|
| US4038171 | 31 Mar 1976 | 26 Jul 1977 | Battelle Memorial Institute | Supported plasma sputtering apparatus for high deposition rate over large area |
| US4221652 | 6 Apr 1976 | 9 Sep 1980 | Kabushiki Kaisha Tokuda Seisakusho | Sputtering device |
| US5130005 | 13 Dec 1990 | 14 Jul 1992 | Materials Research Corporation | Magnetron sputter coating method and apparatus with rotating magnet cathode |
| USH2209 | 14 Apr -96 | | The United States of America as represented by the Secretary of the Navy | Large area metallization pretreatment and surface activation system |
