US3574650A - Vacuum vapor deposition with control of elevation of metal melt - Google Patents

Vacuum vapor deposition with control of elevation of metal melt Download PDF

Info

Publication number
US3574650A
US3574650A US806956A US3574650DA US3574650A US 3574650 A US3574650 A US 3574650A US 806956 A US806956 A US 806956A US 3574650D A US3574650D A US 3574650DA US 3574650 A US3574650 A US 3574650A
Authority
US
United States
Prior art keywords
pool
elevation
spot
molten
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US806956A
Inventor
Randolph D House
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Technologies Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Application granted granted Critical
Publication of US3574650A publication Critical patent/US3574650A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/543Controlling the film thickness or evaporation rate using measurement on the vapor source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F23/00Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
    • G01F23/22Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water
    • G01F23/28Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water by measuring the variations of parameters of electromagnetic or acoustic waves applied directly to the liquid or fluent solid material
    • G01F23/284Electromagnetic waves
    • G01F23/292Light, e.g. infrared or ultraviolet

Definitions

  • the present invention relates in general to a method for sensing changes in the relative location of a material and more particularly relates to an electro-optical method for sensing and controlling the relative surface location of a light reflective material.
  • the invention is particularly useful in detecting and controlling the surface elevation of an incandescent metal melt as it is depleted by evaporation in a vacuum vapor deposition process.
  • aluminide coatings such as that described in the patent to Joseph 3,102,044, have in the past displayed satisfactory performance, it is well known that these coatings, because of their dependence upon the availability of substrate elements, often are characterized by a composition less than optimum.
  • CoCrAlY coating at a nominal composition of, by weight, percent chromium, 15 percent aluminum, O.5 percent yttrium, balance iron, as discussed in the copending application of Frank P. Talboom, r. et a]. entitled Iron Base Coating for the Superalloys, Ser. No. 731,650, filed May 23, 1968.
  • CoCrAlY composition at about, by weight, 21 percent chromium, 15 percent aluminum, 0.7 percent yttrium, balance cobalt.
  • a significant problem in existing vacuum vapor deposition processes has been a lack of effective means for sensing and maintaining the molten source pool at a constant height. It has been demonstrated that coating efiiciency, composition and uniformity are very susceptible to pool height changes. This is true not only with regard to relative changes in position and spacing between source and substrate, but more importantly, with regard to relative changes in elevation of the molten pool within the crucible. Recently, several techniques have been developed to improve the effectiveness of the basic process through the mechanism of monitoring the coating source material elevation. In one such method, a radioactive 1sotope is utilized as a source of radiation in a system wherein the amount of radiation passing over or through the molten pool indicates the elevational location thereof.
  • the present invention contemplates detection and control of a displaceable material having reflective properties by the utilization of a light beam of sufiicient intensity to be monitored in reflection.
  • a high intensity monochromatic light beam such as a laser beam is utilized in a vapor vacuum deposition process and is focused on the surface of the molten source metal pool at a predetermined angle of incidence.
  • the reflected beam is refocused onto a photodetector which is sensitive to movements of the beam caused by elevational displacement of the pool surface.
  • the photodetector in essence, monitors and maintains the evaporating molten metal at a constant elevation to ensure process uniformity and reproducibility.
  • a vacuum chamber 10 having an exit port 12 leading to a suitable high vacuum pump, preferably of the dilIusion type, for the rapid and continuous evacuation of the chamber.
  • a suitable high vacuum pump preferably of the dilIusion type
  • an electron gun 14 for generating a beam of charged particles to impinge upon and vaporize an ingot of source metal 16.
  • the electron beam is suitably directed by conventional magnetic deflection pole pieces 18.
  • the arrangement of the electron beam gun within the vacuum chamber is a function of design.
  • a 30 kilowatt electron beam unit has been used to melt and vaporize the upper end of ingot 16 to create a molten source pool having a reflecting surface 20. Satisfactory deposition rates have been achieved with a two inch diameter ingot of a FeCrAly coating material, the depth of the molten pool usually being /4 /2 inch.
  • the ingot 16 is slidably received at its upper end by a fixed annular water cooled copper crucible 22.
  • the ingot is movable vertically by an actuator or motor means 24 which in turn is electrically controlled by means herein- 3 after described.
  • the ingot 16 passes through a suitable heat resistant vacuum seal 26 in the chamber base.
  • a substrate 27, to be coated is disposed within the vacuum chamber vertically above the pool surface 20. Since the process is fundamentally line-of-sight, the part is typically mounted to effect rotation about its longitudinal axis, usually utilizing a vacuum sealed pass-through (not shown) through the vacuum chamber to an external drive system. Of course, more than one part may be coated at a time. In such a case, in order to minimize non-uniformity of coating between each of the plurality of parts, each part is normally mounted in a plane of vapor isodensity or roughly along an arc defining a zone of constant vapor concentration, the parts closest to the vertical passing through the center of the molten pool being located slight- 1y farther from the pool surface than those positioned at an angle with respect to the said vertical.
