US5494978A - Modified polysilazane and process for preparation thereof - Google Patents

Modified polysilazane and process for preparation thereof Download PDF

Info

Publication number
US5494978A
US5494978A US08/346,845 US34684594A US5494978A US 5494978 A US5494978 A US 5494978A US 34684594 A US34684594 A US 34684594A US 5494978 A US5494978 A US 5494978A
Authority
US
United States
Prior art keywords
mixture
molecular weight
nitrogen
blown
maintained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US08/346,845
Inventor
Yasuo Shimizu
Yuuji Tashiro
Hiroyuki Aoki
Masaaki Ichiyama
Hayato Nishii
Toshihide Kishi
Kouji Okuda
Takeshi Isoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Tonen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tonen Corp filed Critical Tonen Corp
Priority to US08/346,845 priority Critical patent/US5494978A/en
Application granted granted Critical
Publication of US5494978A publication Critical patent/US5494978A/en
Assigned to TONENGENERAL SEKIYU KABUSHIKI KAISHA reassignment TONENGENERAL SEKIYU KABUSHIKI KAISHA MERGER (SEE DOCUMENT FOR DETAILS). Assignors: TONEN CORPORATION
Assigned to CLARIANT INTERNATIONAL, LTD. reassignment CLARIANT INTERNATIONAL, LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TONENGENERAL SEKIYU K.K.
Assigned to AZ ELECTRONIC MATERIALS USA CORP. reassignment AZ ELECTRONIC MATERIALS USA CORP. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CLARIANT INTERNATIONAL LTD
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/62Nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
    • C04B35/589Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained from Si-containing polymer precursors or organosilicon monomers

Definitions

  • the present invention relates to a modified polysilazane. More particularly, the present invention relates to a modified polysilazane stabilized by reacting an inorganic polysilazane with an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, an alkylamine, an alkylsilazane or an alkylaminosilane, and a process for the preparation thereof.
  • Silicon nitride and silicon nitride-containing ceramics formed through a polysilazane as a precursor have an excellent high-temperature strength, thermal shock resistance and oxidation resistance, and therefore, are widely used as construction materials and functional materials in various industrial fields.
  • a polysilazane is valuable as a precursor polymer for silicon nitride ceramics.
  • the polysilazane is soluble in solvents, has an excellent moldability, and gives a high yield of ceramics, and further, is characterized in that the purity of ceramics after firing is high.
  • a polysilazane can be prepared by reacting a halosilane with a Lewis base and reacting the obtained complex compound with ammonia (see, for example, Japanese Examined Patent Publication No. 63-16325).
  • a polysilazane especially an inorganic polysilazane, has a low chemical stability, and an increase of the molecular weight and gelation readily occur, and accordingly, the handling property is poor.
  • the stability of the polysilazane and the molecular structure thereof can be controlled to some extent by changing the kind of the halosilane used as the starting material of the polysilazane or changing the mixing ratio of at least two halosilanes, but this control is limited and difficult. Accordingly, the polysilazane is defective in that the handling thereof is poor, and the properties of ceramics by high-temperature firing are not uniform.
  • the above-mentioned problem is solved by preparing a modified polysilazane by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with at least one compound selected from the group consisting of an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane represented by the following general formula: ##STR1## wherein groups R independently represent an alkyl group or ##STR2## in which groups R' independently represent an alkyl group or a hydrogen atom, with the proviso that at least one of the groups R' is not a hydrogen atom.
  • An inorganic polysilazane is a polysilazane in which all side chains are composed of hydrogens and no organic group is contained.
  • the process for preparing this inorganic polysilazane is not particularly critical.
  • an inorganic polysilazane prepared according to the process disclosed in the above-mentioned Japanese Examined Patent Publication No. 63-16325 can be used.
  • the molecular weight is not particularly critical, and the molecular weight can be within a range of from about 100 to about 100,000.
  • An inorganic polysilazane having a higher molecular weight is easily gelled and has a poor handling. Accordingly, this inorganic polysilazane can be effectively treated according to the present invention.
  • the other reactant to be reacted with the inorganic polysilazane there can be mentioned an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane.
  • the above reactants such as alcohol can be represented by the general formulae: R--OH, R--COOH, R--COOR', R--CO--R', R--CHO, RNCO, RCONH 2 , RSH, where R and R' are preferably hydrocarbon groups having 1 to 10 carbon atoms.
  • R and R' are preferably hydrocarbon groups having 1 to 10 carbon atoms.
  • the alkylamine, alkylsilazane or alkylaminosilane is represented by the formula appeared before.
  • Examples of the preferred alcohol are CH 3 OH (methanol), C 2 H 5 OH (ethanol), n-C 3 H 7 OH (n-propanol), n-C 4 H 9 OH (n-batanol), n-C 5 H 11 (n-pentanol), n-C 6 H 13 (n-hexanol), n-C 7 H 15 OH (n-heptanol), and n-C 8 H 17 OH (n-octanol).
  • the reaction molar ratio between the inorganic polysilazane and the reactant such as an alcohol depends on the kind of the starting inorganic polysilazane and desired properties of the modified polysilazane, but preferably this molar ratio is from 50/50 to 99.99/0.01, more preferably from 80/20 to 98/2. If the proportion of the reactant such as an alcohol is too large, the preferred properties of the polysilazane are lost and, for example, the yield of ceramics is reduced.
  • the inorganic polysilazane is reacted with the reactant such as an alcohol in a basic solvent, although the present invention is not limited to this feature.
  • the basic solvent pyridine, picoline, trimethylphosphine, methyldiethylphosphine, triethylphosphine, thiophene, furan, and dioxane are preferably used. Pyridine and picoline are especially preferably used in view of the handling property and from the economical viewpoint.
  • the reaction temperature is from 0° to the boiling point of the solvent, and an inert gas such as nitrogen or argon is used as the reaction atmosphere.
  • a reactant such as an alcohol
  • the basic solvent is replaced by a non-reactive solvent capable of dissolving the polysilazane therein.
  • a non-reactive solvent toluene and xylene can be used.
  • the thus-prepared modified polysilazane has a structure in which parts of hydrogen on the ends and side chains of the inorganic polysilazane are substituted with --OR, etc.
  • --OR etc.
  • a process for the preparation of a modified polysilazane which comprises reacting an organic polysilazane having a molecular weight of about 100 to about 100,000 with at least one compound selected from the group consisting of an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane represented by the following general formula: ##STR3## wherein groups R independently represent an alkyl group or ##STR4## in which groups R' independently represent an alkyl group or a hydrogen atom, with the proviso that at least one of the groups R' is not a hydrogen atom.
  • the polysilazane is modified, and therefore, the molecular structure can be easily controlled. Since the formed modified polysilazane has an improved chemical stability compared to the unmodified inorganic polysilazane, the modified polysilazane has an excellent handling property. Moreover, an unevenness of the properties of ceramics obtained by firing is reduced. Further, since the molecular structure of the polysilazane can be controlled, the purity and heat resistance of ceramics obtained by firing also can be controlled.
  • FIG. 1 illustrates an apparatus for synthesizing a polysilazane, as used in the examples of the present invention
  • FIG. 2 is an IR chart of the polysilazane of Example 11.
  • FIG. 3 is an IR chart of the modified polysilazane of Example 11.
  • reference numeral 1 represents a reaction vessel
  • reference numeral 2 represents a constant-temperature bath
  • reference numeral 3 represents a heater
  • reference numeral 4 represents a temperature sensor
  • reference numeral 6 represents pyridine
  • reference numeral 7 represents a nitrogen current
  • reference numeral 8 represents dichlorosilane
  • reference numeral 9 represents an additive
  • reference numeral 10 represents ammonia
  • reference numeral 11 represents a vent.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C. 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.
  • the inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel.
  • the mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring.
  • dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate.
  • This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Polymers (AREA)

Abstract

A stabilized polysilazane obtained by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with an alcohol, an organic acid, an ester, a ketone, an aldehyde, a mercaptan, or an alkysilazane preferably at a molar ratio of from 50/50 to 99.99/0.01 is described.

Description

This application is a continuation of application Ser. No. 08/082,013, filed Jun. 23, 1993 now abandoned, which is a continuation of application Ser. No. 816,378, filed Dec. 27, 1991, now abandoned.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a modified polysilazane. More particularly, the present invention relates to a modified polysilazane stabilized by reacting an inorganic polysilazane with an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, an alkylamine, an alkylsilazane or an alkylaminosilane, and a process for the preparation thereof.
2. Description of the Related Art
Silicon nitride and silicon nitride-containing ceramics formed through a polysilazane as a precursor have an excellent high-temperature strength, thermal shock resistance and oxidation resistance, and therefore, are widely used as construction materials and functional materials in various industrial fields.
In general, a polysilazane is valuable as a precursor polymer for silicon nitride ceramics. The polysilazane is soluble in solvents, has an excellent moldability, and gives a high yield of ceramics, and further, is characterized in that the purity of ceramics after firing is high.
Processes for the preparation of inorganic polysilazanes and organic polysilazanes are known. Typically, a polysilazane can be prepared by reacting a halosilane with a Lewis base and reacting the obtained complex compound with ammonia (see, for example, Japanese Examined Patent Publication No. 63-16325).
A polysilazane, especially an inorganic polysilazane, has a low chemical stability, and an increase of the molecular weight and gelation readily occur, and accordingly, the handling property is poor. The stability of the polysilazane and the molecular structure thereof can be controlled to some extent by changing the kind of the halosilane used as the starting material of the polysilazane or changing the mixing ratio of at least two halosilanes, but this control is limited and difficult. Accordingly, the polysilazane is defective in that the handling thereof is poor, and the properties of ceramics by high-temperature firing are not uniform.
SUMMARY OF THE INVENTION
According to the present invention, the above-mentioned problem is solved by preparing a modified polysilazane by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with at least one compound selected from the group consisting of an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane represented by the following general formula: ##STR1## wherein groups R independently represent an alkyl group or ##STR2## in which groups R' independently represent an alkyl group or a hydrogen atom, with the proviso that at least one of the groups R' is not a hydrogen atom.
An inorganic polysilazane is a polysilazane in which all side chains are composed of hydrogens and no organic group is contained. The process for preparing this inorganic polysilazane is not particularly critical. For example, an inorganic polysilazane prepared according to the process disclosed in the above-mentioned Japanese Examined Patent Publication No. 63-16325 can be used. The molecular weight is not particularly critical, and the molecular weight can be within a range of from about 100 to about 100,000. An inorganic polysilazane having a higher molecular weight is easily gelled and has a poor handling. Accordingly, this inorganic polysilazane can be effectively treated according to the present invention.
As the other reactant to be reacted with the inorganic polysilazane, there can be mentioned an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane.
The above reactants such as alcohol can be represented by the general formulae: R--OH, R--COOH, R--COOR', R--CO--R', R--CHO, RNCO, RCONH2, RSH, where R and R' are preferably hydrocarbon groups having 1 to 10 carbon atoms. The alkylamine, alkylsilazane or alkylaminosilane is represented by the formula appeared before.
Examples of the preferred alcohol are CH3 OH (methanol), C2 H5 OH (ethanol), n-C3 H7 OH (n-propanol), n-C4 H9 OH (n-batanol), n-C5 H11 (n-pentanol), n-C6 H13 (n-hexanol), n-C7 H15 OH (n-heptanol), and n-C8 H17 OH (n-octanol).
The reaction molar ratio between the inorganic polysilazane and the reactant such as an alcohol depends on the kind of the starting inorganic polysilazane and desired properties of the modified polysilazane, but preferably this molar ratio is from 50/50 to 99.99/0.01, more preferably from 80/20 to 98/2. If the proportion of the reactant such as an alcohol is too large, the preferred properties of the polysilazane are lost and, for example, the yield of ceramics is reduced.
Preferably, the inorganic polysilazane is reacted with the reactant such as an alcohol in a basic solvent, although the present invention is not limited to this feature. As the basic solvent, pyridine, picoline, trimethylphosphine, methyldiethylphosphine, triethylphosphine, thiophene, furan, and dioxane are preferably used. Pyridine and picoline are especially preferably used in view of the handling property and from the economical viewpoint. The reaction temperature is from 0° to the boiling point of the solvent, and an inert gas such as nitrogen or argon is used as the reaction atmosphere. A reactant, such as an alcohol, is added to a solution of the inorganic polysilazane in the basic solvent while blowing dry nitrogen into the solution, and after termination of the reaction, the basic solvent is replaced by a non-reactive solvent capable of dissolving the polysilazane therein. As the non-reactive solvent, toluene and xylene can be used.
The thus-prepared modified polysilazane has a structure in which parts of hydrogen on the ends and side chains of the inorganic polysilazane are substituted with --OR, etc. By this introduction of the --OR, etc., the inorganic polysilazane is stabilized and the handling property is improved.
According to the present invention, there is provided a process for the preparation of a modified polysilazane, which comprises reacting an organic polysilazane having a molecular weight of about 100 to about 100,000 with at least one compound selected from the group consisting of an alcohol, an organic acid, an ester, a ketone, an aldehyde, an isocyanate, an amide, a mercaptan, and an alkylamine, alkylsilazane or alkylaminosilane represented by the following general formula: ##STR3## wherein groups R independently represent an alkyl group or ##STR4## in which groups R' independently represent an alkyl group or a hydrogen atom, with the proviso that at least one of the groups R' is not a hydrogen atom.
According to this process, the polysilazane is modified, and therefore, the molecular structure can be easily controlled. Since the formed modified polysilazane has an improved chemical stability compared to the unmodified inorganic polysilazane, the modified polysilazane has an excellent handling property. Moreover, an unevenness of the properties of ceramics obtained by firing is reduced. Further, since the molecular structure of the polysilazane can be controlled, the purity and heat resistance of ceramics obtained by firing also can be controlled.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 illustrates an apparatus for synthesizing a polysilazane, as used in the examples of the present invention;
