US2495457A - Method of treating cathodes for electrowinning manganese - Google Patents
Method of treating cathodes for electrowinning manganese Download PDFInfo
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- US2495457A US2495457A US573138A US57313845A US2495457A US 2495457 A US2495457 A US 2495457A US 573138 A US573138 A US 573138A US 57313845 A US57313845 A US 57313845A US 2495457 A US2495457 A US 2495457A
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- Prior art keywords
- cathodes
- manganese
- silicate
- deposited
- stripping
- Prior art date
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- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 title claims description 34
- 229910052748 manganese Inorganic materials 0.000 title claims description 34
- 239000011572 manganese Substances 0.000 title claims description 34
- 238000000034 method Methods 0.000 title claims description 5
- 238000005363 electrowinning Methods 0.000 title claims description 4
- 239000003792 electrolyte Substances 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 4
- 230000001464 adherent effect Effects 0.000 claims description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000003599 detergent Substances 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 241001672769 Crimora Species 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 206010010071 Coma Diseases 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- -1 alkyl silicates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 239000001166 ammonium sulphate Substances 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
- C25C7/08—Separating of deposited metals from the cathode
Definitions
- This invention relates, generally, to the electrowinning of manganese and it has particular relation to the treatment of cathode plates to facilitate stripping the deposited manganese therefrom.
- an important aim of this invention is to reduce the loss of manganese after it is electro-deposited on the cathodes.
- Another important aim of this invention is to facilitate the stripping of the manganese from the cathodes.
- Sill another aim of the invention is to increase the amount of manganese that can be readily stripped from the cathodes on which it has been deposited by electrolytic action. Another aim of this invention is to reduce the amount of buffing or polishing operations in the preparation of cathodes for the electro-deposition of manganese. A still further aim of the invention is to avoid the necessity for treating the cathodes with acid to remove substantial amounts of the adhered manganese. Another aim of the invention is to accomplish the foregoing desired results by providing on the cathodes a thin film of material of such nature that it does not interfere with the deposition of the manganese but does facilitate stripping of the manganese therefrom.
- the properly prepared cathode plates invention there is provided on the properly prepared cathode plates invention, it has been coma fihn which, while permitting the electro-deposition thereon of manganese and sufficient adherence thereto to avoid loss, greatly facilitates stripping of the deposited manganese.
- the present invention it has been possible to strip off readily in excess of 98% of the deposited manganese.
- the cathodes are first buffed and polished to provide a mirror-like surface. They are then washed with a suitable detergent such as sodium or potassium hydroxide, carbonate, phosphate, or soap to remove whatever grease and dirt that may remain. With the detergent there is preferably included in the solution a soluble alkali silicate, such as sodium or potassium silicate. The washed cathodes are then thoroughly rinsed with water to remove any excess silicate. It is contemplated that alkyl silicates may also be used.
- the silicate can be applied separately, instead of with the cleaning solution, as set forth above.
- the cathodes should be rinsed sufliciently to remove excess silicate but not to such an extent that the thin film is completely removed or destroyed.
- the electrolyte, from which the manganese is deposited, should be neutral or slightly alkaline so that the thin silicate film will remain on the cathodes. It has been found that, when the pH of the electrolyte is maintained at from 7.8 to 8.6, the film remains on the cathodes even after several successive deposits of manganese have been stripped therefrom. It has not been necessary to treat the cathodes with an acid after each stripping operation to remove substantial amounts of manganese, or to buff andpolish them each time. Rather, the cathodes can be used several times without further polishing after each stripping operation, but must be treated with the silicate solution after each use.
- cathodes of stainless steel alloy of type 316, containing approximately 18% chromium, 8% nickel and 2% molybdenum, when treated as herein set forth, admit of 98% or better stripping of the deposited manganese.
- Other stainless steel alloys such as 18% chromium, 8% nickel, can also be used with satisfactory results.
