US5854663A - LCD device and method of forming the same in which a black matrix is formed on the orientation layer and covers the active semiconductor layer of a TFT - Google Patents
LCD device and method of forming the same in which a black matrix is formed on the orientation layer and covers the active semiconductor layer of a TFT Download PDFInfo
- Publication number
- US5854663A US5854663A US08/675,316 US67531696A US5854663A US 5854663 A US5854663 A US 5854663A US 67531696 A US67531696 A US 67531696A US 5854663 A US5854663 A US 5854663A
- Authority
- US
- United States
- Prior art keywords
- forming
- orientation layer
- black matrix
- electrode
- panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 239000011159 matrix material Substances 0.000 title claims description 44
- 239000004065 semiconductor Substances 0.000 title claims description 25
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 54
- 230000004913 activation Effects 0.000 claims abstract description 16
- 230000003213 activating effect Effects 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 4
- 229920001721 polyimide Polymers 0.000 claims description 4
- 239000004952 Polyamide Substances 0.000 claims description 3
- 229940114081 cinnamate Drugs 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- -1 polysiloxane Polymers 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- 239000004800 polyvinyl chloride Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims 8
- 229920000915 polyvinyl chloride Polymers 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 5
- 230000002708 enhancing effect Effects 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Thin Film Transistor (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
Claims (24)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960006617A KR100220854B1 (en) | 1996-03-13 | 1996-03-13 | Thin-film transistor substrate and its manufacturing method of liquid crystal display device |
KR96-6617 | 1996-03-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
US5854663A true US5854663A (en) | 1998-12-29 |
Family
ID=19452949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/675,316 Expired - Lifetime US5854663A (en) | 1996-03-13 | 1996-07-03 | LCD device and method of forming the same in which a black matrix is formed on the orientation layer and covers the active semiconductor layer of a TFT |
Country Status (6)
Country | Link |
---|---|
US (1) | US5854663A (en) |
JP (1) | JPH1010582A (en) |
KR (1) | KR100220854B1 (en) |
DE (1) | DE19709204B9 (en) |
FR (1) | FR2746195B1 (en) |
GB (1) | GB2311403B (en) |
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5926702A (en) * | 1996-04-16 | 1999-07-20 | Lg Electronics, Inc. | Method of fabricating TFT array substrate |
US6002462A (en) * | 1996-12-26 | 1999-12-14 | Sharp Kabushiki Kaisha | Liquid crystal display device with electrodes corresponding to channel region and display region and colored layers being formed on the electrodes |
US6002463A (en) * | 1996-01-30 | 1999-12-14 | Seiko Epson Corporation | Liquid crystal device having a light blocking layer provided over an alignment layer, method for making the same |
US6057896A (en) * | 1996-11-26 | 2000-05-02 | Samsung Electronics Co., Ltd. | Liquid crystal displays using organic insulating material for a passivation layer and/or a gate insulating layer and manufacturing methods thereof |
US6162654A (en) * | 1995-11-29 | 2000-12-19 | Sanyo Electric Co., Ltd. | Display and method of producing the display |
US6180430B1 (en) | 1999-12-13 | 2001-01-30 | Chartered Semiconductor Manufacturing Ltd. | Methods to reduce light leakage in LCD-on-silicon devices |
US20030123017A1 (en) * | 2001-12-29 | 2003-07-03 | Lg.Philips Lcd Co., Ltd. | Liquid crystal display device and method of fabricating the same |
US20030213959A1 (en) * | 2002-05-15 | 2003-11-20 | Au Optronics Corp. | Active matrix substrate for a liquid crystal display and method of forming the same |
US20040150761A1 (en) * | 2003-01-30 | 2004-08-05 | Industrial Technology Research Institute | Organic thin film transistor array substrate and liquid crystal display including the same |
