DE69940693D1 - Pulssteuerung in lasersystemen - Google Patents

Pulssteuerung in lasersystemen

Info

Publication number
DE69940693D1
DE69940693D1 DE69940693T DE69940693T DE69940693D1 DE 69940693 D1 DE69940693 D1 DE 69940693D1 DE 69940693 T DE69940693 T DE 69940693T DE 69940693 T DE69940693 T DE 69940693T DE 69940693 D1 DE69940693 D1 DE 69940693D1
Authority
DE
Germany
Prior art keywords
pulse control
laser systems
laser
systems
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940693T
Other languages
English (en)
Inventor
Donald V Smart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Scanning Inc
Original Assignee
General Scanning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Scanning Inc filed Critical General Scanning Inc
Application granted granted Critical
Publication of DE69940693D1 publication Critical patent/DE69940693D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/242Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G5/00Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/01Details
    • H01G5/019Means for correcting the capacitance characteristics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057Temporal shaping, e.g. pulse compression, frequency chirping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123Q-switching
    • H01S3/117Q-switching using intracavity acousto-optic devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08059Constructional details of the reflector, e.g. shape
    • H01S3/08068Holes; Stepped surface; Special cross-section
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10038Amplitude control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10038Amplitude control
    • H01S3/10046Pulse repetition rate control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1068Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using an acousto-optical device
DE69940693T 1998-06-12 1999-06-02 Pulssteuerung in lasersystemen Expired - Lifetime DE69940693D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/096,600 US6339604B1 (en) 1998-06-12 1998-06-12 Pulse control in laser systems
PCT/US1999/012148 WO1999065123A1 (en) 1998-06-12 1999-06-02 Pulse control in laser systems

Publications (1)

Publication Number Publication Date
DE69940693D1 true DE69940693D1 (de) 2009-05-20

Family

ID=22258140

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940693T Expired - Lifetime DE69940693D1 (de) 1998-06-12 1999-06-02 Pulssteuerung in lasersystemen

Country Status (10)

Country Link
US (4) US6339604B1 (de)
EP (1) EP1097492B1 (de)
JP (1) JP3825631B2 (de)
KR (1) KR100433374B1 (de)
CN (1) CN100399654C (de)
AU (1) AU4325899A (de)
CA (1) CA2334764A1 (de)
DE (1) DE69940693D1 (de)
TW (1) TW463432B (de)
WO (1) WO1999065123A1 (de)

Families Citing this family (86)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5998759A (en) * 1996-12-24 1999-12-07 General Scanning, Inc. Laser processing
US6339604B1 (en) * 1998-06-12 2002-01-15 General Scanning, Inc. Pulse control in laser systems
US6144118A (en) 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
US6300590B1 (en) * 1998-12-16 2001-10-09 General Scanning, Inc. Laser processing
US7723642B2 (en) 1999-12-28 2010-05-25 Gsi Group Corporation Laser-based system for memory link processing with picosecond lasers
US7838794B2 (en) * 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US7671295B2 (en) 2000-01-10 2010-03-02 Electro Scientific Industries, Inc. Processing a memory link with a set of at least two laser pulses
US20060141681A1 (en) * 2000-01-10 2006-06-29 Yunlong Sun Processing a memory link with a set of at least two laser pulses
US20030222324A1 (en) * 2000-01-10 2003-12-04 Yunlong Sun Laser systems for passivation or link processing with a set of laser pulses
US20030024913A1 (en) * 2002-04-15 2003-02-06 Downes Joseph P. Laser scanning method and system for marking articles such as printed circuit boards, integrated circuits and the like
JP2001352120A (ja) * 2000-06-06 2001-12-21 Matsushita Electric Ind Co Ltd レーザ装置とその制御方法およびそれを用いたレーザ加工方法とレーザ加工機
JP2002040627A (ja) * 2000-07-24 2002-02-06 Nec Corp レーザパターン修正方法並びに修正装置
JP2002103066A (ja) * 2000-09-25 2002-04-09 Nec Corp レーザ加工装置
US20070173075A1 (en) * 2001-03-29 2007-07-26 Joohan Lee Laser-based method and system for processing a multi-material device having conductive link structures
US6777645B2 (en) * 2001-03-29 2004-08-17 Gsi Lumonics Corporation High-speed, precision, laser-based method and system for processing material of one or more targets within a field
DE10140254A1 (de) * 2001-08-09 2003-03-06 Trumpf Laser Gmbh & Co Kg Laserverstärkersystem
JP3838064B2 (ja) * 2001-09-28 2006-10-25 松下電器産業株式会社 レーザ制御方法
US6875950B2 (en) * 2002-03-22 2005-04-05 Gsi Lumonics Corporation Automated laser trimming of resistors
US6951995B2 (en) 2002-03-27 2005-10-04 Gsi Lumonics Corp. Method and system for high-speed, precise micromachining an array of devices
US7563695B2 (en) * 2002-03-27 2009-07-21 Gsi Group Corporation Method and system for high-speed precise laser trimming and scan lens for use therein
US7015418B2 (en) * 2002-05-17 2006-03-21 Gsi Group Corporation Method and system for calibrating a laser processing system and laser marking system utilizing same
DE60317868T2 (de) * 2002-10-28 2008-12-04 Fujifilm Corp. Lasermarkierungsverfahren
ES2384871T3 (es) * 2003-02-14 2012-07-13 Universität Heidelberg Procedimiento de generación de al menos un impulso y/o secuencia de impulsos con parámetros controlables
US6930274B2 (en) * 2003-03-26 2005-08-16 Siemens Vdo Automotive Corporation Apparatus and method of maintaining a generally constant focusing spot size at different average laser power densities
US6947454B2 (en) * 2003-06-30 2005-09-20 Electro Scientific Industries, Inc. Laser pulse picking employing controlled AOM loading
US7616669B2 (en) * 2003-06-30 2009-11-10 Electro Scientific Industries, Inc. High energy pulse suppression method
JP4391524B2 (ja) * 2003-08-19 2009-12-24 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド 特別形態のパワープロファイルでレーザパルスを用いるリンク処理の方法及びレーザシステム。
US7505196B2 (en) * 2004-03-31 2009-03-17 Imra America, Inc. Method and apparatus for controlling and protecting pulsed high power fiber amplifier systems
US7020582B1 (en) 2004-04-28 2006-03-28 Altera Corporation Methods and apparatus for laser marking of integrated circuit faults
US7103077B2 (en) * 2004-04-29 2006-09-05 20/10 Perfect Vision Optische Geraete Gmbh System and method for measuring and controlling an energy of an ultra-short pulse of a laser beam
US7139294B2 (en) * 2004-05-14 2006-11-21 Electro Scientific Industries, Inc. Multi-output harmonic laser and methods employing same
US7133187B2 (en) * 2004-06-07 2006-11-07 Electro Scientific Industries, Inc. AOM modulation techniques employing plurality of transducers to improve laser system performance
JP4791457B2 (ja) * 2004-06-07 2011-10-12 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド レーザシステム性能を改善するためのaom変調技術
US7120174B2 (en) * 2004-06-14 2006-10-10 Jds Uniphase Corporation Pulsed laser apparatus and method
US20060000814A1 (en) * 2004-06-30 2006-01-05 Bo Gu Laser-based method and system for processing targeted surface material and article produced thereby
US7227098B2 (en) * 2004-08-06 2007-06-05 Electro Scientific Industries, Inc. Method and system for decreasing the effective pulse repetition frequency of a laser
US7372878B2 (en) * 2004-08-06 2008-05-13 Electro Scientific Industries, Inc. Method and system for preventing excessive energy build-up in a laser cavity
CA2531353C (en) * 2004-12-21 2014-06-17 Institut National D'optique Pulsed laser light source
US20060151704A1 (en) * 2004-12-30 2006-07-13 Cordingley James J Laser-based material processing methods, system and subsystem for use therein for precision energy control
US20060191884A1 (en) * 2005-01-21 2006-08-31 Johnson Shepard D High-speed, precise, laser-based material processing method and system
JP5183013B2 (ja) * 2005-01-27 2013-04-17 住友電工デバイス・イノベーション株式会社 レーザモジュールおよび外部共振型レーザの波長制御方法
JP4874561B2 (ja) * 2005-03-24 2012-02-15 芝浦メカトロニクス株式会社 Qスイッチレーザ装置
FR2883782B1 (fr) * 2005-04-01 2008-10-10 Valeo Electronique Sys Liaison Procede et dispositif de controle de la puissance transmise par un faisceau laser en un point de reference, dispositif et procede de brasage
FR2885265B1 (fr) * 2005-04-28 2009-10-09 Femlight Sa Dispositif laser declenche a fibre photonique
US20060289411A1 (en) * 2005-06-24 2006-12-28 New Wave Research Laser system with multiple operating modes and work station using same
US20070215575A1 (en) * 2006-03-15 2007-09-20 Bo Gu Method and system for high-speed, precise, laser-based modification of one or more electrical elements
EP2032301B1 (de) * 2006-06-16 2012-07-11 Valeo Etudes Electroniques Verfahren und vorrichtung zur steuerung der von einem laserstrahl übertragenen energie in einem bezugspunkt, hartlötverfahren und -vorrichtung
US8084706B2 (en) * 2006-07-20 2011-12-27 Gsi Group Corporation System and method for laser processing at non-constant velocities
US7643521B2 (en) * 2006-07-27 2010-01-05 Technolas Perfect Vision Gmbh Material processing system with variable repetition rate laser
US7732731B2 (en) * 2006-09-15 2010-06-08 Gsi Group Corporation Method and system for laser processing targets of different types on a workpiece
JP2010515577A (ja) * 2007-01-05 2010-05-13 ジーエスアイ・グループ・コーポレーション マルチパルス・レーザー加工のためのシステム及び方法
US7817685B2 (en) * 2007-01-26 2010-10-19 Electro Scientific Industries, Inc. Methods and systems for generating pulse trains for material processing
US9029731B2 (en) * 2007-01-26 2015-05-12 Electro Scientific Industries, Inc. Methods and systems for laser processing continuously moving sheet material
