 2008-11-06 Claros Diagnostics, Inc. Fluidic connectors and microfluidic systems
US9234888B2 (en) 2007-05-04 2016-01-12 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US9075047B2 (en) 2007-05-04 2015-07-07 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US10408824B2 (en) 2007-05-04 2019-09-10 Opko Diagnostics, Llc Fluidic connectors and microfluidic systems
US9592505B2 (en) 2008-04-25 2017-03-14 Opko Diagnostics, Llc Flow control in microfluidic systems
US8222049B2 (en) 2008-04-25 2012-07-17 Opko Diagnostics, Llc Flow control in microfluidic systems
US10159978B2 (en) 2008-04-25 2018-12-25 Opko Diagnostics, Llc Flow control in microfluidic systems
US9849455B2 (en) 2008-04-25 2017-12-26 Opko Diagnostics, Llc Flow control in microfluidic systems
US20090266421A1 (en) * 2008-04-25 2009-10-29 Claros Diagnostics, Inc. Flow control in microfluidic systems
US8591697B2 (en) * 2008-07-14 2013-11-26 International Business Machines Corporation Transmission electron microscopy sample etching fixture
US20120211162A1 (en) * 2008-07-14 2012-08-23 International Business Machines Corporation Transmission electron microscopy sample etching fixture
US8591829B2 (en) 2008-12-18 2013-11-26 Opko Diagnostics, Llc Reagent storage in microfluidic systems and related articles and methods
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US9561506B2 (en) 2008-12-18 2017-02-07 Opko Diagnostics, Llc Reagent storage in microfluidic systems and related articles and methods
US9878324B2 (en) 2008-12-18 2018-01-30 Opko Diagnostics, Llc Reagent storage in microfluidic systems and related articles and methods
US8221700B2 (en) 2009-02-02 2012-07-17 Opko Diagnostics, Llc Structures for controlling light interaction with microfluidic devices
US8480975B2 (en) 2009-02-02 2013-07-09 Opko Diagnostics, Llc Structures for controlling light interaction with microfluidic devices
US8802029B2 (en) 2009-02-02 2014-08-12 Opko Diagnostics, Llc Structures for controlling light interaction with microfluidic devices
US9827563B2 (en) 2009-02-02 2017-11-28 Opko Diagnostics, Llc Fluidic systems and methods for analyses
US9827564B2 (en) 2009-02-02 2017-11-28 Opko Diagnostics, Llc Fluidic systems and methods for analyses
US9770715B2 (en) 2009-02-02 2017-09-26 Opko Diagnostics, Llc Structures for controlling light interaction with microfluidic devices
US10413899B2 (en) 2009-11-24 2019-09-17 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US9075051B2 (en) 2009-11-24 2015-07-07 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US9731291B2 (en) 2009-11-24 2017-08-15 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US10953398B2 (en) 2009-11-24 2021-03-23 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US8567425B2 (en) 2009-11-24 2013-10-29 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US20110120562A1 (en) * 2009-11-24 2011-05-26 Claros Diagnostics, Inc. Fluid mixing and delivery in microfluidic systems
US9861980B2 (en) 2009-11-24 2018-01-09 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US9555408B2 (en) 2009-11-24 2017-01-31 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US8915259B2 (en) 2009-11-24 2014-12-23 Opko Diagnostics, Llc Fluid mixing and delivery in microfluidic systems
US9116124B2 (en) 2010-04-16 2015-08-25 Opko Diagnostics, Llc Feedback control in microfluidic systems
US11458473B2 (en) 2010-04-16 2022-10-04 Opko Diagnostics, Llc Systems and devices for analysis of samples
US9981266B2 (en) 2010-04-16 2018-05-29 Opko Diagnostics, Llc Feedback control in microfluidic systems
US9643182B2 (en) 2010-04-16 2017-05-09 Opko Diagnostics, Llc Systems and devices for analysis of samples
US9682376B2 (en) 2010-04-16 2017-06-20 Opko Diagnostics, Llc Systems and devices for analysis of samples
US10456784B2 (en) 2010-04-16 2019-10-29 Opko Diagnostics, Llc Systems and devices for analysis of samples
US8580569B2 (en) 2010-04-16 2013-11-12 Opko Diagnostics, Llc Feedback control in microfluidic systems
US8765062B2 (en) 2010-04-16 2014-07-01 Opko Diagnostics, Llc Systems and devices for analysis of samples
US8932523B2 (en) 2010-04-16 2015-01-13 Opko Diagnostics, Llc Systems and devices for analysis of samples
USD645971S1 (en) 2010-05-11 2011-09-27 Claros Diagnostics, Inc. Sample cassette
CN102683618B (en) * 2011-03-15 2016-08-03 三星显示有限公司 Deposition mas
US9045820B2 (en) * 2011-03-15 2015-06-02 Samsung Display Co., Ltd. Deposition mask
CN102683618A (en) * 2011-03-15 2012-09-19 三星移动显示器株式会社 Deposition mask
US20120234235A1 (en) * 2011-03-15 2012-09-20 Samsung Mobile Display Co., Ltd. Deposition Mask
US10672503B2 (en) 2012-03-05 2020-06-02 Opko Diagnostics, Llc Methods and apparatuses for conducting analyses
US10679883B2 (en) * 2012-04-19 2020-06-09 Intevac, Inc. Wafer plate and mask arrangement for substrate fabrication
US20170062258A1 (en) * 2012-04-19 2017-03-02 Intevac, Inc. Wafer plate and mask arrangement for substrate fabrication
US20130276978A1 (en) * 2012-04-19 2013-10-24 Intevac, Inc. Dual-mask arrangement for solar cell fabrication
US9525099B2 (en) * 2012-04-19 2016-12-20 Intevac, Inc. Dual-mask arrangement for solar cell fabrication
US9502276B2 (en) 2012-04-26 2016-11-22 Intevac, Inc. System architecture for vacuum processing
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
KR101821339B1 (en) 2012-12-13 2018-01-23 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. Mask alignment system and mask alignment method
US10684201B2 (en) 2013-03-13 2020-06-16 Opko Diagnostics, Llc Mixing of fluids in fluidic systems
US9255866B2 (en) 2013-03-13 2016-02-09 Opko Diagnostics, Llc Mixing of fluids in fluidic systems
US9588027B2 (en) 2013-03-13 2017-03-07 UPKO Diagnostics, LLC Mixing of fluids in fluidic systems
US20140284486A1 (en) * 2013-03-19 2014-09-25 Canon Kabushiki Kaisha Radiation detecting apparatus and radiation detecting system
US9366767B2 (en) * 2013-03-19 2016-06-14 Canon Kabushiki Kaisha Radiation detecting apparatus and radiation detecting system
KR101847394B1 (en) 2013-07-26 2018-04-10 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. A system and method for aligning a plurality of masks to a plauality of workpieces
US9543114B2 (en) 2014-08-05 2017-01-10 Intevac, Inc. Implant masking and alignment system with rollers
US10383350B2 (en) * 2014-09-19 2019-08-20 Ginny McCormick Stencil holder apparatus and method
US20180220684A1 (en) * 2014-09-19 2018-08-09 Ginny McCormick Stencil holder apparatus and method
US10279345B2 (en) 2014-12-12 2019-05-07 Opko Diagnostics, Llc Fluidic systems comprising an incubation channel, including fluidic systems formed by molding
US11253853B2 (en) 2014-12-12 2022-02-22 Opko Diagnostics, Llc Fluidic systems comprising an incubation channel, including fluidic systems formed by molding
US10036814B2 (en) * 2015-07-23 2018-07-31 General Electric Company X-ray detector with directly applied scintillator
US20170023682A1 (en) * 2015-07-23 2017-01-26 General Electric Company X-ray detector with directly applied scintillator
USD817511S1 (en) 2015-08-10 2018-05-08 Opko Diagnostics, Llc Multi-layered sample cassette
USD804682S1 (en) 2015-08-10 2017-12-05 Opko Diagnostics, Llc Multi-layered sample cassette
US10852310B2 (en) 2015-12-11 2020-12-01 Opko Diagnostics, Llc Fluidic systems involving incubation of samples and/or reagents

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DE69927228D1 (en) 2005-10-20
CA2288468A1 (en) 2000-05-19
DE69927228T2 (en) 2006-06-29
EP1003226A3 (en) 2000-06-07

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