FIG. 2 is an IR chart of the polysilazane of Example 11; and
FIG. 3 is an IR chart of the modified polysilazane of Example 11.
EXAMPLES Example 1
The reaction was carried out by using a synthesis apparatus shown in FIG. 1. In FIG. 1, reference numeral 1 represents a reaction vessel, reference numeral 2 represents a constant-temperature bath, reference numeral 3 represents a heater, reference numeral 4 represents a temperature sensor, reference numeral 6 represents pyridine, reference numeral 7 represents a nitrogen current, reference numeral 8 represents dichlorosilane, reference numeral 9 represents an additive, reference numeral 10 represents ammonia, and reference numeral 11 represents a vent.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of methanol (CH3 OH) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2030. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.02.
Example 2
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of n-octanol (C8 H17 OH) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2020. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.01.
Example 3
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of isopropyl isocyanate (CH3 C2 H4 N═C═O) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2000. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.00.
Example 4
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of isobutylamide (C3 H7 CONH2) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2000. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.02.
Example 5
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of trimethylsilanol (Me3 SiOH) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2025. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.03.
Example 6
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C. 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of acetone (CH3 COCH3) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.00.
Example 7
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of propionic acid (C2 H5 COOH) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2030. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.03.
Example 8
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of ethyl acetate (CH3 COOC2 H5) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2000. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.01.
Example 9
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of acetaldehyde (CH3 CHO) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2005. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.01.
Example 10
In the same manner as described in Example 1, the reaction was carried out by using the synthesis apparatus shown in FIG. 1.
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene. Then, 4.0 g of n-butylmercaptan (n-C4 H9 SH) was added, and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.03.
Comparative Example 1
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene, and pyridine as the solvent was replaced under reduced pressure by xylene.
When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2650. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.01.
Changes of the molecular weight and composition before and after the solvent substitution in the examples and comparative example are summarized in Table 1.
The stability in air was evaluated with respect to each of the examples and comparative example. The results are shown in Table 2.
              TABLE 1
______________________________________
               Before Solvent
                         After Solvent
               Substitution
                         Substitution
                 Number          Number
                 average         average
                 molec-          molec-
                 ular            ular
       Additive  weight   Si/N   weight Si/N
______________________________________
Example 1
         CH.sub.3 OH 2010     1.01 2030   1.02
Example 2
         n-C.sub.8 H.sub.17 OH
                     2010     1.01 2020   1.01
Example 3
         CH.sub.3 C.sub.2 H.sub.4 NCO
                     2010     1.01 2000   1.00
Example 4
         C.sub.3 H.sub.7 CONH.sub.3
                     2010     1.01 2000   1.02
Example 5
         (CH.sub.3).sub.3 SiOH
                     2010     1.01 2025   1.03
Example 6
         CH.sub.3 COCH.sub.3
                     2010     1.01 2010   1.00
Example 7
         C.sub.2 H.sub.5 COOH
                     2010     1.01 2030   1.03
Example 8
         CH.sub.3 COOC.sub.2 H.sub.5
                     2010     1.01 2000   1.01
Example 9
         CH.sub.3 CHO
                     2010     1.01 2005   1.01
Example 10
         n-C.sub.4 H.sub.9 SH
                     2010     1.01 2010   1.03
Comparative
         not added   2010     1.01 2650   1.01
Example 1
______________________________________
              TABLE 2
______________________________________
                   Stability against 24 Hours'
        Additive   Exposure to Air
______________________________________
Example 1 CH.sub.3 OH  good
Example 2 n-C.sub.8 H.sub.17 OH
                       good
Example 3 CH.sub.3 C.sub.2 H.sub.4 NCO
                       good
Example 4 C.sub.3 H.sub.7 CONH.sub.3
                       good
Example 5 (CH.sub.3).sub.3 SiOH
                       good
Example 6 CH.sub.3 COCH.sub.3
                       good
Example 7 C.sub.2 H.sub.5 COOH
                       good
Example 8 CH.sub.3 COOC.sub.2 H.sub.5
                       good
Example 9 CH.sub.3 CHO good
Example 10
          n-C.sub.4 H.sub.9 SH
                       good
Comparative
          not added    gelled
Example 1
______________________________________
 Note: relative humidity in air: 80%
Example 11
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was naturally cooled to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. When the IR spectrum of the solute was analyzed (FIG. 2), there were observed absorptions attributed to N--H at wave numbers (cm-1) of 3350 and 1175, an absorption attributed to Si--H at 2170, and an absorption attributed to Si--N--Si at 1020 to 820. From the results of the elementary analysis, it was confirmed that the content of Si was 56.1% by weight, the content of N was 27.9% by weight, the content of O was 0.48% by weight and the content of C was 9.7% by weight. The composition molar ratio between nitrogen and silicon was 1.01.
Then, 4.0 g hexamethyldisilazane [(CH3)3 SiNHSi(CH3)3 ] was added to the pyridine solution of this polymer, and while blowing dry nitrogen, the mixture was heated at 60° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. Then, 300 ml of o-dry xylene was added to the solution, and the solvent substitution of pyridine with xylene was carried out under reduced pressure. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2015. When the IR spectrum of the solute was analyzed (FIG. 2), there were observed absorptions attributed to N--H at wave numbers (cm-1) of 3350 and 1175, an absorption attributed to Si--H at 2170, an absorption attributed to Si--N--Si at 1020 to 80, an absorption attributed to Si--Me at 1250 and an absorption attributed C--H at 3000 were observed. From the results of the elementary analysis of the polymer, it was confirmed that the content of Si was 56.2% by weight, the content of N was 27.8% by weight, the content of O was 0.40% by weight and the content of C was 9.7% by weight. The composition molar ratio between nitrogen and silicon was 1.02.
Example 12
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 4.0 g of hexaethyldisilazane [(C2 H5)3 SiNHSi(C2 H5)3 ] and while blowing dry nitrogen, the mixture was heated at 60° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. Then, 300 ml of dry o-xylene was added to the solution, and the solvent substitution of pyridine with xylene was carried out under reduced pressure. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2012. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.00.
Example 13
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of the polymer was added 4.0 g of (CH3)3 SiNHCH3, and the mixture was heated at 60° C. while blowing dry nitrogen and this temperature was maintained for 3 hours. Then, the temperature was lowered to room temperature. Then, 300 ml of dry o-xylene was added and pyridine was substituted with xylene under reduced pressure. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2020. The composition molar ratio between nitrogen and silicon in the polymer was 1.02.
Example 14
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of the polymer was added 4.0 g of diethylamine [NH(C2 H5)2 ], and the mixture was heated at 60° C. while blowing dry nitrogen and this temperature was maintained for 3 hours. Then, the temperature was lowered to room temperature. Then, 300 ml of dry o-xylene was added and pyridine was substituted with xylene under reduced pressure. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in the polymer was 1.01.
Example 15
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of the polymer was added 4.0 g of tetramethyldisilazane [(CH3)2 HSiNHSiH(CH3)2 ], and the mixture was heated at 60° C. while blowing dry nitrogen and this temperature was maintained for 3 hours. Then, the temperature was lowered to room temperature. Then, 300 ml of dry o-xylene was added and pyridine was substituted with xylene under reduced pressure. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2018. The composition molar ratio between nitrogen and silicon in the polymer was 1.03.
Example 16
The inner atmosphere of the reaction vessel placed in the constant-temperature bath maintained at 0° C. was substituted with dry nitrogen, and 600 ml of dry pyridine was charged in the reaction vessel. The mixture was maintained until the temperature became constant, and 28.3 g of dichlorosilane was added with stirring to form a complex mixture. While the mixture was maintained at 0° C., 14 g of dry ammonia was blown into the mixture with stirring. After termination of the reaction, dry nitrogen was blown into the mixture to remove unreacted ammonia, and the reaction mixture was subjected to filtration under pressure in a nitrogen atmosphere to obtain 392 ml of the filtrate. This solution was heated at 60° C. and ammonia was blown into the solution to increase the pressure to 5 atmospheres. This pressure was maintained for 15 hours. The pressure was then lowered to one atmosphere and the mixture was allowed to cool to room temperature, and dry nitrogen was blown into the reaction mixture to remove ammonia therefrom. When the molecular weight of the solute was determined by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2010. The composition molar ratio between nitrogen and silicon in this polymer was 1.01.
To the pyridine solution of this polymer was added 300 ml of o-xylene to replace the solvent from the pyridine with xylene. 4.0 g of hexamethyldisilazane [(CH3)3 SiNHSi(CH3)3 ], and while blowing dry nitrogen, the mixture was heated at 100° C. and this temperature was maintained for 3 hours. Then, the mixture was cooled to room temperature. When the molecular weight of the solute was measured by GPC, it was found that the number average molecular weight as calculated as polystyrene was 2012. In the obtained polymer, the composition molar ratio between nitrogen and silicon was 1.00.
Changes of the molecular weight and composition before and after the solvent substitution in the examples and comparative example 1 are summarized in Table 3.
The stability in air was evaluated with respect to each of the examples and comparative example 1. The results are shown in Table 4.
                                  TABLE 3
__________________________________________________________________________
                                                       Comparative
         Example 11
                 Example 12
                       Example 13
                                 Example 14
                                        Example 15
                                                Example
                                                       Example
__________________________________________________________________________
                                                       1
Additive hexamethyl-
                 hexaethyl-
                       (CH.sub.3).sub.3 SiNHCH.sub.3
                                 diethylamine
                                        tetramethyl-
                                                hexamethyl-
                                                       not added
         disilazane
                 disilazane             disilazane
                                                disilazane
Before Solvent
Substitution
number average
         2010    2010  2010      2010   2010    2010   2010
molecular weight
Si/N     1.01    1.01  1.01      1.01   1.01    1.01   1.01
After Solvent
Substitution
number average
         2015    2012  2020      2010   2018    2012   2650
molecular weight
Si/N     1.02    1.00  1.02      1.01   1.03    1.00   1.01
__________________________________________________________________________
                                  TABLE 4
__________________________________________________________________________
                                                       Comparative
          Example 11
                  Example 12
                         Example 13
                                 Example 14
                                        Example 15
                                                Example
                                                       Example
__________________________________________________________________________
                                                       1
Additive  hexamethyl-
                  hexaethyl-
                         tris(methyl)-
                                 diethylamine
                                        tetramethyl-
                                                hexamethyl-
                                                       not added
          disilazane
                  disilazane
                         methylamino-   disilazane
                                                disilazane
                         silane
Stability against
          good    good   good    good   good    good   gelled
24 Hours' Exposure
to Air
__________________________________________________________________________
 Note relative humidity in air: 80%

Claims (3)

We claim:
1. A process for the stabilization of an inorganic polysilazane, which comprises reacting (A) an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with (B) at least one reactant compound selected from the group consisting of a monoalcohol, an organic monoacid, a monoester, a monoketone, a monoaldehyde, a monomercaptan, and an alkylsilazane and wherein the alkylsilazane is represented by the following general formula: ##STR5## wherein groups R independently represent ##STR6## in which groups R' independently represent an alkyl group wherein the reaction is conducted in a basic solvent at a temperature of from 0° C. to the boiling point of the solvent in such a manner that only one polysilazane (A) is present in the polymer after the above reaction, wherein (A) is stabilized by bonding (B) to a side chain or end group of (A) and wherein the resulting polysilazane reaction product is stabilized and has not essentially increased in molecular weight due to cross linkage.
2. A process as set forth in claim 1, wherein the molar ratio of the inorganic polysilazane to said at least one compound is in the range of from 50/50 to 99.99/0.01.
3. A process as set forth in claim 2, wherein said molar ratio is 80:20 to 98:2.
US08/346,845 1991-12-04 1994-11-30 Modified polysilazane and process for preparation thereof Expired - Lifetime US5494978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US08/346,845 US5494978A (en) 1991-12-04 1994-11-30 Modified polysilazane and process for preparation thereof

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP32016791A JP3283276B2 (en) 1991-12-04 1991-12-04 Modified polysilazane and method for producing the same
JP3-320167 1991-12-04
US81637891A 1991-12-27 1991-12-27
US8201393A 1993-06-23 1993-06-23
US08/346,845 US5494978A (en) 1991-12-04 1994-11-30 Modified polysilazane and process for preparation thereof

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US8201393A Continuation 1991-12-04 1993-06-23

Publications (1)

Publication Number Publication Date
US5494978A true US5494978A (en) 1996-02-27

Family

ID=18118451

Family Applications (1)

Application Number Title Priority Date Filing Date
US08/346,845 Expired - Lifetime US5494978A (en) 1991-12-04 1994-11-30 Modified polysilazane and process for preparation thereof

Country Status (4)

Country Link
US (1) US5494978A (en)
EP (1) EP0544959B1 (en)
JP (1) JP3283276B2 (en)
DE (1) DE69129746T2 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5747623A (en) * 1994-10-14 1998-05-05 Tonen Corporation Method and composition for forming ceramics and article coated with the ceramics
US20020160614A1 (en) * 2001-02-22 2002-10-31 Samsung Electronics Co., Ltd. Method of forming an interlayer dielectric film
US6479405B2 (en) * 2000-10-12 2002-11-12 Samsung Electronics Co., Ltd. Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method
US20040014836A1 (en) * 2002-07-19 2004-01-22 Wacker Polymer Systems Gmbh & Co. Kg Silicone-containing polymers of ethylenically unsaturated monomers
US6706646B1 (en) 2000-05-02 2004-03-16 Samsung Electronics Co., Ltd. Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same
US20040224094A1 (en) * 2000-05-02 2004-11-11 Samsung Electronics Co., Ltd. Method of forming a silicon oxide layer in a semiconductor manufacturing process
US20050027089A1 (en) * 2001-12-27 2005-02-03 Yasuo Shimizu Solvent for treating polysilazane and method of treating polysilazane with the solvent
JP2005045230A (en) * 2003-07-21 2005-02-17 Samsung Electronics Co Ltd Method for forming silicone oxide film with spin-on glass
US7192891B2 (en) 2003-08-01 2007-03-20 Samsung Electronics, Co., Ltd. Method for forming a silicon oxide layer using spin-on glass
US20080090988A1 (en) * 2006-09-29 2008-04-17 Keisuke Nakazawa Method for handling polysilazane or polysilazane solution, polysilazane or polysilazane solution, and method for producing semiconductor device
US20080102211A1 (en) * 2005-02-02 2008-05-01 Hideki Matsuo Polysilazane-Treating Solvent and Method for Treating Polysilazane by Using Such Solvent
US20100234540A1 (en) * 2007-10-26 2010-09-16 Yuki Ozaki Polysilazane-containing composition capable of forming a dense siliceous film
US20170107344A1 (en) 2014-03-31 2017-04-20 Lintec Corporation Elongated gas barrier laminate and method for producing same
US10563093B2 (en) 2016-05-02 2020-02-18 Az Electronic Materials (Luxembourg) S.A.R.L. Composition for forming dense siliceous film

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5612414A (en) * 1993-11-05 1997-03-18 Lanxide Technology Company, Lp Organic/inorganic polymers
US5616650A (en) * 1993-11-05 1997-04-01 Lanxide Technology Company, Lp Metal-nitrogen polymer compositions comprising organic electrophiles
JPH09183663A (en) * 1995-10-30 1997-07-15 Tonen Corp Method of applying sio2 based ceramic on plastic film
JPH09157544A (en) * 1995-12-05 1997-06-17 Tonen Corp Production of substrate provided with silica coating film and substrate provided with silica coating film produced thereby
DE69703770T2 (en) * 1996-08-14 2001-07-12 Tokyo Ohka Kogyo Co Ltd Inspection solution based on polysilazane for insulation with an intermediate layer
ATE354818T1 (en) 2000-08-31 2007-03-15 Az Electronic Materials Usa RADIATION SENSITIVE POLYSILAZANE COMPOSITION, PATTERNS PRODUCED THEREFROM AND A METHOD FOR ASHING A CORRESPONDING COATING FILM
US20070270625A1 (en) * 2006-05-18 2007-11-22 Joshua Gurman Treatment of Polysilazane Waste
DE102009013410A1 (en) * 2009-03-16 2010-09-23 Clariant International Ltd. Hybrid polymers of cyanates and silazanes, process for their preparation and their use
CN103642060B (en) 2009-03-17 2016-05-25 琳得科株式会社 Formed body, its manufacture method, electronic device member and electronic equipment
JP5697230B2 (en) 2010-03-31 2015-04-08 リンテック株式会社 Molded body, manufacturing method thereof, member for electronic device, and electronic device
EP2556954B1 (en) 2010-03-31 2019-09-25 Lintec Corporation Transparent conductive film and electronic device using transparent conductive film
WO2012023389A1 (en) 2010-08-20 2012-02-23 リンテック株式会社 Molding, production method therefor, part for electronic devices and electronic device
KR101886455B1 (en) 2010-09-07 2018-08-07 린텍 가부시키가이샤 Adhesive sheet and electronic device
KR101056838B1 (en) * 2010-10-15 2011-08-12 테크노세미켐 주식회사 Polysilazane solution and method of manufacturing the same
KR101243339B1 (en) * 2010-12-14 2013-03-13 솔브레인 주식회사 Method for preparing polysilazane solution and polysilazane solution prepared by the same
TWI552883B (en) 2011-07-25 2016-10-11 Lintec Corp Gas barrier film laminates and electronic components
JP5988989B2 (en) 2011-11-04 2016-09-07 リンテック株式会社 GAS BARRIER FILM AND MANUFACTURING METHOD THEREOF, GAS BARRIER FILM LAMINATE, ELECTRONIC DEVICE MEMBER, AND ELECTRONIC DEVICE
WO2013081003A1 (en) 2011-11-30 2013-06-06 リンテック株式会社 Manufacturing method for gas barrier film, and electronic member or optical member provided with gas barrier film
TWI626163B (en) 2012-03-06 2018-06-11 Lintec Corp Gas barrier film laminate, adhesive film, and electronic component
WO2013141318A1 (en) 2012-03-22 2013-09-26 リンテック株式会社 Transparent conductive laminate and electronic device or module
KR102055111B1 (en) 2012-03-30 2020-01-22 린텍 가부시키가이샤 Gas barrier film laminate, member for electronic device, and electronic device
KR102267089B1 (en) 2013-03-29 2021-06-18 린텍 가부시키가이샤 Laminate, method for producing same, member for electronic device, and electronic device
KR102267093B1 (en) 2013-03-29 2021-06-18 린텍 가부시키가이샤 Gas barrier laminate, member for electronic device, and electronic device
TW201533098A (en) * 2013-12-25 2015-09-01 Toagosei Co Ltd Polyalkoxysilazane and method for producing same, and coating composition and silicon-based ceramic coating obtained therefrom
TWI691412B (en) 2014-06-04 2020-04-21 日商琳得科股份有限公司 Air-resistive laminate, method for manufacturing the same, element for electronic device, and electronic device
WO2017159787A1 (en) 2016-03-18 2017-09-21 リンテック株式会社 Curable composition for forming primer layer, gas barrier laminated film, and gas barrier laminate
KR102330884B1 (en) 2016-03-29 2021-11-25 린텍 가부시키가이샤 Gas barrier laminate, member for electronic device, and electronic device
US11512231B2 (en) 2017-03-28 2022-11-29 Lintec Corporation Gas barrier laminate
KR102194975B1 (en) 2017-10-13 2020-12-24 삼성에스디아이 주식회사 Composition for forming silica layer, method for manufacturing silica layer, and silica layer
KR20200062162A (en) 2017-10-20 2020-06-03 린텍 가부시키가이샤 Substrate for gas barrier film, gas barrier film, member for electronic device, and electronic device
KR20210110591A (en) 2018-12-27 2021-09-08 린텍 가부시키가이샤 gas barrier laminate

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60145903A (en) * 1983-12-29 1985-08-01 Toa Nenryo Kogyo Kk Synthesis of inorganic polysilazane
EP0303498A1 (en) * 1987-08-13 1989-02-15 Toa Nenryo Kogyo Kabushiki Kaisha Reformed, inorganic polysilazane and method of producing same
EP0304239A1 (en) * 1987-08-13 1989-02-22 Toa Nenryo Kogyo Kabushiki Kaisha Reformed polysilazane and method of producing same
US4929704A (en) * 1988-12-20 1990-05-29 Hercules Incorporated Isocyanate- and isothiocyanate-modified polysilazane ceramic precursors
US4937304A (en) * 1987-06-12 1990-06-26 Chisso Corporation New polysilazane and process for production of the same
US4939225A (en) * 1987-12-23 1990-07-03 Hoechst Aktiengesellschaft Polymeric hydridosilazanes, processes for the preparation thereof, silicon nitride-containing ceramic materials which can be prepared therefrom, and the preparation thereof
US4975712A (en) * 1989-01-23 1990-12-04 Trw Inc. Two-dimensional scanning antenna
US4992523A (en) * 1987-06-10 1991-02-12 Societe Europeenne De Propulsion Copolymers containing si-n and si-si bonds, polycarbosilazanes obtained by pyrolysis of the said copolymers, and use of the said polycarbosilazanes for the preparation of silicon carbonitride
EP0430080A2 (en) * 1989-11-27 1991-06-05 Hercules Incorporated Organic amide-modified polysilazane ceramic precursors
US5032551A (en) * 1988-03-05 1991-07-16 Toa Nenryo Kogyo Kabushiki Kaisha Silicon nitride based ceramic fibers, process of preparing same and composite material containing same
US5086126A (en) * 1990-12-24 1992-02-04 Dow Corning Corporation Method for producing functional silazane polymers

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60145903A (en) * 1983-12-29 1985-08-01 Toa Nenryo Kogyo Kk Synthesis of inorganic polysilazane
US4840778A (en) * 1983-12-29 1989-06-20 Toa Nenryo Kogyo Kabushiki Kaisha Inorganic polysilazane and method of producing the same
US4992523A (en) * 1987-06-10 1991-02-12 Societe Europeenne De Propulsion Copolymers containing si-n and si-si bonds, polycarbosilazanes obtained by pyrolysis of the said copolymers, and use of the said polycarbosilazanes for the preparation of silicon carbonitride
US4937304A (en) * 1987-06-12 1990-06-26 Chisso Corporation New polysilazane and process for production of the same
EP0303498A1 (en) * 1987-08-13 1989-02-15 Toa Nenryo Kogyo Kabushiki Kaisha Reformed, inorganic polysilazane and method of producing same
EP0304239A1 (en) * 1987-08-13 1989-02-22 Toa Nenryo Kogyo Kabushiki Kaisha Reformed polysilazane and method of producing same
US4939225A (en) * 1987-12-23 1990-07-03 Hoechst Aktiengesellschaft Polymeric hydridosilazanes, processes for the preparation thereof, silicon nitride-containing ceramic materials which can be prepared therefrom, and the preparation thereof
US5032551A (en) * 1988-03-05 1991-07-16 Toa Nenryo Kogyo Kabushiki Kaisha Silicon nitride based ceramic fibers, process of preparing same and composite material containing same
US4929704A (en) * 1988-12-20 1990-05-29 Hercules Incorporated Isocyanate- and isothiocyanate-modified polysilazane ceramic precursors
US5021533A (en) * 1988-12-20 1991-06-04 Hercules Incorporated Crosslinkable poly(thio)ureasilazane composition containing a free radical generator
EP0442013A1 (en) * 1988-12-20 1991-08-21 Lanxide Technology Company, Lp Isocyanate- and isothiocyanate-modified polysilazane ceramic precursors
US4975712A (en) * 1989-01-23 1990-12-04 Trw Inc. Two-dimensional scanning antenna
EP0430080A2 (en) * 1989-11-27 1991-06-05 Hercules Incorporated Organic amide-modified polysilazane ceramic precursors
US5032649A (en) * 1989-11-27 1991-07-16 Hercules Incorporated Organic amide-modified polysilazane ceramic precursors
US5086126A (en) * 1990-12-24 1992-02-04 Dow Corning Corporation Method for producing functional silazane polymers

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5747623A (en) * 1994-10-14 1998-05-05 Tonen Corporation Method and composition for forming ceramics and article coated with the ceramics
US7053005B2 (en) 2000-05-02 2006-05-30 Samsung Electronics Co., Ltd. Method of forming a silicon oxide layer in a semiconductor manufacturing process
DE10053201B4 (en) * 2000-05-02 2010-03-04 Samsung Electronics Co., Ltd., Suwon Preparation of a silicon oxide film in a semiconductor manufacturing process using a spin-on glass composition
US7179537B2 (en) 2000-05-02 2007-02-20 Samsung Electronics Co., Ltd. Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same
US6706646B1 (en) 2000-05-02 2004-03-16 Samsung Electronics Co., Ltd. Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same
US20040224094A1 (en) * 2000-05-02 2004-11-11 Samsung Electronics Co., Ltd. Method of forming a silicon oxide layer in a semiconductor manufacturing process
US6479405B2 (en) * 2000-10-12 2002-11-12 Samsung Electronics Co., Ltd. Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method
US6762126B2 (en) 2001-02-22 2004-07-13 Samsung Electronics Co., Ltd. Method of forming an interlayer dielectric film
US20020160614A1 (en) * 2001-02-22 2002-10-31 Samsung Electronics Co., Ltd. Method of forming an interlayer dielectric film
US7344603B2 (en) 2001-12-27 2008-03-18 Az Electronic Materials Usa Corp. Solvent for treating polysilazane and method of treating polysilazane with the solvent
US20050027089A1 (en) * 2001-12-27 2005-02-03 Yasuo Shimizu Solvent for treating polysilazane and method of treating polysilazane with the solvent
US20040014836A1 (en) * 2002-07-19 2004-01-22 Wacker Polymer Systems Gmbh & Co. Kg Silicone-containing polymers of ethylenically unsaturated monomers
JP2005045230A (en) * 2003-07-21 2005-02-17 Samsung Electronics Co Ltd Method for forming silicone oxide film with spin-on glass
US7192891B2 (en) 2003-08-01 2007-03-20 Samsung Electronics, Co., Ltd. Method for forming a silicon oxide layer using spin-on glass
US7517817B2 (en) 2003-08-01 2009-04-14 Samsung Electronics Co., Ltd. Method for forming a silicon oxide layer using spin-on glass
US20070117412A1 (en) * 2003-08-01 2007-05-24 Goo Ju-Seon Method for forming a silicon oxide layer using spin-on glass
US20080102211A1 (en) * 2005-02-02 2008-05-01 Hideki Matsuo Polysilazane-Treating Solvent and Method for Treating Polysilazane by Using Such Solvent
US20080090988A1 (en) * 2006-09-29 2008-04-17 Keisuke Nakazawa Method for handling polysilazane or polysilazane solution, polysilazane or polysilazane solution, and method for producing semiconductor device
US20100234540A1 (en) * 2007-10-26 2010-09-16 Yuki Ozaki Polysilazane-containing composition capable of forming a dense siliceous film
US8263717B2 (en) 2007-10-26 2012-09-11 Az Electronic Materials Usa Corp. Polysilazane-containing composition capable of forming a dense siliceous film
US20170107344A1 (en) 2014-03-31 2017-04-20 Lintec Corporation Elongated gas barrier laminate and method for producing same
US10377870B2 (en) 2014-03-31 2019-08-13 Lintec Corporation Elongated gas barrier laminate and method for producing same
US10563093B2 (en) 2016-05-02 2020-02-18 Az Electronic Materials (Luxembourg) S.A.R.L. Composition for forming dense siliceous film

Also Published As

Publication number Publication date
DE69129746D1 (en) 1998-08-13
DE69129746T2 (en) 1999-03-04
EP0544959A1 (en) 1993-06-09
JP3283276B2 (en) 2002-05-20
EP0544959B1 (en) 1998-07-08
JPH05345826A (en) 1993-12-27

Similar Documents

Publication Publication Date Title
US5494978A (en) Modified polysilazane and process for preparation thereof
JP3042537B2 (en) Modified polysilazane and method for producing the same
US4543344A (en) Silicon nitride-containing ceramic material prepared by pyrolysis of hydrosilazane polymers from (R3 Si)2 NH and HSiCl3
US4395460A (en) Preparation of polysilazane polymers and the polymers therefrom
US4404153A (en) Process for the preparation of poly(disilyl)silazane polymers and the polymers therefrom
US4340619A (en) Process for the preparation of poly(disilyl)silazane polymers and the polymers therefrom
US4312970A (en) Silazane polymers from {R'3 Si}2 NH and organochlorosilanes
US4720532A (en) Organopolysilazane precursors to silicon nitride-rich mixed SiC/Si3 N4
US4675424A (en) Method for making polysilazanes
JPH03252425A (en) Isocyanate- or isothiocyanate-modified polysilazane ceramic precursor
JPH037221B2 (en)
US5032649A (en) Organic amide-modified polysilazane ceramic precursors
US5010158A (en) Process for preparing polysiloxazane compositions and the products formed thereby
JPH01138107A (en) Modified polysilazane, its production and use thereof
US4916200A (en) Silane modified polysilacyclobutasilazanes
US4742143A (en) Preceramic polymers derived from cyclic silazanes, and halosilanes and a method for their preparation
US4745205A (en) Novel preceramic polymers derived from cyclic silazanes and halogenated disilanes and a method for their preparation
US5169908A (en) Curable boron modified hydropolysilazane polymers
US5262553A (en) Method of crosslinking polysilazane polymers
US4987201A (en) Boron-carbon-silicon polymers and the ceramic thereof
US5155181A (en) (Thio)amide-modified silazane polymer composition containing a free radical generator
EP0511568B1 (en) Polyorganosilazanes, process for their preparation and a process for making ceramic material
US5866705A (en) Polymeric silaborocarboazanes, a process for their preparation and their use
US5229338A (en) Preparation of silazane polymers and ceramic materials therefrom
JPS62108719A (en) Preparation of silicon nitride

Legal Events

Date Code Title Description
FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

STCF Information on status: patent grant

Free format text: PATENTED CASE

FPAY Fee payment

Year of fee payment: 4

AS Assignment

Owner name: TONENGENERAL SEKIYU KABUSHIKI KAISHA, JAPAN

Free format text: MERGER;ASSIGNOR:TONEN CORPORATION;REEL/FRAME:012365/0287

Effective date: 20000712

FPAY Fee payment

Year of fee payment: 8

AS Assignment

Owner name: CLARIANT INTERNATIONAL, LTD., SWITZERLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TONENGENERAL SEKIYU K.K.;REEL/FRAME:014609/0431

Effective date: 20030709

AS Assignment

Owner name: AZ ELECTRONIC MATERIALS USA CORP., NEW JERSEY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:CLARIANT INTERNATIONAL LTD;REEL/FRAME:015788/0438

Effective date: 20050302

FPAY Fee payment

Year of fee payment: 12