JP2008207210A (ja) 2007-02-26 2008-09-11 Disco Abrasive Syst Ltd レーザー光線照射装置およびレーザー加工機
US8278595B2 (en) * 2007-03-16 2012-10-02 Electro Scientific Industries, Inc. Use of predictive pulse triggering to improve accuracy in link processing
WO2009039184A2 (en) * 2007-09-19 2009-03-26 Gsi Group Corporation Link processing with high speed beam deflection
JP5192213B2 (ja) * 2007-11-02 2013-05-08 株式会社ディスコ レーザー加工装置
JP5024118B2 (ja) * 2008-02-29 2012-09-12 住友電気工業株式会社 レーザ発振方法、レーザ、レーザ加工方法、及びレーザ測定方法
CN101990729B (zh) 2008-03-31 2013-02-27 伊雷克托科学工业股份有限公司 结合多重激光束以形成高重复率、高平均功率的极化激光束
WO2011082065A2 (en) * 2009-12-30 2011-07-07 Gsi Group Corporation Link processing with high speed beam deflection
US8351477B2 (en) 2010-07-22 2013-01-08 Coherent Gmbh Modulation method for diode-laser pumped lasers
CN102371431B (zh) * 2010-08-13 2015-06-10 豪晶科技股份有限公司 激光加工制程装置
US8604380B2 (en) * 2010-08-19 2013-12-10 Electro Scientific Industries, Inc. Method and apparatus for optimally laser marking articles
CN104159697B (zh) 2011-07-05 2017-02-15 伊雷克托科学工业股份有限公司 在使用过程中为声光射束偏转器和声光调制器提供温度稳定性的系统和方法
TWI558578B (zh) * 2011-09-28 2016-11-21 伊雷克托科學工業股份有限公司 用於最佳化地雷射標記物品之方法和設備
US8767291B2 (en) * 2012-03-16 2014-07-01 Kla-Tencor Corporation Suppression of parasitic optical feedback in pulse laser systems
KR101442164B1 (ko) * 2013-04-15 2014-11-17 (주)엔에스 재단장치 및 이를 이용한 재단방법
US8995052B1 (en) * 2013-09-09 2015-03-31 Coherent Kaiserslautern GmbH Multi-stage MOPA with first-pulse suppression
CN103592783B (zh) * 2013-11-25 2016-04-20 核工业理化工程研究院 光致漂移实验研究中基于电光光开关的激光时域调制器
CN104332809B (zh) * 2014-08-25 2015-08-26 深圳市创鑫激光股份有限公司 基于声光开关的脉宽可调脉冲光纤激光器
JP2016070900A (ja) * 2014-10-02 2016-05-09 セイコーエプソン株式会社 磁気計測装置の製造方法、ガスセルの製造方法、磁気計測装置、およびガスセル
JP6588707B2 (ja) * 2015-02-06 2019-10-09 スペクトロニクス株式会社 レーザ光源装置及びレーザパルス光生成方法
WO2017042357A1 (en) * 2015-09-09 2017-03-16 Sei S.P.A. Laser machining apparatus and method for forming a pattern comprising a plurality of marks on a workpiece
CN107546563B (zh) * 2016-06-28 2020-04-21 广州禾信仪器股份有限公司 激光能量自动控制方法及装置
CN109891689B (zh) * 2016-12-05 2021-05-11 极光先进雷射株式会社 激光装置
JP6961583B2 (ja) * 2016-12-09 2021-11-05 古河電気工業株式会社 パルスレーザ装置、加工装置及びパルスレーザ装置の制御方法
KR102609262B1 (ko) * 2018-05-14 2023-12-04 시반 어드밴스드 테크놀러지스 엘티디. 레이저 빔 방법 및 시스템
DE102019205285A1 (de) * 2019-04-12 2020-10-15 Trumpf Laser Gmbh Verfahren und Vorrichtung zum Erzeugen von Laserpulsen
US20230044929A1 (en) 2021-03-26 2023-02-09 Aeye, Inc. Multi-Lens Lidar Receiver with Multiple Readout Channels
US11442152B1 (en) 2021-03-26 2022-09-13 Aeye, Inc. Hyper temporal lidar with dynamic laser control using a laser energy model
US11630188B1 (en) 2021-03-26 2023-04-18 Aeye, Inc. Hyper temporal lidar with dynamic laser control using safety models
US11486977B2 (en) 2021-03-26 2022-11-01 Aeye, Inc. Hyper temporal lidar with pulse burst scheduling
US20220308220A1 (en) 2021-03-26 2022-09-29 Aeye, Inc. Hyper Temporal Lidar with Controllable Detection Intervals Based on Location Information
US11635495B1 (en) 2021-03-26 2023-04-25 Aeye, Inc. Hyper temporal lidar with controllable tilt amplitude for a variable amplitude scan mirror
KR20220149828A (ko) 2021-04-30 2022-11-09 삼성전자주식회사 반도체 소자
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5396A (en) * 1847-12-11 Dbagoon-saddletbee
US520579A (en) * 1894-05-29 Adjustable surgical chair
US412330A (en) * 1889-10-08 gibson
US3747019A (en) 1970-07-16 1973-07-17 Union Carbide Corp Method and means for stabilizing the amplitude and repetition frequency of a repetitively q-switched laser
US3703687A (en) * 1971-02-12 1972-11-21 Bell Telephone Labor Inc Intracavity modulator
US4337442A (en) 1980-03-28 1982-06-29 Electro Scientific Industries, Inc. First laser pulse amplitude modulation
US4341446A (en) 1980-10-27 1982-07-27 Realist, Inc. Microfiche reading carrel
US4461005A (en) * 1980-10-27 1984-07-17 Ward Ernest M High peak power, high PRF laser system
US4412330A (en) 1981-04-16 1983-10-25 Electro Scientific Industries, Inc. Q-Switched laser with stable output and method of making the same
US4483005A (en) * 1981-09-24 1984-11-13 Teradyne, Inc. Affecting laser beam pulse width
US4423005A (en) * 1981-09-25 1983-12-27 Baxter Travenol Laboratories, Inc. Determining quantitative degree of ethylene oxide exposure in sterilization processes
DE3404396A1 (de) * 1984-02-08 1985-08-14 Dornier Gmbh, 7990 Friedrichshafen Vorrichtung und verfahren zur aufnahme von entfernungsbildern
US4601037A (en) 1984-06-13 1986-07-15 Britt Corporation Pulsed laser system
US4590598A (en) 1984-06-13 1986-05-20 Britt Corporation Pulsed laser system
US4604513A (en) 1985-05-07 1986-08-05 Lim Basilio Y Combination of a laser and a controller for trimming a metallized dielectric film capacitor
US4675872A (en) 1985-09-30 1987-06-23 Harris Corporation Driver unit for a laser Q-switch
JPS6286851A (ja) 1985-10-14 1987-04-21 Nec Corp レ−ザ−トリミング装置
US4730105A (en) 1986-07-25 1988-03-08 American Telephone And Telegraph Company, At&T Bell Laboratories Apparatus for the stabilization of the output intensity of a laser using a Fabry-Perot cavity
US5168400A (en) 1986-09-29 1992-12-01 United States Department Of Energy Laser pulse stacking method
DE3704338C2 (de) 1987-02-12 1995-04-06 Gsf Forschungszentrum Umwelt Einrichtung zur Erzeugung verschiedener Laserwellenlängen aus demselben Lasermedium
US4901323A (en) 1987-05-01 1990-02-13 Universities Research Association, Inc. Laser pulse stretcher method and apparatus
US5121245A (en) * 1989-04-06 1992-06-09 Electro Scientific Industries, Inc. Laser system incorporating an acousto-optic device having reduced susceptibility to stress-induced birefringence
US4972210A (en) * 1989-06-28 1990-11-20 Eastman Kodak Company Driver for a diode laser
IL91240A (en) 1989-08-07 1994-07-31 Quick Tech Ltd Pulsed laser apparatus and systems and techniques for its operation
WO1991011538A2 (en) 1990-01-11 1991-08-08 Battelle Memorial Institute Improving material properties
US5157676A (en) 1990-06-19 1992-10-20 The United States Of America As Represented By The United States Department Of Energy Apparatus and process for active pulse intensity control of laser beam
DE4130802A1 (de) * 1990-09-19 1992-04-23 Tosoh Corp Festkoerper-laseroszillator
US5226051A (en) 1991-06-04 1993-07-06 Lightwave Electronics Laser pump control for output power stabilization
US5243615A (en) * 1991-11-20 1993-09-07 Laserscope High-powered intracavity non-linear optic laser
US5197074A (en) * 1991-12-26 1993-03-23 Electro Scientific Industries, Inc. Multi-function intra-resonator loss modulator and method of operating same
US5365532A (en) 1992-10-09 1994-11-15 Hughes Aircraft Company Cavity dump laser amplitude stabilization
US5291505A (en) * 1993-01-21 1994-03-01 Hughes Aircraft Company Active energy control for diode pumped laser systems using pulsewidth modulation
US5448417A (en) 1993-03-16 1995-09-05 Adams; Jeff C. Laser pulse synthesizer
US5339323A (en) 1993-04-30 1994-08-16 Lumonics Corporation Laser system for controlling emitted pulse energy
US5408480A (en) 1993-07-15 1995-04-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Laser with optically driven Q-switch
US5466484A (en) 1993-09-29 1995-11-14 Motorola, Inc. Resistor structure and method of setting a resistance value
US5453594A (en) 1993-10-06 1995-09-26 Electro Scientific Industries, Inc. Radiation beam position and emission coordination system
JP2500648B2 (ja) 1993-10-29 1996-05-29 日本電気株式会社 ビ―ムスキャン式レ―ザマ―キング装置
JPH0837329A (ja) 1994-07-22 1996-02-06 Toshiba Corp パルスガスレーザ発振方法及びその装置
KR0132269B1 (ko) 1994-08-24 1998-04-11 이대원 노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법
JP2682475B2 (ja) 1994-11-17 1997-11-26 日本電気株式会社 ビームスキャン式レーザマーキング方法および装置
JPH08172236A (ja) 1994-12-15 1996-07-02 Nec Corp Apc回路
US5730811A (en) 1995-12-21 1998-03-24 General Electric Company Cavity dumped laser shock peening process
US5596590A (en) * 1996-01-25 1997-01-21 Cymer Laser Technologies Beam diverting shutter for a laser beam
US5721749A (en) 1996-01-30 1998-02-24 Trw Inc. Laser pulse profile control by modulating relaxation oscillations
KR970063847A (ko) * 1996-02-09 1997-09-12 김광호 펄스 레이저광 발생 장치
US5982790A (en) 1997-01-16 1999-11-09 Lightwave Electronics Corporation System for reducing pulse-to-pulse energy variation in a pulsed laser
DE19705330C1 (de) * 1997-02-12 1998-02-19 Lambda Physik Gmbh Verfahren und Festkörperlasersystem zum Erzeugen von Laserimpulsen mit variabler Impulsfolgefrequenz und konstanten Strahleigenschaften
US5816573A (en) 1997-02-28 1998-10-06 Bolling, Sr.; Harold Lloyd Give and take card game
US5812569A (en) 1997-03-21 1998-09-22 Lumonics, Inc. Stabilization of the output energy of a pulsed solid state laser
US6054673A (en) 1997-09-17 2000-04-25 General Electric Company Method and apparatus for laser drilling
US6172331B1 (en) 1997-09-17 2001-01-09 General Electric Company Method and apparatus for laser drilling
US6021154A (en) 1997-11-21 2000-02-01 General Electric Company Laser shock peening method and reflective laser beam homogenizer
US6009110A (en) 1998-03-11 1999-12-28 Lightwave Electronics Corporation Pulse amplitude control in frequency-converted lasers
US6339604B1 (en) 1998-06-12 2002-01-15 General Scanning, Inc. Pulse control in laser systems
US6172325B1 (en) 1999-02-10 2001-01-09 Electro Scientific Industries, Inc. Laser processing power output stabilization apparatus and method employing processing position feedback
US6418154B1 (en) * 1999-06-07 2002-07-09 Coherent, Inc. Pulsed diode-pumped solid-state laser
KR100773070B1 (ko) 2000-07-12 2007-11-02 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 Ic 퓨즈를 하나의 펄스로 절단하기 위한 uv 레이저시스템 및 방법

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US6973104B2 (en) 2005-12-06
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CN100399654C (zh) 2008-07-02
US6831936B1 (en) 2004-12-14
WO1999065123A9 (en) 2000-03-09
EP1097492A1 (de) 2001-05-09
EP1097492B1 (de) 2009-04-08
CA2334764A1 (en) 1999-12-16
WO1999065123A1 (en) 1999-12-16
KR20010071457A (ko) 2001-07-28
TW463432B (en) 2001-11-11
EP1097492A4 (de) 2005-05-11
US20050271095A1 (en) 2005-12-08
AU4325899A (en) 1999-12-30
US6339604B1 (en) 2002-01-15
JP3825631B2 (ja) 2006-09-27
US20050105568A1 (en) 2005-05-19

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