US20040212760A1 (en) * | 2001-11-21 | 2004-10-28 | Kabushiki Kaisha Toshiba | Liquid crystal display device having a condenser type digital-analog converter |
US20040246406A1 (en) * | 2001-10-02 | 2004-12-09 | Fujitsu Display Technologies Corporation | Liquid crystal display device and method of fabricating the same |
US20050078254A1 (en) * | 2003-10-10 | 2005-04-14 | Byoung Ho Lim | Thin film transistor array substrate, liquid crystal display panel having the same, and method of manufacturing thin film transistor array substrate and liquid crystal display panel |
US20050185109A1 (en) * | 1996-11-26 | 2005-08-25 | Soo-Guy Rho | Liquid crystal displays using organic insulating material and manufacturing methods thereof |
US20060082718A1 (en) * | 1996-05-16 | 2006-04-20 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US7053973B1 (en) * | 1996-05-16 | 2006-05-30 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US20060121817A1 (en) * | 2001-11-24 | 2006-06-08 | Park Chun O | Spacer distributing apparatus for fabricating liquid crystal display device |
US20080001142A1 (en) * | 2006-06-28 | 2008-01-03 | Cho Seung H | Organic thin film transistor substrate and fabrication method therefor |
US20080316406A1 (en) * | 2001-10-02 | 2008-12-25 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US20090122223A1 (en) * | 2006-07-18 | 2009-05-14 | Sharp Kabushiki Kaisha | Liquid crystal display panel |
US20090180064A1 (en) * | 2008-01-10 | 2009-07-16 | Jin-Seuk Kim | Resin composition for light blocking member and display panel comprising the same |
USRE41669E1 (en) | 2002-05-10 | 2010-09-14 | Ponnusamy Palanisamy | Low-cost circuit board materials and processes for area array electrical interconnections over a large area between a device and the circuit board |
USRE41914E1 (en) | 2002-05-10 | 2010-11-09 | Ponnusamy Palanisamy | Thermal management in electronic displays |
US20110193460A1 (en) * | 2008-09-25 | 2011-08-11 | Richard Hung Minh Dinh | P-Chassis Arrangement for Positioning a Display Stack |
US20120161300A1 (en) * | 2007-08-10 | 2012-06-28 | International Business Machines Corporation | Ionizing radiation blocking in ic chip to reduce soft errors |
US20150085216A1 (en) * | 2013-02-28 | 2015-03-26 | Boe Technology Group Co. Ltd. | Array substrate and fabrication method thereof, display panel and fabrication method thereof |
CN104765216A (en) * | 2015-04-30 | 2015-07-08 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof and display device |
US20150206928A1 (en) * | 2014-01-21 | 2015-07-23 | Japan Display Inc. | Display device |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100486899B1 (en) * | 1997-11-25 | 2005-08-10 | 삼성전자주식회사 | Method for making a lcd panel |
KR100552292B1 (en) * | 1998-09-11 | 2006-06-14 | 삼성전자주식회사 | Reflective Liquid Crystal Display and Manufacturing Method Thereof |
KR101212135B1 (en) * | 2005-06-14 | 2012-12-14 | 엘지디스플레이 주식회사 | Liquid Crystal Display Device, and method of fabricating the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4634227A (en) * | 1983-07-22 | 1987-01-06 | Canon Kabushiki Kaisha | Optical modulating device having projection on substrate for registration |
US4821092A (en) * | 1986-11-27 | 1989-04-11 | Nec Corporation | Thin film transistor array for liquid crystal display panel |
US4881797A (en) * | 1984-04-20 | 1989-11-21 | Hosiden Electronics Ltd. | Color liquid crystal display device |
US5327001A (en) * | 1987-09-09 | 1994-07-05 | Casio Computer Co., Ltd. | Thin film transistor array having single light shield layer over transistors and gate and drain lines |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4636038A (en) * | 1983-07-09 | 1987-01-13 | Canon Kabushiki Kaisha | Electric circuit member and liquid crystal display device using said member |
GB2160692B (en) * | 1984-05-04 | 1987-11-11 | Canon Kk | Lcd matrix elements |
EP0231953A3 (en) * | 1986-02-07 | 1989-08-23 | Kabushiki Kaisha Toshiba | Light-absorbing resins for display device, display devices using the resin and method of manufacturing the same |
