Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUS5861337 A
Publication typeGrant
Application numberUS 08/460,688
Publication date19 Jan 1999
Filing date2 Jun 1995
Priority date28 May 1991
Fee statusPaid
Also published asUS5578520, US6174374, US6494162, US6770143, US20030015133
Publication number08460688, 460688, US 5861337 A, US 5861337A, US-A-5861337, US5861337 A, US5861337A
InventorsHongyong Zhang, Naoto Kusumoto
Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Method for annealing a semiconductor
US 5861337 A
Abstract
A method for manufacturing a semiconductor device including preparing a multi-chamber system having at least first and second chambers, the first chamber for forming a film and the second chamber for processing an object with a laser light; processing a substrate in one of the first and second chambers; transferring the substrate to the other one of the first and second chambers; and processing the substrate in the other one of the chambers, wherein the first and second chambers can be isolated from one another by using a gate valve.
Images(4)
Previous page
Next page
Claims(57)
What is claimed is:
1. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
forming a semiconductor film comprising silicon over a substrate;
irradiating said semiconductor film with a laser light,
wherein the semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1 after the irradiation.
2. A method according to claim 1 wherein the laser light is an excimer laser light.
3. A method according to claim 1 wherein said semiconductor film is amorphous before the irradiation of said laser light.
4. A method according to claim 1 wherein said semiconductor film is formed by a method selected from the group consisting of plasma CVD, thermal CVD and sputtering.
5. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
forming a semiconductor film comprising silicon over a glass substrate;
heating said semiconductor film at such a low temperature that said semiconductor film can not be crystallized;
after the heating, crystallizing said semiconductor film by irradiating said semiconductor film with a laser light,
wherein the crystallized semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1.
6. A method according to claim 5 wherein said laser light is a KrF excimer laser light and has a wavelength of 248 nm.
7. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
forming a semiconductor film comprising silicon over a glass substrate;
heating said semiconductor film in order to generate dangling bonds of silicon within said semiconductor film;
after the heating, crystallizing said semiconductor film by irradiating said semiconductor film with a laser light,
wherein the crystallized semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1.
8. A method according to claim 7 wherein said laser light is a KrF excimer laser light and has a wavelength of 248 nm.
9. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
forming a semiconductor film comprising silicon over a glass substrate;
heating said semiconductor film by an infrared lamp in order to remove hydrogen from said semiconductor film;
after the heating, crystallizing said semiconductor film by irradiating said semiconductor film with a laser light,
wherein the crystallized semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1.
10. A method according to claim 9 wherein said laser light is a KrF excimer laser light and has a wavelength of 248 nm.
11. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
depositing a semiconductor film comprising silicon over a glass substrate, wherein hydrogen is contained in said semiconductor film;
heating said semiconductor film in order to remove said hydrogen from the semiconductor film;
preparing a laser beam having a rectangular cross section elongated in a first direction along an edge of said glass substrate;
scanning an entire region of the semiconductor film with said laser beam by moving a relative location of said substrate with respect to said laser beam in a second direction vertical to said first direction, thereby crystallizing said semiconductor film.
12. A method according to claim 11 wherein said laser beam is an excimer laser beam.
13. A method according to claim 11 wherein an insulating film comprising silicon oxide is interposed between said glass substrate and said semiconductor film.
14. A method according to claim 11 wherein said laser beam is irradiated with said substrate at a room temperature.
15. A method according to claim 11 wherein said laser beam is irradiated with said substrate at an elevated temperature.
16. A method according to claim 11 wherein a length of the cross section of said laser beam corresponds to the one edge of said substrate.
17. A method according to claim 11 wherein said semiconductor film is amorphous as deposited over said glass substrate.
18. A method according to claim 11 wherein the crystallized semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1.
19. A method according to claim 11 wherein said laser beam is a KrF excimer laser beam and a wavelength thereof is 248 nm.
20. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
depositing a semiconductor film comprising silicon over a glass substrate, wherein hydrogen is contained in said semiconductor film;
heating said semiconductor film to an elevated temperature in order to remove the hydrogen from the semiconductor film;
preparing a laser beam having a rectangular cross section elongated in a first direction along an edge of said glass substrate;
scanning an entire region of the semiconductor film with said laser beam by moving a relative location of said substrate with respect to said laser beam in a second direction vertical to said first direction, thereby crystallizing said semiconductor film,
wherein the irradiation of said semiconductor film is conducted while maintaining the substrate at the elevated temperature.
21. A method according to claim 20 wherein said laser beam is an excimer laser beam.
22. A method according to claim 20 wherein an insulating film comprising silicon oxide is interposed between said glass substrate and said semiconductor film.
23. A method according to claim 20 wherein said laser beam is irradiated with said substrate at a room temperature.
24. A method according to claim 20 wherein said laser beam is irradiated with said substrate at an elevated temperature.
25. A method according to claim 20 wherein a length of the cross section of said laser beam corresponds to the one edge of said substrate.
26. A method according to claim 20 wherein said semiconductor film is amorphous as deposited over said glass substrate.
27. A method according to claim 20 wherein the crystallized semiconductor film exhibits a Raman shift in the vicinity of 515 cm-1.
28. A method according to claim 20 wherein said laser beam is a KrF excimer laser beam and a wavelength thereof is 248 nm.
29. A method of manufacturing a semiconductor film for a thin film transistor comprising the steps of:
forming a semiconductor film comprising silicon over a glass substrate;
preparing a laser beam having a rectangular cross section elongated in a first direction along an edge of said glass substrate;
scanning an entire region of the semiconductor film with said laser beam by moving a relative location of said substrate with respect to said laser beam in a second direction vertical to said first direction, thereby crystallizing said semiconductor film.
30. A method according to claim 29 wherein said laser beam is an excimer laser beam.
31. A method according to claim 29 wherein an insulating film comprising silicon oxide is interposed between said glass substrate and said semiconductor film.
32. A method according to claim 29 wherein said laser beam is irradiated with said substrate at a room temperature.
33. A method according to claim 29 wherein said laser beam is irradiated with said substrate at an elevated temperature.
34. A method according to claim 29 wherein a length of the cross section of said laser beam corresponds to the one edge of said substrate.
35. A method according to claim 29 wherein said laser beam is a KrF excimer laser beam and a wavelength thereof is 248 nm.
36. A method for forming a crystalline semiconductor comprising the steps of:
forming an amorphous semiconductor;
heat treating said amorphous semiconductor by using an infrared lamp in order to form dangling bonds in said amorphous semiconductor at a sufficiently low temperature not to initiate a crystallization of said amorphous semiconductor; and then
crystallizing said amorphous semiconductor by using a light after heat treating.
37. A method for forming a crystalline semiconductor comprising the steps of:
forming an amorphous semiconductor;
heat treating said amorphous semiconductor by an infrared lamp at a temperature not higher than a crystalline temperature of said amorphous semiconductor; and then
excimer laser crystallizing said amorphous semiconductor after heat treating.
38. A method for forming a crystalline semiconductor comprising the steps of:
thermally annealing an amorphous semiconductor by using an infrared lamp in vacuum or inactive atmosphere in a first chamber at a temperature not higher than a crystallization temperature of said amorphous semiconductor in order to discharge hydrogen contained in said amorphous semiconductor;
transferring said amorphous semiconductor from said first chamber to a second chamber connected to said first chamber without exposing said amorphous semiconductor to an air; and then
irradiating said amorphous semiconductor with a linear excimer laser in a vacuum or inactive atmosphere in said second chamber to crystallize said amorphous semiconductor.
39. The method of claim 38 wherein said laser light is an excimer laser light.
40. The method of claim 38 wherein said inactive atmosphere of said thermally annealing step comprises N2.
41. A method for forming a crystalline semiconductor comprising the steps of:
forming an amorphous semiconductor film on a substrate;
heat treating said amorphous semiconductor film by using an infrared lamp at a temperature not higher than a crystallization temperature of said amorphous semiconductor film in order to discharge hydrogen contained in said amorphous semiconductor film; and then
scanning said amorphous semiconductor film with a light after heat treating said amorphous semiconductor film to crystallize said amorphous semiconductor,
wherein said light is elongated at said semiconductor film in a direction vertical to a direction in which said semiconductor film is scanned.
42. The method of claim 41 wherein said light is an excimer laser light.
43. The method of claim 41 wherein the step of heat treating said amorphous semiconductor is performed in a vacuum or in an inactive atmosphere.
44. The method of claim 41 wherein said inactive atmosphere of said heating treating step comprises N2.
45. The method of claim 41 wherein said amorphous semiconductor is formed by a CVD method.
46. The method of claim 41 wherein said amorphous semiconductor is formed by sputtering.
47. A method for manufacturing a semiconductor device comprising the steps of:
preparing a multi-chamber system having at least first and second and third chambers, said first chamber for forming a film and said second chamber for discharging hydrogen contained in said film and said third chamber for processing an object with a laser light;
processing a substrate in said first chamber to deposit a silicon semiconductor film thereon;
transferring said substrate to said second chamber without exposing said substrate to the air, after depositing said semiconductor film;
processing said substrate in said second chamber to discharge hydrogen contained in said semiconductor film by utilizing an infrared lamp;
transferring said substrate to said third chamber without exposing said substrate to the air, after discharging hydrogen contained in said semiconductor film;
processing said substrate in said third chamber to crystallize said semiconductor film by a linear laser light,
wherein said first and second and third chambers can be isolated from one another by using a gate valve,
wherein said laser light is elongated in one direction on said substrate and an entire surface of said substrate is irradiated with said laser light by moving said substrate in a direction vertical to said one direction, and
wherein said substrate is transferred from said first chamber to the second chamber through a common chamber provided to said multi-chamber system.
48. The method of claim 47 wherein said amorphous silicon semiconductor film is deposited by a plasma CVD method.
49. The method of claim 47 wherein said amorphous silicon semiconductor film is deposited by a sputtering method.
50. The method of claim 47 wherein said amorphous silicon semiconductor film is deposited by a thermal CVD method.
51. The method of claim 47 wherein said laser light is an excimer laser light.
52. The method of claim 51 wherein said excimer laser light is a KrF excimer laser light having a wavelength of 248 nm.
53. The method of claim 47 wherein said semiconductor film is crystallized by said laser light in a vacuum.
54. The method of claim 47 wherein said semiconductor film is crystallized by said laser light in an inactive atmosphere.
55. A method for manufacturing a semiconductor device comprising the steps of:
preparing a multi-chamber system having at least first and second and third chambers, said first chamber for forming a film and said second chamber for discharging hydrogen contained in said film and said third chamber for processing an object with a laser light;
processing a substrate in said first chamber to deposit a silicon semiconductor film thereon;
transferring said substrate to said second chamber without exposing said substrate to the air, after depositing said semiconductor film;
processing said substrate in said second chamber to discharge hydrogen contained in said silicon semiconductor film by using an infrared lamp;
transferring said substrate to said third chamber without exposing said substrate to the air, after discharging hydrogen contained in said silicon semiconductor film; and
processing said substrate in said third chamber to crystallize said semiconductor film by a linear laser light,
wherein said first and second and third chambers can be isolated from one another by using gate valves;
wherein said laser light is elongated in one direction on said substrate and an entire surface of said substrate is irradiated with said laser light by moving said substrate in a direction vertical to said one direction.
56. The method of claim 55 wherein said first chamber is a plasma CVD chamber.
57. The method of claim 55 wherein each of said first, second and third chambers is evacuated by a vacuum pump system comprising a turbo-molecular pump or cryopump.
Description
REFERENCE TO RELATED APPLICATION

This is a Divisional application Ser. No. 08/275,909, filed Jul. 15, 1994, pending; which itself is a continuation-in-part of Ser. No. 08/104,614, filed Aug. 11, 1993 (Now U.S. Pat. No. 5,352,291); which is a continuation of Ser. No. 07/886,814, filed May 22, 1992 now abandoned.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method for annealing a semiconductor, in particular, to an annealing process for obtaining a polycrystal semiconductor used in a thin film device such as an insulated gate field effect transistor by laser irradiation.

2. Description of Prior Art

Thin films of polycrystalline silicon semiconductor for use in a thin film device such as a thin film insulated gate field effect transistor (abbreviated hereinafter as a TFT) have been fabricated heretofore by first depositing amorphous silicon films by plasma-assisted chemical vapor deposition (CVD) or thermal CVD processes, and then irradiating a laser beam thereto to crystallize the thus deposited amorphous silicon films.

The process of crystallizing an amorphous silicon film by irradiating a laser beam comprises, in general, first irradiating a low energy density laser beam to the amorphous silicon film to allow desorption of hydrogen having incorporated into the starting amorphous silicon film, and then irradiating a laser beam at an energy density well above the threshold energy density (a minimum energy density necessary to initiate melting of silicon).

A laser beam having a sufficiently low energy should be irradiated to the amorphous silicon film for the purpose of releasing the hydrogen being incorporated in the film because, if a beam of a high energy density corresponding to the threshold value or higher were to be irradiated, there occur two problems. One is a problem which involves abrupt evolution of a considerable amount of hydrogen from the surface of an amorphous silicon film upon irradiating the laser beam. Such a phenomenon greatly impairs the smoothness of the film surface; the resulting film cannot provide a favorable interface level when an insulator film is established on the surface of the thus crystallized silicon film, because a level develops at the interface between the silicon film and the insulator film. The other problem is the hydrogens present in large amount in the amorphous silicon film; they not only evolve out of the surface upon irradiation of a high energy laser beam having an energy density not lower than the threshold value, but also move inside the melting silicon film with a large kinetic energy to impede the crystallization of the silicon itself.

Accordingly, a conventional laser annealing processes involves a so-called pre-laser annealing step which comprises irradiating a low energy density laser beam to sufficiently drive out hydrogen atoms having incorporated inside the film, followed by the irradiation of a laser beam having a satisfactorily high energy density to effect crystallization of the film. In this manner, the influence of the hydrogen inside the film on the film crystallization can be eliminated.

The conventional laser annealing processes, however, suffer disadvantages as follows.

Firstly, the laser annealing process should be conducted in two steps. Such a process is not suitable for processing large-area substrates. Moreover, it suffers poor efficiency.

Secondly, the most generally used excimer lasers which are operated in a pulsed mode are not suitable for completely driving hydrogen out of the film; the duration of the laser irradiation per pulse is too short.

Furthermore, any laser apparatus for use in the laser annealing inevitably suffers a non-uniform laser beam output and a fluctuation in power output. Those attributes make the hydrogen distribution non-uniform inside the film upon driving hydrogen atoms out of the film. Such a film having a non-uniform hydrogen distribution therein results in a crystallized film consisting of crystal grains of non-uniform grain diameter.

SUMMARY OF THE INVENTION

The present invention relates to a laser annealing process having overcome the aforementioned problems.

More specifically, the present invention provides a method for annealing a semiconductor comprising the steps of:

thermally annealing an amorphous semiconductor in vacuum or inactive atmosphere at a temperature not higher than a crystallization temperature of said amorphous semiconductor; and

irradiating said amorphous semiconductor with a laser light in vacuum or inactive atmosphere after said thermally annealing step to crystallize said amorphous semiconductor.

The laser to be used in the process in general is an excimer laser, but it should be noted that the construction of the present invention is by no means restricted to the use thereof, and hence, any type of laser can be employed in the process.

The generally used amorphous semiconductor, but not limiting, is a silicon semiconductor. In the description of the present invention hereinafter, however, a silicon semiconductor is used for purpose of explanation.

The thermal annealing of the amorphous semiconductor in vacuum or in an inactive gas atmosphere at a temperature not higher than the crystallization temperature of said amorphous semiconductor is conducted for the purpose of driving hydrogen out of the amorphous semiconductor. If this step of thermal annealing were to be conducted at a temperature not lower than the crystallization temperature of the amorphous semiconductor, crystallization would occur on the semiconductor, thereby making the subsequent crystallization by laser irradiation insufficient. Accordingly, it is an important point that the thermal annealing is conducted at a temperature not higher than the crystallization temperature of the semiconductor.

The thermal annealing step should be effected in vacuum or in an inactive gas atmosphere to avoid formation of an undesirable thin film, such as an oxide film, on the surface of the amorphous semiconductor.

Hydrogen can be uniformly and thoroughly driven out of the film by annealing the amorphous semiconductor at a temperature not higher than the crystallization temperature. The semiconductor films thus obtained have improved uniformity for both the intra-planar distribution of crystallinity and the size of the constituting crystal grains. Such semiconductor films enable fabrication of polycrystalline silicon (abbreviated sometimes as "p-Si", hereinafter) TFTs having uniform characteristics over a large-area substrate.

The crystallization of the amorphous semiconductor in vacuum or in an inactive gas atmosphere by irradiating a laser beam thereto is conducted to prevent the dangling bonds, which have once formed upon driving hydrogen out of the amorphous semiconductor, from bonding with oxygen and hydrogen and nitrogen present in the active gas, i.e., air.

The present invention is characterized in one aspect that a large amount of dangling bonds are produced in the amorphous semiconductor to accelerate crystallization of the film. This is based on the fact obtained experimentally by the present inventors, which is described below. It has been found that the crystallinity of an amorphous silicon film having subjected to a thorough driving out of hydrogen remarkably improves by irradiating an excimer laser light (a KrF laser emitting light at wavelength 248 nm) to the film.

An amorphous silicon film in general contains a large amount of hydrogen to neutralize the dangling bonds within the amorphous silicon film. The present inventors, however, realized the important role which the dangling bonds play at the crystallization of the film from its amorphous molten state, and therefore intentionally allowed the dangling bonds to form in the amorphous state to enhance instantaneous crystallization from the molten state. In the course of the crystallization taking advantage of the thus formed dangling bonds, it is very important to irradiate the laser beam in vacuum or in an inactive gas atmosphere, as mentioned earlier, because the exposure of the surface of the thus obtained semiconductor film to air causes bonding (neutralization) of the dangling bonds with oxygen, etc., to form an oxide film and the like on the surface of the film.

