US20090318062A1 - Polishing pad and polishing device - Google Patents
Polishing pad and polishing device Download PDFInfo
- Publication number
- US20090318062A1 US20090318062A1 US12/261,666 US26166608A US2009318062A1 US 20090318062 A1 US20090318062 A1 US 20090318062A1 US 26166608 A US26166608 A US 26166608A US 2009318062 A1 US2009318062 A1 US 2009318062A1
- Authority
- US
- United States
- Prior art keywords
- polishing
- signal
- polishing pad
- pressure
- transmitting module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The present invention provides a polishing pad with a pressure sensor and the polishing apparatus thereof. The polishing pad is used in the polishing process of semiconductor and other work piece, which includes at least one substrate, at least one pressure sensor and at least one signal transmitting module. The substrate has a polishing face, a bottom face opposite to the polishing face, and at least one cavity set on the bottom face of the substrate. The pressure sensor is set in the cavity and configured for providing a pressure signal. The signal transmitting module is set on the polishing pad and configured for transmitting a pressure signal. The pressure signal is a loading pressure value and/or loading pressure distribution on the polishing pad with a preset range. Thus, with the pressure signal, the polishing apparatus prevents the concerned work piece from being over polished to further improve polishing quality and yield.
Description
- 1. Technical Field
- The present invention is related to a polishing pad, and particularly to a polishing pad with a pressure sensor and the polishing apparatus thereof.
- 2. Description of Related Art
- Most of electric chips are consisted of various laminated layers with various materials. For example, semiconductor wafer (silicon wafer) is one of the various materials. For polarization or other destination, a polishing process or thinning process is necessary for the removal of excess laminated material when a new laminated layer is intended to be added. Such a polishing process is called chemical mechanical polishing (CMP). Many CMP steps may be necessary for the requirement of uniform surface for the addition of laminated layers.
- However, with the advances of manufacture technology, the higher density the layout of conductive lines is, the more narrow the width of the conductive lines is. Thus, the tolerance of pressure error reduces because the pressure supplied by the polishing apparatus is only 1 PSI to 2 PSI. The pressure setting is one of important issues for the polishing process. Moreover, a polishing pad is generally sandwiched between the polishing apparatus and the concerned work piece. Thus, there is pressure bias between the preset pressure and an actual pressure.
- Accordingly, the present invention provides a polishing pad with a pressure sensor and a polishing apparatus thereof. The pressure sensor is advantageous positioned to prevent the pressure sensor from being interfered and abraded by polishing chemicals. The pressure sensor directly detects the pressure loaded on a concerned work piece by the polishing apparatus and positively or passively transmits the pressure signal back. Thus, the drawbacks of over pressure or non-uniform distribution of pressure may be reduced to further the yield of the concerned polished work piece.
- Accordingly, the present invention provides a polishing pad with a pressure sensor. The polishing pad is used in the polishing process of semiconductor and other work piece, which includes at least one substrate, at least one pressure sensor and at least one signal transmitting module. The substrate has a polishing face, a bottom face opposite to the polishing face, and at least one cavity set on the bottom face of the substrate. The pressure sensor is set in the cavity and configured for providing a pressure signal. The signal transmitting module is set on the polishing pad and configured for transmitting a pressure signal. The pressure signal is a loading pressure value and/or loading pressure distribution on the polishing pad with a preset range. Thus, with the pressure signal, the polishing apparatus prevents the concerned work piece from being over polished to further improve polishing quality and yield.
- One of objects of the present invention provides a polishing pad with a pressure sensor to detect pressure value and distribution during polishing process.
- One of objects of the present invention provides a polishing pad with a pressure sensor to prevent a concerned work piece from over polishing and improve polishing quality and yield.
- One of objects of the present invention provides a polishing pad with a pressure sensor to implement a preferred method of signal transmission and signal transmission in time.
- The invention as well as a preferred mode of use, further objectives and advantages thereof will best be understood by reference to the following detailed description of illustrative embodiments when read in conjunction with the accompanying drawings, wherein:
-
FIG. 1 is a cross-sectional schematic diagram illustrating a polishing pad in accordance with one preferred embodiment of the present invention. -
FIG. 2 is a cross-sectional schematic diagram illustrating a polishing pad in accordance with one preferred embodiment of the present invention. -
FIG. 3 is a cross-sectional schematic diagram illustrating a signal transmitting module in according with one preferred embodiment of the present invention. -
FIG. 4 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. -
FIG. 5 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. -
FIG. 6 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. -
FIG. 7 is a cross-sectional schematic diagram illustrating a polishing apparatus in according with one preferred embodiment of the present invention. - The present invention provides a polishing pad with a sensor. Some sensors or the detail process or manufacture of the polishing pad used are implemented by the current technology. Thus, some known description is not mentioned in following illustration. The sizes of components are not practical rather than for illustration.
-
FIG. 1 is a cross-sectional schematic diagram illustrating a polishing pad in accordance with one preferred embodiment of the present invention. Thepolishing pad 2 is used in the polishing process of semiconductor and other work piece, which includes at least onesubstrate 21, at least onepressure sensor 3 and at least one signal transmitting module (not shown in the figure). Thesubstrate 21 has a polishingface 211, abottom face 212 opposite to the polishingface 211, and at least onecavity 213 set on thebottom face 212 of thesubstrate 21. Thepressure sensor 3 is set in thecavity 213 and configured for providing a pressure signal. The signal transmitting module is set on thepolishing pad 2 and configured for transmitting a pressure signal. In one embodiment, the pressure signal is a loading pressure value and/or loading pressure distribution on thepolishing pad 2 with a preset range. Thus, with the pressure signal, the polishing apparatus prevents the concerned work piece from being over polished to further improve polishing quality and yield. Next, inFIG. 2 , thepolishing pad 2 have more than the twosubstrates 21 and thepressure sensor 3 is sandwiched between the twosubstrates 21 to form a complex polishing pad. -
FIG. 3 is a cross-sectional schematic diagram illustrating a signal transmitting module in according with one preferred embodiment of the present invention. The exemplary signal transmitting module includes a printed circuit board 31 (PCB) and couples acircuit 311 as a power supply for direct transmission. -
FIG. 4 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. The exemplary signal transmitting module includes at least oneconductive line 32 as the power supply to positively transmit signal. -
FIG. 5 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. The exemplary signal transmitting module includes at least one battery ofpower supply 33 which may be button battery, Mercury battery, dry battery, alkaline battery, Lead/Acid Battery, Nickel-Cadmium Battery, Nickel-Metal hydride batteries, Secondary lithium battery, Li-ion Battery, polymer lithium battery, fuel battery and solar battery and used to positively transmit the signal. -
FIG. 6 is a cross-sectional schematic diagram illustrating another signal transmitting module in according with one preferred embodiment of the present invention. The exemplary signal transmitting module includes at least onewireless signal emitter 34 to passively transmit the signal. - Another signal transmitting module in according with one preferred embodiment of the present invention is provided herein. The exemplary signal transmitting module is integrated with the
pressure sensor 3 into a whole device (not shown in the figure). The whole device includes a chip, a controller, a wireless signal emitter and at least one a power supply. The frequency range of the wireless signal emitter is about from 100 MHz to 3 GHz. Furthermore, the power supply may be a vibrating motor device, external magnetic field motor device, or button battery, Mercury battery, dry battery, alkaline battery, Lead/Acid Battery, Nickel-Cadmium Battery, Nickel-Metal hydride batteries, Secondary lithium battery, Li-ion Battery, polymer lithium battery, fuel battery and solar battery, and so on. These configuration is a passive method of transmitting signal. -
FIG. 7 is a cross-sectional schematic diagram illustrating a polishing apparatus in according with one preferred embodiment of the present invention. The polishingapparatus 4 is configured for polishing awork piece 5 and loading apolishing pad 2. Thepolishing pad 2 includes at least onesubstrate 21, at least onepressure sensor 3 and at least one first signal transmitting module (not shown in the figure). Thesubstrate 21 includes a polishingface 211, abottom face 212 opposite to the polishingface 211 and acavity 213 set on thebottom face 212 of thesubstrate 21. Thepressure sensor 3 is set in thecavity 213 and configured for providing a pressure signal. The first signal transmitting module is set on thepolishing pad 2 and configured for transmitting the pressure signal. In one embodiment, the pressure signal is a loading pressure value and/or loading pressure distribution on thepolishing pad 2 with a preset range. Analarm device 47 is configured for emitting an alarm signal on condition of the pressure signal out of the present range to stop thepolishing apparatus 4. - Furthermore, the polishing
apparatus 4 includes afirst platform 41, adriving device 411, asecond platform 42, apressing device 43, at least onesignal receiving module 44 and adisplay device 45. Thepolishing pad 2 is sealed with an adhesive 46 and fixed on thefirst platform 41. The adhesive 46 may be a pressure-sensitive adhesive. Thefirst platform 41 is configured for loading thepolishing pad 2 and coupling thebottom face 212 of thepolishing pad 2. In one embodiment, the drivingdevice 411 drives thefirst platform 41 to rotate. Thesecond platform 42 is configured for loading thework piece 5. Thepressing device 43 is configured for providing a pressure loaded between thepolishing pad 2 of thefirst platform 41 and thework piece 5 of thesecond platform 42. Thesignal receiving module 44 is configured for receiving the pressure signal provided by thepolishing pad 2. Thesignal receiving module 44 may be awireless signal receiver 441. Thedisplay device 45 is configured for displaying the pressure signal. - Accordingly, a second signal transmitting module is configured for coupling with the first signal transmitting module of the
polishing pad 2 and thesignal receiving module 44 of thepolishing apparatus 4. The second signal transmitting module may be a print circuit board (PCB) 31, aconductive line 32 or a connector. In one embodiment, the second signal transmitting module is set on a surface of thepolishing pad 2 attached to thefirst platform 41. - Accordingly, the present invention provides a polishing pad with a pressure sensor and a polishing apparatus thereof. The pressure sensor is advantageous positioned to prevent the pressure sensor from being interfered and abraded by polishing chemicals. The pressure sensor directly detects the pressure loaded on a concerned work piece by the polishing apparatus and positively or passively transmits the pressure signal back. Thus, the drawbacks of over pressure or non-uniform distribution of pressure may be reduced to further the yield of the concerned polished work piece.
- Although the present invention has been explained in relation to its preferred embodiment, it is to be understood that other modifications and variation can be made without departing the spirit and scope of the invention as hereafter claimed.
Claims (20)
1. A polishing pad, applied to a polishing process of semiconductor or other work piece, said polishing pad comprising:
at least one substrate comprising a polishing face, a bottom face opposite to said polishing face, and at least one cavity set on said bottom face;
at least one pressure sensor set in said cavity and configured for providing a pressure signal; and
at least one signal transmitting module configured for transmitting said pressure signal.
2. The polishing pad according to claim 1 , wherein said pressure signal from pressure sensor comprises a loading pressure value within a preset range.
3. The polishing pad according to claim 1 , wherein said pressure signal from pressure sensor comprises a loading pressure distribution within a preset range.
4. The polishing pad according to claim 1 , wherein said signal transmitting module comprises a print circuit board.
5. The polishing pad according to claim 1 , wherein said signal transmitting module comprises at least one conductive line.
6. The polishing pad according to claim 1 , wherein said signal transmitting module comprises a battery of power supply.
7. The polishing pad according to claim 1 , wherein said signal transmitting module comprises a wireless signal emitter.
8. The polishing pad according to claim 1 , wherein said pressure sensor and said signal transmitting module are integrated into a whole module which comprises a chip, a controller, a wireless signal emitter and a power device.
9. The polishing pad according to claim 1 , wherein there are two said substrates and said pressure sensor sandwiched between said two substrates.
10. A polishing apparatus, configured for polishing a work piece and loading a polishing pad, wherein said polishing pad comprises a substrate, at least one pressure sensor and at least one first signal transmitting module; wherein said substrate comprises a polishing face, a bottom face opposite to said polishing face and a cavity set on said bottom face, and said pressure sensor is set in said cavity and configured for providing a pressure signal, and said first signal transmitting module is set on said polishing pad and configured for transmitting said pressure signal; said polishing apparatus comprising:
a first platform, configured for loading said polishing pad and coupling said bottom face of said polishing pad;
a driving device, configured for driving said first platform to rotate;
a second platform, configured for loading said work piece;
a pressing device, configured for providing a pressure loaded between said polishing pad of said first platform and said work piece of said second platform;
at least one signal receiving module, configured for receiving said pressure signal provided by said polishing pad; and
a display device, configured for displaying said pressure signal.
11. The polishing apparatus of claim 10 , wherein said polishing pad is sealed with an adhesive and fixed on said first platform.
12. The polishing apparatus of claim 11 , wherein said adhesive is a pressure-sensitive adhesive.
13. The polishing apparatus of claim 10 , wherein said pressure signal from pressure sensor comprises a loading pressure value on said polishing pad within a preset range.
14. The polishing apparatus of claim 10 , wherein said pressure signal from pressure sensor comprises a loading pressure distribution on said polishing pad within a preset range.
15. The polishing apparatus of claim 10 , further comprising an alarm device configured for emitting an alarm signal on condition of said pressure signal out of said present range.
16. The polishing apparatus of claim 15 , wherein said alarm device emits said alarm signal to stop said polishing apparatus.
17. The polishing apparatus of claim 10 , further comprising a second signal transmitting module configured for coupling with said first signal transmitting module of said polishing pad and said signal receiving module of said polishing apparatus.
18. The polishing apparatus of claim 17 , wherein said second signal transmitting module comprises a print circuit board, a conductive line or a connector.
19. The polishing apparatus of claim 17 , wherein said second signal transmitting module is set on a surface of said polishing pad attached to said first platform.
20. The polishing apparatus of claim 10 , wherein said signal receiving module comprises a wireless signal receiver.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW097210872U TWM347669U (en) | 2008-06-19 | 2008-06-19 | Polishing pad and polishing device |
TW097210872 | 2008-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20090318062A1 true US20090318062A1 (en) | 2009-12-24 |
Family
ID=41431730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/261,666 Abandoned US20090318062A1 (en) | 2008-06-19 | 2008-10-30 | Polishing pad and polishing device |
Country Status (2)
Country | Link |
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US (1) | US20090318062A1 (en) |
TW (1) | TWM347669U (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120142254A1 (en) * | 2010-12-03 | 2012-06-07 | Seminconductor Manufacturing International (Beijing) Corporation | Polishing apparatus and exception handling method thereof |
US20160358797A1 (en) * | 2014-01-20 | 2016-12-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor Processing Boat Design with Pressure Sensor |
WO2017078933A1 (en) * | 2015-11-06 | 2017-05-11 | Applied Materials, Inc. | Techniques for combining cmp process tracking data with 3d printed cmp consumables |
US10919123B2 (en) | 2018-02-05 | 2021-02-16 | Applied Materials, Inc. | Piezo-electric end-pointing for 3D printed CMP pads |
CN114603474A (en) * | 2020-12-03 | 2022-06-10 | 长鑫存储技术有限公司 | Pressure detection system |
US11446788B2 (en) | 2014-10-17 | 2022-09-20 | Applied Materials, Inc. | Precursor formulations for polishing pads produced by an additive manufacturing process |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
US11685014B2 (en) | 2018-09-04 | 2023-06-27 | Applied Materials, Inc. | Formulations for advanced polishing pads |
US11724362B2 (en) | 2014-10-17 | 2023-08-15 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US11772229B2 (en) | 2016-01-19 | 2023-10-03 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US11958162B2 (en) | 2014-10-17 | 2024-04-16 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
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Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120142254A1 (en) * | 2010-12-03 | 2012-06-07 | Seminconductor Manufacturing International (Beijing) Corporation | Polishing apparatus and exception handling method thereof |
US8858817B2 (en) * | 2010-12-03 | 2014-10-14 | Semiconductor Manufacturing International (Beijing) Corporation | Polishing apparatus and exception handling method thereof |
US10734263B2 (en) * | 2014-01-20 | 2020-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing boat design with pressure sensor |
US9911633B2 (en) * | 2014-01-20 | 2018-03-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing boat design with pressure sensor |
US20180166308A1 (en) * | 2014-01-20 | 2018-06-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing boat design with pressure sensor |
US10475679B2 (en) * | 2014-01-20 | 2019-11-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing boat design with pressure sensor |
US20160358797A1 (en) * | 2014-01-20 | 2016-12-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor Processing Boat Design with Pressure Sensor |
US11724362B2 (en) | 2014-10-17 | 2023-08-15 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11958162B2 (en) | 2014-10-17 | 2024-04-16 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US11446788B2 (en) | 2014-10-17 | 2022-09-20 | Applied Materials, Inc. | Precursor formulations for polishing pads produced by an additive manufacturing process |
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