US20060266158A1 - High purity hafnium, target and thin film comprising said high purity hafnium, and method for producing high purity hafnium - Google Patents
High purity hafnium, target and thin film comprising said high purity hafnium, and method for producing high purity hafnium Download PDFInfo
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- US20060266158A1 US20060266158A1 US10/595,660 US59566004A US2006266158A1 US 20060266158 A1 US20060266158 A1 US 20060266158A1 US 59566004 A US59566004 A US 59566004A US 2006266158 A1 US2006266158 A1 US 2006266158A1
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- United States
- Prior art keywords
- hafnium
- high purity
- wtppm
- zirconium
- purity hafnium
- Prior art date
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- Abandoned
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- 229910052735 hafnium Inorganic materials 0.000 title claims abstract description 103
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 title claims abstract description 98
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 239000010409 thin film Substances 0.000 title claims abstract description 21
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 50
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 50
- 239000002994 raw material Substances 0.000 claims abstract description 33
- 239000007789 gas Substances 0.000 claims abstract description 15
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 13
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 13
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 12
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 239000011574 phosphorus Substances 0.000 claims abstract description 12
- 239000011593 sulfur Substances 0.000 claims abstract description 12
- 238000002844 melting Methods 0.000 claims description 19
- 230000008018 melting Effects 0.000 claims description 19
- 150000003839 salts Chemical class 0.000 claims description 11
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 238000000638 solvent extraction Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 abstract description 28
- 238000005516 engineering process Methods 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 description 18
- PDPJQWYGJJBYLF-UHFFFAOYSA-J hafnium tetrachloride Chemical compound Cl[Hf](Cl)(Cl)Cl PDPJQWYGJJBYLF-UHFFFAOYSA-J 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000002184 metal Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 150000002362 hafnium Chemical class 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- 229910000449 hafnium oxide Inorganic materials 0.000 description 4
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical class [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 238000005477 sputtering target Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000005660 chlorination reaction Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000001110 calcium chloride Substances 0.000 description 2
- 229910001628 calcium chloride Inorganic materials 0.000 description 2
- -1 chloro- Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N hydrofluoric acid Substances F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000008213 purified water Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- TWRSDLOICOIGRH-UHFFFAOYSA-N [Si].[Si].[Hf] Chemical compound [Si].[Si].[Hf] TWRSDLOICOIGRH-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 150000002363 hafnium compounds Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002822 niobium compounds Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/14—Obtaining zirconium or hafnium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Definitions
- the present invention relates to a high purity hafnium material in which the content of impurities such as zirconium, oxygen, sulfur and phosphorus contained in the hafnium is reduced, as well as to a target and thin film formed from such high purity hafnium material, and a manufacturing method of high purity hafnium.
- hafnium and zirconium are very similar in terms of atomic structure and chemical property, the inclusion of zirconium or the inclusion of zirconium in hafnium was never really acknowledged as a problem as exemplified below.
- Hafnium and zirconium are superior in heat resistance and corrosion resistance, and are characterized in that they have a strong affinity with oxygen and nitrogen. And, since the oxides or nitrides thereof have superior stability in high temperatures, they are utilized as fire-resistant materials in the manufacture of nuclear ceramics, steel or castings. Further, recently, these are also being used as electronic materials or optical materials.
- the manufacturing method of metal hafnium or metal zirconium is proposed as the same manufacturing method.
- Patent Document 1 a manufacturing method of reducing zirconium chloride, hafnium chloride or titanium chloride and manufacturing the respective metals thereof characterized in the sealing metal (e.g., refer to Patent Document 2); a manufacturing method of hafnium or zirconium characterized in the reaction container structure upon reducing zirconium tetrachloride or hafnium tetrachloride with magnesium and the manufacturing technique thereof (e.g., refer to Patent Document 3); a method of manufacturing chloro-, bromo- or iodic zirconium, hafnium, tantalum, vanadium and niobium compound vapor by introducing these into a crucible (e.g., refer to Patent Document 4); a method of refining zirconium or hafnium chloride or an acid chloride aqueous solution with strongly basic anion exchange resin (e.g., refer to Patent Document 5); a method of collecting zirconium via solvent extraction (
- Patent Document 1 Japanese Patent Laid-Open Publication No. S60-17027
- Patent Document 2 Japanese Patent Laid-Open Publication No. S61-279641
- Patent Document 3 Japanese Patent Laid-Open Publication No. S62-103328
- Patent Document 4 WO89/11449
- Patent Document 5 Japanese Patent Laid-Open Publication No. H10-204554
- Patent Document 6 Japanese Patent Laid-Open Publication No. S60-255621
- Patent Document 7 Japanese Patent Laid-Open Publication No. S61-242993
- hafnium silicide is being demanded.
- zirconium is an impurity, and there is a possibility that the required characteristics of the hafnium raw material may become unstable. Therefore, there is demand for a high purity hafnium material with reduced zirconium, and a target and thin film formed from such a material.
- an object of the present invention is to provide a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus contained in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium.
- the present inventors discovered that the intended high purity hafnium can be manufactured by using a hafnium sponge with reduced zirconium developed previously by the inventors as the raw material, and further performing electron beam melting and deoxidation with molten salt so as to efficiently separate oxygen, sulfur and phosphorus, and, as necessary, further performing electron beam melting.
- the present invention provides:
- a manufacturing method of high purity hafnium wherein a hafnium sponge raw material is subject to solvent extraction and thereafter dissolved, and the obtained hafnium ingot is further subject to deoxidation with molten salt;
- the present invention yields a superior effect in that it is capable of stably manufacturing high purity hafnium by using a hafnium sponge in which the zirconium in the hafnium is eliminated as the raw material, and further performing electron beam melting and deoxidation with molten salt to this hafnium sponge. Further, by manufacturing a sputtering target with the high purity hafnium ingot obtained as described above and performing sputtering with this target, it is possible to obtain a high purity hafnium thin film. Moreover, it is possible to obtain a thin film having a high residual resistance ratio from the high purity hafnium material, which will be able to sufficiently meet the demands as an electronic component material.
- a hafnium sponge from which zirconium has been eliminated is used as the raw material.
- a method invented previously by the present inventors may be adopted, or another raw material may be used so as long as it is hafnium with reduced zirconium.
- the previous invention as a method for reducing zirconium is introduced below.
- Hafnium tetrachloride (HfCl 4 ) is used as the raw material.
- a commercially available material can be used as the hafnium tetrachloride.
- This commercially available hafnium tetrachloride contains roughly 5 wt % of zirconium.
- hafnium (Hf) metal or hafnium oxide (HfO 2 ) may also be used as the raw material.
- These raw materials have a purity level of 3N excluding zirconium, and contain iron, chrome and nickel as main impurities other than zirconium.
- this hafnium tetrachloride raw material is dissolved in purified water.
- this is subject to multistage organic solvent extraction. Normally, solvent extraction is performed in 1 to 10 stages. TBP may be used as the organic solvent.
- zirconium can be made to be 5000 wtppm or less, and can be further made to be 1000 wtppm or less by repeating solvent extraction. Further, the total content of other impurities can be made to be 1000 wtppm or less.
- hafnium oxide HfO 2
- This hafnium oxide is subject to chlorination to obtain high purity hafnium tetrachloride (HfCl 4 ), and this is further reduced with, for instance, magnesium metal having chloridization power that is stronger than hafnium or zirconium to obtain a hafnium sponge.
- magnesium metal having chloridization power that is stronger than hafnium or zirconium to obtain a hafnium sponge.
- the reducing metal in addition to magnesium, for instance, calcium, sodium, and so on may be used.
- the hafnium sponge obtained as described above is once subject to electron beam melting (hearth melting) in a Cu crucible. Thereafter, the hafnium sponge is sequentially placed therein.
- the hafnium molten metal overflowing from the upper part of the pool flows into the upper part of the ingot. This is still in a molten metal state, and the purity can be improved by performing the two melting processes with a series of electronic beam operations at the stages of hearth melting and manufacturing the ingot.
- the obtained ingot is subject to deoxidation with molten salt.
- This deoxidation process as described later, is able to eliminate carbon, sulfur, phosphorus and other impurities. Specifically, it is possible to make oxygen 40 wtppm or less, and sulfur and phosphorus respectively 10 wtppm or less.
- zirconium can be made to be 5000 wtppm or less, and further 1000 wtppm.
- this high purity hafnium it is possible to use this high purity hafnium to manufacture a high purity hafnium target, and it is further possible to deposit high purity hafnium on a substrate by performing sputtering with this high purity target.
- a material having a high residual resistance ratio can be obtained from the foregoing high purity hafnium material as described in the following Examples, and it is possible to sufficiently meet the demands as an electronic component material.
- the target may be manufactured with the ordinary processing steps of forging, rolling, cutting, finishing (polishing) and so on. There is no particular limitation in the manufacturing method thereof, and the method may be selected arbitrarily.
- HfCl 4 hafnium tetrachloride shown in Table 1 having a purity of 3N and containing roughly 5000 wtppm of zirconium was used as the raw material, and this was dissolved in 1 L of purified water to create a nitric acid solution.
- This raw material contained 500 wtppm, 40 wtppm and 1000 wtppm of iron, chrome and nickel, respectively, as its main impurities in HfCl 4 .
- this hafnium raw material (a nitric acid solution) was subject to 4-stage organic solvent extraction using a TBP organic solvent, and neutralization treatment was performed to obtain hafnium oxide (HfO 2 ).
- hafnium oxide was subject to chlorination to obtain high purity hafnium tetrachloride (HfCl 4 ), and then subject to magnesium reduction to obtain a hafnium sponge as the raw material.
- This hafnium sponge contained 300 wtppm of zirconium, and the total content of other impurities was reduced to 300 wtppm.
- the obtained hafnium sponge was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on.
- the zirconium content did not change at 300 wtppm
- iron, chrome, nickel and other impurities were reduced to 70 wtppm as shown in Table 1, and further resulted in O: 250 wtppm
- N ⁇ 10 wtppm
- S ⁇ 10 wtppm
- P ⁇ 10 wtppm.
- the hafnium thus obtained was subject to deoxidation at 1200° C. for 5 hours with molten salt of Ca and CaCl 2 . Reduction was realized where O: ⁇ 10 wtppm and C: ⁇ 10 wtppm, and other impurities were also reduced to 30 wtppm.
- the sputtering target obtained from this ingot is also capable of maintaining high purity, and, by performing sputtering with this target, a uniform high purity hafnium thin film can be formed on a substrate.
- hafnium metal raw material (zirconium content of 2 wt %) shown in Table 2 was used and dissolved in nitric-hydrofluoric acid.
- This raw material contained 15000 wtppm, 8000 wtppm and 5000 wtppm of iron, chrome and nickel, respectively, as its main impurities in the raw material.
- hafnium raw material was subject to 10-stage organic solvent extraction using a TBP organic solvent, and neutralization treatment was performed to obtain hafnium oxide (HfO 2 ).
- hafnium oxide was subject to chlorination to obtain high purity hafnium tetrachloride (HfCl 4 ), and then subject to calcium reduction to obtain a hafnium sponge.
- This hafnium sponge contained 1500 wtppm of zirconium, and the total content of other impurities was reduced to 1000 wtppm.
- the obtained hafnium sponge was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on.
- Table 2 realized was O: 400 wtppm, C: 30 wtppm, N: ⁇ 10 wtppm, S: 10 wtppm, P: 10 wtppm.
- the hafnium thus obtained was subject to deoxidation at 1200° C. for 10 hours with molten salt of Mg and MgCl 2 . Reduction was realized where O: 20 wtppm and C: 10 wtppm, and other impurities were also reduced to 50 wtppm.
- hafnium oxide (HfO 2 ) raw material (3N level) shown in Table 3 100 Kg was used and dissolved in nitric-hydrofluoric acid.
- This raw material contained 15000 wtppm, 8000 wtppm and 5000 wtppm of iron, chrome and nickel, respectively, as its main impurities in the raw material.
- this hafnium oxide raw material was chlorinated and subject to refining with distillation of 10 or more stages, then further subject to sodium reduction.
- the obtained hafnium was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on.
- Table 3 realized was Zr: 500 wtppm, O: 100 wtppm, C: 100 wtppm, N: 20 wtppm, S: 10 wtppm, P: 10 wtppm, others: 30 wtppm.
- the hafnium thus obtained was subject to deoxidation at 1250° C., under argon pressure (4 atm) for 10 hours with molten salt of Ca and CaCl 2 . Reduction was realized where 0, C, N, S, P ⁇ 10 wtppm, and other impurities were also reduced to 25 wtppm.
- the raw material shown in Table 2 was subject to plasma arc melting to manufacture an ingot.
- the impurity content of the ingot was O: 7,000 wtppm, C: 1,800 wtppm, S: 100 wtppm, P: 50 wtppm, Zr: 20,000 wtppm, others: 1,600 wtppm.
- the residual resistance ratio of this ingot is similarly shown in Table 4.
- the present invention is able to stably manufacture high purity hafnium in which gas components such as oxygen and other impurity elements are reduced by using a hafnium sponge with reduced zirconium as the raw material and subjecting this hafnium sponge to electron beam melting and deoxidation processing with molten salt, such high purity hafnium can be used as a heat-resistant or corrosion-resistant material, or an electronic material or optical material.
Abstract
Description
- The present invention relates to a high purity hafnium material in which the content of impurities such as zirconium, oxygen, sulfur and phosphorus contained in the hafnium is reduced, as well as to a target and thin film formed from such high purity hafnium material, and a manufacturing method of high purity hafnium.
- Conventionally, there are numerous documents relating to the manufacture of hafnium, and, since hafnium and zirconium are very similar in terms of atomic structure and chemical property, the inclusion of zirconium or the inclusion of zirconium in hafnium was never really acknowledged as a problem as exemplified below.
- Hafnium and zirconium are superior in heat resistance and corrosion resistance, and are characterized in that they have a strong affinity with oxygen and nitrogen. And, since the oxides or nitrides thereof have superior stability in high temperatures, they are utilized as fire-resistant materials in the manufacture of nuclear ceramics, steel or castings. Further, recently, these are also being used as electronic materials or optical materials.
- The manufacturing method of metal hafnium or metal zirconium is proposed as the same manufacturing method. As such example, there is a method of reacting a fluorine-containing zirconium or hafnium compound with metal aluminum or magnesium in inert gas, reducing gas or vacuum at a temperature of 400° C. or higher (e.g., refer to Patent Document 1); a manufacturing method of reducing zirconium chloride, hafnium chloride or titanium chloride and manufacturing the respective metals thereof characterized in the sealing metal (e.g., refer to Patent Document 2); a manufacturing method of hafnium or zirconium characterized in the reaction container structure upon reducing zirconium tetrachloride or hafnium tetrachloride with magnesium and the manufacturing technique thereof (e.g., refer to Patent Document 3); a method of manufacturing chloro-, bromo- or iodic zirconium, hafnium, tantalum, vanadium and niobium compound vapor by introducing these into a crucible (e.g., refer to Patent Document 4); a method of refining zirconium or hafnium chloride or an acid chloride aqueous solution with strongly basic anion exchange resin (e.g., refer to Patent Document 5); a method of collecting zirconium via solvent extraction (e.g., refer to Patent Document 6); and a crystal bar hafnium manufacturing device having characteristics in the feed portion (e.g., refer to Patent Document 7).
- [Patent Document 1] Japanese Patent Laid-Open Publication No. S60-17027
- [Patent Document 2] Japanese Patent Laid-Open Publication No. S61-279641
- [Patent Document 3] Japanese Patent Laid-Open Publication No. S62-103328
- [Patent Document 4] WO89/11449
- [Patent Document 5] Japanese Patent Laid-Open Publication No. H10-204554
- [Patent Document 6] Japanese Patent Laid-Open Publication No. S60-255621
- [Patent Document 7] Japanese Patent Laid-Open Publication No. S61-242993
- As described in the foregoing documents, although there are numerous refining methods and extraction methods of zirconium and hafnium, the inclusion of zirconium or the inclusion of zirconium in hafnium was never really acknowledged as a problem.
- Nevertheless, in recent years, deposition on electronic components using hafnium silicide is being demanded. In such a case, even zirconium is an impurity, and there is a possibility that the required characteristics of the hafnium raw material may become unstable. Therefore, there is demand for a high purity hafnium material with reduced zirconium, and a target and thin film formed from such a material.
- However, since there was no notion of separating hafnium and zirconium as described above, the actual condition is that there is no efficient and stable manufacturing technology for obtaining the foregoing high purity hafnium material with reduced zirconium, and a target and thin film formed from such a material. Further, since it is difficult to efficiently eliminate the impurities of oxygen, sulfur and phosphorus, this is another reason that high purification has been neglected heretofore.
- In particular, materials having a high residual resistance ratio are being demanded, and, since a high purity hafnium material could not be obtained conventionally, it was not possible to sufficiently meet the demands as electronic component materials since the residual resistance ratio was low.
- Thus, an object of the present invention is to provide a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus contained in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium. Thereby provided is efficient and stable manufacturing technology which enables the manufacture of a high purity hafnium material, and a target and thin film formed from such material.
- In order to achieve the foregoing object, as a result of intense study, the present inventors discovered that the intended high purity hafnium can be manufactured by using a hafnium sponge with reduced zirconium developed previously by the inventors as the raw material, and further performing electron beam melting and deoxidation with molten salt so as to efficiently separate oxygen, sulfur and phosphorus, and, as necessary, further performing electron beam melting.
- Based on the foregoing discovery, the present invention provides:
- 1) High purity hafnium and a target and thin film formed from the high purity hafnium having a purity of 4N or higher excluding zirconium and gas components, and an oxygen content of 40 wtppm or less;
- 2) High purity hafnium and a target and thin film formed from the high purity hafnium having a purity of 4N or higher excluding zirconium and gas components, and in which the content of sulfur and phosphorus is respectively 10 wtppm or less;
- 3) High purity hafnium and a target and thin film formed from the high purity hafnium according to paragraph 1) above having a purity of 4N or higher excluding zirconium and gas components, and in which the content of sulfur and phosphorus is respectively 10 wtppm or less;
- 4) High purity hafnium and a target and thin film formed from the high purity hafnium according to any one of paragraphs 1) to 3) above having a purity of 4N or higher excluding zirconium and gas components, and in which the zirconium content is 0.5 wt % or lower;
- 5) A manufacturing method of high purity hafnium wherein a hafnium sponge raw material is subject to solvent extraction and thereafter dissolved, and the obtained hafnium ingot is further subject to deoxidation with molten salt; and
- 6) The manufacturing method of high purity hafnium according to paragraph 5) above wherein, after performing deoxidation with molten salt, electron beam melting is further performed.
- [Effect of the Invention]
- The present invention yields a superior effect in that it is capable of stably manufacturing high purity hafnium by using a hafnium sponge in which the zirconium in the hafnium is eliminated as the raw material, and further performing electron beam melting and deoxidation with molten salt to this hafnium sponge. Further, by manufacturing a sputtering target with the high purity hafnium ingot obtained as described above and performing sputtering with this target, it is possible to obtain a high purity hafnium thin film. Moreover, it is possible to obtain a thin film having a high residual resistance ratio from the high purity hafnium material, which will be able to sufficiently meet the demands as an electronic component material.
- In the present invention, a hafnium sponge from which zirconium has been eliminated is used as the raw material. Upon eliminating zirconium from hafnium, a method invented previously by the present inventors may be adopted, or another raw material may be used so as long as it is hafnium with reduced zirconium.
- The previous invention as a method for reducing zirconium is introduced below.
- Hafnium tetrachloride (HfCl4) is used as the raw material. A commercially available material can be used as the hafnium tetrachloride. This commercially available hafnium tetrachloride contains roughly 5 wt % of zirconium. Incidentally, hafnium (Hf) metal or hafnium oxide (HfO2) may also be used as the raw material.
- These raw materials have a purity level of 3N excluding zirconium, and contain iron, chrome and nickel as main impurities other than zirconium.
- First, this hafnium tetrachloride raw material is dissolved in purified water. Next, this is subject to multistage organic solvent extraction. Normally, solvent extraction is performed in 1 to 10 stages. TBP may be used as the organic solvent.
- As a result, zirconium can be made to be 5000 wtppm or less, and can be further made to be 1000 wtppm or less by repeating solvent extraction. Further, the total content of other impurities can be made to be 1000 wtppm or less.
- Next, neutralization treatment is performed to obtain hafnium oxide (HfO2). This hafnium oxide is subject to chlorination to obtain high purity hafnium tetrachloride (HfCl4), and this is further reduced with, for instance, magnesium metal having chloridization power that is stronger than hafnium or zirconium to obtain a hafnium sponge. As the reducing metal, in addition to magnesium, for instance, calcium, sodium, and so on may be used.
- In the present invention, the hafnium sponge obtained as described above is once subject to electron beam melting (hearth melting) in a Cu crucible. Thereafter, the hafnium sponge is sequentially placed therein. The hafnium molten metal overflowing from the upper part of the pool flows into the upper part of the ingot. This is still in a molten metal state, and the purity can be improved by performing the two melting processes with a series of electronic beam operations at the stages of hearth melting and manufacturing the ingot.
- Thereafter, the obtained ingot is subject to deoxidation with molten salt. This deoxidation process, as described later, is able to eliminate carbon, sulfur, phosphorus and other impurities. Specifically, it is possible to make oxygen 40 wtppm or less, and sulfur and phosphorus respectively 10 wtppm or less. In the foregoing process, zirconium can be made to be 5000 wtppm or less, and further 1000 wtppm.
- Like this, it is possible to obtain a high purity hafnium ingot having a purity of 4N (99.99 wt %) or higher excluding gas components such as carbon, oxygen and nitrogen, and zirconium.
- Further, it is possible to use this high purity hafnium to manufacture a high purity hafnium target, and it is further possible to deposit high purity hafnium on a substrate by performing sputtering with this high purity target.
- Moreover, a material having a high residual resistance ratio can be obtained from the foregoing high purity hafnium material as described in the following Examples, and it is possible to sufficiently meet the demands as an electronic component material.
- The target may be manufactured with the ordinary processing steps of forging, rolling, cutting, finishing (polishing) and so on. There is no particular limitation in the manufacturing method thereof, and the method may be selected arbitrarily.
- Examples of the present invention are now explained. These Examples are merely illustrative, and the present invention shall in no way be limited thereby. In other words, the present invention shall only be limited by the scope of the present invention, and shall include the various modifications other than the Examples of this invention.
- 100 Kg of commercially available hafnium tetrachloride (HfCl4) shown in Table 1 having a purity of 3N and containing roughly 5000 wtppm of zirconium was used as the raw material, and this was dissolved in 1 L of purified water to create a nitric acid solution.
- This raw material contained 500 wtppm, 40 wtppm and 1000 wtppm of iron, chrome and nickel, respectively, as its main impurities in HfCl4.
- Next, this hafnium raw material (a nitric acid solution) was subject to 4-stage organic solvent extraction using a TBP organic solvent, and neutralization treatment was performed to obtain hafnium oxide (HfO2).
- Further, this hafnium oxide was subject to chlorination to obtain high purity hafnium tetrachloride (HfCl4), and then subject to magnesium reduction to obtain a hafnium sponge as the raw material. This hafnium sponge contained 300 wtppm of zirconium, and the total content of other impurities was reduced to 300 wtppm.
- Next, the obtained hafnium sponge was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on. As a result of the foregoing process, although the zirconium content did not change at 300 wtppm, iron, chrome, nickel and other impurities were reduced to 70 wtppm as shown in Table 1, and further resulted in O: 250 wtppm, C: 50 wtppm, N: <10 wtppm, S: <10 wtppm, P: <10 wtppm.
- Next, the hafnium thus obtained was subject to deoxidation at 1200° C. for 5 hours with molten salt of Ca and CaCl2. Reduction was realized where O: <10 wtppm and C: <10 wtppm, and other impurities were also reduced to 30 wtppm.
- Accordingly, it is possible to obtain a high purity hafnium ingot having a purity level of 4N (99.99 wt %) excluding zirconium.
- The sputtering target obtained from this ingot is also capable of maintaining high purity, and, by performing sputtering with this target, a uniform high purity hafnium thin film can be formed on a substrate.
TABLE 1 wtppm O C N S P Zr Others Raw Material — — — 20 20 5000 800 Ingot 250 50 <10 <10 <10 300 70 Deoxidation <10 <10 <10 <10 <10 300 30 - 100 Kg of hafnium metal raw material (zirconium content of 2 wt %) shown in Table 2 was used and dissolved in nitric-hydrofluoric acid. This raw material contained 15000 wtppm, 8000 wtppm and 5000 wtppm of iron, chrome and nickel, respectively, as its main impurities in the raw material.
- Next, this hafnium raw material was subject to 10-stage organic solvent extraction using a TBP organic solvent, and neutralization treatment was performed to obtain hafnium oxide (HfO2).
- Further, this hafnium oxide was subject to chlorination to obtain high purity hafnium tetrachloride (HfCl4), and then subject to calcium reduction to obtain a hafnium sponge. This hafnium sponge contained 1500 wtppm of zirconium, and the total content of other impurities was reduced to 1000 wtppm.
- Next, the obtained hafnium sponge was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on. As a result of the foregoing process, as shown in Table 2, realized was O: 400 wtppm, C: 30 wtppm, N: <10 wtppm, S: 10 wtppm, P: 10 wtppm.
- Next, the hafnium thus obtained was subject to deoxidation at 1200° C. for 10 hours with molten salt of Mg and MgCl2. Reduction was realized where O: 20 wtppm and C: 10 wtppm, and other impurities were also reduced to 50 wtppm.
- With the sputtering target obtained from this ingot, as with Example 1, a uniform high purity hafnium thin film can be formed on a substrate.
TABLE 2 wtppm O C N S P Zr Others Raw Material 10000 5000 4000 100 50 20000 30000 Ingot 400 30 <10 10 10 1500 100 Deoxidation 20 10 <10 <10 <10 1500 50 - 100 Kg of hafnium oxide (HfO2) raw material (3N level) shown in Table 3 was used and dissolved in nitric-hydrofluoric acid. This raw material contained 15000 wtppm, 8000 wtppm and 5000 wtppm of iron, chrome and nickel, respectively, as its main impurities in the raw material.
- Next, this hafnium oxide raw material was chlorinated and subject to refining with distillation of 10 or more stages, then further subject to sodium reduction.
- Next, the obtained hafnium was used as the raw material, and further subject to two-stage melting via hearth melting and ingot melting with an electron beam to remove volatile elements, gas components and so on. As a result of the foregoing process, as shown in Table 3, realized was Zr: 500 wtppm, O: 100 wtppm, C: 100 wtppm, N: 20 wtppm, S: 10 wtppm, P: 10 wtppm, others: 30 wtppm.
- Next, the hafnium thus obtained was subject to deoxidation at 1250° C., under argon pressure (4 atm) for 10 hours with molten salt of Ca and CaCl2. Reduction was realized where 0, C, N, S, P<10 wtppm, and other impurities were also reduced to 25 wtppm.
- With the sputtering target obtained from this ingot, as with Example 1, a uniform high purity hafnium thin film can be formed on a substrate.
TABLE 3 wtppm O C N S P Zr Others Raw Material — 10000 5000 500 100 10000 10000 Ingot 100 100 20 10 10 500 30 Deoxidation <10 <10 <10 <10 <10 500 25 - With respect to the foregoing Examples 1 to 3, results of measuring the residual resistance ratio are shown in Table 4. As a result, as shown in Table 4, the residual resistance ratio at the ingot stage in Examples 1, 2 and 3 is respectively 38, 22 and 45, but respectively increased after deoxidation at 200, 120 and 190. Like this, it is evident that hafnium having a high residual resistance ratio can be obtained from hafnium having ultra high purity.
TABLE 4 Hafnium Material Residual Resistance Ratio Example 1 Ingot 38 After Deoxidation 200 Example 2 Ingot 22 After Deoxidation 120 Example 3 Ingot 45 After Deoxidation 190 Comparative Ingot 5 Example 1 - The raw material shown in Table 2 was subject to plasma arc melting to manufacture an ingot. The impurity content of the ingot was O: 7,000 wtppm, C: 1,800 wtppm, S: 100 wtppm, P: 50 wtppm, Zr: 20,000 wtppm, others: 1,600 wtppm. The residual resistance ratio of this ingot is similarly shown in Table 4.
- As clear from Table 4, since the impurity content is high, the residual resistance ratio was low at 5.
- Since the present invention is able to stably manufacture high purity hafnium in which gas components such as oxygen and other impurity elements are reduced by using a hafnium sponge with reduced zirconium as the raw material and subjecting this hafnium sponge to electron beam melting and deoxidation processing with molten salt, such high purity hafnium can be used as a heat-resistant or corrosion-resistant material, or an electronic material or optical material.
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US20060193979A1 (en) * | 2004-03-01 | 2006-08-31 | Meiere Scott H | Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
US20070018138A1 (en) * | 2003-07-25 | 2007-01-25 | Nikko Materials Co.,Ltd. | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US20090000704A1 (en) * | 2003-03-07 | 2009-01-01 | Nippon Mining & Metals Co., Ltd. | Hafnium Alloy Target and Process for Producing the Same |
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Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2782116A (en) * | 1946-09-06 | 1957-02-19 | Frank H Spedding | Method of preparing metals from their halides |
US4637831A (en) * | 1985-05-30 | 1987-01-20 | Westinghouse Electric Corp. | Process for reduction of zirconium, hafnium or titanium using a zinc or tin seal |
US4668287A (en) * | 1985-09-26 | 1987-05-26 | Westinghouse Electric Corp. | Process for producing high purity zirconium and hafnium |
US4897116A (en) * | 1988-05-25 | 1990-01-30 | Teledyne Industries, Inc. | High purity Zr and Hf metals and their manufacture |
US5112493A (en) * | 1990-12-10 | 1992-05-12 | Westinghouse Electric Corp. | Zirconium-hafnium production in a zero liquid discharge process |
US5196916A (en) * | 1990-02-15 | 1993-03-23 | Kabushiki Kaisha Toshiba | Highly purified metal material and sputtering target using the same |
US5460793A (en) * | 1993-05-07 | 1995-10-24 | Japan Energy Corporation | Silicide targets for sputtering and method of manufacturing the same |
US6352628B2 (en) * | 1993-07-27 | 2002-03-05 | Kabushiki Kaisha Toshiba | Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device |
US20020194953A1 (en) * | 1997-04-30 | 2002-12-26 | Harry Rosenberg | Titanium materials |
US20030062261A1 (en) * | 2000-10-02 | 2003-04-03 | Yuichiro Shindo | High purity zirconium or hafnium, sputtering target comprising the high purity zirconium of hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium |
US6723183B2 (en) * | 2000-06-19 | 2004-04-20 | Nikko Materials Company, Limited | Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide target |
US6737030B2 (en) * | 2002-01-29 | 2004-05-18 | Ati Properties, Inc. | Method for separating hafnium from zirconium |
US20040170552A1 (en) * | 2001-07-18 | 2004-09-02 | Shuichi Irumata | Hafnium silicide target for forming gate oxide film and method for preparation thereof |
US6986834B2 (en) * | 2002-08-06 | 2006-01-17 | Nikko Materials Co., Ltd. | Hafnium silicide target and manufacturing method for preparation thereof |
US20060062910A1 (en) * | 2004-03-01 | 2006-03-23 | Meiere Scott H | Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
US20060189164A1 (en) * | 2003-03-07 | 2006-08-24 | Nikko Materials Co., Ltd | Hafnium alloy target and process for producing the same |
US20070018138A1 (en) * | 2003-07-25 | 2007-01-25 | Nikko Materials Co.,Ltd. | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US7241368B2 (en) * | 2001-07-09 | 2007-07-10 | Nippon Mining & Metals Co., Ltd. | Hafnium silicide target for gate oxide film formation and its production method |
US20090226341A1 (en) * | 2005-07-07 | 2009-09-10 | Nippon Mining & Metals Co., Ltd. | High-Purity Hafnium, Target and Thin Film Comprising High-Purity Hafnium, and Process for Producing High-Purity Hafnium |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4722827A (en) * | 1985-09-26 | 1988-02-02 | Westinghouse Electric Corp. | Zirconium and hafnium with low oxygen and iron |
JPH0723526B2 (en) * | 1986-01-13 | 1995-03-15 | 株式会社日立製作所 | Corrosion-resistant hafnium substrate and method for manufacturing the same |
US4923531A (en) * | 1988-09-23 | 1990-05-08 | Rmi Company | Deoxidation of titanium and similar metals using a deoxidant in a molten metal carrier |
JP2921799B2 (en) * | 1990-02-15 | 1999-07-19 | 株式会社 東芝 | Method for manufacturing high-purity sputter target for semiconductor element formation |
JPH0814009B2 (en) * | 1990-08-14 | 1996-02-14 | 京都大学長 | Ultra low oxygen titanium production method |
JPH07316681A (en) * | 1994-05-25 | 1995-12-05 | Japan Energy Corp | Production of metallic material or alloy material, refining agent and metallic material or alloy material excellent in corrosion resistance |
JP3591756B2 (en) * | 1997-04-04 | 2004-11-24 | 日本電信電話株式会社 | Production method of metal fluoride |
JP3607532B2 (en) * | 1999-06-03 | 2005-01-05 | 住友チタニウム株式会社 | Deoxygenation method for titanium material |
JP2002206103A (en) * | 2000-11-09 | 2002-07-26 | Nikko Materials Co Ltd | Method for manufacturing high-purity zirconium or hafnium powder |
JP4104039B2 (en) * | 2000-10-02 | 2008-06-18 | 日鉱金属株式会社 | Method for producing high-purity zirconium or hafnium |
JP3737429B2 (en) * | 2001-12-25 | 2006-01-18 | 住友チタニウム株式会社 | Method for purifying metal salt, method for deoxidizing titanium material, and method for producing the same |
-
2004
- 2004-10-25 JP JP2005515564A patent/JP4749862B2/en not_active Expired - Fee Related
- 2004-10-25 CN CN2004800341759A patent/CN1882711B/en not_active Expired - Fee Related
- 2004-10-25 CN CN200910254164A patent/CN101760647A/en active Pending
- 2004-10-25 EP EP04792914A patent/EP1686196B1/en not_active Expired - Fee Related
- 2004-10-25 KR KR1020067011476A patent/KR100766275B1/en active IP Right Grant
- 2004-10-25 DE DE602004020916T patent/DE602004020916D1/en active Active
- 2004-10-25 US US10/595,660 patent/US20060266158A1/en not_active Abandoned
- 2004-10-25 WO PCT/JP2004/015777 patent/WO2005049882A1/en active Application Filing
- 2004-10-25 EP EP08165172A patent/EP2017360B1/en not_active Expired - Fee Related
- 2004-10-28 TW TW093132709A patent/TWI275653B/en active
-
2010
- 2010-04-05 JP JP2010086629A patent/JP5406104B2/en not_active Expired - Fee Related
Patent Citations (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2782116A (en) * | 1946-09-06 | 1957-02-19 | Frank H Spedding | Method of preparing metals from their halides |
US4637831A (en) * | 1985-05-30 | 1987-01-20 | Westinghouse Electric Corp. | Process for reduction of zirconium, hafnium or titanium using a zinc or tin seal |
US4668287A (en) * | 1985-09-26 | 1987-05-26 | Westinghouse Electric Corp. | Process for producing high purity zirconium and hafnium |
US4897116A (en) * | 1988-05-25 | 1990-01-30 | Teledyne Industries, Inc. | High purity Zr and Hf metals and their manufacture |
US5196916A (en) * | 1990-02-15 | 1993-03-23 | Kabushiki Kaisha Toshiba | Highly purified metal material and sputtering target using the same |
US5458697A (en) * | 1990-02-15 | 1995-10-17 | Kabushiki Kaisha Toshiba | Highly purified metal material and sputtering target using the same |
US5679983A (en) * | 1990-02-15 | 1997-10-21 | Kabushiki Kaisha Toshiba | Highly purified metal material and sputtering target using the same |
US5112493A (en) * | 1990-12-10 | 1992-05-12 | Westinghouse Electric Corp. | Zirconium-hafnium production in a zero liquid discharge process |
US5460793A (en) * | 1993-05-07 | 1995-10-24 | Japan Energy Corporation | Silicide targets for sputtering and method of manufacturing the same |
US6352628B2 (en) * | 1993-07-27 | 2002-03-05 | Kabushiki Kaisha Toshiba | Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device |
US20020194953A1 (en) * | 1997-04-30 | 2002-12-26 | Harry Rosenberg | Titanium materials |
US6723183B2 (en) * | 2000-06-19 | 2004-04-20 | Nikko Materials Company, Limited | Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide target |
US6861030B2 (en) * | 2000-10-02 | 2005-03-01 | Nikko Materials Company, Limited | Method of manufacturing high purity zirconium and hafnium |
US20030062261A1 (en) * | 2000-10-02 | 2003-04-03 | Yuichiro Shindo | High purity zirconium or hafnium, sputtering target comprising the high purity zirconium of hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium |
US7241368B2 (en) * | 2001-07-09 | 2007-07-10 | Nippon Mining & Metals Co., Ltd. | Hafnium silicide target for gate oxide film formation and its production method |
US20040170552A1 (en) * | 2001-07-18 | 2004-09-02 | Shuichi Irumata | Hafnium silicide target for forming gate oxide film and method for preparation thereof |
US6737030B2 (en) * | 2002-01-29 | 2004-05-18 | Ati Properties, Inc. | Method for separating hafnium from zirconium |
US6986834B2 (en) * | 2002-08-06 | 2006-01-17 | Nikko Materials Co., Ltd. | Hafnium silicide target and manufacturing method for preparation thereof |
US20060189164A1 (en) * | 2003-03-07 | 2006-08-24 | Nikko Materials Co., Ltd | Hafnium alloy target and process for producing the same |
US20070018138A1 (en) * | 2003-07-25 | 2007-01-25 | Nikko Materials Co.,Ltd. | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US20090126529A1 (en) * | 2003-07-25 | 2009-05-21 | Nippon Mining & Metals Co., Ltd. | Highly Pure Hafnium Material, Target and Thin Film Comprising the Same and Method for Producing Highly Pure Hafnium |
US7674441B2 (en) * | 2003-07-25 | 2010-03-09 | Nippon Mining & Metals Co., Ltd | Highly pure hafnium material, target and thin film comprising the same and method for producing highly pure hafnium |
US7964070B2 (en) * | 2003-07-25 | 2011-06-21 | Jx Nippon Mining & Metals Corporation | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US20060062910A1 (en) * | 2004-03-01 | 2006-03-23 | Meiere Scott H | Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
US20060193979A1 (en) * | 2004-03-01 | 2006-08-31 | Meiere Scott H | Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
US20090226341A1 (en) * | 2005-07-07 | 2009-09-10 | Nippon Mining & Metals Co., Ltd. | High-Purity Hafnium, Target and Thin Film Comprising High-Purity Hafnium, and Process for Producing High-Purity Hafnium |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7674446B2 (en) | 2001-07-18 | 2010-03-09 | Nippon Mining & Metals Co., Ltd | Hafnium silicide target for forming gate oxide film, and method for preparation thereof |
US20090194898A1 (en) * | 2001-07-18 | 2009-08-06 | Nippon Mining & Metals Co., Ltd. | Hafnium Silicide Target for Forming Gate Oxide Film, and Method for Preparation Thereof |
US8241438B2 (en) | 2003-03-07 | 2012-08-14 | Jx Nippon Mining & Metals Corporation | Hafnium alloy target |
US20090000704A1 (en) * | 2003-03-07 | 2009-01-01 | Nippon Mining & Metals Co., Ltd. | Hafnium Alloy Target and Process for Producing the Same |
US20090050475A1 (en) * | 2003-03-07 | 2009-02-26 | Nippon Mining & Metals Co., Ltd. | Hafnium Alloy Target and Process for Producing the Same |
US20090057142A1 (en) * | 2003-03-07 | 2009-03-05 | Nippon Mining & Metals Co., Ltd. | Hafnium Alloy Target and Process for Producing the Same |
US8062440B2 (en) | 2003-03-07 | 2011-11-22 | Jx Nippon Mining & Metals Corporation | Hafnium alloy target and process for producing the same |
US7964070B2 (en) | 2003-07-25 | 2011-06-21 | Jx Nippon Mining & Metals Corporation | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US20070018138A1 (en) * | 2003-07-25 | 2007-01-25 | Nikko Materials Co.,Ltd. | Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium |
US7674441B2 (en) | 2003-07-25 | 2010-03-09 | Nippon Mining & Metals Co., Ltd | Highly pure hafnium material, target and thin film comprising the same and method for producing highly pure hafnium |
US20090126529A1 (en) * | 2003-07-25 | 2009-05-21 | Nippon Mining & Metals Co., Ltd. | Highly Pure Hafnium Material, Target and Thin Film Comprising the Same and Method for Producing Highly Pure Hafnium |
US20060193979A1 (en) * | 2004-03-01 | 2006-08-31 | Meiere Scott H | Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
US20090226341A1 (en) * | 2005-07-07 | 2009-09-10 | Nippon Mining & Metals Co., Ltd. | High-Purity Hafnium, Target and Thin Film Comprising High-Purity Hafnium, and Process for Producing High-Purity Hafnium |
US8277723B2 (en) | 2005-07-07 | 2012-10-02 | Jx Nippon Mining & Metals Corporation | High-purity hafnium, target and thin film comprising high-purity hafnium, and process for producing high-purity hafnium |
US20110300017A1 (en) * | 2009-01-29 | 2011-12-08 | Jx Nippon Mining & Metals Corporation | Method for Manufacturing High-Purity Erbium, High-Purity Erbium, Sputtering Target Composed of High-Purity Erbium, and Metal Gate Film having High-Purity Erbium as Main Component |
TWI485263B (en) * | 2009-01-29 | 2015-05-21 | Jx Nippon Mining & Metals Corp | High purity erbium, a high purity erbium, a sputtering target composed of high purity erbium, and a metal gate film containing high purity erbium as the main component |
CN102471828A (en) * | 2009-07-15 | 2012-05-23 | 株式会社神户制钢所 | Method for producing alloy ingots |
US8496046B2 (en) | 2009-07-15 | 2013-07-30 | Kobe Steel. Ltd. | Method for producing alloy ingot |
RU2494158C1 (en) * | 2009-07-15 | 2013-09-27 | Кабусики Кайся Кобе Сейко Се | Method of producing alloy ingot |
US9834830B2 (en) | 2011-12-20 | 2017-12-05 | Kabushiki Kaisha Toshiba | Tungsten alloy, tungsten alloy part, discharge lamp, transmitting tube, and magnetron |
US10167536B2 (en) | 2011-12-20 | 2019-01-01 | Kabushiki Kaisha Toshiba | Tungsten alloy, tungsten alloy part, discharge lamp, transmitting tube, and magnetron |
US10395879B2 (en) | 2012-05-29 | 2019-08-27 | Kabushiki Kaisha Toshiba | Tungsten alloy part, and discharge lamp, transmitting tube, and magnetron using the same |
US10998157B2 (en) | 2012-05-29 | 2021-05-04 | Kabushiki Kaisha Toshiba | Tungsten alloy part, and discharge lamp, transmitting tube, and magnetron using the same |
Also Published As
Publication number | Publication date |
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EP2017360A3 (en) | 2009-08-05 |
CN1882711B (en) | 2010-05-12 |
KR100766275B1 (en) | 2007-10-15 |
EP1686196A1 (en) | 2006-08-02 |
KR20060101526A (en) | 2006-09-25 |
TW200521255A (en) | 2005-07-01 |
WO2005049882A1 (en) | 2005-06-02 |
CN1882711A (en) | 2006-12-20 |
JP4749862B2 (en) | 2011-08-17 |
EP1686196A4 (en) | 2007-04-25 |
EP2017360B1 (en) | 2012-08-08 |
DE602004020916D1 (en) | 2009-06-10 |
TWI275653B (en) | 2007-03-11 |
JPWO2005049882A1 (en) | 2008-06-12 |
EP1686196B1 (en) | 2009-04-29 |
EP2017360A2 (en) | 2009-01-21 |
JP2010196172A (en) | 2010-09-09 |
JP5406104B2 (en) | 2014-02-05 |
CN101760647A (en) | 2010-06-30 |
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