The annealing according to the process of the present invention should be conducted at a temperature not higher than the crystallization temperature of the amorphous semiconductor. The crystallization temperature as referred herein signifies the temperature at which the amorphous semiconductor initiates crystallization by thermal annealing. The thermal annealing at a temperature not higher than the crystallization temperature according to the process of the present invention is conducted on the basis of an experimentally derived fact that the improvement of crystallinity is hardly observed by irradiating a laser beam to a once crystallized film, and that those crystallized films are considerably low in crystallinity as compared with the films having crystallized by irradiating a laser beam to films still in their amorphous state.

It can be seen, accordingly, that it is of great importance to drive the hydrogen atoms out of the amorphous semiconductor film at a temperature not higher than the crystallization temperature of the amorphous semiconductor film. However, hydrogen atoms are preferably driven out of the amorphous semiconductor by thermal annealing at a temperature as high as possible, provided that the film does not initiate crystallization; it is of grave importance in the process according to the present invention to form as many dangling bonds as possible in the film while thoroughly driving hydrogen out of the film.

The thermal annealing of the film to drive hydrogen out of the film is characterized by that, unlike the conventional processes which use laser beams at a low energy density, it enables a uniform and thorough elimination of hydrogen from the amorphous semiconductor film.

The process according to the present invention therefore is of great advantage concerning that it realizes a polycrystalline semiconductor film composed of large and uniform crystal grains.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a graph showing the relationship between the Raman spectrum of a polycrystalline semiconductor film obtained by a process according to an embodiment of the present invention and the energy density of the laser beam having irradiated to the film; and

FIG.2 is a schematic drawing which shows a structure of a multi-chamber apparatus for use in EXAMPLE 2 according to an embodiment of the present invention.

FIG. 3 is a diagrammatic plan view of a multi-chamber system for fabricating TFTs on a substrate in accordance with an embodiment of the present invention.

FIGS. 4A-4C are diagrammatic illustrations of a process for manufacturing a TFT on a substrate for an active matrix liquid crystal device utilizing the multi-chamber system of FIG. 3.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Now the present invention is explained in further detail below, referring to non-limiting examples.

EXAMPLE 1

EXAMPLE 1 shows experimentally the effect of thermal annealing of driving hydrogen out of an amorphous silicon film on laser crystallization of the film (crystallization of the film by irradiating a laser beam).

On a 1,000 Å thick silicon oxide film having deposited on a glass substrate as a protective film for the base film was further deposited a 100 nm thick amorphous silicon (a-Si) film by a plasma CVD process under conditions as follows:

______________________________________RF power:             50 WReaction pressure:    0.05 TorrReactive gas flow:    H.sub.2 = 45 sccm                 SiH.sub.4 = 5 sccmSubstrate temperature:                 300 C.______________________________________

Two types of specimen were fabricated in accordance with the process above. One was not subjected to thermal annealing, whereas the other was thermally annealed at 500 C. for one hour in an atmosphere of an inactive gas, i.e., N2 gas. To both of the film specimens were irradiated a KrF excimer laser beam at a wavelength of 248 nm in vacuum to effect crystallization of the a-Si film. The laser crystallization was conducted in one shot, while varying the energy density of the laser.

The substrate during the laser irradiation step was not heated in this case, but otherwise the laser crystallization may be conducted with the substrate being maintained at 500 C., i.e., the temperature of thermal annealing which had been effected prior to the laser crystallization. It should be noted, however, that the thermal annealing for the purpose of driving hydrogen out of the film need not be conducted at 500 C. Furthermore, the thermal annealing, which was effected at 500 C. for an hour in the present example, can be carried out at various temperatures and durations, depending on the process and the semiconductor film employed in the individual cases.

The two types of specimens thus obtained were subjected to the measurement of Raman spectra to study the crystallinity of both specimens.

In FIG. 1 are shown curve A and curve B. Curve A shows the relationship between the peaks in the Raman spectra and the varying energy density of the laser light having irradiated for the crystallization to a specimen having subjected to thermal annealing (500 C., 1 hour) prior to the laser crystallization process. Curve B relates the peaks in the Raman spectra to the varying energy density of the laser light having irradiated for the crystallization of a specimen not having subjected to thermal annealing prior to the laser crystallization.

Referring to FIG. 1, Curve A, it can be seen that the specimen having subjected to thermal annealing prior to the laser crystallization yields a peak at the vicinity of 521 cm-1, i.e., the peak of a single crystal silicon, and that such a thermal annealing enables formation of crystallized silicon having a good crystallinity even upon irradiation of a laser at a low energy density.

In general, it is well accepted that a silicon film having crystallized from amorphous silicon yields a peak in the Raman spectrum at a wavenumber nearer to 521 cm-1, the peak of a single crystal silicon, with increasing crystal grain diameter of the film. It can be seen from the fact above that the thermal annealing conducted for driving hydrogen out of the film enables formation of larger crystal grains.

Referring to Curve B, it can be seen that the crystallinity of the film without thermal annealing for hydrogen elimination greatly depends on the energy density of the laser beam having irradiated at the laser crystallization. Furthermore, it shows that a favorable crystallinity can be obtained only by irradiating a laser beam at a high energy density.

It has been known that the energy density of a beam emitted from an excimer laser apt to fluctuate; this instability in the energy density has long constituted a problem. However, the crystallinity is not largely dependent on the laser beam intensity in such a case the peak of the Raman spectra and the energy density of the laser beam being irradiated at the laser crystallization yield a relationship therebetween corresponding to Curve A; thus, a crystalline film (a p-Si film in the present example) having a uniform crystallinity can be obtained without being influenced by the instability of the excimer laser.

In the case in which no thermal annealing is effected to drive hydrogen out of the film and therefore yields Curve B, a polycrystalline film having a non-uniform crystallinity results by the fluctuation in the energy density of the laser beam.

The practical fabrication process for semiconductor devices is largely concerned with how to obtain devices having uniform characteristics. It can be seen that the laser crystallization process which yield a polycrystalline film having a favorable crystallinity irrespective of the energy density of the laser beam having irradiated to the film, i.e., the process which yields Curve A, is useful for the practical fabrication of semiconductor devices.

By a closer examination of FIG. 1, Curve A, it can be seen also that the specimen having subjected to thermal treatment (thermal annealing for driving hydrogen out of the film) initiates crystallization upon irradiation of a laser beam having a lower energy density.

It can be concluded therefrom that the lowest energy density (threshold energy density) to initiate the crystallization is further lowered by effecting thermal annealing to the film for driving hydrogen out of the film.

Accordingly, the present inventors deduced conclusively that the threshold energy density for the crystallization can be lowered by driving hydrogen thoroughly out of the amorphous silicon film and thereby allowing formation of dangling bonds at a large quantity in the film.

EXAMPLE 2

Referring to FIG. 2, a laser crystallization process using a multi-chamber apparatus is described below. In this process, the multi-chamber apparatus is used so that an amorphous silicon film having subjected to thermal annealing for driving hydrogen out of the film can be directly put to the subsequent laser crystallization step without once exposing its surface to the air.

The apparatus for use in this process is shown schematically in FIG. 2. The apparatus comprises, in a serial arrangement, a plasma CVD apparatus 2 for depositing amorphous silicon film for use as the starting film, a thermal annealing furnace 3 to drive hydrogen out of the film, a chamber 4 to effect therein laser crystallization of the film, a chamber 1 for feeding the specimen, and a chamber 5 for discharging the specimen. Though not shown in FIG. 2, there may be established, if necessary, a gas supply system to each of the chambers 1 to 5 in order to introduce an active or an inactive gas, or a transportation system for transfer of the specimen. To each of the chambers is also provided a vacuum evacuation apparatus comprising a turbo molecular pump and a rotary pump being connected in series, so that the impurity concentration, particularly the oxygen concentration, inside the chamber may be maintained as low as possible. It is also effective to separately establish a cryopump.

The multi-chamber apparatus as shown in FIG. 2 can be partitioned into the chambers 1, 2, 3, 4 and 5 by gate valves 6. The gate valve functions, for example, to avoid the reactive gas inside the chamber 2, i.e., the plasma CVD apparatus, from being introduced inside the thermal annealing furnace 3 being established for driving hydrogen out of the film.

The chamber 3 is a thermal annealing furnace for driving hydrogen out of the film, in which an infrared lamp was used for the heating means. The heating means is not restricted to the use of an infrared lamp, and other means, such as a heater, can be used in the place thereof. The chamber 4, in which the laser annealing is effected, comprises a quartz window at the upper portion thereof. A laser beam is irradiated to the film through this window from an exterior laser-emitting apparatus equipped with an optical system.

The laser beam is adjusted with an optical system so that the cross section thereof may have a rectangular shape, at a predetermined width corresponding to that of the substrate and being elongated along a direction vertical to the direction of transporting the substrate. In this manner, the specimen can be continuously irradiated with the laser beam from its edge to edge and annealed efficiently, by slowly moving the specimen while fixing the laser system.

In the process using the apparatus shown in FIG. 2, the specimen preferably is thermally annealed and subsequently subjected to laser crystallization without interrupting the vacuum state. By thus conducting continuously the thermal annealing and laser crystallization in vacuum, neutralization of the dangling bonds can be avoided and hence the threshold energy density for the crystallization can be lowered. This provides polycrystalline silicon films composed of large-sized grains efficiently through the laser crystallization step.

The present process was described referring to a particular case using an apparatus comprising chambers being connected in series. However, a modified apparatus comprises a plurality of chambers for each step in accordance with the process duration of the specimen within each chamber. Furthermore, modifications may be made on the apparatus so that the chambers are each provided with a common room for supplying the specimen. The productivity can be improved by employing such an arrangement in which a plurality of treatments can be proceeded simultaneously by taking advantage of time difference.

The apparatus hereinbefore was described in connection with a process of depositing a film by plasma CVD. However, the film deposition may be carried out by other processes such as sputtering and thermal CVD; moreover, for example, a film deposition apparatus for depositing an insulating film therein may be further connected to the multi-chamber apparatus above, depending on the desired sequence for fabricating a film.

Conclusively, the present invention provides process which comprises a thermal annealing of an amorphous semiconductor film at a temperature not higher than the crystallization temperature of the film in vacuum or in an inactive gas atmosphere, followed by crystallization of the film in vacuum or in an inactive gas atmosphere by irradiating a laser beam to the film. The process provides a uniform polycrystalline silicon film having high crystallinity, which has less dependence on the energy density of the laser beam which is irradiated thereto for crystallization.

While the invention has been described in detail and with reference to specific embodiments thereof, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof.

The following is an additional description explaining another embodiment of the present invention.

A multi-chamber system for fabricating TFTs on a substrate is shown in FIG. 3. The multi-chamber system utilized in this embodiment is a modification of the system shown in FIG. 2. While the chambers are serially connected in one line in the system of FIG. 2, a plurality of chambers are connected with one another through one common chamber in the present embodiment, as referred to hereinbefore.

Referring to FIG. 3, the system comprises loading and unloading chambers 12 and 11, a plasma CVD chamber 13 for forming an amorphous silicon, a heat treatment chamber 14, a sputtering chamber 15 for forming a silicon oxide and a laser processing chamber 16. These chambers are connected with a common chamber (transfer chamber) 17 through gate valves 20-25, respectively. Also, a robot 18 is provided in the common chamber for transferring a substrate between the chambers. Further, although not shown in the figure, each chamber including the common chamber may be provided with its own vacuum pump. Accordingly, each process chamber can be operated completely isolated from one another.

The manufacture of a TFT on a substrate 19 for an active matrix liquid crystal device will be described below in connection with FIG. 3 and FIGS. 4A-4C.

