DE69938966D1 - Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographie - Google Patents
Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographieInfo
- Publication number
- DE69938966D1 DE69938966D1 DE69938966T DE69938966T DE69938966D1 DE 69938966 D1 DE69938966 D1 DE 69938966D1 DE 69938966 T DE69938966 T DE 69938966T DE 69938966 T DE69938966 T DE 69938966T DE 69938966 D1 DE69938966 D1 DE 69938966D1
- Authority
- DE
- Germany
- Prior art keywords
- polyether polyol
- cationic
- radiation
- reactive
- benticous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C9/00—Stereo-photographic or similar processes
- G03C9/08—Producing three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/050,279 US6136497A (en) | 1998-03-30 | 1998-03-30 | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
PCT/EP1999/001844 WO1999050711A1 (en) | 1998-03-30 | 1999-03-19 | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69938966D1 true DE69938966D1 (de) | 2008-08-07 |
Family
ID=21964363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69938966T Expired - Lifetime DE69938966D1 (de) | 1998-03-30 | 1999-03-19 | Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographie |
Country Status (15)
Country | Link |
---|---|
US (3) | US6136497A (de) |
EP (1) | EP1080392B1 (de) |
JP (1) | JP4798845B2 (de) |
KR (1) | KR100653732B1 (de) |
CN (1) | CN1191498C (de) |
AT (1) | ATE399335T1 (de) |
AU (1) | AU3518699A (de) |
BR (1) | BR9909270A (de) |
CA (1) | CA2326128C (de) |
DE (1) | DE69938966D1 (de) |
HK (1) | HK1032635A1 (de) |
IL (1) | IL138301A0 (de) |
TR (1) | TR200002776T2 (de) |
TW (1) | TWI221850B (de) |
WO (1) | WO1999050711A1 (de) |
Families Citing this family (79)
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EP0938026B1 (de) * | 1998-02-18 | 2009-05-27 | DSM IP Assets B.V. | Fotohärtbare flüssige Harzzusammensetzung |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) * | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
JP4350832B2 (ja) * | 1999-04-19 | 2009-10-21 | Jsr株式会社 | 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物 |
ES2345031T3 (es) * | 2000-02-08 | 2010-09-14 | Huntsman Advanced Materials (Switzerland) Gmbh | Composicion liquida curable por radiacion, especialmente para estereolitografia. |
US8481241B2 (en) | 2000-03-13 | 2013-07-09 | Stratasys Ltd. | Compositions and methods for use in three dimensional model printing |
US7300619B2 (en) | 2000-03-13 | 2007-11-27 | Objet Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
US20030207959A1 (en) | 2000-03-13 | 2003-11-06 | Eduardo Napadensky | Compositions and methods for use in three dimensional model printing |
US6569373B2 (en) * | 2000-03-13 | 2003-05-27 | Object Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
US6574523B1 (en) * | 2000-05-05 | 2003-06-03 | 3D Systems, Inc. | Selective control of mechanical properties in stereolithographic build style configuration |
US6485306B1 (en) * | 2001-07-10 | 2002-11-26 | Aiptek International Inc. | Locus-recordable portable handwriting device |
GB0103752D0 (en) * | 2001-02-15 | 2001-04-04 | Vantico Ltd | Three-Dimensional printing |
KR100737723B1 (ko) * | 2001-07-27 | 2007-07-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
US20030149124A1 (en) * | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
JP4366584B2 (ja) * | 2002-02-18 | 2009-11-18 | 関西ペイント株式会社 | 塗料組成物及び塗膜形成方法 |
US7495034B2 (en) * | 2002-02-22 | 2009-02-24 | Henkel Corporation | Deformable soft molding compositions |
US20060178456A1 (en) * | 2002-04-25 | 2006-08-10 | Ashland Inc. | Surface improver for reinforced composite compositions |
US20040054025A1 (en) * | 2002-06-20 | 2004-03-18 | Lawton John A. | Compositions comprising a benzophenone photoinitiator |
US6989225B2 (en) * | 2002-07-18 | 2006-01-24 | 3D Systems, Inc. | Stereolithographic resins with high temperature and high impact resistance |
US6833231B2 (en) * | 2002-07-31 | 2004-12-21 | 3D Systems, Inc. | Toughened stereolithographic resin compositions |
US20040077745A1 (en) * | 2002-10-18 | 2004-04-22 | Jigeng Xu | Curable compositions and rapid prototyping process using the same |
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US20040137368A1 (en) * | 2003-01-13 | 2004-07-15 | 3D Systems, Inc. | Stereolithographic resins containing selected oxetane compounds |
US20040161704A1 (en) * | 2003-02-18 | 2004-08-19 | Jianbing Huang | Method of making a flexographic printing plate by lithographic transfer of an energy-curable composition |
US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
US20040170923A1 (en) * | 2003-02-27 | 2004-09-02 | 3D Systems, Inc. | Colored stereolithographic resins |
US6856283B2 (en) * | 2003-02-28 | 2005-02-15 | Raytheon Company | Method and apparatus for a power system for phased-array radar |
JP4161858B2 (ja) | 2003-06-03 | 2008-10-08 | コニカミノルタエムジー株式会社 | 感光性組成物、感光性平版印刷版、及び平版印刷版の作製方法 |
US7354643B2 (en) | 2003-06-24 | 2008-04-08 | Cmet Inc. | Three-dimensional object and method of producing the same |
US20050040562A1 (en) * | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
WO2005019299A1 (ja) | 2003-08-21 | 2005-03-03 | Asahi Kasei Chemicals Corporation | 感光性組成物およびその硬化物 |
US7120512B2 (en) * | 2003-08-25 | 2006-10-10 | Hewlett-Packard Development Company, L.P. | Method and a system for solid freeform fabricating using non-reactive powder |
US7232850B2 (en) | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
US20050101684A1 (en) * | 2003-11-06 | 2005-05-12 | Xiaorong You | Curable compositions and rapid prototyping process using the same |
WO2005045525A1 (en) * | 2003-11-06 | 2005-05-19 | Dsm Ip Assets B.V. | Curable compositions and rapid prototyping process using the same |
KR101138169B1 (ko) * | 2003-11-06 | 2012-04-25 | 훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하 | 고 투명도 및 개선된 기계적 특성을 갖는 경화물을 제조하기 위한 광경화성 조성물 |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
DE102004012682A1 (de) * | 2004-03-16 | 2005-10-06 | Degussa Ag | Verfahren zur Herstellung von dreidimensionalen Objekten mittels Lasertechnik und Auftragen eines Absorbers per Inkjet-Verfahren |
PL1727663T3 (pl) * | 2004-03-22 | 2012-04-30 | Huntsman Adv Mat Switzerland | Kompozycje fotoutwardzalne |
DE102004020452A1 (de) * | 2004-04-27 | 2005-12-01 | Degussa Ag | Verfahren zur Herstellung von dreidimensionalen Objekten mittels elektromagnetischer Strahlung und Auftragen eines Absorbers per Inkjet-Verfahren |
DE102004034416A1 (de) * | 2004-07-15 | 2006-02-02 | "Stiftung Caesar" (Center Of Advanced European Studies And Research) | Flüssige, strahlunghärtende Zusammensetzungen |
JP4490798B2 (ja) * | 2004-08-30 | 2010-06-30 | Jsr株式会社 | 光ファイバアップジャケット用液状硬化性樹脂組成物 |
EP1637928B1 (de) * | 2004-09-15 | 2012-05-02 | Dongjin Semichem Co., Ltd | Spirocyclische Ketalgruppe-enthaltendes Photoresistmonomer, dessen Polymer und es enthaltende Photoresistzusammensetzung |
US7423073B2 (en) * | 2004-11-23 | 2008-09-09 | Lexmark International, Inc. | Radiation curable compositions having improved flexibility |
US20060172230A1 (en) * | 2005-02-02 | 2006-08-03 | Dsm Ip Assets B.V. | Method and composition for reducing waste in photo-imaging applications |
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TWI432904B (zh) * | 2006-01-25 | 2014-04-01 | Dow Corning | 用於微影技術之環氧樹脂調配物 |
JP4929784B2 (ja) * | 2006-03-27 | 2012-05-09 | 富士通株式会社 | 多層配線基板、半導体装置およびソルダレジスト |
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US20080103226A1 (en) * | 2006-10-31 | 2008-05-01 | Dsm Ip Assets B.V. | Photo-curable resin composition |
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DE102007043559B4 (de) * | 2007-09-13 | 2012-05-31 | Carl Zeiss Vision Gmbh | Verwendung eines lichthärtenden thermoplastischen Epoxidharzklebstoffs zum Blocken oder Kleben von optischen Bauelementen |
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WO2012126695A1 (en) | 2011-03-23 | 2012-09-27 | Huntsman Advanced Materials (Switzerland) Gmbh | Stable curable thiol-ene composition |
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EP2842980B1 (de) | 2013-08-09 | 2021-05-05 | DSM IP Assets B.V. | Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen |
CN105482513B (zh) * | 2014-10-11 | 2017-12-26 | 中国科学院宁波材料技术与工程研究所 | 油墨用玻璃粉和颜料的改性分散方法及耐高温油墨 |
KR20170129181A (ko) * | 2015-03-11 | 2017-11-24 | 스트라타시스 엘티디. | 지지체 재료 조성물 및 이를 이용한 적층 제조 방법 |
CN107428892B (zh) * | 2015-03-23 | 2021-05-04 | 陶氏环球技术有限责任公司 | 用于三维打印的光固化性组合物 |
CN104914675B (zh) * | 2015-04-08 | 2019-04-23 | 乐道战略材料有限公司 | 一种用于三维快速成型的含光敏性硅氧烷和超支化聚醚多元醇的光敏树脂组合物 |
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EP3181357B1 (de) * | 2015-12-15 | 2018-10-10 | Agfa Nv | Additives fertigungsverfahren mit dynamischer lichtprojektion für flexografiedruckvorlage |
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CN109153172B (zh) | 2016-04-08 | 2020-12-25 | 索尔维特殊聚合物美国有限责任公司 | 可光固化的聚合物、可光固化的聚合物组合物和包括其的光刻工艺 |
ES2685280B2 (es) * | 2017-03-31 | 2019-06-21 | Centro Tecnologico De Nanomateriales Avanzados S L | Composición de resina curable por radiación y procedimiento para su obtención |
JP7175286B2 (ja) | 2017-06-05 | 2022-11-18 | ナノシス・インク. | 量子ドット-樹脂濃縮物及びプレミックスの酸安定化 |
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-
1998
- 1998-03-30 US US09/050,279 patent/US6136497A/en not_active Expired - Lifetime
-
1999
- 1999-03-19 CN CNB998048062A patent/CN1191498C/zh not_active Expired - Lifetime
- 1999-03-19 BR BR9909270-0A patent/BR9909270A/pt not_active IP Right Cessation
- 1999-03-19 TR TR2000/02776T patent/TR200002776T2/xx unknown
- 1999-03-19 DE DE69938966T patent/DE69938966D1/de not_active Expired - Lifetime
- 1999-03-19 AU AU35186/99A patent/AU3518699A/en not_active Abandoned
- 1999-03-19 WO PCT/EP1999/001844 patent/WO1999050711A1/en active IP Right Grant
- 1999-03-19 EP EP99916836A patent/EP1080392B1/de not_active Expired - Lifetime
- 1999-03-19 KR KR1020007010875A patent/KR100653732B1/ko not_active IP Right Cessation
- 1999-03-19 AT AT99916836T patent/ATE399335T1/de active
- 1999-03-19 JP JP2000541560A patent/JP4798845B2/ja not_active Expired - Lifetime
- 1999-03-19 IL IL13830199A patent/IL138301A0/xx unknown
- 1999-03-19 CA CA002326128A patent/CA2326128C/en not_active Expired - Lifetime
- 1999-03-29 TW TW088104905A patent/TWI221850B/zh not_active IP Right Cessation
-
2000
- 2000-08-25 US US09/645,944 patent/US6413697B1/en not_active Expired - Lifetime
-
2001
- 2001-05-14 HK HK01103331A patent/HK1032635A1/xx not_active IP Right Cessation
-
2002
- 2002-06-13 US US10/167,436 patent/US20020177073A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU3518699A (en) | 1999-10-18 |
EP1080392B1 (de) | 2008-06-25 |
EP1080392A1 (de) | 2001-03-07 |
KR20010042325A (ko) | 2001-05-25 |
TWI221850B (en) | 2004-10-11 |
WO1999050711A1 (en) | 1999-10-07 |
BR9909270A (pt) | 2000-11-21 |
US20020177073A1 (en) | 2002-11-28 |
CA2326128C (en) | 2008-07-15 |
HK1032635A1 (en) | 2001-07-27 |
TR200002776T2 (tr) | 2001-02-21 |
CN1191498C (zh) | 2005-03-02 |
IL138301A0 (en) | 2001-10-31 |
JP2002509982A (ja) | 2002-04-02 |
JP4798845B2 (ja) | 2011-10-19 |
CA2326128A1 (en) | 1999-10-07 |
US6136497A (en) | 2000-10-24 |
ATE399335T1 (de) | 2008-07-15 |
CN1296577A (zh) | 2001-05-23 |
KR100653732B1 (ko) | 2006-12-05 |
US6413697B1 (en) | 2002-07-02 |
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