- the cathodes may be made of other kinds of steel or aluminum for practicing the invention.
- cathodes of stainless steel alloy of the type 316 were used. They were first buffed and polished to provide a mirrorlike surface over each side. Then they were washed with a detergent to remove any residual dirt and grease. Next, the cathodes were immersed in a to 5% solution of sodium silicate. This was followed by rinsing with a Water spray for from five to ten minutes and then they were dried. There was then left a very thin film of undetermined composition on the cathodes which greatly facilitated subsequent stripping.
- the cathodes were then placed in a cell in which the electrolyte contained to grams, per liter, of manganese in the form-of sulphate and approximately 125 to 175 grams per liter of ammonium sulphate. tion of the manganese on the cathodes the pH of the electrolyte was held at 7.8 to 8.6.
- the cathodes were removed from the cell and the manganese was readily stripped therefrom.
- the stripping of the deposited manganese resulted in a recovery of 98% of the metal.
- the cathodes may be used for the deposition of manganese for as many as five times without repeating the bufiing or polishing operation.
- the cathodes may be treated with sulphuric acid to-remove the small remainderof manganese.
- the silicate film is then restored each time in the manner herein set-forth. The excess silicate is removed by the rinsing step.
- One reason for this ' is to prevent premature stripping of the deposited manganese either in the cell or before the cathodes are removed to the place where the stripping operation is performed.
- the silicate can be combined with the detergent solution so that it During the electro-deposiwill be unnecessary to employ separate steps in washing the cathodes and forming the silicate film thereon. While the cathodes should be subsequently rinsed to remove the excess silicate, the rinsing operation should not be carried out for such length of time or under such conditions as will completely remove the silicate film.
Description
' is to be electrolytically deposited.
Patented Jan. 24, 1950 METHOD OF TREAT ELECTROWINNI James H. Jacobs, Boul mesne assignments,
Development Corporation,
. poration of Virginia ING CATHODES FOR NG MANGANESE der City, Nev., assignor, by to Crimora Research and Crimora, Va., a cor- No Drawing. Application January 16, 1945, Serial No. 573,138
2 Claims. (01. 204-105 This invention relates, generally, to the electrowinning of manganese and it has particular relation to the treatment of cathode plates to facilitate stripping the deposited manganese therefrom.
Prior to the present mon practice to spend a great deal of time and effort in preparing cathodes on which manganese They are usually buffed carefully to provide a smooth, polished surface. The purpose of this has been to facilitate stripping and remove as large an amount as possible of the deposited manganese. It has been necessary to repeat the buffing operation after each stripping operations In some instances, the manganese has been stripped by heating the cathodes and, afterwards, flexing or vibrating them.
Even though the foregoing operations are carefully performed, there has been a substantial loss of the deposited manganese, because of its adherence to the cathodes. It has been necessary to remove the adhered metal by the use of acid, and it has to be recovered again. Moreover, there has been some loss as a result of some of the manganese dropping off the cathodes while they are in the cell or being transferred therefrom for the stripping operation. Accordingly, an important aim of this invention is to reduce the loss of manganese after it is electro-deposited on the cathodes. Another important aim of this invention is to facilitate the stripping of the manganese from the cathodes. Sill another aim of the invention is to increase the amount of manganese that can be readily stripped from the cathodes on which it has been deposited by electrolytic action. Another aim of this invention is to reduce the amount of buffing or polishing operations in the preparation of cathodes for the electro-deposition of manganese. A still further aim of the invention is to avoid the necessity for treating the cathodes with acid to remove substantial amounts of the adhered manganese. Another aim of the invention is to accomplish the foregoing desired results by providing on the cathodes a thin film of material of such nature that it does not interfere with the deposition of the manganese but does facilitate stripping of the manganese therefrom.
Other aims and objects will appear in the following description, to which reference is made for a more complete understanding of the nature and scope of the invention.