Initially, after the loading chamber 12 is loaded with a glass substrate such as Corning 7059 glass and is pumped down, the gate valve 21 is opened and allows access to the substrate by the robot 18.

The robot 18 transfers it into the plasma CVD chamber 13 through the transfer chamber 17.

After the chamber 13 is loaded with the substrate and the gate valve 22 is closed, the chamber 13 is pumped down and the CVD formation of the amorphous silicon film is started. An example of the process parameters is as below:

______________________________________Starting gas:     SiH.sub.4 diluted with hydrogensubstrate temperature:             250 C.film thickness:   300ÅPower:            13.56 MHz r.f. power______________________________________

Then, in the same manner, the substrate 19 is transferred from the chamber 13 to the heat treatment chamber 14 by the robot 18. The substrate 19 having the amorphous silicon 31 is heated at 500 C. for one hour in N2 gas. Thereby, hydrogen can be discharged from the amorphous silicon film 31.

The substrate is then transferred from the chamber 14 to the sputtering chamber 15. In the chamber 15, a silicon oxide film 32 is deposited on the amorphous silicon film 31 to form a protective layer for the subsequent laser annealing. The process parameters may be as below:

______________________________________target:             artificial quartzsputtering gas:     Ar 25%-O.sub.2 75%substrate temperature:               100 C.power:              13.56 MHz, 400 Wfilm thickness:     100 nm______________________________________

After the formation of the silicon oxide layer 32, the substrate is then transferred to the laser processing chamber 16 by the robot 18. The chamber 16 is provided with a quartz window 27 through which a laser light is emitted into the inside of the chamber 16 from a KrF excimer laser 26 located outside the chamber 16. In the chamber 16, a laser crystallization of the amorphous silicon film 31 is performed in an oxygen gas. The condition of the laser annealing is shown below:

______________________________________energy density:       350 mJ/cm.sup.2pulse number:         1-10 shotssubstrate temperature:                 400 C.______________________________________

Thus, the amorphous silicon is crystallized. The substrate after the crystallization is removed from the multi-chamber system through the unloading chamber 11.

After patterning the polycrystalline silicon film 31 into an island form and removing the upper protective silicon oxide layer 32 by known etching, another silicon oxide layer 33 is formed on the silicon layer 31 through an r.f. plasma CVD using TEOS and oxygen to a thickness of 1000 Å.

Then, a gate electrode 34 is formed on the silicon oxide layer 33 by depositing a aluminum layer doped with silicon to a thickness of 6000 < and pattering it. (FIG. 4B)

Then, as shown in FIG. 4B, a dopant impurity such as phosphorous or boron is doped in the silicon layer 31 by a plasma doping with the gate electrode as a mask. The dose is 11015 -41015 atoms/cm2.

Subsequently, the dopant is activated by using a KrF excimer laser as shown in FIG. 4C. The laser annealing is performed at an energy density 200-350 mJ/cm2, at 300-500 C. substrate temperature.

Thus, a TFT is manufactured on the substrate.

While the figure shows only one TFT, it is obvious that a number of TFTs are manufactured at the same time through the same process. Also, it is advantageous to form a silicide oxide layer on the glass substrate prior to the formation of the amorphous silicon layer. This can be done in the sputtering chamber 15.

Patent Citations
Cited PatentFiling datePublication dateApplicantTitle
US4309225 *22 Feb 19805 Jan 1982Massachusetts Institute Of TechnologyMethod of crystallizing amorphous material with a moving energy beam
US4322253 *30 Apr 198030 Mar 1982Rca CorporationMethod of making selective crystalline silicon regions containing entrapped hydrogen by laser treatment
US4552595 *2 May 198412 Nov 1985Oki Electric Industry Co., Ltd.Method of manufacturing a semiconductor substrate having dielectric regions
US4576851 *16 Apr 198518 Mar 1986Kabushiki Kaisha Suwa SeikoshaSemiconductor substrate
US4589951 *19 Dec 198420 May 1986Fujitsu LimitedMethod for annealing by a high energy beam to form a single-crystal film
US4609407 *19 Dec 19832 Sep 1986Hitachi, Ltd.Method of making three dimensional semiconductor devices in selectively laser regrown polysilicon or amorphous silicon layers
US4719123 *31 Jul 198612 Jan 1988Sanyo Electric Co., Ltd.Method for fabricating periodically multilayered film
US5234528 *25 Sep 199110 Aug 1993Tokyo Electron Sagami LimitedVertical heat-treating apparatus
US5306651 *10 May 199126 Apr 1994Asahi Glass Company Ltd.Process for preparing a polycrystalline semiconductor thin film transistor
US5314839 *6 Sep 199124 May 1994Hitachi, Ltd.Solid state device fabrication method including a surface treatment step with a neutral particle beam with an energy between 10ev and 100ev
US5352291 *11 Aug 19934 Oct 1994Semiconductor Energy Laboratory Co., Ltd.Method of annealing a semiconductor
US5372836 *26 Mar 199313 Dec 1994Tokyo Electron LimitedMethod of forming polycrystalling silicon film in process of manufacturing LCD
JPH0281424A * Title not available
JPH0324717A * Title not available
JPH01179410A * Title not available
JPH02239615A * Title not available
JPS57180116A * Title not available
JPS60227484A * Title not available
JPS62104117A * Title not available
JPS63160336A * Title not available
Non-Patent Citations
Reference
1IEEE Transactions on Electron Devices, vol. 36, No. 12, Dec. 1989, Sera et al. "High-Performance TFT's Fabricated by XeC1 Excimer Laser Annealing of Hydrogenated Amorphous-Silicon Film", pp. 2868-2872.
2 *IEEE Transactions on Electron Devices, vol. 36, No. 12, Dec. 1989, Sera et al. High Performance TFT s Fabricated by XeC1 Excimer Laser Annealing of Hydrogenated Amorphous Silicon Film , pp. 2868 2872.
3 *Japanese Journal of Applied Physics, vol. 28, No. 10, Oct. 1989, pp. 1789 1793, XeC1 Excimer Laser Annealing Used to Fabricate Poly Si TFT s , Sameshima et al.
4Japanese Journal of Applied Physics, vol. 28, No. 10, Oct. 1989, pp. 1789-1793, "XeC1 Excimer Laser Annealing Used to Fabricate Poly-Si TFT's", Sameshima et al.
5Satoshi Takenaka, Masafumi Kunii, Hideaki OKA and Hajime Kurihara, "High Mobility Poly-Si Thin Film Transistors Using Solid Phase Crystallized a-Si Film Deposited by Plasma-Enhanced Chemical Vapor Deposition", published Dec. 1990, Japanese Journal of Applied Physics.
6 *Satoshi Takenaka, Masafumi Kunii, Hideaki OKA and Hajime Kurihara, High Mobility Poly Si Thin Film Transistors Using Solid Phase Crystallized a Si Film Deposited by Plasma Enhanced Chemical Vapor Deposition , published Dec. 1990, Japanese Journal of Applied Physics.
Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US5950078 *19 Sep 19977 Sep 1999Sharp Laboratories Of America, Inc.Rapid thermal annealing with absorptive layers for thin film transistors on transparent substrates
US6197623 *16 Oct 19986 Mar 2001Seungki JooMethod for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor
US6287984 *3 Dec 199911 Sep 2001Mitsubishi Denki Kabushiki KaishaApparatus and method for manufacturing semiconductor device
US63292293 Nov 199711 Dec 2001Semiconductor Energy Laboratory Co., Ltd.Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device
US6329269 *27 Mar 199611 Dec 2001Sanyo Electric Co., Ltd.Semiconductor device manufacturing with amorphous film cyrstallization using wet oxygen
US6348369 *3 Sep 199919 Feb 2002Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor devices
US63587842 Sep 199819 Mar 2002Semiconductor Energy Laboratory Co., Ltd.Process for laser processing and apparatus for use in the same
US649416225 Oct 200017 Dec 2002Semiconductor Energy Laboratory Co., Ltd.Method for annealing a semiconductor
US65066369 May 200114 Jan 2003Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device having a crystallized amorphous silicon film
US65355358 Feb 200018 Mar 2003Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US657653410 Feb 199810 Jun 2003Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor
US665576719 Jul 19992 Dec 2003Semiconductor Energy Laboratory Co., Ltd.Active matrix display device
US6660575 *30 Dec 19989 Dec 2003Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor device
US668964712 Jan 200110 Feb 2004Pt Plus Inc.Method for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor
US670656825 Apr 200216 Mar 2004Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device with a crystallized semiconductor film leveled by radiating with laser beams
US67532136 Nov 200222 Jun 2004Semiconductor Energy Laboratory Co., Ltd.Laser processing method
US677014322 Aug 20023 Aug 2004Semiconductor Energy Laboratory Co., Ltd.Method for annealing a semiconductor
US67777138 Oct 200217 Aug 2004Semiconductor Energy Laboratory Co., Ltd.Irregular semiconductor film, having ridges of convex portion
US68309946 Mar 200214 Dec 2004Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device having a crystallized semiconductor film
US685558428 Mar 200215 Feb 2005Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US689710012 Feb 199724 May 2005Semiconductor Energy Laboratory Co., Ltd.Method for processing semiconductor device apparatus for processing a semiconductor and apparatus for processing semiconductor device
US691923528 Jul 199919 Jul 2005Semiconductor Energy Laboratory Co., Ltd.Semiconductor device having semiconductor circuit comprising semiconductor element, and method for manufacturing same
US69192394 Dec 200319 Jul 2005Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor device
US69242124 Jun 20032 Aug 2005Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor
US6933182 *1 Mar 199923 Aug 2005Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device and manufacturing system thereof
US694419510 Dec 200213 Sep 2005Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US694745225 Jun 200320 Sep 2005Semiconductor Energy Laboratory Co., Ltd.Laser annealing method
US697476325 Oct 200013 Dec 2005Semiconductor Energy Laboratory Co., Ltd.Method of forming semiconductor device by crystallizing amorphous silicon and forming crystallization promoting material in the same chamber
US70150795 Feb 200421 Mar 2006Semiconductor Energy Laboratory Co., Ltd.Semiconductor film, semiconductor device, and method of manufacturing the same including adding metallic element to the amorphous semiconductor film and introducing oxygen after crystallization
US701508321 Sep 200421 Mar 2006Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US7041580 *18 Dec 20019 May 2006Semiconductor Energy Laboratory Co., Ltd.Laser annealing method and laser annealing device
US708750429 Apr 20028 Aug 2006Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device by irradiating with a laser beam
US709576226 Jul 200522 Aug 2006Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US71696571 Dec 200330 Jan 2007Semiconductor Energy Laboratory Co., Ltd.Process for laser processing and apparatus for use in the same
US716968928 Feb 200530 Jan 2007Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US720835815 Aug 200524 Apr 2007Semiconductor Energy Laboratory Co., Ltd.Laser annealing method