  • each substrate is further positioned as close as possible to the surface of the molten source pool without being subjected to nudesirable coating contamination by splash from the pool.
  • the substrate height varies with each system but for a two inch diameter pool and a deposition rate of about 0.3 mil per minute with a FeCrAlY coating material, a mean height of about inches has been found satisfactory.
  • a source of I high energy monochromatic light such as a laser 28.
  • a 1.0 milliwatt helium-neon gas laser has been found satisfactory.
  • the light beam designated by the numeral 30, is projected and focused to a small spot 31 on the reflecting surface of the molten body by appropriate source optics, such as by a microscope objective lens 32 and a lano-convex lens 34.
  • the optical components 32 and 34 are protected against vapor fouling by an inwardly projecting tubular encasement 36 having a transparent window 38 which seals the aforementioned optics from the chamber.
  • the window 38 is itself protected against fouling by suitable apparatus, such as a tube shield 40 provided with an inert gas swee introduced through a gas inlet 42.
  • the free end of the shield 40 is apertured at 44 with the opening just large enough to permit uninterrupted passage of the light beam.
  • the relative sizes of the optical and protective components can of course vary. However, best results have been obtained by providing a large focal distance between the lens 34 and the spot 31, and a relatively small aperture 44. For example, components giving a focal distance of 33 inches with a beam diameter of /2 inch at the lens 34 and a tube shield 15 inches long and apertured to closely circumscribe the beam at a location approximately 16 inches from the spot 31 were found desirable. As will subsequently be understood, such a relation is advantageous in that there is provided a large depth of field which reduces the effect of a changing spot size at the deflector face due to changes in the height of the molten pool.
  • a long focal distance ensures a greater separative distance from the molten pool to minimize vapor condensate contamination while a small aperture 44 corresponding to the small diameter beam reduces the gas load, on the vacuum system, imposed by the protective inert gas sweep.
  • the light beam reflected from spot 31 is intercepted and focused onto a spot 46 on the face of a light sensitive detector 48 by similar appropriate detector optics such as plane-convex lens 50 and microscope objective lens 52.
  • the detector optics are protected against vapor fouling in the same way as the source optics.
  • an encasement 54 having a window 56, the window being protected by an inert gas sweep in a tube shield 58 with a gas inlet 60 and aperture 62.
  • the detector 48 is preferably comprised of matching photo electric cells 64, disposed within the focal plane of the reflected beam and separated by a narrow horizontal gap 66, with each cell connected to appropriate electrical lead lines 68.
  • a photodetector comprised of a two element silicon Schottky barrier photodiode has been found satisfactory.
  • the detector 48 is preceded by a narrow bandpass filter 70 which has its bandpass centered on the laser wavelength, and which is preferably a narrow bandpass dielectric film optical interference filter. It can be seen that as the source material is depleted by evaporation, the pool surface 20 is lowered in elevation, thus altering the vertical and horizontal position of the spot 31 on the pool surface where reflection occurs.
  • the spot 46 is concomitantly displaced from a position of balance in relation to the gap 66 to a position of imbalance whereby the spot impinges more fully on one photo cell 64 than the other, thus causing electrically unbalanced signals to be generated in the lead lines 68.
  • the photo cells 64 may be employed as the active elements of a Wheatstone bridge circuit including in the signal processor whereby unbalancing of electrical signals can be utilized to cause the actuator to move the ingot 16 in the appropriate direction until balance is achieved.
  • the detector optics 50, 52 are positioned so that the reflecting spot 31 and the photoelectric detector 48 are at the conjugate foci thereof. In this way, even though the surface wave amplitudes may become large enough to cause the reflected beam to miss, at times, the detector optics entirely, the system still functions effectively because there results a periodic sweeping of the beam across the aforementioned detector optics.
  • the detectors At each sweep, the detectors produce output pulses the relative magnitudes of which are dependent upon the height of spot 31 during the brief interval that the reflected beam is intercepted by the detector optics.
  • the signal processor time averages the pulses and provides a control signal proportional to the diflerence between a desired control height and the time average height of the molten surface.
  • the incident beam 30 is preferably projected at a relatively large angle of incidence, 6. It will be appreciated that since the sensitivity to pool height is proportional to twice the sine of the angle 0, an angle of incidence in the range of 30 to is preferable, although the system is operable at angles as small as 10. An angle of incidence of approximately 70 however is found to give best results in the present system since 70 affords a satisfactory compromise between optimizing sensitivity while avoiding interference by the edges of the crucible with the incident and reflected beams.
  • a conventional beam splitter 74 and viewing screen with integral reticle 76 are illustrated as providing a means for effecting visual observation of the elevation of the pool surface.

