US20100281683A1 - Electronic device manufacturing chamber and methods of forming the same - Google Patents

Electronic device manufacturing chamber and methods of forming the same Download PDF

Info

Publication number
US20100281683A1
US20100281683A1 US12/840,262 US84026210A US2010281683A1 US 20100281683 A1 US20100281683 A1 US 20100281683A1 US 84026210 A US84026210 A US 84026210A US 2010281683 A1 US2010281683 A1 US 2010281683A1
Authority
US
United States
Prior art keywords
chamber
piece
line segment
pieces
chamber piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/840,262
Inventor
John M. White
Donald Verplancken
Shinichi Kurita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/145,003 external-priority patent/US20060051507A1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US12/840,262 priority Critical patent/US20100281683A1/en
Publication of US20100281683A1 publication Critical patent/US20100281683A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67236Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/139Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49826Assembling or joining
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble

Definitions

  • the present invention relates generally to flat panel display and/or electronic device manufacturing, and more particularly to an electronic device manufacturing chamber and methods of forming the same.
  • the present invention provides an apparatus that includes a plurality of chamber pieces adapted to fit together to form a non-polygon shaped electronic device manufacturing chamber.
  • the chamber pieces individually have dimensions that comply with ground and/or air transportation regulations.
  • an overall dimension of the non-polygon shaped electronic device manufacturing chamber does not comply with ground and/or air transportation regulations.
  • the present invention provides an apparatus that includes (1) a first chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by two cords such that the shape includes two curve segments, a first line segment, and a second line segment; (2) a second chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a third line segment; and (3) a third chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a fourth line segment.
  • the chamber pieces are adapted to fit together to form a shape of an elliptical cylinder.
  • the present invention provides an apparatus that includes (1) a first chamber piece; (2) a second chamber piece adapted to be coupled to the first chamber piece; and (3) a third chamber piece adapted to be coupled to the first chamber piece.
  • the first chamber piece includes a top having a shape formed from two curve segments, a first line segment, and a second line segment.
  • the second chamber piece includes a top having a shape formed from one curve segment and one line segment.
  • the third chamber piece includes a top having a shape formed from one curve segment and one line segment.
  • the first line segment of the first chamber piece is approximately equal in length to the line segment of the second chamber piece
  • the second line segment of the first chamber piece is approximately equal in length to the line segment of the third chamber piece.
  • the two curve segments of the first chamber piece, the curve segment of the second chamber piece, and the curve segment of the third chamber piece form an ellipse when the second and third chamber pieces are coupled to the first chamber piece.
  • the present invention provides a method that includes transporting a plurality of separate chamber pieces that are adapted to fit together to form a non-polygon shaped transfer chamber.
  • the pieces include a plurality of recessed facets, each recessed facet being adapted to be a coupling point to another chamber and including at least one opening.
  • the method also includes assembling the separate chamber pieces into the non-polygon shaped transfer chamber.
  • FIG. 1 is a top view of a first exemplary multi-piece electronic device manufacturing chamber in accordance with some embodiments of the present invention.
  • FIG. 2A is an exploded isometric view of the first exemplary multi-piece electronic device manufacturing chamber of FIG. 1 in accordance with some embodiments of the present invention.
  • FIG. 2B is an isometric view of the first chamber of FIG. 2A when assembled.
  • FIG. 2C is a top view of the first chamber of FIG. 2A .
  • FIG. 2D is a side view of the first chamber of FIG. 2A .
  • FIG. 3 is an isometric view of a second exemplary multi-piece electronic device manufacturing chamber in accordance with some embodiments of the present invention.
  • FIG. 4A is an exploded isometric view of the second exemplary multi-piece electronic device manufacturing chamber of FIG. 3 in accordance with some embodiments of the present invention.
  • FIG. 4B is an isometric view of the second chamber of FIG. 4A when assembled.
  • FIG. 4C is a top view of the second chamber of FIG. 4A .
  • FIG. 4D is a side view of the second chamber of FIG. 4A .
  • FIG. 5 is a flow chart depicting some method embodiments of the present invention.
  • FIG. 1 is a top view of a first exemplary multi-piece electronic device manufacturing chamber 100 in accordance with some embodiments of the present invention.
  • the multi-piece electronic device manufacturing chamber 100 is a transfer chamber for transporting substrates during electronic device manufacturing.
  • the transfer chamber 100 is coupled to one or more processing chambers and/or load locks 103 during electronic device manufacturing.
  • the transfer chamber 100 may include an end effector (not shown) for transporting a substrate among the processing chambers and/or load locks 103 during electronic device manufacturing.
  • Exemplary substrates may include, for example, a glass plate, a polymer substrate, a semiconductor wafer, a mask, a reticule, or the like.
  • the transfer chamber 100 may include multiple pieces which are coupled together. More specifically, the transfer chamber 100 may include a first piece 109 (e.g., a first side piece) and a second piece 111 (e.g., a second side piece) coupled to a third piece 113 (e.g., a center piece). The first piece 109 and second piece 111 may each be coupled to the third piece 113 via an O-ring (not separately shown). The first piece 109 and second piece 111 may each be secured to the third piece 113 using securing means, such as screws, bolts, or the like.
  • the multi-piece electronic device manufacturing chamber 100 of FIG. 1 includes three pieces, the multi-piece electronic device manufacturing chamber may include a larger or smaller number of pieces (e.g., 2, 4, 5, 6, etc.).
  • the width of conventional transfer chambers is generally limited to about 3 m or less to comply with or accommodate ground and/or air transportation regulations, transport capacity and/or building design.
  • a transfer chamber larger than about 3 m may be barred by local regulation from transport in most normal capacity freight airplanes (e.g., the Boeing 747) and may be too large to fit through entrance doorways in a standard electronic device fabrication facility.
  • the width W 1 of the multi-piece transfer chamber, when assembled e.g., the overall width
  • the present electronic device manufacturing chamber 100 can accommodate a larger substrate than can conventional, one-piece transfer chambers.
  • the electronic device manufacturing chamber 100 may be of a larger or smaller width than 4.2 meters.
  • each of the exemplary multi-piece electronic device manufacturing chamber pieces 109 - 113 resemble a circle cut by one or more cords.
  • the side pieces 109 , 111 resemble a portion of a circle (or, more generally, an ellipse) cut by a cord.
  • the center piece 113 resembles a portion of a circle cut by two parallel cords. This shape includes two curve segments and two line segments.
  • the shapes of the side pieces 109 , 111 include a curve segment and a line segment. Note that none of the individual pieces 109 - 113 has a polygon shape. In other words, each of the pieces 109 - 113 includes at least one curve segment.
  • the shape of the exemplary multi-piece electronic device manufacturing chamber 100 when assembled is a circle.
  • the overall shape of the exemplary multi-piece electronic device manufacturing chamber 100 when assembled e.g., the three-dimensional shape
  • the multi-piece electronic device manufacturing chamber 100 may have other overall shapes (e.g., ecliptically cylindrical) including various non-polygonal shapes.
  • Such non-polygonal shaped chambers, particularly symmetrical non-polygonal shaped chambers may provide the most useable internal substrate transfer area for a given amount of chamber material.
  • a non-polygon shaped chamber does not include unusable corner areas.
  • the weight of a non-polygon shaped chamber for a given amount of useable internal substrate transfer area may be less than a polygon shaped chamber with an equivalent amount of useable internal substrate transfer area.
  • FIG. 2A is an exploded isometric view of the first exemplary multi-piece electronic device manufacturing chamber 100 (rotated relative to the depiction in FIG. 1 ) in accordance with some embodiments of the present invention.
  • Each of the first through third pieces 109 - 113 may be coupled horizontally to form the multi-piece electronic device manufacturing chamber 100 .
  • the length of the first piece 109 is represented by LS 1 and the largest width (e.g., the width at the widest point) of the first piece 109 is represented by WS 1 .
  • the length of second piece 111 is represented by LS 2 and the largest width of the second piece 111 is represented by WS 2 .
  • the largest length (e.g., the length at the longest point) of the third piece 113 is represented by LC 1 and the width of the third piece 113 is represented by WC 1 .
  • the largest width WC 1 of the third piece 113 is about 2.4 m and the largest length LC 1 of the third piece 113 is about 4.2 meters. Larger or smaller lengths and/or widths may be employed for the third piece 113 .
  • the largest length LC 1 of the third piece 113 is also the overall diameter of the chamber 100 .
  • the length LS 1 of the first piece 109 and the length LS 2 of the second piece 111 are equal to the length of the sides of third piece 113 .
  • the length LS 1 of the first piece 109 and/or the length LS 2 of the second piece 111 may be different.
  • the width WS 1 of the first piece 109 and/or the width WS 2 of the second piece 111 are each about 0.9 meters.
  • the width WS 1 of the first piece 109 and/or the width WS 2 of the second piece 111 may be different (e.g., larger or smaller) and/or different than each other.
  • the third piece 113 may have a width that is approximately equal to or less than the width of the first piece 109 plus the width of the second piece 111 , although other relationships between the widths of the first, second and third pieces 109 , 111 and 113 may be employed).
  • Each piece 109 - 113 of the multi-piece electronic device manufacturing chamber 100 may be made of, for example, aluminum, stainless steel, or any practicable, relatively inert material suitable for use as a transfer chamber.
  • the dimensions of each piece 109 - 113 of the multi-piece electronic device manufacturing chamber 100 do comply with ground and/or air transportation regulations. More specifically, in the example described above, the overall width W 1 of the multi-piece electronic device manufacturing chamber 100 is 4.2 m, which does not comply with ground and/or air transportation regulations. However, the width WS 1 of the first piece 109 and the width WS 2 of the second piece 111 are each 0.9 m and the width WC 1 of the third piece 113 is 2.4 m, each of which complies with ground and/or air transportation regulations. (In another embodiment, the width WC 1 of the third piece 113 may be about 3 to 3.2 m and the widths WS 1 , WS 2 of the first and second pieces 109 , 111 may each be about 0.5 to 0.6 m.)
  • each piece 109 - 113 of the multi-piece electronic device manufacturing chamber 100 may be fabricated in a conventional machining center or shop. Therefore, a manufacturer of the multi-piece electronic device manufacturing chamber 100 may select one or more of a plurality of conventional machining centers or shops to fabricate the pieces 109 - 113 of the multi-piece electronic device manufacturing chamber 100 . Competition among the plurality of conventional machining centers or shops enables the manufacturer of the multi-piece electronic device manufacturing chamber 100 to obtain a better price. In contrast, the number of machining centers or shops that may fabricate a one-piece electronic device manufacturing chamber with dimensions that can accommodate larger substrates, similar to the multi-piece electronic device manufacturing chamber 100 , is limited. This limited number of machining centers or shops results in reduced competition.
  • the manufacturer may pay more for fabrication of such a one-piece chamber than for the multi-piece semiconductor manufacturing chamber 100 . Further, because such a one-piece chamber does not comply with ground and/or air transportation regulations, the manufacturer of such a one-piece chamber may need to obtain special accommodations, such as a police escort, an “Oversized Load” sign, or the like, while transporting the chamber. The multi-piece electronic device manufacturing chamber 100 does not require such accommodations.
  • FIG. 2B is an isometric view of the first chamber 100 when assembled
  • FIG. 2C is a top view of the first chamber 100
  • FIG. 2D is a side view of the first chamber 100 (illustrating a facet of the first chamber 100 adapted to couple to a triple substrate stacked load lock chamber as described further below).
  • the first chamber 100 includes a plurality of recessed facets 201 A-F ( 201 D not visible from the exterior of the chamber).
  • a plurality of recessed facets 201 A-F 201 D not visible from the exterior of the chamber.
  • six recessed facets are provided, although a larger or smaller number of facets may be provided.
  • Each recessed facet 201 A-F provides a flat area to which a processing chamber, load lock chamber or other chamber may be sealingly coupled (e.g., via an o-ring or other sealing member) as shown, for example, in FIG. 1 with reference to the chambers 103 .
  • the overall structure of the first chamber 100 is cylindrical.
  • the first (side) piece 109 includes a cylindrical wall 203 into which recessed facets 201 B, 201 C are formed
  • the second (side) piece 111 includes a cylindrical wall 205 into which recessed facets 201 E, 201 F are formed.
  • the third (central) piece 113 has cylindrical opposing side walls 207 , 209 as shown ( FIG. 2A ) that include recessed facets 201 A, 201 D, respectively.
  • the interior region of the first chamber 100 is also substantially cylindrical (see, for example, FIG. 2A and FIG. 2C ).
  • a cylindrical configuration reduces the interior volume of the first chamber 100 while allowing free rotation of a vacuum robot located within the first chamber 100 . Such rotation may occur, for example, when the robot rotates to transfer substrates between the various chambers 103 coupled to the first chamber 100 ( FIG. 1 ).
  • the third piece 113 includes notched regions 211 A-D (see FIG. 2A in which only notches 211 A-C are shown).
  • the notches 211 A-D also provide additional clearance during substrate transfers through openings (e.g., slit openings) formed in respective facets of the first and the second side pieces 109 , 111 . That is, the notches 211 A-D may provide additional clearance during substrate transfers through openings 213 , 215 , 217 , 219 , respectively, which correspond to recessed facets 201 F, 201 E, 201 C, 201 B (as shown in FIGS. 2A and 2B ).
  • each recessed facet may include additional openings (e.g., 2, 3, 4 or more openings).
  • the facet 201 A of the third (central) piece 113 is shown having a single opening 221 ( FIG. 2A ), but may include additional openings (e.g., 2, 3, 4, etc.).
  • the facet 201 D ( FIG. 2D ) of the third piece 113 includes three vertically stacked openings 223 A-C ( FIG. 2A and FIG. 2D ), but may include another number of openings (e.g., 1, 2, 4, 5, etc.).
  • the middle opening 223 B of the recessed facet 201 D of the third (central) piece 113 is vertically aligned with the opening 215 of the recessed facet 201 e of the second side piece 111 and with the opening 217 of the recessed facet 201 C of the first side piece 109 (as shown in FIG. 2D ).
  • each opening 213 - 223 c is sized to allow a substrate to pass therethrough. Other configurations or alignments may be employed.
  • the first and second side pieces 109 , 111 include a plurality of fin structures 225 , each adapted to provide structural integrity to the first chamber 100 .
  • the fin structures 225 may reduce deflection of the cylindrical side/top walls of the first and second side pieces 109 , 111 due to pressure differentials between an interior region of the first chamber 100 and any processing chamber coupled thereto, and/or the environment outside of the first chamber 100 .
  • the use of the fin structures 225 allows the wall thicknesses of the first and second pieces 109 , 111 to be reduced, and reduces the overall weight of the first chamber 100 .
  • the fin structures 225 have a thickness of about 0.55 inches near the outer side/top walls of the first and second side pieces 109 , 111 and of about 1.3 inches near the sealing surfaces of the first and second side pieces 109 , 111 that contact the central piece 113 (for stainless steel), although other materials and/or thicknesses may be used.
  • a bottom 227 of the third (central) piece 113 of the first chamber 100 includes a flat portion 229 and a domed portion 231 (see also FIG. 2D ).
  • the domed portion 231 provides improved strength to the bottom 227 , because of its domed shape, and reduces the material thickness requirements for the bottom 227 .
  • the domed portion 231 may have a thickness of about 3 ⁇ 8′′ or less while the flat portion 227 may have a thickness of about 3 ⁇ 4-1′′ or less when stainless steel is employed. Other materials and/or thickness values and/or thickness differences between the flat portion 229 and the domed portion 231 may be used.