US72114768 May 20021 May 2007Semiconductor Energy Laboratory Co., Ltd.Semiconductor device and method of manufacturing the same
US72179529 Sep 200515 May 2007Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device and semiconductor manufacturing apparatus
US725303219 Apr 20027 Aug 2007Semiconductor Energy Laboratory Co., Ltd.Method of flattening a crystallized semiconductor film surface by using a plate
US725908229 Sep 200321 Aug 2007Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing semiconductor device
US72915233 Jan 20066 Nov 2007Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US736278415 Aug 200622 Apr 2008Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US73683671 Aug 20056 May 2008Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor
US7405114 *15 Oct 200329 Jul 2008Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus and method of manufacturing semiconductor device
US748558613 Nov 20063 Feb 2009Semiconductor Energy Laboratory Co., Ltd.Laser irradiating apparatus and method of manufacturing semiconductor apparatus
US751777416 Apr 200714 Apr 2009Semiconductor Energy Laboratory Co., Ltd.Laser annealing method
US752471327 Oct 200628 Apr 2009Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of semiconductor device
US75280578 May 20065 May 2009Semiconductor Energy Laboratory Co., Ltd.Laser annealing method and laser annealing device
US755741218 Apr 20077 Jul 2009Semiconductor Energy Laboratory Co., Ltd.Semiconductor device and method of manufacturing the same
US756944023 May 20054 Aug 2009Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device and manufacturing system thereof
US76555136 Nov 20072 Feb 2010Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US77093028 Jan 20044 May 2010Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device
US771425124 Nov 200611 May 2010Semiconductor Energy Laboratory Co., LtdLaser irradiation apparatus
US778127129 Jan 200724 Aug 2010Semiconductor Energy Laboratory Co., Ltd.Process for laser processing and apparatus for use in the same
US780008019 Jun 200721 Sep 2010Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus and method of manufacturing semiconductor device
US781191124 Oct 200712 Oct 2010Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US793943525 Mar 200910 May 2011Semiconductor Energy Laboratory Co., Ltd.Laser annealing method
US798173321 Apr 200819 Jul 2011Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US801750822 Sep 201013 Sep 2011Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US803472413 Jul 200711 Oct 2011Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US824200231 Aug 201114 Aug 2012Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US83893429 Mar 20105 Mar 2013Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device
US898137922 Sep 201117 Mar 2015Semiconductor Energy Laboratory Co., Ltd.Semiconductor device
US92575623 Mar 20159 Feb 2016Semiconductor Energy Laboratory Co., Ltd.Semiconductor device
US20020153360 *19 Apr 200224 Oct 2002Semiconductor Energy Laboratory Co., Ltd.Laser irradiating apparatus and method of manufacturing semiconductor apparatus
US20020155706 *6 Mar 200224 Oct 2002Semiconductor Energy Laboratory Co. Ltd.Method of manufacturing a semiconductor device
US20020173085 *29 Apr 200221 Nov 2002Semiconductor Energy Laboratory Co., Ltd. & Sharp Kabushiki KaishaMethod of manufacturing a semiconductor device and semiconductor manufacturing apparatus
US20020187594 *28 Mar 200212 Dec 2002Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US20030068872 *18 Dec 200110 Apr 2003Semiconductor Energy Laboratory Co., Ltd. A Japanese CorporationLaser annealing method and laser annealing device
US20030089909 *8 Oct 200215 May 2003Semiconductor Energy Laboratory Co., Ltd.Semiconductor film, semiconductor device, and method of manufacturing the same
US20030162334 *20 Dec 200228 Aug 2003Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US20030207524 *4 Jun 20036 Nov 2003Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor
US20040060515 *1 Oct 20031 Apr 2004Nec CorporationSemiconductor manufacturing apparatus and manufacturing method of thin film semiconductor device
US20040065643 *29 Sep 20038 Apr 2004Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus and method of manufacturing semiconductor device
US20040074881 *15 Oct 200322 Apr 2004Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus and method of manufacturing semiconductor device by using the laser irradiation apparatus
US20040087069 *25 Jun 20036 May 2004Semiconductor Energy Laboratory Co., Ltd. A Japan CorporationLaser annealing method
US20040110385 *4 Dec 200310 Jun 2004Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor device
US20040115940 *1 Dec 200317 Jun 2004Semiconductor Energy Laboratory Co., Ltd.Process for laser processing and apparatus for use in the same
US20040142581 *8 Jan 200422 Jul 2004Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device
US20040157413 *5 Feb 200412 Aug 2004Semiconductor Energy Laboratory Co., Ltd.Semiconductor film, semiconductor device, and method of manufacturing the same
US20050158922 *28 Feb 200521 Jul 2005Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US20050208714 *23 May 200522 Sep 2005Semiconductor Energy Laboratory Co., Ltd., A Japan CorporationMethod of manufacturing a semiconductor device and manufacturing system thereof
US20050260834 *1 Aug 200524 Nov 2005Semiconductor Energy Laboratory Co., Ltd.Method for forming a semiconductor
US20050271097 *26 Jul 20058 Dec 2005Semiconductor Energy Laboratory Co., Ltd.Laser irradiation method, laser irradiation apparatus, and semiconductor device
US20060009015 *9 Sep 200512 Jan 2006Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device and semiconductor manufacturing apparatus
US20060030166 *15 Aug 20059 Feb 2006Semiconductor Energy Laboratory Co., Ltd., A Japan CorporationLaser annealing method
US20070105288 *27 Oct 200610 May 2007Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of semiconductor device
US20070117287 *13 Nov 200624 May 2007Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus
US20070117288 *24 Nov 200624 May 2007Hidekazu MiyairiLaser irradiation apparatus
US20070119815 *29 Jan 200731 May 2007Semiconductor Energy Laboratory Co., Ltd.Process for laser processing and apparatus for use in the same
US20070196969 *18 Apr 200723 Aug 2007Semiconductor Energy Laboratory Co., Ltd.Semiconductor device and method of manufacturing the same
US20080020555 *13 Jul 200724 Jan 2008Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US20080108206 *24 Oct 20078 May 2008Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
US20080138963 *6 Nov 200712 Jun 2008Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a semiconductor device
US20080157008 *19 Jun 20073 Jul 2008Semiconductor Energy Laboratory Co., Ltd.Laser irradiation apparatus and method of manufacturing semiconductor device
US20090186468 *25 Mar 200923 Jul 2009Semiconductor Energy Laboratory Co., Ltd.Laser Annealing Method
US20100155737 *9 Mar 201024 Jun 2010Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device
US20110014780 *22 Sep 201020 Jan 2011Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing semiconductor device
Classifications
U.S. Classification438/437, 257/E21.134, 117/94, 117/106
International ClassificationH01L21/20, C30B1/02
Cooperative ClassificationC30B29/06, Y10T117/10, Y10S117/904, Y10S438/908, C30B1/023, H01L21/2026
European ClassificationH01L21/20D2, C30B1/02B
Legal Events
DateCodeEventDescription
27 Jun 2002FPAYFee payment
Year of fee payment: 4
23 Jun 2006FPAYFee payment
Year of fee payment: 8
16 Jun 2010FPAYFee payment
Year of fee payment: 12