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Referenced by

Citing PatentFiling dateIssue dateOriginal AssigneeTitle
US540346528 May 19934 Apr 1995Gould Inc.Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives
US54219857 Apr 19926 Jun 1995Gould Inc.Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations
US543180322 Oct 199311 Jul 1995Gould Electronics Inc.Electrodeposited copper foil and process for making same
US545492623 Dec 19943 Oct 1995Gould Electronics Inc.Electrodeposited copper foil
US595820913 May 199728 Sep 1999Mitsui Mining & Smelting Co., Ltd.High tensile strength electrodeposited copper foil and process of electrodepositing thereof
US61940569 Jul 199927 Feb 2001Mitsui Mining & Smelting Co., Ltd.High tensile strength electrodeposited copper foil