EP0874428A3 - Long wavelength VCSEL - Google Patents

Long wavelength VCSEL Download PDF

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Publication number
EP0874428A3
EP0874428A3 EP98106843A EP98106843A EP0874428A3 EP 0874428 A3 EP0874428 A3 EP 0874428A3 EP 98106843 A EP98106843 A EP 98106843A EP 98106843 A EP98106843 A EP 98106843A EP 0874428 A3 EP0874428 A3 EP 0874428A3
Authority
EP
European Patent Office
Prior art keywords
gaas
long wavelength
mirror
cladding region
wavelength vcsel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98106843A
Other languages
German (de)
French (fr)
Other versions
EP0874428B1 (en
EP0874428A2 (en
Inventor
Jamal Ramdani
Michael S. Lebby
Wenbin Jiang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of EP0874428A2 publication Critical patent/EP0874428A2/en
Publication of EP0874428A3 publication Critical patent/EP0874428A3/en
Application granted granted Critical
Publication of EP0874428B1 publication Critical patent/EP0874428B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00—Functional characteristics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2302/00—Amplification / lasing wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3202—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
    • H01S5/32358—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers containing very small amounts, usually less than 1%, of an additional III or V compound to decrease the bandgap strongly in a non-linear way by the bowing effect
    • H01S5/32366—(In)GaAs with small amount of N

Abstract

A VCSEL for emitting long wavelength light including a GaAs (111) substrate element (12), a first mirror stack (14) with mirror pairs in a GaAs/AlGaAs material system lattice matched to a GaInAsN active region (20) with an active structure (23) sandwiched between a first cladding region (24) adjacent the first mirror stack (14) and a second cladding region (25), the active structure (23) including a nitride based quantum well (35, 36, & 37), and a second mirror stack (26) lattice matched to the second cladding region (25) and having mirror pairs in a GaAs/AlGaAs material system.
EP98106843A 1997-04-23 1998-04-15 Long wavelength vertical cavity surface emitting semiconductor laser (VCSEL) Expired - Lifetime EP0874428B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/839,112 US5943359A (en) 1997-04-23 1997-04-23 Long wavelength VCSEL
US839112 2001-04-23

Publications (3)

Publication Number Publication Date
EP0874428A2 EP0874428A2 (en) 1998-10-28
EP0874428A3 true EP0874428A3 (en) 1998-11-04
EP0874428B1 EP0874428B1 (en) 2003-02-26

Family

ID=25278892

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98106843A Expired - Lifetime EP0874428B1 (en) 1997-04-23 1998-04-15 Long wavelength vertical cavity surface emitting semiconductor laser (VCSEL)

Country Status (5)

Country Link
US (1) US5943359A (en)
EP (1) EP0874428B1 (en)
JP (1) JPH10303515A (en)
DE (1) DE69811553T2 (en)
TW (1) TW396668B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822995B2 (en) 2002-02-21 2004-11-23 Finisar Corporation GaAs/AI(Ga)As distributed bragg reflector on InP
US8168456B2 (en) 2004-10-01 2012-05-01 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
US8451875B2 (en) 2004-10-01 2013-05-28 Finisar Corporation Vertical cavity surface emitting laser having strain reduced quantum wells

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3683669B2 (en) 1997-03-21 2005-08-17 株式会社リコー Semiconductor light emitting device
US6975660B2 (en) 2001-12-27 2005-12-13 Finisar Corporation Vertical cavity surface emitting laser including indium and antimony in the active region
US7257143B2 (en) * 1998-12-21 2007-08-14 Finisar Corporation Multicomponent barrier layers in quantum well active regions to enhance confinement and speed
US20030219917A1 (en) * 1998-12-21 2003-11-27 Johnson Ralph H. System and method using migration enhanced epitaxy for flattening active layers and the mechanical stabilization of quantum wells associated with vertical cavity surface emitting lasers
US7408964B2 (en) 2001-12-20 2008-08-05 Finisar Corporation Vertical cavity surface emitting laser including indium and nitrogen in the active region
US6922426B2 (en) 2001-12-20 2005-07-26 Finisar Corporation Vertical cavity surface emitting laser including indium in the active region
US7058112B2 (en) 2001-12-27 2006-06-06 Finisar Corporation Indium free vertical cavity surface emitting laser
US7095770B2 (en) 2001-12-20 2006-08-22 Finisar Corporation Vertical cavity surface emitting laser including indium, antimony and nitrogen in the active region
US7435660B2 (en) * 1998-12-21 2008-10-14 Finisar Corporation Migration enhanced epitaxy fabrication of active regions having quantum wells
US7286585B2 (en) * 1998-12-21 2007-10-23 Finisar Corporation Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region
US7167495B2 (en) * 1998-12-21 2007-01-23 Finisar Corporation Use of GaAs extended barrier layers between active regions containing nitrogen and AlGaAs confining layers
US6577658B1 (en) 1999-09-20 2003-06-10 E20 Corporation, Inc. Method and apparatus for planar index guided vertical cavity surface emitting lasers
US6621842B1 (en) 1999-10-15 2003-09-16 E20 Communications, Inc. Method and apparatus for long wavelength semiconductor lasers
US6975663B2 (en) * 2001-02-26 2005-12-13 Ricoh Company, Ltd. Surface-emission laser diode operable in the wavelength band of 1.1-7μm and optical telecommunication system using such a laser diode
US6879615B2 (en) * 2000-01-19 2005-04-12 Joseph Reid Henrichs FCSEL that frequency doubles its output emissions using sum-frequency generation
US6704336B1 (en) * 2000-07-22 2004-03-09 Joseph Reid Henrichs Folded cavity surface emitting laser
US6674785B2 (en) 2000-09-21 2004-01-06 Ricoh Company, Ltd. Vertical-cavity, surface-emission type laser diode and fabrication process thereof
JP2002252426A (en) * 2001-02-26 2002-09-06 Ricoh Co Ltd Optical communication system using long-waveband surface light-emitting laser device
US7590159B2 (en) * 2001-02-26 2009-09-15 Ricoh Company, Ltd. Surface-emission laser diode operable in the wavelength band of 1.1-1.7 micrometers and optical telecommunication system using such a laser diode
JP2002329928A (en) * 2001-02-27 2002-11-15 Ricoh Co Ltd Optical communication system
JP2002261400A (en) * 2001-02-27 2002-09-13 Ricoh Co Ltd Laser, laser apparatus, and optical communication system
JP2002261388A (en) * 2001-02-27 2002-09-13 Ricoh Co Ltd Surface emission semiconductor laser element chip and optical communication system
JP4864014B2 (en) * 2001-03-27 2012-01-25 株式会社リコー Manufacturing method of surface emitting semiconductor laser device
US6888873B2 (en) * 2002-02-21 2005-05-03 Finisar Corporation Long wavelength VCSEL bottom mirror
US7295586B2 (en) * 2002-02-21 2007-11-13 Finisar Corporation Carbon doped GaAsSb suitable for use in tunnel junctions of long-wavelength VCSELs
JP2006294811A (en) 2005-04-08 2006-10-26 Fuji Xerox Co Ltd Tunnel-junction surface emitting semiconductor laser element and manufacturing method thereof
US9450001B2 (en) * 2009-12-03 2016-09-20 Technion Research & Development Foundation Limited Method and system for detecting light and designing a light detector
JP6271934B2 (en) * 2012-11-02 2018-01-31 キヤノン株式会社 Nitride semiconductor surface emitting laser and manufacturing method thereof

Citations (2)

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US5383211A (en) * 1993-11-02 1995-01-17 Xerox Corporation TM-polarized laser emitter using III-V alloy with nitrogen
EP0723303A2 (en) * 1995-01-17 1996-07-24 Hewlett-Packard Company Semiconductor light-emitting device and method for manufacture thereof

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US5146465A (en) * 1991-02-01 1992-09-08 Apa Optics, Inc. Aluminum gallium nitride laser
US5258990A (en) * 1991-11-07 1993-11-02 The United States Of America As Represented By The Secretary Of The United States Department Of Energy Visible light surface emitting semiconductor laser
US5432809A (en) * 1994-06-15 1995-07-11 Motorola, Inc. VCSEL with Al-free cavity region
US5708280A (en) * 1996-06-21 1998-01-13 Motorola Integrated electro-optical package and method of fabrication
US5719895A (en) * 1996-09-25 1998-02-17 Picolight Incorporated Extended wavelength strained layer lasers having short period superlattices

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383211A (en) * 1993-11-02 1995-01-17 Xerox Corporation TM-polarized laser emitter using III-V alloy with nitrogen
EP0723303A2 (en) * 1995-01-17 1996-07-24 Hewlett-Packard Company Semiconductor light-emitting device and method for manufacture thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
KONDOW M ET AL: "A NOVEL MATERIAL OF GAINAS FOR LONG-WAVELENGTH-RANGE LASER DIODES WITH EXCELLENT HIGH-TEMEPRATURE PERFORMANCE", INTERNATIONAL CONFERENCE ON SOLID STATE DEVICES AND MATERIALS, 21 August 1995 (1995-08-21), pages 1016 - 1018, XP000544869 *
T MIYAMOTO, T. TAKADA, ET AL: "Design and expected characteristics of 1.3 mum GaInNAs/GaAs vertical cavity surface emitting lasers", QUANTUM OPTOELECTRONICS 1997, TECHNICAL DIGEST SERIES, POSTCONFERENCE EDITION,, vol. 9, 19 March 1997 (1997-03-19) - 21 March 1997 (1997-03-21), Incline Village NV USA, pages 126-128, XP002075850 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822995B2 (en) 2002-02-21 2004-11-23 Finisar Corporation GaAs/AI(Ga)As distributed bragg reflector on InP
US8168456B2 (en) 2004-10-01 2012-05-01 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
US8451875B2 (en) 2004-10-01 2013-05-28 Finisar Corporation Vertical cavity surface emitting laser having strain reduced quantum wells

Also Published As

Publication number Publication date
JPH10303515A (en) 1998-11-13
TW396668B (en) 2000-07-01
DE69811553D1 (en) 2003-04-03
DE69811553T2 (en) 2003-08-14
EP0874428B1 (en) 2003-02-26
EP0874428A2 (en) 1998-10-28
US5943359A (en) 1999-08-24

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