In accordance with this invention, there is provided on the properly prepared cathode plates invention, it has been coma fihn which, while permitting the electro-deposition thereon of manganese and sufficient adherence thereto to avoid loss, greatly facilitates stripping of the deposited manganese. When the present invention is used it has been possible to strip off readily in excess of 98% of the deposited manganese. g
The cathodes are first buffed and polished to provide a mirror-like surface. They are then washed with a suitable detergent such as sodium or potassium hydroxide, carbonate, phosphate, or soap to remove whatever grease and dirt that may remain. With the detergent there is preferably included in the solution a soluble alkali silicate, such as sodium or potassium silicate. The washed cathodes are then thoroughly rinsed with water to remove any excess silicate. It is contemplated that alkyl silicates may also be used.
If desired, the silicate can be applied separately, instead of with the cleaning solution, as set forth above. In either case, the cathodes should be rinsed sufliciently to remove excess silicate but not to such an extent that the thin film is completely removed or destroyed.
The electrolyte, from which the manganese is deposited, should be neutral or slightly alkaline so that the thin silicate film will remain on the cathodes. It has been found that, when the pH of the electrolyte is maintained at from 7.8 to 8.6, the film remains on the cathodes even after several successive deposits of manganese have been stripped therefrom. It has not been necessary to treat the cathodes with an acid after each stripping operation to remove substantial amounts of manganese, or to buff andpolish them each time. Rather, the cathodes can be used several times without further polishing after each stripping operation, but must be treated with the silicate solution after each use.
Excellent results have been obtained using stainless steel cathodes. In particular, it has been found that cathodes of stainless steel alloy of type 316, containing approximately 18% chromium, 8% nickel and 2% molybdenum, when treated as herein set forth, admit of 98% or better stripping of the deposited manganese. Other stainless steel alloys, such as 18% chromium, 8% nickel, can also be used with satisfactory results. It is also contemplated that the cathodes may be made of other kinds of steel or aluminum for practicing the invention.
By way of a specific example, cathodes of stainless steel alloy of the type 316, were used. They were first buffed and polished to provide a mirrorlike surface over each side. Then they were washed with a detergent to remove any residual dirt and grease. Next, the cathodes were immersed in a to 5% solution of sodium silicate. This was followed by rinsing with a Water spray for from five to ten minutes and then they were dried. There was then left a very thin film of undetermined composition on the cathodes which greatly facilitated subsequent stripping.
The cathodes were then placed in a cell in which the electrolyte contained to grams, per liter, of manganese in the form-of sulphate and approximately 125 to 175 grams per liter of ammonium sulphate. tion of the manganese on the cathodes the pH of the electrolyte was held at 7.8 to 8.6.
The cathodes were removed from the cell and the manganese was readily stripped therefrom. The stripping of the deposited manganese resulted in a recovery of 98% of the metal.
By way of comparison, when the foregoing steps were carried out using cathodes of 18-3 stainless steel, 85% of the deposited manganese was stripped off. It is evident that superior results are obtained when the cathodes are of 18-8 molybdenum steel In order to demonstrate the eifect .of the sillcate film, the foregoing steps were followed, except that no silicate was used. When the cathodes were of 18-8 molybdenum steel, there was stripped only 39% of the deposited manganese. Under similar conditions, when 18-8 stainless steel cathodes were employed only 15% of the deposited managanese was stripped off.
When it is desired to again deposit manganese on the cathodes on which a silicate film has been formed, as set forth herein, it is unnecessary to repeat the polishing operation immediately. It has been found that the cathodes may be used for the deposition of manganese for as many as five times without repeating the bufiing or polishing operation. However, it is preferable to provide the silicate film on the cathodes after each deposition of manganese thereon and the same is stripped therefrom. After each stripping operation the cathodes may be treated with sulphuric acid to-remove the small remainderof manganese. The silicate film is then restored each time in the manner herein set-forth. The excess silicate is removed by the rinsing step. One reason for this 'is to prevent premature stripping of the deposited manganese either in the cell or before the cathodes are removed to the place where the stripping operation is performed.
As hereinbefore indicated, the silicate can be combined with the detergent solution so that it During the electro-deposiwill be unnecessary to employ separate steps in washing the cathodes and forming the silicate film thereon. While the cathodes should be subsequently rinsed to remove the excess silicate, the rinsing operation should not be carried out for such length of time or under such conditions as will completely remove the silicate film.
It will be understood that the foregoing description is merely illustrative of the invention and is not to be construed as limiting it, except as set forth in the appended claims.
What is claimed is:
1. In the method of electrowinning manganese from an alkaline electrolyte and employing stainlesssteel cathode plates; the step which consists in polishing and cleansing the surfaces of the cathodes then coating the cleansed surfaces with very thin adherent films of a dilute solution of alkali silicate; removing any excess silicate which does not readily adhere to the surfaces; submerging the film-coated cathodesin the electrolyte; and depositing the metal thereon without destroying the films to facilitate removal of the metal and eliminate the necessity of bufiing and polishing the cathodes when they are used again. 2. The method, as setforth in claim 1, wherein the films on the cathodes are formed by coating them with a dilute sodiumsilicatesolution and wherein the coated cathodes are rinsed in water to reduce the thicknessof the coatings and leave the very thin adherent films on the surfaces.
JAMESl-I. JACOBS.
REFERENCES CITED The following references are ,of recordin jthe file of this patent:
UNITED STATES PATENTS Number Name Date 1,433,017 McKee Oct. 24, 1922 1,555,798 ,Gravell Sept.:29, 1935 2,119,560 Shelton June 7, 1938 2,325,660 Chamberlain Aug. 3,-1943 OTHER REFERENCES Metal Industry, Dec. 8, 1944, pages 358-360.
Preprint 64-8 of Electrochemical Society (N. Y. 0.), released Sept..11, 1933, pages-92, 93, .94.
Journal of the Electrodepositors Technical Society, vol. 8 (1932-33) London, pages3-10 and 3-11.
The Book of Stainless Steel by E. Thum (1935) pages 139, 140.
Bureau of Mines Bulletin, 463 (1946)., page 71.
Transactions of the American Institute of Mining and Metallurgical Engineers, vol. .159 (1944), pages 408,421, 422.
Claims (1)
1. IN THE METHOD OF ELECTROWINNING MANGANESE FROM AN ALKALINE ELECTROLYTE AND EMPLOYING STAINLESS STEEL CATHODE PLATES; THE STEP WHICH CONSISTS IN POLISHING AND CLEANSING THE SURFACES OF THE CATHODES; THEN COATING THE CLEANSED SURFACES WITH VERY THIN ADHERENT FILMS OF A DILUTE SOLUTION OF ALKALI SILICATE; REMOVING ANY EXCESS SILICATE WHICH DOES NOT READILY ADHERE TO THE SURFACES: SUBMERGING THE FILM-COATED CATHODES IN THE ELECTROLYTE; AND DEPOSITING THE METAL THEREON WITHOUT DESTROYING THE FILMS TO FACILITATE REMOVAL OF THE METAL AND ELIMINATE THE NECESSITY OF BUFFING AND POLISHING THE CATHODES WHEN THEY ARE USED AGAIN.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US573138A US2495457A (en) | 1945-01-16 | 1945-01-16 | Method of treating cathodes for electrowinning manganese |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US573138A US2495457A (en) | 1945-01-16 | 1945-01-16 | Method of treating cathodes for electrowinning manganese |
Publications (1)
Publication Number | Publication Date |
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US2495457A true US2495457A (en) | 1950-01-24 |
Family
ID=24290804
Family Applications (1)
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US573138A Expired - Lifetime US2495457A (en) | 1945-01-16 | 1945-01-16 | Method of treating cathodes for electrowinning manganese |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2755241A (en) * | 1952-07-28 | 1956-07-17 | Union Carbide & Carbon Corp | Electrowinning of manganese |
US3459646A (en) * | 1968-06-25 | 1969-08-05 | Ppg Industries Inc | Alkali metal hydroxide purification |
US6149794A (en) * | 1997-01-31 | 2000-11-21 | Elisha Technologies Co Llc | Method for cathodically treating an electrically conductive zinc surface |
US6153080A (en) * | 1997-01-31 | 2000-11-28 | Elisha Technologies Co Llc | Electrolytic process for forming a mineral |
US6572756B2 (en) | 1997-01-31 | 2003-06-03 | Elisha Holding Llc | Aqueous electrolytic medium |
US6592738B2 (en) | 1997-01-31 | 2003-07-15 | Elisha Holding Llc | Electrolytic process for treating a conductive surface and products formed thereby |
US6599643B2 (en) | 1997-01-31 | 2003-07-29 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
US20030165627A1 (en) * | 2002-02-05 | 2003-09-04 | Heimann Robert L. | Method for treating metallic surfaces and products formed thereby |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1433017A (en) * | 1920-11-05 | 1922-10-24 | Ralph H Mckee | Electrode |
US1555798A (en) * | 1923-12-13 | 1925-09-29 | James H Gravell | Metal pickling |
US2119560A (en) * | 1936-09-10 | 1938-06-07 | Stephen M Shelton | Electrolytic process for the extraction of metallic manganese |
US2325660A (en) * | 1941-01-02 | 1943-08-03 | Electro Manganese Corp | Electrodeposition of manganese and cathode therefor |
-
1945
- 1945-01-16 US US573138A patent/US2495457A/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1433017A (en) * | 1920-11-05 | 1922-10-24 | Ralph H Mckee | Electrode |
US1555798A (en) * | 1923-12-13 | 1925-09-29 | James H Gravell | Metal pickling |
US2119560A (en) * | 1936-09-10 | 1938-06-07 | Stephen M Shelton | Electrolytic process for the extraction of metallic manganese |
US2325660A (en) * | 1941-01-02 | 1943-08-03 | Electro Manganese Corp | Electrodeposition of manganese and cathode therefor |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2755241A (en) * | 1952-07-28 | 1956-07-17 | Union Carbide & Carbon Corp | Electrowinning of manganese |
US3459646A (en) * | 1968-06-25 | 1969-08-05 | Ppg Industries Inc | Alkali metal hydroxide purification |
US6149794A (en) * | 1997-01-31 | 2000-11-21 | Elisha Technologies Co Llc | Method for cathodically treating an electrically conductive zinc surface |
US6153080A (en) * | 1997-01-31 | 2000-11-28 | Elisha Technologies Co Llc | Electrolytic process for forming a mineral |
US6258243B1 (en) | 1997-01-31 | 2001-07-10 | Elisha Technologies Co Llc | Cathodic process for treating an electrically conductive surface |
US6572756B2 (en) | 1997-01-31 | 2003-06-03 | Elisha Holding Llc | Aqueous electrolytic medium |
US6592738B2 (en) | 1997-01-31 | 2003-07-15 | Elisha Holding Llc | Electrolytic process for treating a conductive surface and products formed thereby |
US6599643B2 (en) | 1997-01-31 | 2003-07-29 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
US20030178317A1 (en) * | 1997-01-31 | 2003-09-25 | Heimann Robert I. | Energy enhanced process for treating a conductive surface and products formed thereby |
US6994779B2 (en) | 1997-01-31 | 2006-02-07 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
US20030165627A1 (en) * | 2002-02-05 | 2003-09-04 | Heimann Robert L. | Method for treating metallic surfaces and products formed thereby |
US6866896B2 (en) | 2002-02-05 | 2005-03-15 | Elisha Holding Llc | Method for treating metallic surfaces and products formed thereby |
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