EP2137796A4 - Extendable electrode for gas discharge laser - Google Patents

Extendable electrode for gas discharge laser

Info

Publication number
EP2137796A4
EP2137796A4 EP08742239.0A EP08742239A EP2137796A4 EP 2137796 A4 EP2137796 A4 EP 2137796A4 EP 08742239 A EP08742239 A EP 08742239A EP 2137796 A4 EP2137796 A4 EP 2137796A4
Authority
EP
European Patent Office
Prior art keywords
gas discharge
discharge laser
extendable electrode
extendable
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP08742239.0A
Other languages
German (de)
French (fr)
Other versions
EP2137796A1 (en
EP2137796B1 (en
Inventor
Richard L Sandstrom
Tae H Chung
Richard C Ujazdowski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of EP2137796A1 publication Critical patent/EP2137796A1/en
Publication of EP2137796A4 publication Critical patent/EP2137796A4/en
Application granted granted Critical
Publication of EP2137796B1 publication Critical patent/EP2137796B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381Anodes or particular adaptations thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
EP08742239.0A 2007-04-16 2008-03-25 Extendable electrode for gas discharge laser Active EP2137796B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/787,463 US7856044B2 (en) 1999-05-10 2007-04-16 Extendable electrode for gas discharge laser
PCT/US2008/003890 WO2008130474A1 (en) 2007-04-16 2008-03-25 Extendable electrode for gas discharge laser

Publications (3)

Publication Number Publication Date
EP2137796A1 EP2137796A1 (en) 2009-12-30
EP2137796A4 true EP2137796A4 (en) 2014-01-08
EP2137796B1 EP2137796B1 (en) 2019-01-16

Family

ID=38648278

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08742239.0A Active EP2137796B1 (en) 2007-04-16 2008-03-25 Extendable electrode for gas discharge laser

Country Status (6)

Country Link
US (3) US7856044B2 (en)
EP (1) EP2137796B1 (en)
JP (1) JP5680403B2 (en)
KR (1) KR101430516B1 (en)
TW (1) TWI395385B (en)
WO (1) WO2008130474A1 (en)

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US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
TWI455239B (en) * 2008-03-14 2014-10-01 Lam Res Corp Cam lock electrode clamp
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) * 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
CN102761047B (en) * 2012-07-30 2013-09-25 中国科学院光电研究院 Electrode mechanism of discharge cavity of gas laser
WO2014046186A1 (en) * 2012-09-21 2014-03-27 ギガフォトン株式会社 Laser device
JP6383729B2 (en) * 2013-10-02 2018-08-29 ギガフォトン株式会社 Laser equipment
TWI490254B (en) 2013-12-31 2015-07-01 Ind Tech Res Inst Inorganic passivation coating material, method for forming the same, and inorganic passivation protective film produced therefrom
JP6364476B2 (en) * 2014-03-18 2018-07-25 ギガフォトン株式会社 Gas laser apparatus and control method thereof
WO2016143105A1 (en) * 2015-03-11 2016-09-15 ギガフォトン株式会社 Excimer laser chamber device
US10074953B2 (en) * 2015-09-30 2018-09-11 Cymer, Llc Erosion resistant electrodes for use in generating gas discharge laser
JP7095084B2 (en) * 2017-10-24 2022-07-04 サイマー リミテッド ライアビリティ カンパニー Methods and equipment to extend the life of electrodes in the laser chamber
US11349273B2 (en) * 2018-01-17 2022-05-31 Cymer, Llc Apparatus for tuning discharge performance in a laser chamber
CN109411996A (en) * 2018-11-29 2019-03-01 北京科益虹源光电技术有限公司 A kind of excimer laser electrode structure and excimer laser
JP7381728B2 (en) * 2019-10-11 2023-11-15 サイマー リミテッド ライアビリティ カンパニー Conductive material for discharge laser

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TW200845521A (en) 2008-11-16
US20120219032A1 (en) 2012-08-30
EP2137796A1 (en) 2009-12-30
TWI395385B (en) 2013-05-01
US8526481B2 (en) 2013-09-03
US7856044B2 (en) 2010-12-21
US20110058580A1 (en) 2011-03-10
KR101430516B1 (en) 2014-08-18
WO2008130474A1 (en) 2008-10-30
KR20090129492A (en) 2009-12-16
US20070253459A1 (en) 2007-11-01
JP5680403B2 (en) 2015-03-04
JP2010525571A (en) 2010-07-22
US8446928B2 (en) 2013-05-21
EP2137796B1 (en) 2019-01-16

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