Abstract

IN THE PROCESSES FOR FORMING PROTECTIVE COATINGS ON METAL SUBSTRATES, PARTICULARLY THE NICKEL-BASE AND COLBALTBASE SUPERALLOYS, BY MELTING A COATING MATERIAL TO CAUSE VAPORIZATION THEREOF, A MONOCHROMATIC LIGHT BEAM IN UTI-

LIZED IN SENSING AND CONTROLLING DISPLACEMENT OF THE SURFACE ELEVATION OF THE MELT.

Description

April 13, 1971 R. D. HOUSE 3,574,650
VACUUM VAPOR DEPOSITION WITH CONTROL OF ELEVATION OF METAL MELT Filed March 15, 1969 ///lII/IIIIIIlI/IIIII/III/(IIIII/IIIIl/IIII/II/IIIIlIll/IIII/I'll!Ill/III/lI/I/IIIIIIIIIIIIIIIIIIIfl/Il l IIIIIIIIIIIIIIIIIIIIII" \\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\s \\\\\\\\\\\v llm I iii]? INVENTOR. RANDOLPH D. HOUSE ATTORNEY United States Patent US. Cl. 117-107 5 Claims ABSTRACT OF THE DISCLOSURE In the processes for forming protective coatings on metal substrates, particularly the nickel-base and cobaltbase superalloys, by melting a coating material to cause vaporization thereof, a monochromatic light beam is utilized in sensing and controlling displacement of the surface elevation of the melt.
BACKGROUND OF THE INVENTION The present invention relates in general to a method for sensing changes in the relative location of a material and more particularly relates to an electro-optical method for sensing and controlling the relative surface location of a light reflective material. The invention is particularly useful in detecting and controlling the surface elevation of an incandescent metal melt as it is depleted by evaporation in a vacuum vapor deposition process.
It is well known that the conventional nickel-base and cobalt-base superalloys do not in and of themselves exhibit sufficient oxidation-erosion resistance to provide component operating lives of reasonable duration in the dynamic oxidizing environments such as those associated with the operation of gas turbine engines. Accordingly, it has been the usual practice to provide these alloys with a protective coating in such applications.
Although the aluminide coatings, such as that described in the patent to Joseph 3,102,044, have in the past displayed satisfactory performance, it is well known that these coatings, because of their dependence upon the availability of substrate elements, often are characterized by a composition less than optimum.
Many of the more advanced coatings developed for the next generation of jet engines depend in the first instance on the deposition of a high melting point coating alloy with a concurrent or subsequent reaction with the substrate to attain the desired end composition, microstructure or adherence. These new alloys generally demand the application of special coating techniques to provide the right species in the right amounts on the surfaces to be protected.
Several coating compositions of current interest are described in detail in copending applications of the present assignee. Among these compositions is that hereinafter referred to as the FeCrAlY coating at a nominal composition of, by weight, percent chromium, 15 percent aluminum, O.5 percent yttrium, balance iron, as discussed in the copending application of Frank P. Talboom, r. et a]. entitled Iron Base Coating for the Superalloys, Ser. No. 731,650, filed May 23, 1968. Another such composition is the CoCrAlY composition at about, by weight, 21 percent chromium, 15 percent aluminum, 0.7 percent yttrium, balance cobalt.
The basic problems associated with the deposition of these coating alloys relates to their high melting points and the ditficulty of providing the right amount of all of the alloy species in the coating as applied. Satisfactory results have been attained through the use of vacuum vapor deposition techniques, such as that suggested in the patent to Steigerwald 2,746,420. These processes, which have in the past been primarily directed toward the appliice cation of relatively low temperature materials of relatively simple composition are, in the present instance, characterized by extreme sensitivity to variations in the process parameters and, accordingly, reproducibility as Well as processing expense are formidable problems.
A significant problem in existing vacuum vapor deposition processes has been a lack of effective means for sensing and maintaining the molten source pool at a constant height. It has been demonstrated that coating efiiciency, composition and uniformity are very susceptible to pool height changes. This is true not only with regard to relative changes in position and spacing between source and substrate, but more importantly, with regard to relative changes in elevation of the molten pool within the crucible. Recently, several techniques have been developed to improve the effectiveness of the basic process through the mechanism of monitoring the coating source material elevation. In one such method, a radioactive 1sotope is utilized as a source of radiation in a system wherein the amount of radiation passing over or through the molten pool indicates the elevational location thereof.
