EP1953270A1 - Method for improving the performance of nickel electrodes - Google Patents
Method for improving the performance of nickel electrodes Download PDFInfo
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- EP1953270A1 EP1953270A1 EP08000438A EP08000438A EP1953270A1 EP 1953270 A1 EP1953270 A1 EP 1953270A1 EP 08000438 A EP08000438 A EP 08000438A EP 08000438 A EP08000438 A EP 08000438A EP 1953270 A1 EP1953270 A1 EP 1953270A1
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- platinum
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- sodium chloride
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
- C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Definitions
- the invention relates to a method for improving the performance of nickel electrodes in alkali chloride electrolysis.
- Sodium chloride electrolytic cathodes where hydrogen is developed in alkaline solution are usually made of iron or nickel. If nickel electrodes are used, they can be made entirely of nickel, or only nickel surfaces are used in which substrates of other metals are surface-plated nickel-plated.
- nickel electrodes can be coated with a metal from the VIII subgroup, especially the platinum metals (including Pt, Ru, Rh, Os, Ir, Pd) of the Periodic Table of the Elements or an oxide of such a metal or mixtures thereof. After a calcination process, the corresponding noble metal oxides are usually present on the surface.
- a metal from the VIII subgroup especially the platinum metals (including Pt, Ru, Rh, Os, Ir, Pd) of the Periodic Table of the Elements or an oxide of such a metal or mixtures thereof.
- the electrode thus prepared may, for. B. in the sodium chloride electrolysis used as a cathode for hydrogen evolution.
- many coating variants are known, because the coating of metal oxides can be modified in many different ways, so that different compositions are formed on the surface of the nickel electrode.
- According to the US-A-5 035 789 is z.
- a ruthenium oxide based coating on nickel substrates is used as the cathode.
- a soluble compound of a platinum group metal salt of sodium hydroxide is added to the catholyte during operation of the sodium chloride electrolysis.
- a salt concentration of 200 g / l sodium chloride at 90 ° C and a current density of 2.35 kA / m 2 operated in a sodium chloride electrolysis cell with 32 wt .-% sodium hydroxide solution.
- the cathode is electroless nickel plated for pretreatment and then nickel-plated in a nickel bath.
- Platinum chlorate for example, was added as the active compound in the catholyte, which led to a lowering of the cell voltage by 100 mV.
- US-A-4,105,516 During the electrolysis of alkali metal chlorides, metal compounds are added to the catholyte, which reduce the hydrogen overvoltage and thus reduce the cell voltage.
- the cell has an anode made of titanium expanded metal coated with ruthenium and titanium oxide.
- the cathode consists of iron in the form of expanded metal.
- the examples show the use of cobalt or iron solution on the iron cathode.
- the disadvantages of iron compounds in the treatment of coated nickel electrodes have already been mentioned above.
- metal ions having a low hydrogen overvoltage may be added to catholyte of a membrane electrolytic cell of sodium chloride electrolysis to coat the cathode.
- the addition takes place during the electrolysis.
- platinum oxide for improving an iron or copper cathode is mentioned.
- the sodium chloride electrolysis according to the membrane process is carried out as follows. A solution containing sodium chloride is supplied to an anode chamber with an anode, a sodium hydroxide solution is fed to a cathode chamber with a cathode. The two chambers are separated by an ion exchange membrane. Several of these anode and cathode compartments are assembled into an electrolyzer. The anode chamber leaves next to the chlorine formed a less concentrated sodium chloride-containing solution than it was supplied. The cathode chamber leaves next to hydrogen, a higher concentration of sodium hydroxide solution as this was supplied. The sodium hydroxide volume flow which is supplied to the cathode chamber depends on the current density and the cell design.
- the cathode consists of a nickel-expanded metal, which is provided with a special coating (hereinafter called Coating) (manufacturer eg DENORA) to reduce the hydrogen overvoltage.
- Coating a special coating
- the cathode coatings in the sodium chloride electrolysis of platinum metals, platinum metal oxides or mixtures thereof such as a ruthenium - ruthenium oxide mixture are among the useful platinum metals.
- the cathode coating is not long-term stable, especially not under conditions in which no electrolysis takes place or in case of interruptions of the electrolysis, which can lead to Umpolungsreaen example. Thus, a more or less severe damage of the coating over the operating time of the electrolyzer takes place.
- impurities which, for example, from the brine into the liquor, such as iron ions, can be deposited on the cathode or especially on the active centers of the noble metal-containing coating and thereby deactivate this.
- the cell voltage increases, which increases the energy consumption for the production of chlorine, hydrogen and caustic soda and significantly worsens the economics of the process.
- the object of the invention is therefore to develop a special method for improving nickel electrodes which are coated with platinum metals, platinum metal oxides or mixtures thereof, for use as cathodes in the electrolysis of sodium chloride that can be used in ongoing electrolysis operation and a longer interruption of the electrode operation to restore the cathode activity avoids.
- the invention relates to a method for improving the performance of nickel electrodes having a coating based on platinum metals, platinum metal oxides or mixtures of platinum metals and platinum metal oxides, for the sodium chloride electrolysis according to the membrane process, characterized in that in the electrolysis of sodium chloride, a water-soluble or in Alkali-soluble platinum compound, especially hexachloroplatinic acid, or more preferably an alkali platinate, more preferably sodium hexachloroplatinate (Na 2 PtCl 6 ) and / or sodium hexahydroxyplatinate (Na 2 Pt (OH) 6 ) is added to the catholyte.
- a water-soluble or in Alkali-soluble platinum compound especially hexachloroplatinic acid, or more preferably an alkali platinate, more preferably sodium hexachloroplatinate (Na 2 PtCl 6 ) and / or sodium hexahydroxyplatinate (Na 2 Pt (OH) 6
- either the sodium hexachloroplatinate can be metered in as an aqueous solution or in alkaline solution, or the hexachloroplatinic acid is metered directly into the catholyte, in particular the sodium hydroxide solution, in which case a reaction with the lye to give the chloroplatinate takes place.
- the addition of the platinum compound takes place here in particular during electrolysis under normal electrolysis conditions at a current density of 0.1 to 10 kA / m 2 , more preferably at a current density of 0.5 to 8 kA / m 2 .
- a further preferred embodiment of the addition of platinum is that after the addition of the platinum compound, the electrolysis voltage, in particular pulse-like in the range of 0 to 5 V is varied to deposit finely divided platinum on the cathode.
- the voltage here describes the voltage between anode and cathode.
- the residual ripple of the rectifier may result in an alternating voltage in said voltage range with an amplitude of 0.5 to 500 mV.
- Modern rectifiers hardly have any residual ripple, but there is the possibility of artificially generating a residual ripple.
- the residual ripple is, for example, between 20 and 100 Hz.
- the amplitude is also regulated, this can be around the quiescent potential for the time of the precious metal metering with +100 or -100mV.
- the rest potential is the voltage at which no current flows anymore. Normally, this potential is about 2.1 to 2.3 V, depending on the cell technology and membrane used. However, there is also the special possibility of performing the noble metal dosing when the cell voltage is 0 V, then the amplitude must be greater than the quiescent potential.
- Platinum metals which may be present as metal or metal oxide in the context of the invention as electrode coating on the nickel, are in particular ruthenium, iridium, palladium, platinum, rhodium and osmium.
- a further preferred embodiment of the novel process consists in that, in addition to the platinum compound, other further soluble compounds of subgroup 8 of the Periodic Table of the Elements, in particular compounds of palladium, iridium, rhodium, osmium or ruthenium, are additionally added. These are used in particular in the form of water-soluble salts or complex acids.
- the addition in a first dose after detection of deactivation is such that a platinum compound in the catholyte in the feed to the cathode chamber at a cathode area of 2.71m 2 between 0.02 and 11 g Pt per cathode element, corresponding to 0.007 g / m 2 to 4 g / m 2 , at a current density of 1 to 8 kA / m 2 , takes place.
- the surface used is the geometrically projected cathode surface, which also corresponds to the membrane surface.
- the metering rate can be carried out in such a way that the platinum-containing solution, based on the platinum content per meter 2 of cathode area, is metered between 0.001 g Pt / (hm 2 ) and 1 g Pt / (hm 2 ).
- the addition can be made at a current density preferably under normal operating conditions, as well as at higher or lower current density.
- the addition can be carried out at a current density in particular of 0.1 to 10 kA / m 2 .
- the temperature at which the dosage preferably takes place of the platinum compound is 70 to 90 ° C.
- the dosage can also be done at a lower temperature.
- the proportion based on the platinum of the further soluble compounds in the solution to be added from the 8th subgroup is from 1 to 50% by weight.
- the variation of the electrolysis voltage can be effected, for example, in a preferred embodiment by superposing an AC voltage on the electrolysis voltage.
- the frequency of the superposed AC voltage is in particular from 10 to 100 Hz, the amplitude can then be between 10 and 200 mV.
- the preparation of the Alkaliplatinates can be carried out by reaction of hexachloroplatinic acid with alkali. This can be done separately or directly in situ if, for example, hexachloroplatinic acid is metered directly into the sodium hydroxide feed to the elements or to the electrolyzer. Particularly preferably, the hexachloroplatinic acid is metered directly into the feed to the elements.
- a technical electrolyzer with 144 elements whose nickel cathodes were provided with a coating based on ruthenium / ruthenium oxide from Denora, was operated at an average voltage of 3.12 V. Of these 144 elements, one showed an increased voltage of more than 100 mV from the mean.
- the following treatment cycle was started: 65.88 g of a hexachloroplatinate solution (1.19 g Pt / l) was added at 10.98 l / h during operation in the sodium hydroxide solution (conc. 31.5%) of a membrane electrolyzer at a current density of 4.18 kA / m 2 added over 6 h.
- the mean voltage increased to 3.02 V (based on 4 kA / m 2 ), so that a further dosage of platinum took place in the form of hexachloroplatinic acid.
- 4.12 g of the hexachloroplatinate solution (1.19 g Pt / l) were metered uniformly over the course of 2 hours, so that 4.9 g of platinum reached the surface of 144 cathodes (0.012 g Pt / m 2 ). The electrolysis was continued, the average voltage was then 3.01 V.
- the cell voltage was 3.09 V at a current density of 4 kA / m 2 before dosing, 3.01 V after dosing, which corresponds to a voltage reduction of 80 mV.
- a laboratory electrolysis cell was operated at a current density of 4 kA / m 2 at a cell voltage of 3.05 V using a standard cathode coating from Denora on the nickel cathode as described in Example 1. After decommissioning without application of a protective potential, damage to the cathode coating occurred. Normally, a protection potential is applied during decommissioning in order to protect the coating of the cathode from damage. After restarting, the cell voltage was 3.17 V.
- a solution of hexachloroplatinate with a platinum content of 1250 mg / l Pt was added to the running cell in the catholyte. After dosing the solution for 2 hours with a At a dose level of 5 ml / h, the voltage dropped to 3.04 V. A total of 12.5 mg of platinum (12.5 mg / 100 cm 2 ) was added.
- Example 2 The experiment of Example 2 was repeated, but a solution with a platinum concentration of 250 mg / l was dosed (same dosing and same flow rate). Addition hereby 2.5 mg Pt / 100 cm 2 . The voltage dropped from 3.16V to 3.07V, ie around 90mV.
- a laboratory electrolysis cell was operated at a current density of 4 kA / m 2 of a cell voltage of 3.08 V with a standard cathode coating of Fa. Denora on nickel electrodes as in Example 1. After decommissioning without application of a protective potential, damage to the cathode coating occurred. Normally, a protection potential is applied during decommissioning in order to protect the coating of the cathode from damage. After restarting, the cell voltage was 3.21 V.
- a solution of rhodium III chloride with a rhodium content of 125 mg / l was dosed for 4 hours at 5 ml / h. Thereafter, a further 2 hours with a solution of a concentration of 1250 mg / l and 5 ml / h were dosed, whereby a further 50 mV of voltage reduction were achieved. The voltage reduction was only 60 mV.
Abstract
Description
Die Erfindung betrifft ein Verfahren zur Verbesserung der Leistung von Nickelelektroden in der Alkalichloridelektrolyse.The invention relates to a method for improving the performance of nickel electrodes in alkali chloride electrolysis.
Kathoden für die Natriumchloridelektrolyse, an denen Wasserstoff in alkalischer Lösung entwickelt wird, bestehen üblicherweise aus Eisen oder Nickel. Werden Nickelelektroden eingesetzt, so können diese vollständig aus Nickel bestehen, oder es gelangen nur Nickeloberflächen zum Einsatz, in denen Substrate aus anderen Metallen oberflächlich vernickelt werden.Sodium chloride electrolytic cathodes where hydrogen is developed in alkaline solution are usually made of iron or nickel. If nickel electrodes are used, they can be made entirely of nickel, or only nickel surfaces are used in which substrates of other metals are surface-plated nickel-plated.
Wie in der Offenlegungsschrift
Die so hergestellte Elektrode kann z. B. in der Natriumchloridelektrolyse als Kathode zur Wasserstoffentwicklung eingesetzt werden. Hierbei sind viele Beschichtungsvarianten bekannt, denn die Beschichtung aus Metalloxiden kann dabei in verschiedenster Weise modifiziert werden, so dass unterschiedliche Zusammensetzungen auf der Oberfläche der Nickelelektrode entstehen. Gemäß der
Im Betrieb der nickelbasierenden Elektroden beobachtet man eine mit der Zeit abnehmende Güte der Elektrode, in der Form, dass die Zellspannung bei der Elektrolyse steigt, so dass gegebenenfalls eine Neubeschichtung der Elektrode erforderlich wird. Das ist technisch aufwändig, da die Elektrolyse abgeschaltet werden muss und die Elektroden aus den Elektrolysezellen ausgebaut werden müssen. Aufgabe der Erfindung ist es daher, eine einfachere Form der Leistungssteigerung bzw. der Leistungswiederherstellung zu finden.During operation of the nickel-based electrodes, a decreasing quality of the electrode over time is observed, in the form that the cell voltage rises during the electrolysis, so that, if necessary, a new coating of the electrode is required. This is technically complex, since the electrolysis must be switched off and the electrodes must be removed from the electrolysis cells. The object of the invention is therefore to find a simpler form of performance increase or performance restoration.
Die Firma ELTECH hat unter der Internetseite www.eltechsvstems.com/contact.asp eine Technik veröffentlicht und angeboten, mit der eine Spannungserniedrigung von 200 bis 300 mV verglichen mit unbehandelten Nickel-Elektroden erzielbar ist. Dabei wird eine edelmetall-haltige Lösung ungenannter Zusammensetzung und Inhaltsstoffe in situ, d. h. im Betrieb der Elektrolyse, auf der Kathodenseite der Natriumchloridelektrolyse in Membranzellen angewandt. Die Lösung soll während des Betriebes der Zelle zugegeben werden und die Zellspannung erniedrigen.The company ELTECH has published and offered under the website www.eltechsvstems.com/contact.asp a technique with which a voltage reduction of 200 to 300 mV is achievable compared to untreated nickel electrodes. In this case, a precious metal-containing solution of unnamed composition and ingredients in situ, that is used in the operation of electrolysis, on the cathode side of sodium chloride electrolysis in membrane cells. The solution should be added during operation of the cell and decrease the cell voltage.
Gemäß der Lehre der Patentschrift
Gemäß der weiter bekannt gewordenen Offenlegungsschrift
Gemäß der
Gemäß der
Gemäß der weiter bekannten Patentschrift
Gemäß der
Die Natriumchloridelektrolyse nach dem Membranverfahren wird wie folgt ausgeführt. Eine Natriumchlorid-haltige Lösung wird einer Anodenkammer mit einer Anode, eine Natronlauge wird einer Kathodenkammer mit einer Kathode zugeführt. Die beiden Kammern werden durch eine Ionenaustauschermembran getrennt. Mehrere dieser Anoden- und Kathodenkammern werden zu einem Elektrolyseur zusammengefügt. Die Anodenkammer verlässt neben dem gebildeten Chlor eine geringer konzentrierte Natriumchlorid-haltige Lösung als dieser zugeführt wurde. Die Kathodenkammer verlässt neben Wasserstoff eine höher konzentrierte Natronlauge als dieser zugeführt wurde. Der Natronlauge-Volumenstrom, der der Kathodenkammer zugeführt wird, ist abhängig von der Stromdichte und dem Zelldesign. Bei einer Stromdichte von beispielsweise 4 kA/m2 und dem Zelldesign der Fa. UHDE, Version BM 3.0, beträgt der Volumenstrom an Lauge zum Kathodenraum beispielsweise zwischen 100 und 300 1/h, bei einer Konzentration der ablaufenden Natronlauge von 30 bis 33 Gew.-%. Die geometrisch projizierte Kathodenfläche beträgt 2,71m2, dies entspricht der Membranfläche. Die Kathode besteht dabei aus einem Nickel-Streckmetall, das mit einer speziellen Beschichtung (nachstehend Coating genannt) versehen ist (Hersteller z.B. DENORA), um die Wasserstoffüberspannung zu senken.The sodium chloride electrolysis according to the membrane process is carried out as follows. A solution containing sodium chloride is supplied to an anode chamber with an anode, a sodium hydroxide solution is fed to a cathode chamber with a cathode. The two chambers are separated by an ion exchange membrane. Several of these anode and cathode compartments are assembled into an electrolyzer. The anode chamber leaves next to the chlorine formed a less concentrated sodium chloride-containing solution than it was supplied. The cathode chamber leaves next to hydrogen, a higher concentration of sodium hydroxide solution as this was supplied. The sodium hydroxide volume flow which is supplied to the cathode chamber depends on the current density and the cell design. At a current density of, for example, 4 kA / m 2 and the cell design of the company. UHDE, version BM 3.0, the volume of liquor to the cathode space, for example, between 100 and 300 1 / h, at a concentration of the effluent sodium hydroxide from 30 to 33 wt. -%. The geometrically projected cathode area is 2.71 m 2 , which corresponds to the membrane area. The cathode consists of a nickel-expanded metal, which is provided with a special coating (hereinafter called Coating) (manufacturer eg DENORA) to reduce the hydrogen overvoltage.
Üblicherweise bestehen die Kathoden-Coatings bei der Natriumchlorid-Elektrolyse aus Platinmetallen, Platinmetalloxiden oder deren Mischungen wie z.B. einer Ruthenium - Rutheniumoxid Mischung. Wie in der
Ebenfalls können nur einzelne Elemente eine Schädigung des Kathoden-Coatings aufweisen, wobei es nicht immer wirtschaftlich ist, dafür den gesamten Elektrolyseur abzustellen und das Element mit dem beschädigten Coating zu entfernen, da dies mit erheblichen Produktionsausfällen und Kosten verbunden ist.Also, only individual elements can have damage to the cathode coating, and it is not always economical to turn off the entire electrolyser and remove the damaged coating element, as this involves significant production losses and costs.
Methoden zur Verbesserung von Nickelelektroden für die Natriumchlorid-elektrolyse, die mit Elementen der Platinmetalle (VIII. Nebengruppe des Periodensystems), nachfolgend Platinmetalle, deren Oxiden oder deren Mischungen beschichtet sind, sind aus dem Stand der Technik bislang direkt nicht bekannt.Methods for improving nickel electrodes for the sodium chloride electrolysis, which are coated with elements of platinum metals (VIII. Subgroup of the Periodic Table), hereinafter platinum metals, their oxides or mixtures thereof, are so far not directly known from the prior art.
Aufgabe der Erfindung ist es daher, ein spezielles Verfahren zur Verbesserung von Nickelelektroden, die mit Platinmetallen, Platinmetalloxiden oder deren Mischungen beschichtet sind, für die Verwendung als Kathoden bei der Elektrolyse von Natriumchlorid zu entwickeln, dass sich im laufenden Elektrolysebetrieb einsetzen lässt und eine längere Unterbrechung des Elektrodenbetriebs zur Wiederherstellung der Kathodenaktivität vermeidet.The object of the invention is therefore to develop a special method for improving nickel electrodes which are coated with platinum metals, platinum metal oxides or mixtures thereof, for use as cathodes in the electrolysis of sodium chloride that can be used in ongoing electrolysis operation and a longer interruption of the electrode operation to restore the cathode activity avoids.
Gegenstand der Erfindung ist ein Verfahren zur Verbesserung der Leistung von Nickelelektroden, die eine Beschichtung auf Basis von Platinmetallen, Platinmetalloxiden oder Mischungen von Platinmetallen und Platinmetalloxiden aufweisen, für die Natriumchloridelektrolyse nach dem Membranverfahren, dadurch gekennzeichnet, dass bei der Elektrolyse von Natriumchlorid eine wasserlösliche oder in Alkali lösliche Platin-Verbindung, insbesondere Hexachloroplatinsäure oder insbesondere bevorzugt ein Alkaliplatinat, besonders bevorzugt Natriumhexachloroplatinat (Na2PtCl6) und/oder Natriumhexahydroxyplatinat (Na2Pt(OH)6) dem Katholyt zugegeben wird.The invention relates to a method for improving the performance of nickel electrodes having a coating based on platinum metals, platinum metal oxides or mixtures of platinum metals and platinum metal oxides, for the sodium chloride electrolysis according to the membrane process, characterized in that in the electrolysis of sodium chloride, a water-soluble or in Alkali-soluble platinum compound, especially hexachloroplatinic acid, or more preferably an alkali platinate, more preferably sodium hexachloroplatinate (Na 2 PtCl 6 ) and / or sodium hexahydroxyplatinate (Na 2 Pt (OH) 6 ) is added to the catholyte.
Hierbei kann insbesondere entweder das Natriumhexachloroplatinat als wässrige Lösung oder in alkalischer Lösung dosiert werden oder es wird die Hexachloroplatinsäure direkt in den Katholyt, insbesondere die Natronlauge, dosiert, wobei dann eine Reaktion mit der Lauge zum Chloroplatinat erfolgt.In this case, in particular, either the sodium hexachloroplatinate can be metered in as an aqueous solution or in alkaline solution, or the hexachloroplatinic acid is metered directly into the catholyte, in particular the sodium hydroxide solution, in which case a reaction with the lye to give the chloroplatinate takes place.
Die Zugabe der Platin-Verbindung erfolgt hierbei insbesondere bei laufender Elektrolyse unter normalen Elektrolysebedingungen bei einer Stromdichte von 0,1 bis 10 kA/m2, besonders bevorzugt bei einer Stromdichte von 0,5 bis 8 kA/m2.The addition of the platinum compound takes place here in particular during electrolysis under normal electrolysis conditions at a current density of 0.1 to 10 kA / m 2 , more preferably at a current density of 0.5 to 8 kA / m 2 .
Eine weitere bevorzugte Ausführungsform der Platinzugabe besteht darin, dass nach der Zugabe der Platinverbindung die Elektrolysespannung, insbesondere pulsartig im Bereich von 0 bis 5 V variiert wird, um Platin feinteiliger auf der Kathode abzuscheiden. Die Spannung beschreibt hierbei die Spannung zwischen Anode und Kathode.A further preferred embodiment of the addition of platinum is that after the addition of the platinum compound, the electrolysis voltage, in particular pulse-like in the range of 0 to 5 V is varied to deposit finely divided platinum on the cathode. The voltage here describes the voltage between anode and cathode.
Hierzu kann es je nach verwendetem Gleichrichter zur Erzeugung der Elektrolysegleichspannung ausreichen, die Zellspannung zu erniedrigen, um die Restwelligkeit des Gleichrichters hierfür auszunutzen. Die Restwelligkeit des Gleichrichters kann in einer alternierenden Spannung im genannten Spannungsbereich mit einer Amplitude von 0,5 bis 500 mV resultieren. Moderne Gleichrichter besitzen kaum noch eine Restwelligkeit, jedoch besteht die Möglichkeit künstlich eine Restwelligkeit zu erzeugen. Die Restwelligkeit liegt beispielsweise zwischen 20 und 100 Hz.Depending on the rectifier used, it may be sufficient to generate the electrolysis DC voltage in order to lower the cell voltage in order to utilize the residual ripple of the rectifier for this purpose. The residual ripple of the rectifier may result in an alternating voltage in said voltage range with an amplitude of 0.5 to 500 mV. Modern rectifiers hardly have any residual ripple, but there is the possibility of artificially generating a residual ripple. The residual ripple is, for example, between 20 and 100 Hz.
Wird die Amplitude ebenfalls geregelt, so kann diese für die Zeit der Edelmetall-dosierung mit +100 bzw. -100mV um das Ruhepotenzial betragen. Das Ruhepotenzial ist die Spannung, bei der kein Strom mehr fließt. Normalerweise beträgt dieses Potenzial ca. 2,1 bis 2,3 V, je nach verwendeter Zelltechnologie und Membran. Jedoch besteht auch die besondere Möglichkeit, die Edelmetalldosierung dann durchzuführen, wenn die Zellspannung 0 V beträgt, dann muss die Amplitude größer als das Ruhepotenzial gewählt werden.If the amplitude is also regulated, this can be around the quiescent potential for the time of the precious metal metering with +100 or -100mV. The rest potential is the voltage at which no current flows anymore. Normally, this potential is about 2.1 to 2.3 V, depending on the cell technology and membrane used. However, there is also the special possibility of performing the noble metal dosing when the cell voltage is 0 V, then the amplitude must be greater than the quiescent potential.
Höher aufmodulierte Amplituden sind ebenfalls denkbar.Higher modulated amplitudes are also conceivable.
Platinmetalle, die als Metall oder Metalloxid im Sinne der Erfindung als Elektrodencoating auf dem Nickel vorliegen können, sind insbesondere Ruthenium, Iridium, Palladium, Platin, Rhodium und Osmium.Platinum metals, which may be present as metal or metal oxide in the context of the invention as electrode coating on the nickel, are in particular ruthenium, iridium, palladium, platinum, rhodium and osmium.
Eine weitere bevorzugte Ausführungsform des neuen Verfahrens besteht darin, dass außer der Platinverbindung zusätzlich andere weitere lösliche Verbindungen der 8. Nebengruppe des Periodensystems der Elemente, insbesondere Verbindungen des Palladiums, Iridiums, Rhodiums, Osmiums oder des Rutheniums zugegeben werden. Diese finden insbesondere in Form von wasserlöslichen Salzen oder komplexen Säuren Verwendung.A further preferred embodiment of the novel process consists in that, in addition to the platinum compound, other further soluble compounds of subgroup 8 of the Periodic Table of the Elements, in particular compounds of palladium, iridium, rhodium, osmium or ruthenium, are additionally added. These are used in particular in the form of water-soluble salts or complex acids.
Bevorzugt erfolgt die Zugabe bei einer erstmaligen Dosierung nach Feststellung einer Deaktivierung derart, dass eine Platinverbindung in den Katholyten in den Zulauf zur Kathodenkammer bei einer Kathodenfläche von 2,71m2 zwischen 0,02 und 11 g Pt je Kathodenelement, entsprechend 0,007 g/m2 bis 4 g/m2, bei einer Stromdichte von 1 bis 8 kA/m2, erfolgt. Als Fläche wird die geometrisch projizierte Kathodenfläche, die auch der Membranfläche entspricht, zugrundegelegt. Die Dosiergeschwindigkeit kann dabei so durchgeführt werden, dass die Platin-haltige Lösung bezogen auf den Platingehalt je m2 Kathodenfläche zwischen 0,001 g Pt / (hm2) und 1 g Pt/(hm2) dosiert wird.Preferably, the addition in a first dose after detection of deactivation is such that a platinum compound in the catholyte in the feed to the cathode chamber at a cathode area of 2.71m 2 between 0.02 and 11 g Pt per cathode element, corresponding to 0.007 g / m 2 to 4 g / m 2 , at a current density of 1 to 8 kA / m 2 , takes place. The surface used is the geometrically projected cathode surface, which also corresponds to the membrane surface. The metering rate can be carried out in such a way that the platinum-containing solution, based on the platinum content per meter 2 of cathode area, is metered between 0.001 g Pt / (hm 2 ) and 1 g Pt / (hm 2 ).
Die Zugabe kann bei einer Stromdichte bevorzugt unter normalen Betriebsbedingungen erfolgen, als auch bei höherer oder niedrigerer Stromdichte. So kann die Zugabe bei einer Stromdichte insbesondere von 0,1 bis 10 kA/m2 erfolgen.The addition can be made at a current density preferably under normal operating conditions, as well as at higher or lower current density. Thus, the addition can be carried out at a current density in particular of 0.1 to 10 kA / m 2 .
Die Temperatur, bei der die Dosierung bevorzugt der Platinverbindung erfolgt, beträgt 70 bis 90°C. Die Dosierung kann aber auch bei niedrigerer Temperatur erfolgen.The temperature at which the dosage preferably takes place of the platinum compound is 70 to 90 ° C. The dosage can also be done at a lower temperature.
Wenn nach abgeschlossener Dosierung erneut ein Spannungsanstieg beobachtet wird, kann direkt durch erneute Dosierung diese wieder kompensiert werden. Bei dieser Dosierung ist eine deutlich niedrigere Edelmetall-Menge notwendig, um die Ursprungsspannung wieder herzustellen. Je nach Qualität der Sole, Lauge oder den Stillständen kann in einem Zeitraum von 1 bis 3 Wochen eine erneute, jedoch dann geringere Platin-Zugabe erforderlich sein. Hierbei kann ebenfalls die Zugabe der Platinverbindung in den Katholyten in den Zulauf zu den Kathoden erfolgen. Die benötigten Platinmengen sind nach dem Schadensumfang zu bemessen. Bei stärkerer Schädigung, entsprechend einem hohen Spannungsanstieg, muss mehr Platin dosiert werden, bei geringer Schädigung, entsprechend geringem Spannungsanstieg, entsprechend weniger. Eine Überdosierung von Platin führt jedoch zu keiner weiteren Verbesserung bzgl. Erniedrigung der Zellspannung.If a voltage increase is observed again after the dosage has been completed, it can be compensated directly by re-dosing. At this dosage, a significantly lower amount of noble metal is necessary to restore the original tension. Depending on the quality of the brine, lye or stoppages, a renewed, but then lower platinum addition may be required in a period of 1 to 3 weeks. In this case, the addition of the platinum compound in the catholyte can also be in the feed to the cathodes. The required platinum quantities are to be measured according to the scope of damage. For more severe damage, corresponding to a high voltage increase, more platinum must be dosed, with less damage, correspondingly lower voltage increase, correspondingly less. An overdose of platinum, however, leads to no further improvement in terms of lowering the cell voltage.
Besonders bevorzugt beträgt der Anteil bezogen auf das Platin der weiteren löslichen Verbindungen in der zuzugebenden Lösung aus der 8. Nebengruppe von 1 bis 50 Gew.-%.With particular preference the proportion based on the platinum of the further soluble compounds in the solution to be added from the 8th subgroup is from 1 to 50% by weight.
Die Variation der Elektrolysespannung kann beispielsweise in einer bevorzugten Ausführung durch Überlagerung einer Wechselspannung auf die Elektrolysespannung bewirkt werden. Die Frequenz der überlagerten Wechselspannung beträgt insbesondere von 10 bis 100 Hz, Die Amplitude kann dann zwischen 10 und 200 mV betragen.The variation of the electrolysis voltage can be effected, for example, in a preferred embodiment by superposing an AC voltage on the electrolysis voltage. The frequency of the superposed AC voltage is in particular from 10 to 100 Hz, the amplitude can then be between 10 and 200 mV.
Mit Hilfe des erfindungsgemäßen Verfahrens ist es erstmals möglich, bei beschädigten Nickelelektroden, die mit Ruthenium und/oder Rutheniumoxiden oder deren Mischungen beschichtet sind, eine Spannungserniedrigung um bis zu 200 mV zu realisieren.With the aid of the method according to the invention, it is possible for the first time to realize a voltage reduction of up to 200 mV in the case of damaged nickel electrodes which are coated with ruthenium and / or ruthenium oxides or mixtures thereof.
Die Herstellung des Alkaliplatinates kann durch Umsetzung von Hexachloroplatinsäure mit Alkalilauge erfolgen. Dies kann gesondert erfolgen oder auch direkt in situ, wenn z.B. Hexachloroplatinsäure direkt in die Natronlaugezuführung zu den Elementen bzw. zum Elektrolyseur dosiert wird. Besonders bevorzugt wird die Hexachloroplatinsäure direkt in den Zulauf zu den Elementen dosiert.The preparation of the Alkaliplatinates can be carried out by reaction of hexachloroplatinic acid with alkali. This can be done separately or directly in situ if, for example, hexachloroplatinic acid is metered directly into the sodium hydroxide feed to the elements or to the electrolyzer. Particularly preferably, the hexachloroplatinic acid is metered directly into the feed to the elements.
Ein technischer Elektrolyseur mit 144 Elementen, deren Nickel-Kathoden mit einem Coating basierend auf Ruthenium- / Rutheniumoxid der Fa. Denora versehen waren, wurde bei einer mittleren Spannung von 3,12 V betrieben. Von diesen 144 Elementen zeigte eines eine gegenüber dem Mittelwert um mehr als 100 mV erhöhte Spannung. Es wurde folgender Behandlungszyklus begonnen: 65,88 1 einer Hexachloroplatinat-Lösung (1,19 g Pt/l) wurde mit 10,98 l/h während des Betriebs in die Natronlauge (Konz. 31,5%) eines Membranelektrolyseurs bei einer Stromdichte von 4,18 kA/m2 über von 6 h zudosiert. Es gelangten somit 78,25 g Platin auf die Oberfläche von 144 Kathoden (Oberfläche einer Kathode: 2,71m2). Dies entspricht einer Platin-Menge von 0,21 g Pt/m2. Die Zellspannung fiel im Mittel auf 3,08 V, die Stromaufnahme stieg auf 4,57 kA/m2. Umgerechnet auf 4 kA/m2 entspricht dies einer Erniedrigung der Spannung um 80mV, demnach von 3,09 auf 3,01. Elemente mit deutlich höherer Spannung waren nicht mehr vorhanden. Am nächsten Tag wurde noch einmal mit 16,44 l der gleichen Lösung, entsprechend 0,05 gPt/m2 dosiert. Die Zellspannung verbesserte sich dadurch nicht mehr.A technical electrolyzer with 144 elements, whose nickel cathodes were provided with a coating based on ruthenium / ruthenium oxide from Denora, was operated at an average voltage of 3.12 V. Of these 144 elements, one showed an increased voltage of more than 100 mV from the mean. The following treatment cycle was started: 65.88 g of a hexachloroplatinate solution (1.19 g Pt / l) was added at 10.98 l / h during operation in the sodium hydroxide solution (conc. 31.5%) of a membrane electrolyzer at a current density of 4.18 kA / m 2 added over 6 h. Thus, 78.25 g platinum reached the surface of 144 cathodes (surface of a cathode: 2.71 m 2 ). This corresponds to a platinum amount of 0.21 g Pt / m 2 . The cell voltage fell on average to 3.08 V, the power consumption increased to 4.57 kA / m 2 . Converted to 4 kA / m 2 , this corresponds to a lowering of the voltage by 80mV, thus from 3.09 to 3.01. Elements with significantly higher voltage were no longer available. The next day was again dosed with 16.44 l of the same solution, corresponding to 0.05 gPt / m 2 . The cell voltage did not improve anymore.
Nach 9 Tagen stieg die mittlere Spannung auf 3,02 V (bezogen auf 4 kA/m2), so dass ein weitere Dosierung von Platin in Form der Hexachloroplatinsäure erfolgte. Hierbei wurde gleichmäßig innerhalb von 2 h 4,12 l der Hexachloroplatinat-Lösung (1,19g Pt/1) dosiert, so dass 4,9 g Platin auf die Oberfläche von 144 Kathoden gelangten (0,012g Pt/m2). Die Elektrolyse wurde dabei fortgesetzt, die mittlere Spannung betrug danach 3,01 V.After 9 days, the mean voltage increased to 3.02 V (based on 4 kA / m 2 ), so that a further dosage of platinum took place in the form of hexachloroplatinic acid. During this time, 4.12 g of the hexachloroplatinate solution (1.19 g Pt / l) were metered uniformly over the course of 2 hours, so that 4.9 g of platinum reached the surface of 144 cathodes (0.012 g Pt / m 2 ). The electrolysis was continued, the average voltage was then 3.01 V.
Die Zellspannung betrug bei einer Stromdichte von 4 kA/m2 vor der Dosierung im Mittel 3,09 V, nach der Dosierung 3,01 V, dies entspricht einer Spannungserniedrigung von 80mV.The cell voltage was 3.09 V at a current density of 4 kA / m 2 before dosing, 3.01 V after dosing, which corresponds to a voltage reduction of 80 mV.
Eine Labor-Elektrolysezelle wurde bei einer Stromdichte von 4 kA/m2 bei einer Zellspannung von 3,05 V mit einem Standard Kathoden Coating der Fa. Denora auf der Nickel-Kathode wie in Beispiel 1 beschrieben, betrieben. Nach Außerbetriebnahme ohne Anlegen eines Schutzpotenzials trat eine Schädigung des Kathoden-Coatings ein. Üblicherweise wird bei der Außerbetriebnahme ein Schutzpotenzial angelegt, um das Coating der Kathode vor Beschädigungen zu schützen. Nach Wiederinbetriebnahme betrug die Zellspannung 3,17 V.A laboratory electrolysis cell was operated at a current density of 4 kA / m 2 at a cell voltage of 3.05 V using a standard cathode coating from Denora on the nickel cathode as described in Example 1. After decommissioning without application of a protective potential, damage to the cathode coating occurred. Normally, a protection potential is applied during decommissioning in order to protect the coating of the cathode from damage. After restarting, the cell voltage was 3.17 V.
Eine Lösung aus Hexachloroplatinat mit einem Platingehalt von 1250 mg/l Pt wurde zur laufenden Zelle in den Katholyten dosiert. Nach einer Dosierung der Lösung über 2 Stunden mit einer Dosierungsmenge von 5 ml/ h fiel die Spannung auf 3,04 V. Zugegeben wurden insgesamt 12,5 mg Platin (12,5 mg/100cm2).A solution of hexachloroplatinate with a platinum content of 1250 mg / l Pt was added to the running cell in the catholyte. After dosing the solution for 2 hours with a At a dose level of 5 ml / h, the voltage dropped to 3.04 V. A total of 12.5 mg of platinum (12.5 mg / 100 cm 2 ) was added.
Der Versuch von Beispiel 2 wurde wiederholt, jedoch wurde eine Lösung mit einer Platinkonzentration von 250 mg/l dosiert (gleiche Dosierzeit und gleiche Förderleistung). Zusatz hierbei 2,5 mg Pt / 100 cm2. Die Spannung fiel von 3,16 V auf 3,07 V, d.h. um 90 mV.The experiment of Example 2 was repeated, but a solution with a platinum concentration of 250 mg / l was dosed (same dosing and same flow rate). Addition hereby 2.5 mg Pt / 100 cm 2 . The voltage dropped from 3.16V to 3.07V, ie around 90mV.
Eine weitere Nachdosierung brachte keine weitere Spannungserniedrigung.Further replenishment brought no further decrease in voltage.
Eine Labor-Elektrolysezelle wurde bei einer Stromdichte von 4 kA/m2 einer Zellspannung von 3,08 V mit einem Standard Kathoden Coating der Fa. Denora auf Nickel-Elektroden wie unter Beispiel 1 betrieben. Nach Außerbetriebnahme ohne Anlegen eines Schutzpotenzials trat eine Schädigung des Kathoden-Coatings ein. Üblicherweise wird bei der Außerbetriebnahme ein Schutzpotenzial angelegt, um das Coating der Kathode vor Beschädigungen zu schützen. Nach Wiederinbetriebnahme betrug die Zellspannung 3,21 V.A laboratory electrolysis cell was operated at a current density of 4 kA / m 2 of a cell voltage of 3.08 V with a standard cathode coating of Fa. Denora on nickel electrodes as in Example 1. After decommissioning without application of a protective potential, damage to the cathode coating occurred. Normally, a protection potential is applied during decommissioning in order to protect the coating of the cathode from damage. After restarting, the cell voltage was 3.21 V.
Eine Lösung aus Rhodium-III-chlorid mit einem Rhodiumgehalt von 125 mg/l wurde über 4 Stunden mit 5 ml/h dosiert. Danach wurden nochmals 2 Stunden mit eine Lösung einer Konzentration von 1250 mg/l und 5 ml/h dosiert, wodurch weitere 50 mV an Spannungserniedrigung erzielt wurden. Die Spannungserniedrigung betrug lediglich 60 mV.A solution of rhodium III chloride with a rhodium content of 125 mg / l was dosed for 4 hours at 5 ml / h. Thereafter, a further 2 hours with a solution of a concentration of 1250 mg / l and 5 ml / h were dosed, whereby a further 50 mV of voltage reduction were achieved. The voltage reduction was only 60 mV.
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JP6397396B2 (en) * | 2015-12-28 | 2018-09-26 | デノラ・ペルメレック株式会社 | Alkaline water electrolysis method |
WO2018029200A1 (en) | 2016-08-10 | 2018-02-15 | Covestro Deutschland Ag | Process for the electrochemical purification of chloride-containing process solutions |
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KR102283328B1 (en) * | 2016-11-28 | 2021-07-30 | 주식회사 엘지화학 | Method for regenerating reduction electrode |
FR3066505B1 (en) * | 2017-05-16 | 2021-04-09 | Safran Aircraft Engines | IMPROVED PROCESS AND DEVICE FOR PLATINUM BATH FILTRATION BY ELECTRODIALYSIS |
US10815578B2 (en) | 2017-09-08 | 2020-10-27 | Electrode Solutions, LLC | Catalyzed cushion layer in a multi-layer electrode |
EP3597791B1 (en) | 2018-07-20 | 2021-11-17 | Covestro Deutschland AG | Method for improving the performance of nickel electrodes |
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RU2443803C2 (en) | 2012-02-27 |
CN101302624B (en) | 2016-08-03 |
BRPI0800044A (en) | 2008-09-16 |
JP5679621B2 (en) | 2015-03-04 |
EP1953270B1 (en) | 2015-12-09 |
JP2013213284A (en) | 2013-10-17 |
KR20080069913A (en) | 2008-07-29 |
TW200846500A (en) | 2008-12-01 |
CN101302624A (en) | 2008-11-12 |
US9273403B2 (en) | 2016-03-01 |
CA2618205A1 (en) | 2008-07-24 |
RU2008101765A (en) | 2009-07-27 |
JP5732111B2 (en) | 2015-06-10 |
DE102007003554A1 (en) | 2008-07-31 |
SG144842A1 (en) | 2008-08-28 |
US20120325674A1 (en) | 2012-12-27 |
TWI437128B (en) | 2014-05-11 |
JP2008179896A (en) | 2008-08-07 |
US20080257749A1 (en) | 2008-10-23 |
KR20150082163A (en) | 2015-07-15 |
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