US20070034515A1 - Radiation- or thermally-curable oxetane barrier sealants - Google Patents

Radiation- or thermally-curable oxetane barrier sealants Download PDF

Info

Publication number
US20070034515A1
US20070034515A1 US11/502,707 US50270706A US2007034515A1 US 20070034515 A1 US20070034515 A1 US 20070034515A1 US 50270706 A US50270706 A US 50270706A US 2007034515 A1 US2007034515 A1 US 2007034515A1
Authority
US
United States
Prior art keywords
oxetane
group
electrophoretic device
accordance
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/502,707
Inventor
Shengqian Kong
Stijn Gillissen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel AG and Co KGaA
Original Assignee
National Starch and Chemical Investment Holding Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Starch and Chemical Investment Holding Corp filed Critical National Starch and Chemical Investment Holding Corp
Priority to US11/502,707 priority Critical patent/US20070034515A1/en
Assigned to NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORP. reassignment NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORP. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: GILLISSEN, STIJN, KONG, SHENGQIAN
Publication of US20070034515A1 publication Critical patent/US20070034515A1/en
Priority to US12/179,924 priority patent/US7887716B2/en
Assigned to HENKEL KGAA reassignment HENKEL KGAA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: INDOPCO, INC., NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION
Assigned to HENKEL AG & CO. KGAA reassignment HENKEL AG & CO. KGAA CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). Assignors: HENKEL KGAA
Abandoned legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16Cyclic ethers having four or more ring atoms
    • C08G65/18Oxetanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D69/00Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Definitions

  • This invention relates to barrier sealants, adhesives, encapsulants, and coatings for use in electronic and optoelectronic devices.
  • adhesives, sealants, encapsulants, and coatings are similar materials, all having adhesive, sealant, and coating properties and functions. When any one is recited, the others are deemed to be included.
  • Radiation curable materials have found increased use as coatings, adhesives, and sealants over the past three decades for reasons including low energy consumption during cure, rapid cure speed through both radical and cationic mechanisms, low curing temperature, wide availability of curable materials, and the availability of solvent-free products. These benefits have made such products especially suited for rapidly adhering and sealing electronic and optoelectronic devices that are temperature sensitive or cannot conveniently withstand prolonged curing times. Optoelectronic devices particularly are often thermally sensitive and may need to be optically aligned and spatially immobilized through curing in a very short time period.
  • a common approach is to seal the device between an impermeable substrate on which it is positioned and an impermeable glass or metal lid, and seal or adhere the perimeter of the lid to the bottom substrate using a radiation curable adhesive or sealant.
  • FIG. 1 A common manifestation of this package geometry is exemplified in FIG. 1 , which discloses the use of a radiation curable perimeter sealant ( 1 ) to bond a metal or glass lid ( 2 ) over an organic light emitting diode (OLED) stack ( 3 ) fabricated on a glass substrate ( 4 ).
  • OLED organic light emitting diode
  • a typical device also contains an anode ( 5 ), a cathode ( 6 ), and some form of electrical interconnect between the OLED pixel/device and external circuitry ( 7 ).
  • no particular device geometry is specified or required aside from one which incorporates an adhesive/sealant material such as a perimeter sealant ( 1 ).
  • both the glass substrate and the metal/glass lid are essentially impermeable to oxygen and moisture, and the sealant is the only material that surrounds the device with any appreciable permeability.
  • moisture permeability is very often more critical than oxygen permeability; consequently, the oxygen barrier requirements are much less stringent, and it is the moisture barrier properties of the perimeter sealant that are critical to successful performance of the device.
  • Good barrier sealants will exhibit low bulk moisture permeability, good adhesion, and strong interfacial adhesive/substrate interactions. If the quality of the substrate to sealant interface is poor, the interface may function as a weak boundary, which allows rapid moisture ingress into the device regardless of the bulk moisture permeability of the sealant. If the interface is at least as continuous as the bulk sealant, then the permeation of moisture typically will be dominated by the bulk moisture permeability of the sealant itself.
  • moisture permeability P
  • WVTR water vapor transmission rate
  • permeability coefficient e.g. g ⁇ mil/(100 in 2 ⁇ day ⁇ atm)
  • permeation coefficient e.g. g ⁇ mil/(100 in 2 ⁇ day) at a given temperature and relative humidity
  • D diffusion term
  • S solubility term
  • the solubility term reflects the affinity of the barrier for the permeant, and, in relation to water vapor, a low S term is obtained from hydrophobic materials.
  • the diffusion term is a measure of the mobility of a permeant in the barrier matrix and is directly related to material properties of the barrier, such as free volume and molecular mobility. Often, a low D term is obtained from highly crosslinked or crystalline materials (in contrast to less crosslinked or amorphous analogs). Permeability will increase drastically as molecular motion increases (for example as temperature is increased, and particularly when the T g of a polymer is exceeded).
  • the attainment of lower molecular mobility within the cured matrix is approached through high crosslink density, microcrystallinity, or close packing of molecular backbones between the crosslinked portions of the matrix.
  • FIG. 1 is a perimeter sealed optoelectronic device.
  • the inventors have discovered that certain resin and resin/filler systems provide superior barrier performance, particularly to moisture, through the incorporation of an oxetane resin and a cationic initiator into the barrier composition.
  • the oxetane resin in general will have the structure in which R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester groups.
  • Such barrier materials may be used alone or in combination with other curable resins and various fillers.
  • compositions exhibit a commercially acceptable cure rate, a balance of high crosslink density and molecular packing (low permeant mobility/diffusivity term, D), hydrophobicity (low water solubility term, S), and adhesion (strong adhesive/substrate interfaces) to make them effective for use in sealing and encapsulating electronic, optoelectronic, and MEMS devices.
  • D permeant mobility/diffusivity term
  • S low water solubility term
  • adhesion strong adhesive/substrate interfaces
  • This invention is a cationically curable barrier sealant consisting essentially of (a) an oxetane compound and (b) a cationic initiator.
  • the barrier adhesive or sealant optionally contains (c) one or more fillers and optionally, (d) one or more adhesion promoters or one or more epoxy resins.
  • one or more epoxy resins are selected from the group consisting of bisphenol F diglycidyl ether, resorcinol diglycidyl ether, novolac glycidyl ethers, halogenated glycidyl ethers, naphthalene diglycidyl ether, and cycloaliphatic epoxies.
  • the use of the cationic initiators results in a radiation-curable formulation; however, the use of a cationic catalyst that can trigger polymerization at room or elevated temperatures may be used for thermal cure.
  • the resulting compositions are suitable for use in sealing and encapsulating electronic and optoelectronic devices.
  • actinic radiation is defined as electromagnetic radiation that induces a chemical change in a material, and for purposes within this specification will also include electron-beam curing. In most cases electromagnetic radiation with wavelengths in the ultraviolet (UV) and/or visible regions of the spectrum are most useful.
  • UV radiation ultraviolet
  • optoelectronic devices are defined broadly as those which involve optical and/or electrical input or output signals.
  • Non limiting examples of optoelectronic devices include organic light emitting diode (OLED) displays, OLED microdisplays, liquid crystal displays (LCD), electrophoretic displays, plasma displays, microelectromechanical (MEMS) devices, liquid crystal-on silicon (LCOS) devices, photovoltaic cells, charge coupled device (CCD) sensors, and ceramic-metal oxide semiconductor (CMOS) sensors.
  • OLED organic light emitting diode
  • LCD liquid crystal displays
  • MEMS microelectromechanical
  • LCOS liquid crystal-on silicon
  • CCD charge coupled device
  • CMOS ceramic-metal oxide semiconductor
  • oxetane compound refers to any small molecule, oligomer, or polymer carrying an oxetane functionality.
  • the oxetane compound in general will have the structure in which R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester, thio-ester, and sulfide groups.
  • the oxetane compounds are selected from the group of oxetane compounds having the structures:
  • the oxetane compound will have an aromatic core, onto which aromatic core are substituted in a meta-position with each other, the oxetane functionality and an additional polymerizable functionality.
  • the oxetane compound will have the structure: in which R 7 , R 8 , R 9 , R 10 and R 11 are independently selected from the group consisting hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; n is 0, 1, 2, 3, or 4; Z is a cationically reactive functionality selected from the group consisting of
  • Exemplary oxetane compounds meeting the above description include, but are not limited to,
  • the oxetane compound is a hybrid compound having both oxetane and a second reactive functionality extending from a cycloaliphatic backbone.
  • such compounds will have the structure in which L, L′, L′′ and L′′′ are linking groups selected from the group consisting of:
  • X can be attached to the cycloaliphatic backbone by a direct bond or can be a part of the cycloaliphatic backbone.
  • exemplary embodiments of the cycloaliphatic hybrid compounds include, but are not limited to,
  • cycloaliphatic or alicyclic refer generally to a class of organic compounds containing carbon and hydrogen atoms joined to form one or more rings, which may contain other atoms, such as, halogens (e.g. Cl, Br, I), substituent atoms (e.g. O, S, N), or substituent groups (e.g. OR, SR, NR 2 in which R is a linear or branched alkyl or cycloalkyl or aryl group).
  • cycloaliphatic resins are defined as resins that contain a cyclic carbon-based ring structure in their backbone, which cyclic carbon backbone may have heteroatoms within the backbone or attached to it. It is preferable that the cycloaliphatic resin backbone be composed primarily of carbon, hydrogen and halogen atoms.
  • an initiator for the inventive radiation curable barrier materials is familiar to those skilled in the art of radiation curing.
  • the curing initiator be a photoinitiator.
  • the selection of an appropriate photoinitiator is highly dependent on the specific application in which the barrier sealant is to be used.
  • a suitable photoinitiator is one that exhibits a light absorption spectrum that is distinct from that of the resins, fillers, and other additives in the radiation curable system. If the sealant must be cured through a cover or substrate, the photoinitiator will be one capable of absorbing radiation at wavelengths for which the cover or substrate is transparent.
  • the photoinitiator must have significant UV absorbance above ca. 320 nm. UV radiation below 320 nm will be absorbed by the sodalime glass coverplate and not reach the photoinitiator.
  • Exemplary photoinitiators are disclosed in Ionic Polymerizations and Related processes, 45-60, 1999, Kluwer Academic Publishers; Netherlands; J. E. Puskas et al. (eds.).
  • Preferred cationic photoinitiators include diaryliodonium salts and triarylsulfonium salts.
  • Well known commercially available examples include UV9380C (GE Silicones), PC2506 (Polyset), SR1012 (Sartomer), Rhodorsil 2074 (Rhodia), and UVI-6974 (Dow).
  • Preferred sensitizers for diaryliodonium salts are isopropylthioxanthone (referred to herein as ITX, often sold as a mixture of 2- and 4-isomers) and 2-chloro-4-propoxythioxanthone.
  • ITX isopropylthioxanthone
  • 2-chloro-4-propoxythioxanthone 2-chloro-4-propoxythioxanthone.
  • catalysts include Br ⁇ nsted acids, Lewis acids, and latent thermal acid generators. Representative examples of Br ⁇ nsted and Lewis acids may be found in literature sources such as Smith, M. B. and March, J. in March's Advanced Organic Chemistry, Reactions, Mechanisms, and Structures, 5 th Edition, 2001, John Wiley & Sons, Inc., New York, N.Y. pp. 327-362.
  • latent thermal acid generators include, but not limited to, diaryliodonium salts, benzylsulfonium salts, phenacylsulfonium salts, N-benzylpyridinium salts, N-benzylpyrazinium salts, N-benzylammonium salts, phosphonium salts, hydrazinium salts, ammonium borate salts, etc.
  • Common fillers include, but are not limited to ground quartz, fused silica, amorphous silica, talc, glass beads, graphite, carbon black, alumina, clays, mica, vermiculite, aluminum nitride, and boron nitride.
  • Metal powders and flakes consisting of silver, copper, gold, tin, tin/lead alloys, and other alloys are contemplated.
  • Organic filler powders such as poly(tetrachloroethylene), poly(chlorotriflouroethylene), and poly(vinylidene chloride) may also be used.
  • Fillers that act as desiccants or oxygen scavengers including but not limited to, CaO, BaO, Na 2 SO 4 , CaSO 4 , MgSO 4 , zeolites, silica gel, P 2 O 5 , CaCl 2 , and Al 2 O 3 may also be utilized.
  • Example 2 The reaction conditions of Example 1 were adopted except 25.0 g ⁇ , ⁇ ′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g ⁇ , ⁇ ′-dibromo-m-xylene (0.095 mol).
  • Example 2 The reaction conditions of Example 1 were adopted except 34.1 g 3-ethyl-3-hydroxymethyl-oxetane (0.29 mol) was used instead of 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol).
  • Example 3 The reaction conditions of Example 3 were adopted except 25.0 g ⁇ , ⁇ ′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g ⁇ , ⁇ ′-dibromo-m-xylene (0.095 mol).
  • oxetane from example 3 a photoinitiating system (cationic photoinitiator and ITX) were placed in a plastic jar and mixed with a vortex mixer for one hour until clear. Micron sized silica and a nanosilica rheology modifier were then added to the jar and the whole sample was mixed for another hour with the vortex mixer. The resulting paste was further mixed with a ceramic three-roll mill and degassed in a vacuum chamber. The components and parts by weight are disclosed in Table 1.
  • Adhesion performance was tested by applying two pieces of tape ( ⁇ 5 mils) approximately a quarter of an inch apart on TEFLON coated aluminum plates. Using a blade, the formulation was drawn into a film between the tapes. The glass slides and the dies were wiped clean with isopropanol and sonicated for ten minutes in isopropanol. The slides and dies were removed from the isopropanol and air-dried followed by 5 min UV ozone cleaning. The dies were then placed in the film of formulation and slightly tapped to wet out the entire die. The dies were picked from the formulation coating and placed onto the slides. The dies were slightly tapped to allow the formulation to wet out between the die and the slide.
  • the sealant formulations were cured in a Dymax UV curing unit with 3.3 J UVA.
  • the shear adhesion of the cured samples was tested using a Royce Instrument 552 100K equipped with 100 kg head and 300 mil die tool. The adhesion was found to be 44.7 ⁇ 1.6 kg.
  • the cationically curable barrier composition will further consist essentially of an adhesion promoter, preferably a silane adhesion promoter.
  • an adhesion promoter preferably a silane adhesion promoter.
  • the effect of the addition of a silane adhesion promoter was investigated by adding 3.5 wt % Silquest A-186 silane (based on the total formulation) to the formulation in Table 1. Moisture permeation of the cured sample (3.3 J UVA) was found to be 3.1 g ⁇ mil/100 in 2 ⁇ day and the die shear was 17.0 ⁇ 4.0 kg, sufficient for some commercial applications.
  • Oxetane resins may be combined with platelet fillers such as talc in order to reduce moisture permeability.
  • a formulation was prepared similarly to Example 5. The components and parts by weight are disclosed in Table 2. After curing with 6.0 J UVA, the permeation coefficient was 4.2 g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity. TABLE 2 BARRIER SEALANT #2 COMPONENT PARTS BY WEIGHT Oxetane in Example 3 58.8 Photoinitiator 1.2 ITX 0.2 Filler: Vertal 410 talc 39.8 Total: 100.0
  • This liquid (40.0 g, 0.19 mol) was combined with allyl bromide (36.3 g, 0.3 mol), NaOH (12.0 g, 0.3 mol), tetrabutylammonium bromide (0.82 g, 0.0025 mol), and 100 mL toluene in a four-neck, 1000 mL round bottom flask equipped with a mechanical stirrer and condenser.
  • the reaction was heated to 65° C. with stirring, and the color changed from brown to orange within ten minutes. Heating and stirring were continued overnight. Finally, the solid was filtered off and toluene was removed to give the allylated oxetane product, which was purified by vacuum distillation.
  • Epoxidation of the allylated oxetane was conducted by combining 17.5 g (0.1 mol) of 3-chloroperoxybenzoic acid in 225 mL of dichloromethane in a four-neck, 500 mL round bottom flask equipped with a mechanical stirrer and thermometer. The flask was chilled to 0° C. in an ice/water bath, and 20.5 g of the above allylated oxetane product dissolved in 50 mL of CH 2 Cl 2 was added dropwise over 2.5 hours. The flask was warmed to room temperature one hour later, and stirring continued for three days. The solid was filtered off to obtain a clear, orange liquid. The CH 2 Cl 2 solution was washed with saturated NaHCO 3 solution in water and then three times with water.
  • This product was mixed with a photoinitiating system (2.0 wt % cationic photoinitiator SR1 012 and 0.12% ITX) and cured with 3.3 J UVA. Permeation of the cured film was 6.3 g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity.
  • the resin was combined with a photoinitiating system (2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX).
  • a photoinitiating system 2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX.
  • the formulation cured well and the moisture permeation coefficient was 6.6 mil ⁇ g/100 in 2 ⁇ day at 50° C., 100% relative humidity.
  • the oxetanes in Examples 1 to 4 were each blended with a photoinitiating system (2 wt % photoinitiator GE 9380C) and cured with 6.0 J UVA followed by annealing at 175° C. for one hour.
  • the permeation coefficient of the cured films were measured and are reported in Table 3.
  • the meta-substituted oxetanes in examples 1 and 3 are better moisture barrier materials than their para-substituted counterparts, examples 2 and 4.
  • the permeation coefficient of a 50/50 (wt/wt) solution of the oxetane in example 3 and an aromatic epoxy (EPON 862) using a photoinitiating system of 2 wt % cationic photoinitiator (UV 9380C) was compared with the permeation coefficient of the oxetane in example 4. Again, the meta-substituted oxetane formulation resulted in lower permeation coefficient. As shown in table 3, one may also tailor the moisture barrier performance of the cured samples by choosing different epoxies.
  • brominated BPADGE is brominated bisphenol A diglycidyl ether and has the structure: TABLE 3 PERMEATION COEFFICIENT (g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity) OF VARIOUS FORMULATIONS 50/50 50/50 50/50 (WT) (WT) WITH (WT) WITH WITH BY EPON EPON BROMINATED OXETANE ITSELF 862 828 BPADGE Oxetane in 7.0 — — — example 1 Oxetane in 9.4 — — — example 2 Oxetane in 5.9 6.2 — — example 3 Oxetane in 9.5 10.5 11.0 9.1 example 4 EPON 862 has the structure: EPON 828 has the structure: EPON 828 has the structure: EPON 828 has the structure:
  • Oxetanes may be blended with diluents, such as vinyl ethers, in UV curable cationic formulations.
  • diluents such as vinyl ethers
  • a cycloaliphatic vinyl ether (CAVE) having the below structure was used as a reactive diluent and the resulting formulation exhibited a very low moisture permeation coefficient.
  • CAVE cycloaliphatic vinyl ether
  • Oxetane/epoxy resin mixtures may also be blended with diluents, such as vinyl ethers or alcohols in UV curable cationic formulations.
  • diluents such as vinyl ethers or alcohols
  • the formulation and results are reported in Table 6. Cure speed was measured with a Perkin Elmer Differential Scanning Calorimetry 7 equipped with a UV light source.
  • UV cure speed and the reactivity of a perimeter sealant is critical to production throughput, and the minimization of thermal processing is generally required for many display applications.
  • UV curing kinetics and thermodynamics can be measured using differential photocalorimetry (“photo DSC”).
  • photo DSC differential photocalorimetry
  • the cure speed for a series of oxetane/epoxy/talc formulations with various oxetane/epoxy ratios are reported in Table 7.
  • Differential photocalorimetry was performed on the samples using a Perkin-Elmer Differential Scanning Calorimeter 7 equipped with a Hg-arc lamp UV light source. All samples were cured through an indium/tin oxide (ITO)-coated sodalime glass.
  • ITO indium/tin oxide
  • Each of the resin combinations contains oxetane (OXT-121, Toagosei), EPON 862 aromatic epoxy, 35 wt % talc (Mistrofil P403 talc), and a photoinitiating system of 2.0 wt % cationic photoinitiator (SR1012), and 0.21 wt % ITX (all based on total weight).
  • OXT-121 Toagosei
  • EPON 862 aromatic epoxy 35 wt % talc
  • Mistrofil P403 talc 35 wt % talc
  • SR1012 wt % cationic photoinitiator
  • ITX 0.21 wt % ITX
  • a series of oxetane (OXT-121) and epoxy (EPON 862) resin blends were prepared and cured by heat.
  • the oxetane and epoxy blends at different weight ratios were polymerized using DSC ramp from room temperature to 300° C. at 10° C./min.
  • Each sample contained 2.0% cationic photoinitiator (SR1012). The onset, peak temperatures and total heat of polymerization are reported in Table 10.

Abstract

This invention relates to cationically curable sealants that provide low moisture permeability and good adhesive strength after cure. The composition consists essentially of an electrophoretic device containing an oxetane compound and a photoinitiating system comprising and photoinitiator and optionally a photosensitizer.

Description

  • This invention is a continuation-in-part application of co-pending U.S. patent application Ser. No. 11/098,116, filed on Apr. 5, 2005.
  • This Invention was made with support from the Government of the United States of America under Agreement No. MDA972-93-2-0014 awarded by the Army Research Laboratories. The Government has certain rights in the Invention.
  • FIELD OF THE INVENTION
  • This invention relates to barrier sealants, adhesives, encapsulants, and coatings for use in electronic and optoelectronic devices. (As used in this specification and claims, adhesives, sealants, encapsulants, and coatings are similar materials, all having adhesive, sealant, and coating properties and functions. When any one is recited, the others are deemed to be included.)
  • BACKGROUND
  • Radiation curable materials have found increased use as coatings, adhesives, and sealants over the past three decades for reasons including low energy consumption during cure, rapid cure speed through both radical and cationic mechanisms, low curing temperature, wide availability of curable materials, and the availability of solvent-free products. These benefits have made such products especially suited for rapidly adhering and sealing electronic and optoelectronic devices that are temperature sensitive or cannot conveniently withstand prolonged curing times. Optoelectronic devices particularly are often thermally sensitive and may need to be optically aligned and spatially immobilized through curing in a very short time period.
  • Numerous optoelectronic devices are also moisture or oxygen sensitive and need to be protected from exposure during their functional lifetime. A common approach is to seal the device between an impermeable substrate on which it is positioned and an impermeable glass or metal lid, and seal or adhere the perimeter of the lid to the bottom substrate using a radiation curable adhesive or sealant.
  • A common manifestation of this package geometry is exemplified in FIG. 1, which discloses the use of a radiation curable perimeter sealant (1) to bond a metal or glass lid (2) over an organic light emitting diode (OLED) stack (3) fabricated on a glass substrate (4). Although various configurations exist, a typical device also contains an anode (5), a cathode (6), and some form of electrical interconnect between the OLED pixel/device and external circuitry (7). For the purposes of this invention, no particular device geometry is specified or required aside from one which incorporates an adhesive/sealant material such as a perimeter sealant (1).
  • In many configurations, as for the example in FIG. 1, both the glass substrate and the metal/glass lid are essentially impermeable to oxygen and moisture, and the sealant is the only material that surrounds the device with any appreciable permeability. For electronic and optoelectronic devices, moisture permeability is very often more critical than oxygen permeability; consequently, the oxygen barrier requirements are much less stringent, and it is the moisture barrier properties of the perimeter sealant that are critical to successful performance of the device.
  • Good barrier sealants will exhibit low bulk moisture permeability, good adhesion, and strong interfacial adhesive/substrate interactions. If the quality of the substrate to sealant interface is poor, the interface may function as a weak boundary, which allows rapid moisture ingress into the device regardless of the bulk moisture permeability of the sealant. If the interface is at least as continuous as the bulk sealant, then the permeation of moisture typically will be dominated by the bulk moisture permeability of the sealant itself.
  • It is important to note that one must examine moisture permeability (P) as the measure of effective barrier properties and not merely water vapor transmission rate (WVTR), as the latter is not normalized to a defined path thickness or path length for permeation. Generally, permeability can be defined as WVTR multiplied by permeation path length, and is, thus, the preferred way to evaluate whether a sealant is inherently a good barrier material.
  • The most common ways to express permeability are the permeability coefficient (e.g. g·mil/(100 in2·day·atm)), which applies to any set of experimental conditions, or the permeation coefficient (e.g. g·mil/(100 in2·day) at a given temperature and relative humidity), which must be quoted with the experimental conditions in order to define the partial pressure/concentration of permeant present in the barrier material. In general, the penetration of a permeant through some barrier material (permeability, P) can be described as the product of a diffusion term (D) and a solubility term (S): P=DS
  • The solubility term reflects the affinity of the barrier for the permeant, and, in relation to water vapor, a low S term is obtained from hydrophobic materials. The diffusion term is a measure of the mobility of a permeant in the barrier matrix and is directly related to material properties of the barrier, such as free volume and molecular mobility. Often, a low D term is obtained from highly crosslinked or crystalline materials (in contrast to less crosslinked or amorphous analogs). Permeability will increase drastically as molecular motion increases (for example as temperature is increased, and particularly when the Tg of a polymer is exceeded).
  • Logical chemical approaches to producing improved barriers must consider these two fundamental factors (D and S) affecting the permeability of water vapor and oxygen. Superimposed on such chemical factors are physical variables: long permeation pathways and flawless adhesive bondlines (good wetting of the adhesive onto the substrate), which improve barrier performance and should be applied whenever possible. The ideal barrier sealant will exhibit low D and S terms while providing excellent adhesion to all device substrates.
  • It is not sufficient to have only a low solubility (S) term or only a low diffusivity (D) term in order to obtain high performance barrier materials. A classic example can be found in common siloxane elastomers. Such materials are extremely hydrophobic (low solubility term, S), yet they are quite poor barriers due to their high molecular mobility due to unhindered rotation about the Si—O bonds (which produces a high diffusivity term (D). Thus, many systems that are merely hydrophobic are not good barrier materials despite the fact that they exhibit low moisture solubility. Low moisture solubility must be combined with low molecular mobility and, thus, low permeant mobility or diffusivity.
  • For liquid materials that are radiation cured to solid sealants, such as the inventive compositions, the attainment of lower molecular mobility within the cured matrix is approached through high crosslink density, microcrystallinity, or close packing of molecular backbones between the crosslinked portions of the matrix.
  • BRIEF DESCRIPTION OF THE DRAWING
  • FIG. 1 is a perimeter sealed optoelectronic device.
  • SUMMARY OF THE INVENTION
  • The inventors have discovered that certain resin and resin/filler systems provide superior barrier performance, particularly to moisture, through the incorporation of an oxetane resin and a cationic initiator into the barrier composition. The oxetane resin in general will have the structure
    Figure US20070034515A1-20070215-C00001

    in which R1, R2, R3, R4, R5, and R6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester groups. Such barrier materials may be used alone or in combination with other curable resins and various fillers. The resulting compositions exhibit a commercially acceptable cure rate, a balance of high crosslink density and molecular packing (low permeant mobility/diffusivity term, D), hydrophobicity (low water solubility term, S), and adhesion (strong adhesive/substrate interfaces) to make them effective for use in sealing and encapsulating electronic, optoelectronic, and MEMS devices.
  • DETAILED DESCRIPTION OF THE INVENTION
  • This invention is a cationically curable barrier sealant consisting essentially of (a) an oxetane compound and (b) a cationic initiator. The barrier adhesive or sealant optionally contains (c) one or more fillers and optionally, (d) one or more adhesion promoters or one or more epoxy resins. When one or more epoxy resins are present, they are selected from the group consisting of bisphenol F diglycidyl ether, resorcinol diglycidyl ether, novolac glycidyl ethers, halogenated glycidyl ethers, naphthalene diglycidyl ether, and cycloaliphatic epoxies. The use of the cationic initiators results in a radiation-curable formulation; however, the use of a cationic catalyst that can trigger polymerization at room or elevated temperatures may be used for thermal cure. The resulting compositions are suitable for use in sealing and encapsulating electronic and optoelectronic devices.
  • Within this specification, the term radiation is used to describe actinic electromagnetic radiation. Actinic radiation is defined as electromagnetic radiation that induces a chemical change in a material, and for purposes within this specification will also include electron-beam curing. In most cases electromagnetic radiation with wavelengths in the ultraviolet (UV) and/or visible regions of the spectrum are most useful.
  • For the purposes of this document optoelectronic devices are defined broadly as those which involve optical and/or electrical input or output signals. Non limiting examples of optoelectronic devices include organic light emitting diode (OLED) displays, OLED microdisplays, liquid crystal displays (LCD), electrophoretic displays, plasma displays, microelectromechanical (MEMS) devices, liquid crystal-on silicon (LCOS) devices, photovoltaic cells, charge coupled device (CCD) sensors, and ceramic-metal oxide semiconductor (CMOS) sensors.
  • Within this specification, the term oxetane compound refers to any small molecule, oligomer, or polymer carrying an oxetane functionality. The oxetane compound in general will have the structure
    Figure US20070034515A1-20070215-C00002

    in which R1, R2, R3, R4, R5, and R6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester, thio-ester, and sulfide groups. In one embodiment, the oxetane compounds are selected from the group of oxetane compounds having the structures:
    Figure US20070034515A1-20070215-C00003
  • In another embodiment, the oxetane compound will have an aromatic core, onto which aromatic core are substituted in a meta-position with each other, the oxetane functionality and an additional polymerizable functionality. In this embodiment, the oxetane compound will have the structure:
    Figure US20070034515A1-20070215-C00004

    in which R7, R8, R9, R10 and R11 are independently selected from the group consisting hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; n is 0, 1, 2, 3, or 4; Z is a cationically reactive functionality selected from the group consisting of
    • hydroxyl —OH
    • vinyl ether —O—CH═CH—R12
    • aliphatic epoxy
      Figure US20070034515A1-20070215-C00005

      and glycidyl ether
      Figure US20070034515A1-20070215-C00006

      cycloaliphatic epoxy, which includes, but is not limited to
      Figure US20070034515A1-20070215-C00007
      • in which R11 and R12 are selected from the group consisting of hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; and R13 is a linking group selected from the group consisting of alkyl, haloalkyl, aryl, ether, thio-ether, aryl ether, ester, thio-ester, silane, carbonate, or ketone.
  • Exemplary oxetane compounds meeting the above description include, but are not limited to,
    Figure US20070034515A1-20070215-C00008
  • In another embodiment the oxetane compound is a hybrid compound having both oxetane and a second reactive functionality extending from a cycloaliphatic backbone. In general, such compounds will have the structure
    Figure US20070034515A1-20070215-C00009

    in which L, L′, L″ and L′″ are linking groups selected from the group consisting of:
    Figure US20070034515A1-20070215-C00010
      • R is selected from the group consisting of linear alkyl, branched alkyl, cycloalkyl, aryl, heteroaryl, silane or siloxane groups, which optionally contain heteroatoms (such as O, S, and N); X is a reactive group independently selected from epoxies, selected from glycidyl epoxy, aliphatic epoxy, and cycloaliphatic epoxy; acrylate and methacrylate; itaconate; maleimide; vinyl, propenyl, crotyl, allyl, and propargyl ether and thio-ethers of those groups; maleate, fumarate, and cinnamate esters; styrenic; acrylamide and methacrylamide; chalcone; hydroxyl and thiol; allyl, alkenyl, and cycloalkenyl; n, k, and l equal 0 or 1; and y equals 1 to 10.
  • When n, k, and l in the above structures are 0, and X is a form of epoxy, X can be attached to the cycloaliphatic backbone by a direct bond or can be a part of the cycloaliphatic backbone. Exemplary embodiments of the cycloaliphatic hybrid compounds include, but are not limited to,
    Figure US20070034515A1-20070215-C00011
  • Within this specification, the terms cycloaliphatic or alicyclic refer generally to a class of organic compounds containing carbon and hydrogen atoms joined to form one or more rings, which may contain other atoms, such as, halogens (e.g. Cl, Br, I), substituent atoms (e.g. O, S, N), or substituent groups (e.g. OR, SR, NR2 in which R is a linear or branched alkyl or cycloalkyl or aryl group). In general, cycloaliphatic resins are defined as resins that contain a cyclic carbon-based ring structure in their backbone, which cyclic carbon backbone may have heteroatoms within the backbone or attached to it. It is preferable that the cycloaliphatic resin backbone be composed primarily of carbon, hydrogen and halogen atoms.
  • The selection of an initiator for the inventive radiation curable barrier materials is familiar to those skilled in the art of radiation curing. For photocuring, the curing initiator be a photoinitiator. The selection of an appropriate photoinitiator is highly dependent on the specific application in which the barrier sealant is to be used. A suitable photoinitiator is one that exhibits a light absorption spectrum that is distinct from that of the resins, fillers, and other additives in the radiation curable system. If the sealant must be cured through a cover or substrate, the photoinitiator will be one capable of absorbing radiation at wavelengths for which the cover or substrate is transparent. For example, if a barrier sealant is to be cured through a sodalime glass coverplate, the photoinitiator must have significant UV absorbance above ca. 320 nm. UV radiation below 320 nm will be absorbed by the sodalime glass coverplate and not reach the photoinitiator. In this example, it would be beneficial to include a photosensitizer with the photoinitiator into the photoinitiating system, to augment the transfer of energy to the photoinitiator.
  • Exemplary photoinitiators are disclosed in Ionic Polymerizations and Related processes, 45-60, 1999, Kluwer Academic Publishers; Netherlands; J. E. Puskas et al. (eds.). Preferred cationic photoinitiators include diaryliodonium salts and triarylsulfonium salts. Well known commercially available examples include UV9380C (GE Silicones), PC2506 (Polyset), SR1012 (Sartomer), Rhodorsil 2074 (Rhodia), and UVI-6974 (Dow). Preferred sensitizers for diaryliodonium salts are isopropylthioxanthone (referred to herein as ITX, often sold as a mixture of 2- and 4-isomers) and 2-chloro-4-propoxythioxanthone. The selection of an efficient cationic photoinitiating system for a particular curing geometry and resin system is known to those skilled in the art of cationic UV curing, and is not limited within the scope of this invention.
  • Less common initiating systems, such as thermally generated acids are also anticipated in cases where such catalysts, initiators, and curing agents are appropriate. Exemplary catalysts include Brφnsted acids, Lewis acids, and latent thermal acid generators. Representative examples of Brφnsted and Lewis acids may be found in literature sources such as Smith, M. B. and March, J. in March's Advanced Organic Chemistry, Reactions, Mechanisms, and Structures, 5th Edition, 2001, John Wiley & Sons, Inc., New York, N.Y. pp. 327-362. Examples of latent thermal acid generators include, but not limited to, diaryliodonium salts, benzylsulfonium salts, phenacylsulfonium salts, N-benzylpyridinium salts, N-benzylpyrazinium salts, N-benzylammonium salts, phosphonium salts, hydrazinium salts, ammonium borate salts, etc.
  • Common fillers include, but are not limited to ground quartz, fused silica, amorphous silica, talc, glass beads, graphite, carbon black, alumina, clays, mica, vermiculite, aluminum nitride, and boron nitride. Metal powders and flakes consisting of silver, copper, gold, tin, tin/lead alloys, and other alloys are contemplated. Organic filler powders such as poly(tetrachloroethylene), poly(chlorotriflouroethylene), and poly(vinylidene chloride) may also be used. Fillers that act as desiccants or oxygen scavengers, including but not limited to, CaO, BaO, Na2SO4, CaSO4, MgSO4, zeolites, silica gel, P2O5, CaCl2, and Al2O3 may also be utilized.
  • EXAMPLES Example 1 Synthesis of Oxethane, 3,3′-[1,3-Phenylenebis (Methyleneoxymethylene)]bis[3-Methyl-
  • Figure US20070034515A1-20070215-C00012
  • Into a 250 mL three-neck round bottom flask equipped with a reflux condenser, a mechanic stirrerwere added 12.0 g NaOH (0.3 mol), 0.6 g n-Bu4N+Br(0.0019 mol), 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol), 25.0 g α, α′-dibromo-m-xylene (0.095 mol), and 100 mL of toluene. The reaction was brought to 110° C. for 3.5 hours. The organic phase was collected by filtration and the solvents were removed. The light yellow crude product was redissolved in 200 mL of toluene and washed with deionized water three times. After drying over magnesium sulfate, the toluene solution was passed through a short column of neutral alumina to remove trace amount of the ammonium salt phase transfer catalyst. Finally, the solvents were removed with rotary evaporator and Kugelrohr and the sample was purified by distillation. 1H NMR (CDCl3): δppm 1.36 (6H), 3.56 (4H), 4.38-4.55 (8H), 4.60 (4H), 7.18-7.38 (4H).
  • Example 2 Synthesis of Oxetane, 3,3′-[1,4-phenylenebis(methyleneoxymethylene)]bis[3-methyl-
  • Figure US20070034515A1-20070215-C00013
  • The reaction conditions of Example 1 were adopted except 25.0 g α, α′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g α,α′-dibromo-m-xylene (0.095 mol). 1H NMR (CDCl3): δppm 1.36 (6H), 3.55 (4H), 4.37-4.55 (8H), 4.59 (4H), 7.36 (4H)
  • Example 3 Synthesis of Oxetane, 3,3′-[1,3-phenylenebis(methyleneoxymethylene)]bis[3-ethyl-
  • Figure US20070034515A1-20070215-C00014
  • The reaction conditions of Example 1 were adopted except 34.1 g 3-ethyl-3-hydroxymethyl-oxetane (0.29 mol) was used instead of 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol). 1H NMR (CDCl3): δppm 0.87-0.91 (6H), 1.77-1.83 (4H) 3.61 (4H), 4.40-4.49 (8H), 4.59 (4H), 7.28-7.38 (4H)
  • Example 4 Synthesis of Oxetane, 3,3′-[1,4-phenylenebis (methyleneoxymethelene)]bis[3-ethyl-
  • Figure US20070034515A1-20070215-C00015
  • The reaction conditions of Example 3 were adopted except 25.0 g α,α′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g α, α′-dibromo-m-xylene (0.095 mol). 1H NMR (CDCl3): δppm 0.89-0.92 (6H), 1.77-1.83 (4H) 3.61 (4H), 4.40-4.49 (8H), 4.58 (4H), 7.34 (4H).
  • Example 5 Oxetane-Based Barrier Sealant 1
  • The oxetane from example 3, a photoinitiating system (cationic photoinitiator and ITX) were placed in a plastic jar and mixed with a vortex mixer for one hour until clear. Micron sized silica and a nanosilica rheology modifier were then added to the jar and the whole sample was mixed for another hour with the vortex mixer. The resulting paste was further mixed with a ceramic three-roll mill and degassed in a vacuum chamber. The components and parts by weight are disclosed in Table 1.
    TABLE 1
    BARRIER SEALANT # 1
    COMPONENT PARTS BY WEIGHT
    Oxetane in Example 3 35.3
    Photoinitiator 0.7
    ITX 0.1
    Micron sized silica 63.1
    Nanosilica rheology modifier 0.9
    Total: 100.0
  • After the formulation was thoroughly mixed, 1-2 grams of formulation material were placed on a TEFLON coated aluminum plate. An eight-path variable scraper was used to cast an even thickness of film. The sample was then placed inside a Dymax stationary curing unit and cured for 70 seconds (3.3 J UVA) with a medium pressure mercury lamp. Irradiance on the sample surface was measured with a UV Power Puck high energy UV radiometer (EIT Inc., Sterling, Va.) and was found to be 47 (UVA), 32 (UVB), 3 (UVC), 35 (UVV) mW/cm2 respectively. Moisture permeation coefficient (50° C., 100% relative humidity) of the above film was measured with Mocon Permeatran 3/33 and was found to be 3.1 g·mil/100 in2·day.
  • Adhesion performance was tested by applying two pieces of tape (˜5 mils) approximately a quarter of an inch apart on TEFLON coated aluminum plates. Using a blade, the formulation was drawn into a film between the tapes. The glass slides and the dies were wiped clean with isopropanol and sonicated for ten minutes in isopropanol. The slides and dies were removed from the isopropanol and air-dried followed by 5 min UV ozone cleaning. The dies were then placed in the film of formulation and slightly tapped to wet out the entire die. The dies were picked from the formulation coating and placed onto the slides. The dies were slightly tapped to allow the formulation to wet out between the die and the slide. The sealant formulations were cured in a Dymax UV curing unit with 3.3 J UVA. The shear adhesion of the cured samples was tested using a Royce Instrument 552 100K equipped with 100 kg head and 300 mil die tool. The adhesion was found to be 44.7±1.6 kg.
  • In another embodiment, the cationically curable barrier composition will further consist essentially of an adhesion promoter, preferably a silane adhesion promoter. The effect of the addition of a silane adhesion promoter was investigated by adding 3.5 wt % Silquest A-186 silane (based on the total formulation) to the formulation in Table 1. Moisture permeation of the cured sample (3.3 J UVA) was found to be 3.1 g·mil/100 in2·day and the die shear was 17.0±4.0 kg, sufficient for some commercial applications.
  • Example 6 Oxetane-Based Barrier Sealant 2
  • Oxetane resins may be combined with platelet fillers such as talc in order to reduce moisture permeability. A formulation was prepared similarly to Example 5. The components and parts by weight are disclosed in Table 2. After curing with 6.0 J UVA, the permeation coefficient was 4.2 g·mil/100 in2·day at 50° C., 100% relative humidity.
    TABLE 2
    BARRIER SEALANT #2
    COMPONENT PARTS BY WEIGHT
    Oxetane in Example 3 58.8
    Photoinitiator 1.2
    ITX 0.2
    Filler: Vertal 410 talc 39.8
    Total: 100.0
  • Example 7 Synthesis and Performance of an Aromatic Epoxy-Oxetane Hybrid
  • Figure US20070034515A1-20070215-C00016
  • 3-Hydroxybenzyl alcohol (24.8 g, 0.2 mol), 3-methyl-3-bromomethyl oxetane (36.3 g, 0.22 mol), potassium carbonate fine powder (30.4 g, 0.22 mol), and 200 mL methyl ethyl ketone were combined in a four neck, 1000 mL round bottom flask equipped with a condenser and mechanical stirrer. The reaction was heated to 65° C. in an oil bath with stirring, and heating and stirring were continued for a total of five days. The solid was filtered off and the liquid portion was washed with 3% aqueous NaOH solution followed by water. Solvent removal by rotary evaporator gave a low viscosity liquid.
  • This liquid (40.0 g, 0.19 mol) was combined with allyl bromide (36.3 g, 0.3 mol), NaOH (12.0 g, 0.3 mol), tetrabutylammonium bromide (0.82 g, 0.0025 mol), and 100 mL toluene in a four-neck, 1000 mL round bottom flask equipped with a mechanical stirrer and condenser. The reaction was heated to 65° C. with stirring, and the color changed from brown to orange within ten minutes. Heating and stirring were continued overnight. Finally, the solid was filtered off and toluene was removed to give the allylated oxetane product, which was purified by vacuum distillation.
  • Epoxidation of the allylated oxetane was conducted by combining 17.5 g (0.1 mol) of 3-chloroperoxybenzoic acid in 225 mL of dichloromethane in a four-neck, 500 mL round bottom flask equipped with a mechanical stirrer and thermometer. The flask was chilled to 0° C. in an ice/water bath, and 20.5 g of the above allylated oxetane product dissolved in 50 mL of CH2Cl2 was added dropwise over 2.5 hours. The flask was warmed to room temperature one hour later, and stirring continued for three days. The solid was filtered off to obtain a clear, orange liquid. The CH2Cl2 solution was washed with saturated NaHCO3 solution in water and then three times with water.
  • The organic layer was collected and dried over sodium sulfate. The CH2Cl2 was removed by rotary evaporation. Purification by vacuum distillation gave 1.5 g of pure hybrid epoxy-oxetane product at 155° C./147 micron. This product was a clear, colorless liquid. 1H NMR (CDCl3): δppm 1.45 (3H), 2.61-2.82 (2H), 3.19 (1H), 3.43-3.80 (2H), 4.04 (2H), 4.45 (2H), 4.46-4.58 (2H), 4.624.64 (2H), 6.86-6.95 (3H), 7.25-7.29 (1H). This product was mixed with a photoinitiating system (2.0 wt % cationic photoinitiator SR1 012 and 0.12% ITX) and cured with 3.3 J UVA. Permeation of the cured film was 6.3 g·mil/100 in2·day at 50° C., 100% relative humidity.
  • Example 8 Synthesis and Performance of a Cycloaliphatic Epoxy-Oxetane Hybrid
  • Figure US20070034515A1-20070215-C00017
  • A four-neck, 500 mL round bottom flask equipped with mechanical stirrer and condenser was charged with 150.0 g (0.2 mol) hydroxycyclopentadiene (TCI America), 165.0 g (0.24 mol) 3-methyl-3-bromomethyl oxetane (Chemada), 9.6 g (0.24 mol) sodium hydroxide, 0.64 g (1.0 mol %) tetrabutylammonium bromide (TBAB), and 100 mL toluene. The reaction mixture was heated at 80° C. in an oil bath for two hours, and the temperature was then increased to 110° C. for 24 hours. An additional 26.4 g (0.16 mol) 3-methyl-3-bromomethyl oxetane, 6.4 g (0.16 mol) sodium hydroxide, and 0.64 g TBAB were added and stirring continued for 24 hours. The mixture was filtered and toluene was removed by rotary evaporation, and the oxetane product was separated by vacuum distillation.
  • Next, 13.8 g (0.061 mol) of 77% m-chloroperoxybenzoic acid (mCPBA) and 200 mL dichloromethane were combined to form a 0.4 M solution in a 500 mL round bottom flask equipped with mechanical stirrer and thermometer, and chilled to 0° C. in an ice/water bath. Using an additional funnel, 12.3 g (0.0525 mol) above oxetane product dissolved in 65 mL dichloromethane was added dropwise to the mCPBA solution over 1.5 hours. The mixture was warmed to room temperature and allowed to stir for another 24 hours.
  • After the reaction, the mixture was filtered, and the dichloromethane solution was washed with 70 mL saturated NaHCO3 solution, and then with 70 mL water three times. The organic layer was collected and dried over sodium sulfate, and the dichloromethane was removed by rotary evaporation. Vacuum distillation gave the desired product as a colorless liquid in 10.5% yield. 1H NMR (CDCl3): δppm 1.29 (3H), 1.27-2.32 (11H), 3.24-3.41 (2H), 3.43-3.50 (2H), 4.32-4.34 (2H), 4.464.50 (2H). The resin was combined with a photoinitiating system (2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX). The formulation cured well and the moisture permeation coefficient was 6.6 mil·g/100 in2·day at 50° C., 100% relative humidity.
  • Example 9 Effect of Aromatic Substitution on Permeation Coefficient
  • The oxetanes in Examples 1 to 4 were each blended with a photoinitiating system (2 wt % photoinitiator GE 9380C) and cured with 6.0 J UVA followed by annealing at 175° C. for one hour. The permeation coefficient of the cured films were measured and are reported in Table 3. As the data indicate, the meta-substituted oxetanes in examples 1 and 3 are better moisture barrier materials than their para-substituted counterparts, examples 2 and 4.
  • The permeation coefficient of a 50/50 (wt/wt) solution of the oxetane in example 3 and an aromatic epoxy (EPON 862) using a photoinitiating system of 2 wt % cationic photoinitiator (UV 9380C) was compared with the permeation coefficient of the oxetane in example 4. Again, the meta-substituted oxetane formulation resulted in lower permeation coefficient. As shown in table 3, one may also tailor the moisture barrier performance of the cured samples by choosing different epoxies.
  • In the following formulations brominated BPADGE is brominated bisphenol A diglycidyl ether and has the structure:
    TABLE 3
    PERMEATION COEFFICIENT
    (g · mil/100 in2 · day at 50° C.,
    100% relative humidity)
    OF VARIOUS FORMULATIONS
    50/50 50/50 50/50 (WT)
    (WT) WITH (WT) WITH WITH
    BY EPON EPON BROMINATED
    OXETANE ITSELF 862 828 BPADGE
    Oxetane in 7.0
    example 1
    Oxetane in 9.4
    example 2
    Oxetane in 5.9  6.2
    example 3
    Oxetane in 9.5 10.5 11.0 9.1
    example 4
    Figure US20070034515A1-20070215-C00018
    EPON 862 has the structure:
    Figure US20070034515A1-20070215-C00019
    EPON 828 has the structure
    Figure US20070034515A1-20070215-C00020
  • Example 10 Oxetane/Epoxy Blends with Various Fillers
  • In this example, epoxy/oxetane formulations with different fillers were tested and compared. The results are reported in Table 4 and indicate that, in general, platy fillers such as talc work better at reducing moisture permeation (formulations A, B, C in table 4) than nanosilica fillers (formulation D), on an equal weight basis. The results further indicate that aromatic epoxy EPON 862 in formulation D is a better barrier material than aromatic epoxy EPON 828 in formulation E, when used in cationic UV curable systems. It is also possible to use both talc and silica as fillers for better barrier performance as shown in formulations F and G. No difference in permeation was observed when nanosilica filler was replaced with micron sized silica.
    TABLE 4
    PERMEATION COEFFICIENTS OF OXETANE/EPOXY
    BLENDS WITH VARIOUS FILLERS
    FORMULATION
    COMPONENTS A B C D E F G
    Oxetane in example 3 24.7 24.7
    Oxetane in example 4 32.9 32.9 32.9 32.9 32.9
    Aromatic epoxy 32.9 32.9 32.9 32.9 24.7 24.7
    Epon 862
    Aromatic epoxy 32.9
    EPON 828
    Cationic photoinitiator 1.0 1.0
    SR1012
    Cationic photoinitiator 1.3 1.3 1.3 1.3 1.3
    UV 9380C
    Photosensitizer ITX 0.1 0.1
    Filler Vertal 7 talc 32.9
    Filler FDC talc 32.9
    Filler Mistrofil P403 32.9 33.0 33.0
    talc
    Filler Nanosilica 32.9 32.9 16.5
    Filler Micron sized 16.5
    silica
    Total 100.0 100.0 100.0 100.0 100.0 100.0 100.0
    Permeation Coefficient 5.7 9.3 5.4 7.7 8.8 3.5 3.5
    g · mil/100 in2 · day
    at 50° C., 100% RH
  • Example 11 Oxetane/Vinyl Ether Formulation
  • Oxetanes may be blended with diluents, such as vinyl ethers, in UV curable cationic formulations. In this example, a cycloaliphatic vinyl ether (CAVE) having the below structure was used as a reactive diluent and the resulting formulation exhibited a very low moisture permeation coefficient. The formulation and results are reported in Table 5.
    TABLE 5
    PERMEATION COEFFICIENT OF
    OXETANENINYL ETHER FORMULATION
    Figure US20070034515A1-20070215-C00021
    COMPONENTS PARTS BY WEIGHT
    Oxetane in example 3 17.5
    CAVE 11.7
    Photoinitiator (GE9380C) 0.87
    Photosensltlzer (ITX) 0.045
    Micron sized silica 69.9
    Total 100.0
    Viscosity (cP)
    10 rpm 6,676
    1 rpm 9,420
    Permeation Coefficient 2.8
    g · mil/100 in2 · day at (3J UVA)
    50° C., 100% RH
  • Example 12 Oxetane/Epoxy Blends with Different Additives
  • Oxetane/epoxy resin mixtures may also be blended with diluents, such as vinyl ethers or alcohols in UV curable cationic formulations. The formulation and results are reported in Table 6. Cure speed was measured with a Perkin Elmer Differential Scanning Calorimetry 7 equipped with a UV light source.
    TABLE 6
    OXETANE/EPOXY BLENDS WITH DIFFERENT ADDITIVES
    COMPONENT PARTS BY WEIGHT
    Oxetane in example 3 4.0 4.0 4.0
    Aromatic epoxy 4.0 4.0 4.0
    EPON 862
    Cationic Photoinitiator SR1012 0.16 0.16 0.16
    CAVE 0.82
    Tricyclodecane dimethanol (Aldrich) 0.82
    Curing Speed Excellent Excellent Fair
    Time to Peak Exotherm(min) 0.13 0.12 0.78
    Time to 90% Total Exotherm (min) 0.69 0.69 1.78
    ΔH (J/g) 294 271 328
    Permeation Coefficient 6.3 6.4 7.2
    g · mil/100 in2 · day at
    50° C., 100% RH
    (cured with 3J UVA)
  • Example 13 Properties and Performances of Oxetane/Epoxy/Talc Formulations with Various Oxetane/Epoxy Ratios
  • UV cure speed and the reactivity of a perimeter sealant is critical to production throughput, and the minimization of thermal processing is generally required for many display applications. UV curing kinetics and thermodynamics can be measured using differential photocalorimetry (“photo DSC”). The cure speed for a series of oxetane/epoxy/talc formulations with various oxetane/epoxy ratios are reported in Table 7. Differential photocalorimetry was performed on the samples using a Perkin-Elmer Differential Scanning Calorimeter 7 equipped with a Hg-arc lamp UV light source. All samples were cured through an indium/tin oxide (ITO)-coated sodalime glass.
  • Each of the resin combinations contains oxetane (OXT-121, Toagosei), EPON 862 aromatic epoxy, 35 wt % talc (Mistrofil P403 talc), and a photoinitiating system of 2.0 wt % cationic photoinitiator (SR1012), and 0.21 wt % ITX (all based on total weight). For each barrier sealant, the time from UV initiation to maximum curing exotherm was recorded, as well as the time taken to reach 90% of the observed UV curing exotherm. Shorter time to peak and time to 90% conversion are indications of good curing performance.
  • As the table indicates, good curing performance and good die shear adhesion were observed for formulations K, L, M where the oxetane/epoxy ratio ranged from 75:25 to 25:75. Most significantly, the fastest UV cure speed came from a 50:50 mole ratio of the oxetane and epoxy, which has the sharpest and narrowest exothermic peak. In addition, die shear adhesion of the oxetane rich (H, I) formulations were found to be better than epoxy rich (M, N) formulations.
    TABLE 7
    PROPERTIES AND PERFORMANCES OF OXETANE/EPOXY/TALC
    FORMULATIONS WITH VARIOUS OXETANE/EPOXY
    RATIOS
    OXT 121: Cure Speed (min) Die shear
    EPON 862 Viscosity (cPs) Time to Time to Adhesion
    Formula (mole) 1.0 rpm 10.0 rpm Peak 90% (kg)
    H 100:0  2,867 1,597 0.43 3.92 40.9
    I 95:5  4,096 2,252 0.27 4.44 40.9
    J 75:25 8,601 4,198 0.17 0.93 45.2
    K 50:50 7,987 4,301 0.12 0.70 44.4
    L 25:75 11,870 6,553 0.13 1.73 44.2
    M  5:95 15,560 9,093 0.15 2.04 33.1
    N  0:100 18,020 10,420 0.20 2.34 35.5
  • Example 14 Permeability of Oxetane/Epoxy Blends with Various Photoinitiators
  • Several cationic photoinitiators were used to cure 50/50 (by weight) blends of OXT-121 oxetane and EPON 862 epoxy. The results are reported in Table 8 and indicate there is little difference in the permeabilities obtained using these different photoinitiators. The loading of the photoinitiators were normalized so that equal molar amounts of the active catalyst were used. The sulfonium salt catalyst is proprietary to National Starch and Chemical Company.
    TABLE 8
    PERMEABILITY OF OXETANE/EPOXY BLENDS
    WITH VARIOUS PHOTOINITIATORS
    LOADING PERMEATION
    FORMULA PHOTOINITIATOR (WT %) (g · mil/100 in2 · day)
    O solid iodonium salt SR1012 1.0 10.1
    P solid iodonium salt SR1012 1.0 10.3
    with a sensitizer perylene 0.1
    Q sulfonium salt proprietary 1.1 9.9
    R liquid iodonium salt I UV 9380C 2.0 9.1
  • Different levels of photoinitiator SR 1012 were also explored using 50/50 (by weight) blends of OXT-121 oxetane and EPON 862 epoxy and the results are reported in Table 9. Within experimental error, the change in the photoinitiator level did not show significant impact on the moisture permeation performance of the sealant. This clearly demonstrates that the barrier performance of the sealants is mostly dominated by the choice of resins and less affected by ways of curing.
    TABLE 9
    VARIATIONS IN PHOTOINITIATOR LEVEL
    PHOTOINITIATOR LOADING PERMEATION
    (WT %) (g · mil/100 in2 · day)
    0.25 9.6
    0.50 9.3
    1.00 10.1
    2.00 9.7
    3.00 10.1
  • Example 15 Curing of Oxetane/Epoxy Blends by Heat
  • A series of oxetane (OXT-121) and epoxy (EPON 862) resin blends were prepared and cured by heat. The oxetane and epoxy blends at different weight ratios were polymerized using DSC ramp from room temperature to 300° C. at 10° C./min. Each sample contained 2.0% cationic photoinitiator (SR1012). The onset, peak temperatures and total heat of polymerization are reported in Table 10.
    TABLE 10
    CURING OF OXETANE/EPOXY BLENDS BY HEAT
    RATIO OXETANE:EPOXY
    100:0 67:33 50:50 33:67 0:100
    ONSET (° C.) 138 135 133 138 171
    PEAK (° C.) 158 153 158 203 214
    ΔH (J/G) 627 724 681 637 646

Claims (18)

1. An electrophoretic device with a cationically curable barrier composition consisting essentially of
(a) an oxetane compound, and
(b) a cationic initiator,
(c) optionally, one or more fillers,
(d) optionally one or more adhesion promoters, or one or more epoxy resins.
2. The electrophoretic device in accordance with claim 1, in which the oxetane compound has the structure:
Figure US20070034515A1-20070215-C00022
in which R1, R2, R3, R4, R5, R6 are selected from the group consisting hydrogen, and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester, thio-ester, and sulfide groups.
3. The electrophoretic device in accordance with claim 1, in which the oxetane compound is selected from the group of oxetane compounds having the structures:
Figure US20070034515A1-20070215-C00023
4. The electrophoretic device in accordance with claim 1, in which the oxetane compound has an aromatic core, onto which aromatic core are substituted in a meta-position with each other, the oxetane functionality and an additional polymerizable functionality.
5. The electrophoretic device in accordance with claim 1, in which the oxetane compound has the structure:
Figure US20070034515A1-20070215-C00024
in which
R7, R8, R9, R10, and R11 are independently selected from the group consisting hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl and aryloyl;
n is 0, 1, 2, 3, or 4;
Z is a cationically reactive functionality selected from the group consisting of
Figure US20070034515A1-20070215-C00025
in which
R11 and R12 are selected from the group consisting of hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, or ester; and
R13 is a linking group selected from the group consisting of alkyl, haloalkyl, aryl, ether, thio-ether, aryl ether, ester, thio-ester, silane, carbonate, or ketone.
6. The electrophoretic device in accordance with claim 5, in which the oxetane compound is selected from the group having the structures:
Figure US20070034515A1-20070215-C00026
7. The electrophoretic device in accordance with claim 1, in which the oxetane compound is a hybrid compound having both oxetane and a second reactive functionality extending from a cycloaliphatic backbone.
8. The electrophoretic device in accordance with claim 1, in which the oxetane compound has the structure
Figure US20070034515A1-20070215-C00027
in which
L, L′, L″ and L′″ are linking groups independently selected from the group consisting of
Figure US20070034515A1-20070215-C00028
R is selected from the group consisting of linear alkyl, branched alkyl, cycloalkyl, aryl, heteroaryl, silane or siloxane groups which optionally contain heteroatoms;
X is a reactive group independently selected from the group consisting of glycidyl epoxy, aliphatic epoxy, and cycloaliphatic epoxy; and methacrylate; itaconate; maleimide; oxetane, vinyl, propenyl, crotyl, allyl, and propargyl ether and thio-ethers of those groups; maleate, fumarate, and cinnamate esthers; styrenic; acrylamide and methacrylamide; chalcone; thiol; allyl, alkenyl, and cycloalkenyl groups;
n, k, and l are 0 or 1; and
y is 1 to 10.
9. The electrophoretic device in accordance with claim 8, in which the oxetane compound has the structure selected from the group consisting of:
Figure US20070034515A1-20070215-C00029
10. The electrophoretic device in accordance with any of claims 1 through 9 in which the cationic initiator is a Brφnsted acid, a Lewis acid, or a photo or thermal acid generator.
11. The electrophoretic device in accordance with any of claims 1 through 9 in which the one or more fillers are present.
12. The electrophoretic device in accordance with any of claims 1 through 9 in which the one or more fillers are present and are selected from the group consisting of ground quartz, fused silica, amorphous silica, talc, glass beads, graphite, carbon black, alumina, clays, mica, vermiculite, aluminum nitride, boron nitride; silver, copper, gold, tin, tin/lead alloys, poly(tetrachloroethylene), poly(chlorotriflouroethylene), poly(vinylidene chloride), CaO, BaO, Na2SO4, CaSO4, MgSO4, zeolites, silica gel, P2O5, CaCl2, and Al2O3
13. The electrophoretic device in accordance with any of claims 1 through 9 in which the one or more epoxy resins are present.
14. The electrophoretic device in accordance with any of claims 1 through 9 in which the one or more epoxy resins are present and are selected from the group consisting of bisphenol F diglycidyl ether, resorcinol diglycidyl ether, novolac glycidyl ethers, halogenated glycidyl ethers, naphthalene diglycidyl ether, and cycloaliphatic epoxies.
15. The electrophoretic device in accordance with any of claims 1 through 9 in which the one or more adhesion promoters are present.
16. The electrophoretic device in accordance with any of claims 1 through 9 in which an adhesion promoter is present and is a silane.
17. An electrophoretic device containing a hybrid compound containing both oxetane and epoxy functionality selected from the group consisting of:
Figure US20070034515A1-20070215-C00030
18. An electrophoretic device sealed with the barrier sealant according to any one of claims 1 to 9.
US11/502,707 2005-04-04 2006-08-10 Radiation- or thermally-curable oxetane barrier sealants Abandoned US20070034515A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/502,707 US20070034515A1 (en) 2005-04-04 2006-08-10 Radiation- or thermally-curable oxetane barrier sealants
US12/179,924 US7887716B2 (en) 2005-04-04 2008-07-25 Barrier sealant of phenylene oxetane and cationic initiator

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/098,116 US20060223978A1 (en) 2005-04-04 2005-04-04 Radiation- or thermally-curable oxetane barrier sealants
US11/502,707 US20070034515A1 (en) 2005-04-04 2006-08-10 Radiation- or thermally-curable oxetane barrier sealants

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/098,116 Continuation-In-Part US20060223978A1 (en) 2005-04-04 2005-04-04 Radiation- or thermally-curable oxetane barrier sealants

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/179,924 Division US7887716B2 (en) 2005-04-04 2008-07-25 Barrier sealant of phenylene oxetane and cationic initiator

Publications (1)

Publication Number Publication Date
US20070034515A1 true US20070034515A1 (en) 2007-02-15

Family

ID=36950282

Family Applications (4)

Application Number Title Priority Date Filing Date
US11/098,116 Abandoned US20060223978A1 (en) 2005-04-04 2005-04-04 Radiation- or thermally-curable oxetane barrier sealants
US11/502,707 Abandoned US20070034515A1 (en) 2005-04-04 2006-08-10 Radiation- or thermally-curable oxetane barrier sealants
US12/147,032 Expired - Fee Related US7902305B2 (en) 2005-04-04 2008-06-26 Composition of cationic initiator and oxetane compound
US12/179,924 Expired - Fee Related US7887716B2 (en) 2005-04-04 2008-07-25 Barrier sealant of phenylene oxetane and cationic initiator

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US11/098,116 Abandoned US20060223978A1 (en) 2005-04-04 2005-04-04 Radiation- or thermally-curable oxetane barrier sealants

Family Applications After (2)

Application Number Title Priority Date Filing Date
US12/147,032 Expired - Fee Related US7902305B2 (en) 2005-04-04 2008-06-26 Composition of cationic initiator and oxetane compound
US12/179,924 Expired - Fee Related US7887716B2 (en) 2005-04-04 2008-07-25 Barrier sealant of phenylene oxetane and cationic initiator

Country Status (9)

Country Link
US (4) US20060223978A1 (en)
EP (2) EP1866360B1 (en)
JP (1) JP5297185B2 (en)
KR (2) KR101470473B1 (en)
CN (2) CN101891945B (en)
AT (1) ATE510872T1 (en)
PT (2) PT1992654E (en)
TW (1) TWI393731B (en)
WO (1) WO2006107803A2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009099589A1 (en) * 2008-02-07 2009-08-13 Corning Incorporated Method for sealing an electronic device
WO2013040056A1 (en) * 2011-09-13 2013-03-21 Switch Bulb Company, Inc. Scavengers for reducing contaminants in liquid-filled led bulbs
CN104084061A (en) * 2014-08-06 2014-10-08 哈尔滨工业大学 Preparation method of nano BN (boron nitride) modified hyperfiltration membrane
CN104693685A (en) * 2015-03-19 2015-06-10 西安交通大学 Preparation method for acrylamide graft modification nanometer aluminum oxide epoxy composite insulating material
US9212244B2 (en) 2009-03-20 2015-12-15 Merck Patent Gesellschaft Mit Beschrankter Haftung Polymers made from mixtures comprising vinyl ether monomers
US10392473B2 (en) 2014-06-27 2019-08-27 Daicel Corporation Monomer composition and curable composition containing same
US10472466B2 (en) 2014-06-27 2019-11-12 Daicel Corporation Monomer composition and curable composition containing same
WO2020151527A1 (en) * 2019-01-21 2020-07-30 江南大学 Method for implementing mercapto-epoxy deep photocuring and application thereof

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101252701B1 (en) * 2006-03-29 2013-04-09 헨켈 아게 운트 코. 카게아아 Radiation-or thermally-curable barrier sealants
WO2007111607A1 (en) * 2006-03-29 2007-10-04 National Starch And Chemical Investment Radiation-curable rubber adhesive/sealant
WO2007124073A2 (en) * 2006-04-21 2007-11-01 Ndsu Research Foundation Polyol photosensitizers, carrier gas uv laser ablation sensitizers, and other additives and methods for making and using same
JP4213767B2 (en) * 2007-01-12 2009-01-21 積水化学工業株式会社 Adhesive for electronic parts
EP2441761A1 (en) * 2007-03-23 2012-04-18 Daicel Chemical Industries, Ltd. Oxetane-containing vinyl ether compounds and polymerizable compositions
TWI370525B (en) * 2008-04-25 2012-08-11 Ind Tech Res Inst Encapsulant composition and method for fabricating encapsulant material
KR20110093781A (en) * 2008-11-08 2011-08-18 다이셀 가가꾸 고교 가부시끼가이샤 Photosensitive composition for volume hologram recording and method for producing same
GB2466251B (en) * 2008-12-16 2011-03-09 Ind Tech Res Inst Encapsulant compositions and method for fabricating encapsulant materials
US8525635B2 (en) 2009-07-17 2013-09-03 Tyco Electronics Corporation Oxygen-barrier packaged surface mount device
US9136195B2 (en) 2009-07-17 2015-09-15 Tyco Electronics Corporation Oxygen barrier compositions and related methods
EP2439240A1 (en) 2010-10-06 2012-04-11 Henkel AG & Co. KGaA Radiation curable composition
TWI537356B (en) * 2010-12-17 2016-06-11 Toagosei Co Ltd Photo-curable adhesive composition, polarizing adhesive and manufacturing method thereof, optical member and liquid crystal display device (1)
WO2014145276A1 (en) 2013-03-15 2014-09-18 Cargill, Incorporated Carbohydrate compositions
CN105873974A (en) * 2013-08-27 2016-08-17 汉高股份有限及两合公司 Curable composition and use for electronic device
CN103500755A (en) * 2013-10-16 2014-01-08 京东方科技集团股份有限公司 OLED (organic light-emitting diode) display screen, manufacturing method for same and display device
TWI519560B (en) 2014-11-24 2016-02-01 財團法人工業技術研究院 Resin containing oxetane and epoxy groups and resin composition including the same
CN105185922B (en) * 2015-06-12 2018-09-21 合肥京东方光电科技有限公司 A kind of encapsulating structure and packaging method, OLED device
DE102015112233B4 (en) 2015-07-27 2021-12-09 Granula Polymer Gmbh Process for the production of films and membranes comprising hyperbranched copolymers based on oxetane, films and membranes obtained by this process, and their use
JP6657716B2 (en) * 2015-09-29 2020-03-04 日立化成株式会社 Liquid composition for sealing, sealing material, and electronic component device
CN107619399B (en) 2016-07-13 2021-04-27 常州强力先端电子材料有限公司 Polyfunctional oxetane compound and preparation method thereof
CN107621752B (en) 2016-07-13 2019-11-12 常州强力先端电子材料有限公司 One specific admixture type photosensitive resin and preparation method thereof
CN106187953B (en) * 2016-07-29 2018-06-29 湖北固润科技股份有限公司 A kind of cationic polymerization monomer and synthesis and application
CN106396478A (en) * 2016-08-30 2017-02-15 裴寿益 Heat dissipation material
WO2018079427A1 (en) * 2016-10-28 2018-05-03 シャープ株式会社 Seal material composition, liquid crystal cell, and scanning antenna
KR102034455B1 (en) * 2016-12-09 2019-10-21 주식회사 엘지화학 Encapsulating composition
JP6827526B2 (en) * 2016-12-09 2021-02-10 エルジー・ケム・リミテッド Sealing material composition
TWI687448B (en) 2016-12-09 2020-03-11 南韓商Lg化學股份有限公司 Encapsulating composition
US10647899B2 (en) * 2017-06-26 2020-05-12 Shin-Etsu Chemical Co., Ltd. Heat-curable fluoropolyether-based adhesive composition and electric/electronic component
US10858541B2 (en) * 2017-12-19 2020-12-08 Rohm And Haas Electronic Materials Llc Curable composition
EP3800228A4 (en) * 2018-06-12 2021-04-21 Lg Chem, Ltd. Sealant composition
KR102389442B1 (en) * 2018-08-10 2022-04-21 미쓰이 가가쿠 가부시키가이샤 encapsulant
CN111410455A (en) * 2020-04-03 2020-07-14 杨云 Vermiculite high-temperature sealant and preparation method and preparation device thereof
CN114635128A (en) * 2020-12-16 2022-06-17 常州强力电子新材料股份有限公司 Ultraviolet-curable surface passivator, metal product and application
EP4050060A1 (en) 2021-02-26 2022-08-31 Henkel AG & Co. KGaA A photocurable adhesive or sealant composition
EP4050061A1 (en) 2021-02-26 2022-08-31 Henkel AG & Co. KGaA Near-infrared (nir) sensitized adhesive and sealant compositions

Citations (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2830721A (en) * 1956-03-28 1958-04-15 Plax Corp Plastic coated articles
US3704806A (en) * 1971-01-06 1972-12-05 Le T Im Lensoveta Dehumidifying composition and a method for preparing the same
US3835003A (en) * 1968-08-20 1974-09-10 American Can Co Photopolymerization of oxetanes
US4013566A (en) * 1975-04-07 1977-03-22 Adsorbex, Incorporated Flexible desiccant body
US4036360A (en) * 1975-11-12 1977-07-19 Graham Magnetics Incorporated Package having dessicant composition
US4081397A (en) * 1969-12-22 1978-03-28 P. R. Mallory & Co. Inc. Desiccant for electrical and electronic devices
US4394403A (en) * 1974-05-08 1983-07-19 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US5008137A (en) * 1988-02-04 1991-04-16 Ppg Industries, Inc. Barrier coatings
US5122403A (en) * 1989-04-03 1992-06-16 Ppg Industries, Inc. Windshield edge seal
US5171760A (en) * 1988-08-05 1992-12-15 Edison Polymer Innovation Corp. UV curable polymer formulation
US5300541A (en) * 1988-02-04 1994-04-05 Ppg Industries, Inc. Polyamine-polyepoxide gas barrier coatings
US5304419A (en) * 1990-07-06 1994-04-19 Alpha Fry Ltd Moisture and particle getter for enclosures
US5401536A (en) * 1992-01-10 1995-03-28 Shores; A. Andrew Method of providing moisture-free enclosure for electronic device
US5463084A (en) * 1992-02-18 1995-10-31 Rensselaer Polytechnic Institute Photocurable silicone oxetanes
US5665823A (en) * 1996-08-30 1997-09-09 Dow Corning Corporation Polyisobutylene polymers having acrylic functionality
US5747363A (en) * 1996-06-10 1998-05-05 Motorola, Inc. Method of manufacturing an integrated electro-optical package
US5827908A (en) * 1994-01-26 1998-10-27 Shin-Etsu Chemical Co., Ltd. Naphthalene and or biphenyl skeleton containing epoxy resin composition
US5882842A (en) * 1996-02-16 1999-03-16 Kansai Paint Co., Ltd. Active energy ray-curable resin composition
US6054549A (en) * 1998-11-25 2000-04-25 Dow Corning Asia, Ltd. Alkenyl ether functional polyisobutylenes and methods for the preparation thereof
US6081071A (en) * 1998-05-18 2000-06-27 Motorola, Inc. Electroluminescent apparatus and methods of manufacturing and encapsulating
US6084004A (en) * 1997-08-21 2000-07-04 Espe Dental Ag Compositions which undergo light-induced cationic curing and their use
US6121358A (en) * 1997-09-22 2000-09-19 The Dexter Corporation Hydrophobic vinyl monomers, formulations containing same, and uses therefor
US6150479A (en) * 1998-11-23 2000-11-21 Loctite Corporation Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
US6166101A (en) * 1997-11-21 2000-12-26 Kansai Paint Co., Ltd. Ultraviolet-curing coating composition for cans
US6211320B1 (en) * 1999-07-28 2001-04-03 Dexter Corporation Low viscosity acrylate monomers formulations containing same and uses therefor
US6226890B1 (en) * 2000-04-07 2001-05-08 Eastman Kodak Company Desiccation of moisture-sensitive electronic devices
US20010018477A1 (en) * 2000-01-26 2001-08-30 Sony Chemical Corp. Adhesive composition
US20030020398A1 (en) * 2001-07-30 2003-01-30 Booth Lawrence A. Sealing organic light emitting device displays
US6521731B2 (en) * 2001-02-07 2003-02-18 Henkel Loctite Corporation Radical polymerizable compositions containing polycyclic olefins
US20030037677A1 (en) * 2001-08-08 2003-02-27 Eastman Kodak Company Desiccants and desiccant packages for highly moisture-sensitive electronic devices
US20030062125A1 (en) * 2001-07-17 2003-04-03 Yasushi Takamatsu Photocationic-curable resin composition and uses thereof
US6569532B2 (en) * 1999-12-02 2003-05-27 Sony Corporation Epoxy resin compositions and premolded semiconductor packages
US20030111519A1 (en) * 2001-09-04 2003-06-19 3M Innovative Properties Company Fluxing compositions
US6586496B1 (en) * 1999-08-12 2003-07-01 Mitsui Chemicals, Inc. Photocurable resin composition for sealing material and method of sealing
US6692986B1 (en) * 1999-09-09 2004-02-17 Osram Opto Semiconductors Gmbh Method for encapsulating components
US6706779B2 (en) * 2000-05-12 2004-03-16 Dow Corning Corporation Radiation curable compositions containing alkenyl ether functional polyisobutylenes
US20040084686A1 (en) * 2002-11-06 2004-05-06 Ping-Song Wang Packaging material used for a display device and method of forming thereof
US20040191566A1 (en) * 2003-03-03 2004-09-30 Hiroshi Kikuchi Organic electroluminescence display device
US20040225025A1 (en) * 2001-08-03 2004-11-11 Sullivan Michael G. Curable compositions for display devices
US6833668B1 (en) * 1999-09-29 2004-12-21 Sanyo Electric Co., Ltd. Electroluminescence display device having a desiccant
US6835950B2 (en) * 2002-04-12 2004-12-28 Universal Display Corporation Organic electronic devices with pressure sensitive adhesive layer
US6897474B2 (en) * 2002-04-12 2005-05-24 Universal Display Corporation Protected organic electronic devices and methods for making the same
US6936131B2 (en) * 2002-01-31 2005-08-30 3M Innovative Properties Company Encapsulation of organic electronic devices using adsorbent loaded adhesives

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US37677A (en) * 1863-02-17 Improvements breast-pumps
US62125A (en) * 1867-02-19 Improvement in apparatus for lighting gas by electricity
US225025A (en) * 1880-03-02 Bill-file
US20398A (en) * 1858-06-01 Telephonic indicator for steam-boilers
US191566A (en) * 1877-06-05 Improvement in limekilns
US111519A (en) * 1871-02-07 Improvement in clothes-driers
US4265976A (en) * 1978-09-19 1981-05-05 Celanese Corporation Radiation-curable coated article having moisture barrier propetes
JPH10158581A (en) * 1996-12-05 1998-06-16 Kansai Paint Co Ltd Ultraviolet-curable coating composition for can
JP3765896B2 (en) * 1996-12-13 2006-04-12 Jsr株式会社 Photocurable resin composition for optical three-dimensional modeling
JP2001303013A (en) * 2000-04-18 2001-10-31 Ube Ind Ltd Ultraviolet curable adhesive composition
JP2001303015A (en) * 2000-04-25 2001-10-31 Hitachi Chem Co Ltd Adhesive film, method for producing the same and method for bonding
US6794451B2 (en) * 2001-02-13 2004-09-21 Toagosei Co., Ltd. Cationically polymerizable liquid composition and tacky polymer
US6692610B2 (en) * 2001-07-26 2004-02-17 Osram Opto Semiconductors Gmbh Oled packaging
JP2003327951A (en) * 2002-05-10 2003-11-19 Mitsui Chemicals Inc Photo-setting resin composition for sealing material
TWI340763B (en) * 2003-02-20 2011-04-21 Nippon Kayaku Kk Seal agent for photoelectric conversion elements and photoelectric conversion elements using such seal agent
EP1518899A3 (en) * 2003-09-18 2005-08-03 Fuji Photo Film Co., Ltd. Photocurable adhesive and bonding process employing same

Patent Citations (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2830721A (en) * 1956-03-28 1958-04-15 Plax Corp Plastic coated articles
US3835003A (en) * 1968-08-20 1974-09-10 American Can Co Photopolymerization of oxetanes
US4081397A (en) * 1969-12-22 1978-03-28 P. R. Mallory & Co. Inc. Desiccant for electrical and electronic devices
US3704806A (en) * 1971-01-06 1972-12-05 Le T Im Lensoveta Dehumidifying composition and a method for preparing the same
US4394403A (en) * 1974-05-08 1983-07-19 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4013566A (en) * 1975-04-07 1977-03-22 Adsorbex, Incorporated Flexible desiccant body
US4036360A (en) * 1975-11-12 1977-07-19 Graham Magnetics Incorporated Package having dessicant composition
US5300541A (en) * 1988-02-04 1994-04-05 Ppg Industries, Inc. Polyamine-polyepoxide gas barrier coatings
US5008137A (en) * 1988-02-04 1991-04-16 Ppg Industries, Inc. Barrier coatings
US5491204A (en) * 1988-02-04 1996-02-13 Ppg Industries, Inc. Gas barrier coating from reacting polyamine, alkanolamine and polyepoxide
US5171760A (en) * 1988-08-05 1992-12-15 Edison Polymer Innovation Corp. UV curable polymer formulation
US5122403A (en) * 1989-04-03 1992-06-16 Ppg Industries, Inc. Windshield edge seal
US5304419A (en) * 1990-07-06 1994-04-19 Alpha Fry Ltd Moisture and particle getter for enclosures
US5591379A (en) * 1990-07-06 1997-01-07 Alpha Fry Limited Moisture getting composition for hermetic microelectronic devices
US5401536A (en) * 1992-01-10 1995-03-28 Shores; A. Andrew Method of providing moisture-free enclosure for electronic device
US5463084A (en) * 1992-02-18 1995-10-31 Rensselaer Polytechnic Institute Photocurable silicone oxetanes
US5827908A (en) * 1994-01-26 1998-10-27 Shin-Etsu Chemical Co., Ltd. Naphthalene and or biphenyl skeleton containing epoxy resin composition
US5882842A (en) * 1996-02-16 1999-03-16 Kansai Paint Co., Ltd. Active energy ray-curable resin composition
US5747363A (en) * 1996-06-10 1998-05-05 Motorola, Inc. Method of manufacturing an integrated electro-optical package
US5665823A (en) * 1996-08-30 1997-09-09 Dow Corning Corporation Polyisobutylene polymers having acrylic functionality
US6084004A (en) * 1997-08-21 2000-07-04 Espe Dental Ag Compositions which undergo light-induced cationic curing and their use
US6121358A (en) * 1997-09-22 2000-09-19 The Dexter Corporation Hydrophobic vinyl monomers, formulations containing same, and uses therefor
US6166101A (en) * 1997-11-21 2000-12-26 Kansai Paint Co., Ltd. Ultraviolet-curing coating composition for cans
US6081071A (en) * 1998-05-18 2000-06-27 Motorola, Inc. Electroluminescent apparatus and methods of manufacturing and encapsulating
US6150479A (en) * 1998-11-23 2000-11-21 Loctite Corporation Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
US6054549A (en) * 1998-11-25 2000-04-25 Dow Corning Asia, Ltd. Alkenyl ether functional polyisobutylenes and methods for the preparation thereof
US6211320B1 (en) * 1999-07-28 2001-04-03 Dexter Corporation Low viscosity acrylate monomers formulations containing same and uses therefor
US6586496B1 (en) * 1999-08-12 2003-07-01 Mitsui Chemicals, Inc. Photocurable resin composition for sealing material and method of sealing
US6692986B1 (en) * 1999-09-09 2004-02-17 Osram Opto Semiconductors Gmbh Method for encapsulating components
US6833668B1 (en) * 1999-09-29 2004-12-21 Sanyo Electric Co., Ltd. Electroluminescence display device having a desiccant
US6569532B2 (en) * 1999-12-02 2003-05-27 Sony Corporation Epoxy resin compositions and premolded semiconductor packages
US6780898B2 (en) * 2000-01-26 2004-08-24 Sony Chemicals Corporation Adhesive composition
US20010018477A1 (en) * 2000-01-26 2001-08-30 Sony Chemical Corp. Adhesive composition
US6226890B1 (en) * 2000-04-07 2001-05-08 Eastman Kodak Company Desiccation of moisture-sensitive electronic devices
US6706779B2 (en) * 2000-05-12 2004-03-16 Dow Corning Corporation Radiation curable compositions containing alkenyl ether functional polyisobutylenes
US6521731B2 (en) * 2001-02-07 2003-02-18 Henkel Loctite Corporation Radical polymerizable compositions containing polycyclic olefins
US20030062125A1 (en) * 2001-07-17 2003-04-03 Yasushi Takamatsu Photocationic-curable resin composition and uses thereof
US20030020398A1 (en) * 2001-07-30 2003-01-30 Booth Lawrence A. Sealing organic light emitting device displays
US20040225025A1 (en) * 2001-08-03 2004-11-11 Sullivan Michael G. Curable compositions for display devices
US20030037677A1 (en) * 2001-08-08 2003-02-27 Eastman Kodak Company Desiccants and desiccant packages for highly moisture-sensitive electronic devices
US20030111519A1 (en) * 2001-09-04 2003-06-19 3M Innovative Properties Company Fluxing compositions
US6936131B2 (en) * 2002-01-31 2005-08-30 3M Innovative Properties Company Encapsulation of organic electronic devices using adsorbent loaded adhesives
US6835950B2 (en) * 2002-04-12 2004-12-28 Universal Display Corporation Organic electronic devices with pressure sensitive adhesive layer
US6897474B2 (en) * 2002-04-12 2005-05-24 Universal Display Corporation Protected organic electronic devices and methods for making the same
US20040084686A1 (en) * 2002-11-06 2004-05-06 Ping-Song Wang Packaging material used for a display device and method of forming thereof
US20040191566A1 (en) * 2003-03-03 2004-09-30 Hiroshi Kikuchi Organic electroluminescence display device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009099589A1 (en) * 2008-02-07 2009-08-13 Corning Incorporated Method for sealing an electronic device
US9212244B2 (en) 2009-03-20 2015-12-15 Merck Patent Gesellschaft Mit Beschrankter Haftung Polymers made from mixtures comprising vinyl ether monomers
WO2013040056A1 (en) * 2011-09-13 2013-03-21 Switch Bulb Company, Inc. Scavengers for reducing contaminants in liquid-filled led bulbs
US8558436B2 (en) 2011-09-13 2013-10-15 Switch Bulb Company, Inc. Scavengers for reducing contaminants in liquid-filled LED bulbs
US8853922B2 (en) 2011-09-13 2014-10-07 Switch Bulb Company, Inc. Scavengers for reducing contaminants in liquid-filled LED bulbs
US10392473B2 (en) 2014-06-27 2019-08-27 Daicel Corporation Monomer composition and curable composition containing same
US10472466B2 (en) 2014-06-27 2019-11-12 Daicel Corporation Monomer composition and curable composition containing same
US10882953B2 (en) 2014-06-27 2021-01-05 Daicel Corporation Monomer composition and curable composition containing same
CN104084061A (en) * 2014-08-06 2014-10-08 哈尔滨工业大学 Preparation method of nano BN (boron nitride) modified hyperfiltration membrane
CN104693685A (en) * 2015-03-19 2015-06-10 西安交通大学 Preparation method for acrylamide graft modification nanometer aluminum oxide epoxy composite insulating material
WO2020151527A1 (en) * 2019-01-21 2020-07-30 江南大学 Method for implementing mercapto-epoxy deep photocuring and application thereof

Also Published As

Publication number Publication date
EP1866360A2 (en) 2007-12-19
TWI393731B (en) 2013-04-21
US20080272328A1 (en) 2008-11-06
CN101891945B (en) 2012-10-24
CN101155853A (en) 2008-04-02
KR20070122526A (en) 2007-12-31
JP5297185B2 (en) 2013-09-25
US20060223978A1 (en) 2006-10-05
KR101306213B1 (en) 2013-09-09
KR20130054393A (en) 2013-05-24
WO2006107803A2 (en) 2006-10-12
JP2008535975A (en) 2008-09-04
CN101891945A (en) 2010-11-24
TW200702354A (en) 2007-01-16
ATE510872T1 (en) 2011-06-15
PT1866360E (en) 2011-07-12
WO2006107803A3 (en) 2006-12-07
US7902305B2 (en) 2011-03-08
US7887716B2 (en) 2011-02-15
EP1992654B1 (en) 2012-09-12
US20080296159A1 (en) 2008-12-04
EP1992654A1 (en) 2008-11-19
PT1992654E (en) 2012-11-08
EP1866360B1 (en) 2011-05-25
KR101470473B1 (en) 2014-12-08

Similar Documents

Publication Publication Date Title
US7887716B2 (en) Barrier sealant of phenylene oxetane and cationic initiator
US8278401B2 (en) Radiation or thermally curable barrier sealants
US20070117917A1 (en) Radiation curable cycloaliphatic barrier sealants
WO2005085317A1 (en) Ultraviolet-curing composition
KR20170023834A (en) Photocurable composition and optical element adhesive including same
JP2005336349A (en) Cationically polymerizable composition
CN102336890B (en) The anti-seepage sealant of radiation or heat solidifiable
JP2019183061A (en) Adhesive for optical member and adhesion material made of cured product thereof
JP5785236B2 (en) Radiation- or thermo-curable barrier sealant
JP2014167082A (en) Cationic polymerizable oxirane epoxy compound
CN103772649B (en) The anti-seepage sealant of radiation or heat solidifiable
JP2005336333A (en) Actinic radiation curing composition
JP2000044670A (en) Compound having oxetanyl group and curable composition containing the same as component

Legal Events

Date Code Title Description
AS Assignment

Owner name: NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CO

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KONG, SHENGQIAN;GILLISSEN, STIJN;REEL/FRAME:018393/0159;SIGNING DATES FROM 20060922 TO 20061002

AS Assignment

Owner name: HENKEL KGAA, GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION;INDOPCO, INC.;REEL/FRAME:021912/0634

Effective date: 20080401

Owner name: HENKEL KGAA,GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION;INDOPCO, INC.;REEL/FRAME:021912/0634

Effective date: 20080401

AS Assignment

Owner name: HENKEL AG & CO. KGAA, GERMANY

Free format text: CHANGE OF NAME;ASSIGNOR:HENKEL KGAA;REEL/FRAME:022309/0718

Effective date: 20080415

Owner name: HENKEL AG & CO. KGAA,GERMANY

Free format text: CHANGE OF NAME;ASSIGNOR:HENKEL KGAA;REEL/FRAME:022309/0718

Effective date: 20080415

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION