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Referenced by

Citing PatentFiling dateIssue dateOriginal AssigneeTitle
US40352461 Jun 197612 Jul 1977Rapid Electroplating Process, Inc.Method and compositions for electroplating copper and brass
US413480321 Dec 197716 Jan 1979R. O. Hull & Company, Inc.Nitrogen and sulfur compositions and acid copper plating baths
US434710829 May 198131 Aug 1982Rohco, Inc.Electrodeposition of copper, acidic copper electroplating baths and additives therefor
US47818013 Feb 19871 Nov 1988McGean-Rohco, Inc.Method of copper plating gravure rolls
US508454231 May 199028 Jan 1992E. I. du Pont de Nemours and CompanyEpoxy/isocyanate crosslinked coatings containing 1,3-disubstituted imidazole-2-thione catalysts
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US541784125 Oct 199423 May 1995McGean-Rohco, Inc.Copper plating of gravure rolls
US670956813 Jun 200223 Mar 2004Advanced Technology Materials, Inc.Method for determining concentrations of additives in acid copper electrochemical deposition baths
US688131920 Dec 200119 Apr 2005Shipley Company, L.L.C.Electrolytic copper plating solution and method for controlling the same
US742734423 Dec 200523 Sep 2008Advanced Technology Materials, Inc.Methods for determining organic component concentrations in an electrolytic solution
US74273464 May 200423 Sep 2008Advanced Technology Materials, Inc.Electrochemical drive circuitry and method
US743532030 Apr 200414 Oct 2008Advanced Technology Materials, Inc.Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions