DE69940916D1 - Fotohärtbare flüssige Harzzusammensetzung - Google Patents

Fotohärtbare flüssige Harzzusammensetzung

Info

Publication number
DE69940916D1
DE69940916D1 DE69940916T DE69940916T DE69940916D1 DE 69940916 D1 DE69940916 D1 DE 69940916D1 DE 69940916 T DE69940916 T DE 69940916T DE 69940916 T DE69940916 T DE 69940916T DE 69940916 D1 DE69940916 D1 DE 69940916D1
Authority
DE
Germany
Prior art keywords
resin composition
liquid resin
photohardenable liquid
photohardenable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940916T
Other languages
English (en)
Inventor
Tetsuya Yamamura
Akira Takeuchi
Tsuyoshi Watanabe
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05272998A external-priority patent/JP3824286B2/ja
Priority claimed from JP05886298A external-priority patent/JP4017236B2/ja
Priority claimed from JP06209098A external-priority patent/JP4017238B2/ja
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM IP Assets BV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69940916D1 publication Critical patent/DE69940916D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
DE69940916T 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung Expired - Lifetime DE69940916D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP05272998A JP3824286B2 (ja) 1998-02-18 1998-02-18 光硬化性樹脂組成物
JP5886198 1998-02-24
JP05886298A JP4017236B2 (ja) 1998-02-24 1998-02-24 光硬化性液状樹脂組成物
JP06209098A JP4017238B2 (ja) 1998-02-24 1998-02-26 光硬化性液状樹脂組成物

Publications (1)

Publication Number Publication Date
DE69940916D1 true DE69940916D1 (de) 2009-07-09

Family

ID=27462810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940916T Expired - Lifetime DE69940916D1 (de) 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung

Country Status (3)

Country Link
US (2) US6287745B1 (de)
EP (1) EP0938026B1 (de)
DE (1) DE69940916D1 (de)

