EP1957249A4 - Method and system for double-sided patterning of substrates - Google Patents

Method and system for double-sided patterning of substrates

Info

Publication number
EP1957249A4
EP1957249A4 EP06844789A EP06844789A EP1957249A4 EP 1957249 A4 EP1957249 A4 EP 1957249A4 EP 06844789 A EP06844789 A EP 06844789A EP 06844789 A EP06844789 A EP 06844789A EP 1957249 A4 EP1957249 A4 EP 1957249A4
Authority
EP
European Patent Office
Prior art keywords
substrates
double
sided patterning
patterning
sided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06844789A
Other languages
German (de)
French (fr)
Other versions
EP1957249A2 (en
EP1957249B1 (en
Inventor
Byung-Jin Choi
Sidlgata V Sreenivasan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of EP1957249A2 publication Critical patent/EP1957249A2/en
Publication of EP1957249A4 publication Critical patent/EP1957249A4/en
Application granted granted Critical
Publication of EP1957249B1 publication Critical patent/EP1957249B1/en
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565—Moulds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp
EP06844789.5A 2005-12-08 2006-11-30 Method and system for double-sided patterning of substrates Not-in-force EP1957249B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74843005P 2005-12-08 2005-12-08
PCT/US2006/046256 WO2007067488A2 (en) 2005-12-08 2006-11-30 Method and system for double-sided patterning of substrates

Publications (3)

Publication Number Publication Date
EP1957249A2 EP1957249A2 (en) 2008-08-20
EP1957249A4 true EP1957249A4 (en) 2012-07-25
EP1957249B1 EP1957249B1 (en) 2014-11-12

Family

ID=38123403

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06844789.5A Not-in-force EP1957249B1 (en) 2005-12-08 2006-11-30 Method and system for double-sided patterning of substrates

Country Status (8)

Country Link
US (2) US7670529B2 (en)
EP (1) EP1957249B1 (en)
JP (1) JP4987012B2 (en)
KR (1) KR101324549B1 (en)
CN (2) CN101535021A (en)
MY (1) MY144847A (en)
TW (1) TWI310726B (en)
WO (1) WO2007067488A2 (en)

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MY144847A (en) 2011-11-30
WO2007067488A3 (en) 2009-04-23
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KR101324549B1 (en) 2013-11-01
US20070132152A1 (en) 2007-06-14
JP4987012B2 (en) 2012-07-25
KR20080080338A (en) 2008-09-03
WO2007067488A2 (en) 2007-06-14
US8109754B2 (en) 2012-02-07
EP1957249A2 (en) 2008-08-20
CN104317161A (en) 2015-01-28
US20100129486A1 (en) 2010-05-27
TWI310726B (en) 2009-06-11
CN101535021A (en) 2009-09-16
EP1957249B1 (en) 2014-11-12
JP2009518863A (en) 2009-05-07
US7670529B2 (en) 2010-03-02

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