JPH04211225A (en) * | 1990-03-15 | 1992-08-03 | Canon Inc | Liquid crystal element and display method and display device using the same |
GB2245741A (en) * | 1990-06-27 | 1992-01-08 | Philips Electronic Associated | Active matrix liquid crystal devices |
JPH0815727A (en) * | 1994-06-29 | 1996-01-19 | Toppan Printing Co Ltd | Production of electrode substrate for liquid crystal display device |
JP3467651B2 (en) * | 1996-01-30 | 2003-11-17 | セイコーエプソン株式会社 | Liquid crystal device substrate, method of manufacturing liquid crystal device substrate, liquid crystal device, and electronic equipment |
-
1996
- 1996-03-13 KR KR1019960006617A patent/KR100220854B1/en not_active IP Right Cessation
- 1996-07-03 US US08/675,316 patent/US5854663A/en not_active Expired - Lifetime
- 1996-11-28 GB GB9624838A patent/GB2311403B/en not_active Expired - Lifetime
-
1997
- 1997-02-25 JP JP4108797A patent/JPH1010582A/en active Pending
- 1997-02-25 FR FR9702222A patent/FR2746195B1/en not_active Expired - Lifetime
- 1997-03-06 DE DE19709204A patent/DE19709204B9/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4634227A (en) * | 1983-07-22 | 1987-01-06 | Canon Kabushiki Kaisha | Optical modulating device having projection on substrate for registration |
US4881797A (en) * | 1984-04-20 | 1989-11-21 | Hosiden Electronics Ltd. | Color liquid crystal display device |
US4821092A (en) * | 1986-11-27 | 1989-04-11 | Nec Corporation | Thin film transistor array for liquid crystal display panel |
US5327001A (en) * | 1987-09-09 | 1994-07-05 | Casio Computer Co., Ltd. | Thin film transistor array having single light shield layer over transistors and gate and drain lines |
Non-Patent Citations (2)
Title |
---|
"Dye Embedded BM Resin and Three Dimensional Picture Element Implemented by BM On ARRAY Technology for the First Time"; NIKKEI MICRODEVICES, Jul. 1994, pp. 60-62 (English translation attached hereto). |
Dye Embedded BM Resin and Three Dimensional Picture Element Implemented by BM On ARRAY Technology for the First Time ; NIKKEI MICRODEVICES, Jul. 1994, pp. 60 62 (English translation attached hereto). * |
Cited By (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6162654A (en) * | 1995-11-29 | 2000-12-19 | Sanyo Electric Co., Ltd. | Display and method of producing the display |
US6002463A (en) * | 1996-01-30 | 1999-12-14 | Seiko Epson Corporation | Liquid crystal device having a light blocking layer provided over an alignment layer, method for making the same |
US5926702A (en) * | 1996-04-16 | 1999-07-20 | Lg Electronics, Inc. | Method of fabricating TFT array substrate |
US7417702B2 (en) | 1996-05-16 | 2008-08-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US20060082718A1 (en) * | 1996-05-16 | 2006-04-20 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US7053973B1 (en) * | 1996-05-16 | 2006-05-30 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US6057896A (en) * | 1996-11-26 | 2000-05-02 | Samsung Electronics Co., Ltd. | Liquid crystal displays using organic insulating material for a passivation layer and/or a gate insulating layer and manufacturing methods thereof |
US7973905B2 (en) | 1996-11-26 | 2011-07-05 | Samsung Electronics Co., Ltd. | Liquid crystal displays using organic insulating material and manufacturing methods thereof |
US6597415B2 (en) | 1996-11-26 | 2003-07-22 | Samsung Electronics Co., Ltd. | Thin film transistor substrates for liquid crystal displays including thinner passivation layer on storage capacitor electrode than other regions |
US6243146B1 (en) | 1996-11-26 | 2001-06-05 | Samsung Electronics Co., Ltd. | Liquid crystal displays using organic insulating material and manufacturing methods thereof |
US6862050B2 (en) | 1996-11-26 | 2005-03-01 | Samsung Electronics Co., Ltd. | Liquid crystal displays using organic insulating material for a gate insulating layer and/or having photolithographic formed spacers |
US6940566B1 (en) | 1996-11-26 | 2005-09-06 | Samsung Electronics Co., Ltd. | Liquid crystal displays including organic passivation layer contacting a portion of the semiconductor layer between source and drain regions |
US20050185109A1 (en) * | 1996-11-26 | 2005-08-25 | Soo-Guy Rho | Liquid crystal displays using organic insulating material and manufacturing methods thereof |
US6002462A (en) * | 1996-12-26 | 1999-12-14 | Sharp Kabushiki Kaisha | Liquid crystal display device with electrodes corresponding to channel region and display region and colored layers being formed on the electrodes |
US6180430B1 (en) | 1999-12-13 | 2001-01-30 | Chartered Semiconductor Manufacturing Ltd. | Methods to reduce light leakage in LCD-on-silicon devices |
US7324175B2 (en) * | 2001-10-02 | 2008-01-29 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US20040246406A1 (en) * | 2001-10-02 | 2004-12-09 | Fujitsu Display Technologies Corporation | Liquid crystal display device and method of fabricating the same |
US20050024556A1 (en) * | 2001-10-02 | 2005-02-03 | Fujitsu Display Technologies Corporation | Liquid crystal display device and method of fabricating the same |
US8558959B2 (en) | 2001-10-02 | 2013-10-15 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US8284362B2 (en) | 2001-10-02 | 2012-10-09 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US7956969B2 (en) | 2001-10-02 | 2011-06-07 | Sharp Kabushiki Kaisha | Liquid crystal display device |
US20110058134A1 (en) * | 2001-10-02 | 2011-03-10 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US7450206B2 (en) | 2001-10-02 | 2008-11-11 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US20080316406A1 (en) * | 2001-10-02 | 2008-12-25 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US20050030445A1 (en) * | 2001-10-02 | 2005-02-10 | Fujitsu Display Technologies Corporation | Liquid crystal display device and method of fabricating the same |
US7136119B2 (en) | 2001-10-02 | 2006-11-14 | Sharp Kabushiki Kaisha | Liquid crystal display device and method of fabricating the same |
US20040212760A1 (en) * | 2001-11-21 | 2004-10-28 | Kabushiki Kaisha Toshiba | Liquid crystal display device having a condenser type digital-analog converter |
US7006176B2 (en) * | 2001-11-21 | 2006-02-28 | Kabushiki Kaisha Toshiba | Liquid crystal display device comprising a C-DAC and wherein a light blocking film opposes the C-DAC and contacts the liquid crystal |
US20060121817A1 (en) * | 2001-11-24 | 2006-06-08 | Park Chun O | Spacer distributing apparatus for fabricating liquid crystal display device |
US7692758B2 (en) * | 2001-11-24 | 2010-04-06 | Lg Display Co., Ltd. | Spacer distributing apparatus for fabricating liquid crystal display device |
US7667784B2 (en) * | 2001-12-29 | 2010-02-23 | Lg Display Co., Ltd. | Liquid crystal display device with light block pattern and method of fabricating the same |
US20030123017A1 (en) * | 2001-12-29 | 2003-07-03 | Lg.Philips Lcd Co., Ltd. | Liquid crystal display device and method of fabricating the same |
USRE42542E1 (en) | 2002-05-10 | 2011-07-12 | Transpacific Infinity, Llc | Low-cost circuit board materials and processes for area array electrical interconnections over a large area between a device and the circuit board |
USRE41914E1 (en) | 2002-05-10 | 2010-11-09 | Ponnusamy Palanisamy | Thermal management in electronic displays |
USRE41669E1 (en) | 2002-05-10 | 2010-09-14 | Ponnusamy Palanisamy | Low-cost circuit board materials and processes for area array electrical interconnections over a large area between a device and the circuit board |
US6825497B2 (en) * | 2002-05-15 | 2004-11-30 | Au Optronics Corp. | Active matrix substrate for a liquid crystal display and method of forming the same |
US6927087B2 (en) | 2002-05-15 | 2005-08-09 | Au Optronics Corp. | Active matrix substrate for a liquid crystal display and method of forming the same |
US20050019970A1 (en) * | 2002-05-15 | 2005-01-27 | Au Optronics Corp. | Active matrix substrate for a liquid crystal display and method of forming the same |
US20030213959A1 (en) * | 2002-05-15 | 2003-11-20 | Au Optronics Corp. | Active matrix substrate for a liquid crystal display and method of forming the same |
US7253848B2 (en) * | 2003-01-30 | 2007-08-07 | Industrial Technology Research Institute | Organic thin film transistor array substrate and liquid crystal display including the same |
US7456912B2 (en) | 2003-01-30 | 2008-11-25 | Industrial Technology Research Institute | Organic thin film transistor array substrate and liquid crystal display including the same |
US20050062040A1 (en) * | 2003-01-30 | 2005-03-24 | Industrial Technology Research Institute | Organic thin film transistor array substrate and liquid crystal display including the same |
US20040150761A1 (en) * | 2003-01-30 | 2004-08-05 | Industrial Technology Research Institute | Organic thin film transistor array substrate and liquid crystal display including the same |
US20050078254A1 (en) * | 2003-10-10 | 2005-04-14 | Byoung Ho Lim | Thin film transistor array substrate, liquid crystal display panel having the same, and method of manufacturing thin film transistor array substrate and liquid crystal display panel |
US7612838B2 (en) * | 2003-10-10 | 2009-11-03 | Lg Display Co., Ltd. | Thin film transistor array substrate, liquid crystal display panel having the same, and method of manufacturing thin film transistor array substrate and liquid crystal display panel |
US8211757B2 (en) * | 2006-06-28 | 2012-07-03 | Samsung Electronics Co., Ltd. | Organic thin film transistor substrate and fabrication method therefor |
US20110053315A1 (en) * | 2006-06-28 | 2011-03-03 | Seung Hwan Cho | Organic thin film transistor substrate and fabrication method therefor |
US7803669B2 (en) * | 2006-06-28 | 2010-09-28 | Samsung Electronics Co., Ltd. | Organic thin-film transistor substrate and fabrication method therefor |
US20080001142A1 (en) * | 2006-06-28 | 2008-01-03 | Cho Seung H | Organic thin film transistor substrate and fabrication method therefor |
US20090122223A1 (en) * | 2006-07-18 | 2009-05-14 | Sharp Kabushiki Kaisha | Liquid crystal display panel |
US10784200B2 (en) * | 2007-08-10 | 2020-09-22 | International Business Machines Corporation | Ionizing radiation blocking in IC chip to reduce soft errors |
US20120161300A1 (en) * | 2007-08-10 | 2012-06-28 | International Business Machines Corporation | Ionizing radiation blocking in ic chip to reduce soft errors |
US20090180064A1 (en) * | 2008-01-10 | 2009-07-16 | Jin-Seuk Kim | Resin composition for light blocking member and display panel comprising the same |
US20110193460A1 (en) * | 2008-09-25 | 2011-08-11 | Richard Hung Minh Dinh | P-Chassis Arrangement for Positioning a Display Stack |
US8553172B2 (en) * | 2008-09-25 | 2013-10-08 | Apple Inc. | P-chassis arrangement for positioning a display stack |
US20150085216A1 (en) * | 2013-02-28 | 2015-03-26 | Boe Technology Group Co. Ltd. | Array substrate and fabrication method thereof, display panel and fabrication method thereof |
US10217773B2 (en) * | 2013-02-28 | 2019-02-26 | Boe Technology Group Co., Ltd. | Array substrate and fabrication method thereof, display panel and fabrication method thereof |
US20150206928A1 (en) * | 2014-01-21 | 2015-07-23 | Japan Display Inc. | Display device |
WO2016173129A1 (en) * | 2015-04-30 | 2016-11-03 | 京东方科技集团股份有限公司 | Array substrate and preparation method therefor, and display device |
US9547196B2 (en) | 2015-04-30 | 2017-01-17 | Boe Technology Group Co., Ltd. | Array substrate and manufacturing method thereof and display device |
CN104765216B (en) * | 2015-04-30 | 2017-12-19 | 京东方科技集团股份有限公司 | Array base palte and preparation method thereof and display device |
CN104765216A (en) * | 2015-04-30 | 2015-07-08 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof and display device |
Also Published As
Publication number | Publication date |
---|---|
FR2746195A1 (en) | 1997-09-19 |
JPH1010582A (en) | 1998-01-16 |
GB9624838D0 (en) | 1997-01-15 |
KR970067944A (en) | 1997-10-13 |
GB2311403B (en) | 1998-09-23 |
GB2311403A (en) | 1997-09-24 |
FR2746195B1 (en) | 2001-12-28 |
DE19709204B9 (en) | 2006-03-16 |
KR100220854B1 (en) | 1999-09-15 |
DE19709204B4 (en) | 2005-11-10 |
DE19709204A1 (en) | 1997-09-18 |
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