EP2113085A4 - Arc recovery without over-voltage plasma chamber power supplies using a shunt switch - Google Patents
Arc recovery without over-voltage plasma chamber power supplies using a shunt switchInfo
- Publication number
- EP2113085A4 EP2113085A4 EP08729944.2A EP08729944A EP2113085A4 EP 2113085 A4 EP2113085 A4 EP 2113085A4 EP 08729944 A EP08729944 A EP 08729944A EP 2113085 A4 EP2113085 A4 EP 2113085A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- over
- power supplies
- plasma chamber
- shunt switch
- chamber power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000011084 recovery Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
- H02H3/00—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal electric working condition with or without subsequent reconnection ; integrated protection
- H02H3/08—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal electric working condition with or without subsequent reconnection ; integrated protection responsive to excess current
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/12—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/677,786 US8217299B2 (en) | 2007-02-22 | 2007-02-22 | Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch |
PCT/US2008/054056 WO2008103600A1 (en) | 2007-02-22 | 2008-02-15 | Arc recovery without over-voltage plasma chamber power supplies using a shunt switch |
Publications (4)
Publication Number | Publication Date |
---|---|
EP2113085A1 EP2113085A1 (en) | 2009-11-04 |
EP2113085A4 true EP2113085A4 (en) | 2015-05-06 |
EP2113085B1 EP2113085B1 (en) | 2019-06-12 |
EP2113085B8 EP2113085B8 (en) | 2019-07-24 |
Family
ID=39710440
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08729944.2A Active EP2113085B8 (en) | 2007-02-22 | 2008-02-15 | Arc recovery without over-voltage plasma chamber power supplies using a shunt switch |
Country Status (7)
Country | Link |
---|---|
US (1) | US8217299B2 (en) |
EP (1) | EP2113085B8 (en) |
JP (1) | JP2010519708A (en) |
KR (1) | KR101274514B1 (en) |
CN (1) | CN101641604A (en) |
TW (1) | TW200845834A (en) |
WO (1) | WO2008103600A1 (en) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7817382B2 (en) * | 2008-01-02 | 2010-10-19 | Honeywell International, Inc. | Hybrid high voltage DC contactor with arc energy diversion |
KR101606734B1 (en) * | 2008-07-07 | 2016-03-28 | 램 리써치 코포레이션 | Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting in-situ arcing events in a plasma processing chamber |
US8044594B2 (en) | 2008-07-31 | 2011-10-25 | Advanced Energy Industries, Inc. | Power supply ignition system and method |
WO2010063027A2 (en) * | 2008-11-28 | 2010-06-03 | General Plasma, Inc. | Bipolar rectifier power supply |
US8395078B2 (en) * | 2008-12-05 | 2013-03-12 | Advanced Energy Industries, Inc | Arc recovery with over-voltage protection for plasma-chamber power supplies |
US8815329B2 (en) * | 2008-12-05 | 2014-08-26 | Advanced Energy Industries, Inc. | Delivered energy compensation during plasma processing |
EP2219205B1 (en) | 2009-02-17 | 2014-06-04 | Solvix GmbH | A power supply device for plasma processing |
DE102010031568B4 (en) | 2010-07-20 | 2014-12-11 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschanordnung and method for erasing arcs |
US8552665B2 (en) * | 2010-08-20 | 2013-10-08 | Advanced Energy Industries, Inc. | Proactive arc management of a plasma load |
KR101303040B1 (en) * | 2012-02-28 | 2013-09-03 | 주식회사 뉴파워 프라즈마 | Method and apparatus for detecting arc in plasma chamber |
US9226380B2 (en) | 2012-11-01 | 2015-12-29 | Advanced Energy Industries, Inc. | Adjustable non-dissipative voltage boosting snubber network |
US9287098B2 (en) | 2012-11-01 | 2016-03-15 | Advanced Energy Industries, Inc. | Charge removal from electrodes in unipolar sputtering system |
US9129776B2 (en) | 2012-11-01 | 2015-09-08 | Advanced Energy Industries, Inc. | Differing boost voltages applied to two or more anodeless electrodes for plasma processing |
US20140217832A1 (en) * | 2013-02-06 | 2014-08-07 | Astec International Limited | Disconnect switches in dc power systems |
JP5797313B1 (en) * | 2014-08-25 | 2015-10-21 | 株式会社京三製作所 | Regenerative circulator, high frequency power supply device, and high frequency power regeneration method |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US11848176B2 (en) | 2020-07-31 | 2023-12-19 | Applied Materials, Inc. | Plasma processing using pulsed-voltage and radio-frequency power |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US20220324049A1 (en) * | 2021-04-13 | 2022-10-13 | Esab Ab | Overvoltage protection for current braking switch |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6621674B1 (en) * | 1999-08-13 | 2003-09-16 | Hüttinger Elektronik GmbH & Co. KG | Electric supply unit for plasma installations |
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-
2007
- 2007-02-22 US US11/677,786 patent/US8217299B2/en active Active
-
2008
- 2008-02-15 CN CN200880009384A patent/CN101641604A/en active Pending
- 2008-02-15 KR KR1020097018460A patent/KR101274514B1/en active IP Right Grant
- 2008-02-15 EP EP08729944.2A patent/EP2113085B8/en active Active
- 2008-02-15 WO PCT/US2008/054056 patent/WO2008103600A1/en active Application Filing
- 2008-02-15 TW TW097105285A patent/TW200845834A/en unknown
- 2008-02-15 JP JP2009550968A patent/JP2010519708A/en not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6621674B1 (en) * | 1999-08-13 | 2003-09-16 | Hüttinger Elektronik GmbH & Co. KG | Electric supply unit for plasma installations |
Also Published As
Publication number | Publication date |
---|---|
EP2113085B1 (en) | 2019-06-12 |
WO2008103600A1 (en) | 2008-08-28 |
EP2113085A1 (en) | 2009-11-04 |
CN101641604A (en) | 2010-02-03 |
EP2113085B8 (en) | 2019-07-24 |
KR20090121301A (en) | 2009-11-25 |
US8217299B2 (en) | 2012-07-10 |
KR101274514B1 (en) | 2013-06-13 |
US20080203070A1 (en) | 2008-08-28 |
TW200845834A (en) | 2008-11-16 |
JP2010519708A (en) | 2010-06-03 |
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