DE69940916D1 - Fotohärtbare flüssige Harzzusammensetzung - Google Patents

Fotohärtbare flüssige Harzzusammensetzung

Info

Publication number
DE69940916D1
DE69940916D1 DE69940916T DE69940916T DE69940916D1 DE 69940916 D1 DE69940916 D1 DE 69940916D1 DE 69940916 T DE69940916 T DE 69940916T DE 69940916 T DE69940916 T DE 69940916T DE 69940916 D1 DE69940916 D1 DE 69940916D1
Authority
DE
Germany
Prior art keywords
resin composition
liquid resin
photohardenable liquid
photohardenable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940916T
Other languages
English (en)
Inventor
Tetsuya Yamamura
Akira Takeuchi
Tsuyoshi Watanabe
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05272998A external-priority patent/JP3824286B2/ja
Priority claimed from JP05886298A external-priority patent/JP4017236B2/ja
Priority claimed from JP06209098A external-priority patent/JP4017238B2/ja
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM IP Assets BV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69940916D1 publication Critical patent/DE69940916D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
DE69940916T 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung Expired - Lifetime DE69940916D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP05272998A JP3824286B2 (ja) 1998-02-18 1998-02-18 光硬化性樹脂組成物
JP05886298A JP4017236B2 (ja) 1998-02-24 1998-02-24 光硬化性液状樹脂組成物
JP5886198 1998-02-24
JP06209098A JP4017238B2 (ja) 1998-02-24 1998-02-26 光硬化性液状樹脂組成物

Publications (1)

Publication Number Publication Date
DE69940916D1 true DE69940916D1 (de) 2009-07-09

Family

ID=27462810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940916T Expired - Lifetime DE69940916D1 (de) 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung

Country Status (3)

Country Link
US (2) US6287745B1 (de)
EP (1) EP0938026B1 (de)
DE (1) DE69940916D1 (de)

Families Citing this family (69)

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US6579917B1 (en) * 1999-02-24 2003-06-17 Sanyo Electric Co., Ltd. Surface treatment agent for model
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
CN1203150C (zh) * 1999-08-12 2005-05-25 三井化学株式会社 密封剂用光固化型树脂组合物及密封方法
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AU7466201A (en) * 2000-06-09 2001-12-17 Dsm N.V. Resin composition and three-dimensional object
JP2002040632A (ja) * 2000-07-21 2002-02-06 Showa Denko Kk レジストインキ組成物
US6503689B2 (en) 2000-09-19 2003-01-07 Shipley Company, L.L.C. Antireflective composition
US6849333B2 (en) 2001-05-18 2005-02-01 Corning Incorporated Optical fiber with an improved primary coating composition
US6811937B2 (en) * 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US7048985B2 (en) * 2001-07-23 2006-05-23 Vrac, Llc Three-dimensional spacer fabric resin infusion media and reinforcing composite lamina
US7060156B2 (en) * 2001-07-23 2006-06-13 Vrac, Llc Three-dimensional spacer fabric resin interlaminar infusion media process and vacuum-induced reinforcing composite laminate structures
US6810187B2 (en) 2001-07-27 2004-10-26 Corning Incorporated Optical waveguide thermoplastic elastomer coating
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US6689463B2 (en) 2001-12-18 2004-02-10 Corning Incorporated Secondary coating composition for optical fibers
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US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
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WO2004001507A1 (en) * 2002-06-20 2003-12-31 Dsm Ip Assets B.V. Compositions comprising a benzophenone photoinitiator
US6850681B2 (en) * 2002-08-22 2005-02-01 Addison Clear Wave, Llc Radiation-curable flame retardant optical fiber coatings
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
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US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
EP1612597B1 (de) * 2003-04-08 2008-08-13 Nippon Kayaku Kabushiki Kaisha Flüssigkristalldichtmittel und flüssigkristalline anzeigezelle damit
JP4161850B2 (ja) * 2003-05-13 2008-10-08 コニカミノルタエムジー株式会社 感光性組成物、感光性平版印刷版、及びその画像形成方法
JP2005015627A (ja) * 2003-06-26 2005-01-20 Jsr Corp 光硬化性液状樹脂組成物
JP2005056998A (ja) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd 固体撮像装置およびその製造方法
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JP2005153273A (ja) * 2003-11-25 2005-06-16 Nitto Denko Corp 樹脂シート、液晶セル基板、液晶表示装置、エレクトロルミネッセンス表示装置用基板、エレクトロルミネッセンス表示装置および太陽電池用基板
US7560519B2 (en) * 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
EP1720072B1 (de) 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen und Verfahren für Immersionslithografie
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
US7541391B2 (en) * 2005-09-02 2009-06-02 General Electric Company Self-forming polymer waveguide and waveguide material with reduced shrinkage
US20100152314A1 (en) * 2005-09-29 2010-06-17 Cmet Inc. Resin composition for stereolithography
EP1801142B1 (de) * 2005-12-16 2016-02-24 Canon Kabushiki Kaisha Harzzusammensetzung, gehärtetes Harzprodukt und Flüssigkeitsausstosskopf
WO2007124911A1 (en) * 2006-05-01 2007-11-08 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
US9423638B2 (en) 2006-07-14 2016-08-23 Dexerials Corporation Resin composition and display unit
KR101310696B1 (ko) * 2006-09-29 2013-09-25 디아이씨 가부시끼가이샤 다분기 폴리에테르폴리올 함유의 양이온 중합성 수지조성물, 그것을 포함하는 접착제, 및 그것을 사용한 적층체및 편광판
JP2008191644A (ja) 2006-10-30 2008-08-21 Rohm & Haas Electronic Materials Llc 液浸リソグラフィーのための組成物および方法
KR101433413B1 (ko) 2007-03-20 2014-08-26 디에스엠 아이피 어셋츠 비.브이. 입체리소그래피 수지 조성물 및 이로부터 제조된 3차원 물체
CN101675461B (zh) 2007-04-09 2013-11-13 迪睿合电子材料有限公司 图像显示装置
JP5470735B2 (ja) 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
JP4973876B2 (ja) * 2007-08-22 2012-07-11 信越化学工業株式会社 パターン形成方法及びこれに用いるパターン表面コート材
JP2009199058A (ja) 2007-11-05 2009-09-03 Rohm & Haas Electronic Materials Llc 液浸リソグラフィーのための組成物および方法
JP2009244421A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 平版印刷版の製版方法
US20120028041A1 (en) * 2009-02-16 2012-02-02 Soken Chemical & Engineering Co., Ltd. Radiation-Curable Adhesive Composition for Optical Component and Adhesive Optical Component
KR101714798B1 (ko) * 2009-03-13 2017-03-09 디에스엠 아이피 어셋츠 비.브이. 방사선-경화성 수지 조성물 및 이를 이용한 쾌속 3차원 이미지화 방법
JP5430345B2 (ja) * 2009-10-26 2014-02-26 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
KR20130106507A (ko) * 2012-03-20 2013-09-30 삼성디스플레이 주식회사 실링 조성물 및 이를 이용한 표시 패널의 제조방법
BR112015008189A2 (pt) * 2012-10-19 2017-07-04 Dow Global Technologies Llc composição, processo para sua preparação e compósito
EP2920255B1 (de) 2012-11-19 2019-03-13 Hewlett-Packard Development Company, L.P. Zusammensetzungen für dreidimensionales (3d) drucken
CN104610511B (zh) 2013-11-05 2018-11-16 帝斯曼知识产权资产管理有限公司 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物
JP2015225205A (ja) * 2014-05-28 2015-12-14 京セラドキュメントソリューションズ株式会社 光偏向器及び該光偏向器を備えた画像形成装置
US10683381B2 (en) 2014-12-23 2020-06-16 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
WO2016132671A1 (ja) * 2015-02-16 2016-08-25 パナソニックＩｐマネジメント株式会社 封止用アクリル樹脂組成物とその硬化物、製造方法、その樹脂組成物を用いた半導体装置とその製造方法
EP3390006B1 (de) 2015-12-17 2021-01-27 Bridgestone Americas Tire Operations, LLC Kartuschen zur generativen fertigung und verfahren zur herstellung gehärteter polymerprodukte durch generative fertigung
CN108778688B (zh) * 2016-03-14 2022-05-13 科思创(荷兰)有限公司 具有改善韧性耐高温性的加成法制造用可辐射固化组合物
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Also Published As

Publication number Publication date
US20020048717A1 (en) 2002-04-25
US6727035B2 (en) 2004-04-27
EP0938026A1 (de) 1999-08-25
US6287745B1 (en) 2001-09-11
EP0938026B1 (de) 2009-05-27

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