SUMMARY OF THE INVENTION The present invention contemplates detection and control of a displaceable material having reflective properties by the utilization of a light beam of sufiicient intensity to be monitored in reflection.
According to a preferred embodiment of the invention, a high intensity monochromatic light beam such as a laser beam is utilized in a vapor vacuum deposition process and is focused on the surface of the molten source metal pool at a predetermined angle of incidence. The reflected beam is refocused onto a photodetector which is sensitive to movements of the beam caused by elevational displacement of the pool surface. The photodetector, in essence, monitors and maintains the evaporating molten metal at a constant elevation to ensure process uniformity and reproducibility.
BRIEF DESCRIPTION OF THE DRAWING An understanding of the invention will become more apparent to those skilled in the art by reference to the following detailed description when viewed in light of the accompanying drawing, wherein is shown a schematic llustration, partially in section, of a vacuum vapor coatmg apparatus in accordance with this invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS In one particular embodiment as illustrated in the drawmg, there is shown a vacuum chamber 10 having an exit port 12 leading to a suitable high vacuum pump, preferably of the dilIusion type, for the rapid and continuous evacuation of the chamber. Located inside the chamber, there is shown an electron gun 14 for generating a beam of charged particles to impinge upon and vaporize an ingot of source metal 16. It will be appreciated by those skilled in the art that the electron beam is suitably directed by conventional magnetic deflection pole pieces 18. Of course, the arrangement of the electron beam gun within the vacuum chamber is a function of design. A 30 kilowatt electron beam unit has been used to melt and vaporize the upper end of ingot 16 to create a molten source pool having a reflecting surface 20. Satisfactory deposition rates have been achieved with a two inch diameter ingot of a FeCrAly coating material, the depth of the molten pool usually being /4 /2 inch.
The ingot 16 is slidably received at its upper end by a fixed annular water cooled copper crucible 22. The ingot is movable vertically by an actuator or motor means 24 which in turn is electrically controlled by means herein- 3 after described. The ingot 16 passes through a suitable heat resistant vacuum seal 26 in the chamber base.
A substrate 27, to be coated, is disposed within the vacuum chamber vertically above the pool surface 20. Since the process is fundamentally line-of-sight, the part is typically mounted to effect rotation about its longitudinal axis, usually utilizing a vacuum sealed pass-through (not shown) through the vacuum chamber to an external drive system. Of course, more than one part may be coated at a time. In such a case, in order to minimize non-uniformity of coating between each of the plurality of parts, each part is normally mounted in a plane of vapor isodensity or roughly along an arc defining a zone of constant vapor concentration, the parts closest to the vertical passing through the center of the molten pool being located slight- 1y farther from the pool surface than those positioned at an angle with respect to the said vertical. Whether coating a single part or a plurality of parts however, each substrate is further positioned as close as possible to the surface of the molten source pool without being subjected to nudesirable coating contamination by splash from the pool. The substrate height varies with each system but for a two inch diameter pool and a deposition rate of about 0.3 mil per minute with a FeCrAlY coating material, a mean height of about inches has been found satisfactory.
As indicated previously, keeping the molten pool surface at a constant elevation is of great importance in maximizing coating efliciency, uniformity and composition. Although prior attempts to monitor and control vapor source materials have been useful, it is believed that the present electro-optical displacement sensing system is distinct and advantageous in accomplishing this end.
As shown in the drawing, there is provided a source of I high energy monochromatic light, such as a laser 28. In
practice, a 1.0 milliwatt helium-neon gas laser has been found satisfactory. The light beam, designated by the numeral 30, is projected and focused to a small spot 31 on the reflecting surface of the molten body by appropriate source optics, such as by a microscope objective lens 32 and a lano-convex lens 34. The optical components 32 and 34 are protected against vapor fouling by an inwardly projecting tubular encasement 36 having a transparent window 38 which seals the aforementioned optics from the chamber. The window 38 is itself protected against fouling by suitable apparatus, such as a tube shield 40 provided with an inert gas swee introduced through a gas inlet 42. The free end of the shield 40 is apertured at 44 with the opening just large enough to permit uninterrupted passage of the light beam. The relative sizes of the optical and protective components can of course vary. However, best results have been obtained by providing a large focal distance between the lens 34 and the spot 31, and a relatively small aperture 44. For example, components giving a focal distance of 33 inches with a beam diameter of /2 inch at the lens 34 and a tube shield 15 inches long and apertured to closely circumscribe the beam at a location approximately 16 inches from the spot 31 were found desirable. As will subsequently be understood, such a relation is advantageous in that there is provided a large depth of field which reduces the effect of a changing spot size at the deflector face due to changes in the height of the molten pool. Further, a long focal distance ensures a greater separative distance from the molten pool to minimize vapor condensate contamination while a small aperture 44 corresponding to the small diameter beam reduces the gas load, on the vacuum system, imposed by the protective inert gas sweep.
The light beam reflected from spot 31 is intercepted and focused onto a spot 46 on the face of a light sensitive detector 48 by similar appropriate detector optics such as plane-convex lens 50 and microscope objective lens 52. The detector optics are protected against vapor fouling in the same way as the source optics. There is provided an encasement 54 having a window 56, the window being protected by an inert gas sweep in a tube shield 58 with a gas inlet 60 and aperture 62. The detector 48 is preferably comprised of matching photo electric cells 64, disposed within the focal plane of the reflected beam and separated by a narrow horizontal gap 66, with each cell connected to appropriate electrical lead lines 68. In practice, a photodetector comprised of a two element silicon Schottky barrier photodiode has been found satisfactory. The detector 48 is preceded by a narrow bandpass filter 70 which has its bandpass centered on the laser wavelength, and which is preferably a narrow bandpass dielectric film optical interference filter. It can be seen that as the source material is depleted by evaporation, the pool surface 20 is lowered in elevation, thus altering the vertical and horizontal position of the spot 31 on the pool surface where reflection occurs.
The component of motion of the spot 31 along a line normal to the otpical axis 23 of the detector optic and lying in a vertical plane containing the optical axis, changes the angular position of the spot with respect to the axis of the detector optics. The spot 46 is concomitantly displaced from a position of balance in relation to the gap 66 to a position of imbalance whereby the spot impinges more fully on one photo cell 64 than the other, thus causing electrically unbalanced signals to be generated in the lead lines 68. By connecting the lead lines from opposite sides of the detector 48 to a signal processor 72. in turn connected to the actuator 24, it will be appreciated by those skilled in the art that the photo cells 64 may be employed as the active elements of a Wheatstone bridge circuit including in the signal processor whereby unbalancing of electrical signals can be utilized to cause the actuator to move the ingot 16 in the appropriate direction until balance is achieved.
In the described system, it is recognized that the surface of the molten metal pool in the vicinity of the small reflecting spot 31 is continually tilting at random by virtue of surface waves traversing the pool which constantly alter the direction of the reflected beam. In order to avoid excessive sensitivity to the tilting of the reflecting surface, the detector optics 50, 52 are positioned so that the reflecting spot 31 and the photoelectric detector 48 are at the conjugate foci thereof. In this way, even though the surface wave amplitudes may become large enough to cause the reflected beam to miss, at times, the detector optics entirely, the system still functions effectively because there results a periodic sweeping of the beam across the aforementioned detector optics. At each sweep, the detectors produce output pulses the relative magnitudes of which are dependent upon the height of spot 31 during the brief interval that the reflected beam is intercepted by the detector optics. The signal processor time averages the pulses and provides a control signal proportional to the diflerence between a desired control height and the time average height of the molten surface.
In order to maintain a high sensitivity to pool height changes, the incident beam 30 is preferably projected at a relatively large angle of incidence, 6. It will be appreciated that since the sensitivity to pool height is proportional to twice the sine of the angle 0, an angle of incidence in the range of 30 to is preferable, although the system is operable at angles as small as 10. An angle of incidence of approximately 70 however is found to give best results in the present system since 70 affords a satisfactory compromise between optimizing sensitivity while avoiding interference by the edges of the crucible with the incident and reflected beams.
A conventional beam splitter 74 and viewing screen with integral reticle 76 are illustrated as providing a means for effecting visual observation of the elevation of the pool surface.
It is to be understood that various modifications can be made without departing from the spirit of the present invention. It is recognized, for example, that while high intensity monochromatic electromagnetic radiation is necessary for incandescent targets such as high melting point molten metals, that polychromatic radiation may be utilized on bodies, molten or solid, which are held at lower temperatures 30 long as they are sufliciently reflective. It is similarly recognized that the body to be monitored can have reflective properties without inherently possessing a surface that is effectual as a reflector. In other words, the technique is also operable with a relatively non-reflective body which is given reflective properties by having an auxiliary reflecting surface element provided thereon.
What has been set forth above is intended primarily as exemplary to enable those skilled in the art in the practice of the invention and it should therefore be understood that within the scope of the appended claims, the invention may be practiced in other ways than as specifically described.
What is claimed is:
1. In the processes for forming protective coatings of metallic material on a substrate by vacuum vapor deposition, the improvement which comprises:
melting metallic coating material in a crucible to form a molten pool,
evaporating molten pool, thereby causing a lowering of the pool surface elevation,
establishing an incident beam of monochromatic light on said molten pool surface, said incident beam being focused onto a spot thereon, focusing, by optical means, the reflected beam onto a photodetector, said spot and said photodetector being located at the conjugate foci of the optical means whereby changes in the molten surface elevation are detected, and generating signals in said photodetector proportional to said detected changes to raise said molten pool to maintain its surface at a constant elevation. 2. The invention of claim 1 wherein the angle of incidence of the beam is approximately 70.
3. In the processes for forming protective coatings of metallic material on a substrate by vacuum vapor deposition, the improvement which comprises:
feeding an ingot of coating material upwardly through an annular crucible; melting the upper end of said ingot to form an evaporating pool having a surface level within said crucible;
establishing an incident beam of monochromatic light on said molten pool surface, said incident beam being focused to a spot thereon;
detecting changes in the position of said spot, and
generating signals proportional to said detected changes to cause movement of said ingot to maintain said molten pool surface at a constant elevation.
4. The invention of claim 3 wherein changes in the position of said spot are detected by focusing, by optical means, the reflected light beam onto a photodetector with said spot and said photodetector being at the conjugate foci of the optical means.
5. The invention of claim 4 wherein the angle of incidence of the beam is approximately References Cited UNITED STATES PATENTS 2,746,420 5/1956 Steigerwald 1l849X 3,086,889 4/1963 Strong 117107X 3,114,790 12/1963 Hanks 118-9X 3,117,024 1/1964 Ross l18-9X 3,123,712 3/1964 SpOoner 250--43.5 (L)X 3,170,383 2/1965 Hunt 118-9UX 3,244,557 4/1966 Chiou et a1 1187UX 3,316,468 4/1967 Hanks 118-9X 3,347,701 10/1967 Yamagishi et a1. 11849.1X 3,373,278 3/1968 Cilyo 250-495(8) ALFRED L. LEAVI'I'I, Primary Examiner I. R. BATTEN, I R., Assistant Examiner US. Cl. X.R.
qgxgg UNITED STATES PATENT OFFICE CERTIFICATE OF CORRECTION Patent 3l574.650 Dated @ril 13 1971 Inventoz-(s) landolph D. House It is certified that error appears in the above-identified patent and that said Letter-a Patent are hereby corrected as shown below:
Column 6, line 4, "rating pool" should read --rating molten pool-- Signed and sealed this 13th day of July 1971 (SEAL) Attest:
EDWARD M.FLETCHER,JR. WILLIAM E. SGHUYLER, J Attesting Officer Commissioner of Patent
US806956A 1969-03-13 1969-03-13 Vacuum vapor deposition with control of elevation of metal melt Expired - Lifetime US3574650A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80695669A 1969-03-13 1969-03-13

Publications (1)

Publication Number Publication Date
US3574650A true US3574650A (en) 1971-04-13

Family

ID=25195217

Family Applications (1)

Application Number Title Priority Date Filing Date
US806956A Expired - Lifetime US3574650A (en) 1969-03-13 1969-03-13 Vacuum vapor deposition with control of elevation of metal melt

Country Status (6)

Country Link
US (1) US3574650A (en)
CA (1) CA959145A (en)
DE (1) DE2012075A1 (en)
FR (1) FR2037794A5 (en)
GB (1) GB1294234A (en)
SE (1) SE366832B (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3740563A (en) * 1971-06-25 1973-06-19 Monsanto Co Electroptical system and method for sensing and controlling the diameter and melt level of pulled crystals
US3958129A (en) * 1974-08-05 1976-05-18 Motorola, Inc. Automatic crystal diameter control for growth of semiconductor crystals
US4046100A (en) * 1975-10-20 1977-09-06 Trw Inc. Apparatus for thermal deposition of metal
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
EP0024527A2 (en) * 1979-08-01 1981-03-11 Endress u. Hauser GmbH u.Co. Arrangement for measuring the level of the bath in a casting plant, in particular in the mould of a continuous-casting plant
US4396005A (en) * 1981-07-06 1983-08-02 Corning Glass Works Solar collector and control
US4508970A (en) * 1982-07-15 1985-04-02 Motorola, Inc. Melt level sensing system and method
US5617911A (en) * 1995-09-08 1997-04-08 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a support material and a deposition material
US5718951A (en) * 1995-09-08 1998-02-17 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material
US5746844A (en) * 1995-09-08 1998-05-05 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of molten metal and using a stress-reducing annealing process on the deposited metal
US5787965A (en) * 1995-09-08 1998-08-04 Aeroquip Corporation Apparatus for creating a free-form metal three-dimensional article using a layer-by-layer deposition of a molten metal in an evacuation chamber with inert environment
US6342265B1 (en) * 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
US20080160171A1 (en) * 2006-12-29 2008-07-03 United Technologies Corporation Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
WO2017048523A1 (en) * 2015-09-15 2017-03-23 Retech Systems Llc Laser sensor for melt control of hearth furnaces and the like
US11213912B2 (en) * 2018-06-25 2022-01-04 Bwxt Nuclear Operations Group, Inc. Methods and systems for monitoring a temperature of a component during a welding operation
WO2022002371A1 (en) * 2020-06-30 2022-01-06 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Method for controlling an evaporation rate of source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2482290A1 (en) * 1980-05-09 1981-11-13 Poncet Pierre Automatic height control of metal in mould during continuous casting - where projector lamp and camera contg. photoelectric cells are used to form image of metal in mould
DE3336210C2 (en) * 1982-10-06 1986-04-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Method and device for level measurement
DE3720303C2 (en) * 1987-06-19 1993-09-30 Schenck Ag Carl Sample clamping device for testing machines
DE3740227C2 (en) * 1987-11-27 1994-03-24 Schenck Ag Carl Method and device for measuring deformations on samples or test specimens in testing machines
DE3720248A1 (en) * 1987-06-19 1989-01-05 Schenck Ag Carl METHOD AND ARRANGEMENT FOR MEASURING DEFORMATION ON SAMPLES OR TEST BODIES IN TESTING MACHINES
DE10040942A1 (en) * 2000-08-21 2002-03-07 Endress Hauser Gmbh Co Filling level of bulk material determination device, especially loose solid material within a container, using a matrix of measurement points on the material surface to precisely determine the material volume

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3740563A (en) * 1971-06-25 1973-06-19 Monsanto Co Electroptical system and method for sensing and controlling the diameter and melt level of pulled crystals
US3958129A (en) * 1974-08-05 1976-05-18 Motorola, Inc. Automatic crystal diameter control for growth of semiconductor crystals
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US4046100A (en) * 1975-10-20 1977-09-06 Trw Inc. Apparatus for thermal deposition of metal
EP0024527A2 (en) * 1979-08-01 1981-03-11 Endress u. Hauser GmbH u.Co. Arrangement for measuring the level of the bath in a casting plant, in particular in the mould of a continuous-casting plant
EP0024527A3 (en) * 1979-08-01 1981-10-28 Endress u. Hauser GmbH u.Co. Arrangement for measuring the level of the bath in a casting plant, in particular in the mould of a continuous-casting plant
US4420250A (en) * 1979-08-01 1983-12-13 Endress U. Hauser Gmbh U. Co. Arrangement for measuring the bath level in a continuous casting apparatus
US4396005A (en) * 1981-07-06 1983-08-02 Corning Glass Works Solar collector and control
US4508970A (en) * 1982-07-15 1985-04-02 Motorola, Inc. Melt level sensing system and method
US5718951A (en) * 1995-09-08 1998-02-17 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material
US5617911A (en) * 1995-09-08 1997-04-08 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a support material and a deposition material
US5746844A (en) * 1995-09-08 1998-05-05 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of molten metal and using a stress-reducing annealing process on the deposited metal
US5787965A (en) * 1995-09-08 1998-08-04 Aeroquip Corporation Apparatus for creating a free-form metal three-dimensional article using a layer-by-layer deposition of a molten metal in an evacuation chamber with inert environment
US5960853A (en) * 1995-09-08 1999-10-05 Aeroquip Corporation Apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material
US6342265B1 (en) * 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
US6617574B2 (en) 1997-08-20 2003-09-09 Triumf Apparatus for in-situ thickness and stoichiometry measurement of thin films
US20080160171A1 (en) * 2006-12-29 2008-07-03 United Technologies Corporation Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
JP2008163464A (en) * 2006-12-29 2008-07-17 United Technol Corp <Utc> Process for adjusting feed rate in electron-beam physical vapor deposition apparatus, electron beam physical vapor deposition apparatus and method for manufacturing multi-component condensate free of lamination using the apparatus
EP1939924A3 (en) * 2006-12-29 2008-11-12 United Technologies Corporation Electron beam physical vapor deposition apparatus and processes
WO2017048523A1 (en) * 2015-09-15 2017-03-23 Retech Systems Llc Laser sensor for melt control of hearth furnaces and the like
US11213912B2 (en) * 2018-06-25 2022-01-04 Bwxt Nuclear Operations Group, Inc. Methods and systems for monitoring a temperature of a component during a welding operation
WO2022002371A1 (en) * 2020-06-30 2022-01-06 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Method for controlling an evaporation rate of source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation

Also Published As

Publication number Publication date
DE2012075A1 (en) 1970-09-10
SE366832B (en) 1974-05-06
GB1294234A (en) 1972-10-25
FR2037794A5 (en) 1970-12-31
CA959145A (en) 1974-12-10

Similar Documents

Publication Publication Date Title
US3574650A (en) Vacuum vapor deposition with control of elevation of metal melt
US5858478A (en) Magnetic field pulsed laser deposition of thin films
CN107148494B (en) Lighthouse scanner with rotating mirror and annular target
US5084300A (en) Apparatus for the ablation of material from a target and coating method and apparatus
US6110337A (en) Sputtering method and apparatus with optical monitoring
EP0497499A1 (en) Thin film coating and method
US6214408B1 (en) Method for the operation of an electron beam
Maxman Target preparation techniques
GB1031963A (en) Improved method and apparatus for producing vapors
US2428868A (en) Apparatus for producing hardened optical coatings by electron bombardment
JPH04110644A (en) Apparatus for measuring on-line alloyed degree of alloyed galvanized steel plate
US4238525A (en) Method and apparatus for vacuum depositing thin coatings using electron beams
USRE27930E (en) Vacuum vapor deposition with control of flevation of metal melt
Greer et al. Future trends for large-area pulsed laser deposition
US5238546A (en) Method and apparatus for vaporizing materials by plasma arc discharge
Groh Vacuum deposition of thin films by means of a CO2 laser
MXPA05006762A (en) Vacuum arc source comprising a device for generating a magnetic field.
US3620815A (en) Vapor collimation in vacuum deposition of coatings
CA2065833A1 (en) Process for forming metal film, on surface of synthetic resin substrate
US3854984A (en) Vacuum deposition of multi-element coatings and films with a single source
Vahvaselkä X-ray diffraction analysis of liquid Hg, Sn, Zn, Al and Cu
Wade et al. Small angle electron scattering from vacuum condensed metallic films II. Experimental results
US4472453A (en) Process for radiation free electron beam deposition
DE4006456C1 (en) Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
Maier-Komor et al. Completion of the plant for laser plasma ablation-deposition of carbon