US20060233214A1 - Hybrid electrode support bar - Google Patents
Hybrid electrode support bar Download PDFInfo
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- US20060233214A1 US20060233214A1 US11/224,861 US22486105A US2006233214A1 US 20060233214 A1 US20060233214 A1 US 20060233214A1 US 22486105 A US22486105 A US 22486105A US 2006233214 A1 US2006233214 A1 US 2006233214A1
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- flow
- increasing mechanism
- speed increasing
- fan
- flow speed
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/08—Cooling; Ventilating
- H01F27/22—Cooling by heat conduction through solid or powdered fillings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F3/00—Cores, Yokes, or armatures
- H01F3/10—Composite arrangements of magnetic circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/08—High-leakage transformers or inductances
- H01F38/10—Ballasts, e.g. for discharge lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/24—Magnetic cores
- H01F27/26—Fastening parts of the core together; Fastening or mounting the core on casing or support
- H01F27/266—Fastening or mounting the core on casing or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
Definitions
- the present invention relates to gas discharge excimer or fluorine laser system gas circulation flow.
- lasing occurs in a lasing gas medium created by an electrical discharge between electrodes in a chamber containing the lasing gas mixture, e.g., for ArF, KrF, XeCl, XeF, F 2 or the like gas discharge lasers.
- the lasing gas mixture is circulated by a circulation fan, e.g., a squirrel-cage cross-flow fan, such as described in the above referenced co-pending application Ser. No. 11/095,976.
- AFBS arc-free blower speed
- AFFS arc-free fan speed
- pulse repetition rates of the types of laser mentioned above have steadily increased, e.g., up to 4 kHz it has become increasingly more difficult to attain and maintain AFFS with given size motors capable of operation at a selected RPM and torque within an allowed power consumption.
- Applicant's assignee has in the past developed a variety of fan configurations, and flow path improvements to address the need to add more RPM and/or torque to attain sufficient gas movement due to the fan operation to achieve an AFFS that is acceptable in terms of, e.g., fan power consumption. This is becoming even more critical a design issue as the pulse repetition rates climb by 50% to 6 kHz operation.
- the present application relates to further such improvements.
- An excimer or molecular fluorine gas discharge laser which may comprise a pair of electrodes extending longitudinally across a lasing chamber forming a discharge region, and method of operating same, is disclosed which may comprise a fan providing sufficient gas movement to allow for arc-free laser operation at a selected laser output light pulse repetition rate; a flow guiding mechanism extending longitudinally across the lasing chamber along the length of the discharge region configured to optimize the fan power consumption at a selected fan speed, e.g., that is greater than an AFFS; and a flow speed increasing mechanism selectively positioned along the length of the flow guiding mechanism selectively increasing the lasing gas flow rate in the vicinity of the flow increasing mechanism to thereby enable running at the selected fan speed, e.g., an arc free fan speed, at a reduced power consumption level in the fan.
- a selected fan speed e.g., an arc free fan speed
- the method and apparatus may comprise the flow speed increasing mechanism being selectively positioned in a plurality of discrete positions along the length of the flow guiding mechanism, which may comprise the two ends of the flow guiding mechanism.
- the flow guiding mechanism may comprise an electrode support optimizing the fan power consumption at a selected fan speed by being formed to have a plurality of flow slots separated by respective support member; and the flow speed increasing mechanism may comprise the absence of a slot at a selected position along the length of the flow guiding mechanism.
- the electrode support may comprise an anode support bar, which may comprise a flue comprising a pocket formed along the longitudinal extent of the anode support bar and/or a pocket formed in the vicinity of the flow speed increasing mechanism.
- the position of the flow speed increasing mechanism may be selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
- FIG. 1 shows a perspective orthogonal view of an anode support bar illustrating aspects of an embodiment of the present invention
- FIG. 2 shows an opposite perspective orthogonal view of the anode support bar of FIG. 1 .
- FIG. 3 shows a cross-sectional view along lined 3 - 3 in FIG. 2 ;
- FIG. 4 shows a cross-sectional view along lines 4 - 4 in FIG. 2 .
- Applicant has examined the role of end effects in arc free fan speed (“AFFS”) variability, and determined that there is a relatively small effect that flow shaping elements have on the flow speed near the chamber walls, i.e., at either end of the anode support bar holding the anode in typical laser chambers, e.g., of the kind contained in applicant's assignees 6XXX, 7XXX and XLA-XXX series laser systems currently on the market. Applicant has also been made aware of the apparent relatively large effect that filling in the ends of the MI had on the AFFS. Considering end effects from different anode support bar geometries, applicant concluded that the anode support bar also had a large effect on end flow.
- AFFS arc free fan speed
- Applicant then concluded that one could change the geometry of the anode support bar only at the ends of the chamber and improve flow in that region, while maintaining other effects of, e.g., flow shaping elements. This can have the effect of, e.g., maximizing or optimizing flow rate in critical areas while minimizing overall fan power consumption.
- Applicant has discovered that certain anode support bar geometries draw less power for a given fan speed, e.g. a pocketed anode support bar, e.g., as disclosed in the above referenced co-pending '976 application. Applicant also has found that, such anode support bars also deliver slightly lower flow speeds.
- the AFFS being defined as the fan speed/blower speed at which unwanted arcing will occur within the chamber, e.g., through the ions in the spent lasing gas medium moving from the discharge region between the electrodes, the blower speed must be at least greater than the AFFS. With some built in margin for insuring arcing does not occur, the fan speed should be selected to be above the AFFS by such margin, e.g., at least 10% margin.
- applicants propose to configure the anode support bar as discussed herein to then enable running the fan/blower at the selected speed, but at a power level to the fan/blower that is reduced according to the configuration of the anode support bar.
- the support structure 10 may serve as an anode support bar in a gas discharge laser of the type referenced above and may serve to support an anode electrode (not shown) and adjacent flow shaping fairings (not shown) and also to ground the electrode the laser chamber, e.g., by being constructed of a conducting material and being connected to the chamber as further described below.
- the electrode support structure 10 may comprise an upper support surface 12 through which may be formed electrode connecting pin holes 14 , which may serve to fasten the, e.g., anode electrode to the electrode support structure 10 .
- the electrode support structure may have formed therein a support member fairing 16 which may form a leading edge 20 . Between the electrode support structure 10 and the support member fairing 16 may be formed a plurality of flow slots 22 , which may be structurally supported by a plurality of ribs 24 .
- the electrode support structure may have a flue 30 at least a portion of which may extend substantially between the opposing interior side walls of the laser chamber (not shown) and thereby define a flow channel for the laser gas medium flowing around the interior of the chamber.
- the flue 30 may have a concave surface 32 .
- the electrode support member may have a first end 34 and a second end 36 . at each of the first end 34 and second end 36 there may be formed a flow cutout 40 , which together with the elimination of a slot 16 so that the electrode support member 10 is solid from the leading edge 20 to the downstream side of the electrode support member over a region substantially corresponding to the length of the cutout 40 .
- the electrode support structure 10 may be formed on the first end 34 and on the second end 36 with, e.g., a mounting bracket 44 and a mounting lip 46 , for attachment of the electrode support structure 10 to the laser chamber (not shown).
- AFFS may be defined as the blower speed above which arcing occurs and below which arcing does not occur as noted above, however this speed is not a precise, e.g., RPM number as, e.g., it may vary with conditions in the chamber, e.g., pulse repetition rate, operating voltage for the gas discharge between the electrodes, fluorine content in the lasing gas mixture, which varies during laser system operation, and other factors. In addition those skilled in the art may select various levels of acceptable margin for error to insure arcing does not occur.
- AFFS as used in the present application and the appended claims includes the concept of a speed found acceptable to prevent arcing over whatever range of conditions may impact that speed and with whatever margin for error is found acceptable, whereby according to aspects of embodiments of the present invention, whatever this speed is selected to be the configuration of the anode support bar enables a reduction in the required power to achieve this selected speed or perhaps even various different AFFSs selected based on particular operating conditions and/or particular margins for error.
Abstract
An excimer or molecular fluorine gas discharge laser which may comprise a pair of electrodes extending longitudinally across a lasing chamber forming a discharge region, and method of operating same, is disclosed which may comprise a fan providing sufficient gas movement to allow for arc-free laser operation at a selected laser output light pulse repetition rate; a flow guiding mechanism extending longitudinally across the lasing chamber along the length of the discharge region configured to optimize the fan power consumption at a selected fan speed, e.g., that is greater than an arc free fan speed; and a flow speed increasing mechanism selectively positioned along the length of the flow guiding mechanism selectively increasing the lasing gas flow rate in the vicinity of the flow increasing mechanism to thereby enable running at the selected fan speed at a reduced power consumption level in the fan.
Description
- The present application is a continuation in part of co-pending U.S. application Ser. No. 11/095,976, entitled 6 KHZ AND ABOVE GAS DISCHARGE LASER SYSTEM, filed on Mar. 31, 2005, Attorney Docket No. 2004-0010-01, the disclosure of which is hereby incorporated by reference.
- The present invention relates to gas discharge excimer or fluorine laser system gas circulation flow.
- In excimer or molecular fluorine gas discharge lasers lasing occurs in a lasing gas medium created by an electrical discharge between electrodes in a chamber containing the lasing gas mixture, e.g., for ArF, KrF, XeCl, XeF, F2 or the like gas discharge lasers. Typically the lasing gas mixture is circulated by a circulation fan, e.g., a squirrel-cage cross-flow fan, such as described in the above referenced co-pending application Ser. No. 11/095,976. This can provide sufficient flow in the region between the electrodes, which essentially extend across most of the length of the chamber in the longitudinal axis of the electrodes, to both replace the spent gas mixture between the electrodes between successive electrical discharges and move the spent gas sufficiently far from the region of the next successive discharge between the electrodes so that arcing does not occur, e.g., through ions still remaining in the spent gas.
- Depending on the composition of the gas a certain fan or blower speed is needed to accomplish this and is referred to by applicant as arc-free blower speed (“AFBS”) or arc-free fan speed (“AFFS”), hereinafter AFFS. As the pulse repetition rates of the types of laser mentioned above have steadily increased, e.g., up to 4 kHz it has become increasingly more difficult to attain and maintain AFFS with given size motors capable of operation at a selected RPM and torque within an allowed power consumption. Applicant's assignee has in the past developed a variety of fan configurations, and flow path improvements to address the need to add more RPM and/or torque to attain sufficient gas movement due to the fan operation to achieve an AFFS that is acceptable in terms of, e.g., fan power consumption. This is becoming even more critical a design issue as the pulse repetition rates climb by 50% to 6 kHz operation.
- The present application relates to further such improvements.
- An excimer or molecular fluorine gas discharge laser which may comprise a pair of electrodes extending longitudinally across a lasing chamber forming a discharge region, and method of operating same, is disclosed which may comprise a fan providing sufficient gas movement to allow for arc-free laser operation at a selected laser output light pulse repetition rate; a flow guiding mechanism extending longitudinally across the lasing chamber along the length of the discharge region configured to optimize the fan power consumption at a selected fan speed, e.g., that is greater than an AFFS; and a flow speed increasing mechanism selectively positioned along the length of the flow guiding mechanism selectively increasing the lasing gas flow rate in the vicinity of the flow increasing mechanism to thereby enable running at the selected fan speed, e.g., an arc free fan speed, at a reduced power consumption level in the fan. The method and apparatus may comprise the flow speed increasing mechanism being selectively positioned in a plurality of discrete positions along the length of the flow guiding mechanism, which may comprise the two ends of the flow guiding mechanism. The flow guiding mechanism may comprise an electrode support optimizing the fan power consumption at a selected fan speed by being formed to have a plurality of flow slots separated by respective support member; and the flow speed increasing mechanism may comprise the absence of a slot at a selected position along the length of the flow guiding mechanism. The electrode support may comprise an anode support bar, which may comprise a flue comprising a pocket formed along the longitudinal extent of the anode support bar and/or a pocket formed in the vicinity of the flow speed increasing mechanism. The position of the flow speed increasing mechanism may be selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
-
FIG. 1 shows a perspective orthogonal view of an anode support bar illustrating aspects of an embodiment of the present invention; -
FIG. 2 shows an opposite perspective orthogonal view of the anode support bar ofFIG. 1 . -
FIG. 3 shows a cross-sectional view along lined 3-3 inFIG. 2 ; and -
FIG. 4 shows a cross-sectional view along lines 4-4 inFIG. 2 . - Applicant has examined the role of end effects in arc free fan speed (“AFFS”) variability, and determined that there is a relatively small effect that flow shaping elements have on the flow speed near the chamber walls, i.e., at either end of the anode support bar holding the anode in typical laser chambers, e.g., of the kind contained in applicant's assignees 6XXX, 7XXX and XLA-XXX series laser systems currently on the market. Applicant has also been made aware of the apparent relatively large effect that filling in the ends of the MI had on the AFFS. Considering end effects from different anode support bar geometries, applicant concluded that the anode support bar also had a large effect on end flow. Applicant then concluded that one could change the geometry of the anode support bar only at the ends of the chamber and improve flow in that region, while maintaining other effects of, e.g., flow shaping elements. This can have the effect of, e.g., maximizing or optimizing flow rate in critical areas while minimizing overall fan power consumption. Applicant has discovered that certain anode support bar geometries draw less power for a given fan speed, e.g. a pocketed anode support bar, e.g., as disclosed in the above referenced co-pending '976 application. Applicant also has found that, such anode support bars also deliver slightly lower flow speeds. Therefore, according to aspects of an embodiment of the present invention, applicant proposes to provide for changes in the anode support bar geometry over the length of the chamber, such that flow speed might be tuned to minimize downstream arcing in critical areas, such as at the ends of the electrodes where, e.g., the flow speed has been seen to drop.
- The AFFS being defined as the fan speed/blower speed at which unwanted arcing will occur within the chamber, e.g., through the ions in the spent lasing gas medium moving from the discharge region between the electrodes, the blower speed must be at least greater than the AFFS. With some built in margin for insuring arcing does not occur, the fan speed should be selected to be above the AFFS by such margin, e.g., at least 10% margin. By selecting the fan speed as this AFFS plus an appropriate margin for a slotted only anode support bar, according to aspects of an embodiment of the present invention applicants then propose to configure the anode support bar as discussed herein to then enable running the fan/blower at the selected speed, but at a power level to the fan/blower that is reduced according to the configuration of the anode support bar.
- Turning now to
FIGS. 1-4 there is shown anelectrode support structure 10 according to aspects of an embodiment of the present invention. Thesupport structure 10 may serve as an anode support bar in a gas discharge laser of the type referenced above and may serve to support an anode electrode (not shown) and adjacent flow shaping fairings (not shown) and also to ground the electrode the laser chamber, e.g., by being constructed of a conducting material and being connected to the chamber as further described below. - The
electrode support structure 10 may comprise anupper support surface 12 through which may be formed electrode connectingpin holes 14, which may serve to fasten the, e.g., anode electrode to theelectrode support structure 10. The electrode support structure may have formed therein asupport member fairing 16 which may form a leadingedge 20. Between theelectrode support structure 10 and thesupport member fairing 16 may be formed a plurality offlow slots 22, which may be structurally supported by a plurality ofribs 24. - The electrode support structure may have a
flue 30 at least a portion of which may extend substantially between the opposing interior side walls of the laser chamber (not shown) and thereby define a flow channel for the laser gas medium flowing around the interior of the chamber. Theflue 30 may have aconcave surface 32. The electrode support member may have afirst end 34 and asecond end 36. at each of thefirst end 34 andsecond end 36 there may be formed aflow cutout 40, which together with the elimination of aslot 16 so that theelectrode support member 10 is solid from the leadingedge 20 to the downstream side of the electrode support member over a region substantially corresponding to the length of thecutout 40. - The
electrode support structure 10 may be formed on thefirst end 34 and on thesecond end 36 with, e.g., amounting bracket 44 and amounting lip 46, for attachment of theelectrode support structure 10 to the laser chamber (not shown). - It will be understood by those skilled in the art that AFFS may be defined as the blower speed above which arcing occurs and below which arcing does not occur as noted above, however this speed is not a precise, e.g., RPM number as, e.g., it may vary with conditions in the chamber, e.g., pulse repetition rate, operating voltage for the gas discharge between the electrodes, fluorine content in the lasing gas mixture, which varies during laser system operation, and other factors. In addition those skilled in the art may select various levels of acceptable margin for error to insure arcing does not occur. Therefore, AFFS as used in the present application and the appended claims includes the concept of a speed found acceptable to prevent arcing over whatever range of conditions may impact that speed and with whatever margin for error is found acceptable, whereby according to aspects of embodiments of the present invention, whatever this speed is selected to be the configuration of the anode support bar enables a reduction in the required power to achieve this selected speed or perhaps even various different AFFSs selected based on particular operating conditions and/or particular margins for error.
- While the particular aspects of embodiment(s) of the HYBRID ELECTRODE SUPPORT BAR described and illustrated in this patent application in the detail required to satisfy 35 U.S.C. §112 is fully capable of attaining any above-described purposes for, problems to be solved by or any other reasons for or objects of the aspects of an embodiment(s) above described, it is to be understood by those skilled in the art that it is the presently described aspects of the described embodiment(s) of the present invention are merely exemplary, illustrative and representative of the subject matter which is broadly contemplated by the present invention. The scope of the presently described and claimed aspects of embodiments fully encompasses other embodiments which may now be or may become obvious to those skilled in the art based on the teachings of the Specification. The scope of the present HYBRID ELECTRODE SUPPORT BAR is solely and completely limited by only the appended claims and nothing beyond the recitations of the appended claims. Reference to an element in such claims in the singular is not intended to mean nor shall it mean in interpreting such claim element “one and only one” unless explicitly so stated, but rather “one or more”. All structural and functional equivalents to any of the elements of the above-described aspects of an embodiment(s) that are known or later come to be known to those of ordinary skill in the art are expressly incorporated herein by reference and are intended to be encompassed by the present claims. Any term used in the specification and/or in the claims and expressly given a meaning in the Specification and/or claims in the present application shall have that meaning, regardless of any dictionary or other commonly used meaning for such a term. It is not intended or necessary for a device or method discussed in the Specification as any aspect of an embodiment to address each and every problem sought to be solved by the aspects of embodiments disclosed in this application, for it to be encompassed by the present claims. No element, component, or method step in the present disclosure is intended to be dedicated to the public regardless of whether the element, component, or method step is explicitly recited in the claims. No claim element in the appended claims is to be construed under the provisions of 35 U.S.C. §112, sixth paragraph, unless the element is expressly recited using the phrase “means for” or, in the case of a method claim, the element is recited as a “step” instead of an “act”.
- It will be understood by those skilled in the art that the aspects of embodiments of the present invention disclosed above are intended to be preferred embodiments only and not to limit the disclosure of the present invention(s) in any way and particularly not to a specific preferred embodiment alone. Many changes and modification can be made to the disclosed aspects of embodiments of the disclosed invention(s) that will be understood and appreciated by those skilled in the art. The appended claims are intended in scope and meaning to cover not only the disclosed aspects of embodiments of the present invention(s) but also such equivalents and other modifications and changes that would be apparent to those skilled in the art. In additions to changes and modifications to the disclosed and claimed aspects of embodiments of the present invention(s) noted above others could be implemented.
Claims (24)
1. An excimer or molecular fluorine gas discharge laser comprising a pair of electrodes extending longitudinally across a lasing chamber forming a discharge region, comprising:
a fan providing sufficient gas movement to allow for arc-free laser operation at a selected laser output light pulse repetition rate;
a flow guiding mechanism extending longitudinally across the lasing chamber along the length of the discharge region configured to optimize the fan power consumption at a selected fan speed;
a flow speed increasing mechanism selectively positioned along the length of the flow guiding mechanism selectively increasing the lasing gas flow rate in the vicinity of the flow increasing mechanism to thereby enable running at the selected fan speed at a reduced power consumption level in the fan.
2. The apparatus of claim 1 further comprising:
the flow speed increasing mechanism is selectively positioned in a plurality of discrete positions along the length of the flow guiding mechanism.
3. The apparatus of claim 2 further comprising:
the plurality of locations comprises the two ends of the flow guiding mechanism.
4. The apparatus of claim 1 further comprising:
the flow guiding mechanism comprising an electrode support optimizing the fan power consumption at a selected fan speed by being formed to have a plurality of flow slots separated by respective support member; and
the flow speed increasing mechanism comprises the absence of a slot at a selected position along the length of the flow guiding mechanism.
5. The apparatus of claim 2 further comprising:
the flow guiding mechanism comprising an electrode support optimizing the fan power consumption at a selected fan speed by being formed to have a plurality of flow slots separated by respective support member; and
the flow speed increasing mechanism comprises the absence of a slot at a selected position along the length of the flow guiding mechanism.
6. The apparatus of claim 3 further comprising:
the flow guiding mechanism comprising an electrode support optimizing the fan power consumption at a selected fan speed by being formed to have a plurality of flow slots separated by respective support member; and
the flow speed increasing mechanism comprises the absence of a slot at a selected position along the length of the flow guiding mechanism.
7. The apparatus of claim 4 further comprising:
the electrode support comprising an anode support bar.
8. The apparatus of claim 5 further comprising:
the electrode support comprising an anode support bar.
9. The apparatus of claim 6 further comprising:
the electrode support comprising an anode support bar.
10. The apparatus of claim 7 further comprising:
the anode support bar comprising a flue comprising a pocket formed along the longitudinal extent of the anode support bar.
11. The apparatus of claim 8 further comprising:
the anode support bar comprising a flue comprising a pocket formed along the longitudinal extent of the anode support bar.
12. The apparatus of claim 9 further comprising:
the anode support bar comprising a flue comprising a pocket formed along the longitudinal extent of the anode support bar.
13. The apparatus of claim 7 further comprising:
the anode support bar comprising a pocket formed in the vicinity of the flow speed increasing mechanism.
14. The apparatus of claim 8 further comprising:
the anode support bar comprising a pocket formed in the vicinity of the flow speed increasing mechanism.
15. The apparatus of claim 9 further comprising:
the anode support bar comprising a pocket formed in the vicinity of the flow speed increasing mechanism.
16. The apparatus of claim 7 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
17. The apparatus of claim 8 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
18. The apparatus of claim 9 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
19. The apparatus of claim 10 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
20. The apparatus of claim 11 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
21. The apparatus of claim 12 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
22. The apparatus of claim 13 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
23. The apparatus of claim 14 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
24. The apparatus of claim 15 further comprising:
the position of the flow speed increasing mechanism being selected to reduce arcing downstream of the position of the flow speed increasing mechanism that occurs in the selected position at the selected fan speed.
Priority Applications (1)
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US11/224,861 US20060233214A1 (en) | 2005-03-31 | 2005-09-13 | Hybrid electrode support bar |
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US11/224,861 US20060233214A1 (en) | 2005-03-31 | 2005-09-13 | Hybrid electrode support bar |
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US11/095,976 Continuation-In-Part US20060222034A1 (en) | 2005-03-31 | 2005-03-31 | 6 Khz and above gas discharge laser system |
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US11/224,861 Abandoned US20060233214A1 (en) | 2005-03-31 | 2005-09-13 | Hybrid electrode support bar |
US13/352,127 Expired - Fee Related US8855166B2 (en) | 2005-03-31 | 2012-01-17 | 6 KHz and above gas discharge laser system |
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US11/095,976 Abandoned US20060222034A1 (en) | 2005-03-31 | 2005-03-31 | 6 Khz and above gas discharge laser system |
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US13/352,127 Expired - Fee Related US8855166B2 (en) | 2005-03-31 | 2012-01-17 | 6 KHz and above gas discharge laser system |
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EP (1) | EP1867015B1 (en) |
JP (1) | JP5349954B2 (en) |
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Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7439530B2 (en) * | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
US7482609B2 (en) * | 2005-02-28 | 2009-01-27 | Cymer, Inc. | LPP EUV light source drive laser system |
US20060222034A1 (en) | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
US7643529B2 (en) * | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
US7885309B2 (en) * | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
KR101194231B1 (en) * | 2005-11-01 | 2012-10-29 | 사이머 인코포레이티드 | Laser system |
US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
CN102810810A (en) * | 2012-03-02 | 2012-12-05 | 中国科学院光电研究院 | Single-cavity dual-electrode discharging cavity and quasimolecule laser |
RU2510110C1 (en) * | 2012-07-23 | 2014-03-20 | Олег Борисович Христофоров | Gas discharge laser |
RU2506671C1 (en) * | 2012-07-23 | 2014-02-10 | Общество с ограниченной ответственностью "РнД-ИСАН" | Gas-discharge laser and method of generating radiation |
RU2503104C1 (en) * | 2012-07-23 | 2013-12-27 | Олег Борисович Христофоров | Gas-discharge laser |
RU2519869C2 (en) * | 2012-07-23 | 2014-06-20 | Общество с ограниченной ответственностью "РнД-ИСАН" | Excimer laser system and method of generating radiation |
RU2507654C1 (en) * | 2012-07-23 | 2014-02-20 | Олег Борисович Христофоров | Gas discharge laser, laser system and method of radiation generation |
RU2510109C1 (en) * | 2012-07-23 | 2014-03-20 | Олег Борисович Христофоров | Gas discharge laser and method of radiation generation |
RU2519867C2 (en) * | 2012-07-23 | 2014-06-20 | Общество с ограниченной ответственностью "РнД-ИСАН" | Gas-discharge laser |
RU2507653C1 (en) * | 2012-07-23 | 2014-02-20 | Олег Борисович Христофоров | Gas discharge laser |
US9261794B1 (en) | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
CN107910159B (en) * | 2017-11-29 | 2019-02-12 | 山东骏风电子有限公司 | A kind of transformer of included heat sinking function |
Citations (82)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4410992A (en) * | 1980-03-26 | 1983-10-18 | Laser Science, Inc. | Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification |
US4455658A (en) * | 1982-04-20 | 1984-06-19 | Sutter Jr Leroy V | Coupling circuit for use with a transversely excited gas laser |
US4494167A (en) * | 1981-04-03 | 1985-01-15 | The Marconi Company Limited | Inductor |
US4696792A (en) * | 1984-07-30 | 1987-09-29 | General Electric Company | Nuclear reactor coolant recirculation |
US4716013A (en) * | 1983-04-29 | 1987-12-29 | Westinghouse Electric Corp. | Nuclear reactor |
US4764339A (en) * | 1986-12-16 | 1988-08-16 | The United States Of America As Represented By The United States Department Of Energy | High flux reactor |
US4770846A (en) * | 1984-02-03 | 1988-09-13 | Westinghouse Electric Corp. | Replacement support pin for guide tubes in operating plants |
US4902998A (en) * | 1988-11-21 | 1990-02-20 | Westinghouse Electric Corp. | Inductor assembly with cooled winding turns |
US4959840A (en) * | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
US4983859A (en) * | 1988-08-25 | 1991-01-08 | Hitachi Metals, Ltd. | Magnetic device for high-voltage pulse generating apparatuses |
US5023884A (en) * | 1988-01-15 | 1991-06-11 | Cymer Laser Technologies | Compact excimer laser |
US5025445A (en) * | 1989-11-22 | 1991-06-18 | Cymer Laser Technologies | System for, and method of, regulating the wavelength of a light beam |
US5025446A (en) * | 1988-04-01 | 1991-06-18 | Laserscope | Intra-cavity beam relay for optical harmonic generation |
US5100609A (en) * | 1990-11-19 | 1992-03-31 | General Electric Company | Enhancing load-following and/or spectral shift capability in single-sparger natural circulation boiling water reactors |
US5189678A (en) * | 1986-09-29 | 1993-02-23 | The United States Of America As Represented By The United States Department Of Energy | Coupling apparatus for a metal vapor laser |
US5313481A (en) * | 1993-09-29 | 1994-05-17 | The United States Of America As Represented By The United States Department Of Energy | Copper laser modulator driving assembly including a magnetic compression laser |
US5315611A (en) * | 1986-09-25 | 1994-05-24 | The United States Of America As Represented By The United States Department Of Energy | High average power magnetic modulator for metal vapor lasers |
US5325407A (en) * | 1993-03-22 | 1994-06-28 | Westinghouse Electric Corporation | Core barrel and support plate assembly for pressurized water nuclear reactor |
US5359620A (en) * | 1992-11-12 | 1994-10-25 | Cymer Laser Technologies | Apparatus for, and method of, maintaining a clean window in a laser |
US5416391A (en) * | 1992-07-31 | 1995-05-16 | Correa; Paulo N. | Electromechanical transduction of plasma pulses |
US5448580A (en) * | 1994-07-05 | 1995-09-05 | The United States Of America As Represented By The United States Department Of Energy | Air and water cooled modulator |
US5471965A (en) * | 1990-12-24 | 1995-12-05 | Kapich; Davorin D. | Very high speed radial inflow hydraulic turbine |
US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US5771260A (en) * | 1996-10-04 | 1998-06-23 | Excimer Laser Systems, Inc. | Enclosure system for laser optical systems and devices |
US5852621A (en) * | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
US5863017A (en) * | 1996-01-05 | 1999-01-26 | Cymer, Inc. | Stabilized laser platform and module interface |
US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
US5940421A (en) * | 1997-12-15 | 1999-08-17 | Cymer, Inc. | Current reversal prevention circuit for a pulsed gas discharge laser |
US5953360A (en) * | 1997-10-24 | 1999-09-14 | Synrad, Inc. | All metal electrode sealed gas laser |
US5978394A (en) * | 1998-03-11 | 1999-11-02 | Cymer, Inc. | Wavelength system for an excimer laser |
US5982800A (en) * | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
US6014398A (en) * | 1997-10-10 | 2000-01-11 | Cymer, Inc. | Narrow band excimer laser with gas additive |
US6016325A (en) * | 1998-04-27 | 2000-01-18 | Cymer, Inc. | Magnetic modulator voltage and temperature timing compensation circuit |
US6018537A (en) * | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US6028880A (en) * | 1998-01-30 | 2000-02-22 | Cymer, Inc. | Automatic fluorine control system |
US6067311A (en) * | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
US6094448A (en) * | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
US6104735A (en) * | 1999-04-13 | 2000-08-15 | Cymer, Inc. | Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US6151346A (en) * | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
US6151349A (en) * | 1998-03-04 | 2000-11-21 | Cymer, Inc. | Automatic fluorine control system |
US6164116A (en) * | 1999-05-06 | 2000-12-26 | Cymer, Inc. | Gas module valve automated test fixture |
US6188710B1 (en) * | 1997-10-10 | 2001-02-13 | Cymer, Inc. | Narrow band gas discharge laser with gas additive |
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
US6208674B1 (en) * | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
US6208675B1 (en) * | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
US6212211B1 (en) * | 1998-10-09 | 2001-04-03 | Cymer, Inc. | Shock wave dissipating laser chamber |
US6219368B1 (en) * | 1999-02-12 | 2001-04-17 | Lambda Physik Gmbh | Beam delivery system for molecular fluorine (F2) laser |
US6240117B1 (en) * | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
US6317447B1 (en) * | 2000-01-25 | 2001-11-13 | Cymer, Inc. | Electric discharge laser with acoustic chirp correction |
US6330261B1 (en) * | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
US20020006149A1 (en) * | 2000-02-09 | 2002-01-17 | Spangler Ronald L. | Laser wavelength control unit with piezoelectric driver |
US20020021728A1 (en) * | 1999-12-27 | 2002-02-21 | Newman Peter C. | Four KHz gas discharge laser |
US6359922B1 (en) * | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
US20020048288A1 (en) * | 1997-07-22 | 2002-04-25 | Armen Kroyan | Laser spectral engineering for lithographic process |
US6396856B1 (en) * | 1994-04-01 | 2002-05-28 | Irma America, Inc. | Scanning temporal ultrafast delay methods and apparatuses therefor |
US6414979B2 (en) * | 2000-06-09 | 2002-07-02 | Cymer, Inc. | Gas discharge laser with blade-dielectric electrode |
US20020101589A1 (en) * | 2001-01-29 | 2002-08-01 | Sandstrom Richard L. | High resolution etalon-grating spectrometer |
US20020105994A1 (en) * | 2000-11-17 | 2002-08-08 | Partlo William N. | Gas discharge laser with improved beam path |
US6442181B1 (en) * | 1998-07-18 | 2002-08-27 | Cymer, Inc. | Extreme repetition rate gas discharge laser |
US20020122450A1 (en) * | 2001-03-02 | 2002-09-05 | Sparrow Robert W. | High repetition rate UV excimer laser |
US6466365B1 (en) * | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
US20020154668A1 (en) * | 1999-12-10 | 2002-10-24 | Knowles David S. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6477193B2 (en) * | 1998-07-18 | 2002-11-05 | Cymer, Inc. | Extreme repetition rate gas discharge laser with improved blower motor |
US20020167975A1 (en) * | 1997-07-22 | 2002-11-14 | Spangler Ronald L. | Laser spectral engineering for lithographic process |
US20020191654A1 (en) * | 2001-01-29 | 2002-12-19 | Brian Klene | Laser lithography light source with beam delivery |
US6497490B1 (en) * | 1999-12-14 | 2002-12-24 | Silicon Light Machines | Laser beam attenuator and method of attenuating a laser beam |
US20030043876A1 (en) * | 2001-01-29 | 2003-03-06 | Leonard Lublin | Lithography laser with beam delivery and beam pointing control |
US6535531B1 (en) * | 2001-11-29 | 2003-03-18 | Cymer, Inc. | Gas discharge laser with pulse multiplier |
US6538716B2 (en) * | 2000-06-01 | 2003-03-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US20030091087A1 (en) * | 2001-01-29 | 2003-05-15 | Ershov Alexander I. | Lithography laser system with in-place alignment tool |
US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6567163B1 (en) * | 2000-08-17 | 2003-05-20 | Able Signal Company Llc | Microarray detector and synthesizer |
US20030118072A1 (en) * | 1999-12-27 | 2003-06-26 | Wittak Christian J. | Four KHz gas discharge laser system |
US20030219056A1 (en) * | 2001-01-29 | 2003-11-27 | Yager Thomas A. | High power deep ultraviolet laser with long life optics |
US6687562B2 (en) * | 2000-02-16 | 2004-02-03 | Cymer, Inc. | Process monitoring system for lithography lasers |
US20040022291A1 (en) * | 2001-04-09 | 2004-02-05 | Das Plash P. | Lithography laser with beam delivery and beam pointing control |
US6693343B2 (en) * | 2000-12-28 | 2004-02-17 | Infineon Technologies Ag | Self-passivating Cu laser fuse |
US6721340B1 (en) * | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
US6750972B2 (en) * | 2000-11-17 | 2004-06-15 | Cymer, Inc. | Gas discharge ultraviolet wavemeter with enhanced illumination |
US20040160583A1 (en) * | 2000-06-01 | 2004-08-19 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7257144B2 (en) * | 2004-02-11 | 2007-08-14 | Photomedex | Rare gas-halogen excimer lasers with baffles |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2769962A (en) * | 1952-08-22 | 1956-11-06 | British Thomson Houston Co Ltd | Cooling means for laminated magnetic cores |
US2770785A (en) * | 1953-01-29 | 1956-11-13 | Raytheon Mfg Co | Directly-cooled electromagnetic components |
US2921239A (en) * | 1955-05-10 | 1960-01-12 | Babcock & Wilcox Co | Electric igniters for use with fluent fuel burners and in sparking plugs |
US3192575A (en) * | 1962-07-25 | 1965-07-06 | Perkin Elmer Corp | Heat insulating window |
US3576500A (en) * | 1965-11-30 | 1971-04-27 | Gordon Gould | Low level laser with cyclic excitation and relaxation |
US3638137A (en) * | 1969-01-10 | 1972-01-25 | Hughes Aircraft Co | Method of q-switching and mode locking a laser beam and structure |
US3998557A (en) * | 1974-06-03 | 1976-12-21 | Massachusetts Institute Of Technology | Gas detector |
JPS55108788U (en) | 1979-01-24 | 1980-07-30 | ||
JPS55108788A (en) * | 1979-02-14 | 1980-08-21 | Nec Corp | Gas laser device |
EP0075964B1 (en) * | 1980-04-05 | 1987-08-05 | ELTRO GmbH Gesellschaft für Strahlungstechnik | Laser device |
US4407133A (en) * | 1981-08-10 | 1983-10-04 | Edmonson Glenn V | Self-contained portable temperature-controlled chamber for medications and the like |
US4529177A (en) * | 1982-09-20 | 1985-07-16 | Allied Corporation | Transformer core mandrel |
US4566291A (en) * | 1983-02-14 | 1986-01-28 | General Pneumatics Corporation | Closed cycle cryogenic cooling apparatus |
US4686680A (en) * | 1985-06-25 | 1987-08-11 | Laser Corporation Of America | Gas laser having improved crossflow blower arrangement |
US4794605A (en) * | 1986-03-13 | 1988-12-27 | Trw Inc. | Method and apparatus for control of phase conjugation cells |
US4777639A (en) * | 1986-12-15 | 1988-10-11 | Prc Corporation | Laser optical element mounting arrangement and method |
JPS63228780A (en) * | 1987-03-18 | 1988-09-22 | Toshiba Corp | Highly repetitive pulsed laser device |
JPH0637406Y2 (en) | 1987-07-24 | 1994-09-28 | 株式会社ニコン | Camera shooting data setting device |
US5153892A (en) * | 1990-01-24 | 1992-10-06 | Hitachi, Ltd. | High-pressure gas laser apparatus and method of laser processing |
US5305338A (en) * | 1990-09-25 | 1994-04-19 | Mitsubishi Denki Kabushiki Kaisha | Switch device for laser |
JP3029860B2 (en) * | 1990-11-20 | 2000-04-10 | 株式会社アマダ | Gas laser equipment |
JP3158655B2 (en) * | 1992-05-25 | 2001-04-23 | ソニー株式会社 | Radiator for electronic equipment |
JPH0637406A (en) * | 1992-07-20 | 1994-02-10 | Hitachi Ltd | Metal vapor laser device |
US6728284B1 (en) * | 1993-06-08 | 2004-04-27 | The United States Of America As Represented By The United States Department Of Energy | High power solid state laser modulator |
US5730016A (en) * | 1996-03-22 | 1998-03-24 | Elmag, Inc. | Method and apparatus for electromagnetic forming of thin walled metal |
US5719896A (en) * | 1996-03-29 | 1998-02-17 | Cymer Inc. | Low cost corona pre-ionizer for a laser |
US6198716B1 (en) | 1996-12-03 | 2001-03-06 | Sanyo Electric Co., Ltd. | Disk player including a disk chucking mechanism and plate separator device |
JP3587023B2 (en) * | 1997-05-22 | 2004-11-10 | 株式会社デンソー | Vacuum die casting apparatus and vacuum die casting method |
USRE38054E1 (en) * | 1997-07-18 | 2003-04-01 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US6240112B1 (en) * | 1997-12-15 | 2001-05-29 | Cymer, Inc. | High pulse rate pulse power system with liquid cooling |
US6345065B1 (en) * | 1998-06-04 | 2002-02-05 | Lambda Physik Ag | F2-laser with line selection |
US6023486A (en) * | 1998-08-28 | 2000-02-08 | Cymer, Inc. | Soldered fan assembly for electric discharge laser |
US6778584B1 (en) * | 1999-11-30 | 2004-08-17 | Cymer, Inc. | High power gas discharge laser with helium purged line narrowing unit |
JP4017277B2 (en) * | 1999-02-10 | 2007-12-05 | 株式会社小松製作所 | Vacuum ultraviolet laser |
US6198761B1 (en) * | 1999-05-07 | 2001-03-06 | Lambda Physik Gmbh | Coaxial laser pulser with solid dielectrics |
US6381257B1 (en) * | 1999-09-27 | 2002-04-30 | Cymer, Inc. | Very narrow band injection seeded F2 lithography laser |
US6118662A (en) * | 1999-11-05 | 2000-09-12 | Special Product Company | Enclosure for telecommunications equipment |
CH694478A5 (en) * | 2000-01-20 | 2005-01-31 | Multi Holding Ag | Contact element. |
US6404637B2 (en) * | 2000-02-14 | 2002-06-11 | Special Product Company | Concentrical slot telecommunications equipment enclosure |
DE10017816C2 (en) * | 2000-04-10 | 2002-11-14 | Vontana Ind Gmbh & Co Kg | Heating device with electric heating elements for water beds |
US6690706B2 (en) * | 2000-06-09 | 2004-02-10 | Cymer, Inc. | High rep-rate laser with improved electrodes |
US6690704B2 (en) | 2001-04-09 | 2004-02-10 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
JP2003133622A (en) * | 2001-10-29 | 2003-05-09 | Gigaphoton Inc | Ultraviolet laser apparatus |
JP3773858B2 (en) * | 2002-01-30 | 2006-05-10 | 株式会社小松製作所 | Injection-locked or MOPA gas laser system |
DE10206271A1 (en) * | 2002-02-15 | 2003-08-28 | Conti Temic Microelectronic | Thermal conductor connecting heat sink to substrate carrying electronic components used for engine valve control, has wavy profile and resilience |
JP2004106041A (en) * | 2002-09-20 | 2004-04-08 | Sumitomo Special Metals Co Ltd | Press, and manufacturing method of magnet |
US7002443B2 (en) * | 2003-06-25 | 2006-02-21 | Cymer, Inc. | Method and apparatus for cooling magnetic circuit elements |
US20060222034A1 (en) | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
-
2005
- 2005-03-31 US US11/095,976 patent/US20060222034A1/en not_active Abandoned
- 2005-09-13 US US11/224,861 patent/US20060233214A1/en not_active Abandoned
-
2006
- 2006-03-27 KR KR1020077022202A patent/KR101332767B1/en not_active IP Right Cessation
- 2006-03-27 JP JP2008504262A patent/JP5349954B2/en not_active Expired - Fee Related
- 2006-03-27 WO PCT/US2006/011339 patent/WO2006105119A2/en active Application Filing
- 2006-03-27 EP EP06748829A patent/EP1867015B1/en not_active Expired - Fee Related
-
2012
- 2012-01-17 US US13/352,127 patent/US8855166B2/en not_active Expired - Fee Related
Patent Citations (92)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4410992A (en) * | 1980-03-26 | 1983-10-18 | Laser Science, Inc. | Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification |
US4494167A (en) * | 1981-04-03 | 1985-01-15 | The Marconi Company Limited | Inductor |
US4455658A (en) * | 1982-04-20 | 1984-06-19 | Sutter Jr Leroy V | Coupling circuit for use with a transversely excited gas laser |
US4716013A (en) * | 1983-04-29 | 1987-12-29 | Westinghouse Electric Corp. | Nuclear reactor |
US4770846A (en) * | 1984-02-03 | 1988-09-13 | Westinghouse Electric Corp. | Replacement support pin for guide tubes in operating plants |
US4696792A (en) * | 1984-07-30 | 1987-09-29 | General Electric Company | Nuclear reactor coolant recirculation |
US5315611A (en) * | 1986-09-25 | 1994-05-24 | The United States Of America As Represented By The United States Department Of Energy | High average power magnetic modulator for metal vapor lasers |
US5189678A (en) * | 1986-09-29 | 1993-02-23 | The United States Of America As Represented By The United States Department Of Energy | Coupling apparatus for a metal vapor laser |
US4764339A (en) * | 1986-12-16 | 1988-08-16 | The United States Of America As Represented By The United States Department Of Energy | High flux reactor |
US4959840A (en) * | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
US5023884A (en) * | 1988-01-15 | 1991-06-11 | Cymer Laser Technologies | Compact excimer laser |
US5025446A (en) * | 1988-04-01 | 1991-06-18 | Laserscope | Intra-cavity beam relay for optical harmonic generation |
US4983859A (en) * | 1988-08-25 | 1991-01-08 | Hitachi Metals, Ltd. | Magnetic device for high-voltage pulse generating apparatuses |
US4902998A (en) * | 1988-11-21 | 1990-02-20 | Westinghouse Electric Corp. | Inductor assembly with cooled winding turns |
US5025445A (en) * | 1989-11-22 | 1991-06-18 | Cymer Laser Technologies | System for, and method of, regulating the wavelength of a light beam |
US5100609A (en) * | 1990-11-19 | 1992-03-31 | General Electric Company | Enhancing load-following and/or spectral shift capability in single-sparger natural circulation boiling water reactors |
US5471965A (en) * | 1990-12-24 | 1995-12-05 | Kapich; Davorin D. | Very high speed radial inflow hydraulic turbine |
US5416391A (en) * | 1992-07-31 | 1995-05-16 | Correa; Paulo N. | Electromechanical transduction of plasma pulses |
US5359620A (en) * | 1992-11-12 | 1994-10-25 | Cymer Laser Technologies | Apparatus for, and method of, maintaining a clean window in a laser |
US5325407A (en) * | 1993-03-22 | 1994-06-28 | Westinghouse Electric Corporation | Core barrel and support plate assembly for pressurized water nuclear reactor |
US5313481A (en) * | 1993-09-29 | 1994-05-17 | The United States Of America As Represented By The United States Department Of Energy | Copper laser modulator driving assembly including a magnetic compression laser |
US6396856B1 (en) * | 1994-04-01 | 2002-05-28 | Irma America, Inc. | Scanning temporal ultrafast delay methods and apparatuses therefor |
US5448580A (en) * | 1994-07-05 | 1995-09-05 | The United States Of America As Represented By The United States Department Of Energy | Air and water cooled modulator |
US5863017A (en) * | 1996-01-05 | 1999-01-26 | Cymer, Inc. | Stabilized laser platform and module interface |
US5771260A (en) * | 1996-10-04 | 1998-06-23 | Excimer Laser Systems, Inc. | Enclosure system for laser optical systems and devices |
US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US5982800A (en) * | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US6005879A (en) * | 1997-04-23 | 1999-12-21 | Cymer, Inc. | Pulse energy control for excimer laser |
US6094448A (en) * | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
US6018537A (en) * | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US6330261B1 (en) * | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
US5852621A (en) * | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
US20020048288A1 (en) * | 1997-07-22 | 2002-04-25 | Armen Kroyan | Laser spectral engineering for lithographic process |
US20020167975A1 (en) * | 1997-07-22 | 2002-11-14 | Spangler Ronald L. | Laser spectral engineering for lithographic process |
US6721340B1 (en) * | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
US6671294B2 (en) * | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
US6014398A (en) * | 1997-10-10 | 2000-01-11 | Cymer, Inc. | Narrow band excimer laser with gas additive |
US6188710B1 (en) * | 1997-10-10 | 2001-02-13 | Cymer, Inc. | Narrow band gas discharge laser with gas additive |
US5953360A (en) * | 1997-10-24 | 1999-09-14 | Synrad, Inc. | All metal electrode sealed gas laser |
US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
US5940421A (en) * | 1997-12-15 | 1999-08-17 | Cymer, Inc. | Current reversal prevention circuit for a pulsed gas discharge laser |
US6151346A (en) * | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
US6028880A (en) * | 1998-01-30 | 2000-02-22 | Cymer, Inc. | Automatic fluorine control system |
US6240117B1 (en) * | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
US6151349A (en) * | 1998-03-04 | 2000-11-21 | Cymer, Inc. | Automatic fluorine control system |
US5978394A (en) * | 1998-03-11 | 1999-11-02 | Cymer, Inc. | Wavelength system for an excimer laser |
US5991324A (en) * | 1998-03-11 | 1999-11-23 | Cymer, Inc. | Reliable. modular, production quality narrow-band KRF excimer laser |
US6016325A (en) * | 1998-04-27 | 2000-01-18 | Cymer, Inc. | Magnetic modulator voltage and temperature timing compensation circuit |
US6477193B2 (en) * | 1998-07-18 | 2002-11-05 | Cymer, Inc. | Extreme repetition rate gas discharge laser with improved blower motor |
US6442181B1 (en) * | 1998-07-18 | 2002-08-27 | Cymer, Inc. | Extreme repetition rate gas discharge laser |
US6208675B1 (en) * | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
US6067311A (en) * | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
US6314119B1 (en) * | 1998-09-04 | 2001-11-06 | Cymer, Inc. | Excimer laser with pulse and beam multiplier |
US6208674B1 (en) * | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
US6212211B1 (en) * | 1998-10-09 | 2001-04-03 | Cymer, Inc. | Shock wave dissipating laser chamber |
US6219368B1 (en) * | 1999-02-12 | 2001-04-17 | Lambda Physik Gmbh | Beam delivery system for molecular fluorine (F2) laser |
US6104735A (en) * | 1999-04-13 | 2000-08-15 | Cymer, Inc. | Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly |
US6164116A (en) * | 1999-05-06 | 2000-12-26 | Cymer, Inc. | Gas module valve automated test fixture |
US6359922B1 (en) * | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US20020154668A1 (en) * | 1999-12-10 | 2002-10-24 | Knowles David S. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6497490B1 (en) * | 1999-12-14 | 2002-12-24 | Silicon Light Machines | Laser beam attenuator and method of attenuating a laser beam |
US6757316B2 (en) * | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
US20020021728A1 (en) * | 1999-12-27 | 2002-02-21 | Newman Peter C. | Four KHz gas discharge laser |
US20030118072A1 (en) * | 1999-12-27 | 2003-06-26 | Wittak Christian J. | Four KHz gas discharge laser system |
US6317447B1 (en) * | 2000-01-25 | 2001-11-13 | Cymer, Inc. | Electric discharge laser with acoustic chirp correction |
US20020006149A1 (en) * | 2000-02-09 | 2002-01-17 | Spangler Ronald L. | Laser wavelength control unit with piezoelectric driver |
US6687562B2 (en) * | 2000-02-16 | 2004-02-03 | Cymer, Inc. | Process monitoring system for lithography lasers |
US6466365B1 (en) * | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
US20040160583A1 (en) * | 2000-06-01 | 2004-08-19 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US6538716B2 (en) * | 2000-06-01 | 2003-03-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US6414979B2 (en) * | 2000-06-09 | 2002-07-02 | Cymer, Inc. | Gas discharge laser with blade-dielectric electrode |
US6567163B1 (en) * | 2000-08-17 | 2003-05-20 | Able Signal Company Llc | Microarray detector and synthesizer |
US6750972B2 (en) * | 2000-11-17 | 2004-06-15 | Cymer, Inc. | Gas discharge ultraviolet wavemeter with enhanced illumination |
US20020105994A1 (en) * | 2000-11-17 | 2002-08-08 | Partlo William N. | Gas discharge laser with improved beam path |
US6693343B2 (en) * | 2000-12-28 | 2004-02-17 | Infineon Technologies Ag | Self-passivating Cu laser fuse |
US20030043876A1 (en) * | 2001-01-29 | 2003-03-06 | Leonard Lublin | Lithography laser with beam delivery and beam pointing control |
US20030091087A1 (en) * | 2001-01-29 | 2003-05-15 | Ershov Alexander I. | Lithography laser system with in-place alignment tool |
US6704339B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser with beam delivery and beam pointing control |
US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
US6538737B2 (en) * | 2001-01-29 | 2003-03-25 | Cymer, Inc. | High resolution etalon-grating spectrometer |
US20030219056A1 (en) * | 2001-01-29 | 2003-11-27 | Yager Thomas A. | High power deep ultraviolet laser with long life optics |
US20020191654A1 (en) * | 2001-01-29 | 2002-12-19 | Brian Klene | Laser lithography light source with beam delivery |
US20020101589A1 (en) * | 2001-01-29 | 2002-08-01 | Sandstrom Richard L. | High resolution etalon-grating spectrometer |
US20020122450A1 (en) * | 2001-03-02 | 2002-09-05 | Sparrow Robert W. | High repetition rate UV excimer laser |
US6768762B2 (en) * | 2001-03-02 | 2004-07-27 | Corning Incorporated | High repetition rate UV excimer laser |
US20040022291A1 (en) * | 2001-04-09 | 2004-02-05 | Das Plash P. | Lithography laser with beam delivery and beam pointing control |
US6535531B1 (en) * | 2001-11-29 | 2003-03-18 | Cymer, Inc. | Gas discharge laser with pulse multiplier |
US7257144B2 (en) * | 2004-02-11 | 2007-08-14 | Photomedex | Rare gas-halogen excimer lasers with baffles |
Also Published As
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US20060222034A1 (en) | 2006-10-05 |
KR20070120511A (en) | 2007-12-24 |
JP5349954B2 (en) | 2013-11-20 |
JP2008538162A (en) | 2008-10-09 |
EP1867015A2 (en) | 2007-12-19 |
KR101332767B1 (en) | 2013-11-25 |
EP1867015B1 (en) | 2012-11-21 |
US20120120974A1 (en) | 2012-05-17 |
WO2006105119A2 (en) | 2006-10-05 |
WO2006105119A3 (en) | 2008-10-16 |
US8855166B2 (en) | 2014-10-07 |
EP1867015A4 (en) | 2010-11-03 |
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