US20140091537A1 - Chuck table - Google Patents
Chuck table Download PDFInfo
- Publication number
- US20140091537A1 US20140091537A1 US14/041,461 US201314041461A US2014091537A1 US 20140091537 A1 US20140091537 A1 US 20140091537A1 US 201314041461 A US201314041461 A US 201314041461A US 2014091537 A1 US2014091537 A1 US 2014091537A1
- Authority
- US
- United States
- Prior art keywords
- workpiece
- wafer
- annular seal
- seal member
- suction holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims abstract description 25
- 230000007246 mechanism Effects 0.000 description 12
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 229920001973 fluoroelastomer Polymers 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/24—Chucks characterised by features relating primarily to remote control of the gripping means
- B23B31/30—Chucks characterised by features relating primarily to remote control of the gripping means using fluid-pressure means in the chuck
- B23B31/307—Vacuum chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/10—Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
- B23K37/04—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
- B23K37/0408—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work for planar work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/11—Vacuum
Definitions
- the present invention relates to a chuck table for holding a workpiece such as a wafer.
- a workpiece such as a wafer having devices formed on the front side is processed by a laser processing apparatus including a laser processing unit, for example.
- This laser processing apparatus includes a chuck table for holding the workpiece in processing the workpiece.
- the chuck table has a suction holding member formed of a porous ceramic material. Accordingly, the workpiece is held under suction on the suction holding member of the chuck table.
- the position of application of a laser beam to the workpiece is changed to allow the processing of the workpiece.
- the workpiece to be processed by the laser processing apparatus has a warp to a certain degree.
- the workpiece has a warp due to the lamination of the substrates.
- the peripheral portion of the workpiece is higher in level than the central portion of the workpiece, the peripheral portion of the workpiece floats over the upper surface of the suction holding member, so that the degree of tight contact between the workpiece and the suction holding member becomes low.
- the chuck table cannot exert a sufficient suction holding force and therefore cannot properly hold the workpiece.
- a chuck table for holding a workpiece having a warp thereon, including a suction holding member having an upper surface as a suction holding surface for holding the workpiece under suction; an annular seal member provided so as to surround the outer circumference of the suction holding member, the annular seal member having an upper surface for supporting a peripheral portion of the workpiece held on the suction holding surface, the annular seal member being formed from an elastic member; and a vacuum source connected to the suction holding member for producing a vacuum and applying the vacuum to the suction holding surface; the upper surface of the annular seal member being set higher in level than the suction holding surface according to the warp of the workpiece; whereby when the vacuum produced by the vacuum source is applied to the suction holding surface, the peripheral portion of the workpiece comes into contact with the upper surface of the annular seal member to thereby seal off the vacuum leaking from the gap between the workpiece and the suction holding surface due to the warp of the workpiece, so that the annular seal
- the peripheral portion of the workpiece comes into contact with the annular seal member formed from an elastic member, so that a reduction in air-tightness due to the warp can be prevented to thereby properly hold the workpiece under suction.
- the annular seal member is deformed by the vacuum in holding the workpiece under suction in such a manner that the front side (upper surface) of the workpiece is flattened, so that the processability of the workpiece can be improved.
- the annular seal member is deformed by the vacuum in holding the workpiece under suction, a local stress to the workpiece can be relaxed to thereby prevent damage to the workpiece.
- FIG. 1 is a perspective view of a laser processing apparatus including a chuck table according to a preferred embodiment of the present invention
- FIG. 2 is a perspective view of the chuck table according to this preferred embodiment.
- FIGS. 3A to 3C are sectional views showing the operation of the chuck table according to this preferred embodiment in holding a wafer having a warp under suction.
- FIG. 1 is a perspective view of a laser processing apparatus (processing apparatus) 1 including a chuck table 15 according to this preferred embodiment.
- a wafer (workpiece) W is also shown in FIG. 1 in relation with the laser processing apparatus 1 .
- the laser processing apparatus 1 is so configured as to apply a laser beam to the wafer W held on the chuck table 15 , thereby allowing laser processing of the wafer W.
- the wafer W is a disk-shaped member.
- the front side (upper surface) of the wafer W is partitioned into a plurality of regions by a plurality of crossing streets.
- a plurality of devices are respectively formed in these regions partitioned by the streets on the front side of the wafer W.
- a protective tape (not shown) is attached to the back side or front side of the wafer W coming into contact with the chuck table 15 in holding the wafer W on the chuck table 15 under suction.
- the laser processing apparatus 1 has a substantially boxlike base 11 . There is provided on the upper surface of the base 11 a table moving mechanism 13 for feeding the chuck table 15 in the X direction extending along an X axis shown in FIG. 1 and also indexing the chuck table 15 in the Y direction extending along a Y axis shown in FIG. 1 .
- a wall portion 12 stands from the base 11 at its rear end behind the table moving mechanism 13 .
- the wall portion 12 is provided with an arm portion 121 projecting frontward.
- a laser processing unit 14 is supported to the arm portion 121 so as to be opposed to the chuck table 15 .
- the table moving mechanism 13 includes a pair of guide rails 131 provided on the upper surface of the base 11 so as to extend in the Y direction and a Y-axis table 132 slidably supported to the guide rails 131 .
- the table moving mechanism 13 further includes a pair of guide rails 135 provided on the upper surface of the Y-axis table 132 so as to extend in the X direction and an X-axis table 136 slidably supported to the guide rails 135 .
- a ⁇ table 151 is provided on the upper surface of the X-axis table 136 so as to be rotatable about a Z axis shown in FIG. 1 , and the chuck table 15 supported to this ⁇ table 151 .
- Nut portions (not shown) are provided on the lower surfaces of the Y-axis table 132 and the X-axis table 136 , and ball screws 133 and 137 are threadedly engaged with these nut portions of the Y-axis table 132 and the X-axis table 136 , respectively.
- Drive motors 134 and 138 are connected to the end portions of the ball screws 133 and 137 , respectively. Accordingly, when the ball screws 133 and 137 are rotationally driven by the drive motors 134 and 138 , respectively, the chuck table 15 is moved in the Y direction and the X direction along the guide rails 131 and 135 , respectively.
- the laser processing unit 14 includes a focusing unit 141 provided at the front end of the arm portion 121 .
- the focusing unit 141 includes an optical system having a focusing lens (not shown).
- the laser processing unit 14 further includes an oscillator (not shown) for oscillating a laser beam.
- the laser beam oscillated by the oscillator is focused by the focusing lens and applied to the wafer W held on the chuck table 15 .
- the chuck table 15 is relatively moved with respect to the laser processing unit 14 to thereby change the position of application of the laser beam to the wafer W, thus allowing the processing of the wafer W.
- FIG. 2 is a perspective view of the chuck table 15 according to this preferred embodiment.
- the chuck table 15 has a table base 152 fixed to the upper surface of the ⁇ table 151 (see FIG. 1 ).
- the table base 152 includes a disk-shaped base portion 152 a and a cylindrical support portion 152 b projecting upward from the central portion of the base portion 152 a.
- the peripheral portion of the base portion 152 a is formed with four through holes 152 c for fixing the table base 152 to the ⁇ table 151 . These through holes 152 c are arranged at equal intervals.
- the upper surface of the ⁇ table 151 is formed with four tapped holes (not shown) respectively corresponding to the four through holes 152 c of the base portion 152 a.
- the support portion 152 b is a solid cylindrical member and it is formed with a suction passage 152 d vertically extending through the support portion 152 b (see FIG. 3A ).
- a suction holding member 153 is provided on the central portion of the upper surface of the support portion 152 b.
- the suction holding member 153 is formed of a porous ceramic material.
- the upper end of the suction passage 152 d is covered with the suction holding member 153 .
- the lower end of the suction passage 152 d is connected through a pipe to a vacuum source (not shown) such as a vacuum pump. Accordingly, a vacuum is produced in the suction passage 152 d by operating the vacuum source, thereby holding the wafer W on a suction holding surface 153 a of the suction holding member 153 under suction.
- the side surface (cylindrical surface) of the support portion 152 b is formed with four notches 152 e arranged at equal intervals. These four notches 152 e respectively correspond to four hooks of an edge clamp type handling mechanism (not shown) for gripping the peripheral portion (edge portion) of the wafer W.
- the four hooks gripping the wafer W are respectively inserted into the four notches 152 e, thereby allowing the placement of the wafer W on the suction holding surface 153 a.
- a handling mechanism for handling the wafer W is not limited to such an edge clamp type handling mechanism. In the case that such an edge clamp type handling mechanism is not used, the support portion 152 b may not have the notches 152 e.
- the wafer W having a warp is placed on a suction holding member of a conventional chuck table in such a manner that the peripheral portion of the wafer W is higher in level than the central portion of the wafer W, the central portion of the wafer W comes into contact with the suction holding surface of the suction holding member, but the peripheral portion of the wafer W floats over the suction holding surface.
- the degree of tight contact between the wafer W and the suction holding member is low, so that the chuck table cannot exert a sufficient suction holding force and therefore cannot properly hold the wafer W.
- the chuck table 15 includes an annular seal member 154 surrounding the outer circumference of the suction holding member 153 .
- the annular seal member 154 has an inner diameter and an outer diameter such that it can hold the peripheral portion of the wafer W placed on the suction holding surface 153 a of the suction holding member 153 .
- the upper surface 154 a of the annular seal member 154 is higher in level than the suction holding surface 153 a of the suction holding member 153 . That is, the height of the upper surface 154 a of the annular seal member 154 is set greater than the height of the suction holding surface 153 a of the suction holding member 153 according to the warp of the wafer W.
- the annular seal member 154 is formed of a fluororubber sponge as an elastic member. More specifically, the annular seal member 154 is formed of a fluororubber sponge having a sponge hardness of 35.
- the annular seal member 154 is deformed by a force acting in holding the wafer W on the chuck table 15 under suction (see FIG. 3 C). That is, by producing a suitable vacuum in holding the wafer W on the chuck table 15 under suction, the warp of the wafer W can be relaxed to thereby flatten the front side (or back side) of the wafer W. As a result, the processability of the wafer W can be improved.
- the elastic member to be used for the annular seal member 154 is not limited to a fluororubber sponge, but any elastic member having a sponge hardness of 30 to 40 may be suitably used for the annular seal member 154 .
- the sponge hardness mentioned above is defined as a value measured by an instrument conforming to SRIS 0101 that is the standard for sponge hardness measuring instrument.
- the annular seal member 154 is too hard (in the case that the annular seal member 154 has a sponge hardness greater than 40), there is a possibility that a local stress may be applied to the wafer W in holding the wafer W on the chuck table 15 under suction, causing any damage to the wafer W.
- the annular seal member 154 having a suitable sponge hardness the annular seal member 154 can be deformed in holding the wafer W on the chuck table 15 under suction, so that a local stress to the wafer W can be relaxed to thereby prevent the damage to the wafer W.
- the annular seal member 154 is too soft (in the case that the annular seal member 154 has a sponge hardness less than 30), there is a possibility that the annular seal member 154 may adhere to the wafer W in holding the wafer W on the chuck table 15 under suction. In this case, even when the suction holding force of the chuck table 15 is removed, it is not easy to separate the wafer W from the chuck table 15 . Accordingly, by using the annular seal member 154 having a suitable sponge hardness, the adhesion of the annular seal member 154 to the wafer W in holding the wafer W under suction can be prevented to thereby allow easy separation of the wafer W from the chuck table 15 after removing the suction holding force.
- the side surface (outer circumferential surface) of the annular seal member 154 is formed with four notches 154 b arranged at equal intervals. These four notches 154 b of the annular seal member 154 are formed at the positions respectively corresponding to the positions of the four notches 152 e of the support portion 152 b. Owing to the formation of the notches 154 b, the wafer W can be transported by using an edge clamp type handling mechanism. However, in the case that such an edge clamp type handling mechanism is not used, the annular seal member 154 may not have the notches 154 b.
- FIG. 3A the wafer W is transported to the position above the chuck table 15 by a handling mechanism (not shown).
- the wafer W is aligned to the suction holding surface 153 a and then placed on the suction holding surface 153 a.
- the central portion W 1 of the wafer W comes into contact with the suction holding surface 153 a as shown in FIG. 3B .
- the peripheral portion W 2 of the wafer W is curved upward and therefore does not come into contact with the suction holding surface 153 a.
- the peripheral portion W 2 of the wafer W comes into contact with the upper surface 154 a of the annular seal member 154 surrounding the outer circumference of the suction holding member 153 . Since the wafer W comes into contact with the annular seal member 154 as mentioned above, air-tightness in the space S defined by the wafer W and the annular seal member 154 is ensured.
- the suction holding member 153 is formed of a porous ceramic material, so that the vacuum in the suction passage 152 d acts on the suction holding member 153 to produce a suction holding force on the suction holding surface 153 a. Since the central portion W 1 of the wafer W is in contact with the suction holding surface 153 a, the central portion W 1 is held on the suction holding surface 153 a by the suction holding force produced above.
- the peripheral portion W 2 of the wafer W is not in contact with the suction holding surface 153 a, so that the vacuum in the suction passage 152 d leaks through the gap between the wafer W and the suction holding surface 153 a into the space S defined by the wafer W and the annular seal member 154 . Accordingly, the space S defined by the wafer W and the annular seal member 154 is evacuated. As a result, a downward force by atmospheric pressure acts on the peripheral portion W 2 of the wafer W.
- the annular seal member 154 is formed from an elastic member having a predetermined sponge hardness set so that it is deformed by the force acting on the annular seal member 154 in holding the wafer W under suction. Accordingly, when the downward force by atmospheric pressure acts on the peripheral portion W 2 of the wafer W, the annular seal member 154 is sandwiched between the peripheral portion W 2 of the wafer W and the support portion 152 b and deformed so as to be depressed in the direction of thickness of the annular seal member 154 . Further, the warp of the wafer W is reduced by the downward force by atmospheric pressure, so that the front side (upper surface) of the wafer W is flattened.
- the vacuum to be produced by the vacuum source is suitably adjusted in the range where the above operation is allowed.
- the chuck table 15 includes the annular seal member 154 formed from an elastic member adapted to make the contact with the peripheral portion W 2 of the wafer W (workpiece). Accordingly, a reduction in air-tightness between the wafer W and the chuck table 15 due to the warp of the wafer W can be prevented to thereby suitably hold the wafer W on the chuck table 15 under suction. Further, the annular seal member 154 is deformed by the vacuum produced in holding the wafer W under suction in such a manner that the front side (upper surface) of the wafer W is flattened, so that the processability of the wafer W can be improved. Further, since the annular seal member 154 is deformed by the vacuum produced in holding the wafer W under suction, a local stress to the wafer W can be relaxed to thereby prevent the damage to the wafer W.
- the present invention is not limited to the above preferred embodiment, but various modifications may be made.
- the chuck table 15 is applied to a laser processing apparatus in the above preferred embodiment
- the chuck table according to the present invention may be applied to various processing apparatuses including such a laser processing apparatus.
- the chuck table according to the present invention may be applied to a cutting apparatus.
- the upper surface 154 a of the annular seal member 154 is formed as a horizontal surface parallel to the suction holding surface 153 a
- the upper surface of the annular seal member in the present invention is not especially limited.
- the upper surface of the annular seal member in the present invention may be formed as an inclined surface inclined according to the warp of the wafer (workpiece). In this case, the degree of tight contact between the annular seal member and the wafer can be improved, so that the air-tightness in the space defined by the wafer and the annular seal member can be further improved.
- the annular seal member may be replaceable.
- a plurality of annular seal members having different heights may be prepared and they may be replaced each other according to the warp of the wafer.
- a plurality of chuck tables having annular seal members different in height may be prepared and a suitable one of the plural chuck tables may be selected according to the warp of the wafer.
- annular seal member 154 has a rectangular cross section (see FIG. 3A ) in the above preferred embodiment, the corner of the annular seal member 154 may be chamfered. In this case, a local stress to the wafer can be further relaxed to thereby prevent the damage to the wafer.
- the other configurations and methods in the above preferred embodiment may be suitably modified without departing from the scope of the object of the present invention.
Abstract
Description
- 1. Field of the Invention
- The present invention relates to a chuck table for holding a workpiece such as a wafer.
- 2. Description of the Related Art
- A workpiece such as a wafer having devices formed on the front side is processed by a laser processing apparatus including a laser processing unit, for example. This laser processing apparatus includes a chuck table for holding the workpiece in processing the workpiece. The chuck table has a suction holding member formed of a porous ceramic material. Accordingly, the workpiece is held under suction on the suction holding member of the chuck table. By relatively moving the chuck table holding the workpiece thereon with respect to the laser processing unit, the position of application of a laser beam to the workpiece is changed to allow the processing of the workpiece.
- In some cases, the workpiece to be processed by the laser processing apparatus has a warp to a certain degree. For example, in a lift-off process of separating a plurality of laminated substrates from each other by applying a laser beam, the workpiece has a warp due to the lamination of the substrates. When the workpiece having a warp is placed on the chuck table in such a manner that the peripheral portion of the workpiece is higher in level than the central portion of the workpiece, the peripheral portion of the workpiece floats over the upper surface of the suction holding member, so that the degree of tight contact between the workpiece and the suction holding member becomes low. In this case, the chuck table cannot exert a sufficient suction holding force and therefore cannot properly hold the workpiece.
- It is therefore an object of the present invention to provide a chuck table which can properly hold the workpiece having a warp.
- In accordance with an aspect of the present invention, there is provided a chuck table for holding a workpiece having a warp thereon, including a suction holding member having an upper surface as a suction holding surface for holding the workpiece under suction; an annular seal member provided so as to surround the outer circumference of the suction holding member, the annular seal member having an upper surface for supporting a peripheral portion of the workpiece held on the suction holding surface, the annular seal member being formed from an elastic member; and a vacuum source connected to the suction holding member for producing a vacuum and applying the vacuum to the suction holding surface; the upper surface of the annular seal member being set higher in level than the suction holding surface according to the warp of the workpiece; whereby when the vacuum produced by the vacuum source is applied to the suction holding surface, the peripheral portion of the workpiece comes into contact with the upper surface of the annular seal member to thereby seal off the vacuum leaking from the gap between the workpiece and the suction holding surface due to the warp of the workpiece, so that the annular seal member is elastically deformed by the vacuum applied to the peripheral portion of the workpiece and the upper surface of the workpiece is therefore flattened to thereby hold the workpiece under suction.
- With this configuration, the peripheral portion of the workpiece comes into contact with the annular seal member formed from an elastic member, so that a reduction in air-tightness due to the warp can be prevented to thereby properly hold the workpiece under suction. Further, the annular seal member is deformed by the vacuum in holding the workpiece under suction in such a manner that the front side (upper surface) of the workpiece is flattened, so that the processability of the workpiece can be improved. Further, since the annular seal member is deformed by the vacuum in holding the workpiece under suction, a local stress to the workpiece can be relaxed to thereby prevent damage to the workpiece.
- The above and other objects, features and advantages of the present invention and the manner of realizing them will become more apparent, and the invention itself will best be understood from a study of the following description and appended claims with reference to the attached drawings showing a preferred embodiment of the invention.
-
FIG. 1 is a perspective view of a laser processing apparatus including a chuck table according to a preferred embodiment of the present invention; -
FIG. 2 is a perspective view of the chuck table according to this preferred embodiment; and -
FIGS. 3A to 3C are sectional views showing the operation of the chuck table according to this preferred embodiment in holding a wafer having a warp under suction. - A preferred embodiment of the present invention will now be described with reference to the attached drawings.
FIG. 1 is a perspective view of a laser processing apparatus (processing apparatus) 1 including a chuck table 15 according to this preferred embodiment. A wafer (workpiece) W is also shown inFIG. 1 in relation with the laser processing apparatus 1. The laser processing apparatus 1 is so configured as to apply a laser beam to the wafer W held on the chuck table 15, thereby allowing laser processing of the wafer W. - As shown in
FIG. 1 , the wafer W is a disk-shaped member. The front side (upper surface) of the wafer W is partitioned into a plurality of regions by a plurality of crossing streets. A plurality of devices are respectively formed in these regions partitioned by the streets on the front side of the wafer W. Preferably, a protective tape (not shown) is attached to the back side or front side of the wafer W coming into contact with the chuck table 15 in holding the wafer W on the chuck table 15 under suction. - The laser processing apparatus 1 has a substantially
boxlike base 11. There is provided on the upper surface of the base 11 atable moving mechanism 13 for feeding the chuck table 15 in the X direction extending along an X axis shown inFIG. 1 and also indexing the chuck table 15 in the Y direction extending along a Y axis shown inFIG. 1 . Awall portion 12 stands from thebase 11 at its rear end behind thetable moving mechanism 13. Thewall portion 12 is provided with anarm portion 121 projecting frontward. Alaser processing unit 14 is supported to thearm portion 121 so as to be opposed to the chuck table 15. - The
table moving mechanism 13 includes a pair ofguide rails 131 provided on the upper surface of thebase 11 so as to extend in the Y direction and a Y-axis table 132 slidably supported to theguide rails 131. Thetable moving mechanism 13 further includes a pair ofguide rails 135 provided on the upper surface of the Y-axis table 132 so as to extend in the X direction and an X-axis table 136 slidably supported to theguide rails 135. - A θ table 151 is provided on the upper surface of the X-axis table 136 so as to be rotatable about a Z axis shown in
FIG. 1 , and the chuck table 15 supported to this θ table 151. Nut portions (not shown) are provided on the lower surfaces of the Y-axis table 132 and the X-axis table 136, andball screws Drive motors ball screws ball screws drive motors guide rails - The
laser processing unit 14 includes a focusingunit 141 provided at the front end of thearm portion 121. The focusingunit 141 includes an optical system having a focusing lens (not shown). Thelaser processing unit 14 further includes an oscillator (not shown) for oscillating a laser beam. The laser beam oscillated by the oscillator is focused by the focusing lens and applied to the wafer W held on the chuck table 15. The chuck table 15 is relatively moved with respect to thelaser processing unit 14 to thereby change the position of application of the laser beam to the wafer W, thus allowing the processing of the wafer W. - The chuck table 15 included in the laser processing apparatus 1 will now be described in more detail with reference to
FIG. 2 .FIG. 2 is a perspective view of the chuck table 15 according to this preferred embodiment. The chuck table 15 has atable base 152 fixed to the upper surface of the θ table 151 (seeFIG. 1 ). Thetable base 152 includes a disk-shaped base portion 152 a and acylindrical support portion 152 b projecting upward from the central portion of thebase portion 152 a. - The peripheral portion of the
base portion 152 a is formed with four throughholes 152 c for fixing thetable base 152 to the θ table 151. These throughholes 152 c are arranged at equal intervals. The upper surface of the θ table 151 is formed with four tapped holes (not shown) respectively corresponding to the four throughholes 152 c of thebase portion 152 a. By inserting a bolt through each throughhole 152 c of thebase portion 152 a and engaging the bolt to each tapped hole of the θ table 151, thetable base 152 can be fixed to the upper portion of the θ table 151. - The
support portion 152 b is a solid cylindrical member and it is formed with asuction passage 152 d vertically extending through thesupport portion 152 b (seeFIG. 3A ). Asuction holding member 153 is provided on the central portion of the upper surface of thesupport portion 152 b. Thesuction holding member 153 is formed of a porous ceramic material. The upper end of thesuction passage 152 d is covered with thesuction holding member 153. The lower end of thesuction passage 152 d is connected through a pipe to a vacuum source (not shown) such as a vacuum pump. Accordingly, a vacuum is produced in thesuction passage 152 d by operating the vacuum source, thereby holding the wafer W on asuction holding surface 153 a of thesuction holding member 153 under suction. - The side surface (cylindrical surface) of the
support portion 152 b is formed with fournotches 152 e arranged at equal intervals. These fournotches 152 e respectively correspond to four hooks of an edge clamp type handling mechanism (not shown) for gripping the peripheral portion (edge portion) of the wafer W. The four hooks gripping the wafer W are respectively inserted into the fournotches 152 e, thereby allowing the placement of the wafer W on thesuction holding surface 153 a. Further, by inserting the four hooks into the fournotches 152 e, the wafer W placed on thesuction holding surface 153 a can be gripped by the four hooks and transported by the edge clamp type handling mechanism. A handling mechanism for handling the wafer W is not limited to such an edge clamp type handling mechanism. In the case that such an edge clamp type handling mechanism is not used, thesupport portion 152 b may not have thenotches 152 e. - In the case that the wafer W having a warp is placed on a suction holding member of a conventional chuck table in such a manner that the peripheral portion of the wafer W is higher in level than the central portion of the wafer W, the central portion of the wafer W comes into contact with the suction holding surface of the suction holding member, but the peripheral portion of the wafer W floats over the suction holding surface. In this case, the degree of tight contact between the wafer W and the suction holding member is low, so that the chuck table cannot exert a sufficient suction holding force and therefore cannot properly hold the wafer W.
- To solve this problem, the chuck table 15 according to this preferred embodiment includes an
annular seal member 154 surrounding the outer circumference of thesuction holding member 153. Theannular seal member 154 has an inner diameter and an outer diameter such that it can hold the peripheral portion of the wafer W placed on thesuction holding surface 153 a of thesuction holding member 153. Theupper surface 154 a of theannular seal member 154 is higher in level than thesuction holding surface 153 a of thesuction holding member 153. That is, the height of theupper surface 154 a of theannular seal member 154 is set greater than the height of thesuction holding surface 153 a of thesuction holding member 153 according to the warp of the wafer W. - Accordingly, when the wafer W having a warp is placed on the
suction holding member 153 in such a manner that the peripheral portion of the wafer W is higher in level than the central portion of the wafer W, the central portion of the wafer W comes into contact with thesuction holding surface 153 a, and the peripheral portion of the wafer W comes into contact with theupper surface 154 a of theannular seal member 154. Since the peripheral portion of the wafer W comes into contact with theupper surface 154 a of theannular seal member 154, air-tightness for suction holding of the wafer W can be ensured. - The
annular seal member 154 is formed of a fluororubber sponge as an elastic member. More specifically, theannular seal member 154 is formed of a fluororubber sponge having a sponge hardness of 35. By using an elastic member having such a specific sponge hardness for theannular seal member 154, theannular seal member 154 is deformed by a force acting in holding the wafer W on the chuck table 15 under suction (see FIG. 3C). That is, by producing a suitable vacuum in holding the wafer W on the chuck table 15 under suction, the warp of the wafer W can be relaxed to thereby flatten the front side (or back side) of the wafer W. As a result, the processability of the wafer W can be improved. - The elastic member to be used for the
annular seal member 154 is not limited to a fluororubber sponge, but any elastic member having a sponge hardness of 30 to 40 may be suitably used for theannular seal member 154. The sponge hardness mentioned above is defined as a value measured by an instrument conforming to SRIS 0101 that is the standard for sponge hardness measuring instrument. - In the case that the
annular seal member 154 is too hard (in the case that theannular seal member 154 has a sponge hardness greater than 40), there is a possibility that a local stress may be applied to the wafer W in holding the wafer W on the chuck table 15 under suction, causing any damage to the wafer W. By using theannular seal member 154 having a suitable sponge hardness, theannular seal member 154 can be deformed in holding the wafer W on the chuck table 15 under suction, so that a local stress to the wafer W can be relaxed to thereby prevent the damage to the wafer W. - In the case that the
annular seal member 154 is too soft (in the case that theannular seal member 154 has a sponge hardness less than 30), there is a possibility that theannular seal member 154 may adhere to the wafer W in holding the wafer W on the chuck table 15 under suction. In this case, even when the suction holding force of the chuck table 15 is removed, it is not easy to separate the wafer W from the chuck table 15. Accordingly, by using theannular seal member 154 having a suitable sponge hardness, the adhesion of theannular seal member 154 to the wafer W in holding the wafer W under suction can be prevented to thereby allow easy separation of the wafer W from the chuck table 15 after removing the suction holding force. - As shown in
FIG. 2 , the side surface (outer circumferential surface) of theannular seal member 154 is formed with fournotches 154 b arranged at equal intervals. These fournotches 154 b of theannular seal member 154 are formed at the positions respectively corresponding to the positions of the fournotches 152 e of thesupport portion 152 b. Owing to the formation of thenotches 154 b, the wafer W can be transported by using an edge clamp type handling mechanism. However, in the case that such an edge clamp type handling mechanism is not used, theannular seal member 154 may not have thenotches 154 b. - The operation of the chuck table 15 in holding the wafer W having a warp under suction will now be described with reference to
FIGS. 3A to 3C . As shown inFIG. 3A , the wafer W is transported to the position above the chuck table 15 by a handling mechanism (not shown). The wafer W is aligned to thesuction holding surface 153 a and then placed on thesuction holding surface 153 a. When the wafer W is placed on thesuction holding surface 153 a, the central portion W1 of the wafer W comes into contact with thesuction holding surface 153 a as shown inFIG. 3B . In contrast, the peripheral portion W2 of the wafer W is curved upward and therefore does not come into contact with thesuction holding surface 153 a. However, the peripheral portion W2 of the wafer W comes into contact with theupper surface 154 a of theannular seal member 154 surrounding the outer circumference of thesuction holding member 153. Since the wafer W comes into contact with theannular seal member 154 as mentioned above, air-tightness in the space S defined by the wafer W and theannular seal member 154 is ensured. - Thereafter, the vacuum source is operated in this condition to thereby produce a vacuum in the
suction passage 152 d. Thesuction holding member 153 is formed of a porous ceramic material, so that the vacuum in thesuction passage 152 d acts on thesuction holding member 153 to produce a suction holding force on thesuction holding surface 153 a. Since the central portion W1 of the wafer W is in contact with thesuction holding surface 153 a, the central portion W1 is held on thesuction holding surface 153 a by the suction holding force produced above. On the other hand, the peripheral portion W2 of the wafer W is not in contact with thesuction holding surface 153 a, so that the vacuum in thesuction passage 152 d leaks through the gap between the wafer W and thesuction holding surface 153 a into the space S defined by the wafer W and theannular seal member 154. Accordingly, the space S defined by the wafer W and theannular seal member 154 is evacuated. As a result, a downward force by atmospheric pressure acts on the peripheral portion W2 of the wafer W. - As described above, the
annular seal member 154 is formed from an elastic member having a predetermined sponge hardness set so that it is deformed by the force acting on theannular seal member 154 in holding the wafer W under suction. Accordingly, when the downward force by atmospheric pressure acts on the peripheral portion W2 of the wafer W, theannular seal member 154 is sandwiched between the peripheral portion W2 of the wafer W and thesupport portion 152 b and deformed so as to be depressed in the direction of thickness of theannular seal member 154. Further, the warp of the wafer W is reduced by the downward force by atmospheric pressure, so that the front side (upper surface) of the wafer W is flattened. The vacuum to be produced by the vacuum source is suitably adjusted in the range where the above operation is allowed. - In this manner, the chuck table 15 according to this preferred embodiment includes the
annular seal member 154 formed from an elastic member adapted to make the contact with the peripheral portion W2 of the wafer W (workpiece). Accordingly, a reduction in air-tightness between the wafer W and the chuck table 15 due to the warp of the wafer W can be prevented to thereby suitably hold the wafer W on the chuck table 15 under suction. Further, theannular seal member 154 is deformed by the vacuum produced in holding the wafer W under suction in such a manner that the front side (upper surface) of the wafer W is flattened, so that the processability of the wafer W can be improved. Further, since theannular seal member 154 is deformed by the vacuum produced in holding the wafer W under suction, a local stress to the wafer W can be relaxed to thereby prevent the damage to the wafer W. - The present invention is not limited to the above preferred embodiment, but various modifications may be made. For example, while the chuck table 15 is applied to a laser processing apparatus in the above preferred embodiment, the chuck table according to the present invention may be applied to various processing apparatuses including such a laser processing apparatus. For example, the chuck table according to the present invention may be applied to a cutting apparatus.
- Further, while the
upper surface 154 a of theannular seal member 154 is formed as a horizontal surface parallel to thesuction holding surface 153 a, the upper surface of the annular seal member in the present invention is not especially limited. For example, the upper surface of the annular seal member in the present invention may be formed as an inclined surface inclined according to the warp of the wafer (workpiece). In this case, the degree of tight contact between the annular seal member and the wafer can be improved, so that the air-tightness in the space defined by the wafer and the annular seal member can be further improved. - Further, the annular seal member may be replaceable. For example, a plurality of annular seal members having different heights may be prepared and they may be replaced each other according to the warp of the wafer. As a modification, a plurality of chuck tables having annular seal members different in height may be prepared and a suitable one of the plural chuck tables may be selected according to the warp of the wafer. By changing the height of the annular seal member according to the warp of the wafer as mentioned above, the degree of tight contact between the annular seal member and the wafer can be improved. As a result, the air-tightness in the space defined by the wafer and the annular seal member can be further improved.
- While the
annular seal member 154 has a rectangular cross section (seeFIG. 3A ) in the above preferred embodiment, the corner of theannular seal member 154 may be chamfered. In this case, a local stress to the wafer can be further relaxed to thereby prevent the damage to the wafer. The other configurations and methods in the above preferred embodiment may be suitably modified without departing from the scope of the object of the present invention. - The present invention is not limited to the details of the above described preferred embodiment. The scope of the invention is defined by the appended claims and all changes and modifications as fall within the equivalence of the scope of the claims are therefore to be embraced by the invention.
Claims (1)
Applications Claiming Priority (2)
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JP2012-220248 | 2012-10-02 | ||
JP2012220248A JP2014072510A (en) | 2012-10-02 | 2012-10-02 | Chuck table |
Publications (2)
Publication Number | Publication Date |
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US20140091537A1 true US20140091537A1 (en) | 2014-04-03 |
US9381577B2 US9381577B2 (en) | 2016-07-05 |
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Application Number | Title | Priority Date | Filing Date |
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US14/041,461 Active 2034-06-24 US9381577B2 (en) | 2012-10-02 | 2013-09-30 | Chuck table |
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US (1) | US9381577B2 (en) |
JP (1) | JP2014072510A (en) |
KR (1) | KR20140043678A (en) |
CN (1) | CN103715127B (en) |
DE (1) | DE102013219901A1 (en) |
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US20150155196A1 (en) * | 2013-12-04 | 2015-06-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Transfer Module for Bowed Wafers |
US20160136782A1 (en) * | 2014-11-18 | 2016-05-19 | Hermes-Epitek Corp. | Workpiece processing apparatus and method |
US20180229312A1 (en) * | 2017-02-10 | 2018-08-16 | Spy Eye, Llc | Method for achieving length accuracy of diamond turned parts |
US11587818B2 (en) * | 2019-07-18 | 2023-02-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chuck design and method for wafer |
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Also Published As
Publication number | Publication date |
---|---|
DE102013219901A1 (en) | 2014-04-03 |
CN103715127B (en) | 2018-01-23 |
JP2014072510A (en) | 2014-04-21 |
KR20140043678A (en) | 2014-04-10 |
US9381577B2 (en) | 2016-07-05 |
CN103715127A (en) | 2014-04-09 |
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