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US6579917B1 (en) * 1999-02-24 2003-06-17 Sanyo Electric Co., Ltd. Surface treatment agent for model
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
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US6849333B2 (en) 2001-05-18 2005-02-01 Corning Incorporated Optical fiber with an improved primary coating composition
US6811937B2 (en) * 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US7060156B2 (en) * 2001-07-23 2006-06-13 Vrac, Llc Three-dimensional spacer fabric resin interlaminar infusion media process and vacuum-induced reinforcing composite laminate structures
US7048985B2 (en) * 2001-07-23 2006-05-23 Vrac, Llc Three-dimensional spacer fabric resin infusion media and reinforcing composite lamina
US6810187B2 (en) 2001-07-27 2004-10-26 Corning Incorporated Optical waveguide thermoplastic elastomer coating
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US6689463B2 (en) 2001-12-18 2004-02-10 Corning Incorporated Secondary coating composition for optical fibers
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US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
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US6850681B2 (en) * 2002-08-22 2005-02-01 Addison Clear Wave, Llc Radiation-curable flame retardant optical fiber coatings
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20060004140A1 (en) * 2002-11-06 2006-01-05 Toyohumi Asano Sealing material for liquid crystal and liquid crystal display cell using same
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
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JP4161850B2 (ja) * 2003-05-13 2008-10-08 コニカミノルタエムジー株式会社 感光性組成物、感光性平版印刷版、及びその画像形成方法
JP2005015627A (ja) * 2003-06-26 2005-01-20 Jsr Corp 光硬化性液状樹脂組成物
JP2005056998A (ja) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd 固体撮像装置およびその製造方法
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JP2007515785A (ja) * 2003-11-21 2007-06-14 ロード・コーポレーション 二段階のウェーハ塗布アンダフィル
JP2005153273A (ja) * 2003-11-25 2005-06-16 Nitto Denko Corp 樹脂シート、液晶セル基板、液晶表示装置、エレクトロルミネッセンス表示装置用基板、エレクトロルミネッセンス表示装置および太陽電池用基板
US7560519B2 (en) * 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
EP1720072B1 (de) * 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen und Verfahren für Immersionslithografie
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
US7541391B2 (en) * 2005-09-02 2009-06-02 General Electric Company Self-forming polymer waveguide and waveguide material with reduced shrinkage
CN101277991B (zh) * 2005-09-29 2011-11-09 Cmet公司 用于立体平版印刷术的树脂组合物
EP1801142B1 (de) * 2005-12-16 2016-02-24 Canon Kabushiki Kaisha Harzzusammensetzung, gehärtetes Harzprodukt und Flüssigkeitsausstosskopf
EP2019975B1 (de) * 2006-05-01 2017-08-16 DSM IP Assets B.V. MIT STRAHLUNG AUSHÄRTBARE HARZZUSAMMENSETZUNG UND DIESE VERWENDENDER SCHNELLER DREIDIMENSIONALER ABBILDUNGSPROZEß
KR101379126B1 (ko) 2006-07-14 2014-03-28 데쿠세리아루즈 가부시키가이샤 수지 조성물 및 표시 장치
EP2067810B1 (de) * 2006-09-29 2013-10-09 DIC Corporation Kationenpolymerisierbare harzzusammensetzung mit einem mehrfach verzweigten polyether-polyol, haftmittel mit der zusammensetzung sowie beschichtung und polarisierungsplatte mit dem haftmittel
KR101186689B1 (ko) 2006-10-30 2012-09-27 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 침지 리소그래피 처리용 조성물 및 방법
CN101809500A (zh) 2007-03-20 2010-08-18 帝斯曼知识产权资产管理有限公司 立体光刻树脂组合物以及由其制成的三维物品
KR20140140620A (ko) 2007-04-09 2014-12-09 데쿠세리아루즈 가부시키가이샤 화상 표시 장치
JP5470735B2 (ja) 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
JP4973876B2 (ja) * 2007-08-22 2012-07-11 信越化学工業株式会社 パターン形成方法及びこれに用いるパターン表面コート材
TWI554841B (zh) 2007-11-05 2016-10-21 羅門哈斯電子材料有限公司 浸潤式微影組成物及製程
JP2009244421A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 平版印刷版の製版方法
WO2010092995A1 (ja) * 2009-02-16 2010-08-19 綜研化学株式会社 光学部材用放射線硬化型粘着剤組成物および粘着型光学部材
CN102272227B (zh) 2009-03-13 2014-03-12 帝斯曼知识产权资产管理有限公司 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法
JP5430345B2 (ja) 2009-10-26 2014-02-26 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
KR20130106507A (ko) * 2012-03-20 2013-09-30 삼성디스플레이 주식회사 실링 조성물 및 이를 이용한 표시 패널의 제조방법
WO2014062903A1 (en) * 2012-10-19 2014-04-24 Dow Global Technologies Llc Polymer particle dispersions with polyols
WO2014077848A1 (en) * 2012-11-19 2014-05-22 Hewlett-Packard Development Company, L.P. Compositions for three-dimensional (3d) printing
CN109503761B (zh) 2013-11-05 2022-02-01 科思创(荷兰)有限公司 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物
JP2015225205A (ja) * 2014-05-28 2015-12-14 京セラドキュメントソリューションズ株式会社 光偏向器及び該光偏向器を備えた画像形成装置
US10683381B2 (en) 2014-12-23 2020-06-16 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
US10797013B2 (en) * 2015-02-16 2020-10-06 Panasonic Intellectual Property Management Co., Ltd. Acrylic resin composition for sealing, cured product of same, method for producing same, semiconductor device using said resin composition, and method for manufacturing said semiconductor device
EP3390006B1 (de) 2015-12-17 2021-01-27 Bridgestone Americas Tire Operations, LLC Kartuschen zur generativen fertigung und verfahren zur herstellung gehärteter polymerprodukte durch generative fertigung
JP6798071B2 (ja) * 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
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Also Published As

Publication number Publication date
EP0938026A1 (de) 1999-08-25
US20020048717A1 (en) 2002-04-25
US6727035B2 (en) 2004-04-27
EP0938026B1 (de) 2009-05-27
US6287745B1 (en) 2001-09-11

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