DE69942913D1 - Verfahren und gerät zum entwickeln von fotoresistmustern - Google Patents

Verfahren und gerät zum entwickeln von fotoresistmustern

Info

Publication number
DE69942913D1
DE69942913D1 DE69942913T DE69942913T DE69942913D1 DE 69942913 D1 DE69942913 D1 DE 69942913D1 DE 69942913 T DE69942913 T DE 69942913T DE 69942913 T DE69942913 T DE 69942913T DE 69942913 D1 DE69942913 D1 DE 69942913D1
Authority
DE
Germany
Prior art keywords
manifold
fluid
developer
rinse
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69942913T
Other languages
English (en)
Inventor
Emir Gurer
Ed C Lee
Murthy Krishna
Reese Reynolds
John Salois
Royal Cherry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Application granted granted Critical
Publication of DE69942913D1 publication Critical patent/DE69942913D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0884—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point the outlet orifices for jets constituted by a liquid or a mixture containing a liquid being aligned
DE69942913T 1998-09-17 1999-09-01 Verfahren und gerät zum entwickeln von fotoresistmustern Expired - Lifetime DE69942913D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10073898P 1998-09-17 1998-09-17
US09/221,060 US6248171B1 (en) 1998-09-17 1998-12-28 Yield and line width performance for liquid polymers and other materials
PCT/US1999/020115 WO2000016163A2 (en) 1998-09-17 1999-09-01 Method and apparatus for developing photoresist patterns

Publications (1)

Publication Number Publication Date
DE69942913D1 true DE69942913D1 (de) 2010-12-16

Family

ID=26797493

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69942913T Expired - Lifetime DE69942913D1 (de) 1998-09-17 1999-09-01 Verfahren und gerät zum entwickeln von fotoresistmustern

Country Status (9)

Country Link
US (6) US6248171B1 (de)
EP (1) EP1114355B8 (de)
JP (1) JP3708437B2 (de)
KR (1) KR100560180B1 (de)
AT (1) ATE487164T1 (de)
AU (1) AU5802399A (de)
DE (1) DE69942913D1 (de)
TW (1) TWI249657B (de)
WO (1) WO2000016163A2 (de)

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EP1950584B1 (de) 2007-01-26 2009-04-22 Sick Ag Optoelektronischer Sensor und Empfangsverfahren mit Störlichtkorrektur
TWI409597B (zh) * 2010-08-06 2013-09-21 Inotera Memories Inc 用於減少顯影劑用量之顯影劑噴灑裝置
US9120190B2 (en) 2011-11-30 2015-09-01 Palo Alto Research Center Incorporated Co-extruded microchannel heat pipes
US10371468B2 (en) 2011-11-30 2019-08-06 Palo Alto Research Center Incorporated Co-extruded microchannel heat pipes
US8875653B2 (en) * 2012-02-10 2014-11-04 Palo Alto Research Center Incorporated Micro-extrusion printhead with offset orifices for generating gridlines on non-square substrates
JP6300477B2 (ja) 2012-09-20 2018-03-28 花王株式会社 皮膚又は毛髪用洗浄剤組成物
JP6235843B2 (ja) 2012-09-20 2017-11-22 花王株式会社 皮膚又は毛髪用洗浄剤組成物
US9573144B2 (en) * 2014-05-30 2017-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Coating apparatus and method of forming coating film
KR101593019B1 (ko) 2015-11-05 2016-02-11 고진우 불빛이 나오는 인테리어 장식판
US10203606B1 (en) * 2017-11-22 2019-02-12 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for dispensing developer onto semiconductor substrate
CN112965347B (zh) * 2020-11-12 2023-11-03 重庆康佳光电科技有限公司 晶圆显影装置、方法和晶圆
US11747729B2 (en) * 2021-03-19 2023-09-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor developer tool and methods of operation
CN113772246A (zh) * 2021-09-10 2021-12-10 贵州聚材科技有限公司 可以同时多点涂布储光与反光涂层的装置及其使用方法

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Also Published As

Publication number Publication date
KR20010089163A (ko) 2001-09-29
ATE487164T1 (de) 2010-11-15
US7255975B2 (en) 2007-08-14
JP3708437B2 (ja) 2005-10-19
WO2000016163A2 (en) 2000-03-23
EP1114355A2 (de) 2001-07-11
US7208262B2 (en) 2007-04-24
AU5802399A (en) 2000-04-03
WO2000016163A3 (en) 2000-09-08
US20070089671A1 (en) 2007-04-26
TWI249657B (en) 2006-02-21
US20040062876A1 (en) 2004-04-01
US7625692B2 (en) 2009-12-01
EP1114355B8 (de) 2011-01-19
US6248171B1 (en) 2001-06-19
JP2002525653A (ja) 2002-08-13
EP1114355B1 (de) 2010-11-03
US20050095368A1 (en) 2005-05-05
US20020187442A1 (en) 2002-12-12
US6669779B2 (en) 2003-12-30
KR100560180B1 (ko) 2006-03-13
US20070059651A1 (en) 2007-03-15

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