US20070204420A1 - Polishing pad and method of making - Google Patents
Polishing pad and method of making Download PDFInfo
- Publication number
- US20070204420A1 US20070204420A1 US11/369,216 US36921606A US2007204420A1 US 20070204420 A1 US20070204420 A1 US 20070204420A1 US 36921606 A US36921606 A US 36921606A US 2007204420 A1 US2007204420 A1 US 2007204420A1
- Authority
- US
- United States
- Prior art keywords
- pad
- buffing
- concentric rings
- resilient foam
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
- B24D7/14—Zonally-graded wheels; Composite wheels comprising different abrasives
Definitions
- This invention relates generally to buffing pads for buffing machines and more particularly to buffing pads made of resilient foam.
- the buffing pads are often used when a wax or polish is mechanically applied to a surface.
- the buffing pads generally include a pad material with a buffing surface on one side and an attachment surface on the other side.
- a pad support is secured to the attachment surface of the pad material, such as by an adhesive.
- the pad material is typically a soft, non-abrasive material that provides the desired characteristics for the buffing pad when used to spread a polish or wax on a surface.
- the pad support is generally more rigid than the pad material, and it typically includes a connector for releasably securing the buffing pad to a backing plate on the buffing machine, which typically includes a complementary connector. Suitable connectors include, but are not limited to, hook and loop connectors.
- the form and materials for the pad material have been varied to provide effective contact between the buffing material on the buffing surface and the item to be buffed or polished.
- the goal is to maximize the contact of the buffing surface with the item, maximizing the effectiveness of the buffing surface in spreading the wax or polish over the item.
- the variations typically take the form of different shapes for the buffing surface, increasing the contact of the pad with the surface over those portions of the pad which contact the surface.
- One type of pad which has been used is a flat, foam buffing pad.
- the flat surface of these pads generates more heat than other foam buffing pad designs.
- the heat causes the buffing material to dry out or break down rapidly, causing the buffing surface of the pad to make contact with the substrate directly.
- chatter or a squeaking noise is generated.
- the chatter notifies the user to add more buffing material.
- Flat pads also have problems getting the buffing material out to the edge of the buffing surface. This limits the size of the area which can be buffed effectively.
- the waffle pad has a convoluted buffing surface which reduces chatter. However, it can cause the buffing material to spatter.
- the buffing surface allows the buffing material to reach the outer edges of the buffing pad, but it does not stop there. It is thrown out beyond the edge of the buffing surface and can end up in areas which are not being buffed. Additional clean-up is necessary to remove the unwanted buffing material.
- the present invention meets this need by providing a buffing pad which allows good contact between the buffing surface of the buffing pad and the substrate to be buffed without generating excessive heat, and which reduces spatter of the buffing material.
- the buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
- Another aspect of the present invention is a method of making the buffing pad.
- the method includes providing a pad support having a first surface and a second surface; providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface; positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and securing the attachment surface of the concentric rings to the first surface of the pad support.
- FIG. 1 is schematic of the buffing surface of one embodiment of the present invention.
- FIG. 2 is a schematic of the buffing surface of another embodiment of the present invention.
- FIG. 3 is a schematic of the buffing surface of another embodiment of the present invention.
- FIG. 4 is a schematic of a schematic of a cross-section of one embodiment of the buffing surface of FIG. 3 .
- FIG. 5 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3 .
- FIG. 6 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3 .
- FIG. 7 is a schematic of a cross-section of one embodiment of a two sided pad.
- FIG. 8 is a schematic of a cross-section of another embodiment of a two sided pad.
- the concentric ring design of the present invention allows for maximum contact between the buffing surface of the buffing pad and the substrate to be buffed, without generating excessive heat.
- the gap between the concentric rings widens. The widening of the gap between the concentric rings reduces/breaks the surface tension between the buffing pad and the substrate. Breaking the surface tension improves control and generates less heat, therefore, reducing chatter.
- the gap between the concentric rings also allows for efficient movement of wax or polish from the inner ring to the outer ring(s).
- pressure is applied to the buffing pad, the wax or polish is pressed to the surface being buffed. This helps to trap wax or polish where it is needed most, limiting the amount of wax or polish being slung out beyond the outer edges of the buffing surface.
- the wax or polish is easily transferred to the entire buffing surface, limiting the amount of wax or polish slung out beyond the outer edges of the buffing surface. Therefore, clean-up of the excess wax or polish is either minimal or not needed.
- FIG. 1 shows one embodiment of the buffing pad 5 of the present invention.
- the buffing pad 5 is typically circular in shape.
- the buffing surface 10 of the resilient foam pad 15 includes three concentric rings 20 , 30 , 40 of resilient foam.
- the concentric rings can be made of the same type of resilient foam, different types of resilient foam can be used in two or more of the rings, or a blend of resilient foams can be used within each ring.
- the resilient foam can either be opened cell or closed cell foam. Suitable foam includes, but is not limited to, polyurethane foam, and is commercially available from various foam manufacturers and fabricators.
- the widths 25 , 35 , 45 of the three concentric rings 20 , 30 , 40 are all different.
- the inner concentric ring 40 has the widest width 45
- the middle concentric ring 30 has the smallest width 35 .
- the widths could all be the same, or some could be the same and some different.
- the location of the widest and narrowest concentric rings could be varied.
- the gap is typically in the range of about 1/16 in. to about 1 ⁇ 8 in., but it can be smaller or larger, if desired.
- FIG. 3 shows a third embodiment of the buffing pad 205 .
- the buffing surface 210 of the resilient foam pad 215 includes two concentric rings, 220 , 230 .
- the width 225 of concentric ring 220 is about the same as the width 235 of concentric ring 230 .
- FIG. 4 shows a cross-section of one embodiment of the buffing pad 205 of FIG. 3 .
- the buffing surface 210 is on one side of the resilient foam pad 215 and the attachment surface 265 is on the other side of the resilient foam pad 215 .
- the two concentric rings 220 , 230 have the same thickness 227 , 237 . There is a gap 255 between the concentric rings 220 and 230 .
- a pad support 270 with a first surface 275 and a second surface 280 .
- the first surface 275 of the pad support 270 is secured to the attachment surface 265 of the resilient foam pad 215 .
- the second surface 280 of the pad support 270 has a releasable connector 285 .
- the releasable connector can be attached to the second surface 280 of the pad support 270 .
- the releasable connector can form the pad support, if desired.
- Suitable releasable connectors include, but are not limited to, hook and loop connectors.
- One part of the releasable connector is on the pad support, while the complementary connector is on the backing plate of the buffing machine (not shown).
- a radius 290 can be formed on the outer edge of the resilient foam pad 215 to enhance buffing and engagement characteristics, if desired.
- FIGS. 5 and 6 show alternative embodiments in which the thickness of the concentric rings varies.
- the thickness 237 of concentric ring 230 is greater than the thickness 227 of concentric ring 220
- the thickness 227 of concentric ring 220 is greater than the thickness 237 of concentric ring 230 .
- the buffing pads can be made by cutting foam pad into concentric rings having the desired size.
- the concentric rings can be made of the same foam material, or they can be made of different foam materials, if desired.
- the concentric rings are arranged on the pad support with a gap between them and secured to it, generally with an adhesive.
- the concentric rings are typically permanently secured to the pad support, although they could be releasably secured, if desired.
- the pad support can have a connector attached to the other side, either before or after the concentric rings are attached.
- the outer edge of the foam pad can be ground into a radius, if desired.
- the buffing pad can be dual-sided, if desired.
- two buffing pads could be used with the pad supports back to back, as shown in FIG. 8 .
- the pad supports could be secured to one another, such as with adhesive, hook and loop connectors, etc., as is well known in the art.
- two resilient foam pads could be attached to a single pad support, as shown in FIG. 7 .
- Other arrangements for dual-sided buffing pads are well-known to those of skill in the art.
- Buffing pads were made according to the present invention with two concentric rings.
- the inner ring was 41 ⁇ 2 in. in diameter with a 7 ⁇ 8 in. centering hole (1 13/16 in. width) and 11 ⁇ 4 in. thick.
- the outer ring was 8 in. in diameter (13 ⁇ 4 in. width) and 11 ⁇ 4 in. thick. Both the inner ring and the outer ring were made of open cell, polyurethane foam pad.
- the buffing pads were tested and compared to two commercially available foam pads. Each set of pads was tested with the same compounds and glazes, and each pad was evaluated for scratch removal/surface clean-up and gloss level. The testing was conducted on panels sprayed with basecoat and clearcoat. The clearcoat was allowed to air dry for 16 hrs. on one panel and for more than 48 hrs. on another panel. Each panel was sanded with 1500 grit sandpaper on a dual action (DA) sander, wet 1500 grit sandpaper by hand, and wet 3000 grit sandpaper on a DA sander. Each sanded area was buffed with the pads and compounds and glazes, and the pad performance was evaluated.
- DA dual action
- the buffing pads of the present invention showed improved cutting capability, control, finished surface, and gloss level as compared to the two commercially available buffing pads.
- the pad of the present invention When pressure is applied to the buffing pad of the present invention, the pad opens up, creating a larger buffing surface. More cutting action is created by having this larger buffing surface, therefore effectively removing any sand scratches or imperfections in the paint or clearcoat. As pressure is released, the pad flattens out. This flattened surface is the ideal buffing surface to provide a swirl-free, high gloss finish.
- the pad of the present invention provides a user with a buffing pad that can remove sandscratches and imperfections, while providing a clean, high gloss finish.
Abstract
Description
- This invention relates generally to buffing pads for buffing machines and more particularly to buffing pads made of resilient foam.
- Buffing pads are often used when a wax or polish is mechanically applied to a surface. The buffing pads generally include a pad material with a buffing surface on one side and an attachment surface on the other side. A pad support is secured to the attachment surface of the pad material, such as by an adhesive. The pad material is typically a soft, non-abrasive material that provides the desired characteristics for the buffing pad when used to spread a polish or wax on a surface. The pad support is generally more rigid than the pad material, and it typically includes a connector for releasably securing the buffing pad to a backing plate on the buffing machine, which typically includes a complementary connector. Suitable connectors include, but are not limited to, hook and loop connectors.
- The form and materials for the pad material have been varied to provide effective contact between the buffing material on the buffing surface and the item to be buffed or polished. The goal is to maximize the contact of the buffing surface with the item, maximizing the effectiveness of the buffing surface in spreading the wax or polish over the item. The variations typically take the form of different shapes for the buffing surface, increasing the contact of the pad with the surface over those portions of the pad which contact the surface.
- One type of pad which has been used is a flat, foam buffing pad. The flat surface of these pads generates more heat than other foam buffing pad designs. The heat causes the buffing material to dry out or break down rapidly, causing the buffing surface of the pad to make contact with the substrate directly. Without adequate lubrication from the buffing material, chatter or a squeaking noise is generated. The chatter notifies the user to add more buffing material. Flat pads also have problems getting the buffing material out to the edge of the buffing surface. This limits the size of the area which can be buffed effectively.
- Another type of pad is a “waffle” pad. The waffle pad has a convoluted buffing surface which reduces chatter. However, it can cause the buffing material to spatter. The buffing surface allows the buffing material to reach the outer edges of the buffing pad, but it does not stop there. It is thrown out beyond the edge of the buffing surface and can end up in areas which are not being buffed. Additional clean-up is necessary to remove the unwanted buffing material.
- Therefore, there remains a need for an improved buffing pad which reduces chatter and spattering of the buffing material.
- The present invention meets this need by providing a buffing pad which allows good contact between the buffing surface of the buffing pad and the substrate to be buffed without generating excessive heat, and which reduces spatter of the buffing material.
- The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
- Another aspect of the present invention is a method of making the buffing pad. The method includes providing a pad support having a first surface and a second surface; providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface; positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and securing the attachment surface of the concentric rings to the first surface of the pad support.
-
FIG. 1 is schematic of the buffing surface of one embodiment of the present invention. -
FIG. 2 is a schematic of the buffing surface of another embodiment of the present invention. -
FIG. 3 is a schematic of the buffing surface of another embodiment of the present invention. -
FIG. 4 is a schematic of a schematic of a cross-section of one embodiment of the buffing surface ofFIG. 3 . -
FIG. 5 is a schematic of a cross-section of another embodiment of the buffing surface ofFIG. 3 . -
FIG. 6 is a schematic of a cross-section of another embodiment of the buffing surface ofFIG. 3 . -
FIG. 7 is a schematic of a cross-section of one embodiment of a two sided pad. -
FIG. 8 is a schematic of a cross-section of another embodiment of a two sided pad. - The concentric ring design of the present invention allows for maximum contact between the buffing surface of the buffing pad and the substrate to be buffed, without generating excessive heat. When the buffing pad is attached to the buffing machine, and the machine is turned on, the gap between the concentric rings widens. The widening of the gap between the concentric rings reduces/breaks the surface tension between the buffing pad and the substrate. Breaking the surface tension improves control and generates less heat, therefore, reducing chatter.
- The gap between the concentric rings also allows for efficient movement of wax or polish from the inner ring to the outer ring(s). As pressure is applied to the buffing pad, the wax or polish is pressed to the surface being buffed. This helps to trap wax or polish where it is needed most, limiting the amount of wax or polish being slung out beyond the outer edges of the buffing surface. As the pressure is released and the pad flattens out, the wax or polish is easily transferred to the entire buffing surface, limiting the amount of wax or polish slung out beyond the outer edges of the buffing surface. Therefore, clean-up of the excess wax or polish is either minimal or not needed.
-
FIG. 1 shows one embodiment of thebuffing pad 5 of the present invention. Thebuffing pad 5 is typically circular in shape. Thebuffing surface 10 of theresilient foam pad 15 includes threeconcentric rings - The concentric rings can be made of the same type of resilient foam, different types of resilient foam can be used in two or more of the rings, or a blend of resilient foams can be used within each ring. The resilient foam can either be opened cell or closed cell foam. Suitable foam includes, but is not limited to, polyurethane foam, and is commercially available from various foam manufacturers and fabricators.
- As shown in
FIG. 1 , thewidths concentric rings concentric ring 40 has thewidest width 45, while the middleconcentric ring 30 has thesmallest width 35. However, the widths could all be the same, or some could be the same and some different. In addition, the location of the widest and narrowest concentric rings could be varied. - There is a
gap 50 betweenconcentric rings gap 55 betweenconcentric rings -
FIG. 2 shows another embodiment of thebuffing pad 105. In this embodiment, buffing surface 110 of theresilient foam pad 115 includes threeconcentric rings FIG. 2 , thewidths 125, 135, 145 of the threeconcentric rings gap 150 betweenconcentric rings gap 155 betweenconcentric rings -
FIG. 3 shows a third embodiment of thebuffing pad 205. The buffingsurface 210 of theresilient foam pad 215 includes two concentric rings, 220, 230. Thewidth 225 ofconcentric ring 220 is about the same as thewidth 235 ofconcentric ring 230. There is agap 255 betweenconcentric rings -
FIG. 4 shows a cross-section of one embodiment of thebuffing pad 205 ofFIG. 3 . The buffingsurface 210 is on one side of theresilient foam pad 215 and theattachment surface 265 is on the other side of theresilient foam pad 215. - In this embodiment, the two
concentric rings same thickness gap 255 between theconcentric rings - There is a
pad support 270 with afirst surface 275 and asecond surface 280. Thefirst surface 275 of thepad support 270 is secured to theattachment surface 265 of theresilient foam pad 215. Thesecond surface 280 of thepad support 270 has areleasable connector 285. The releasable connector can be attached to thesecond surface 280 of thepad support 270. Alternatively, the releasable connector can form the pad support, if desired. Suitable releasable connectors include, but are not limited to, hook and loop connectors. One part of the releasable connector is on the pad support, while the complementary connector is on the backing plate of the buffing machine (not shown). - A
radius 290 can be formed on the outer edge of theresilient foam pad 215 to enhance buffing and engagement characteristics, if desired. -
FIGS. 5 and 6 show alternative embodiments in which the thickness of the concentric rings varies. InFIG. 5 , thethickness 237 ofconcentric ring 230 is greater than thethickness 227 ofconcentric ring 220, while inFIG. 6 , thethickness 227 ofconcentric ring 220 is greater than thethickness 237 ofconcentric ring 230. - The buffing pads can be made by cutting foam pad into concentric rings having the desired size. The concentric rings can be made of the same foam material, or they can be made of different foam materials, if desired. The concentric rings are arranged on the pad support with a gap between them and secured to it, generally with an adhesive. The concentric rings are typically permanently secured to the pad support, although they could be releasably secured, if desired. The pad support can have a connector attached to the other side, either before or after the concentric rings are attached. The outer edge of the foam pad can be ground into a radius, if desired.
- Although embodiments with two or three concentric rings have been shown, more rings can be used, if desired. There can be two or more concentric rings.
- The buffing pad can be dual-sided, if desired. For example, two buffing pads could be used with the pad supports back to back, as shown in
FIG. 8 . There could be a center mounting ring so that the dual-sided buffing pad can be attached to the buffing machine. The pad supports could be secured to one another, such as with adhesive, hook and loop connectors, etc., as is well known in the art. Alternatively, two resilient foam pads could be attached to a single pad support, as shown inFIG. 7 . There could be a center mounting ring for attachment to the buffing machine. Other arrangements for dual-sided buffing pads are well-known to those of skill in the art. - Buffing pads were made according to the present invention with two concentric rings. The inner ring was 4½ in. in diameter with a ⅞ in. centering hole (1 13/16 in. width) and 1¼ in. thick. The outer ring was 8 in. in diameter (1¾ in. width) and 1¼ in. thick. Both the inner ring and the outer ring were made of open cell, polyurethane foam pad.
- The buffing pads were tested and compared to two commercially available foam pads. Each set of pads was tested with the same compounds and glazes, and each pad was evaluated for scratch removal/surface clean-up and gloss level. The testing was conducted on panels sprayed with basecoat and clearcoat. The clearcoat was allowed to air dry for 16 hrs. on one panel and for more than 48 hrs. on another panel. Each panel was sanded with 1500 grit sandpaper on a dual action (DA) sander, wet 1500 grit sandpaper by hand, and wet 3000 grit sandpaper on a DA sander. Each sanded area was buffed with the pads and compounds and glazes, and the pad performance was evaluated.
- The buffing pads of the present invention showed improved cutting capability, control, finished surface, and gloss level as compared to the two commercially available buffing pads.
- When pressure is applied to the buffing pad of the present invention, the pad opens up, creating a larger buffing surface. More cutting action is created by having this larger buffing surface, therefore effectively removing any sand scratches or imperfections in the paint or clearcoat. As pressure is released, the pad flattens out. This flattened surface is the ideal buffing surface to provide a swirl-free, high gloss finish. The pad of the present invention provides a user with a buffing pad that can remove sandscratches and imperfections, while providing a clean, high gloss finish.
- It will be obvious to those skilled in the art that various changes may be made without departing from the scope of the invention which is not to be considered limited to what is described in the specification.
Claims (21)
Priority Applications (1)
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US11/369,216 US20070204420A1 (en) | 2006-03-06 | 2006-03-06 | Polishing pad and method of making |
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US11/369,216 US20070204420A1 (en) | 2006-03-06 | 2006-03-06 | Polishing pad and method of making |
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US20070204420A1 true US20070204420A1 (en) | 2007-09-06 |
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US11/369,216 Abandoned US20070204420A1 (en) | 2006-03-06 | 2006-03-06 | Polishing pad and method of making |
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Cited By (15)
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US20080254725A1 (en) * | 2007-04-10 | 2008-10-16 | Henning Lee A | Quick mount adapter and backing plate surface care system and apparatus |
WO2011059935A1 (en) | 2009-11-12 | 2011-05-19 | 3M Innovative Properties Company | Rotary buffing pad |
US20150158149A1 (en) * | 2013-12-09 | 2015-06-11 | Saint-Gobain Abrasives, Inc. | Abrasive article |
US20170120416A1 (en) * | 2015-10-30 | 2017-05-04 | Applied Materials, Inc. | Apparatus and method of forming a polishing article that has a desired zeta potential |
US9914197B2 (en) | 2013-12-09 | 2018-03-13 | Saint-Gobain Abrasives, Inc. | Abrasive assembly having alignment elements |
US11446788B2 (en) | 2014-10-17 | 2022-09-20 | Applied Materials, Inc. | Precursor formulations for polishing pads produced by an additive manufacturing process |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
US11524384B2 (en) | 2017-08-07 | 2022-12-13 | Applied Materials, Inc. | Abrasive delivery polishing pads and manufacturing methods thereof |
US11685014B2 (en) | 2018-09-04 | 2023-06-27 | Applied Materials, Inc. | Formulations for advanced polishing pads |
US11724362B2 (en) | 2014-10-17 | 2023-08-15 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US11772229B2 (en) | 2016-01-19 | 2023-10-03 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US11851570B2 (en) | 2019-04-12 | 2023-12-26 | Applied Materials, Inc. | Anionic polishing pads formed by printing processes |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
US11958162B2 (en) | 2020-01-17 | 2024-04-16 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
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