EP2157468A4 - Piezoelectric mirror device, optical device using the piezoelectric mirror device and method for manufacturing piezoelectric mirror device - Google Patents

Piezoelectric mirror device, optical device using the piezoelectric mirror device and method for manufacturing piezoelectric mirror device

Info

Publication number
EP2157468A4
EP2157468A4 EP08765410A EP08765410A EP2157468A4 EP 2157468 A4 EP2157468 A4 EP 2157468A4 EP 08765410 A EP08765410 A EP 08765410A EP 08765410 A EP08765410 A EP 08765410A EP 2157468 A4 EP2157468 A4 EP 2157468A4
Authority
EP
European Patent Office
Prior art keywords
piezoelectric mirror
mirror device
manufacturing
piezoelectric
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP08765410A
Other languages
German (de)
French (fr)
Other versions
EP2157468A1 (en
EP2157468B8 (en
EP2157468B1 (en
Inventor
Shinji Maekawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to EP15178240.6A priority Critical patent/EP2963477A1/en
Publication of EP2157468A1 publication Critical patent/EP2157468A1/en
Publication of EP2157468A4 publication Critical patent/EP2157468A4/en
Application granted granted Critical
Publication of EP2157468B1 publication Critical patent/EP2157468B1/en
Publication of EP2157468B8 publication Critical patent/EP2157468B8/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/0054—For holding or placing an element in a given position
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00166—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/113—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49128—Assembling formed circuit to base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49789—Obtaining plural product pieces from unitary workpiece
    • Y10T29/49798—Dividing sequentially from leading end, e.g., by cutting or breaking
EP08765410.9A 2007-06-08 2008-06-04 Method for manufacturing a piezoelectric mirror device Expired - Fee Related EP2157468B8 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP15178240.6A EP2963477A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007152399 2007-06-08
JP2008105650A JP5286906B2 (en) 2007-06-08 2008-04-15 Piezoelectric mirror device, optical apparatus using the same, and method of manufacturing piezoelectric mirror device
PCT/JP2008/060630 WO2008150016A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical device using the piezoelectric mirror device and method for manufacturing piezoelectric mirror device

Related Child Applications (2)

Application Number Title Priority Date Filing Date
EP15178240.6A Division-Into EP2963477A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process
EP15178240.6A Division EP2963477A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process

Publications (4)

Publication Number Publication Date
EP2157468A1 EP2157468A1 (en) 2010-02-24
EP2157468A4 true EP2157468A4 (en) 2012-08-15
EP2157468B1 EP2157468B1 (en) 2016-09-07
EP2157468B8 EP2157468B8 (en) 2016-11-02

Family

ID=40093817

Family Applications (2)

Application Number Title Priority Date Filing Date
EP08765410.9A Expired - Fee Related EP2157468B8 (en) 2007-06-08 2008-06-04 Method for manufacturing a piezoelectric mirror device
EP15178240.6A Withdrawn EP2963477A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP15178240.6A Withdrawn EP2963477A1 (en) 2007-06-08 2008-06-04 Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process

Country Status (6)

Country Link
US (3) US8300290B2 (en)
EP (2) EP2157468B8 (en)
JP (1) JP5286906B2 (en)
KR (1) KR101017316B1 (en)
TW (1) TWI410674B (en)
WO (1) WO2008150016A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5286906B2 (en) 2007-06-08 2013-09-11 大日本印刷株式会社 Piezoelectric mirror device, optical apparatus using the same, and method of manufacturing piezoelectric mirror device
JP5493735B2 (en) * 2009-01-30 2014-05-14 株式会社リコー Deflection mirror, optical scanning device, image forming device, and image projection device
DE102009050340B4 (en) * 2009-10-23 2017-08-10 Leica Microsystems Cms Gmbh Device for deflecting a light beam in two different directions and scanning microscope
DE102011006595B4 (en) * 2011-03-31 2019-01-17 Robert Bosch Gmbh Micromechanical component and production method for a micromechanical component
JP5876345B2 (en) * 2012-03-23 2016-03-02 スタンレー電気株式会社 Optical deflector
WO2014162521A1 (en) * 2013-04-02 2014-10-09 パイオニア株式会社 Actuator
JP6264709B2 (en) * 2013-12-25 2018-01-24 スタンレー電気株式会社 Vehicle lighting
JP6988062B2 (en) * 2016-08-02 2022-01-05 株式会社リコー Light deflectors, light scanning devices, image projection devices, image forming devices, and moving objects
CN110275284B (en) * 2018-03-14 2021-10-29 铭异科技股份有限公司 Suspension system for biaxial optical actuator
CN108761773A (en) * 2018-06-15 2018-11-06 重庆大学 A kind of MOEMS raster micro mirrors of the non-homogeneous folded beam driving of piezoelectricity
CN112912784B (en) * 2018-10-25 2022-11-11 富士胶片株式会社 Micromirror device and driving method of micromirror device
CN111624763A (en) * 2019-02-28 2020-09-04 中强光电股份有限公司 Vibration optical module and projector
CN109755288A (en) * 2019-03-11 2019-05-14 中国计量大学 A kind of SOI substrate OLED micro-display device with reflecting barrier layer
US11726183B2 (en) * 2019-10-19 2023-08-15 Beijing Voyager Technology Co., Ltd. Micromachined mirror assembly with piezoelectric actuator
JP7028271B2 (en) * 2020-03-24 2022-03-02 株式会社リコー Light deflector, light scanning device, image forming device, image projection device, head-up display device, and radar device
EP4310573A1 (en) 2022-07-18 2024-01-24 STMicroelectronics S.r.l. Mems mirror device with piezoelectric actuation and manufacturing process thereof

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US20020149834A1 (en) * 2000-12-22 2002-10-17 Ball Semiconductor, Inc. Light modulation device and system
JP2003075738A (en) * 2001-08-31 2003-03-12 Hitachi Ltd Optical switch
US6681063B1 (en) * 2000-11-16 2004-01-20 Computer Optics Inc Low voltage micro-mirror array light beam switch

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JPS5728223A (en) * 1980-07-26 1982-02-15 New Japan Radio Co Ltd Pyroelectric type radiation wave detector and manufacture thereof
JP2924200B2 (en) * 1990-01-18 1999-07-26 富士電機株式会社 Torsional vibrator and its application element
JPH0784196A (en) * 1993-09-13 1995-03-31 Canon Inc Optical deflector and display device using the same
JP3605899B2 (en) * 1995-09-29 2004-12-22 株式会社デンソー Optical scanner device
US5903380A (en) * 1997-05-01 1999-05-11 Rockwell International Corp. Micro-electromechanical (MEM) optical resonator and method
JP3993343B2 (en) 1999-06-29 2007-10-17 富士通株式会社 Galvano micro mirror
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US6681063B1 (en) * 2000-11-16 2004-01-20 Computer Optics Inc Low voltage micro-mirror array light beam switch
US20020149834A1 (en) * 2000-12-22 2002-10-17 Ball Semiconductor, Inc. Light modulation device and system
JP2003075738A (en) * 2001-08-31 2003-03-12 Hitachi Ltd Optical switch

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Title
See also references of WO2008150016A1 *

Also Published As

Publication number Publication date
EP2157468A1 (en) 2010-02-24
US8539655B2 (en) 2013-09-24
US20120200903A1 (en) 2012-08-09
US8300290B2 (en) 2012-10-30
JP2009015300A (en) 2009-01-22
US20110179614A1 (en) 2011-07-28
WO2008150016A1 (en) 2008-12-11
KR101017316B1 (en) 2011-02-28
TWI410674B (en) 2013-10-01
EP2157468B8 (en) 2016-11-02
US20090284818A1 (en) 2009-11-19
US8570630B2 (en) 2013-10-29
JP5286906B2 (en) 2013-09-11
EP2963477A1 (en) 2016-01-06
EP2157468B1 (en) 2016-09-07
TW200914870A (en) 2009-04-01
KR20090085021A (en) 2009-08-06

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