US20070214727A1 - Coated Abrasives - Google Patents
Coated Abrasives Download PDFInfo
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- US20070214727A1 US20070214727A1 US10/586,307 US58630705A US2007214727A1 US 20070214727 A1 US20070214727 A1 US 20070214727A1 US 58630705 A US58630705 A US 58630705A US 2007214727 A1 US2007214727 A1 US 2007214727A1
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- US
- United States
- Prior art keywords
- hard abrasive
- metals
- super
- metal
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000003082 abrasive agent Substances 0.000 title claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 50
- 239000002184 metal Substances 0.000 claims abstract description 50
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 41
- 239000010432 diamond Substances 0.000 claims abstract description 41
- 239000010936 titanium Substances 0.000 claims abstract description 36
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 29
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 25
- 150000002739 metals Chemical class 0.000 claims abstract description 22
- 239000010949 copper Substances 0.000 claims abstract description 14
- 229910001092 metal group alloy Inorganic materials 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 239000000956 alloy Substances 0.000 claims abstract description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000010937 tungsten Substances 0.000 claims abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 7
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 7
- 150000003624 transition metals Chemical class 0.000 claims abstract description 7
- 230000000737 periodic effect Effects 0.000 claims abstract description 6
- 238000000576 coating method Methods 0.000 claims description 55
- 239000011248 coating agent Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 15
- 238000005240 physical vapour deposition Methods 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 7
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- -1 platinum group metals Chemical class 0.000 claims description 3
- 229910003470 tongbaite Inorganic materials 0.000 claims description 3
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims description 2
- 150000001247 metal acetylides Chemical class 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 abstract description 4
- 239000011651 chromium Substances 0.000 abstract description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- 229910052796 boron Inorganic materials 0.000 abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 abstract description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract description 2
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 2
- 239000011733 molybdenum Substances 0.000 abstract description 2
- 239000002245 particle Substances 0.000 description 32
- 239000010410 layer Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 15
- 238000005229 chemical vapour deposition Methods 0.000 description 14
- 230000008569 process Effects 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 6
- 238000003556 assay Methods 0.000 description 6
- 229910001507 metal halide Inorganic materials 0.000 description 6
- 150000005309 metal halides Chemical class 0.000 description 6
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000399 optical microscopy Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 238000004876 x-ray fluorescence Methods 0.000 description 2
- GJNGXPDXRVXSEH-UHFFFAOYSA-N 4-chlorobenzonitrile Chemical compound ClC1=CC=C(C#N)C=C1 GJNGXPDXRVXSEH-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- IUYOGGFTLHZHEG-UHFFFAOYSA-N copper titanium Chemical compound [Ti].[Cu] IUYOGGFTLHZHEG-UHFFFAOYSA-N 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011156 metal matrix composite Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4584—Coating or impregnating of particulate or fibrous ceramic material
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Composite Materials (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
A coated super-hard abrasive comprises a core of super-hard abrasive material, typically diamond or cBN based, an inner layer of a metal carbide, nitride, boride, carbonitride or boronitride chemically bonded to an outer surface of the super-hard abrasive material and an outer layer of a metal, metal alloy or a combination of metals or metal alloys deposited on the inner layer. Examples of metals or metal alloys that can be applied as an outer layer include metals from group IVa, Va or Vla transition metals, including tungsten, titanium, chromium, molybdenum, and zirconium, and metals from the first row transition metals (Ti to Cu), particularly the non magnetic metals or alloys of these that are amenable to magnetron sputtering, and elements from groups IIIb and IVb of the periodic table, such as B, Al, Si.
Description
- This invention relates to coated abrasives, a process for their production, and to coated abrasives for use in abrasive-containing tools.
- Abrasive particles such as diamond and cubic boron nitride are commonly used in cutting, grinding, drilling, sawing and polishing applications. In such applications, abrasive particles are mixed with metal powder mixes, then sintered at high temperatures to form bonded cutting elements. Typical bond matrices contain iron, cobalt, copper, nickel and/or alloys thereof.
- Common problems in applications are retention of particles in the bond matrix, and resistance against oxidative attack during the sintering process and the subsequent application.
- These problems are commonly addressed by coating the abrasive particles with metals or alloys which bond chemically to the particle, and alloy to the bond matrix. Typically, chemical vapour deposition (CVD) or physical vapour deposition (PVD sputter coating) techniques are used. Titanium carbide is an example of a material that has been proposed as a coating for abrasive particles, because of its good adhesion to diamond. Chromium carbide is a similar coating material that can be used.
- A problem with the use of titanium carbide coatings is that in order for the coating to protect the diamond particles, it has to form a barrier between the bond matrix and the particles. In other words, it should be impermeable and dense, so that components of the bond matrix are unable to pass through and make contact with the particle surface. One way the components could pass through the coating is by solid-state diffusion through the coating. Alternatively, if the coating is incomplete, cracked or porous, components may pass through the coating to reach the particle surface. A coating may initially be dense and impermeable, but during the sintering process, a phase change may occur due to alloying with the bond matrix, for example, which results in the formation of a less dense alloy, or perhaps a porous coating, which allows passage of the bond matrix components through the coating to the particle surface. Titanium carbide coatings often do not form good barriers, particularly in aggressive sintering conditions.
- A coated super-hard abrasive comprising a core of super-hard abrasive material, an inner layer of a metal carbide, nitride, boride, carbonitride or boronitride chemically bonded to an outer surface of the super-hard abrasive material and an outer layer of a metal, metal alloy or a combination of metals or metal alloys deposited on the inner layer.
- Examples of metals or metal alloys that can be applied as an outer layer include metals from group IVa, Va or Vla transition metals, including tungsten, titanium, chromium, molybdenum, and zirconium, and metals from the first row transition metals (Ti to Cu), particularly the non magnetic metals or alloys of these that are amenable to magnetron sputtering, and elements from groups IIIb and IVb of the periodic table, such as B, Al, Si. Alloys might include the metals mentioned above with metals selected from the platinum group metals and metals from group Ib. Examples are aluminium-, copper- or nickel-titanium. An example of a non magnetic alloy from the first row transition metals is nickel—20 weight % chromium.
- The outer layer is preferably applied by physical vapour deposition, in particular by PVD sputter coating.
- The super-hard abrasive material may be diamond or cBN based, and may include diamond or cBN grit, PCD substrates, PcBN substrates, thermally stable PCD (TSPCD) substrates, CVD diamond film, single crystal diamond substrates.
- The inner layer is formed from an element capable of forming (singly or in combination) carbides, nitrides or borides to the surface(s) of the abrasive material when applied as an inner layer using a hot coating process. Typically these elements come from groups IVa, Va, Vla, IIIb and IVb of the periodic table and include examples such as Ti, Cr, Zr, Mo, Ta, W, Al, B and Si. The inner layer is preferably a titanium or chromium carbide coating in the case of a diamond abrasive core, or a titanium or chromium nitride, boride or boronitride coating in the case of a cBN abrasive core.
- The properties of the metal layer may be tailored for better compatibility with the inner layer or for better bonding with metal bond matrices.
- Whilst the invention extends to various forms of coated abrasive material, it will in the most part be described with reference to the coating of diamond grit for convenience.
- Ti in the form of titanium carbide or titanium nitrides, borides and boronitrides have been shown to be useful coating materials for diamond and cBN substrates, respectively. They are particularly useful because of their ability to bind chemically to the substrate and to protect the substrate.
- However, as has been mentioned previously, they are not suitable in some applications, particularly where they are sintered in aggressive sintering conditions. They are also prone to problems with bonding properly with the bond matrix.
- It has been found that the advantages of titanium coatings can be extended to other applications where an outer metal coating is applied over the titanium coating layer. This is particularly the case where the titanium coating is prone to deterioration and where there is poor bonding with the metal matrix.
- It is especially useful in the making of diamond impregnated tools such as segments for saw blades, drills, beads for diamond wires especially where high amounts of bronze or copper limit the usefulness of titanium carbide coatings, the making of brazed diamond layer tools such as brazed diamond wire beads, the making of diamond containing metal matrix composites, brazing of diamond materials such as affixing TSPCD, PCD and diamond drillstones to a drill body, affixing CVD, monocrystal, TSPCD and PCD to a saw blade, tool post, drill body and the like.
- Additionally, the coated diamond impregnated tools yield improved performance, such as longer tool life and higher productivity. Coated diamond particles or substrates of the invention for brazing applications allow the use of simple brazes that work in air as opposed to active brazes containing Ti which require the exclusion of oxygen.
- The coated abrasive particles are preferably formed using a hot coating process for applying the inner layer and a low temperature CVD or PVD process for applying the outer layer.
- The diamond grit particles are those used conventionally in the manufacturing of metal bonded tools. They are generally uniformly sized, typically 0.1 to 10 mm. Examples of such diamond grit particles include: Micron grit 0.1 to 60 micron, wheel grit 40 micron to 200 micron, saw grit 180 micron to 2 millimeter, mono crystal 1 millimeter to 10 millimeter, CVD inserts of a few square millimeter to discs up to 200 millimeter diameter, PCD inserts of a few square millimeter to discs 104 millimeter diameter, cBN grit in micron range 0.1 to 60 micron, in wheel grit range 40 micron to 200 micron, PCBN inserts of a few mm to discs up to 104 mm diameter.
- The diamond particles are first coated in a hot coating process to provide an inner layer, which may be a metal layer or a metal carbide, nitride or carbonitride layer. In the case of cBN, such inner coating would typically be a metal nitride or boride or boronitride layer. In this hot coating process, the metal-based coat is applied to the diamond substrate under suitable hot conditions for such bonding to take place. Typical hot coating technologies that can be used include processes involving deposition from a metal halide gas phase, CVD processes, or thermodiffusion vacuum coating or metal vapour deposition processes, for example. Deposition from a metal halide gas phase and CVD processes are preferred.
- In processes involving deposition from a metal halide gas phase, the particles to be coated are exposed to a metal-halide containing the metal to be coated (e.g. titanium) in an appropriate gaseous environment (e.g. non-oxidising environments containing one or more of the following: inert gas, hydrogen, hydrocarbon, reduced pressure). The metal halide may be generated from a metal as part of the process.
- The mixture is subjected to a heat cycle during which the metal-halide transports the titanium to the surfaces of the particles where it is released and is chemically bonded to the particles.
- The outer layer of metal, metal alloy or combination of metals or metal alloys is deposited using a cold coating technique such as low temperature CVD or PVD, which is preferred. It is a low temperature process in that insufficient heat is generated to cause significant carbide formation. Hence, if used alone, it would result in poor adhesion to the diamond particles. An example of a PVD process for applying the outer coating is PVD sputtering. In this method, the metals, metal alloys or multiple layers of metal are deposited on the inner layer. The sputtering can take place from different positions, using more than one metal/metal alloy. This allows for the production of metallic outer layers that bond better with the bond matrix. They can also be tailored to provide for improved chemical resistance, tailored melt point, and improved resistance to diffusion reactions and the tendency to alloy with the bond matrix.
- Examples of coated abrasives of the invention include:
- Titanium carbide coating applied by a hot coating process, such as the commercially available SDBTCH, with an outer coating of:
-
- i) titanium, which improves oxidation resistance,
- ii) tungsten, which provides for improved chemical resistance.
This invention will now be described, by way of example only, with reference to the following non-limiting examples.
- Diamond grit from Element Six, 40/45 US mesh size, was coated in a CVD process to produce TiC coated diamond according to general methods commonly known in the art. The CVD TiC coated diamond was then used as the substrate for the second coating step.
- 1,000 carats of this TiC coated diamond, 40/45 US mesh size, was placed in a magnetron sputter coater with a rotating barrel. Two small targets of titanium and copper were used with two small independent magnetrons. The coating chamber was evacuated, argon was admitted and the power turned on to form plasma. Sputtering power was increased to 2 kW (420V) on the titanium target while rotating the barrel to ensure an even coating on all the diamond particles at 20 sccm argon pressure. Titanium was coated for 45 minutes. Copper was simultaneously coated at 100 W purely to prevent contaminating the copper target. Power to the titanium target was ramped down from 2 kW to 100 W and at the same time power to the copper target was ramped up from 100 W to 2 kW, over 30 minutes. Copper was coated at 2 kW (540V) for 45 minutes. Titanium was simultaneously coated at 100 W purely to prevent contaminating the titanium target. The total coating time was 120 minutes.
- An analysis of this coated diamond was undertaken, consisting of X-ray diffraction, X-ray fluorescence, Chemical assay of the coating, Optical and Scanning Electron Microscopy image analysis, and particle fracture followed by cross-sectional analysis on the SEM.
- Visually, this coating appeared a dark coppery colour. This colouring appeared evenly distributed over each particle and each particle appeared identical. The coating looked uniform and without any uncoated areas. Observation on the SEM again showed an even coating with a rough morphology composed of agglomerated particles. Fractured particles were also observed on the SEM. A two-layer structure was not easily distinguishable, the complete layer having a thickness of about 0.8 microns. This particular coating resulted in an assay of 2.7%. The TiC coating in this size used for this batch typically has an assay of 0.77%. The rest of the 2.7% is therefore attributable to the PVD TiC and Ti/Cu metal layer on top of the CVD TiC. When analysed using XRD, TiC and Cu metal were found. XRF analysis showed 23% Ti and 77% Cu.
- CVD TiC coated diamond produced in accordance with Example 1 was used as the substrate for the second coating step. 1,000 carats of this TiC coated diamond, 40/45 US mesh size, was placed in a magnetron sputter coater with a rotating barrel. Two small targets of titanium and tungsten were used with two small independent magnetrons. The coating chamber was evacuated, argon was admitted and the power turned on to form plasma. Sputtering power was increased to 2 kW (420V) on the titanium target while rotating the barrel to ensure an even coating on all the diamond particles at 20 sccm argon pressure. Titanium was coated for 45 minutes while oscillating the barrel. Tungsten was simultaneously coated at 100 W purely to prevent contaminating the tungsten target. Power to the titanium target was ramped down from 2 kW to 100 W and at the same time power to the tungsten target was ramped up from 100 W to 2 kW, over 30 minutes. Tungsten was coated at 2 kW (450V) for 60 minutes. Titanium was simultaneously coated at 100 W purely to prevent contaminating the titanium target. The total coating time was 135 minutes.
- An analysis of this coated diamond was undertaken, consisting of X-ray diffraction, X-ray fluorescence, Chemical assay of the coating, Optical and Scanning Electron Microscopy image analysis, and particle fracture followed by cross-sectional analysis on the SEM.
- Visually, this coating appeared a dark silvery grey metallic colour. This colouring appeared evenly distributed over each particle and each particle appeared identical. The coating looked uniform and without any uncoated areas. Observation on the SEM again showed an even coating with a slightly rough morphology composed of small agglomerated particles. Fractured particles were also observed on the SEM. A two-layer structure was seen in most instances, the Ti—W layer having a thickness of about 0.2 microns. This particular coating resulted in an assay of 2%. The TiC coating in this size used for this batch typically has an assay of 0.77%. The rest of the 2% is therefore attributable to the PVD TiC and Ti/W metal layer on top of the CVD TiC. When analysed using XRD, diamond, TiC and W metal were found. XRF analysis showed 32% Ti and 68% W.
Claims (11)
1. A coated super-hard abrasive comprising a core of super-hard abrasive material, an inner layer of a metal carbide, nitride, boride, carbonitride or boronitride chemically bonded to an outer surface of the super-hard abrasive material and an outer layer of a metal, metal alloy or a combination of metals or metal alloys deposited on the inner layer.
2. A coated super-hard abrasive according to claim 1 , wherein the metals or metal alloys that can be applied as an outer layer are selected from the group comprising metals from group IVa, Va or Vla transition metals, metals from the first row transition metals (Ti to Cu), and elements from groups IIIb and IVb of the periodic table, and alloys thereof.
3. A coated super-hard abrasive according to claim 2 , wherein the alloys comprise additional metals selected from the platinum group metals and metals from group Ib of the periodic table.
4. A coated super-hard abrasive according to any one of the preceding claims, wherein the outer layer is deposited by physical vapour deposition.
5. A coated super-hard abrasive according to claim 4 , wherein the outer layer is deposited by PVD sputter coating.
6. A coated super-hard abrasive according to any one of the preceding claims, wherein the super-hard abrasive material is diamond or cBN based.
7. A coated super-hard abrasive according to claim 6 , wherein the super-hard abrasive material is selected from the group comprising diamond or cBN grit, a PCD substrate, a PcBN substrate, a thermally stable PCD (TSPCD) substrate, a CVD diamond film, and a single crystal diamond substrate.
8. A coated super-hard abrasive according to any one of the preceding claims, wherein the inner layer is formed from an element capable of forming (singly or in combination) carbides, nitrides or borides to the surface(s) of the abrasive material when applied as an inner layer using a hot coating process.
9. A coated super-hard abrasive according to claim 8 , wherein the element is selected from the group comprising groups IVa, Va, Vla, IIIb and IVb of the periodic table.
10. A coated super-hard abrasive according to any one of the preceding claims, wherein the inner layer is a titanium or chromium carbide coating in the case of a diamond based core, or a titanium or chromium nitride, boride or boronitride coating in the case of a cBN based core.
11. A coated super-hard abrasive according to any one of the preceding claims, wherein the outer layer comprises titanium, tungsten, copper, or combinations thereof.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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IE20040023 | 2004-01-15 | ||
IES2004/0023 | 2004-01-15 | ||
PCT/IB2005/000061 WO2005078044A1 (en) | 2004-01-15 | 2005-01-13 | Coated abrasives |
Publications (1)
Publication Number | Publication Date |
---|---|
US20070214727A1 true US20070214727A1 (en) | 2007-09-20 |
Family
ID=34856838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/586,307 Abandoned US20070214727A1 (en) | 2004-01-15 | 2005-01-13 | Coated Abrasives |
Country Status (4)
Country | Link |
---|---|
US (1) | US20070214727A1 (en) |
EP (1) | EP1709138A1 (en) |
WO (1) | WO2005078044A1 (en) |
ZA (1) | ZA200606184B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090205260A1 (en) * | 2004-01-15 | 2009-08-20 | David Patrick Egan | Coated abrasives |
US20100122853A1 (en) * | 2007-02-23 | 2010-05-20 | Baker Hughes Incorporated | Encapsulated diamond particles, materials and impregnated diamond earth-boring bits including such particles, and methods of forming such particles, materials, and bits |
US20100141221A1 (en) * | 2008-12-05 | 2010-06-10 | Milan Ilic | Delivered energy compensation during plasma processing |
US20100167044A1 (en) * | 2007-02-28 | 2010-07-01 | Cornelius Johannes Pretorius | Tool component |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101679837B (en) * | 2007-05-22 | 2013-10-30 | 六号元素有限公司 | Coated CBN |
WO2009013714A1 (en) * | 2007-07-23 | 2009-01-29 | Element Six Limited | Air brazeable material |
GB201215469D0 (en) * | 2012-08-30 | 2012-10-17 | Element Six Ltd | Diamond constructions, tools comprising same and method for making same |
FR2998464B1 (en) | 2012-11-26 | 2015-05-22 | Seb Sa | COOKING DEVICE HAVING AN EASY-TO-CLEAN COOKING SURFACE WITH SCRATCH RESISTANCE |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4399167A (en) * | 1978-03-09 | 1983-08-16 | Pipkin Noel J | Metal coating of abrasive particles |
US5024680A (en) * | 1988-11-07 | 1991-06-18 | Norton Company | Multiple metal coated superabrasive grit and methods for their manufacture |
US5062865A (en) * | 1987-12-04 | 1991-11-05 | Norton Company | Chemically bonded superabrasive grit |
US5143523A (en) * | 1991-09-20 | 1992-09-01 | General Electric Company | Dual-coated diamond pellets and saw blade semgents made therewith |
US5889219A (en) * | 1995-11-15 | 1999-03-30 | Sumitomo Electric Industries, Ltd. | Superhard composite member and method of manufacturing the same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
HUT62831A (en) * | 1991-09-12 | 1993-06-28 | Gen Electric | Method for producing covered cubed leather-nitride abrasive grain, abrasive grain and grinding tool by using the same |
-
2005
- 2005-01-13 EP EP05702231A patent/EP1709138A1/en not_active Withdrawn
- 2005-01-13 ZA ZA200606184A patent/ZA200606184B/en unknown
- 2005-01-13 US US10/586,307 patent/US20070214727A1/en not_active Abandoned
- 2005-01-13 WO PCT/IB2005/000061 patent/WO2005078044A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4399167A (en) * | 1978-03-09 | 1983-08-16 | Pipkin Noel J | Metal coating of abrasive particles |
US5062865A (en) * | 1987-12-04 | 1991-11-05 | Norton Company | Chemically bonded superabrasive grit |
US5024680A (en) * | 1988-11-07 | 1991-06-18 | Norton Company | Multiple metal coated superabrasive grit and methods for their manufacture |
US5143523A (en) * | 1991-09-20 | 1992-09-01 | General Electric Company | Dual-coated diamond pellets and saw blade semgents made therewith |
US5889219A (en) * | 1995-11-15 | 1999-03-30 | Sumitomo Electric Industries, Ltd. | Superhard composite member and method of manufacturing the same |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090205260A1 (en) * | 2004-01-15 | 2009-08-20 | David Patrick Egan | Coated abrasives |
US20100122853A1 (en) * | 2007-02-23 | 2010-05-20 | Baker Hughes Incorporated | Encapsulated diamond particles, materials and impregnated diamond earth-boring bits including such particles, and methods of forming such particles, materials, and bits |
US8069936B2 (en) * | 2007-02-23 | 2011-12-06 | Baker Hughes Incorporated | Encapsulated diamond particles, materials and impregnated diamond earth-boring bits including such particles, and methods of forming such particles, materials, and bits |
US20100167044A1 (en) * | 2007-02-28 | 2010-07-01 | Cornelius Johannes Pretorius | Tool component |
US20100141221A1 (en) * | 2008-12-05 | 2010-06-10 | Milan Ilic | Delivered energy compensation during plasma processing |
US8815329B2 (en) * | 2008-12-05 | 2014-08-26 | Advanced Energy Industries, Inc. | Delivered energy compensation during plasma processing |
Also Published As
Publication number | Publication date |
---|---|
EP1709138A1 (en) | 2006-10-11 |
ZA200606184B (en) | 2007-11-28 |
WO2005078044A1 (en) | 2005-08-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |