US20070204420A1 - Polishing pad and method of making - Google Patents

Polishing pad and method of making Download PDF

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Publication number
US20070204420A1
US20070204420A1 US11/369,216 US36921606A US2007204420A1 US 20070204420 A1 US20070204420 A1 US 20070204420A1 US 36921606 A US36921606 A US 36921606A US 2007204420 A1 US2007204420 A1 US 2007204420A1
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US
United States
Prior art keywords
pad
buffing
concentric rings
resilient foam
support
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Abandoned
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US11/369,216
Inventor
David Hornby
Randy Schneider
James Testa
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AMERICAN BUFFING COMPANY Inc
Illinois Tool Works Inc
Original Assignee
AMERICAN BUFFING COMPANY Inc
Illinois Tool Works Inc
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Filing date
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Application filed by AMERICAN BUFFING COMPANY Inc, Illinois Tool Works Inc filed Critical AMERICAN BUFFING COMPANY Inc
Priority to US11/369,216 priority Critical patent/US20070204420A1/en
Assigned to ILLINOIS TOOL WORKS INC. reassignment ILLINOIS TOOL WORKS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: AMERICAN BUFFING COMPANY, INC.
Assigned to ILLINOIS TOOL WORKS INC. reassignment ILLINOIS TOOL WORKS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SCHNEIDER, RANDY L., TESTA, JAMES A.
Assigned to AMERICAN BUFFING COMPANY, INC. reassignment AMERICAN BUFFING COMPANY, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HORNBY, DAVID M.
Publication of US20070204420A1 publication Critical patent/US20070204420A1/en
Abandoned legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/26Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/14Zonally-graded wheels; Composite wheels comprising different abrasives

Definitions

  • This invention relates generally to buffing pads for buffing machines and more particularly to buffing pads made of resilient foam.
  • the buffing pads are often used when a wax or polish is mechanically applied to a surface.
  • the buffing pads generally include a pad material with a buffing surface on one side and an attachment surface on the other side.
  • a pad support is secured to the attachment surface of the pad material, such as by an adhesive.
  • the pad material is typically a soft, non-abrasive material that provides the desired characteristics for the buffing pad when used to spread a polish or wax on a surface.
  • the pad support is generally more rigid than the pad material, and it typically includes a connector for releasably securing the buffing pad to a backing plate on the buffing machine, which typically includes a complementary connector. Suitable connectors include, but are not limited to, hook and loop connectors.
  • the form and materials for the pad material have been varied to provide effective contact between the buffing material on the buffing surface and the item to be buffed or polished.
  • the goal is to maximize the contact of the buffing surface with the item, maximizing the effectiveness of the buffing surface in spreading the wax or polish over the item.
  • the variations typically take the form of different shapes for the buffing surface, increasing the contact of the pad with the surface over those portions of the pad which contact the surface.
  • One type of pad which has been used is a flat, foam buffing pad.
  • the flat surface of these pads generates more heat than other foam buffing pad designs.
  • the heat causes the buffing material to dry out or break down rapidly, causing the buffing surface of the pad to make contact with the substrate directly.
  • chatter or a squeaking noise is generated.
  • the chatter notifies the user to add more buffing material.
  • Flat pads also have problems getting the buffing material out to the edge of the buffing surface. This limits the size of the area which can be buffed effectively.
  • the waffle pad has a convoluted buffing surface which reduces chatter. However, it can cause the buffing material to spatter.
  • the buffing surface allows the buffing material to reach the outer edges of the buffing pad, but it does not stop there. It is thrown out beyond the edge of the buffing surface and can end up in areas which are not being buffed. Additional clean-up is necessary to remove the unwanted buffing material.
  • the present invention meets this need by providing a buffing pad which allows good contact between the buffing surface of the buffing pad and the substrate to be buffed without generating excessive heat, and which reduces spatter of the buffing material.
  • the buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
  • Another aspect of the present invention is a method of making the buffing pad.
  • the method includes providing a pad support having a first surface and a second surface; providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface; positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and securing the attachment surface of the concentric rings to the first surface of the pad support.
  • FIG. 1 is schematic of the buffing surface of one embodiment of the present invention.
  • FIG. 2 is a schematic of the buffing surface of another embodiment of the present invention.
  • FIG. 3 is a schematic of the buffing surface of another embodiment of the present invention.
  • FIG. 4 is a schematic of a schematic of a cross-section of one embodiment of the buffing surface of FIG. 3 .
  • FIG. 5 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3 .
  • FIG. 6 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3 .
  • FIG. 7 is a schematic of a cross-section of one embodiment of a two sided pad.
  • FIG. 8 is a schematic of a cross-section of another embodiment of a two sided pad.
  • the concentric ring design of the present invention allows for maximum contact between the buffing surface of the buffing pad and the substrate to be buffed, without generating excessive heat.
  • the gap between the concentric rings widens. The widening of the gap between the concentric rings reduces/breaks the surface tension between the buffing pad and the substrate. Breaking the surface tension improves control and generates less heat, therefore, reducing chatter.
  • the gap between the concentric rings also allows for efficient movement of wax or polish from the inner ring to the outer ring(s).
  • pressure is applied to the buffing pad, the wax or polish is pressed to the surface being buffed. This helps to trap wax or polish where it is needed most, limiting the amount of wax or polish being slung out beyond the outer edges of the buffing surface.
  • the wax or polish is easily transferred to the entire buffing surface, limiting the amount of wax or polish slung out beyond the outer edges of the buffing surface. Therefore, clean-up of the excess wax or polish is either minimal or not needed.
  • FIG. 1 shows one embodiment of the buffing pad 5 of the present invention.
  • the buffing pad 5 is typically circular in shape.
  • the buffing surface 10 of the resilient foam pad 15 includes three concentric rings 20 , 30 , 40 of resilient foam.
  • the concentric rings can be made of the same type of resilient foam, different types of resilient foam can be used in two or more of the rings, or a blend of resilient foams can be used within each ring.
  • the resilient foam can either be opened cell or closed cell foam. Suitable foam includes, but is not limited to, polyurethane foam, and is commercially available from various foam manufacturers and fabricators.
  • the widths 25 , 35 , 45 of the three concentric rings 20 , 30 , 40 are all different.
  • the inner concentric ring 40 has the widest width 45
  • the middle concentric ring 30 has the smallest width 35 .
  • the widths could all be the same, or some could be the same and some different.
  • the location of the widest and narrowest concentric rings could be varied.
  • the gap is typically in the range of about 1/16 in. to about 1 ⁇ 8 in., but it can be smaller or larger, if desired.
  • FIG. 3 shows a third embodiment of the buffing pad 205 .
  • the buffing surface 210 of the resilient foam pad 215 includes two concentric rings, 220 , 230 .
  • the width 225 of concentric ring 220 is about the same as the width 235 of concentric ring 230 .
  • FIG. 4 shows a cross-section of one embodiment of the buffing pad 205 of FIG. 3 .
  • the buffing surface 210 is on one side of the resilient foam pad 215 and the attachment surface 265 is on the other side of the resilient foam pad 215 .
  • the two concentric rings 220 , 230 have the same thickness 227 , 237 . There is a gap 255 between the concentric rings 220 and 230 .
  • a pad support 270 with a first surface 275 and a second surface 280 .
  • the first surface 275 of the pad support 270 is secured to the attachment surface 265 of the resilient foam pad 215 .
  • the second surface 280 of the pad support 270 has a releasable connector 285 .
  • the releasable connector can be attached to the second surface 280 of the pad support 270 .
  • the releasable connector can form the pad support, if desired.
  • Suitable releasable connectors include, but are not limited to, hook and loop connectors.
  • One part of the releasable connector is on the pad support, while the complementary connector is on the backing plate of the buffing machine (not shown).
  • a radius 290 can be formed on the outer edge of the resilient foam pad 215 to enhance buffing and engagement characteristics, if desired.
  • FIGS. 5 and 6 show alternative embodiments in which the thickness of the concentric rings varies.
  • the thickness 237 of concentric ring 230 is greater than the thickness 227 of concentric ring 220
  • the thickness 227 of concentric ring 220 is greater than the thickness 237 of concentric ring 230 .
  • the buffing pads can be made by cutting foam pad into concentric rings having the desired size.
  • the concentric rings can be made of the same foam material, or they can be made of different foam materials, if desired.
  • the concentric rings are arranged on the pad support with a gap between them and secured to it, generally with an adhesive.
  • the concentric rings are typically permanently secured to the pad support, although they could be releasably secured, if desired.
  • the pad support can have a connector attached to the other side, either before or after the concentric rings are attached.
  • the outer edge of the foam pad can be ground into a radius, if desired.
  • the buffing pad can be dual-sided, if desired.
  • two buffing pads could be used with the pad supports back to back, as shown in FIG. 8 .
  • the pad supports could be secured to one another, such as with adhesive, hook and loop connectors, etc., as is well known in the art.
  • two resilient foam pads could be attached to a single pad support, as shown in FIG. 7 .
  • Other arrangements for dual-sided buffing pads are well-known to those of skill in the art.
  • Buffing pads were made according to the present invention with two concentric rings.
  • the inner ring was 41 ⁇ 2 in. in diameter with a 7 ⁇ 8 in. centering hole (1 13/16 in. width) and 11 ⁇ 4 in. thick.
  • the outer ring was 8 in. in diameter (13 ⁇ 4 in. width) and 11 ⁇ 4 in. thick. Both the inner ring and the outer ring were made of open cell, polyurethane foam pad.
  • the buffing pads were tested and compared to two commercially available foam pads. Each set of pads was tested with the same compounds and glazes, and each pad was evaluated for scratch removal/surface clean-up and gloss level. The testing was conducted on panels sprayed with basecoat and clearcoat. The clearcoat was allowed to air dry for 16 hrs. on one panel and for more than 48 hrs. on another panel. Each panel was sanded with 1500 grit sandpaper on a dual action (DA) sander, wet 1500 grit sandpaper by hand, and wet 3000 grit sandpaper on a DA sander. Each sanded area was buffed with the pads and compounds and glazes, and the pad performance was evaluated.
  • DA dual action
  • the buffing pads of the present invention showed improved cutting capability, control, finished surface, and gloss level as compared to the two commercially available buffing pads.
  • the pad of the present invention When pressure is applied to the buffing pad of the present invention, the pad opens up, creating a larger buffing surface. More cutting action is created by having this larger buffing surface, therefore effectively removing any sand scratches or imperfections in the paint or clearcoat. As pressure is released, the pad flattens out. This flattened surface is the ideal buffing surface to provide a swirl-free, high gloss finish.
  • the pad of the present invention provides a user with a buffing pad that can remove sandscratches and imperfections, while providing a clean, high gloss finish.

Abstract

A buffing pad. The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween. A method of making the buffing pad is also disclosed.

Description

    BACKGROUND OF THE INVENTION
  • This invention relates generally to buffing pads for buffing machines and more particularly to buffing pads made of resilient foam.
  • Buffing pads are often used when a wax or polish is mechanically applied to a surface. The buffing pads generally include a pad material with a buffing surface on one side and an attachment surface on the other side. A pad support is secured to the attachment surface of the pad material, such as by an adhesive. The pad material is typically a soft, non-abrasive material that provides the desired characteristics for the buffing pad when used to spread a polish or wax on a surface. The pad support is generally more rigid than the pad material, and it typically includes a connector for releasably securing the buffing pad to a backing plate on the buffing machine, which typically includes a complementary connector. Suitable connectors include, but are not limited to, hook and loop connectors.
  • The form and materials for the pad material have been varied to provide effective contact between the buffing material on the buffing surface and the item to be buffed or polished. The goal is to maximize the contact of the buffing surface with the item, maximizing the effectiveness of the buffing surface in spreading the wax or polish over the item. The variations typically take the form of different shapes for the buffing surface, increasing the contact of the pad with the surface over those portions of the pad which contact the surface.
  • One type of pad which has been used is a flat, foam buffing pad. The flat surface of these pads generates more heat than other foam buffing pad designs. The heat causes the buffing material to dry out or break down rapidly, causing the buffing surface of the pad to make contact with the substrate directly. Without adequate lubrication from the buffing material, chatter or a squeaking noise is generated. The chatter notifies the user to add more buffing material. Flat pads also have problems getting the buffing material out to the edge of the buffing surface. This limits the size of the area which can be buffed effectively.
  • Another type of pad is a “waffle” pad. The waffle pad has a convoluted buffing surface which reduces chatter. However, it can cause the buffing material to spatter. The buffing surface allows the buffing material to reach the outer edges of the buffing pad, but it does not stop there. It is thrown out beyond the edge of the buffing surface and can end up in areas which are not being buffed. Additional clean-up is necessary to remove the unwanted buffing material.
  • Therefore, there remains a need for an improved buffing pad which reduces chatter and spattering of the buffing material.
  • SUMMARY OF THE INVENTION
  • The present invention meets this need by providing a buffing pad which allows good contact between the buffing surface of the buffing pad and the substrate to be buffed without generating excessive heat, and which reduces spatter of the buffing material.
  • The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
  • Another aspect of the present invention is a method of making the buffing pad. The method includes providing a pad support having a first surface and a second surface; providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface; positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and securing the attachment surface of the concentric rings to the first surface of the pad support.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is schematic of the buffing surface of one embodiment of the present invention.
  • FIG. 2 is a schematic of the buffing surface of another embodiment of the present invention.
  • FIG. 3 is a schematic of the buffing surface of another embodiment of the present invention.
  • FIG. 4 is a schematic of a schematic of a cross-section of one embodiment of the buffing surface of FIG. 3.
  • FIG. 5 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3.
  • FIG. 6 is a schematic of a cross-section of another embodiment of the buffing surface of FIG. 3.
  • FIG. 7 is a schematic of a cross-section of one embodiment of a two sided pad.
  • FIG. 8 is a schematic of a cross-section of another embodiment of a two sided pad.
  • DETAILED DESCRIPTION OF THE INVENTION
  • The concentric ring design of the present invention allows for maximum contact between the buffing surface of the buffing pad and the substrate to be buffed, without generating excessive heat. When the buffing pad is attached to the buffing machine, and the machine is turned on, the gap between the concentric rings widens. The widening of the gap between the concentric rings reduces/breaks the surface tension between the buffing pad and the substrate. Breaking the surface tension improves control and generates less heat, therefore, reducing chatter.
  • The gap between the concentric rings also allows for efficient movement of wax or polish from the inner ring to the outer ring(s). As pressure is applied to the buffing pad, the wax or polish is pressed to the surface being buffed. This helps to trap wax or polish where it is needed most, limiting the amount of wax or polish being slung out beyond the outer edges of the buffing surface. As the pressure is released and the pad flattens out, the wax or polish is easily transferred to the entire buffing surface, limiting the amount of wax or polish slung out beyond the outer edges of the buffing surface. Therefore, clean-up of the excess wax or polish is either minimal or not needed.
  • FIG. 1 shows one embodiment of the buffing pad 5 of the present invention. The buffing pad 5 is typically circular in shape. The buffing surface 10 of the resilient foam pad 15 includes three concentric rings 20, 30, 40 of resilient foam.
  • The concentric rings can be made of the same type of resilient foam, different types of resilient foam can be used in two or more of the rings, or a blend of resilient foams can be used within each ring. The resilient foam can either be opened cell or closed cell foam. Suitable foam includes, but is not limited to, polyurethane foam, and is commercially available from various foam manufacturers and fabricators.
  • As shown in FIG. 1, the widths 25, 35, 45 of the three concentric rings 20, 30, 40 are all different. The inner concentric ring 40 has the widest width 45, while the middle concentric ring 30 has the smallest width 35. However, the widths could all be the same, or some could be the same and some different. In addition, the location of the widest and narrowest concentric rings could be varied.
  • There is a gap 50 between concentric rings 20 and 30, and a gap 55 between concentric rings 30 and 40. The gap is typically in the range of about 1/16 in. to about ⅛ in., but it can be smaller or larger, if desired.
  • FIG. 2 shows another embodiment of the buffing pad 105. In this embodiment, buffing surface 110 of the resilient foam pad 115 includes three concentric rings 120, 130, 140 of resilient foam. As shown in FIG. 2, the widths 125, 135, 145 of the three concentric rings 120, 130, 140 are all different. The widest concentric ring is 120 and the narrowest is 140. There is a gap 150 between concentric rings 120 and 130, and a gap 155 between concentric rings 130 and 140.
  • FIG. 3 shows a third embodiment of the buffing pad 205. The buffing surface 210 of the resilient foam pad 215 includes two concentric rings, 220, 230. The width 225 of concentric ring 220 is about the same as the width 235 of concentric ring 230. There is a gap 255 between concentric rings 220 and 230.
  • FIG. 4 shows a cross-section of one embodiment of the buffing pad 205 of FIG. 3. The buffing surface 210 is on one side of the resilient foam pad 215 and the attachment surface 265 is on the other side of the resilient foam pad 215.
  • In this embodiment, the two concentric rings 220, 230 have the same thickness 227, 237. There is a gap 255 between the concentric rings 220 and 230.
  • There is a pad support 270 with a first surface 275 and a second surface 280. The first surface 275 of the pad support 270 is secured to the attachment surface 265 of the resilient foam pad 215. The second surface 280 of the pad support 270 has a releasable connector 285. The releasable connector can be attached to the second surface 280 of the pad support 270. Alternatively, the releasable connector can form the pad support, if desired. Suitable releasable connectors include, but are not limited to, hook and loop connectors. One part of the releasable connector is on the pad support, while the complementary connector is on the backing plate of the buffing machine (not shown).
  • A radius 290 can be formed on the outer edge of the resilient foam pad 215 to enhance buffing and engagement characteristics, if desired.
  • FIGS. 5 and 6 show alternative embodiments in which the thickness of the concentric rings varies. In FIG. 5, the thickness 237 of concentric ring 230 is greater than the thickness 227 of concentric ring 220, while in FIG. 6, the thickness 227 of concentric ring 220 is greater than the thickness 237 of concentric ring 230.
  • The buffing pads can be made by cutting foam pad into concentric rings having the desired size. The concentric rings can be made of the same foam material, or they can be made of different foam materials, if desired. The concentric rings are arranged on the pad support with a gap between them and secured to it, generally with an adhesive. The concentric rings are typically permanently secured to the pad support, although they could be releasably secured, if desired. The pad support can have a connector attached to the other side, either before or after the concentric rings are attached. The outer edge of the foam pad can be ground into a radius, if desired.
  • Although embodiments with two or three concentric rings have been shown, more rings can be used, if desired. There can be two or more concentric rings.
  • The buffing pad can be dual-sided, if desired. For example, two buffing pads could be used with the pad supports back to back, as shown in FIG. 8. There could be a center mounting ring so that the dual-sided buffing pad can be attached to the buffing machine. The pad supports could be secured to one another, such as with adhesive, hook and loop connectors, etc., as is well known in the art. Alternatively, two resilient foam pads could be attached to a single pad support, as shown in FIG. 7. There could be a center mounting ring for attachment to the buffing machine. Other arrangements for dual-sided buffing pads are well-known to those of skill in the art.
  • EXAMPLE 1
  • Buffing pads were made according to the present invention with two concentric rings. The inner ring was 4½ in. in diameter with a ⅞ in. centering hole (1 13/16 in. width) and 1¼ in. thick. The outer ring was 8 in. in diameter (1¾ in. width) and 1¼ in. thick. Both the inner ring and the outer ring were made of open cell, polyurethane foam pad.
  • The buffing pads were tested and compared to two commercially available foam pads. Each set of pads was tested with the same compounds and glazes, and each pad was evaluated for scratch removal/surface clean-up and gloss level. The testing was conducted on panels sprayed with basecoat and clearcoat. The clearcoat was allowed to air dry for 16 hrs. on one panel and for more than 48 hrs. on another panel. Each panel was sanded with 1500 grit sandpaper on a dual action (DA) sander, wet 1500 grit sandpaper by hand, and wet 3000 grit sandpaper on a DA sander. Each sanded area was buffed with the pads and compounds and glazes, and the pad performance was evaluated.
  • The buffing pads of the present invention showed improved cutting capability, control, finished surface, and gloss level as compared to the two commercially available buffing pads.
  • When pressure is applied to the buffing pad of the present invention, the pad opens up, creating a larger buffing surface. More cutting action is created by having this larger buffing surface, therefore effectively removing any sand scratches or imperfections in the paint or clearcoat. As pressure is released, the pad flattens out. This flattened surface is the ideal buffing surface to provide a swirl-free, high gloss finish. The pad of the present invention provides a user with a buffing pad that can remove sandscratches and imperfections, while providing a clean, high gloss finish.
  • It will be obvious to those skilled in the art that various changes may be made without departing from the scope of the invention which is not to be considered limited to what is described in the specification.

Claims (21)

1. A buffing pad comprising:
a pad support having a first surface and a second surface;
a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
2. The buffing pad of claim 1 wherein the resilient foam pad comprises at least three separate concentric rings of resilient foam.
3. The buffing pad of claim 1 wherein the concentric rings are made of different types of resilient foam.
4. The buffing pad of claim 1 wherein the concentric rings are made of the same type of resilient foam.
5. The buffing pad of claim 1 wherein the resilient foam pad is permanently secured to the first surface of the pad support.
6. The buffing pad of claim 1 wherein the second surface of the pad support has a connector selected from hooks or loops.
7. The buffing pad of claim 1 wherein an outer edge of the buffing surface of the resilient foam pad has a radius.
8. The buffing pad of claim 1 wherein the concentric rings have different thicknesses.
9. The buffing pad of claim 1 wherein the concentric rings have the same thickness.
10. The buffing pad of claim 1 wherein the concentric rings have different widths.
11. The buffing pad of claim 1 further comprising a second resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the second resilient foam pad secured to the second surface of the pad support, the second resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.
12. A buffing pad comprising:
a pair of a pad supports having a first surface and a second surface;
a pair of resilient foam pads having an attachment surface and a buffing surface, the attachment surface of the pair of resilient foam pads secured to the first surface of the pair of pad supports, the pair of resilient foam pads comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween,
wherein the second surfaces of the pair of pad supports are secured to each other.
13. A method of making a buffing pad comprising:
providing a pad support having a first surface and a second surface;
providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface;
positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and
securing the attachment surface of the concentric rings to the first surface of the pad support.
14. The method of claim 13 wherein the concentric rings are permanently secured to the first surface of the pad support.
15. The method of claim 13 wherein the concentric rings are made of different types of resilient foam.
16. The method of claim 13 further comprising attaching a connector to the second surface of the pad support, the connector selected from hooks or loops.
17. The method of claim 13 further comprising forming a radius on an outer edge of the buffing surface of the outer concentric ring.
18. The method of claim 13 wherein the concentric rings have different thicknesses.
19. The method of claim 13 wherein the concentric rings have different widths.
20. The method of claim 13 further comprising:
providing at least two second concentric rings of resilient foam, the second concentric rings having an attachment surface and a buffing surface;
positioning the second concentric rings on the second surface of the pad support so that there is a gap between the concentric rings; and
securing the attachment surface of the second concentric rings to the second surface of the pad support.
21. The method of claim 13 further comprising;
providing a second buffing pad, the second buffing pad comprising:
a second pad support having a first surface and a second surface; and
a second resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the second resilient foam pad secured to the first surface of the second pad support, the second resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween; and
securing the second surface of the pad support to the second surface of the second pad support.
US11/369,216 2006-03-06 2006-03-06 Polishing pad and method of making Abandoned US20070204420A1 (en)

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US20080254725A1 (en) * 2007-04-10 2008-10-16 Henning Lee A Quick mount adapter and backing plate surface care system and apparatus
WO2011059935A1 (en) 2009-11-12 2011-05-19 3M Innovative Properties Company Rotary buffing pad
US20150158149A1 (en) * 2013-12-09 2015-06-11 Saint-Gobain Abrasives, Inc. Abrasive article
US20170120416A1 (en) * 2015-10-30 2017-05-04 Applied Materials, Inc. Apparatus and method of forming a polishing article that has a desired zeta potential
US9914197B2 (en) 2013-12-09 2018-03-13 Saint-Gobain Abrasives, Inc. Abrasive assembly having alignment elements
US11446788B2 (en) 2014-10-17 2022-09-20 Applied Materials, Inc. Precursor formulations for polishing pads produced by an additive manufacturing process
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11524384B2 (en) 2017-08-07 2022-12-13 Applied Materials, Inc. Abrasive delivery polishing pads and manufacturing methods thereof
US11685014B2 (en) 2018-09-04 2023-06-27 Applied Materials, Inc. Formulations for advanced polishing pads
US11724362B2 (en) 2014-10-17 2023-08-15 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US11772229B2 (en) 2016-01-19 2023-10-03 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11851570B2 (en) 2019-04-12 2023-12-26 Applied Materials, Inc. Anionic polishing pads formed by printing processes
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
US11958162B2 (en) 2020-01-17 2024-04-16 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes

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US8029340B2 (en) 2007-04-10 2011-10-04 D.C. Henning, Inc. Quick mount adapter and backing plate surface care system and apparatus
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WO2011059935A1 (en) 2009-11-12 2011-05-19 3M Innovative Properties Company Rotary buffing pad
US9914199B2 (en) * 2013-12-09 2018-03-13 Saint-Gobain Abrasives, Inc. Abrasive disc
US20150158149A1 (en) * 2013-12-09 2015-06-11 Saint-Gobain Abrasives, Inc. Abrasive article
US9914197B2 (en) 2013-12-09 2018-03-13 Saint-Gobain Abrasives, Inc. Abrasive assembly having alignment elements
US11724362B2 (en) 2014-10-17 2023-08-15 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US11446788B2 (en) 2014-10-17 2022-09-20 Applied Materials, Inc. Precursor formulations for polishing pads produced by an additive manufacturing process
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10618141B2 (en) * 2015-10-30 2020-04-14 Applied Materials, Inc. Apparatus for forming a polishing article that has a desired zeta potential
US20170120416A1 (en) * 2015-10-30 2017-05-04 Applied Materials, Inc. Apparatus and method of forming a polishing article that has a desired zeta potential
US11772229B2 (en) 2016-01-19 2023-10-03 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11524384B2 (en) 2017-08-07 2022-12-13 Applied Materials, Inc. Abrasive delivery polishing pads and manufacturing methods thereof
US11685014B2 (en) 2018-09-04 2023-06-27 Applied Materials, Inc. Formulations for advanced polishing pads
US11851570B2 (en) 2019-04-12 2023-12-26 Applied Materials, Inc. Anionic polishing pads formed by printing processes
US11958162B2 (en) 2020-01-17 2024-04-16 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ

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