|
| US4075662 | 8 Jun 1976 | 21 Feb 1978 | Dr. -Ing. Rudolf Hell GmbH | Method and system for compensating the non-linearities in a reproduction process |
| US4082958 | 27 Apr 1977 | 4 Apr 1978 | Simulation Physics, Inc. | Apparatus involving pulsed electron beam processing of semiconductor devices |
| US4112305 | 15 Oct 1976 | 5 Sep 1978 | Rikagaku Kenkyusho | Method of projecting a beam of charged particles |
| US4117340 | 31 May 1977 | 26 Sep 1978 | Rikagaku Kenkyusho
Nihon Denshi Kabushiki Kaisha | Electron beam exposure system |
| US4119854 | 17 Nov 1977 | 10 Oct 1978 | Nihon Denshi Kabushiki Kaisha | Electron beam exposure system |
| US4151422 | 7 Jun 1978 | 24 Apr 1979 | Rikagaku Kenkyusho
Nihon Denshi Kabushiki Kaisha | Electron beam exposure method |
| US4173672 | 6 Sep 1977 | 6 Nov 1979 | | Decorated safety glass |
| US4362942 | 5 Dec 1980 | 7 Dec 1982 | Fujitsu Limited | Electron beam exposure system and an apparatus for carrying out the same |
| US4438332 | 9 Feb 1983 | 20 Mar 1984 | U.S. Philips Corporation | Detector for an electron microscope |
| US4500790 | 19 Oct 1982 | 19 Feb 1985 | International Business Machines Corporation | System for improving the uniformness of patterns generated by electron beam lithography |
| US4601971 | 14 Jul 1983 | 22 Jul 1986 | Siemens Aktiengesellschaft | Tunnel cathode mask for electron lithography and method for manufacturing and operating it |
| US4891524 | 12 Sep 1988 | 2 Jan 1990 | Fujitsu Limited | Charged particle beam exposure system and method of compensating for eddy current effect on charged particle beam |
| US4996434 | 20 Apr 1989 | 26 Feb 1991 | Toshiba Machine Co., Ltd. | Electron-beam lithographic apparatus |
| US5808892 | 5 Nov 1996 | 15 Sep 1998 | Taiwan Semiconductor Manufacturing Company Ltd. | Line edge and size definition in e-beam exposure |
| US6515287 | 15 Jun 2001 | 4 Feb 2003 | KLA-Tencor Technologies Corporation | Sectored magnetic lens and method of use |
| US6806465 | 15 Jan 2002 | 19 Oct 2004 | The Johns Hopkins University | Sample collection preparation methods for time-of flight miniature mass spectrometer |
| US6891167 | 15 Jun 2001 | 10 May 2005 | KLA-Tencor Technologies | Apparatus and method for applying feedback control to a magnetic lens |
| US7112803 | 23 Jul 2004 | 26 Sep 2006 | Applied Materials, Israel, Ltd. | Beam directing system and method for use in a charged particle beam column |
| US7407736 | 31 Jan 2006 | 5 Aug 2008 | International Business Machines Corporation | Methods of improving single layer resist patterning scheme |
| USRE31630 | 6 Jul 1982 | 17 Jul 1984 | Rikagaku Kenkyusho
Nihon Denshi Kabushiki Kaisha | Electron beam exposure system |
