EP1397725A1 - Radiation-curable resin composition and rapid prototyping process using the same - Google Patents
Radiation-curable resin composition and rapid prototyping process using the sameInfo
- Publication number
- EP1397725A1 EP1397725A1 EP02743966A EP02743966A EP1397725A1 EP 1397725 A1 EP1397725 A1 EP 1397725A1 EP 02743966 A EP02743966 A EP 02743966A EP 02743966 A EP02743966 A EP 02743966A EP 1397725 A1 EP1397725 A1 EP 1397725A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- free radical
- composition
- radical polymerizable
- radiation
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29947001P | 2001-06-21 | 2001-06-21 | |
US299470P | 2001-06-21 | ||
PCT/NL2002/000408 WO2003001295A1 (en) | 2001-06-21 | 2002-06-20 | Radiation-curable resin composition and rapid prototyping process using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1397725A1 true EP1397725A1 (en) | 2004-03-17 |
EP1397725B1 EP1397725B1 (en) | 2017-12-20 |
Family
ID=23154931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02743966.0A Expired - Lifetime EP1397725B1 (en) | 2001-06-21 | 2002-06-20 | Radiation-curable resin composition and rapid prototyping process using the same |
Country Status (7)
Country | Link |
---|---|
US (1) | US6811937B2 (en) |
EP (1) | EP1397725B1 (en) |
JP (1) | JP2004530773A (en) |
KR (1) | KR20040030694A (en) |
CN (1) | CN1295562C (en) |
HK (1) | HK1070142A1 (en) |
WO (1) | WO2003001295A1 (en) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040054025A1 (en) * | 2002-06-20 | 2004-03-18 | Lawton John A. | Compositions comprising a benzophenone photoinitiator |
US7232850B2 (en) * | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
CA2541160C (en) * | 2003-11-06 | 2012-05-15 | Huntsman Advanced Materials (Switzerland) Gmbh | Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
US7704643B2 (en) * | 2005-02-28 | 2010-04-27 | Inphase Technologies, Inc. | Holographic recording medium with control of photopolymerization and dark reactions |
EP1924887B1 (en) * | 2005-09-13 | 2017-11-22 | 3D Systems, Inc. | Photocurable compositions for preparing abs-like articles |
US20070092733A1 (en) * | 2005-10-26 | 2007-04-26 | 3M Innovative Properties Company | Concurrently curable hybrid adhesive composition |
US20090004579A1 (en) * | 2007-06-27 | 2009-01-01 | Dsm Ip Assets B.V. | Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
WO2009070500A1 (en) * | 2007-11-27 | 2009-06-04 | Huntsman Advanced Materials Americas Inc. | Photocurable resin composition for producing three dimensional articles having high clarity |
EP2151214B1 (en) * | 2008-07-30 | 2013-01-23 | Ivoclar Vivadent AG | Light hardening dross for stereolithographic production of dental ceramics |
JP5430345B2 (en) | 2009-10-26 | 2014-02-26 | Jsr株式会社 | Radiation curable liquid resin composition for optical three-dimensional modeling and three-dimensional modeling obtained by photocuring the same |
EP2526463B1 (en) * | 2010-01-22 | 2016-07-13 | DSM IP Assets B.V. | Method of forming a three-dimensional article having selective visual effects |
JP6348702B2 (en) * | 2013-11-07 | 2018-06-27 | シーメット株式会社 | Optical three-dimensional resin composition |
WO2015067685A1 (en) * | 2013-11-08 | 2015-05-14 | Sicpa Holding Sa | Composite marking based on chiral liquid crystal precursors and modifying resins |
CN103755889A (en) * | 2014-01-10 | 2014-04-30 | 上海那恒新材料有限公司 | Light-emitting high precision three-dimensionally moulded photosensitive resin composition |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
CN113579992A (en) | 2014-10-17 | 2021-11-02 | 应用材料公司 | CMP pad construction with composite material properties using additive manufacturing process |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US10618141B2 (en) | 2015-10-30 | 2020-04-14 | Applied Materials, Inc. | Apparatus for forming a polishing article that has a desired zeta potential |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US11602412B2 (en) | 2016-12-23 | 2023-03-14 | 3M Innovative Properties Company | Printable compositions including polymeric and polymerizable components, articles, and methods of making articles therefrom |
US20180304539A1 (en) | 2017-04-21 | 2018-10-25 | Applied Materials, Inc. | Energy delivery system with array of energy sources for an additive manufacturing apparatus |
CN108976352A (en) * | 2017-06-05 | 2018-12-11 | 惠展电子材料(上海)有限公司 | A kind of 3D printing Photocurable composition based on acrylic resin |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
CN107513309B (en) * | 2017-08-01 | 2018-10-30 | 珠海赛纳打印科技股份有限公司 | Three-dimensionally shaped photocuring transparent ink composition and its preparation method and application |
US11072050B2 (en) | 2017-08-04 | 2021-07-27 | Applied Materials, Inc. | Polishing pad with window and manufacturing methods thereof |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | Abrasive delivery polishing pads and manufacturing methods thereof |
TWI692502B (en) | 2017-12-29 | 2020-05-01 | 法商阿科瑪法國公司 | Curable compositions |
WO2020050932A1 (en) | 2018-09-04 | 2020-03-12 | Applied Materials, Inc. | Formulations for advanced polishing pads |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
CN114805702A (en) * | 2022-05-06 | 2022-07-29 | 苏州鑫雷盟智能制造科技有限公司 | SLA high-toughness photosensitive resin for 3D printing and preparation method thereof |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2406400B2 (en) | 1973-02-14 | 1977-04-28 | Hitachi Chemical Co., Ltd., Tokio | LIGHT-SENSITIVE RESIN COMPOSITIONS ON THE BASIS OF COMPOUNDS WITH EPOXY OR. PHOTOPOLYMERIZABLE ACRYLIC GROUPS |
US4237216A (en) | 1978-12-08 | 1980-12-02 | International Business Machines Corporation | Photosensitive patternable coating composition containing novolak type materials |
US4426431A (en) | 1982-09-22 | 1984-01-17 | Eastman Kodak Company | Radiation-curable compositions for restorative and/or protective treatment of photographic elements |
US4623676A (en) * | 1985-01-18 | 1986-11-18 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
DE59209143D1 (en) | 1991-03-27 | 1998-02-26 | Ciba Geigy Ag | Photosensitive mixture based on acrylates |
US5510226A (en) | 1991-05-01 | 1996-04-23 | Alliedsignal Inc. | Stereolithography using vinyl ether-epoxide polymers |
TW269017B (en) | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
ES2147777T3 (en) | 1993-09-16 | 2000-10-01 | Ciba Sc Holding Ag | VINILETER COMPOUNDS WITH ADDITIONAL FUNCTIONAL GROUPS, OTHER THAN VINILETER, AND THEIR USE IN THE FORMULATION OF RETICULABLE COMPOUNDS. |
JP3117394B2 (en) | 1994-11-29 | 2000-12-11 | 帝人製機株式会社 | Optical three-dimensional molding resin composition |
TW418215B (en) | 1995-03-13 | 2001-01-11 | Ciba Sc Holding Ag | A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition |
US5707780A (en) | 1995-06-07 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Photohardenable epoxy composition |
JP3930567B2 (en) | 1996-05-09 | 2007-06-13 | ディーエスエム アイピー アセッツ ビー. ブイ | Photosensitive resin composition for rapid prototyping and manufacturing method of three-dimensional object |
ES2144836T3 (en) | 1996-07-29 | 2000-06-16 | Ciba Sc Holding Ag | LIQUID COMPOSITION RETICULABLE BY RADIATION, ESPECIALLY FOR STEREOLITHOGRAPHY. |
US6054250A (en) | 1997-02-18 | 2000-04-25 | Alliedsignal Inc. | High temperature performance polymers for stereolithography |
US6100313A (en) * | 1997-03-07 | 2000-08-08 | The Walman Optical Company | UV-curable abrasion-resistant coating composition |
EP0889360B1 (en) | 1997-06-30 | 2002-01-30 | Siemens Aktiengesellschaft | Reactive resin mixtures and their use |
US6287745B1 (en) | 1998-02-18 | 2001-09-11 | Dsm N.V. | Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
JP2000075774A (en) * | 1998-09-01 | 2000-03-14 | Toppan Printing Co Ltd | Hologram recording material |
ATE465434T1 (en) | 2000-02-08 | 2010-05-15 | Huntsman Adv Mat Switzerland | LIQUID, RADIATION-CURED COMPOSITION, PARTICULARLY FOR STEREOLITHOGRAPHY |
-
2002
- 2002-03-06 US US10/091,119 patent/US6811937B2/en not_active Expired - Lifetime
- 2002-06-20 WO PCT/NL2002/000408 patent/WO2003001295A1/en active Application Filing
- 2002-06-20 EP EP02743966.0A patent/EP1397725B1/en not_active Expired - Lifetime
- 2002-06-20 CN CNB02816184XA patent/CN1295562C/en not_active Expired - Lifetime
- 2002-06-20 KR KR10-2003-7016707A patent/KR20040030694A/en active IP Right Grant
- 2002-06-20 JP JP2003507629A patent/JP2004530773A/en active Pending
-
2005
- 2005-03-29 HK HK05102611A patent/HK1070142A1/en not_active IP Right Cessation
Non-Patent Citations (1)
Title |
---|
See references of WO03001295A1 * |
Also Published As
Publication number | Publication date |
---|---|
CN1543590A (en) | 2004-11-03 |
EP1397725B1 (en) | 2017-12-20 |
KR20040030694A (en) | 2004-04-09 |
US20030104313A1 (en) | 2003-06-05 |
HK1070142A1 (en) | 2005-06-10 |
CN1295562C (en) | 2007-01-17 |
WO2003001295A1 (en) | 2003-01-03 |
US6811937B2 (en) | 2004-11-02 |
JP2004530773A (en) | 2004-10-07 |
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