US5821545A - Heated stage for a scanning probe microscope - Google Patents

Heated stage for a scanning probe microscope Download PDF

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US5821545A
US5821545A US08/729,395 US72939596A US5821545A US 5821545 A US5821545 A US 5821545A US 72939596 A US72939596 A US 72939596A US 5821545 A US5821545 A US 5821545A
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support
scanning probe
probe microscope
support sheet
support substrate
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US08/729,395
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Stuart M. Lindsay
Tianwei Jing
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Keysight Technologies Inc
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Molecular Imaging Corp
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/08Means for establishing or regulating a desired environmental condition within a sample chamber
    • G01Q30/10Thermal environment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001Maintaining constant desired temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2818Scanning tunnelling microscopes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86Scanning probe structure
    • Y10S977/871Scanning probe structure with environmental regulation means

Definitions

  • This invention relates to scanning probe microscopy. More particularly, the present invention relates to temperature control of samples under investigation in a scanning probe microscope.
  • SPM scanning probe microscope
  • STM scanning tunneling microscope
  • AFM atomic force microscope
  • Scanning probe microscopes have been constructed which operate in a cryogenic fluid or inside a high vacuum chamber. In each case it is relatively straightforward to control the temperature of the sample (and/or the microscope as well). However, in the case of microscopes designed to operate in ambient air (or some gas at or near ambient pressure) it is more difficult to design a heated sample stage. The reason is that convection caused by hot gasses and temperature gradients across the microscope (the body of which is assumed to be at ambient temperature) causes mechanical instabilities which degrade the resolution of the microscope.
  • a sample to be studied 20 is glued onto the hot side 22 of Peltier device 16, so that the whole assembly of Peltier device 16 and sample 20 is scanned under probe tip 24 of the scanning probe microscope.
  • This arrangement is simple, however the heat applied to the sample 20 is removed from the cold side 26 of the Peltier device 16 causing thermal gradients at the scanner 18. The effect is small because much of the current applied to a Peltier device is consumed in Joule heating.
  • a second limitation lies with the materials used to fabricate the Peltier device itself: the manufacturers of such devices recommend that they be run at temperatures below 60° C. to avoid damage to internal solder contacts and semiconductor elements, thus the available heating range is necessarily limited by this constraint to about 60° C. or less.
  • FIG. 3 A heater assembly 28, consisting of a thin film 30 of indium-tin-oxide ("ITO") is coated onto the underside 32 of a glass slide 34, the underside 40 of which also serves as a support for a sample to be studied by a scanning probe microscope. Heat is developed in the heater assembly 28 by applying an electric current to a multicore, flexible copper wire (not shown) soldered to the ITO surface at diagonally facing corners of the ITO layer 30.
  • ITO indium-tin-oxide
  • the heater assembly 28 is mounted onto drops 36 of an epoxy adhesive which act as thermal insulating stand-off supports for the heater assembly 28 and hold it onto an X-Y scanner 38 of a scanning probe microscope.
  • This arrangement is capable of heating the sample to higher temperatures than the Peltier-based heater of FIG. 2, but the entire thermal gradient must be sustained across the epoxy drops 36 and the air space between the ITO layer 30 and the scanner 38.
  • the thermal gradient across these drops 36 results in excessive thermal drift for some applications.
  • the inherently small size of drops 36 (typically about 2 mm in diameter) provides only very limited thermal isolation of the sample stage 40 from the rest of the microscope and thus the rest of the microscope is substantially radiatively heated when the stage is hot.
  • a heater for use in heating a sample stage of a microscope such as a scanning probe microscope is bonded to a sample stage which sits on a tube of a ceramic thermal insulator which is, in turn, mounted within or part of a tube of the same material.
  • This re-entrant design provides an increased thermal path over straight line distances between the heater and the support structure for the sample stage and thus provides excellent thermal insulation, while also maximizing the thermal stability of the system.
  • Yet another object and advantage of the present invention is to provide a heated stage scanning probe microscope having a long thermal path between the heating element of the heated stage and other components of the microscope.
  • FIG. 1 depicts a silicon-based microfabricated sample stage according to the prior art.
  • FIG. 2 depicts a Peltier heater according to the prior art.
  • FIG. 3 depicts a thin-film heater according to the prior art.
  • FIG. 4 is an elevational section of a heated stage for a scanning probe microscope in accordance with a presently preferred embodiment of the present invention.
  • FIG. 5 is a top plan view of the heated stage of FIG. 4.
  • FIG. 6 is an elevational section of a heated stage for a scanning probe microscope in accordance with an alternative embodiment of the present invention.
  • FIGS. 4-5 The present invention in its preferred embodiment is illustrated in FIGS. 4-5.
  • Heater 40 is, according to a presently preferred embodiment of the present invention, a commercially available device printed on a thin Kapton film.
  • An example of such a device is the Thermofoil heater from Minco Products of Minneapolis, Minn.
  • Sample stage 44 itself is ideally made from a metal of high thermal conductivity such as copper. This minimizes thermal gradients across stage 44 and results in more rapid thermal stabilization.
  • the stage/heater assembly 46 is mounted onto a thermally insulating support element 48 (preferably fabricated of a ceramic material such as alumina or MacorTM, a machinable ceramic product available from Dow Chemical Corporation).
  • Thermally insulating support element 48 is attached directly to the sample stage 44 at the outer periphery 50 of underside 42 of assembly 46. This is preferably arranged so as to leave an air gap 52 between heater 40 and ring-shaped support portion 54 of element 48 and an air gap 56 between heater 40 and the bottom 57 of cavity 58. Air gaps 52 and 56 in conjunction with ring-shaped support portion 54 of element 48 provide a means for supporting stage/heater assembly 46 without permitting heater 40 to contact support portion 54. Since heater 40 is fabricated from a polymer film (Kapton) which creeps on heating, greater thermal stability is achieved by leaving heater 40 attached only by its top side to underside 42 of sample stage 44.
  • Kapton polymer film
  • element 48 preferably includes two concentric rods or tubes 60, 62.
  • elements 60, 62 are fabricated from a single ceramic insulating element 48 by cutting a circular gap or generally torroidally-shaped void 64 partially through it.
  • an insulating material could be cast or otherwise formed in this way without the need for a cutting step.
  • FIG. 4 in this way, heat must first flow down element 60 as illustrated by arrow 66 and then back up element 62 as illustrated by arrow 68. This arrangement confers two important advantages.
  • heater 40 is attached to a circular platen or support sheet 73 (FIG. 4) of a scanning probe microscope such as the PicoSPMO® available from the Molecular Imaging Corporation of Tempe, Ariz.
  • a scanning probe microscope such as the PicoSPMO® available from the Molecular Imaging Corporation of Tempe, Ariz.
  • the sample platen or support sheet 73 is suspended below the scanning tip 74 (which may be an AFM tip or an STM tip) by means of magnetic mounts 76 (magnetized balls) which extend downwardly from a suspension mechanism and attract platen 73 which is made of a material attracted by magnets such as steel or other well known magnetically attractive materials.
  • the heater element 40 is generally circular in shape with a thickness of 0.01" and a diameter of 0.8".
  • Sample stage 44 is generally circular in shape with a diameter of 1" and a thickness of 0.1" and is formed of copper. It is attached at its outer periphery to supports 54 of element 48 by means of screws.
  • Element 48 is generally circular in shape with a vertical thickness of 0.8" and a diameter of 2.5".
  • Element 48 is formed of MacorTM.
  • Cavity 58 is generally circular in shape and is 0.1" deep vertically and has a diameter of 0.7". Cavity 58 is preferably formed by machining, but it could be molded for higher volume applications.
  • Void 64 is also preferably formed by machining, but for higher volume applications could also be molded as known to those of ordinary skill in the art.
  • Support sheet 73 is formed of magnetic stainless steel and is generally circular in shape with a thickness of 0.12" and a diameter of 2.5". It is attached to element 48 by means of screws.
  • FIG. 6 An alternative embodiment of the invention in accordance with the discussion above is shown in FIG. 6.
  • a total of three generally torroidally-shaped voids or air gaps 80, 82, 84 have been incorporated into the thermally insulating support element 48 at increasing radii from the center line 86 of thermally insulating support element 48 as shown.
  • the thermal path from heater 40 to support sheet 73 is at least about 4 L (more, actually, if the radial distance travelled by the heat is taken into account).
  • these simple structures provide a much improved mechanism for delivering stable heat to a sample under study.

Abstract

A heater for use in heating a sample stage of a microscope such as a scanning probe microscope is bonded to a sample stage which sits on a tube of a ceramic thermal insulator which is, in turn, mounted within or part of a tube of the same material. This re-entrant design provides an increased thermal path over straight line distances between the heater and the support structure for the sample stage and thus provides excellent thermal insulation, while also maximizing the thermal stability of the system.

Description

CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of U.S. patent application Ser. No. 08/551,836, now U.S. Pat. No. 5,654,546, entitled "A Variable Temperature Scanning Probe Microscope Based On A Peltier Device" filed 7 Nov., 1995 in the name of inventor Stuart M. Lindsay.
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to scanning probe microscopy. More particularly, the present invention relates to temperature control of samples under investigation in a scanning probe microscope.
2. The Prior Art
It is often desirable to control the temperature of a sample that is being studied in a scanning probe microscope (SPM) such as the scanning tunneling microscope (STM) or atomic force microscope (AFM). This is because many aspects of surface structure and chemistry are sensitive to temperature, so variable temperature operation adds greatly to the utility of the scanning probe microscope.
Scanning probe microscopes have been constructed which operate in a cryogenic fluid or inside a high vacuum chamber. In each case it is relatively straightforward to control the temperature of the sample (and/or the microscope as well). However, in the case of microscopes designed to operate in ambient air (or some gas at or near ambient pressure) it is more difficult to design a heated sample stage. The reason is that convection caused by hot gasses and temperature gradients across the microscope (the body of which is assumed to be at ambient temperature) causes mechanical instabilities which degrade the resolution of the microscope.
One solution to this problem is to make the heater very small, comparable in size to the probe of the microscope. The heated region itself can then be raised to a high temperature with a very small heat input, with the result that the rest of the sample stage and microscope is not disturbed. Such an arrangement has been built by M. DiBattista et al., and is described in "A Microfabricated Hot Stage for Scanning Probe Microscopes" (1996), using integrated-circuit manufacturing technology. This approach is illustrated in the diagram of FIG. 1. In FIG. 1 the sample stage 10 is a silicon wafer of high resistivity, onto which is patterned a pair of electrical contacts 12a and 12b. A small region 14 located between contacts 12a, 12b is boron-doped so as to make it electrically conductive. Electrical current passed from contact 12a to 12b (or vice versa) will cause resistive heating in region 14 depending upon the level of boron doping in region 14 and the magnitude of the electrical current applied. Using this technique, the heated region can be made as small as 100 microns or so. While excellent results have been obtained with this system, only the heater itself (or thin films applied to the heater) have been studied so far. The system is too small for routine mounting of larger easily-handled samples. Furthermore, expensive microfabrication procedures are required for fabrication of this heating system.
Another approach, described by W. J. Kulnis, Jr. et al. in "A Thermal Stage for Nanoscale Structure Studies With the Scanning Force Microscope", Mat. Res. Soc. Symp. Proc. Vol. 332, pp. 105-108 (1994), uses a small Peltier thermoelectric device to heat the sample. Peltier thermoelectric devices use electric currents to carry heat from one side of the device to another, and usually find application as small coolers. However, because heat is actively transported across the device, the device itself serves as an excellent `insulator`. The arrangement of the apparatus of W. K. Kulnis, Jr. et al. is shown in FIG. 2. In FIG. 2, a Peltier device 16 is glued onto an X-Y scanner 18 of a scanning probe microscope. A sample to be studied 20 is glued onto the hot side 22 of Peltier device 16, so that the whole assembly of Peltier device 16 and sample 20 is scanned under probe tip 24 of the scanning probe microscope. This arrangement is simple, however the heat applied to the sample 20 is removed from the cold side 26 of the Peltier device 16 causing thermal gradients at the scanner 18. The effect is small because much of the current applied to a Peltier device is consumed in Joule heating. However, a second limitation lies with the materials used to fabricate the Peltier device itself: the manufacturers of such devices recommend that they be run at temperatures below 60° C. to avoid damage to internal solder contacts and semiconductor elements, thus the available heating range is necessarily limited by this constraint to about 60° C. or less.
Yet another arrangement has been constructed by I. Musevic et al., in "Temperature controlled microstage for an atomic force microscope", Rev. Sci. Instrum. 67 (7), pp. 2554-2556 (July, 1996). The Musevic et al. arrangement is shown at FIG. 3. A heater assembly 28, consisting of a thin film 30 of indium-tin-oxide ("ITO") is coated onto the underside 32 of a glass slide 34, the underside 40 of which also serves as a support for a sample to be studied by a scanning probe microscope. Heat is developed in the heater assembly 28 by applying an electric current to a multicore, flexible copper wire (not shown) soldered to the ITO surface at diagonally facing corners of the ITO layer 30. The heater assembly 28 is mounted onto drops 36 of an epoxy adhesive which act as thermal insulating stand-off supports for the heater assembly 28 and hold it onto an X-Y scanner 38 of a scanning probe microscope. This arrangement is capable of heating the sample to higher temperatures than the Peltier-based heater of FIG. 2, but the entire thermal gradient must be sustained across the epoxy drops 36 and the air space between the ITO layer 30 and the scanner 38. The thermal gradient across these drops 36 results in excessive thermal drift for some applications. In addition, the inherently small size of drops 36 (typically about 2 mm in diameter) provides only very limited thermal isolation of the sample stage 40 from the rest of the microscope and thus the rest of the microscope is substantially radiatively heated when the stage is hot.
SUMMARY OF THE INVENTION
A heater for use in heating a sample stage of a microscope such as a scanning probe microscope is bonded to a sample stage which sits on a tube of a ceramic thermal insulator which is, in turn, mounted within or part of a tube of the same material. This re-entrant design provides an increased thermal path over straight line distances between the heater and the support structure for the sample stage and thus provides excellent thermal insulation, while also maximizing the thermal stability of the system.
OBJECTS AND ADVANTAGES OF THE INVENTION
Accordingly, it is an object and advantage of the present invention to provide a heated stage for a scanning probe microscope.
It is another object and advantage of the present invention to provide a heated sample stage for a microscope which, while operating in a room temperature and pressure environment is capable of heating samples to temperatures well in excess of one hundred degrees centigrade with minimal heating of the remainder of the microscope and minimum thermal drift of the assembly during heating.
Yet another object and advantage of the present invention is to provide a heated stage scanning probe microscope having a long thermal path between the heating element of the heated stage and other components of the microscope.
These and many other objects and advantages of the present invention will become apparent to those of ordinary skill in the art from a consideration of the drawings and ensuing description of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 depicts a silicon-based microfabricated sample stage according to the prior art.
FIG. 2 depicts a Peltier heater according to the prior art.
FIG. 3 depicts a thin-film heater according to the prior art.
FIG. 4 is an elevational section of a heated stage for a scanning probe microscope in accordance with a presently preferred embodiment of the present invention.
FIG. 5 is a top plan view of the heated stage of FIG. 4.
FIG. 6 is an elevational section of a heated stage for a scanning probe microscope in accordance with an alternative embodiment of the present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Those of ordinary skill in the art will realize that the following description of the present invention is illustrative only and is not intended to be in any way limiting. Other embodiments of the invention will readily suggest themselves to such skilled persons from an examination of the within disclosure.
The present invention in its preferred embodiment is illustrated in FIGS. 4-5. Turning now to FIG. 4, a thin film heater element 40 is bonded to the underside 42 of a sample stage 44. Heater 40 is, according to a presently preferred embodiment of the present invention, a commercially available device printed on a thin Kapton film. An example of such a device is the Thermofoil heater from Minco Products of Minneapolis, Minn. Those of ordinary skill in the art will recognize that other heater materials could used, such as mica or ceramic films. Sample stage 44 itself is ideally made from a metal of high thermal conductivity such as copper. This minimizes thermal gradients across stage 44 and results in more rapid thermal stabilization. The stage/heater assembly 46 is mounted onto a thermally insulating support element 48 (preferably fabricated of a ceramic material such as alumina or Macor™, a machinable ceramic product available from Dow Chemical Corporation). Thermally insulating support element 48 is attached directly to the sample stage 44 at the outer periphery 50 of underside 42 of assembly 46. This is preferably arranged so as to leave an air gap 52 between heater 40 and ring-shaped support portion 54 of element 48 and an air gap 56 between heater 40 and the bottom 57 of cavity 58. Air gaps 52 and 56 in conjunction with ring-shaped support portion 54 of element 48 provide a means for supporting stage/heater assembly 46 without permitting heater 40 to contact support portion 54. Since heater 40 is fabricated from a polymer film (Kapton) which creeps on heating, greater thermal stability is achieved by leaving heater 40 attached only by its top side to underside 42 of sample stage 44.
Turning now to FIG. 5, element 48 preferably includes two concentric rods or tubes 60, 62. According to a presently preferred embodiment of the present invention, elements 60, 62 are fabricated from a single ceramic insulating element 48 by cutting a circular gap or generally torroidally-shaped void 64 partially through it. Those of ordinary skill in the art will also realize that an insulating material could be cast or otherwise formed in this way without the need for a cutting step. Turning now to FIG. 4, in this way, heat must first flow down element 60 as illustrated by arrow 66 and then back up element 62 as illustrated by arrow 68. This arrangement confers two important advantages. First, given a thickness, L, of element 48, the thermal path is increased to approximately 2 L, resulting in improved insulation of heating element 40 from the rest of the microscope. Second, if the temperature drops across each element 60, 62 were equal, then the expansion of the inner element 60 would be exactly compensated by the expansion of outer element 62, providing that the entire assembly 70 is supported by upper surface 72 of support sheet 73. In practice, this ideal is not achieved, but partial compensation of thermal expansion is still achieved.
According to a presently preferred embodiment of the present invention, heater 40 is attached to a circular platen or support sheet 73 (FIG. 4) of a scanning probe microscope such as the PicoSPMO® available from the Molecular Imaging Corporation of Tempe, Ariz. In that microscope, the sample platen or support sheet 73 is suspended below the scanning tip 74 (which may be an AFM tip or an STM tip) by means of magnetic mounts 76 (magnetized balls) which extend downwardly from a suspension mechanism and attract platen 73 which is made of a material attracted by magnets such as steel or other well known magnetically attractive materials. In accordance with this presently preferred embodiment, the heater element 40 is generally circular in shape with a thickness of 0.01" and a diameter of 0.8". Sample stage 44 is generally circular in shape with a diameter of 1" and a thickness of 0.1" and is formed of copper. It is attached at its outer periphery to supports 54 of element 48 by means of screws. Element 48 is generally circular in shape with a vertical thickness of 0.8" and a diameter of 2.5". Element 48 is formed of Macor™. Cavity 58 is generally circular in shape and is 0.1" deep vertically and has a diameter of 0.7". Cavity 58 is preferably formed by machining, but it could be molded for higher volume applications. Generally torroidally-shaped void 64 begins at radius=0.5" and ends at radius=0.6" as measured from the centerline of element 48 and has a vertical depth of 0.7". Void 64 is also preferably formed by machining, but for higher volume applications could also be molded as known to those of ordinary skill in the art. Support sheet 73 is formed of magnetic stainless steel and is generally circular in shape with a thickness of 0.12" and a diameter of 2.5". It is attached to element 48 by means of screws.
Alternative Embodiments
Those of ordinary skill in the art will realize that more complex versions of this design can be used to improve the performance, i.e., by extending the thermal path between heater 40 and the rest of the microscope. For example, circular cuts could be made alternately into the upper and lower surfaces of a ceramic piece, each cut being at a somewhat different radius from the center of element 48 (element 48 need not be round and the cuts need not be round but could be any shape so as to achieve the increased thermal path--it could also be fabricated of subassemblies glued or otherwise attached to one another as would be readily appreciated by those of ordinary skill in the art). The device would be supported after the outermost cut and the sample stage lie within the innermost. N sections would give a thermal path of approximately N*L, thus greatly increasing the thermal isolation of heater 40. Furthermore, this type of approach would tend to produce a more even temperature gradient across the entire heater/insulator/support assembly.
An alternative embodiment of the invention in accordance with the discussion above is shown in FIG. 6. In this embodiment a total of three generally torroidally-shaped voids or air gaps 80, 82, 84 have been incorporated into the thermally insulating support element 48 at increasing radii from the center line 86 of thermally insulating support element 48 as shown. In this way, if the vertical thickness of element 48 is L, the thermal path from heater 40 to support sheet 73 is at least about 4 L (more, actually, if the radial distance travelled by the heat is taken into account). Thus, these simple structures provide a much improved mechanism for delivering stable heat to a sample under study.
Although illustrative presently preferred embodiments and applications of this invention are shown and described herein, many variations and modifications are possible which remain within the concept, scope, and spirit of the invention, and these variations would become clear to those of skill in the art after perusal of this application. The invention, therefore, is not to be limited except in the spirit of the appended claims.

Claims (9)

What is claimed is:
1. A scanning probe microscope including a heated stage, said heated stage comprising:
a support substrate having an upper surface and a lower surface, said upper surface adapted for supporting a sample under investigation by the scanning probe microscope;
an electrically powered heating element thermally coupled to at least a portion of said lower surface of said support substrate;
a thermally insulating support element engaged with said lower surface of said support substrate, said support element having a vertical thickness of L, said support element attached to the microscope at a plurality of peripheral points;
at least one generally torroidally-shaped void in said support element disposed so as to increase the distance within said support element between said heating element and said peripheral points to at least about 2 L or greater.
2. A scanning probe microscope according to claim 1 wherein said support substrate comprises copper.
3. A scanning probe microscope according to claim 1 wherein said support sheet comprises steel.
4. A removable heated stage for a scanning probe microscope, said stage comprising:
a support sheet of a material attracted by magnets adapted to be supported by magnets extending downwardly to engage an upper surface of said support sheet, said support sheet having an aperture therein;
a thermally insulating block coupled to a lower surface of said support sheet, said thermally insulating block having a generally torroidally-shaped air gap therein, said torroidally-shaped air gap having a center along a vertical axis of said air gap;
a support substrate accessible through said support sheet through said aperture and having an upper surface and a lower surface, said upper surface adapted for supporting a sample under investigation by the scanning probe microscope; and
an electrically powered heating element thermally coupled to at least a portion of said lower surface of said support substrate and supported by a portion of said thermally insulating block over said center.
5. A removable heated stage according to claim 4 wherein said support substrate comprises copper.
6. A removable heated stage according to claim 4 wherein said support sheet comprises steel.
7. A removable heated stage for a scanning probe microscope, said stage comprising:
a support sheet of a material attracted by magnets adapted to be supported by magnets extending downwardly to engage an upper surface of said support sheet, said support sheet having an aperture therein;
a thermally insulating block coupled to a lower surface of said support sheet, said thermally insulating block having a generally torroidally-shaped air gap therein, said torroidally-shaped air gap having a center along a vertical axis of said air gap;
a support substrate accessible through said aperture in said support sheet and having an upper surface and a lower surface, said upper surface adapted for supporting a sample under investigation by the scanning probe microscope; and
an electrically powered heating element thermally coupled to at least a portion of said lower surface of said support substrate and supported by a portion of said thermally insulating block over said center.
8. A removable heated stage according to claim 7 wherein said support substrate comprises copper.
9. A removable heated stage according to claim 7 wherein said support sheet comprises steel.
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US6185992B1 (en) 1999-07-15 2001-02-13 Veeco Instruments Inc. Method and system for increasing the accuracy of a probe-based instrument measuring a heated sample
US6490913B1 (en) 1995-05-19 2002-12-10 The United States Of America As Represented By The Secretary Of Commerce Humidity chamber for scanning stylus atomic force microscope with cantilever tracking
US6586734B2 (en) * 1998-08-03 2003-07-01 The Regents Of The University Of California Hyperbaric hydrothermal atomic force microscope
US20040047025A1 (en) * 2002-09-06 2004-03-11 Michel Moulin Electro-optic spatial modulator for high energy density
US20040083799A1 (en) * 2002-10-31 2004-05-06 Veeco Instruments, Inc. Environmental scanning probe microscope
US6734438B1 (en) 2001-06-14 2004-05-11 Molecular Imaging Corporation Scanning probe microscope and solenoid driven cantilever assembly
US20060054813A1 (en) * 2004-09-13 2006-03-16 Jeol Ltd. Method and system for inspecting specimen
US20070029480A1 (en) * 2005-08-03 2007-02-08 The University Of Chicago Integrated electron beam tip and sample heating device for a scanning tunneling microscope
US7183548B1 (en) * 2004-02-25 2007-02-27 Metadigm Llc Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision
US20080174862A1 (en) * 2007-01-22 2008-07-24 Focht Daniel C Specimen Holder For Microscopy
WO2009086319A3 (en) * 2007-12-21 2009-10-01 Protochips, Inc. Specimen mount for microscopy
US20100031403A1 (en) * 2006-08-11 2010-02-04 Nambition Gmbh Heat Coupling Device
US20110239336A1 (en) * 2010-03-19 2011-09-29 Brucker Nano, Inc. Low Drift Scanning Probe Microscope
US20120292528A1 (en) * 2009-11-27 2012-11-22 Hysitron, Inc. Micro electro-mechanical heater
US20130212750A1 (en) * 2012-02-10 2013-08-15 The National Institute Of Standards And Technology Zero thermal expansion, low heat transfer, variable temperature sample assembly for probe microscopy
JP2015501935A (en) * 2011-11-28 2015-01-19 ハイジトロン, インク.Hysitron, Inc. High temperature heating system
US9097737B2 (en) 2013-11-25 2015-08-04 Oxford Instruments Asylum Research, Inc. Modular atomic force microscope with environmental controls
US20160282243A1 (en) * 2015-03-23 2016-09-29 Nanomechanics, Inc. Structure For Achieving Dimensional Stability During Temperature Changes
US9476816B2 (en) 2011-11-14 2016-10-25 Hysitron, Inc. Probe tip heating assembly
US9829417B2 (en) 2012-06-13 2017-11-28 Hysitron, Inc. Environmental conditioning assembly for use in mechanical testing at micron or nano-scales

Citations (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4317036A (en) * 1980-03-11 1982-02-23 Wang Chia Gee Scanning X-ray microscope
US4343993A (en) * 1979-09-20 1982-08-10 International Business Machines Corporation Scanning tunneling microscope
US4591722A (en) * 1982-04-20 1986-05-27 The University Court Of The University Of Glasgow Low temperature stage for microanalysis
US4724318A (en) * 1985-11-26 1988-02-09 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4747698A (en) * 1986-04-30 1988-05-31 International Business Machines Corp. Scanning thermal profiler
US4785177A (en) * 1986-03-27 1988-11-15 Kernforschungsanlage Julich Gesellschaft Mit Beschrankter Haftung Kinematic arrangement for the micro-movements of objects
US4800274A (en) * 1987-02-02 1989-01-24 The Regents Of The University Of California High resolution atomic force microscope
US4806755A (en) * 1986-10-03 1989-02-21 International Business Machines Corporation Micromechanical atomic force sensor head
US4841148A (en) * 1988-03-21 1989-06-20 The Board Of Trustees Of The University Of Illinois Variable temperature scanning tunneling microscope
US4866271A (en) * 1986-07-11 1989-09-12 Agency Of Industrial Science And Technology Relative displacement control apparatus
US4868396A (en) * 1987-10-13 1989-09-19 Arizona Board Of Regents, Arizona State University Cell and substrate for electrochemical STM studies
US4871938A (en) * 1988-06-13 1989-10-03 Digital Instruments, Inc. Positioning device for a scanning tunneling microscope
US4877957A (en) * 1986-07-14 1989-10-31 Olympus Optical Co., Ltd. Scanning type tunnel microscope
US4894537A (en) * 1988-07-21 1990-01-16 Canadian Patents & Development Ltd. High stability bimorph scanning tunneling microscope
US4914293A (en) * 1988-03-04 1990-04-03 Kabushiki Kaisha Toshiba Microscope apparatus
US4947042A (en) * 1988-12-13 1990-08-07 Mitsubishi Denki Kabushiki Kaisha Tunnel unit and scanning head for scanning tunneling microscope
US4950900A (en) * 1988-03-10 1990-08-21 Sanyo Electric Co., Ltd. Heated infrared gas analyzer using a pyroelectric infrared sensor
USRE33387E (en) * 1985-11-26 1990-10-16 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4969978A (en) * 1987-11-27 1990-11-13 Seiko Instruments Inc. Apparatus and method for tunnel current measurement observed simultaneously with electrochemical measurement
US5013913A (en) * 1988-07-23 1991-05-07 Carl-Zeiss-Stiftung Method of illuminating an object in a transmission electron microscope
USRE33587E (en) * 1984-12-21 1991-05-14 General Electric Company Method for (prepolarizing and centering) operating a piezoceramic power switching device
US5023452A (en) * 1990-04-20 1991-06-11 Hughes Aircraft Company Method and apparatus for detecting trace contaminents
US5025658A (en) * 1989-11-28 1991-06-25 Digital Instruments, Inc. Compact atomic force microscope
US5047637A (en) * 1989-05-29 1991-09-10 Olympus Optical Co., Ltd. Atomic probe type microscope apparatus
US5077473A (en) * 1990-07-26 1991-12-31 Digital Instruments, Inc. Drift compensation for scanning probe microscopes using an enhanced probe positioning system
US5081390A (en) * 1990-08-13 1992-01-14 Digital Instruments, Inc. Method of operating a scanning probe microscope to improve drift characteristics
US5103095A (en) * 1990-05-23 1992-04-07 Digital Instruments, Inc. Scanning probe microscope employing adjustable tilt and unitary head
US5106729A (en) * 1989-07-24 1992-04-21 Arizona Board Of Regents Acting On Behalf Of Arizona State University Method for visualizing the base sequence of nucleic acid polymers
US5120959A (en) * 1989-01-31 1992-06-09 Seiko Instruments Inc. Apparatus for simultaneously effecting electrochemical measurement and measurement of tunneling current and tunnel probe therefor
US5144833A (en) * 1990-09-27 1992-09-08 International Business Machines Corporation Atomic force microscopy
US5155715A (en) * 1989-01-13 1992-10-13 Sharp Kabushiki Kaisha Reproducing apparatus
US5157251A (en) * 1991-03-13 1992-10-20 Park Scientific Instruments Scanning force microscope having aligning and adjusting means
US5166615A (en) * 1991-02-11 1992-11-24 The Board Of Regents Of The University Of Washington System for detecting nuclear magnetic resonance signals from small samples
US5172002A (en) * 1991-08-22 1992-12-15 Wyko Corporation Optical position sensor for scanning probe microscopes
US5189906A (en) * 1989-11-28 1993-03-02 Digital Instruments, Inc. Compact atomic force microscope
US5200616A (en) * 1990-12-20 1993-04-06 Shimadzu Corporation Environment controllable scanning probe microscope
US5202004A (en) * 1989-12-20 1993-04-13 Digital Instruments, Inc. Scanning electrochemical microscopy
US5224376A (en) * 1989-12-08 1993-07-06 Digital Instruments, Inc. Atomic force microscope
USRE34331E (en) * 1988-07-06 1993-08-03 Digital Instruments, Inc. Feedback control for scanning tunnel microscopes
US5247186A (en) * 1991-05-14 1993-09-21 Olympus Optical Co., Ltd. Integrated optical displacement sensor
US5253516A (en) * 1990-05-23 1993-10-19 Digital Instruments, Inc. Atomic force microscope for small samples having dual-mode operating capability
US5260577A (en) * 1992-11-09 1993-11-09 International Business Machines Corp. Sample carriage for scanning probe microscope
US5260824A (en) * 1989-04-24 1993-11-09 Olympus Optical Co., Ltd. Atomic force microscope
USRE34489E (en) * 1989-03-13 1993-12-28 The Regents Of The University Of California Atomic force microscope with optional replaceable fluid cell
JPH0659004A (en) * 1992-08-10 1994-03-04 Hitachi Ltd Scanning type surface magnetic microscope
US5291775A (en) * 1992-03-04 1994-03-08 Topometrix Scanning force microscope with integrated optics and cantilever mount
US5294804A (en) * 1992-03-11 1994-03-15 Olympus Optical Co., Ltd. Cantilever displacement detection apparatus
US5296704A (en) * 1989-10-02 1994-03-22 Olympus Optical Co., Ltd. Scanning tunneling microscope
US5307693A (en) * 1993-01-21 1994-05-03 At&T Bell Laboratories Force-sensing system, including a magnetically mounted rocking element
US5314254A (en) * 1992-11-03 1994-05-24 Digital Instruments Stiffness enhancer for movable stage assembly
US5317153A (en) * 1991-08-08 1994-05-31 Nikon Corporation Scanning probe microscope
US5319960A (en) * 1992-03-06 1994-06-14 Topometrix Scanning force microscope
US5325010A (en) * 1988-07-03 1994-06-28 Forschungszentrum Julich Gmbh Micromanipulator
US5357105A (en) * 1993-11-09 1994-10-18 Quesant Instrument Corporation Light modulated detection system for atomic force microscopes
US5363697A (en) * 1991-04-30 1994-11-15 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope, molecular processing method using the scanning probe microscope and DNA base arrangement detecting method
US5381101A (en) * 1992-12-02 1995-01-10 The Board Of Trustees Of The Leland Stanford Junior University System and method of measuring high-speed electrical waveforms using force microscopy and offset sampling frequencies
US5388452A (en) * 1993-10-15 1995-02-14 Quesant Instrument Corporation Detection system for atomic force microscopes
US5410910A (en) * 1993-12-22 1995-05-02 University Of Virginia Patent Foundation Cryogenic atomic force microscope
US5438206A (en) * 1993-06-02 1995-08-01 Matsushita Electric Industrial Co., Ltd. Positioning device
US5461907A (en) * 1993-03-23 1995-10-31 Regents Of The University Of California Imaging, cutting, and collecting instrument and method
US5468959A (en) * 1993-03-19 1995-11-21 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope and method for measuring surfaces by using this microscope
US5481521A (en) * 1993-09-01 1996-01-02 Canon Kabushiki Kaisha Information recording and reproducing apparatus utilizing a tunneling current or interatomic forces
US5497000A (en) * 1994-01-27 1996-03-05 The United States Of America As Represented By The Secretary Of The Navy Method of electrochemical detection/identification of single organic molecules using scanning tunneling microscopy
US5504366A (en) * 1992-07-17 1996-04-02 Biotechnology Research And Development Corp. System for analyzing surfaces of samples
US5654546A (en) * 1995-11-07 1997-08-05 Molecular Imaging Corporation Variable temperature scanning probe microscope based on a peltier device

Patent Citations (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4343993A (en) * 1979-09-20 1982-08-10 International Business Machines Corporation Scanning tunneling microscope
US4317036A (en) * 1980-03-11 1982-02-23 Wang Chia Gee Scanning X-ray microscope
US4591722A (en) * 1982-04-20 1986-05-27 The University Court Of The University Of Glasgow Low temperature stage for microanalysis
USRE33587E (en) * 1984-12-21 1991-05-14 General Electric Company Method for (prepolarizing and centering) operating a piezoceramic power switching device
US4724318A (en) * 1985-11-26 1988-02-09 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
USRE33387E (en) * 1985-11-26 1990-10-16 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4785177A (en) * 1986-03-27 1988-11-15 Kernforschungsanlage Julich Gesellschaft Mit Beschrankter Haftung Kinematic arrangement for the micro-movements of objects
US4747698A (en) * 1986-04-30 1988-05-31 International Business Machines Corp. Scanning thermal profiler
US4866271A (en) * 1986-07-11 1989-09-12 Agency Of Industrial Science And Technology Relative displacement control apparatus
US4877957A (en) * 1986-07-14 1989-10-31 Olympus Optical Co., Ltd. Scanning type tunnel microscope
US4806755A (en) * 1986-10-03 1989-02-21 International Business Machines Corporation Micromechanical atomic force sensor head
US4800274A (en) * 1987-02-02 1989-01-24 The Regents Of The University Of California High resolution atomic force microscope
US4868396A (en) * 1987-10-13 1989-09-19 Arizona Board Of Regents, Arizona State University Cell and substrate for electrochemical STM studies
US4969978A (en) * 1987-11-27 1990-11-13 Seiko Instruments Inc. Apparatus and method for tunnel current measurement observed simultaneously with electrochemical measurement
US4914293A (en) * 1988-03-04 1990-04-03 Kabushiki Kaisha Toshiba Microscope apparatus
US4950900A (en) * 1988-03-10 1990-08-21 Sanyo Electric Co., Ltd. Heated infrared gas analyzer using a pyroelectric infrared sensor
US4841148A (en) * 1988-03-21 1989-06-20 The Board Of Trustees Of The University Of Illinois Variable temperature scanning tunneling microscope
US4871938A (en) * 1988-06-13 1989-10-03 Digital Instruments, Inc. Positioning device for a scanning tunneling microscope
US5325010A (en) * 1988-07-03 1994-06-28 Forschungszentrum Julich Gmbh Micromanipulator
USRE34331E (en) * 1988-07-06 1993-08-03 Digital Instruments, Inc. Feedback control for scanning tunnel microscopes
US4894537A (en) * 1988-07-21 1990-01-16 Canadian Patents & Development Ltd. High stability bimorph scanning tunneling microscope
US5013913A (en) * 1988-07-23 1991-05-07 Carl-Zeiss-Stiftung Method of illuminating an object in a transmission electron microscope
US4947042A (en) * 1988-12-13 1990-08-07 Mitsubishi Denki Kabushiki Kaisha Tunnel unit and scanning head for scanning tunneling microscope
US5155715A (en) * 1989-01-13 1992-10-13 Sharp Kabushiki Kaisha Reproducing apparatus
US5120959A (en) * 1989-01-31 1992-06-09 Seiko Instruments Inc. Apparatus for simultaneously effecting electrochemical measurement and measurement of tunneling current and tunnel probe therefor
USRE34489F1 (en) * 1989-03-13 1999-12-14 Univ California Atomic force microscope with optimal replacement fluid cell
USRE34489E (en) * 1989-03-13 1993-12-28 The Regents Of The University Of California Atomic force microscope with optional replaceable fluid cell
US5260824A (en) * 1989-04-24 1993-11-09 Olympus Optical Co., Ltd. Atomic force microscope
US5047637A (en) * 1989-05-29 1991-09-10 Olympus Optical Co., Ltd. Atomic probe type microscope apparatus
US5106729A (en) * 1989-07-24 1992-04-21 Arizona Board Of Regents Acting On Behalf Of Arizona State University Method for visualizing the base sequence of nucleic acid polymers
US5296704A (en) * 1989-10-02 1994-03-22 Olympus Optical Co., Ltd. Scanning tunneling microscope
US5189906A (en) * 1989-11-28 1993-03-02 Digital Instruments, Inc. Compact atomic force microscope
US5025658A (en) * 1989-11-28 1991-06-25 Digital Instruments, Inc. Compact atomic force microscope
US5224376A (en) * 1989-12-08 1993-07-06 Digital Instruments, Inc. Atomic force microscope
US5202004A (en) * 1989-12-20 1993-04-13 Digital Instruments, Inc. Scanning electrochemical microscopy
US5023452A (en) * 1990-04-20 1991-06-11 Hughes Aircraft Company Method and apparatus for detecting trace contaminents
US5253516A (en) * 1990-05-23 1993-10-19 Digital Instruments, Inc. Atomic force microscope for small samples having dual-mode operating capability
US5103095A (en) * 1990-05-23 1992-04-07 Digital Instruments, Inc. Scanning probe microscope employing adjustable tilt and unitary head
US5077473A (en) * 1990-07-26 1991-12-31 Digital Instruments, Inc. Drift compensation for scanning probe microscopes using an enhanced probe positioning system
US5081390A (en) * 1990-08-13 1992-01-14 Digital Instruments, Inc. Method of operating a scanning probe microscope to improve drift characteristics
US5144833A (en) * 1990-09-27 1992-09-08 International Business Machines Corporation Atomic force microscopy
US5200616A (en) * 1990-12-20 1993-04-06 Shimadzu Corporation Environment controllable scanning probe microscope
US5166615A (en) * 1991-02-11 1992-11-24 The Board Of Regents Of The University Of Washington System for detecting nuclear magnetic resonance signals from small samples
US5157251A (en) * 1991-03-13 1992-10-20 Park Scientific Instruments Scanning force microscope having aligning and adjusting means
US5363697A (en) * 1991-04-30 1994-11-15 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope, molecular processing method using the scanning probe microscope and DNA base arrangement detecting method
US5247186A (en) * 1991-05-14 1993-09-21 Olympus Optical Co., Ltd. Integrated optical displacement sensor
US5317153A (en) * 1991-08-08 1994-05-31 Nikon Corporation Scanning probe microscope
US5172002A (en) * 1991-08-22 1992-12-15 Wyko Corporation Optical position sensor for scanning probe microscopes
US5291775A (en) * 1992-03-04 1994-03-08 Topometrix Scanning force microscope with integrated optics and cantilever mount
US5319960A (en) * 1992-03-06 1994-06-14 Topometrix Scanning force microscope
US5294804A (en) * 1992-03-11 1994-03-15 Olympus Optical Co., Ltd. Cantilever displacement detection apparatus
US5504366A (en) * 1992-07-17 1996-04-02 Biotechnology Research And Development Corp. System for analyzing surfaces of samples
JPH0659004A (en) * 1992-08-10 1994-03-04 Hitachi Ltd Scanning type surface magnetic microscope
US5314254A (en) * 1992-11-03 1994-05-24 Digital Instruments Stiffness enhancer for movable stage assembly
US5260577A (en) * 1992-11-09 1993-11-09 International Business Machines Corp. Sample carriage for scanning probe microscope
US5381101A (en) * 1992-12-02 1995-01-10 The Board Of Trustees Of The Leland Stanford Junior University System and method of measuring high-speed electrical waveforms using force microscopy and offset sampling frequencies
US5307693A (en) * 1993-01-21 1994-05-03 At&T Bell Laboratories Force-sensing system, including a magnetically mounted rocking element
US5468959A (en) * 1993-03-19 1995-11-21 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope and method for measuring surfaces by using this microscope
US5461907A (en) * 1993-03-23 1995-10-31 Regents Of The University Of California Imaging, cutting, and collecting instrument and method
US5438206A (en) * 1993-06-02 1995-08-01 Matsushita Electric Industrial Co., Ltd. Positioning device
US5481521A (en) * 1993-09-01 1996-01-02 Canon Kabushiki Kaisha Information recording and reproducing apparatus utilizing a tunneling current or interatomic forces
US5388452A (en) * 1993-10-15 1995-02-14 Quesant Instrument Corporation Detection system for atomic force microscopes
US5357105A (en) * 1993-11-09 1994-10-18 Quesant Instrument Corporation Light modulated detection system for atomic force microscopes
US5410910A (en) * 1993-12-22 1995-05-02 University Of Virginia Patent Foundation Cryogenic atomic force microscope
US5497000A (en) * 1994-01-27 1996-03-05 The United States Of America As Represented By The Secretary Of The Navy Method of electrochemical detection/identification of single organic molecules using scanning tunneling microscopy
US5654546A (en) * 1995-11-07 1997-08-05 Molecular Imaging Corporation Variable temperature scanning probe microscope based on a peltier device

Non-Patent Citations (40)

* Cited by examiner, † Cited by third party
Title
Binnig, G., et al., "Single-tube three-dimensional scanner for scanning tunneling microscopy", Review of Scientific Instruments, Aug. 1986, vol. 57, No. 8, pp. 1688-1689.
Binnig, G., et al., Single tube three dimensional scanner for scanning tunneling microscopy , Review of Scientific Instruments, Aug. 1986, vol. 57, No. 8, pp. 1688 1689. *
Brede, M., et al., "Brittle crack propagation in silicon single crystals", Journal of Applied Physics, Jul. 15, 1991, vol. 70, No. 2, pp. 758-771.
Brede, M., et al., Brittle crack propagation in silicon single crystals , Journal of Applied Physics, Jul. 15, 1991, vol. 70, No. 2, pp. 758 771. *
Davidsson, P., et al., "A new symmetric scanning tunneling microscope design", Journal of Vacuum Science & Technology: Part A, Mar./Apr. 1988, No. 2, pp. 380-382.
Davidsson, P., et al., A new symmetric scanning tunneling microscope design , Journal of Vacuum Science & Technology: Part A, Mar./Apr. 1988, No. 2, pp. 380 382. *
Drake, B., et al., "Imaging Crystals, Polymers, and Processes in Water with the Atomic Force Microscope", Science, vol. 243, pp. 1586-1589.
Drake, B., et al., Imaging Crystals, Polymers, and Processes in Water with the Atomic Force Microscope , Science, vol. 243, pp. 1586 1589. *
Hamers, et al., "A scanning tunneling microscopy study of the reaction of si(001)-(2X1) with NH3 ", J. Vac. Sci.Technol., Mar./Apr. 1988, A, vol. 6. No. 3, pp. 508-511.
Hamers, et al., A scanning tunneling microscopy study of the reaction of si(001) (2X1) with NH 3 , J. Vac. Sci.Technol., Mar./Apr. 1988, A, vol. 6. No. 3, pp. 508 511. *
Hansma, P.K., et al., Article (untitled) from Journal of Applied Physics, Jul. 15, 1994, vol. 76, No. 2, pp. 796 799. *
Hansma, P.K., et al., Article (untitled) from Journal of Applied Physics, Jul. 15, 1994, vol. 76, No. 2, pp. 796-799.
Jarvis, S.P., et al., "A novel force microscope and point contact probe", Review of Scientific Instruments, Dec. 1993, vol. 64, No. 12. pp. 3515-3520.
Jarvis, S.P., et al., A novel force microscope and point contact probe , Review of Scientific Instruments, Dec. 1993, vol. 64, No. 12. pp. 3515 3520. *
Jung, P.S., et al., "Novel Stationary-Sample Atomic Force Microscope with Beam-Tracking Lens", Electronics Letters, Feb. 4, 1993, vol. 29, No. 3, pp. 264-265.
Jung, P.S., et al., Novel Stationary Sample Atomic Force Microscope with Beam Tracking Lens , Electronics Letters, Feb. 4, 1993, vol. 29, No. 3, pp. 264 265. *
Kirk, M.D., et al., "Low-temperature atomic force microscopy", Review of Scientific Instruments, Jun. 1988, vol. 59, No. 6, pp. 833-835.
Kirk, M.D., et al., Low temperature atomic force microscopy , Review of Scientific Instruments, Jun. 1988, vol. 59, No. 6, pp. 833 835. *
Lindsay, S.M., et al., "Scanning tunneling microscopy and atomic force microscopy studies of biomaterials at a liquid-solid interface", Journal of Vacuum Science Technology/ Jul./Aug. 1993, vol. 11. No. 4, pp. 808-815.
Lindsay, S.M., et al., Scanning tunneling microscopy and atomic force microscopy studies of biomaterials at a liquid solid interface , Journal of Vacuum Science Technology/ Jul./Aug. 1993, vol. 11. No. 4, pp. 808 815. *
Marti, O., et al., "Atomic force microscopy of liquid-covered surfaces: Atomic resolution images", Applied Physics Letters, Aug. 17, 1987, vol. 51, No. 7, pp. 484-486.
Marti, O., et al., Atomic force microscopy of liquid covered surfaces: Atomic resolution images , Applied Physics Letters, Aug. 17, 1987, vol. 51, No. 7, pp. 484 486. *
Martin, Y., et al., "Atomic force microscope-force mapping and profiling on a sub 100-Å scale", Journal of Applied Physics, May 15, 1987, vol. 61, No. 10, pp. 4723-4729.
Martin, Y., et al., Atomic force microscope force mapping and profiling on a sub 100 scale , Journal of Applied Physics, May 15, 1987, vol. 61, No. 10, pp. 4723 4729. *
Mou, Jianxun, et al., "An optical detection low temperature atomic force microscope at ambient pressure for biological research", Review of Scientific Instruments, Jun. 1993, vol. 64, No. 6, pp. 1483-1487.
Mou, Jianxun, et al., An optical detection low temperature atomic force microscope at ambient pressure for biological research , Review of Scientific Instruments, Jun. 1993, vol. 64, No. 6, pp. 1483 1487. *
Ohnesorge, F., et al., "True Atomic Resolution by Atomic Force Microscopy Through Repulsive and Attractive Forces", Science, Jun. 4, 1993, vol. 260, pp. 1451-1456.
Ohnesorge, F., et al., True Atomic Resolution by Atomic Force Microscopy Through Repulsive and Attractive Forces , Science, Jun. 4, 1993, vol. 260, pp. 1451 1456. *
Sonnenfeld, Richard, et al., "Atomic-Resolution Microscopy in Water", Science, Apr. 11, 1986, vol. 232, pp. 211-213.
Sonnenfeld, Richard, et al., "Semiconductor topography in aqueous environments: Tunneling microscope of chemomechanically polished (001) GaAs", Applied Physics Letters, Jun. 15, 1987, vol. 50, No. 24, pp. 1742-1744.
Sonnenfeld, Richard, et al., Atomic Resolution Microscopy in Water , Science, Apr. 11, 1986, vol. 232, pp. 211 213. *
Sonnenfeld, Richard, et al., Semiconductor topography in aqueous environments: Tunneling microscope of chemomechanically polished (001) GaAs , Applied Physics Letters, Jun. 15, 1987, vol. 50, No. 24, pp. 1742 1744. *
Specht, Martin, et al., "Simultaneous measurement of tunneling current and force as a function of position through a lipid film on a solid substrate", Surface Science Letters, 1991, vol. 257, pp. L653-L-658.
Specht, Martin, et al., Simultaneous measurement of tunneling current and force as a function of position through a lipid film on a solid substrate , Surface Science Letters, 1991, vol. 257, pp. L653 L 658. *
Stewart, A.M., et al., "Use of magnetic forces to conttol distance in a surface force apparatus".
Stewart, A.M., et al., Use of magnetic forces to conttol distance in a surface force apparatus . *
Travaglini, G., et al., "Scanning Tunneling Microscopy on a Biological Matter", Surface Science, 1987, vol. 181. pp. 380-390.
Travaglini, G., et al., Scanning Tunneling Microscopy on a Biological Matter , Surface Science, 1987, vol. 181. pp. 380 390. *
Yang, Jie, et al., "Atomic force microscopy of DNA molecules", 1992 Federation of European Biochemical Secoeties, Apr. 1992, vol. 301, No. 2, pp. 173-176.
Yang, Jie, et al., Atomic force microscopy of DNA molecules , 1992 Federation of European Biochemical Secoeties, Apr. 1992, vol. 301, No. 2, pp. 173 176. *

Cited By (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490913B1 (en) 1995-05-19 2002-12-10 The United States Of America As Represented By The Secretary Of Commerce Humidity chamber for scanning stylus atomic force microscope with cantilever tracking
US6586734B2 (en) * 1998-08-03 2003-07-01 The Regents Of The University Of California Hyperbaric hydrothermal atomic force microscope
US6389886B2 (en) 1999-07-15 2002-05-21 Veeco Instruments Inc. Method and system for increasing the accuracy of a probe-based instrument measuring a heated sample
US6185992B1 (en) 1999-07-15 2001-02-13 Veeco Instruments Inc. Method and system for increasing the accuracy of a probe-based instrument measuring a heated sample
US6734438B1 (en) 2001-06-14 2004-05-11 Molecular Imaging Corporation Scanning probe microscope and solenoid driven cantilever assembly
US6798559B2 (en) 2002-09-06 2004-09-28 Kodak Polychrome Graphics Llc Electro-optic spatial modulator for high energy density
US20040047025A1 (en) * 2002-09-06 2004-03-11 Michel Moulin Electro-optic spatial modulator for high energy density
WO2004023198A1 (en) * 2002-09-06 2004-03-18 Kodak Polychrome Graphics, Llc Electro-optic spatial modulator for high energy density
US7076996B2 (en) 2002-10-31 2006-07-18 Veeco Instruments Inc. Environmental scanning probe microscope
US20040083799A1 (en) * 2002-10-31 2004-05-06 Veeco Instruments, Inc. Environmental scanning probe microscope
US7183548B1 (en) * 2004-02-25 2007-02-27 Metadigm Llc Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision
US7514680B1 (en) 2004-02-25 2009-04-07 Metadigm Llc Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision
US20060054813A1 (en) * 2004-09-13 2006-03-16 Jeol Ltd. Method and system for inspecting specimen
US7388365B2 (en) * 2004-09-13 2008-06-17 Jeol Ltd. Method and system for inspecting specimen
US20070029480A1 (en) * 2005-08-03 2007-02-08 The University Of Chicago Integrated electron beam tip and sample heating device for a scanning tunneling microscope
US7427755B2 (en) * 2005-08-03 2008-09-23 Uchicago Argonne, Llc Integrated electron beam tip and sample heating device for a scanning tunneling microscope
US20100031403A1 (en) * 2006-08-11 2010-02-04 Nambition Gmbh Heat Coupling Device
US20080174862A1 (en) * 2007-01-22 2008-07-24 Focht Daniel C Specimen Holder For Microscopy
US9064672B2 (en) 2007-12-21 2015-06-23 Protochips, Inc. Specimen mount for microscopy
WO2009086319A3 (en) * 2007-12-21 2009-10-01 Protochips, Inc. Specimen mount for microscopy
US20110032611A1 (en) * 2007-12-21 2011-02-10 Protochips, Inc. Specimen mount for microscopy
US9316569B2 (en) * 2009-11-27 2016-04-19 Hysitron, Inc. Micro electro-mechanical heater
US20120292528A1 (en) * 2009-11-27 2012-11-22 Hysitron, Inc. Micro electro-mechanical heater
US9759641B2 (en) 2009-11-27 2017-09-12 Hysitron, Inc. Micro electro-mechanical heater
US20150074859A1 (en) * 2010-03-19 2015-03-12 Bruker Nano, Inc. Low Drift Scanning Probe Microscope
US8869310B2 (en) * 2010-03-19 2014-10-21 Bruker Nano, Inc. Low drift scanning probe microscope
US9116168B2 (en) * 2010-03-19 2015-08-25 Bruker Nano, Inc. Low drift scanning probe microscope
US20110239336A1 (en) * 2010-03-19 2011-09-29 Brucker Nano, Inc. Low Drift Scanning Probe Microscope
US9476816B2 (en) 2011-11-14 2016-10-25 Hysitron, Inc. Probe tip heating assembly
US9804072B2 (en) 2011-11-28 2017-10-31 Hysitron, Inc. High temperature heating system
US10241017B2 (en) 2011-11-28 2019-03-26 Bruker Nano, Inc. High temperature heating system
JP2015501935A (en) * 2011-11-28 2015-01-19 ハイジトロン, インク.Hysitron, Inc. High temperature heating system
US20130212750A1 (en) * 2012-02-10 2013-08-15 The National Institute Of Standards And Technology Zero thermal expansion, low heat transfer, variable temperature sample assembly for probe microscopy
US8763161B2 (en) * 2012-02-10 2014-06-24 The United States of America, as represented by the Secretary of Commerce, The National Institute of Standards and Technology Zero thermal expansion, low heat transfer, variable temperature sample assembly for probe microscopy
US9829417B2 (en) 2012-06-13 2017-11-28 Hysitron, Inc. Environmental conditioning assembly for use in mechanical testing at micron or nano-scales
US9581616B2 (en) 2013-11-25 2017-02-28 Oxford Instruments Asylum Research, Inc Modular atomic force microscope with environmental controls
US9097737B2 (en) 2013-11-25 2015-08-04 Oxford Instruments Asylum Research, Inc. Modular atomic force microscope with environmental controls
US10416190B2 (en) 2013-11-25 2019-09-17 Oxford Instruments Asylum Research Inc Modular atomic force microscope with environmental controls
US20160282243A1 (en) * 2015-03-23 2016-09-29 Nanomechanics, Inc. Structure For Achieving Dimensional Stability During Temperature Changes
CN107835943A (en) * 2015-03-23 2018-03-23 纳米力学有限公司 Realize the structure of the dimensional stability during temperature change
US10168261B2 (en) * 2015-03-23 2019-01-01 Kla-Tencor Corporation Structure for achieving dimensional stability during temperature changes

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