US20090088050A1 - Conductive polishing article for electrochemical mechanical polishing - Google Patents
Conductive polishing article for electrochemical mechanical polishing Download PDFInfo
- Publication number
- US20090088050A1 US20090088050A1 US11/863,878 US86387807A US2009088050A1 US 20090088050 A1 US20090088050 A1 US 20090088050A1 US 86387807 A US86387807 A US 86387807A US 2009088050 A1 US2009088050 A1 US 2009088050A1
- Authority
- US
- United States
- Prior art keywords
- polishing
- conductive
- ion exchange
- anodes
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 166
- 239000003014 ion exchange membrane Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 25
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 9
- 229910001882 dioxygen Inorganic materials 0.000 claims description 9
- 239000008151 electrolyte solution Substances 0.000 claims description 9
- 238000005342 ion exchange Methods 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 6
- 125000000129 anionic group Chemical group 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 4
- 229920002313 fluoropolymer Polymers 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 229940021013 electrolyte solution Drugs 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 4
- 230000000717 retained effect Effects 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000557 Nafion® Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H5/00—Combined machining
- B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
- B23H5/08—Electrolytic grinding
Definitions
- Sub-quarter micron multi-level metallization is one of the key technologies for the next generation of ultra large-scale integration (ULSI).
- the multilevel interconnects that lie at the heart of this technology require planarization of interconnect features formed in high aspect ratio apertures, including contacts, vias, lines and other features. Reliable formation of these interconnect features is very important to the success of ULSI and to the continued effort to increase circuit density and quality on individual substrates and die.
- Planarizing a surface is a process where material is removed from the surface of the substrate to form a generally even, planar surface. Planarization is useful in removing undesired surface topography and surface defects, such as rough surfaces, agglomerated materials, crystal lattice damage, scratches, and contaminated layers or materials. Planarization is also useful in forming features on a substrate by removing excess deposited material used to fill the features and to provide an even surface for subsequent levels of metallization and processing.
- CMP chemical mechanical polishing
- ECMP electrochemical mechanical polishing
- the electrochemical dissolution is performed by applying a bias between a cathode and substrate surface to remove conductive materials from a substrate surface into a surrounding electrolyte.
- the bias is applied by a ring of conductive contacts in electrical communication with the substrate surface.
- the contact ring has been observed to exhibit non-uniform distribution of current over the substrate surface, which results in non-uniform dissolution.
- polishing pad may be composed of insulative materials that may interfere with the application of bias to the substrate surface and result in non-uniform or variable dissolution of material from the substrate surface.
- a polishing article comprises a polishing pad, a first electrode, a second electrode, and a membrane.
- the polishing pad has a polishing surface adapted to contact a substrate surface.
- the first electrode disposes below the polishing surface at a first distance
- the second electrode disposes below the polishing surface at a second distance.
- the second distance is substantially shorter than the first distance.
- the membrane disposes at least partially covering the second electrode.
- the membrane is permeable to ions to allow ionic communication between the second electrode and the substrate.
- a conductive polishing article comprises a polishing pad, plural cathodes, plural anodes, plural ion exchange membranes, and a sub pad.
- the polishing pad has a polishing surface for polishing a substrate and a mounting surface located oppositely, wherein the polishing pad has a plurality of first perforations and second perforations distributed evenly.
- the cathodes are located in the first perforations, and the anodes are located in the second perforations.
- a first distance between a top surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface.
- the ion exchange membranes which are comprised of an ion exchange material, respectively encapsulate the anodes to prevent oxygen gas contacting the substrate.
- the sub pad is located adjacent to the mounting surface of the polishing pad.
- a conductive polishing article for electrochemical mechanical polishing comprises a polishing pad, at least one cathode, plural anodes, plural ion exchange membranes, and a sub pad.
- the polishing pad has a polishing surface adapted to polish a substrate, wherein the polishing pad has plural perforations and plural grooves cut into the polishing pad from the polishing surface.
- the at least one cathode is located in or behind the polishing pad, wherein at least a part of the cathode is exposed to the substrate by the perforations.
- the anodes are located in the grooves.
- a first distance between the exposed surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface.
- the ion exchange membranes respectively encapsulate the anodes to prevent oxygen gas contacting the substrate, the ion exchange membranes being comprised of an ion exchange material.
- the sub pad is located behind the polishing pad to support the polishing pad.
- FIG. 1A is an isometric view of a conductive polishing article according to an embodiment of the invention.
- FIG. 1B is a sectional view along the line I-I′ in FIG. 1A ;
- FIG. 1C is a sectional view showing another arrangement of the anode electrode encapsulated in an ion exchange membrane
- FIG. 1D is a sectional view showing the conductive polishing article in FIGS. 1A and 1B polishing a substrate.
- FIG. 2A is an isometric view of a conductive polishing article according to another embodiment of the invention.
- FIG. 2B is a partial enlarged plan view of the conductive polishing article in FIG. 2A ;
- FIG. 2C is a sectional view along the line II-II′ in FIG. 2B ;
- FIG. 3A is an isometric view of a conductive polishing article according to another embodiment of the invention.
- FIG. 3B is a sectional view along the line III-III′ in FIG. 3A ;
- FIG. 3C is a sectional view along the line III-III′ in FIG. 3A showing another cathode arrangement.
- Embodiments of the present invention are generally directed to a conductive polishing article, which can be used in electrochemical mechanical polishing (ECMP).
- ECMP electrochemical mechanical polishing
- the introduction and details of an ECMP system are disclosed in U.S. Pat. No. 7,066,800, which is incorporated here entirely by reference.
- no conductive element such as an electrode is needed to contact with a wafer during ECMP process.
- the wafer electrically contacts with the conductive polishing article through an electrolyte solution.
- an ion exchange membrane at least partially covering the anodes is used to prevent undesired species, such as oxygen gas generated near the anodes, from contacting a surface of the wafer.
- FIG. 1A is an isometric view of a conductive polishing article according to an embodiment of the invention.
- a conductive polishing article 100 from bottom to top, generally comprises a rigid support 105 , a sub pad 110 , and a polishing pad 115 .
- the polishing pad 115 has a polishing surface 116 thereon and a mounting surface 117 thereunder (please refer to FIG. 1B ).
- a plurality of concentric circular perforations 120 a and 120 b may be formed in the polishing paid 115 .
- the width of the perforations 120 a is about 1-10 mm, and the width of the perforations 120 b is about 3-10 mm.
- the sub pad 110 located on the rigid support 105 is used to support the polishing pad 115 and may have a printed circuit adjacent to the mounting surface 117 of the polishing pad 115 to bias electrodes in the polishing pad 115 .
- the rigid support 105 may couple with an ECMP system.
- An electrolyte supplier 125 is disposed over the conductive polishing article 100 for supplying an electrolyte solution during the ECMP process.
- FIG. 1B A sectional view along line I-I′ in FIG. 1A is shown in FIG. 1B .
- cathodes 130 and anodes 135 are respectively located on the bottoms of the perforations 120 a and 120 b.
- the top surfaces of the cathodes 130 and the anodes 135 are all below the polishing surface 116 of the polishing pad 115 , and the top surfaces of the cathodes 130 are lower than the top surfaces of the anodes 135 .
- the distance between the top surfaces of the cathodes 130 and the polishing surface 116 is about 1 mm to about 5 mm.
- the distance between the top surfaces of the anodes 135 and the polishing surface 116 is about 0.1 mm to about 1 mm. Since the top surface of the anodes 135 is very close to the polishing surface 116 of the polishing pad 115 , the electrical potential of the wafer on the polishing surface 116 is almost the same as the anodes 135 .
- a ratio of the total top surfaces of the cathodes 130 over the total top surfaces of the anodes 135 is about 0.01 to about 100.
- the ratio is about 3 in one embodiment of this invention.
- each anode 135 has an ion exchange membranes 140 a covering thereon.
- the ion exchange membranes 140 a are permeable to ions to allow electrical communication between the anodes 135 and the conductive layer of the wafer through ions in the electrolyte solution disposed on the polishing pad 115 .
- the ion exchange membrane 140 a can further confine the oxygen gas, which is generated on surfaces of the anodes 135 due to higher voltage applied, under the ion exchange membrane 140 a. Therefore, the oxygen gas cannot contact the conductive layer on the wafer to reduce defect formation and stabilize current density between the anodes 135 and the conductive layer on the wafer.
- FIG. 1C Another embodiment of the anodes 135 and the ion exchange membrane 140 b is shown in FIG. 1C .
- the anodes 135 can be encapsulated in the ion exchange membrane 140 b, and the oxygen gas is hence confined in the ion exchange membrane 140 b.
- the ion exchange membrane 140 a and 140 b can be used to retain an anolyte solution 145 having a composition different from the electrolyte solution supplied by the electrolyte supplier 125 .
- an anolyte source 147 FIG. 1B may be connected to the conductive polishing article 100 to circulate the anolyte solution 145 around the anodes 135 .
- the anolyte solution 145 may be recycled during processing.
- the anolyte source 147 may comprise a regenerator (not shown) that removes bubbles generated around the anodes 135 and reimburse consumed species in the anolyte solution 145 .
- the anolyte source 147 may connect to the anodes 135 through inlets 147 a and outlets 147 b located in a space between the ion exchange membrane 140 a, 140 b and the anode 135 , i.e. the space occupied by the anolyte solution 145 .
- the material of the ion exchange membrane 140 a and 140 b comprises an ion exchange material for transporting cations in electrolyte solution through the ion exchange membrane 140 a or 140 b.
- the ion exchange membrane 140 a and 140 b may comprise cation exchange material.
- the ion exchange material can be, for example, a fluorinated polymer matrix having at least an anionic functional group, such as NAFION® membrane manufactured by Dupont Corporation.
- the anionic functional group described above can be, for example, sulfonate, carboxylate, phosphate or a combination thereof.
- FIG. 1D is a sectional view showing the conductive polishing article in FIGS. 1A and 1B polishing a substrate.
- a wafer 150 having a conductive layer 155 thereon is placed on the polishing pad 115 , and the conductive layer 155 faces the polishing surface 116 of the polishing pad 115 .
- the anolyte solution 145 is retained in the ion exchange membrane 140 a.
- a polishing solution 160 which has different electrolyte composition from that of the anolyte solution 145 , is above the cathodes 130 and the ion exchange membranes 140 a.
- the conductive layer 155 may be in contact with the polishing surface 116 during polishing.
- FIG. 2A is an isometric view of a conductive polishing article according to another embodiment of the invention.
- a conductive polishing article 200 from bottom to top, generally comprises a rigid support 205 , a sub pad 210 , and a polishing pad 215 .
- the polishing pad 215 has a polishing surface 216 thereon and a mounting surface 217 thereunder (please refer to FIG. 2C ).
- the sub pad 210 located on the rigid support 205 is used to support the polishing pad 215 and may have a printed circuit adjacent to the mounting surface 217 of the polishing pad 215 to bias electrodes in the polishing pad 215 .
- the rigid support 205 may couple with an ECMP system.
- Some linear perforations 220 and some circle perforations 225 are distributed in the polishing pad 215 .
- the linear perforations 220 constitute a grid pattern, and the circle perforations 225 located on intersects of the linear perforations 220 .
- the width of the linear perforations 220 is about 1-6 mm.
- the diameter of the circle perforations 225 is about 5-15 mm.
- FIG. 2B is a partial enlarged plan view of the conductive polishing article in FIG. 2A .
- cathodes 230 and the anodes 235 are alternatively located in the perforations 225 .
- Electrolyte solutions can flow between the perforations 225 through the linear perforations 220 .
- the shape of the perforations 225 is not limited to circle, the shape of the perforations 225 can be, for example, square or polygon.
- FIG. 2C The sectional view along line II-II′ is shown in FIG. 2C .
- cathodes 230 and anodes 235 are respectively located on the bottoms of the perforations 225 .
- the top surfaces of the cathodes 230 and the anodes 235 are also all below the polishing surface 216 of the polishing pad 215 , and the top surfaces of the cathodes 230 are lower than the top surfaces of the anodes 235 .
- the distance between the top surfaces of the cathodes 230 and the polishing surface 216 is about 1 mm to about 5 mm.
- the distance between the top surfaces of the anodes 235 and the polishing surface 216 is about 0.1 mm to about 1 mm, and the voltage of the wafer on the polishing surface 116 is hence almost the same as the anodes 135 .
- the distance between the top surfaces of the anodes 235 and the polishing surface 216 approximate the thickness of the ion exchange membrane 240 a.
- a ratio of the total top surfaces of the cathodes 230 over the total top surfaces of the anodes 235 is also about 0.01 to about 100.
- ion exchange membrane 240 a located above each of the anode 235 and below the polishing surface 216 .
- the anodes 235 can also be encapsulated in the ion exchange membrane, as depicted in FIG. 1C .
- the material and the function of the ion exchange membrane 240 a has been discussed in Embodiment 1 and hence omitted here.
- an anolyte source 247 may be connected to the conductive polishing article 200 and circulate an anolyte solution 245 around the anodes 235 .
- the anolyte source 247 may comprise a regenerator (not shown) that removes bubbles generated around the anodes 235 and reimburse consumed species in the anolyte solution 245 .
- the anolyte source 247 may circylate the anolyte solution 245 through inlets 247 a and outlets 247 b located in a space between the ion exchange membrane 240 a and the anode 235 , i.e. the space occupied by the anolyte solution 245 .
- FIG. 3A is an isometric view of a conductive polishing article according to another embodiment of the invention.
- a conductive polishing article 300 from bottom to top, generally comprises a rigid support 305 , a sub pad 310 , and a polishing pad 315 .
- the polishing pad 315 has a polishing surface 316 thereon and a mounting surface 317 thereunder (please refer to FIG. 3B ).
- Some linear grooves 320 and perforations 325 are distributed in the polishing pad 315 .
- the linear grooves 320 are distributed radially, and the perforations 325 are distributed evenly between the linear grooves 320 .
- the width of the linear grooves 320 is about 2 mm to about 8 mm.
- the diameter of the perforations 325 is about 4 mm to about 14 mm.
- the sub pad 310 located on the rigid support 305 is used to support the polishing pad 315 and may have a printed circuit adjacent to the mounting surface 317 of the polishing pad 315 to bias electrodes in the polishing pad 315 .
- the rigid support 305 may couple with an ECMP system.
- FIG. 3B A sectional view along line III-III′ in FIG. 3A is shown in FIG. 3B .
- cathodes 330 a and anodes 335 are respectively located on the bottoms of the perforations 325 and the linear grooves 320 .
- the top surfaces of the cathodes 330 a and the anodes 335 are also all below the polishing surface 316 of the polishing pad 315 , and the top surfaces of the cathodes 330 a are lower than the top surfaces of the anodes 335 .
- the distance between the top surfaces of the cathodes 330 a and the polishing surface 316 is about 1 mm to about 5 mm.
- the distance between the top surfaces of the anodes 335 and the polishing surface 316 is about 0.1 mm to about 1 mm, and the voltage of the wafer on the polishing surface 116 is hence almost the same as the anodes 135 .
- a ratio of the total top surfaces of the cathodes 330 a over the total top surfaces of the anodes 335 is also about 0.01 to about 100.
- An ion exchange membrane 340 encapsulates each of the anodes 335 . The material and the function of the ion exchange membrane 340 has been discussed in Embodiment 1 and hence omitted here.
- an anolyte source 347 may be connected to the conductive polishing article 300 and circulate an anolyte solution 345 around the anodes 335 .
- the anolyte source 347 may comprise a regenerator (not shown) that removes bubbles generated around the anodes 335 and reimburse consumed species in the anolyte solution 345 .
- the anolyte source 347 may circulate the anolyte solution 345 through inlets 347 a and outlets 347 b located in a space between the ion exchange membrane 340 and the anode 335 , i.e. the space occupied by the anolyte solution 345 .
- FIG. 3C is a sectional view along the line III-III′ in FIG. 3A showing another cathode arrangement.
- the cathode 330 b is located under the polishing pad 315 instead of on the bottom of the perforations 325 as shown in FIG. 3B .
- a ratio of the total exposed surfaces of the cathodes 330 b over the total top surfaces of the anodes 335 is also about 0.01 to about 100.
- the present invention has the advantages of no conductive electrode is contact with a wafer on the polishing pad, since top surfaces of both cathodes and anodes are below the polishing surface of the polishing pad. Hence, no scratch defects caused by the contact of conductive electrodes are generated. At least, polishing defects can thus be minimized. Moreover, an ion exchange membrane covers each of the anodes to prevent oxygen gas contact the wafer, the polishing defects can be further reduced.
Abstract
A conductive polishing article is provided. The conductive polishing article at least has a polishing pad, cathodes and anodes. Cathodes and anodes are disposed below the polishing surface of the polishing pad, and an ion exchange membrane at least partially covers the anodes.
Description
- Sub-quarter micron multi-level metallization is one of the key technologies for the next generation of ultra large-scale integration (ULSI). The multilevel interconnects that lie at the heart of this technology require planarization of interconnect features formed in high aspect ratio apertures, including contacts, vias, lines and other features. Reliable formation of these interconnect features is very important to the success of ULSI and to the continued effort to increase circuit density and quality on individual substrates and die.
- As layers of materials are sequentially deposited and removed, the uppermost surface of the substrate may become non-planar across its surface and require planarization. Planarizing a surface, or “polishing” a surface, is a process where material is removed from the surface of the substrate to form a generally even, planar surface. Planarization is useful in removing undesired surface topography and surface defects, such as rough surfaces, agglomerated materials, crystal lattice damage, scratches, and contaminated layers or materials. Planarization is also useful in forming features on a substrate by removing excess deposited material used to fill the features and to provide an even surface for subsequent levels of metallization and processing.
- One material increasingly utilized in integrated circuit fabrication is copper due to its desirable electrical properties. However, for planarizing copper, conventional chemical mechanical polishing (CMP) encountered some problems such as that the interface between the conductive material and the barrier layer is generally non-planar and residual copper material is retained in irregularities formed by the non-planar interface. Further, the conductive material and the barrier materials are often removed from the substrate surface at different rates, both of which can result in excess conductive material being retained as residues on the substrate surface. Additionally, the substrate surface may have different surface topography, depending on the density or size of features formed therein. Copper material is removed at different removal rates along the different surface topography of the substrate surface, which makes effective removal of copper material from the substrate surface and final planarity of the substrate surface difficult to achieve.
- One solution for polishing copper in low dielectric materials with reduced or minimal defects formed thereon is polishing copper by electrochemical mechanical polishing (ECMP) techniques. ECMP techniques remove the conductive material from a substrate surface by electrochemical dissolution while concurrently polishing the substrate with reduced mechanical abrasion compared to conventional CMP processes. The electrochemical dissolution is performed by applying a bias between a cathode and substrate surface to remove conductive materials from a substrate surface into a surrounding electrolyte. In one embodiment of an ECMP system, the bias is applied by a ring of conductive contacts in electrical communication with the substrate surface. However, the contact ring has been observed to exhibit non-uniform distribution of current over the substrate surface, which results in non-uniform dissolution. Mechanical abrasion is performed by positioning the substrate in contact with conventional polishing pads and providing relative motion therebetween. However, conventional polishing pads often limit electrolyte flow to the surface of the substrate. Additionally, the polishing pad may be composed of insulative materials that may interfere with the application of bias to the substrate surface and result in non-uniform or variable dissolution of material from the substrate surface.
- Therefore, there is a need for an improved polishing article for the removal of conductive material on a substrate surface.
- According to one embodiment of the present invention, a polishing article is provided. The polishing article comprises a polishing pad, a first electrode, a second electrode, and a membrane. The polishing pad has a polishing surface adapted to contact a substrate surface. The first electrode disposes below the polishing surface at a first distance, and the second electrode disposes below the polishing surface at a second distance. The second distance is substantially shorter than the first distance. The membrane disposes at least partially covering the second electrode. The membrane is permeable to ions to allow ionic communication between the second electrode and the substrate.
- According to another embodiment of this invention, a conductive polishing article is provided. The conductive polishing article comprises a polishing pad, plural cathodes, plural anodes, plural ion exchange membranes, and a sub pad. The polishing pad has a polishing surface for polishing a substrate and a mounting surface located oppositely, wherein the polishing pad has a plurality of first perforations and second perforations distributed evenly. The cathodes are located in the first perforations, and the anodes are located in the second perforations. A first distance between a top surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface. The ion exchange membranes, which are comprised of an ion exchange material, respectively encapsulate the anodes to prevent oxygen gas contacting the substrate. The sub pad is located adjacent to the mounting surface of the polishing pad.
- According to another embodiment of this invention, a conductive polishing article for electrochemical mechanical polishing is provided. The conductive polishing article comprises a polishing pad, at least one cathode, plural anodes, plural ion exchange membranes, and a sub pad. The polishing pad has a polishing surface adapted to polish a substrate, wherein the polishing pad has plural perforations and plural grooves cut into the polishing pad from the polishing surface. The at least one cathode is located in or behind the polishing pad, wherein at least a part of the cathode is exposed to the substrate by the perforations. The anodes are located in the grooves. A first distance between the exposed surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface. The ion exchange membranes respectively encapsulate the anodes to prevent oxygen gas contacting the substrate, the ion exchange membranes being comprised of an ion exchange material. The sub pad is located behind the polishing pad to support the polishing pad.
- So that the manner in which the above recited features of the present invention can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
-
FIG. 1A is an isometric view of a conductive polishing article according to an embodiment of the invention; -
FIG. 1B is a sectional view along the line I-I′ inFIG. 1A ; -
FIG. 1C is a sectional view showing another arrangement of the anode electrode encapsulated in an ion exchange membrane; -
FIG. 1D is a sectional view showing the conductive polishing article inFIGS. 1A and 1B polishing a substrate. -
FIG. 2A is an isometric view of a conductive polishing article according to another embodiment of the invention; -
FIG. 2B is a partial enlarged plan view of the conductive polishing article inFIG. 2A ; -
FIG. 2C is a sectional view along the line II-II′ inFIG. 2B ; -
FIG. 3A is an isometric view of a conductive polishing article according to another embodiment of the invention; -
FIG. 3B is a sectional view along the line III-III′ inFIG. 3A ; and -
FIG. 3C is a sectional view along the line III-III′ inFIG. 3A showing another cathode arrangement. - Embodiments of the present invention are generally directed to a conductive polishing article, which can be used in electrochemical mechanical polishing (ECMP). The introduction and details of an ECMP system are disclosed in U.S. Pat. No. 7,066,800, which is incorporated here entirely by reference. In embodiments of this invention, no conductive element such as an electrode is needed to contact with a wafer during ECMP process. The wafer electrically contacts with the conductive polishing article through an electrolyte solution. Further, an ion exchange membrane at least partially covering the anodes is used to prevent undesired species, such as oxygen gas generated near the anodes, from contacting a surface of the wafer.
-
FIG. 1A is an isometric view of a conductive polishing article according to an embodiment of the invention. InFIG. 1A , aconductive polishing article 100, from bottom to top, generally comprises arigid support 105, asub pad 110, and apolishing pad 115. Thepolishing pad 115 has a polishingsurface 116 thereon and a mountingsurface 117 thereunder (please refer toFIG. 1B ). A plurality of concentriccircular perforations perforations 120 a is about 1-10 mm, and the width of theperforations 120 b is about 3-10 mm. Thesub pad 110 located on therigid support 105 is used to support thepolishing pad 115 and may have a printed circuit adjacent to the mountingsurface 117 of thepolishing pad 115 to bias electrodes in thepolishing pad 115. Therigid support 105 may couple with an ECMP system. Anelectrolyte supplier 125 is disposed over theconductive polishing article 100 for supplying an electrolyte solution during the ECMP process. - A sectional view along line I-I′ in
FIG. 1A is shown inFIG. 1B . InFIG. 1B ,cathodes 130 andanodes 135 are respectively located on the bottoms of theperforations cathodes 130 and theanodes 135 are all below the polishingsurface 116 of thepolishing pad 115, and the top surfaces of thecathodes 130 are lower than the top surfaces of theanodes 135. The distance between the top surfaces of thecathodes 130 and the polishingsurface 116 is about 1 mm to about 5 mm. The distance between the top surfaces of theanodes 135 and the polishingsurface 116 is about 0.1 mm to about 1 mm. Since the top surface of theanodes 135 is very close to the polishingsurface 116 of thepolishing pad 115, the electrical potential of the wafer on the polishingsurface 116 is almost the same as theanodes 135. - A ratio of the total top surfaces of the
cathodes 130 over the total top surfaces of theanodes 135 is about 0.01 to about 100. For example, the ratio is about 3 in one embodiment of this invention. - In
FIG. 1B , eachanode 135 has anion exchange membranes 140 a covering thereon. Theion exchange membranes 140 a are permeable to ions to allow electrical communication between theanodes 135 and the conductive layer of the wafer through ions in the electrolyte solution disposed on thepolishing pad 115. Theion exchange membrane 140 a can further confine the oxygen gas, which is generated on surfaces of theanodes 135 due to higher voltage applied, under theion exchange membrane 140 a. Therefore, the oxygen gas cannot contact the conductive layer on the wafer to reduce defect formation and stabilize current density between theanodes 135 and the conductive layer on the wafer. Another embodiment of theanodes 135 and theion exchange membrane 140 b is shown inFIG. 1C . InFIG. 1C , theanodes 135 can be encapsulated in theion exchange membrane 140 b, and the oxygen gas is hence confined in theion exchange membrane 140 b. - For some other purposes, such as anode activation, catalyst isolation, and particle reduction, the
ion exchange membrane anolyte solution 145 having a composition different from the electrolyte solution supplied by theelectrolyte supplier 125. In one embodiment, an anolyte source 147 (FIG. 1B ) may be connected to theconductive polishing article 100 to circulate theanolyte solution 145 around theanodes 135. In one embodiment, theanolyte solution 145 may be recycled during processing. Theanolyte source 147 may comprise a regenerator (not shown) that removes bubbles generated around theanodes 135 and reimburse consumed species in theanolyte solution 145. Theanolyte source 147 may connect to theanodes 135 throughinlets 147 a andoutlets 147 b located in a space between theion exchange membrane anode 135, i.e. the space occupied by theanolyte solution 145. - The material of the
ion exchange membrane ion exchange membrane ion exchange membrane anodes 135 and the wafer can be maintained. The ion exchange material can be, for example, a fluorinated polymer matrix having at least an anionic functional group, such as NAFION® membrane manufactured by Dupont Corporation. The anionic functional group described above can be, for example, sulfonate, carboxylate, phosphate or a combination thereof. -
FIG. 1D is a sectional view showing the conductive polishing article inFIGS. 1A and 1B polishing a substrate. InFIG. 1D , during an ECMP process, awafer 150 having aconductive layer 155 thereon is placed on thepolishing pad 115, and theconductive layer 155 faces the polishingsurface 116 of thepolishing pad 115. Theanolyte solution 145 is retained in theion exchange membrane 140 a. Apolishing solution 160, which has different electrolyte composition from that of theanolyte solution 145, is above thecathodes 130 and theion exchange membranes 140 a. In one embodiment, theconductive layer 155 may be in contact with the polishingsurface 116 during polishing. -
FIG. 2A is an isometric view of a conductive polishing article according to another embodiment of the invention. InFIG. 2A , aconductive polishing article 200, from bottom to top, generally comprises arigid support 205, asub pad 210, and apolishing pad 215. Thepolishing pad 215 has a polishingsurface 216 thereon and a mountingsurface 217 thereunder (please refer toFIG. 2C ). Thesub pad 210 located on therigid support 205 is used to support thepolishing pad 215 and may have a printed circuit adjacent to the mountingsurface 217 of thepolishing pad 215 to bias electrodes in thepolishing pad 215. Therigid support 205 may couple with an ECMP system. - Some
linear perforations 220 and somecircle perforations 225 are distributed in thepolishing pad 215. Thelinear perforations 220 constitute a grid pattern, and thecircle perforations 225 located on intersects of thelinear perforations 220. The width of thelinear perforations 220 is about 1-6 mm. The diameter of thecircle perforations 225 is about 5-15 mm. -
FIG. 2B is a partial enlarged plan view of the conductive polishing article inFIG. 2A . InFIG. 2B ,cathodes 230 and theanodes 235 are alternatively located in theperforations 225. Electrolyte solutions can flow between theperforations 225 through thelinear perforations 220. The shape of theperforations 225 is not limited to circle, the shape of theperforations 225 can be, for example, square or polygon. - The sectional view along line II-II′ is shown in
FIG. 2C . InFIG. 2C , similar toEmbodiment 1,cathodes 230 andanodes 235 are respectively located on the bottoms of theperforations 225. The top surfaces of thecathodes 230 and theanodes 235 are also all below the polishingsurface 216 of thepolishing pad 215, and the top surfaces of thecathodes 230 are lower than the top surfaces of theanodes 235. The distance between the top surfaces of thecathodes 230 and the polishingsurface 216 is about 1 mm to about 5 mm. The distance between the top surfaces of theanodes 235 and the polishingsurface 216 is about 0.1 mm to about 1 mm, and the voltage of the wafer on the polishingsurface 116 is hence almost the same as theanodes 135. In one embodiment, the distance between the top surfaces of theanodes 235 and the polishingsurface 216 approximate the thickness of theion exchange membrane 240 a. Similarly, a ratio of the total top surfaces of thecathodes 230 over the total top surfaces of theanodes 235 is also about 0.01 to about 100. - There is an
ion exchange membrane 240 a located above each of theanode 235 and below the polishingsurface 216. Theanodes 235 can also be encapsulated in the ion exchange membrane, as depicted inFIG. 1C . The material and the function of theion exchange membrane 240 a has been discussed inEmbodiment 1 and hence omitted here. - In one embodiment, an anolyte source 247 (
FIG. 1C ) may be connected to theconductive polishing article 200 and circulate ananolyte solution 245 around theanodes 235. Theanolyte source 247 may comprise a regenerator (not shown) that removes bubbles generated around theanodes 235 and reimburse consumed species in theanolyte solution 245. Theanolyte source 247 may circylate theanolyte solution 245 throughinlets 247 a andoutlets 247 b located in a space between theion exchange membrane 240 a and theanode 235, i.e. the space occupied by theanolyte solution 245. -
FIG. 3A is an isometric view of a conductive polishing article according to another embodiment of the invention. InFIG. 3A , aconductive polishing article 300, from bottom to top, generally comprises arigid support 305, asub pad 310, and apolishing pad 315. Thepolishing pad 315 has a polishingsurface 316 thereon and a mountingsurface 317 thereunder (please refer toFIG. 3B ). Somelinear grooves 320 andperforations 325 are distributed in thepolishing pad 315. Thelinear grooves 320 are distributed radially, and theperforations 325 are distributed evenly between thelinear grooves 320. The width of thelinear grooves 320 is about 2 mm to about 8 mm. The diameter of theperforations 325 is about 4 mm to about 14 mm. - The
sub pad 310 located on therigid support 305 is used to support thepolishing pad 315 and may have a printed circuit adjacent to the mountingsurface 317 of thepolishing pad 315 to bias electrodes in thepolishing pad 315. Therigid support 305 may couple with an ECMP system. - A sectional view along line III-III′ in
FIG. 3A is shown inFIG. 3B . InFIG. 3B ,cathodes 330 a andanodes 335 are respectively located on the bottoms of theperforations 325 and thelinear grooves 320. Similar toEmbodiment 1, the top surfaces of thecathodes 330 a and theanodes 335 are also all below the polishingsurface 316 of thepolishing pad 315, and the top surfaces of thecathodes 330 a are lower than the top surfaces of theanodes 335. The distance between the top surfaces of thecathodes 330 a and the polishingsurface 316 is about 1 mm to about 5 mm. The distance between the top surfaces of theanodes 335 and the polishingsurface 316 is about 0.1 mm to about 1 mm, and the voltage of the wafer on the polishingsurface 116 is hence almost the same as theanodes 135. Similarly, a ratio of the total top surfaces of thecathodes 330 a over the total top surfaces of theanodes 335 is also about 0.01 to about 100. Anion exchange membrane 340 encapsulates each of theanodes 335. The material and the function of theion exchange membrane 340 has been discussed inEmbodiment 1 and hence omitted here. - In one embodiment, an
anolyte source 347 may be connected to theconductive polishing article 300 and circulate ananolyte solution 345 around theanodes 335. Theanolyte source 347 may comprise a regenerator (not shown) that removes bubbles generated around theanodes 335 and reimburse consumed species in theanolyte solution 345. Theanolyte source 347 may circulate theanolyte solution 345 throughinlets 347 a andoutlets 347 b located in a space between theion exchange membrane 340 and theanode 335, i.e. the space occupied by theanolyte solution 345. -
FIG. 3C is a sectional view along the line III-III′ inFIG. 3A showing another cathode arrangement. InFIG. 3C , thecathode 330 b is located under thepolishing pad 315 instead of on the bottom of theperforations 325 as shown inFIG. 3B . In this case, a ratio of the total exposed surfaces of thecathodes 330 b over the total top surfaces of theanodes 335 is also about 0.01 to about 100. - According to the forgoing embodiments, the present invention has the advantages of no conductive electrode is contact with a wafer on the polishing pad, since top surfaces of both cathodes and anodes are below the polishing surface of the polishing pad. Hence, no scratch defects caused by the contact of conductive electrodes are generated. At least, polishing defects can thus be minimized. Moreover, an ion exchange membrane covers each of the anodes to prevent oxygen gas contact the wafer, the polishing defects can be further reduced.
- While the foregoing is directed to embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
Claims (20)
1. A polishing article comprising:
a polishing pad having a polishing surface adapted to contact a substrate surface;
a first electrode disposed below the polishing surface at a first distance;
a second electrode disposed below the polishing surface at a second distance, wherein the second distance is substantially shorter than the first distance; and
an ion exchange membrane disposed at least partially covering the second electrode, wherein the membrane is permeable to ions and allows ionic communication between the second electrode and the substrate surface.
2. The polishing article of claim 1 , wherein the ion exchange membrane is comprised of an ion exchange material.
3. The conductive polishing article of claim 1 , wherein the membrane is configured to retain an electrolyte solution therein.
4. The conductive polishing article of claim 1 , wherein the first distance is about 1 to 5 millimeters.
5. The conductive polishing article of claim 1 , wherein the second distance is about 0.1 to 1 millimeters.
6. The conductive polishing article of claim 1 , wherein a ratio of the total exposed surfaces of the first electrode over the total exposed surfaces of the second electrode is about 0.01 to about 100.
7. The conductive polishing article of claim 1 , wherein a ratio of the total exposed surfaces of the first electrode over the total exposed surfaces of the second electrode is about 3.
8. A conductive polishing article for electrochemical mechanical polishing, comprising:
a polishing pad having a polishing surface for polishing a substrate and a mounting surface located oppositely, wherein the polishing pad has a plurality of first perforations and second perforations distributed evenly;
a plurality of cathodes located in the plurality of first perforations;
a plurality of anodes located in the second perforations, wherein a first distance between a top surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface;
a plurality of ion exchange membranes respectively encapsulating the anodes to prevent oxygen gas contacting the substrate, the ion exchange membranes being comprised of an ion exchange material; and
a sub pad located adjacent to the mounting surface of the polishing pad.
9. The conductive polishing article of claim 8 , wherein the ion exchange material is based on a fluorinated polymer matrix having at least an anionic functional group.
10. The conductive polishing article of claim 8 , wherein the ion exchange membrane is configured to retain an electrolyte solution therein.
11. The conductive polishing article of claim 8 , wherein the first distance is about 1 mm to about 5 mm.
12. The conductive polishing article of claim 8 , wherein the second distance is about 0.1 mm to about 1 mm.
13. The conductive polishing article of claim 8 , wherein a ratio of the total top surfaces of the cathodes over the total top surfaces of the anodes is from about 0.01 to about 100.
14. The conductive polishing article of claim 8 wherein a ratio of the total top surfaces of the cathodes over the total top surfaces of the anodes is about 3.
15. A conductive polishing article for electrochemical mechanical polishing, comprising:
a polishing pad having a polishing surface adapted to polish a substrate, wherein the polishing pad has plural perforations and plural grooves cut into the polishing pad from the polishing surface;
at least one cathode located in or behind the polishing pad, wherein at least a part of the cathode is exposed to the substrate by the perforations;
a plurality of anodes located in the grooves, wherein a first distance between the exposed surface of the cathodes and the polishing surface is greater than a second distance between the top surface of the anodes and the polishing surface;
a plurality of ion exchange membranes respectively encapsulating the anodes to prevent oxygen gas contacting the substrate, the ion exchange membranes being comprised of an ion exchange material; and
a sub pad located behind the polishing pad to support the polishing pad.
16. The conductive polishing article of claim 15 wherein the ion exchange material is based on a fluorinated polymer matrix having at least an anionic functional group.
17. The conductive polishing article of claim 15 wherein the ion exchange membrane is configured to retain an electrolyte solution therein.
18. The conductive polishing article of claim 15 wherein the first distance is about 1 to 2 millimeters.
19. The conductive polishing article of claim 15 wherein the second distance is about 0.1 to 0.5 millimeters.
20. The conductive polishing article of claim 15 , wherein a ratio of the total exposed surfaces of the cathode over the total top surfaces of the anodes is about 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/863,878 US20090088050A1 (en) | 2007-09-28 | 2007-09-28 | Conductive polishing article for electrochemical mechanical polishing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/863,878 US20090088050A1 (en) | 2007-09-28 | 2007-09-28 | Conductive polishing article for electrochemical mechanical polishing |
Publications (1)
Publication Number | Publication Date |
---|---|
US20090088050A1 true US20090088050A1 (en) | 2009-04-02 |
Family
ID=40508901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/863,878 Abandoned US20090088050A1 (en) | 2007-09-28 | 2007-09-28 | Conductive polishing article for electrochemical mechanical polishing |
Country Status (1)
Country | Link |
---|---|
US (1) | US20090088050A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120062248A1 (en) * | 2010-09-15 | 2012-03-15 | Samsung Electronics Co., Ltd. | Touch sensing apparatus and method for detecting approach |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6893328B2 (en) * | 2003-04-23 | 2005-05-17 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Conductive polishing pad with anode and cathode |
US6979248B2 (en) * | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7066800B2 (en) * | 2000-02-17 | 2006-06-27 | Applied Materials Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7077721B2 (en) * | 2000-02-17 | 2006-07-18 | Applied Materials, Inc. | Pad assembly for electrochemical mechanical processing |
US20060243598A1 (en) * | 2005-02-25 | 2006-11-02 | Saravjeet Singh | Auxiliary electrode encased in cation exchange membrane tube for electroplating cell |
US7137868B2 (en) * | 2000-02-17 | 2006-11-21 | Applied Materials, Inc. | Pad assembly for electrochemical mechanical processing |
US7186164B2 (en) * | 2003-12-03 | 2007-03-06 | Applied Materials, Inc. | Processing pad assembly with zone control |
US7189141B2 (en) * | 1999-09-14 | 2007-03-13 | Applied Materials, Inc. | Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
-
2007
- 2007-09-28 US US11/863,878 patent/US20090088050A1/en not_active Abandoned
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7189141B2 (en) * | 1999-09-14 | 2007-03-13 | Applied Materials, Inc. | Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
US7066800B2 (en) * | 2000-02-17 | 2006-06-27 | Applied Materials Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7077721B2 (en) * | 2000-02-17 | 2006-07-18 | Applied Materials, Inc. | Pad assembly for electrochemical mechanical processing |
US7137868B2 (en) * | 2000-02-17 | 2006-11-21 | Applied Materials, Inc. | Pad assembly for electrochemical mechanical processing |
US6979248B2 (en) * | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US6893328B2 (en) * | 2003-04-23 | 2005-05-17 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Conductive polishing pad with anode and cathode |
US7186164B2 (en) * | 2003-12-03 | 2007-03-06 | Applied Materials, Inc. | Processing pad assembly with zone control |
US20060243598A1 (en) * | 2005-02-25 | 2006-11-02 | Saravjeet Singh | Auxiliary electrode encased in cation exchange membrane tube for electroplating cell |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120062248A1 (en) * | 2010-09-15 | 2012-03-15 | Samsung Electronics Co., Ltd. | Touch sensing apparatus and method for detecting approach |
US8680877B2 (en) * | 2010-09-15 | 2014-03-25 | Samsung Electronics Co., Ltd. | Touch sensing apparatus and method for detecting approach |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6402925B2 (en) | Method and apparatus for electrochemical mechanical deposition | |
US6776693B2 (en) | Method and apparatus for face-up substrate polishing | |
US6902659B2 (en) | Method and apparatus for electro-chemical mechanical deposition | |
US6572755B2 (en) | Method and apparatus for electrochemically depositing a material onto a workpiece surface | |
US7059948B2 (en) | Articles for polishing semiconductor substrates | |
US6299741B1 (en) | Advanced electrolytic polish (AEP) assisted metal wafer planarization method and apparatus | |
US20100000877A1 (en) | Method for electrochemical mechanical polishing | |
EP1520281A2 (en) | Low-force electrochemical mechanical processing method and apparatus | |
CN101352844A (en) | Pad and method for chemical mechanical polishing | |
JP2004531885A (en) | Conductive abrasive articles for electrochemical mechanical polishing | |
CN100419963C (en) | Forming a semiconductor structure using a combination of planarizing methods and electropolishing | |
US20020115283A1 (en) | Planarization by selective electro-dissolution | |
TW201321129A (en) | Electric field-assisted chemical mechanical polishing system and method thereof | |
US6613200B2 (en) | Electro-chemical plating with reduced thickness and integration with chemical mechanical polisher into a single platform | |
US7323095B2 (en) | Integrated multi-step gap fill and all feature planarization for conductive materials | |
CN102371532A (en) | Reworking method for chemical mechanical lapping process | |
US20090088050A1 (en) | Conductive polishing article for electrochemical mechanical polishing | |
US20100163426A1 (en) | Electrochemical planarization system comprising enhanced electrolyte flow | |
US20030168345A1 (en) | In-situ monitor seed for copper plating | |
KR20050009990A (en) | Polishing method, polishing device, and method of manufacturing semiconductor equipment | |
KR100900225B1 (en) | Method for forming copper interconnection layer of semiconductor deviec using damnscene process | |
US6211060B1 (en) | Method for planarizing a damascene structure | |
US7468322B1 (en) | Methods of multi-step electrochemical mechanical planarization of Cu | |
JP2003193300A (en) | Method of manufacturing semiconductor device, electrolytic etching apparatus and apparatus for manufactured semiconductor | |
US20070151860A1 (en) | Method for forming a copper metal interconnection of a semiconductor device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: APPLIED MATERIALS, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HSU, WEI-YUNG;DUBOUST, ALAIN;CHEN, LIANG-YUH;AND OTHERS;REEL/FRAME:019895/0839;SIGNING DATES FROM 20070926 TO 20070927 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |