EP2642833A3 - Device and method for generating a plasma - Google Patents

Device and method for generating a plasma Download PDF

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Publication number
EP2642833A3
EP2642833A3 EP13159136.4A EP13159136A EP2642833A3 EP 2642833 A3 EP2642833 A3 EP 2642833A3 EP 13159136 A EP13159136 A EP 13159136A EP 2642833 A3 EP2642833 A3 EP 2642833A3
Authority
EP
European Patent Office
Prior art keywords
coupling means
waveguide
plasma source
plasma
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP13159136.4A
Other languages
German (de)
French (fr)
Other versions
EP2642833A2 (en
EP2642833B1 (en
Inventor
Silvio Kühn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungsverbund Berlin FVB eV
Original Assignee
Forschungsverbund Berlin FVB eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungsverbund Berlin FVB eV filed Critical Forschungsverbund Berlin FVB eV
Publication of EP2642833A2 publication Critical patent/EP2642833A2/en
Publication of EP2642833A3 publication Critical patent/EP2642833A3/en
Application granted granted Critical
Publication of EP2642833B1 publication Critical patent/EP2642833B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/24—Radiofrequency or microwave generators

Abstract

Es wird eine Vorrichtung (200) zur Erzeugung eines Plasmas offenbart, die eine als Hohlraum ausgebildete Plasmaquelle (241) und einen Resonator (201) aufweist, welcher einen Wellenleiter (211, 212, 2131) und die Plasmaquelle (241) umfasst, wobei der Wellenleiter (212, 213) mit der Plasmaquelle (241) wirkverbunden ist; die Vorrichtung (200) ein erstes Kopplungsmittel (231) zur Energie-Einspeisung (251) und ein zweites Kopplungsmittel (232) zur Energie-Auskopplung (252) aufweist, wobei jedes Kopplungsmittel (231, 232) Energie- und Signal- führend (251, 252) mit dem Wellenleiter wirkverbunden ist; die Vorrichtung ein aktives Element (261) zur Energieversorgung des Resonators (201) aufweist, welches mit dem ersten (231) und mit dem zweiten (232) Kopplungsmittel wirkverbunden ist, wobei die Plasmaquelle (241) zumindest teilweise in einem Bereich des Wellenleiters (211, 212, 213) integriert ist, der sich zwischen dem ersten Kopplungsmittel (231) und dem zweiten Kopplungsmittel (232) erstreckt.

Figure imgaf001
There is disclosed a plasma generating apparatus (200) comprising a plasma source (241) formed as a cavity and a resonator (201) comprising a waveguide (211, 212, 2131) and the plasma source (241) Waveguide (212, 213) is operatively connected to the plasma source (241); the device (200) comprises a first coupling means (231) for energy supply (251) and a second coupling means (232) for energy extraction (252), each coupling means (231, 232) energy and signal leading (251 , 252) is operatively connected to the waveguide; the device comprises an active element (261) for supplying energy to the resonator (201) which is operatively connected to the first (231) and the second (232) coupling means, the plasma source (241) being at least partially located in a region of the waveguide (211 , 212, 213) extending between the first coupling means (231) and the second coupling means (232).
Figure imgaf001
EP13159136.4A 2012-03-20 2013-03-14 Device for generating a plasma Active EP2642833B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102012204447A DE102012204447B4 (en) 2012-03-20 2012-03-20 Apparatus and method for generating a plasma

Publications (3)

Publication Number Publication Date
EP2642833A2 EP2642833A2 (en) 2013-09-25
EP2642833A3 true EP2642833A3 (en) 2014-06-04
EP2642833B1 EP2642833B1 (en) 2016-02-03

Family

ID=47891461

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13159136.4A Active EP2642833B1 (en) 2012-03-20 2013-03-14 Device for generating a plasma

Country Status (3)

Country Link
US (1) US8963427B2 (en)
EP (1) EP2642833B1 (en)
DE (1) DE102012204447B4 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5131992A (en) * 1990-01-08 1992-07-21 The United States Of America, As Represented By The Secretary Of The Interior Microwave induced plasma process for producing tungsten carbide
US5945888A (en) * 1997-06-09 1999-08-31 Northrop Grumman Corporation Dielectric resonator tunable via a change in gas pressure
US20070171006A1 (en) * 2005-10-27 2007-07-26 Devincentis Marc Plasma lamp with compact waveguide
US20090295509A1 (en) * 2008-05-28 2009-12-03 Universal Phase, Inc. Apparatus and method for reaction of materials using electromagnetic resonators

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1516909C3 (en) * 1966-09-29 1976-10-21 Philips Patentverwaltung Gmbh High-frequency generator with a self-excited run-time tube generator in continuous operation
DE3831453A1 (en) * 1988-09-16 1990-03-22 Philips Patentverwaltung DEVICE FOR MICROWAVE TRANSMISSION
CN100334079C (en) 1998-04-15 2007-08-29 陶氏环球技术公司 Process for direct oxidation of olefins to olefin oxides
US6362449B1 (en) * 1998-08-12 2002-03-26 Massachusetts Institute Of Technology Very high power microwave-induced plasma
US6558635B2 (en) * 2001-03-12 2003-05-06 Bruce Minaee Microwave gas decomposition reactor
AT504487B1 (en) * 2007-06-13 2008-06-15 Ulrich Dipl Ing Dr Traxlmayr Device for producing a plasma or radicals comprises a reaction tube positioned in the longitudinal direction of a waveguide in the region of a maximum magnetic and minimum electric field strength and a magnetron
DE102009046881B4 (en) * 2009-11-19 2015-10-22 Forschungsverbund Berlin E.V. Apparatus and method for generating a plasma by means of a traveling wave resonator
GB201006330D0 (en) * 2010-04-15 2010-06-02 Linde Ag Gas delivery devices and methods

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5131992A (en) * 1990-01-08 1992-07-21 The United States Of America, As Represented By The Secretary Of The Interior Microwave induced plasma process for producing tungsten carbide
US5945888A (en) * 1997-06-09 1999-08-31 Northrop Grumman Corporation Dielectric resonator tunable via a change in gas pressure
US20070171006A1 (en) * 2005-10-27 2007-07-26 Devincentis Marc Plasma lamp with compact waveguide
US20090295509A1 (en) * 2008-05-28 2009-12-03 Universal Phase, Inc. Apparatus and method for reaction of materials using electromagnetic resonators

Also Published As

Publication number Publication date
EP2642833A2 (en) 2013-09-25
US20130249398A1 (en) 2013-09-26
DE102012204447A1 (en) 2013-09-26
US8963427B2 (en) 2015-02-24
DE102012204447B4 (en) 2013-10-31
EP2642833B1 (en) 2016-02-03

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