  • fins or similar support structures 233 may be formed below the domed portion 231 as shown in FIG. 2D .
  • the use of the fins 233 may reduce, for example, vertical deflections of the domed portion 231 .
  • FIGS. 2B-2C illustrate a top lid 235 that may be employed with the first chamber 100 .
  • the lid 235 may be adapted to seal the third (central) piece 113 of the first chamber (by employing an o-ring or similar sealing element between the lid 235 and the third piece 113 ).
  • the top lid 235 includes a flat sealing portion 237 that is reinforced with a plurality of support structures, such as beams 239 as shown.
  • the sealing portion 237 may have a thickness similar to that of the flat portion 229 ( FIG. 2A ) of the bottom 227 of the chamber 100 , and the beams 239 provide additional structural support (allowing the thickness and weight of the lid 235 to be reduced).
  • the lid 235 may include a connection location 241 that may be used for lifting and/or lowering the lid 235 relative to the first chamber 100 (e.g., via a crane or the like).
  • any number of access hatches may be included (e.g., 1, 3, 4, etc.).
  • FIG. 3 is a top view of a second exemplary multi-piece electronic device manufacturing chamber 300 in accordance with some embodiments of the present invention.
  • the second embodiment of a multi-piece electronic device manufacturing chamber 300 is also a transfer chamber for transporting substrates during electronic device manufacturing.
  • the transfer chamber 300 is coupled to one or more processing chambers and/or load locks 103 during electronic device manufacturing.
  • the transfer chamber 300 may include an end effector (not shown) for transporting a substrate among the processing chambers and/or load locks 103 during electronic device manufacturing.
  • the transfer chamber 300 may include multiple pieces which are coupled together. More specifically, the transfer chamber 300 may include a first piece 309 (e.g., a first side piece) and a second piece 311 (e.g., a second side piece) coupled to a third piece 313 (e.g., a center piece). The first piece 309 and second piece 311 may each be coupled to the third piece 313 via an O-ring (not separately shown). The first piece 309 and second piece 311 may each be secured to the third piece 313 using securing means, such as screws, bolts, or the like.
  • the multi-piece electronic device manufacturing chamber 300 of FIG. 3 includes three pieces, the multi-piece electronic device manufacturing chamber may include a larger or smaller number of pieces (e.g., 2, 4, 5, 6, etc.).
  • the width W 2 of the multi-piece transfer chamber when assembled (e.g., the overall width), is 4.2 meters. Therefore, the present electronic device manufacturing chamber 300 can accommodate a larger substrate than can conventional, one-piece transfer chambers.
  • the electronic device manufacturing chamber 300 may be of a larger or smaller width than 4.2 meters.
  • each of the exemplary multi-piece electronic device manufacturing chamber pieces 309 - 313 resembles a circle cut by one or more cords.
  • the side pieces 309 , 311 resembles a portion of a circle (or, more generally, an ellipse) cut by a cord.
  • the center piece 313 resembles a portion of a circle cut by two parallel cords. This shape includes two curve segments and two line segments.
  • the shapes of the side pieces 309 , 311 include a curve segment and a line segment. Note that none of the individual pieces 309 - 313 has a polygon shape. In other words, each of the pieces 309 - 313 include at least one curve segment.
  • the shape of the second exemplary multi-piece electronic device manufacturing chamber 300 when assembled is a circle.
  • the overall shape of the second exemplary multi-piece electronic device manufacturing chamber 300 when assembled is substantially cylindrical.
  • the multi-piece electronic device manufacturing chamber 300 may have other overall shapes (e.g., ecliptically cylindrical) including various non-polygonal shapes.
  • such non-polygonal shaped chambers, particularly symmetrical non-polygonal shaped chambers may provide increase useable internal substrate transfer area for a given amount of chamber material.
  • FIG. 4A is an exploded isometric view of the second exemplary multi-piece electronic device manufacturing chamber 300 (rotated relative to the depiction in FIG. 3 ) in accordance with some embodiments of the present invention.
  • Each of the first through third pieces 309 - 313 may be coupled horizontally to form the multi-piece electronic device manufacturing chamber 300 .
  • the length of the first piece 309 is represented by LS 1 ′ and the largest width (e.g., the width at the widest point) of the first piece 309 is represented by WS 1 ′.
  • the length of second piece 311 is represented by LS 2 ′ and the largest width of the second piece 311 is represented by WS 2 ′.
  • the largest length (e.g., the length at the longest point) of the third piece 313 is represented by LC 1 ′ and the width of the third piece 313 is represented by WC 1 ′.
  • the largest width WC 1 ′ of the third piece 313 is about 2.4 m and the largest length LC 1 ′ of the third piece 313 is about 4.2 meters. Larger or smaller lengths and/or widths may be employed for the third piece 313 .
  • the largest length LC 1 ′ of the third piece 313 is also the overall diameter of the chamber 300 .
  • the length LS 1 ′ of the first piece 309 and the length LS 2 ′ of the second piece 311 are equal to the length of the sides of third piece 313 .
  • the length LS 1 ′ of the first piece 309 and/or the length LS 2 ′ of the second piece 311 may be different.
  • the width WS 1 ′ of the first piece 309 and/or the width WS 2 ′ of the second piece 311 are each about 0.9 meters.
  • the width WS 1 ′ of the first piece 309 and/or the width WS 2 ′ of the second piece 311 may be different (e.g., larger or smaller) and/or different than each other.
  • the third piece 313 may have a width that is approximately equal to or less than the width of the first piece 309 plus the width of the second piece 311 , although other relationships between the widths of the first, second and third pieces 309 , 311 and 313 may be employed).
  • Each piece 309 - 313 of the multi-piece electronic device manufacturing chamber 300 may be made of, for example, aluminum, stainless steel, or any practicable, relatively inert material suitable for use as a transfer chamber.
  • the dimensions of each piece 309 - 313 of the multi-piece electronic device manufacturing chamber 300 do comply with ground and/or air transportation regulations. More specifically, in the example described above, the overall width W 2 of the multi-piece electronic device manufacturing chamber 300 is 4.2 m, which does not comply with ground and/or air transportation regulations. However, the width WS 1 ′ of the first piece 309 and the width WS 2 ′ of the second piece 311 are each 0.9 m and the width WC 1 ′ of the third piece 313 is 2.4 m, each of which complies with ground and/or air transportation regulations.
  • the width WC 1 ′ of the third piece 313 may be about 3 to 3.2 m and the widths WS 1 ′, WS 2 ′ of the first and second pieces 309 , 311 may each be about 0.5 to 0.6 m.
  • each piece 309 - 313 of the multi-piece electronic device manufacturing chamber 300 may be fabricated in a conventional machining center or shop. Therefore, as with the multi-piece electronic device manufacturing chamber 100 described above, a manufacturer of the multi-piece electronic device manufacturing chamber 300 may select one or more of a plurality of conventional machining centers or shops to fabricate the pieces 309 - 313 of the multi-piece electronic device manufacturing chamber 300 . Also, the multi-piece electronic device manufacturing chamber 300 does not require special transportation accommodations.
  • FIG. 4A is an isometric view of the second chamber 300 when assembled
  • FIG. 4C is a top view of the second chamber 300
  • FIG. 4D is a side view of the second chamber 300 (illustrating a facet of the second chamber 300 adapted to couple to a triple substrate stacked load lock chamber as described further below).
  • the second chamber 300 includes a plurality of extended facets 401 A-F that protrude from the curved sidewalls of the chamber 300 .
  • six extended facets are provided, although a larger or smaller number of facets may be provided.
  • Each extended facet 401 A-F provides a flat area to which a processing chamber, load lock chamber or other chamber may be sealingly coupled (e.g., via an o-ring or other sealing member) as shown, for example, in FIG. 3 with reference to the chambers 103 .
  • the overall structure of the first chamber 300 is substantially cylindrical.
  • the first (side) piece 309 includes a cylindrical wall 403 from which extended facets 401 B, 401 C protrude
  • the second (side) piece 311 includes a cylindrical wall 405 from which extended facets 401 E, 401 F protrude.
  • the third (central) piece 313 has cylindrical opposing side walls 407 , 409 as shown ( FIG. 4A ) that include extended facets 401 A, 401 D, respectively.
  • the interior region of the second chamber 300 is also substantially cylindrical (see, for example, FIG. 4A and FIG. 4C ).
  • a cylindrical configuration reduces the interior volume of the second chamber 300 while allowing free rotation of a vacuum robot located within the second chamber 300 . Such rotation may occur, for example, when the robot rotates to transfer substrates between the various chambers 103 coupled to the first chamber 300 ( FIG. 3 ).
  • the third piece 313 includes notched regions 411 A-D (see FIG. 4A in which only notches 411 A-C are shown).
  • the notches 411 A-D also provide additional clearance during substrate transfers through openings (e.g., slit openings) formed in respective facets of the first and the second side pieces 309 , 311 . That is, the notches 411 A-D may provide additional clearance during substrate transfers through openings 413 , 415 , 417 , 419 , respectively, which correspond to facets 401 F, 401 E, 401 C, 401 B (as shown in FIGS. 4A and 4B ).
  • each extended facet may include additional openings (e.g., 2, 3, 4 or more openings).
  • the extended facet 401 A of the third (central) piece 313 is shown having a single opening 421 ( FIG. 4A ), but may include additional openings (e.g., 2, 3, 4, etc.).
  • the extended facet 401 D ( FIG. 4D ) of the third piece 313 includes three vertically stacked openings 423 A-C ( FIG. 4A and FIG. 4D ), but may include another number of openings (e.g., 1, 2, 4, 5, etc.).
  • the middle opening 423 B of the extended facet 401 D of the third (central) piece 313 is vertically aligned with the opening 415 of the extended facet 401 e of the second side piece 311 and with the opening 417 of the extended facet 401 C of the first side piece 309 (as shown in FIG. 4D ).
  • each opening 413 - 423 c is sized to allow a substrate to pass therethrough. Other configurations or alignments may be employed.
  • the first and second side pieces 309 , 311 include a plurality of fin structures 425 , each adapted to provide structural integrity to the second chamber 300 .
  • the fin structures 425 may reduce deflection of the cylindrical side/top walls of the first and second side pieces 309 , 311 due to pressure differentials between an interior region of the second chamber 300 and any processing chamber coupled thereto, and/or the environment outside of the first chamber 300 .
  • the use of the fin structures 425 allows the wall thicknesses of the first and second pieces 309 , 311 to be reduced, and reduces the overall weight of the second chamber 300 .
  • the fin structures 425 have a thickness of about 0.55 inches near the outer side/top walls of the first and second side pieces 309 , 311 and of about 1.3 inches near the sealing surfaces of the first and second side pieces 309 , 311 that contact the central piece 313 (for stainless steel), although other materials and/or thicknesses may be used.
  • a bottom 427 of the third (central) piece 313 of the second chamber 300 includes a flat portion 429 and a domed portion 431 (see also FIG. 4D ).
  • the domed portion 431 provides improved strength to the bottom 427 , because of its domed shape, and reduces the material thickness requirements for the bottom 427 .
  • the domed portion 431 may have a thickness of about 3 ⁇ 8′′ or less while the flat portion 427 may have a thickness of about 3 ⁇ 4-1′′ or less when stainless steel is employed. Other materials and/or thickness values and/or thickness differences between the flat portion 429 and the domed portion 431 may be used.
  • fins or similar support structures 433 may be formed below the domed portion 431 as shown in FIG. 4D .
  • the use of the fins 433 may reduce, for example, vertical deflections of the domed portion 431 .
  • FIGS. 4B-4C also illustrate a top lid 435 that may be employed with the second chamber 300 .
  • the lid 435 may be adapted to seal the third (central) piece 313 of the first chamber (by employing an o-ring or similar sealing element between the lid 435 and the third piece 313 ).
  • the top lid 435 includes a flat sealing portion 437 that is reinforced with a plurality of support structures, such as beams 439 as shown.
  • the sealing portion 437 may have a thickness similar to that of the flat portion 429 ( FIG. 4A ) of the bottom 427 of the chamber 300 , and the beams 439 provide additional structural support (allowing the thickness and weight of the lid 435 to be reduced).
  • the lid 435 may include a connection location 441 that may be used for lifting and/or lowering the lid 235 relative to the second chamber 300 (e.g., via a crane or the like).
  • a user may employ the inventive method 500 described below with respect to FIG. 5 .
  • the method 500 commences at step 502 .
  • one or more overall dimensions of the electronic device manufacturing chamber is determined. More specifically, a manufacturer may need to manufacture a substrate of a required size. Based on the required size, the manufacturer may determine (e.g., design) one or more overall dimensions of an electronic device manufacturing chamber capable of manufacturing such a substrate. If the required substrate size is large enough, the overall dimensions of the chamber will not comply with at least one of ground and air transportation regulations.
  • the manufacturer may determine how to divide the electronic device manufacturing chamber into a plurality of pieces such that the dimensions of each of the plurality of pieces complies with at least one of ground and air transportation regulations and at the same time, the structural integrity of the chamber when assembled will be sufficient to perform manufacturing operations.
  • the manufacturer may divide the designed multi-piece electronic device manufacturing chamber into pieces using vertical sectioning, such as with the electronic device manufacturing chambers 100 , 300 shown in FIGS. 1-4 . Horizontal sectioning is also possible.
  • the manufacturer may decide to divide the electronic device manufacturing chamber into pieces using sectioning having other orientations or combinations of orientations.
  • step 506 the plurality of pieces are manufactured.
  • the manufacturer may employ a machining center or shop to fabricate the plurality of pieces.
  • the multi-piece electronic device manufacturing chamber 100 , 300 is manufactured.
  • the electronic device manufacturing chamber 100 , 300 may be transported, for example, to a customer site in step 508 .
  • the manufacturer may employ a method of transporting such a chamber in accordance with one or more embodiments of the present invention.
  • a first piece of a plurality of electronic device manufacturing chamber pieces may be transported via one of ground and air transportation.
  • the first piece may be placed in a container that complies with transportation regulations such that the first piece forms an angle with a side (such as a bottom side) of the container.
  • the first piece may have an actual height or width dimension larger than permitted if it was not placed in the container at such an angle, yet may still fit within a container that complies with transportation regulations.
  • the ability to ship larger pieces allows the inventive multi-piece chamber to be formed from fewer pieces. Therefore, placing the pieces at an angle within the shipping container may be preferred, though not required.
  • it may be preferred to manufacture a multi-piece chamber such that a main or central piece is as large as possible and still capable of fitting into a standard size shipping container while the remaining pieces are smaller or as small as possible so that assembly is easier.
  • extended facets may be installed into or in replacement of the recessed facets 201 A-F of the electronic device manufacturing chamber 100 in step 512 .
  • the extended facets may aid in coupling load locks and/or processing chambers to the electronic device manufacturing chamber 100 .
  • extended facets added to recessed facets 201 A-F may extend completely outside the outer circumference of the electronic device manufacturing chamber 100 so that the resulting chamber appears similar to the embodiment depicted in FIG. 4A .
  • Extended facets added to recessed facets 201 A-F may only extend partially beyond the outer circumference of the electronic device manufacturing chamber 100 .
  • Extended facets may include a flat area (for coupling a load lock or processing chamber) with an opening (sized to allow the passage of a substrate) and an adapter portion that fits sealingly into the recess of a recessed facet 201 A-F.
  • step 514 load locks and/or processing chambers may be coupled to the facets of the electronic device manufacturing chamber 100 , 300 .
  • step 516 a robot, adapted to move substrates between the processing chambers via the non-polygon shaped transfer chamber may be installed within the electronic device manufacturing chamber 100 , 300 .
  • the method 500 is completed in step 518 .

Abstract

A non-polygon shaped, multi-piece chamber is provided. A non-polygon shaped, multi-piece chamber may include (1) a central piece having a first side and a second side, (2) a first side piece adapted to couple with the first side of the central piece, and (3) a second side piece adapted to couple with the second side of the central piece. The central piece, the first side piece, and the second side piece form a cylindrical overall shape when coupled together. Numerous other aspects are provided.

Description

  • The present application is a divisional of and claims priority from U.S. patent application Ser. No. 11/214,475, filed Aug. 29, 2005 and titled “ELECTRONIC DEVICE MANUFACTURING CHAMBER AND METHODS OF FORMING THE SAME” (Attorney Docket No. 8840/P01/Y03), which is a continuation-in-part of and claims priority from U.S. patent application Ser. No. 11/145,003, filed Jun. 2, 2005 and titled “ELECTRONIC DEVICE MANUFACTURING CHAMBER AND METHODS OF FORMING THE SAME” (Attorney Docket No. 8840), which claims priority to U.S. Provisional Application Ser. No. 60/576,902, filed Jun. 2, 2004 and titled “SEMICONDUCTOR DEVICE MANUFACTURING TOOL AND METHODS FOR USING THE SAME” (Attorney Docket No. 8840/L) and U.S. Provisional Application Ser. No. 60/587,109, filed Jul. 12, 2004 and titled “ELECTRONIC DEVICE MANUFACTURING TOOL AND METHODS FOR USING THE SAME” (Attorney Docket No. 8840/L2), which are hereby incorporated by reference herein in their entirety for all purposes.
  • FIELD OF THE INVENTION
  • The present invention relates generally to flat panel display and/or electronic device manufacturing, and more particularly to an electronic device manufacturing chamber and methods of forming the same.
  • BACKGROUND OF THE INVENTION
  • As substrates used in flat panel displays increase in size, the dimensions of electronic device manufacturing chambers (e.g., processing and/or transfer chambers) used to manufacture the larger flat panel displays also must increase in size. However, the difficulty of manufacturing and transporting such chambers also increases with chamber size due to the overall dimensions and/or weight of the chambers. As such, a need exists for improved electronic device manufacturing chambers used for manufacturing large flat panel displays, as well as for improved methods of transporting such chambers.
  • SUMMARY OF THE INVENTION
  • In certain aspects, the present invention provides an apparatus that includes a plurality of chamber pieces adapted to fit together to form a non-polygon shaped electronic device manufacturing chamber. The chamber pieces individually have dimensions that comply with ground and/or air transportation regulations. However, an overall dimension of the non-polygon shaped electronic device manufacturing chamber does not comply with ground and/or air transportation regulations.
  • In certain aspects, the present invention provides an apparatus that includes (1) a first chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by two cords such that the shape includes two curve segments, a first line segment, and a second line segment; (2) a second chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a third line segment; and (3) a third chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a fourth line segment. The chamber pieces are adapted to fit together to form a shape of an elliptical cylinder.
  • In certain aspects, the present invention provides an apparatus that includes (1) a first chamber piece; (2) a second chamber piece adapted to be coupled to the first chamber piece; and (3) a third chamber piece adapted to be coupled to the first chamber piece. The first chamber piece includes a top having a shape formed from two curve segments, a first line segment, and a second line segment. The second chamber piece includes a top having a shape formed from one curve segment and one line segment. The third chamber piece includes a top having a shape formed from one curve segment and one line segment.
  • The first line segment of the first chamber piece is approximately equal in length to the line segment of the second chamber piece, and the second line segment of the first chamber piece is approximately equal in length to the line segment of the third chamber piece. The two curve segments of the first chamber piece, the curve segment of the second chamber piece, and the curve segment of the third chamber piece form an ellipse when the second and third chamber pieces are coupled to the first chamber piece.
  • In certain aspects, the present invention provides a method that includes transporting a plurality of separate chamber pieces that are adapted to fit together to form a non-polygon shaped transfer chamber. The pieces include a plurality of recessed facets, each recessed facet being adapted to be a coupling point to another chamber and including at least one opening. The method also includes assembling the separate chamber pieces into the non-polygon shaped transfer chamber.
  • Other features and aspects of the present invention will become more fully apparent from the following detailed description, the appended claims and the accompanying drawings.
  • BRIEF DESCRIPTION OF THE FIGURES
  • FIG. 1 is a top view of a first exemplary multi-piece electronic device manufacturing chamber in accordance with some embodiments of the present invention.
  • FIG. 2A is an exploded isometric view of the first exemplary multi-piece electronic device manufacturing chamber of FIG. 1 in accordance with some embodiments of the present invention.
  • FIG. 2B is an isometric view of the first chamber of FIG. 2A when assembled.
  • FIG. 2C is a top view of the first chamber of FIG. 2A.
  • FIG. 2D is a side view of the first chamber of FIG. 2A.
  • FIG. 3 is an isometric view of a second exemplary multi-piece electronic device manufacturing chamber in accordance with some embodiments of the present invention.
  • FIG. 4A is an exploded isometric view of the second exemplary multi-piece electronic device manufacturing chamber of FIG. 3 in accordance with some embodiments of the present invention.
  • FIG. 4B is an isometric view of the second chamber of FIG. 4A when assembled.
  • FIG. 4C is a top view of the second chamber of FIG. 4A.
  • FIG. 4D is a side view of the second chamber of FIG. 4A.
  • FIG. 5 is a flow chart depicting some method embodiments of the present invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • FIG. 1 is a top view of a first exemplary multi-piece electronic device manufacturing chamber 100 in accordance with some embodiments of the present invention. With reference to FIG. 1, the multi-piece electronic device manufacturing chamber 100 is a transfer chamber for transporting substrates during electronic device manufacturing. The transfer chamber 100 is coupled to one or more processing chambers and/or load locks 103 during electronic device manufacturing. The transfer chamber 100 may include an end effector (not shown) for transporting a substrate among the processing chambers and/or load locks 103 during electronic device manufacturing. Exemplary substrates may include, for example, a glass plate, a polymer substrate, a semiconductor wafer, a mask, a reticule, or the like.
  • In accordance with some embodiments of the invention, the transfer chamber 100 may include multiple pieces which are coupled together. More specifically, the transfer chamber 100 may include a first piece 109 (e.g., a first side piece) and a second piece 111 (e.g., a second side piece) coupled to a third piece 113 (e.g., a center piece). The first piece 109 and second piece 111 may each be coupled to the third piece 113 via an O-ring (not separately shown). The first piece 109 and second piece 111 may each be secured to the third piece 113 using securing means, such as screws, bolts, or the like. Although, the multi-piece electronic device manufacturing chamber 100 of FIG. 1 includes three pieces, the multi-piece electronic device manufacturing chamber may include a larger or smaller number of pieces (e.g., 2, 4, 5, 6, etc.).
  • The width of conventional transfer chambers (e.g., one-piece transfer chambers) is generally limited to about 3 m or less to comply with or accommodate ground and/or air transportation regulations, transport capacity and/or building design. For example, a transfer chamber larger than about 3 m may be barred by local regulation from transport in most normal capacity freight airplanes (e.g., the Boeing 747) and may be too large to fit through entrance doorways in a standard electronic device fabrication facility. In contrast, in one or more embodiments of the present invention, the width W1 of the multi-piece transfer chamber, when assembled (e.g., the overall width), is 4.2 meters. Therefore, the present electronic device manufacturing chamber 100 can accommodate a larger substrate than can conventional, one-piece transfer chambers. The electronic device manufacturing chamber 100 may be of a larger or smaller width than 4.2 meters.
  • In accordance with some embodiments of the invention, from a top view or a lateral cross-sectional view, the shapes of each of the exemplary multi-piece electronic device manufacturing chamber pieces 109-113 resemble a circle cut by one or more cords. For example, from a top view or a lateral cross-sectional view, the side pieces 109, 111 resemble a portion of a circle (or, more generally, an ellipse) cut by a cord. Likewise, from a top view or a lateral cross-sectional view, the center piece 113 resembles a portion of a circle cut by two parallel cords. This shape includes two curve segments and two line segments. The shapes of the side pieces 109,111 include a curve segment and a line segment. Note that none of the individual pieces 109-113 has a polygon shape. In other words, each of the pieces 109-113 includes at least one curve segment.
  • From a top view, or a lateral cross-sectional view, the shape of the exemplary multi-piece electronic device manufacturing chamber 100 when assembled (e.g., the combined shape) is a circle. The overall shape of the exemplary multi-piece electronic device manufacturing chamber 100 when assembled (e.g., the three-dimensional shape) is cylindrical. However, the multi-piece electronic device manufacturing chamber 100 may have other overall shapes (e.g., ecliptically cylindrical) including various non-polygonal shapes. Such non-polygonal shaped chambers, particularly symmetrical non-polygonal shaped chambers (e.g., a cylinder shaped chamber) may provide the most useable internal substrate transfer area for a given amount of chamber material. For example, compared to a polygon shaped chamber, a non-polygon shaped chamber does not include unusable corner areas. As such, the weight of a non-polygon shaped chamber for a given amount of useable internal substrate transfer area may be less than a polygon shaped chamber with an equivalent amount of useable internal substrate transfer area.
  • FIG. 2A is an exploded isometric view of the first exemplary multi-piece electronic device manufacturing chamber 100 (rotated relative to the depiction in FIG. 1) in accordance with some embodiments of the present invention. Each of the first through third pieces 109-113 may be coupled horizontally to form the multi-piece electronic device manufacturing chamber 100. The length of the first piece 109 is represented by LS1 and the largest width (e.g., the width at the widest point) of the first piece 109 is represented by WS1. The length of second piece 111 is represented by LS2 and the largest width of the second piece 111 is represented by WS2. The largest length (e.g., the length at the longest point) of the third piece 113 is represented by LC1 and the width of the third piece 113 is represented by WC1.
  • In one or more embodiments, the largest width WC1 of the third piece 113 is about 2.4 m and the largest length LC1 of the third piece 113 is about 4.2 meters. Larger or smaller lengths and/or widths may be employed for the third piece 113. In the embodiment shown, the largest length LC1 of the third piece 113 is also the overall diameter of the chamber 100. As shown, the length LS1 of the first piece 109 and the length LS2 of the second piece 111 are equal to the length of the sides of third piece 113. However, the length LS1 of the first piece 109 and/or the length LS2 of the second piece 111 may be different. In one embodiment the width WS1 of the first piece 109 and/or the width WS2 of the second piece 111 are each about 0.9 meters. However, the width WS1 of the first piece 109 and/or the width WS2 of the second piece 111 may be different (e.g., larger or smaller) and/or different than each other. (In one particular embodiment, the third piece 113 may have a width that is approximately equal to or less than the width of the first piece 109 plus the width of the second piece 111, although other relationships between the widths of the first, second and third pieces 109, 111 and 113 may be employed).
  • Each piece 109-113 of the multi-piece electronic device manufacturing chamber 100 may be made of, for example, aluminum, stainless steel, or any practicable, relatively inert material suitable for use as a transfer chamber.
  • Although the overall dimensions of the multi-piece electronic device manufacturing chamber 100 do not comply with ground and/or air transportation regulations, the dimensions of each piece 109-113 of the multi-piece electronic device manufacturing chamber 100 do comply with ground and/or air transportation regulations. More specifically, in the example described above, the overall width W1 of the multi-piece electronic device manufacturing chamber 100 is 4.2 m, which does not comply with ground and/or air transportation regulations. However, the width WS1 of the first piece 109 and the width WS2 of the second piece 111 are each 0.9 m and the width WC1 of the third piece 113 is 2.4 m, each of which complies with ground and/or air transportation regulations. (In another embodiment, the width WC1 of the third piece 113 may be about 3 to 3.2 m and the widths WS1, WS2 of the first and second pieces 109, 111 may each be about 0.5 to 0.6 m.)
  • Further, each piece 109-113 of the multi-piece electronic device manufacturing chamber 100 may be fabricated in a conventional machining center or shop. Therefore, a manufacturer of the multi-piece electronic device manufacturing chamber 100 may select one or more of a plurality of conventional machining centers or shops to fabricate the pieces 109-113 of the multi-piece electronic device manufacturing chamber 100. Competition among the plurality of conventional machining centers or shops enables the manufacturer of the multi-piece electronic device manufacturing chamber 100 to obtain a better price. In contrast, the number of machining centers or shops that may fabricate a one-piece electronic device manufacturing chamber with dimensions that can accommodate larger substrates, similar to the multi-piece electronic device manufacturing chamber 100, is limited. This limited number of machining centers or shops results in reduced competition. Due to reduced competition, the manufacturer may pay more for fabrication of such a one-piece chamber than for the multi-piece semiconductor manufacturing chamber 100. Further, because such a one-piece chamber does not comply with ground and/or air transportation regulations, the manufacturer of such a one-piece chamber may need to obtain special accommodations, such as a police escort, an “Oversized Load” sign, or the like, while transporting the chamber. The multi-piece electronic device manufacturing chamber 100 does not require such accommodations.
  • Additional features of the first multi-piece electronic device manufacturing chamber 100 will now be described with reference to FIG. 2A, as well as to FIGS. 2B-2D in which FIG. 2B is an isometric view of the first chamber 100 when assembled; FIG. 2C is a top view of the first chamber 100; and FIG. 2D is a side view of the first chamber 100 (illustrating a facet of the first chamber 100 adapted to couple to a triple substrate stacked load lock chamber as described further below).
  • With reference to FIGS. 2A-2D, the first chamber 100 includes a plurality of recessed facets 201A-F (201D not visible from the exterior of the chamber). In the embodiment shown, six recessed facets are provided, although a larger or smaller number of facets may be provided.
  • Each recessed facet 201A-F provides a flat area to which a processing chamber, load lock chamber or other chamber may be sealingly coupled (e.g., via an o-ring or other sealing member) as shown, for example, in FIG. 1 with reference to the chambers 103. Despite the presence of the recessed facets 201A-F, the overall structure of the first chamber 100 is cylindrical. For example, as shown in FIGS. 2A-2C, the first (side) piece 109 includes a cylindrical wall 203 into which recessed facets 201B, 201C are formed, and the second (side) piece 111 includes a cylindrical wall 205 into which recessed facets 201E, 201F are formed. The third (central) piece 113 has cylindrical opposing side walls 207, 209 as shown (FIG. 2A) that include recessed facets 201A, 201D, respectively.
  • Because of the cylindrical walls 203, 205, 207, 209 of the pieces 109, 111, 113, the interior region of the first chamber 100 is also substantially cylindrical (see, for example, FIG. 2A and FIG. 2C). A cylindrical configuration reduces the interior volume of the first chamber 100 while allowing free rotation of a vacuum robot located within the first chamber 100. Such rotation may occur, for example, when the robot rotates to transfer substrates between the various chambers 103 coupled to the first chamber 100 (FIG. 1).
  • To accommodate rotations of a vacuum robot through the third (central) piece 113 of the chamber 100, the third piece 113 includes notched regions 211A-D (see FIG. 2A in which only notches 211A-C are shown). The notches 211A-D also provide additional clearance during substrate transfers through openings (e.g., slit openings) formed in respective facets of the first and the second side pieces 109, 111. That is, the notches 211A-D may provide additional clearance during substrate transfers through openings 213, 215, 217, 219, respectively, which correspond to recessed facets 201F, 201E, 201C, 201B (as shown in FIGS. 2A and 2B).
  • While recessed facets 201B, 201C, 201E, 201F of the first and second pieces 309, 311 are shown as having only one opening, each recessed facet may include additional openings (e.g., 2, 3, 4 or more openings). Likewise, the facet 201A of the third (central) piece 113 is shown having a single opening 221 (FIG. 2A), but may include additional openings (e.g., 2, 3, 4, etc.). The facet 201D (FIG. 2D) of the third piece 113 includes three vertically stacked openings 223A-C (FIG. 2A and FIG. 2D), but may include another number of openings (e.g., 1, 2, 4, 5, etc.). In at least one embodiment of the invention, the middle opening 223B of the recessed facet 201D of the third (central) piece 113 is vertically aligned with the opening 215 of the recessed facet 201 e of the second side piece 111 and with the opening 217 of the recessed facet 201C of the first side piece 109 (as shown in FIG. 2D). Note that each opening 213-223 c is sized to allow a substrate to pass therethrough. Other configurations or alignments may be employed.
  • Referring again to FIG. 2A-2B, the first and second side pieces 109, 111 include a plurality of fin structures 225, each adapted to provide structural integrity to the first chamber 100. For example, the fin structures 225 may reduce deflection of the cylindrical side/top walls of the first and second side pieces 109, 111 due to pressure differentials between an interior region of the first chamber 100 and any processing chamber coupled thereto, and/or the environment outside of the first chamber 100. Further, the use of the fin structures 225 allows the wall thicknesses of the first and second pieces 109, 111 to be reduced, and reduces the overall weight of the first chamber 100. In one embodiment, the fin structures 225 have a thickness of about 0.55 inches near the outer side/top walls of the first and second side pieces 109, 111 and of about 1.3 inches near the sealing surfaces of the first and second side pieces 109, 111 that contact the central piece 113 (for stainless steel), although other materials and/or thicknesses may be used.
  • As further shown in FIG. 2A, a bottom 227 of the third (central) piece 113 of the first chamber 100 includes a flat portion 229 and a domed portion 231 (see also FIG. 2D). The domed portion 231 provides improved strength to the bottom 227, because of its domed shape, and reduces the material thickness requirements for the bottom 227. In one exemplary embodiment, the domed portion 231 may have a thickness of about ⅜″ or less while the flat portion 227 may have a thickness of about ¾-1″ or less when stainless steel is employed. Other materials and/or thickness values and/or thickness differences between the flat portion 229 and the domed portion 231 may be used. To further increase the strength of the domed portion 231, fins or similar support structures 233 may be formed below the domed portion 231 as shown in FIG. 2D. The use of the fins 233 may reduce, for example, vertical deflections of the domed portion 231.
  • FIGS. 2B-2C illustrate a top lid 235 that may be employed with the first chamber 100. For example, the lid 235 may be adapted to seal the third (central) piece 113 of the first chamber (by employing an o-ring or similar sealing element between the lid 235 and the third piece 113).
  • With reference to FIGS. 2B-2C, the top lid 235 includes a flat sealing portion 237 that is reinforced with a plurality of support structures, such as beams 239 as shown. The sealing portion 237 may have a thickness similar to that of the flat portion 229 (FIG. 2A) of the bottom 227 of the chamber 100, and the beams 239 provide additional structural support (allowing the thickness and weight of the lid 235 to be reduced). The lid 235 may include a connection location 241 that may be used for lifting and/or lowering the lid 235 relative to the first chamber 100 (e.g., via a crane or the like).
  • Because of the weight of the lid 235, it may be desirable to provide one or more access hatches (not shown) or other openings within the lid 235 so that the entire lid 235 need not be removed from the first chamber 100 to gain access to the interior of the first chamber 100 (e.g., for maintenance or other servicing). Any number of access hatches may be included (e.g., 1, 3, 4, etc.).
  • FIG. 3 is a top view of a second exemplary multi-piece electronic device manufacturing chamber 300 in accordance with some embodiments of the present invention. With reference to FIG. 3, the second embodiment of a multi-piece electronic device manufacturing chamber 300 is also a transfer chamber for transporting substrates during electronic device manufacturing. The transfer chamber 300 is coupled to one or more processing chambers and/or load locks 103 during electronic device manufacturing. The transfer chamber 300 may include an end effector (not shown) for transporting a substrate among the processing chambers and/or load locks 103 during electronic device manufacturing.
  • In accordance with some embodiments of the invention, the transfer chamber 300 may include multiple pieces which are coupled together. More specifically, the transfer chamber 300 may include a first piece 309 (e.g., a first side piece) and a second piece 311 (e.g., a second side piece) coupled to a third piece 313 (e.g., a center piece). The first piece 309 and second piece 311 may each be coupled to the third piece 313 via an O-ring (not separately shown). The first piece 309 and second piece 311 may each be secured to the third piece 313 using securing means, such as screws, bolts, or the like. Although, the multi-piece electronic device manufacturing chamber 300 of FIG. 3 includes three pieces, the multi-piece electronic device manufacturing chamber may include a larger or smaller number of pieces (e.g., 2, 4, 5, 6, etc.).
  • In one or more embodiments of the present invention, the width W2 of the multi-piece transfer chamber, when assembled (e.g., the overall width), is 4.2 meters. Therefore, the present electronic device manufacturing chamber 300 can accommodate a larger substrate than can conventional, one-piece transfer chambers. The electronic device manufacturing chamber 300 may be of a larger or smaller width than 4.2 meters.
  • In accordance with some embodiments of the invention, from a top view or a lateral cross-sectional view, the shapes of each of the exemplary multi-piece electronic device manufacturing chamber pieces 309-313 resembles a circle cut by one or more cords. For example, from a top view or a lateral cross-sectional view, the side pieces 309, 311 resembles a portion of a circle (or, more generally, an ellipse) cut by a cord. Likewise, from a top view or a lateral cross-sectional view, the center piece 313 resembles a portion of a circle cut by two parallel cords. This shape includes two curve segments and two line segments. The shapes of the side pieces 309,311 include a curve segment and a line segment. Note that none of the individual pieces 309-313 has a polygon shape. In other words, each of the pieces 309-313 include at least one curve segment.
  • From a top view, or a lateral cross-sectional view, the shape of the second exemplary multi-piece electronic device manufacturing chamber 300 when assembled (e.g., the combined shape) is a circle. The overall shape of the second exemplary multi-piece electronic device manufacturing chamber 300 when assembled (e.g., the three dimensional shape) is substantially cylindrical. However, the multi-piece electronic device manufacturing chamber 300 may have other overall shapes (e.g., ecliptically cylindrical) including various non-polygonal shapes. As noted above, such non-polygonal shaped chambers, particularly symmetrical non-polygonal shaped chambers (e.g., a cylinder shaped chamber) may provide increase useable internal substrate transfer area for a given amount of chamber material.
  • FIG. 4A is an exploded isometric view of the second exemplary multi-piece electronic device manufacturing chamber 300 (rotated relative to the depiction in FIG. 3) in accordance with some embodiments of the present invention. Each of the first through third pieces 309-313 may be coupled horizontally to form the multi-piece electronic device manufacturing chamber 300. The length of the first piece 309 is represented by LS1′ and the largest width (e.g., the width at the widest point) of the first piece 309 is represented by WS1′. The length of second piece 311 is represented by LS2′ and the largest width of the second piece 311 is represented by WS2′. The largest length (e.g., the length at the longest point) of the third piece 313 is represented by LC1′ and the width of the third piece 313 is represented by WC1′.
  • In one or more embodiments, the largest width WC1′ of the third piece 313 is about 2.4 m and the largest length LC1′ of the third piece 313 is about 4.2 meters. Larger or smaller lengths and/or widths may be employed for the third piece 313. In the embodiment shown, the largest length LC1′ of the third piece 313 is also the overall diameter of the chamber 300. As shown, the length LS1′ of the first piece 309 and the length LS2′ of the second piece 311 are equal to the length of the sides of third piece 313. However, the length LS1′ of the first piece 309 and/or the length LS2′ of the second piece 311 may be different. In one embodiment the width WS1′ of the first piece 309 and/or the width WS2′ of the second piece 311 are each about 0.9 meters. However, the width WS1′ of the first piece 309 and/or the width WS2′ of the second piece 311 may be different (e.g., larger or smaller) and/or different than each other. (In one particular embodiment, the third piece 313 may have a width that is approximately equal to or less than the width of the first piece 309 plus the width of the second piece 311, although other relationships between the widths of the first, second and third pieces 309, 311 and 313 may be employed).
  • Each piece 309-313 of the multi-piece electronic device manufacturing chamber 300 may be made of, for example, aluminum, stainless steel, or any practicable, relatively inert material suitable for use as a transfer chamber.
  • Although the overall dimensions of the multi-piece electronic device manufacturing chamber 300 do not comply with ground and/or air transportation regulations, the dimensions of each piece 309-313 of the multi-piece electronic device manufacturing chamber 300 do comply with ground and/or air transportation regulations. More specifically, in the example described above, the overall width W2 of the multi-piece electronic device manufacturing chamber 300 is 4.2 m, which does not comply with ground and/or air transportation regulations. However, the width WS1′ of the first piece 309 and the width WS2′ of the second piece 311 are each 0.9 m and the width WC1′ of the third piece 313 is 2.4 m, each of which complies with ground and/or air transportation regulations. (In another embodiment, the width WC1′ of the third piece 313 may be about 3 to 3.2 m and the widths WS1′, WS2′ of the first and second pieces 309, 311 may each be about 0.5 to 0.6 m.)
  • Further, each piece 309-313 of the multi-piece electronic device manufacturing chamber 300 may be fabricated in a conventional machining center or shop. Therefore, as with the multi-piece electronic device manufacturing chamber 100 described above, a manufacturer of the multi-piece electronic device manufacturing chamber 300 may select one or more of a plurality of conventional machining centers or shops to fabricate the pieces 309-313 of the multi-piece electronic device manufacturing chamber 300. Also, the multi-piece electronic device manufacturing chamber 300 does not require special transportation accommodations.
  • Additional features of the first multi-piece electronic device manufacturing chamber 300 will now be described with reference to FIG. 4A, as well as to FIGS. 4B-4D in which FIG. 4B is an isometric view of the second chamber 300 when assembled; FIG. 4C is a top view of the second chamber 300; and FIG. 4D is a side view of the second chamber 300 (illustrating a facet of the second chamber 300 adapted to couple to a triple substrate stacked load lock chamber as described further below).
  • With reference to FIGS. 4A-4D, the second chamber 300 includes a plurality of extended facets 401A-F that protrude from the curved sidewalls of the chamber 300. In the embodiment shown, six extended facets are provided, although a larger or smaller number of facets may be provided.
  • Each extended facet 401A-F provides a flat area to which a processing chamber, load lock chamber or other chamber may be sealingly coupled (e.g., via an o-ring or other sealing member) as shown, for example, in FIG. 3 with reference to the chambers 103. Despite the presence of the extended facets 401A-F, the overall structure of the first chamber 300 is substantially cylindrical. For example, as shown in FIGS. 4A-4C, the first (side) piece 309 includes a cylindrical wall 403 from which extended facets 401B, 401C protrude, and the second (side) piece 311 includes a cylindrical wall 405 from which extended facets 401E, 401F protrude. The third (central) piece 313 has cylindrical opposing side walls 407, 409 as shown (FIG. 4A) that include extended facets 401A, 401D, respectively.
  • Because of the cylindrical walls 403, 405, 407, 409 of the pieces 309, 311, 313, the interior region of the second chamber 300 is also substantially cylindrical (see, for example, FIG. 4A and FIG. 4C). A cylindrical configuration reduces the interior volume of the second chamber 300 while allowing free rotation of a vacuum robot located within the second chamber 300. Such rotation may occur, for example, when the robot rotates to transfer substrates between the various chambers 103 coupled to the first chamber 300 (FIG. 3).
  • To accommodate rotations of a vacuum robot through the third (central) piece 313 of the chamber 300, the third piece 313 includes notched regions 411A-D (see FIG. 4A in which only notches 411A-C are shown). The notches 411A-D also provide additional clearance during substrate transfers through openings (e.g., slit openings) formed in respective facets of the first and the second side pieces 309, 311. That is, the notches 411A-D may provide additional clearance during substrate transfers through openings 413, 415, 417, 419, respectively, which correspond to facets 401F, 401E, 401C, 401B (as shown in FIGS. 4A and 4B).
  • While extended facets 401B, 401C, 401E, 401F of the first and second pieces 309, 311 are shown as having only one opening, each extended facet may include additional openings (e.g., 2, 3, 4 or more openings). Likewise, the extended facet 401A of the third (central) piece 313 is shown having a single opening 421 (FIG. 4A), but may include additional openings (e.g., 2, 3, 4, etc.). The extended facet 401D (FIG. 4D) of the third piece 313 includes three vertically stacked openings 423A-C (FIG. 4A and FIG. 4D), but may include another number of openings (e.g., 1, 2, 4, 5, etc.). In at least one embodiment of the invention, the middle opening 423B of the extended facet 401D of the third (central) piece 313 is vertically aligned with the opening 415 of the extended facet 401 e of the second side piece 311 and with the opening 417 of the extended facet 401C of the first side piece 309 (as shown in FIG. 4D). Note that each opening 413-423 c is sized to allow a substrate to pass therethrough. Other configurations or alignments may be employed.
  • Referring again to FIG. 4A-4B, the first and second side pieces 309, 311 include a plurality of fin structures 425, each adapted to provide structural integrity to the second chamber 300. For example, the fin structures 425 may reduce deflection of the cylindrical side/top walls of the first and second side pieces 309, 311 due to pressure differentials between an interior region of the second chamber 300 and any processing chamber coupled thereto, and/or the environment outside of the first chamber 300. Further, the use of the fin structures 425 allows the wall thicknesses of the first and second pieces 309, 311 to be reduced, and reduces the overall weight of the second chamber 300. In one embodiment, the fin structures 425 have a thickness of about 0.55 inches near the outer side/top walls of the first and second side pieces 309, 311 and of about 1.3 inches near the sealing surfaces of the first and second side pieces 309, 311 that contact the central piece 313 (for stainless steel), although other materials and/or thicknesses may be used.
  • As further shown in FIG. 4A, a bottom 427 of the third (central) piece 313 of the second chamber 300 includes a flat portion 429 and a domed portion 431 (see also FIG. 4D). The domed portion 431 provides improved strength to the bottom 427, because of its domed shape, and reduces the material thickness requirements for the bottom 427. In one exemplary embodiment, the domed portion 431 may have a thickness of about ⅜″ or less while the flat portion 427 may have a thickness of about ¾-1″ or less when stainless steel is employed. Other materials and/or thickness values and/or thickness differences between the flat portion 429 and the domed portion 431 may be used. To further increase the strength of the domed portion 431, fins or similar support structures 433 may be formed below the domed portion 431 as shown in FIG. 4D. The use of the fins 433 may reduce, for example, vertical deflections of the domed portion 431.
  • FIGS. 4B-4C also illustrate a top lid 435 that may be employed with the second chamber 300. For example, the lid 435 may be adapted to seal the third (central) piece 313 of the first chamber (by employing an o-ring or similar sealing element between the lid 435 and the third piece 313).
  • With reference to FIGS. 4B-4C, the top lid 435 includes a flat sealing portion 437 that is reinforced with a plurality of support structures, such as beams 439 as shown. The sealing portion 437 may have a thickness similar to that of the flat portion 429 (FIG. 4A) of the bottom 427 of the chamber 300, and the beams 439 provide additional structural support (allowing the thickness and weight of the lid 435 to be reduced). The lid 435 may include a connection location 441 that may be used for lifting and/or lowering the lid 235 relative to the second chamber 300 (e.g., via a crane or the like).
  • To manufacture a multi-piece electronic device manufacturing chamber 100, 300, a user, such as a manufacturer, may employ the inventive method 500 described below with respect to FIG. 5. The method 500 commences at step 502. According to the inventive method 500, in step 504, one or more overall dimensions of the electronic device manufacturing chamber is determined. More specifically, a manufacturer may need to manufacture a substrate of a required size. Based on the required size, the manufacturer may determine (e.g., design) one or more overall dimensions of an electronic device manufacturing chamber capable of manufacturing such a substrate. If the required substrate size is large enough, the overall dimensions of the chamber will not comply with at least one of ground and air transportation regulations.
  • Thereafter, in some embodiments, the manufacturer, for example, may determine how to divide the electronic device manufacturing chamber into a plurality of pieces such that the dimensions of each of the plurality of pieces complies with at least one of ground and air transportation regulations and at the same time, the structural integrity of the chamber when assembled will be sufficient to perform manufacturing operations. For example, the manufacturer may divide the designed multi-piece electronic device manufacturing chamber into pieces using vertical sectioning, such as with the electronic device manufacturing chambers 100, 300 shown in FIGS. 1-4. Horizontal sectioning is also possible. The manufacturer may decide to divide the electronic device manufacturing chamber into pieces using sectioning having other orientations or combinations of orientations.
  • Thereafter, in step 506, the plurality of pieces are manufactured. For example, the manufacturer may employ a machining center or shop to fabricate the plurality of pieces. In this manner, the multi-piece electronic device manufacturing chamber 100, 300 is manufactured.
  • Once the electronic device manufacturing chamber 100, 300 is manufactured, the electronic device manufacturing chamber 100, 300 may be transported, for example, to a customer site in step 508. To transport a multi-piece electronic device manufacturing chamber 100, 300, the manufacturer may employ a method of transporting such a chamber in accordance with one or more embodiments of the present invention. For example, a first piece of a plurality of electronic device manufacturing chamber pieces may be transported via one of ground and air transportation. The first piece may be placed in a container that complies with transportation regulations such that the first piece forms an angle with a side (such as a bottom side) of the container. Thus, the first piece may have an actual height or width dimension larger than permitted if it was not placed in the container at such an angle, yet may still fit within a container that complies with transportation regulations. The ability to ship larger pieces allows the inventive multi-piece chamber to be formed from fewer pieces. Therefore, placing the pieces at an angle within the shipping container may be preferred, though not required. In some embodiments it may be preferred to manufacture a multi-piece chamber such that a main or central piece is as large as possible and still capable of fitting into a standard size shipping container while the remaining pieces are smaller or as small as possible so that assembly is easier.
  • Once the pieces arrive at, for example, the customer site, the pieces may be assembled to form the electronic device manufacturing chamber 100, 300 in step 510. In some embodiments, extended facets may be installed into or in replacement of the recessed facets 201A-F of the electronic device manufacturing chamber 100 in step 512. In such embodiments, the extended facets may aid in coupling load locks and/or processing chambers to the electronic device manufacturing chamber 100. In certain embodiments, extended facets added to recessed facets 201A-F may extend completely outside the outer circumference of the electronic device manufacturing chamber 100 so that the resulting chamber appears similar to the embodiment depicted in FIG. 4A. In other embodiments, extended facets added to recessed facets 201A-F may only extend partially beyond the outer circumference of the electronic device manufacturing chamber 100. Extended facets may include a flat area (for coupling a load lock or processing chamber) with an opening (sized to allow the passage of a substrate) and an adapter portion that fits sealingly into the recess of a recessed facet 201A-F.
  • In step 514, load locks and/or processing chambers may be coupled to the facets of the electronic device manufacturing chamber 100, 300. In step 516, a robot, adapted to move substrates between the processing chambers via the non-polygon shaped transfer chamber may be installed within the electronic device manufacturing chamber 100, 300. The method 500 is completed in step 518.
  • Accordingly, while the present invention has been disclosed in connection with exemplary embodiments thereof, it should be understood that other embodiments may fall within the spirit and scope of the invention, as defined by the following claims.

Claims (23)

1. An apparatus comprising:
a plurality of chamber pieces adapted to fit together to form a non-polygon shaped electronic device manufacturing chamber,
wherein the chamber pieces individually have dimensions that comply with at least one of ground and air transportation regulations; and
wherein an overall dimension of the non-polygon shaped electronic device manufacturing chamber does not comply with at least one of ground and air transportation regulations.
2. The apparatus of claim 1 wherein the chamber pieces each include at least one curved side.
3. The apparatus of claim 2 wherein at least one of the chamber pieces includes at least two curved sides and two straight sides.
4. The apparatus of claim 2 wherein at least two of the chamber pieces each include at least one curved side and one straight side.
5. The apparatus of claim 4 wherein the chamber pieces are adapted to fit together along the straight sides.
6. The apparatus of claim 2 wherein the curved sides each include at least one opening, each opening being both sized to allow a substrate to pass therethrough and adapted to be coupled to a second chamber.
7. The apparatus of claim 2 wherein the plurality of chamber pieces include at least one chamber piece having at least one facet in at least one of the curved sides, and
wherein the at least one facet is adapted to be coupled to a second chamber and includes at least one opening.
8. The apparatus of claim 7 wherein the at least one facet is recessed in the curved side.
9. The apparatus of claim 8 wherein the at least one facet includes a plurality of openings.
10. The apparatus of claim 7 wherein the at least one facet is adapted to extend out of the curved side.
11. The apparatus of claim 10 wherein the at least one facet includes a plurality of openings.
12. An apparatus comprising:
a first chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by two cords such that the shape includes two curve segments, a first line segment, and a second line segment;
a second chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a third line segment; and
a third chamber piece having a lateral cross-sectional shape of a portion of an ellipse cut by a cord such that the shape includes a curve segment and a fourth line segment,
wherein the chamber pieces are adapted to fit together to form a shape of an elliptical cylinder.
13. The apparatus of claim 10 wherein the two cords forming the lateral cross-sectional shape of the first chamber piece are parallel.
14. The apparatus of claim 10 wherein the first chamber piece is adapted to be coupled to the second chamber piece along the first line segment, and
wherein the first chamber piece is adapted to be coupled to the third chamber piece along the second line segment.
15. The apparatus of claim 12 wherein the chamber pieces are adapted to fit together to form a chamber having circular cylinder shape.
16. An apparatus comprising:
a first chamber piece;
a second chamber piece adapted to be coupled to the first chamber piece; and
a third chamber piece adapted to be coupled to the first chamber piece,
wherein the first chamber piece includes a top having a shape formed from two curve segments, a first line segment, and a second line segment,
wherein the second chamber piece includes a top having a shape formed from one curve segment and one line segment,
wherein the third chamber piece includes a top having a shape formed from one curve segment and one line segment,
wherein the first line segment of the first chamber piece is approximately equal in length to the line segment of the second chamber piece, the second line segment of the first chamber piece is approximately equal in length to the line segment of the third chamber piece, and
wherein the two curve segments of the first chamber piece, the curve segment of the second chamber piece, and the curve segment of the third chamber piece form an ellipse when the second and third chamber pieces are coupled to the first chamber piece.
17. The apparatus of claim 16 wherein the ellipse formed by the curve segments of the chamber pieces is a circle.
18. The apparatus of claim 16 wherein the second chamber piece is adapted to be coupled to the first chamber piece along the line segment of the second chamber piece and the first line segment of the first chamber piece.
19. The apparatus of claim 16 wherein the first line segment of the first chamber piece and the second line segment of the first chamber piece are approximately equal in length.
20. The apparatus of claim 16 wherein the first line segment of the first chamber piece and the second line segment of the first chamber piece are of different lengths.
21. The apparatus of claim 16 wherein the chamber pieces each include at least one curved sidewall and at least one facet in the curved sidewall,
wherein at least one facet is adapted to be coupled to a load lock, and
wherein at least one facet includes one or more openings adapted to pass a substrate.
22. The apparatus of claim 21 wherein at least one facet is recessed into a curved sidewall.
23. The apparatus of claim 21 wherein at least one facet extends out from a curved sidewall.
US12/840,262 2004-06-02 2010-07-20 Electronic device manufacturing chamber and methods of forming the same Abandoned US20100281683A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/840,262 US20100281683A1 (en) 2004-06-02 2010-07-20 Electronic device manufacturing chamber and methods of forming the same

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US57690204P 2004-06-02 2004-06-02
US58710904P 2004-07-12 2004-07-12
US11/145,003 US20060051507A1 (en) 2004-06-02 2005-06-02 Electronic device manufacturing chamber and methods of forming the same
US11/214,475 US7784164B2 (en) 2004-06-02 2005-08-29 Electronic device manufacturing chamber method
US12/840,262 US20100281683A1 (en) 2004-06-02 2010-07-20 Electronic device manufacturing chamber and methods of forming the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/214,475 Division US7784164B2 (en) 2004-06-02 2005-08-29 Electronic device manufacturing chamber method

Publications (1)

Publication Number Publication Date
US20100281683A1 true US20100281683A1 (en) 2010-11-11

Family

ID=46124054

Family Applications (2)

Application Number Title Priority Date Filing Date
US11/214,475 Active 2027-10-17 US7784164B2 (en) 2004-06-02 2005-08-29 Electronic device manufacturing chamber method
US12/840,262 Abandoned US20100281683A1 (en) 2004-06-02 2010-07-20 Electronic device manufacturing chamber and methods of forming the same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US11/214,475 Active 2027-10-17 US7784164B2 (en) 2004-06-02 2005-08-29 Electronic device manufacturing chamber method

Country Status (1)

Country Link
US (2) US7784164B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10998209B2 (en) 2019-05-31 2021-05-04 Applied Materials, Inc. Substrate processing platforms including multiple processing chambers
US11600507B2 (en) 2020-09-09 2023-03-07 Applied Materials, Inc. Pedestal assembly for a substrate processing chamber
US11610799B2 (en) 2020-09-18 2023-03-21 Applied Materials, Inc. Electrostatic chuck having a heating and chucking capabilities
US11674227B2 (en) 2021-02-03 2023-06-13 Applied Materials, Inc. Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
US11749542B2 (en) 2020-07-27 2023-09-05 Applied Materials, Inc. Apparatus, system, and method for non-contact temperature monitoring of substrate supports
US11817331B2 (en) 2020-07-27 2023-11-14 Applied Materials, Inc. Substrate holder replacement with protective disk during pasting process

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1523761A1 (en) * 2002-06-21 2005-04-20 Applied Materials, Inc. Transfer chamber for vacuum processing system
KR100441875B1 (en) * 2003-06-02 2004-07-27 주성엔지니어링(주) Separable type transfer chamber
US20060201074A1 (en) * 2004-06-02 2006-09-14 Shinichi Kurita Electronic device manufacturing chamber and methods of forming the same
TWI298895B (en) * 2004-06-02 2008-07-11 Applied Materials Inc Electronic device manufacturing chamber and methods of forming the same
US7784164B2 (en) * 2004-06-02 2010-08-31 Applied Materials, Inc. Electronic device manufacturing chamber method
US20070281090A1 (en) * 2006-04-11 2007-12-06 Shinichi Kurita System architecture and method for solar panel formation
JP5419581B2 (en) * 2009-07-31 2014-02-19 東京エレクトロン株式会社 Method for assembling transfer mechanism and transfer chamber

Citations (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1381877A (en) * 1919-05-12 1921-06-14 Edward T Neyhard Knockdown tank
US2761582A (en) * 1950-08-01 1956-09-04 Moorex Ind Inc Demountable structure
US3610784A (en) * 1970-03-19 1971-10-05 Tecumseh Products Co Electric motor and compressor construction
US4341592A (en) * 1975-08-04 1982-07-27 Texas Instruments Incorporated Method for removing photoresist layer from substrate by ozone treatment
US4455177A (en) * 1982-09-13 1984-06-19 Filippov Vladimir I Method and apparatus for chemical heat treatment of steel parts utilizing a continuous electric furnace
US4474358A (en) * 1981-10-27 1984-10-02 Bennett Arthur M Valves
US4483654A (en) * 1981-02-13 1984-11-20 Lam Research Corporation Workpiece transfer mechanism
US4491520A (en) * 1984-02-22 1985-01-01 Jaye Richard C Filter for water jugs
US4643627A (en) * 1984-10-16 1987-02-17 International Business Machines Corporation Vacuum transfer device
US4649612A (en) * 1984-12-26 1987-03-17 Nippon Piston Ring Co., Ltd. Method of manufacturing a rotor for rotary fluid pumps
US4695215A (en) * 1982-05-25 1987-09-22 Ernst Leitz Wetzlar Gmbh Device for automatically transporting disk shaped objects
US4722298A (en) * 1986-05-19 1988-02-02 Machine Technology, Inc. Modular processing apparatus for processing semiconductor wafers
US4726924A (en) * 1984-06-28 1988-02-23 The Boeing Company Method of planar forming of zero degree composite tape
US4763690A (en) * 1986-07-29 1988-08-16 Harsco Corporation Leak-proof valve for gas cylinders
US4799418A (en) * 1987-08-21 1989-01-24 Mitsuba Electric Mfg. Co., Ltd. Vacuum actuator for vehicle speed control
US4851058A (en) * 1982-09-03 1989-07-25 General Motors Corporation High energy product rare earth-iron magnet alloys
US4851101A (en) * 1987-09-18 1989-07-25 Varian Associates, Inc. Sputter module for modular wafer processing machine
US4851018A (en) * 1986-11-28 1989-07-25 Commissariat A L'energie Atomique Installation for the storage and transfer of objects in a very clean atmosphere
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
US4952299A (en) * 1988-10-31 1990-08-28 Eaton Corporation Wafer handling apparatus
US4993358A (en) * 1989-07-28 1991-02-19 Watkins-Johnson Company Chemical vapor deposition reactor and method of operation
US5002464A (en) * 1987-04-16 1991-03-26 Lee Hyeong G Double buffer vacuum system
US5085887A (en) * 1990-09-07 1992-02-04 Applied Materials, Inc. Wafer reactor vessel window with pressure-thermal compensation
US5138525A (en) * 1991-06-14 1992-08-11 Dell Usa Corporation Multi-purpose strut for digital computer chassis
US5152504A (en) * 1991-09-11 1992-10-06 Janis Research Company, Inc. Vacuum valve
US5186718A (en) * 1989-05-19 1993-02-16 Applied Materials, Inc. Staged-vacuum wafer processing system and method
US5417537A (en) * 1993-05-07 1995-05-23 Miller; Kenneth C. Wafer transport device
US5421957A (en) * 1993-07-30 1995-06-06 Applied Materials, Inc. Low temperature etching in cold-wall CVD systems
US5503809A (en) * 1993-04-19 1996-04-02 John T. Towles Compact ozone generator
US5522412A (en) * 1993-08-11 1996-06-04 Tokyo Electron Kabushiki Kaisha Vacuum treatment apparatus and a cleaning method therefor
US5567243A (en) * 1994-06-03 1996-10-22 Sony Corporation Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
US5647243A (en) * 1995-02-02 1997-07-15 Comau S.P.A. Device for hemming elements of pressed sheet metal
US5647911A (en) * 1993-12-14 1997-07-15 Sony Corporation Gas diffuser plate assembly and RF electrode
US5730801A (en) * 1994-08-23 1998-03-24 Applied Materials, Inc. Compartnetalized substrate processing chamber
US5766364A (en) * 1996-07-17 1998-06-16 Matsushita Electric Industrial Co., Ltd. Plasma processing apparatus
US5877086A (en) * 1996-07-12 1999-03-02 Applied Materials, Inc. Metal planarization using a CVD wetting film
US5934856A (en) * 1994-05-23 1999-08-10 Tokyo Electron Limited Multi-chamber treatment system
US6010133A (en) * 1996-07-09 2000-01-04 Lam Research Corporation Chamber interfacing O-rings and method for implementing same
US6019839A (en) * 1998-04-17 2000-02-01 Applied Materials, Inc. Method and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor deposition
US6045620A (en) * 1997-07-11 2000-04-04 Applied Materials, Inc. Two-piece slit valve insert for vacuum processing system
US6093252A (en) * 1995-08-03 2000-07-25 Asm America, Inc. Process chamber with inner support
US6099697A (en) * 1999-04-13 2000-08-08 Applied Materials, Inc. Method of and apparatus for restoring a support surface in a semiconductor wafer processing system
US6143079A (en) * 1998-11-19 2000-11-07 Asm America, Inc. Compact process chamber for improved process uniformity
US6190104B1 (en) * 1998-06-08 2001-02-20 Kokusai Electric Co., Ltd. Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method
US6201999B1 (en) * 1997-06-09 2001-03-13 Applied Materials, Inc. Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool
US6216328B1 (en) * 1996-07-09 2001-04-17 Lam Research Corporation Transport chamber and method for making same
US6257827B1 (en) * 1997-12-01 2001-07-10 Brooks Automation Inc. Apparatus and method for transporting substrates
US6267917B1 (en) * 1998-10-16 2001-07-31 Norstar Aluminum Molds, Inc. Rotatable mold apparatus having replaceable molds and replacement methods
US6267545B1 (en) * 1999-03-29 2001-07-31 Lam Research Corporation Semiconductor processing platform architecture having processing module isolation capabilities
US20010012681A1 (en) * 1998-02-27 2001-08-09 Wensel Richard W. Method and apparatus for removing contaminants on electronic devices
US20010016364A1 (en) * 1998-04-14 2001-08-23 James F. Loan Film processing system
US6286451B1 (en) * 1997-05-29 2001-09-11 Applied Materials, Inc. Dome: shape and temperature controlled surfaces
US20010029892A1 (en) * 1997-08-11 2001-10-18 Robert C. Cook Vertical plasma enhanced process apparatus & method
US20020033232A1 (en) * 1999-09-10 2002-03-21 Ivo Raaijmakers Quartz wafer processing chamber
US6390019B1 (en) * 1998-06-11 2002-05-21 Applied Materials, Inc. Chamber having improved process monitoring window
US6440261B1 (en) * 1999-05-25 2002-08-27 Applied Materials, Inc. Dual buffer chamber cluster tool for semiconductor wafer processing
US6503365B1 (en) * 1998-04-21 2003-01-07 Samsung Electronics Co., Ltd. Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing
US20030012624A1 (en) * 2001-07-13 2003-01-16 Kinnard David William Wafer transport apparatus
US6517304B1 (en) * 1999-03-31 2003-02-11 Canon Kabushiki Kaisha Method for transporting substrates and a semiconductor manufacturing apparatus using the method
US20030035709A1 (en) * 2000-04-14 2003-02-20 Damon Cox Robot for handling semiconductor wafers
US6530732B1 (en) * 1997-08-12 2003-03-11 Brooks Automation, Inc. Single substrate load lock with offset cool module and buffer chamber
US6538388B2 (en) * 2000-10-16 2003-03-25 Alps Electric Co., Ltd. Plasma processing apparatus suitable for power supply of higher frequency
US6540869B2 (en) * 2000-06-02 2003-04-01 Tokyo Electron Limited Semiconductor processing system
US20030109094A1 (en) * 2001-10-29 2003-06-12 Seidel Thomas E. Massively parallel atomic layer deposition/chemical vapor deposition system
US6634845B1 (en) * 1999-06-18 2003-10-21 Tokyo Electron Limited Transfer module and cluster system for semiconductor manufacturing process
US20040003777A1 (en) * 2002-07-08 2004-01-08 Carpenter Craig M. Apparatus and method for depositing materials onto microelectronic workpieces
US6691876B2 (en) * 2001-10-22 2004-02-17 Advanced Semiconductor Engineering, Inc. Semiconductor wafer cassette
US6698991B1 (en) * 2000-03-02 2004-03-02 Applied Materials, Inc. Fabrication system with extensible equipment sets
US6719517B2 (en) * 2001-12-04 2004-04-13 Brooks Automation Substrate processing apparatus with independently configurable integral load locks
US6736149B2 (en) * 1999-11-02 2004-05-18 Supercritical Systems, Inc. Method and apparatus for supercritical processing of multiple workpieces
US20040200415A1 (en) * 2003-02-26 2004-10-14 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US20050005849A1 (en) * 2003-05-22 2005-01-13 Noboru Masuoka Semiconductor processing system
US20050095088A1 (en) * 2003-10-20 2005-05-05 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US20050133160A1 (en) * 2003-12-23 2005-06-23 Kennedy William S. Showerhead electrode assembly for plasma processing apparatuses
US6926798B2 (en) * 1999-11-02 2005-08-09 Tokyo Electron Limited Apparatus for supercritical processing of a workpiece
US20050205012A1 (en) * 2003-06-02 2005-09-22 Jusung Engineering Co., Ltd. Transfer chamber for cluster system
US6950721B2 (en) * 2002-03-22 2005-09-27 Tokyo Electron Limited Positioning substrate for semiconductor process
US20060015340A1 (en) * 2004-07-14 2006-01-19 Culture.Com Technology (Macau) Ltd. Operating system and method
US20060051507A1 (en) * 2004-06-02 2006-03-09 Applied Materials, Inc. Electronic device manufacturing chamber and methods of forming the same
US20060054280A1 (en) * 2004-02-23 2006-03-16 Jang Geun-Ha Apparatus of manufacturing display substrate and showerhead assembly equipped therein
US20060060138A1 (en) * 2004-09-20 2006-03-23 Applied Materials, Inc. Diffuser gravity support
US7018517B2 (en) * 2002-06-21 2006-03-28 Applied Materials, Inc. Transfer chamber for vacuum processing system
US20060101728A1 (en) * 2004-06-02 2006-05-18 White John M Electronic device manufacturing chamber and methods of forming the same
US20060182529A1 (en) * 2003-02-24 2006-08-17 Tokyo Electron Limited Transfer device and semiconductor processing system
US20060201074A1 (en) * 2004-06-02 2006-09-14 Shinichi Kurita Electronic device manufacturing chamber and methods of forming the same
US20070020890A1 (en) * 2005-07-19 2007-01-25 Applied Materials, Inc. Method and apparatus for semiconductor processing
US20070141748A1 (en) * 2005-12-20 2007-06-21 Applied Materials, Inc. Extended mainframe designs for semiconductor device manufacturing equipment
US20070166133A1 (en) * 2006-01-13 2007-07-19 Applied Materials, Inc. Decoupled chamber body
US20070183869A1 (en) * 2002-07-17 2007-08-09 Sungmin Cho Docking station for a factory interface
US20080025821A1 (en) * 2006-07-25 2008-01-31 Applied Materials, Inc. Octagon transfer chamber

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4632624A (en) 1984-03-09 1986-12-30 Tegal Corporation Vacuum load lock apparatus
FR2594102B1 (en) 1986-02-12 1991-04-19 Stein Heurtey AUTOMATED FLEXIBLE INSTALLATION FOR FAST THERMOCHEMICAL TREATMENT
JPH05347130A (en) 1992-06-15 1993-12-27 Mitsubishi Electric Corp Cathode-ray tube
US5961269A (en) 1996-11-18 1999-10-05 Applied Materials, Inc. Three chamber load lock apparatus
US6174377B1 (en) 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
JPH1189026A (en) 1997-09-08 1999-03-30 Hitachi Ltd Switch gear
JPH1189027A (en) 1997-09-08 1999-03-30 Hitachi Ltd Switch gear
JPH11186363A (en) 1997-12-24 1999-07-09 Shin Etsu Handotai Co Ltd Semiconductor manufacturing device
US6042623A (en) 1998-01-12 2000-03-28 Tokyo Electron Limited Two-wafer loadlock wafer processing apparatus and loading and unloading method therefor
US6026589A (en) 1998-02-02 2000-02-22 Silicon Valley Group, Thermal Systems Llc Wafer carrier and semiconductor apparatus for processing a semiconductor substrate
JP2000167788A (en) 1998-12-07 2000-06-20 Nsk Ltd Conveyance robot device
JP3433392B2 (en) 1999-01-12 2003-08-04 セントラル硝子株式会社 Cleaning gas and cleaning method for vacuum processing apparatus
US6326597B1 (en) 1999-04-15 2001-12-04 Applied Materials, Inc. Temperature control system for process chamber
US6245149B1 (en) 1999-07-01 2001-06-12 Applied Materials, Inc. Inert barrier for high purity epitaxial deposition systems
US6347919B1 (en) 1999-12-17 2002-02-19 Eaton Corporation Wafer processing chamber having separable upper and lower halves
US6494959B1 (en) 2000-01-28 2002-12-17 Applied Materials, Inc. Process and apparatus for cleaning a silicon surface
US6506009B1 (en) 2000-03-16 2003-01-14 Applied Materials, Inc. Apparatus for storing and moving a cassette
US6977014B1 (en) 2000-06-02 2005-12-20 Novellus Systems, Inc. Architecture for high throughput semiconductor processing applications
JP2002001100A (en) 2000-06-22 2002-01-08 Mitsubishi Heavy Ind Ltd Plasma treatment apparatus
JP5159010B2 (en) 2000-09-08 2013-03-06 株式会社半導体エネルギー研究所 Method for manufacturing light emitting device
US20020159864A1 (en) 2001-04-30 2002-10-31 Applied Materials, Inc. Triple chamber load lock
KR20030035350A (en) 2001-10-31 2003-05-09 대우종합기계 주식회사 structure for connecting a transmission to an engine of a wheel loader
US20040221811A1 (en) 2001-11-30 2004-11-11 Robert Mitchell Method and apparatus for processing wafers
KR20030046306A (en) 2001-12-05 2003-06-12 에섹 트레이딩 에스에이 Apparatus for mounting semiconductor chips
JP2004335743A (en) 2003-05-08 2004-11-25 Ulvac Japan Ltd Vacuum chamber for vacuum processing apparatus
JP4450664B2 (en) 2003-06-02 2010-04-14 東京エレクトロン株式会社 Substrate processing apparatus and substrate transfer method
US7313262B2 (en) * 2003-08-06 2007-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for visualization of process chamber conditions
EP1684951B1 (en) 2003-11-10 2014-05-07 Brooks Automation, Inc. System for handling workpieces in a vacuum-based semiconductor handling system
WO2006130811A2 (en) 2005-06-02 2006-12-07 Applied Materials, Inc. Electronic device manufacturing chamber and methods of forming the same

Patent Citations (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1381877A (en) * 1919-05-12 1921-06-14 Edward T Neyhard Knockdown tank
US2761582A (en) * 1950-08-01 1956-09-04 Moorex Ind Inc Demountable structure
US3610784A (en) * 1970-03-19 1971-10-05 Tecumseh Products Co Electric motor and compressor construction
US4341592A (en) * 1975-08-04 1982-07-27 Texas Instruments Incorporated Method for removing photoresist layer from substrate by ozone treatment
US4483654A (en) * 1981-02-13 1984-11-20 Lam Research Corporation Workpiece transfer mechanism
US4474358A (en) * 1981-10-27 1984-10-02 Bennett Arthur M Valves
US4695215A (en) * 1982-05-25 1987-09-22 Ernst Leitz Wetzlar Gmbh Device for automatically transporting disk shaped objects
US4851058A (en) * 1982-09-03 1989-07-25 General Motors Corporation High energy product rare earth-iron magnet alloys
US4455177A (en) * 1982-09-13 1984-06-19 Filippov Vladimir I Method and apparatus for chemical heat treatment of steel parts utilizing a continuous electric furnace
US4491520A (en) * 1984-02-22 1985-01-01 Jaye Richard C Filter for water jugs
US4726924A (en) * 1984-06-28 1988-02-23 The Boeing Company Method of planar forming of zero degree composite tape
US4643627A (en) * 1984-10-16 1987-02-17 International Business Machines Corporation Vacuum transfer device
US4649612A (en) * 1984-12-26 1987-03-17 Nippon Piston Ring Co., Ltd. Method of manufacturing a rotor for rotary fluid pumps
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
US4722298A (en) * 1986-05-19 1988-02-02 Machine Technology, Inc. Modular processing apparatus for processing semiconductor wafers
US4763690A (en) * 1986-07-29 1988-08-16 Harsco Corporation Leak-proof valve for gas cylinders
US4851018A (en) * 1986-11-28 1989-07-25 Commissariat A L'energie Atomique Installation for the storage and transfer of objects in a very clean atmosphere
US5002464A (en) * 1987-04-16 1991-03-26 Lee Hyeong G Double buffer vacuum system
US4799418A (en) * 1987-08-21 1989-01-24 Mitsuba Electric Mfg. Co., Ltd. Vacuum actuator for vehicle speed control
US4851101A (en) * 1987-09-18 1989-07-25 Varian Associates, Inc. Sputter module for modular wafer processing machine
US4952299A (en) * 1988-10-31 1990-08-28 Eaton Corporation Wafer handling apparatus
US5186718A (en) * 1989-05-19 1993-02-16 Applied Materials, Inc. Staged-vacuum wafer processing system and method
US4993358A (en) * 1989-07-28 1991-02-19 Watkins-Johnson Company Chemical vapor deposition reactor and method of operation
US5085887A (en) * 1990-09-07 1992-02-04 Applied Materials, Inc. Wafer reactor vessel window with pressure-thermal compensation
US5138525A (en) * 1991-06-14 1992-08-11 Dell Usa Corporation Multi-purpose strut for digital computer chassis
US5152504A (en) * 1991-09-11 1992-10-06 Janis Research Company, Inc. Vacuum valve
US5503809A (en) * 1993-04-19 1996-04-02 John T. Towles Compact ozone generator
US5417537A (en) * 1993-05-07 1995-05-23 Miller; Kenneth C. Wafer transport device
US5421957A (en) * 1993-07-30 1995-06-06 Applied Materials, Inc. Low temperature etching in cold-wall CVD systems
US5522412A (en) * 1993-08-11 1996-06-04 Tokyo Electron Kabushiki Kaisha Vacuum treatment apparatus and a cleaning method therefor
US5647911A (en) * 1993-12-14 1997-07-15 Sony Corporation Gas diffuser plate assembly and RF electrode
US5934856A (en) * 1994-05-23 1999-08-10 Tokyo Electron Limited Multi-chamber treatment system
US5567243A (en) * 1994-06-03 1996-10-22 Sony Corporation Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
US5730801A (en) * 1994-08-23 1998-03-24 Applied Materials, Inc. Compartnetalized substrate processing chamber
US5647243A (en) * 1995-02-02 1997-07-15 Comau S.P.A. Device for hemming elements of pressed sheet metal
US6464792B1 (en) * 1995-08-03 2002-10-15 Asm America, Inc. Process chamber with downstream getter plate
US6093252A (en) * 1995-08-03 2000-07-25 Asm America, Inc. Process chamber with inner support
US6216328B1 (en) * 1996-07-09 2001-04-17 Lam Research Corporation Transport chamber and method for making same
US6010133A (en) * 1996-07-09 2000-01-04 Lam Research Corporation Chamber interfacing O-rings and method for implementing same
US6305565B1 (en) * 1996-07-09 2001-10-23 Lam Research Corporation Transport chamber and method for making same
US5877086A (en) * 1996-07-12 1999-03-02 Applied Materials, Inc. Metal planarization using a CVD wetting film
US5766364A (en) * 1996-07-17 1998-06-16 Matsushita Electric Industrial Co., Ltd. Plasma processing apparatus
US6286451B1 (en) * 1997-05-29 2001-09-11 Applied Materials, Inc. Dome: shape and temperature controlled surfaces
US20020000198A1 (en) * 1997-05-29 2002-01-03 Applied Materials, Inc. The dome: shape and temperature controlled surfaces
US6201999B1 (en) * 1997-06-09 2001-03-13 Applied Materials, Inc. Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool
US6045620A (en) * 1997-07-11 2000-04-04 Applied Materials, Inc. Two-piece slit valve insert for vacuum processing system
US20010029892A1 (en) * 1997-08-11 2001-10-18 Robert C. Cook Vertical plasma enhanced process apparatus & method
US6530732B1 (en) * 1997-08-12 2003-03-11 Brooks Automation, Inc. Single substrate load lock with offset cool module and buffer chamber
US6257827B1 (en) * 1997-12-01 2001-07-10 Brooks Automation Inc. Apparatus and method for transporting substrates
US20010012681A1 (en) * 1998-02-27 2001-08-09 Wensel Richard W. Method and apparatus for removing contaminants on electronic devices
US20010016364A1 (en) * 1998-04-14 2001-08-23 James F. Loan Film processing system
US6019839A (en) * 1998-04-17 2000-02-01 Applied Materials, Inc. Method and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor deposition
US6503365B1 (en) * 1998-04-21 2003-01-07 Samsung Electronics Co., Ltd. Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing
US6190104B1 (en) * 1998-06-08 2001-02-20 Kokusai Electric Co., Ltd. Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method
US6390019B1 (en) * 1998-06-11 2002-05-21 Applied Materials, Inc. Chamber having improved process monitoring window
US6267917B1 (en) * 1998-10-16 2001-07-31 Norstar Aluminum Molds, Inc. Rotatable mold apparatus having replaceable molds and replacement methods
US6869485B2 (en) * 1998-11-19 2005-03-22 Asm America, Inc. Compact process chamber for improved process uniformity
US6143079A (en) * 1998-11-19 2000-11-07 Asm America, Inc. Compact process chamber for improved process uniformity
US6267545B1 (en) * 1999-03-29 2001-07-31 Lam Research Corporation Semiconductor processing platform architecture having processing module isolation capabilities
US6517304B1 (en) * 1999-03-31 2003-02-11 Canon Kabushiki Kaisha Method for transporting substrates and a semiconductor manufacturing apparatus using the method
US6099697A (en) * 1999-04-13 2000-08-08 Applied Materials, Inc. Method of and apparatus for restoring a support surface in a semiconductor wafer processing system
US6440261B1 (en) * 1999-05-25 2002-08-27 Applied Materials, Inc. Dual buffer chamber cluster tool for semiconductor wafer processing
US6634845B1 (en) * 1999-06-18 2003-10-21 Tokyo Electron Limited Transfer module and cluster system for semiconductor manufacturing process
US20020033232A1 (en) * 1999-09-10 2002-03-21 Ivo Raaijmakers Quartz wafer processing chamber
US6383330B1 (en) * 1999-09-10 2002-05-07 Asm America, Inc. Quartz wafer processing chamber
US6926798B2 (en) * 1999-11-02 2005-08-09 Tokyo Electron Limited Apparatus for supercritical processing of a workpiece
US6736149B2 (en) * 1999-11-02 2004-05-18 Supercritical Systems, Inc. Method and apparatus for supercritical processing of multiple workpieces
US7060422B2 (en) * 1999-11-02 2006-06-13 Tokyo Electron Limited Method of supercritical processing of a workpiece
US6698991B1 (en) * 2000-03-02 2004-03-02 Applied Materials, Inc. Fabrication system with extensible equipment sets
US20030035709A1 (en) * 2000-04-14 2003-02-20 Damon Cox Robot for handling semiconductor wafers
US6540869B2 (en) * 2000-06-02 2003-04-01 Tokyo Electron Limited Semiconductor processing system
US6538388B2 (en) * 2000-10-16 2003-03-25 Alps Electric Co., Ltd. Plasma processing apparatus suitable for power supply of higher frequency
US20030012624A1 (en) * 2001-07-13 2003-01-16 Kinnard David William Wafer transport apparatus
US20040076505A1 (en) * 2001-07-13 2004-04-22 Kinnard David William Wafer transport apparatus
US6691876B2 (en) * 2001-10-22 2004-02-17 Advanced Semiconductor Engineering, Inc. Semiconductor wafer cassette
US20030109094A1 (en) * 2001-10-29 2003-06-12 Seidel Thomas E. Massively parallel atomic layer deposition/chemical vapor deposition system
US6719517B2 (en) * 2001-12-04 2004-04-13 Brooks Automation Substrate processing apparatus with independently configurable integral load locks
US6950721B2 (en) * 2002-03-22 2005-09-27 Tokyo Electron Limited Positioning substrate for semiconductor process
US7018517B2 (en) * 2002-06-21 2006-03-28 Applied Materials, Inc. Transfer chamber for vacuum processing system
US20040003777A1 (en) * 2002-07-08 2004-01-08 Carpenter Craig M. Apparatus and method for depositing materials onto microelectronic workpieces
US20070183869A1 (en) * 2002-07-17 2007-08-09 Sungmin Cho Docking station for a factory interface
US20060182529A1 (en) * 2003-02-24 2006-08-17 Tokyo Electron Limited Transfer device and semiconductor processing system
US20040200415A1 (en) * 2003-02-26 2004-10-14 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US20050005849A1 (en) * 2003-05-22 2005-01-13 Noboru Masuoka Semiconductor processing system
US7375041B2 (en) * 2003-06-02 2008-05-20 Jusung Engineering Co., Ltd. Transfer chamber for cluster system
US20050205012A1 (en) * 2003-06-02 2005-09-22 Jusung Engineering Co., Ltd. Transfer chamber for cluster system
US7282460B2 (en) * 2003-06-02 2007-10-16 Jusung Engineering Co., Ltd. Transfer chamber for cluster system
US20050095088A1 (en) * 2003-10-20 2005-05-05 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US20050133160A1 (en) * 2003-12-23 2005-06-23 Kennedy William S. Showerhead electrode assembly for plasma processing apparatuses
US20060054280A1 (en) * 2004-02-23 2006-03-16 Jang Geun-Ha Apparatus of manufacturing display substrate and showerhead assembly equipped therein
US20060051507A1 (en) * 2004-06-02 2006-03-09 Applied Materials, Inc. Electronic device manufacturing chamber and methods of forming the same
US20060101728A1 (en) * 2004-06-02 2006-05-18 White John M Electronic device manufacturing chamber and methods of forming the same
US20060201074A1 (en) * 2004-06-02 2006-09-14 Shinichi Kurita Electronic device manufacturing chamber and methods of forming the same
US20060015340A1 (en) * 2004-07-14 2006-01-19 Culture.Com Technology (Macau) Ltd. Operating system and method
US20060060138A1 (en) * 2004-09-20 2006-03-23 Applied Materials, Inc. Diffuser gravity support
US20070020890A1 (en) * 2005-07-19 2007-01-25 Applied Materials, Inc. Method and apparatus for semiconductor processing
US20070141748A1 (en) * 2005-12-20 2007-06-21 Applied Materials, Inc. Extended mainframe designs for semiconductor device manufacturing equipment
US20070166133A1 (en) * 2006-01-13 2007-07-19 Applied Materials, Inc. Decoupled chamber body
US20080025821A1 (en) * 2006-07-25 2008-01-31 Applied Materials, Inc. Octagon transfer chamber

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10998209B2 (en) 2019-05-31 2021-05-04 Applied Materials, Inc. Substrate processing platforms including multiple processing chambers
US11749542B2 (en) 2020-07-27 2023-09-05 Applied Materials, Inc. Apparatus, system, and method for non-contact temperature monitoring of substrate supports
US11817331B2 (en) 2020-07-27 2023-11-14 Applied Materials, Inc. Substrate holder replacement with protective disk during pasting process
US11600507B2 (en) 2020-09-09 2023-03-07 Applied Materials, Inc. Pedestal assembly for a substrate processing chamber
US11610799B2 (en) 2020-09-18 2023-03-21 Applied Materials, Inc. Electrostatic chuck having a heating and chucking capabilities
US11674227B2 (en) 2021-02-03 2023-06-13 Applied Materials, Inc. Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure

Also Published As

Publication number Publication date
US20060101728A1 (en) 2006-05-18
US7784164B2 (en) 2010-08-31

Similar Documents

Publication Publication Date Title
US7784164B2 (en) Electronic device manufacturing chamber method
KR101108366B1 (en) Electronic device manufacturing chamber and methods of forming the same
US20060201074A1 (en) Electronic device manufacturing chamber and methods of forming the same
US7018517B2 (en) Transfer chamber for vacuum processing system
EP1086030B1 (en) Pod including wafer cassette
CN100401338C (en) Apparatus for manufacturing flat-panel display
KR100736243B1 (en) Vacuum chamber for vacuum processing apparatus
KR20070026215A (en) Vacuum chamber and vacuum processing apparatus
JP3127265U (en) Electronic device manufacturing chamber
KR200418867Y1 (en) Electronic device manufacturing chamber and methods of forming the same
CN111290215A (en) Light shield container
CN100550086C (en) Be used to make the equipment of flat-panel monitor
KR20180086142A (en) Decompression container, processing apparatus, processing system, and method of producing flat panel display
US7337911B2 (en) Clean container module
KR20070082056A (en) Transfer chamber for vacuum processing apparatus of substrate
KR200429043Y1 (en) Electronic device manufacturing chamber
CN115172219A (en) Reconfigurable host with replaceable interface board
WO2006130811A2 (en) Electronic device manufacturing chamber and methods of forming the same
CN112928043B (en) Reconfigurable host with replaceable interface board
KR101598176B1 (en) Vacuum chamber
TWM312762U (en) Electronic device manufacturing apparatus
TWI353622B (en) Electronic device manufacturing chamber and method
JP2021009891A (en) Gas box and transport method thereof

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION