DE69934646D1 - System und Verfahren zur dynamischen Zufuhr von gemischtem Gas - Google Patents

System und Verfahren zur dynamischen Zufuhr von gemischtem Gas

Info

Publication number
DE69934646D1
DE69934646D1 DE69934646T DE69934646T DE69934646D1 DE 69934646 D1 DE69934646 D1 DE 69934646D1 DE 69934646 T DE69934646 T DE 69934646T DE 69934646 T DE69934646 T DE 69934646T DE 69934646 D1 DE69934646 D1 DE 69934646D1
Authority
DE
Germany
Prior art keywords
fluid
gaseous mixture
blended gaseous
blended
supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69934646T
Other languages
English (en)
Other versions
DE69934646T2 (de
Inventor
Almeida Botelho Alexandre De
Thomas Anthony Delprato
Robert William Ford
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Publication of DE69934646D1 publication Critical patent/DE69934646D1/de
Application granted granted Critical
Publication of DE69934646T2 publication Critical patent/DE69934646T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/04—Arrangement or mounting of valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/22—Control or regulation
    • B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2211—Amount of delivered fluid during a period
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2111—Flow rate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2113—Pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90—Heating or cooling systems
    • B01F2035/99—Heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/32—Hydrogen storage
DE69934646T 1998-10-16 1999-10-14 System und Verfahren zur dynamischen Zufuhr von gemischtem Gas Expired - Fee Related DE69934646T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US174196 1998-10-16
US09/174,196 US6217659B1 (en) 1998-10-16 1998-10-16 Dynamic blending gas delivery system and method

Publications (2)

Publication Number Publication Date
DE69934646D1 true DE69934646D1 (de) 2007-02-15
DE69934646T2 DE69934646T2 (de) 2007-10-31

Family

ID=22635229

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69934646T Expired - Fee Related DE69934646T2 (de) 1998-10-16 1999-10-14 System und Verfahren zur dynamischen Zufuhr von gemischtem Gas

Country Status (8)

Country Link
US (3) US6217659B1 (de)
EP (1) EP0994502B1 (de)
JP (1) JP3329775B2 (de)
KR (1) KR100360921B1 (de)
AT (1) ATE350140T1 (de)
DE (1) DE69934646T2 (de)
SG (1) SG91836A1 (de)
TW (1) TW538207B (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3472482B2 (ja) * 1998-06-30 2003-12-02 富士通株式会社 半導体装置の製造方法と製造装置
JP3905678B2 (ja) * 2000-02-28 2007-04-18 株式会社堀場製作所 薄膜堆積方法とその装置および薄膜堆積方法に用いるｆｔｉｒガス分析計並びに薄膜堆積方法に用いる混合ガス供給装置
US7001640B2 (en) * 2000-05-31 2006-02-21 Canon Kabushiki Kaisha Apparatus and method for forming deposited film
US7905653B2 (en) * 2001-07-31 2011-03-15 Mega Fluid Systems, Inc. Method and apparatus for blending process materials
US6923568B2 (en) 2000-07-31 2005-08-02 Celerity, Inc. Method and apparatus for blending process materials
KR20040019293A (ko) 2001-05-24 2004-03-05 셀레리티 그룹 아이엔씨 소정 비율의 프로세스 유체를 제공하는 방법 및 장치
JP2002350925A (ja) * 2001-05-30 2002-12-04 Fuji Photo Film Co Ltd カメラの絞り切換え装置
US7334708B2 (en) * 2001-07-16 2008-02-26 L'air Liquide, Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical
US6461436B1 (en) * 2001-10-15 2002-10-08 Micron Technology, Inc. Apparatus and process of improving atomic layer deposition chamber performance
US20090001524A1 (en) * 2001-11-26 2009-01-01 Siegele Stephen H Generation and distribution of a fluorine gas
US6474077B1 (en) 2001-12-12 2002-11-05 Air Products And Chemicals, Inc. Vapor delivery from a low vapor pressure liquefied compressed gas
JP4294910B2 (ja) * 2002-03-27 2009-07-15 株式会社東芝 半導体デバイス製造プラントにおける物質供給システム
DE20205819U1 (de) 2002-04-12 2003-08-21 Kinetics Germany Gmbh Vorrichtung zur Bereitstellung von hochreinen Prozesschemikalien
US20030236489A1 (en) 2002-06-21 2003-12-25 Baxter International, Inc. Method and apparatus for closed-loop flow control system
JP2004039921A (ja) * 2002-07-04 2004-02-05 Watanabe Shoko:Kk 成膜装置
US7344298B2 (en) * 2002-07-19 2008-03-18 Celerity, Inc. Method and apparatus for blending process materials
US7192486B2 (en) * 2002-08-15 2007-03-20 Applied Materials, Inc. Clog-resistant gas delivery system
JP2004091850A (ja) * 2002-08-30 2004-03-25 Tokyo Electron Ltd 処理装置及び処理方法
US6868869B2 (en) * 2003-02-19 2005-03-22 Advanced Technology Materials, Inc. Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
US20050120958A1 (en) * 2003-12-07 2005-06-09 Frank Lin Reactor
KR100591762B1 (ko) * 2004-01-19 2006-06-22 삼성전자주식회사 증착 장치 및 증착 방법
JP2006253696A (ja) * 2005-03-10 2006-09-21 Asm America Inc ガスインジェクタ制御システム
US20060243207A1 (en) * 2005-04-20 2006-11-02 Jursich Gregory M Fluid mixing and delivery system
JP2007051002A (ja) * 2005-08-19 2007-03-01 Kyocera Mita Corp 用紙カセット
CN100422628C (zh) * 2006-07-28 2008-10-01 周玉成 一种标准气体的动态配制系统
KR101238793B1 (ko) * 2007-03-30 2013-03-04 도쿄엘렉트론가부시키가이샤 증착원 유닛, 증착 장치 및 증착원 유닛의 온도 조정 장치
US8067061B2 (en) 2007-10-25 2011-11-29 Asm America, Inc. Reaction apparatus having multiple adjustable exhaust ports
US20100051109A1 (en) * 2008-09-04 2010-03-04 Michael Meier CO2 dialer and manifold apparatus and system
US8486191B2 (en) * 2009-04-07 2013-07-16 Asm America, Inc. Substrate reactor with adjustable injectors for mixing gases within reaction chamber
KR20100119346A (ko) * 2009-04-30 2010-11-09 한국에이에스엠지니텍 주식회사 증착 장치
US8950414B2 (en) * 2009-07-31 2015-02-10 Tokyo Electron Limited Liquid processing apparatus, liquid processing method, and storage medium
US8671971B2 (en) 2010-08-25 2014-03-18 Michael Meier Systems and methods for providing a monitoring and deactivation apparatus for a beverage distribution system
JP5395102B2 (ja) 2011-02-28 2014-01-22 株式会社豊田中央研究所 気相成長装置
FR2976258B1 (fr) * 2011-06-09 2014-09-05 Air Liquide Installation de conditionnement de no a debitmetres massiques
JP5430621B2 (ja) * 2011-08-10 2014-03-05 Ｃｋｄ株式会社 ガス流量検定システム及びガス流量検定ユニット
TWI458843B (zh) * 2011-10-06 2014-11-01 Ind Tech Res Inst 蒸鍍裝置與有機薄膜的形成方法
JP5793103B2 (ja) * 2012-04-13 2015-10-14 岩谷産業株式会社 混合気体の供給方法及び供給装置
DE102014100135A1 (de) * 2014-01-08 2015-07-09 Aixtron Se Gasmischvorrichtung an einem Reaktor mit Wegeventil
JP2016134569A (ja) * 2015-01-21 2016-07-25 株式会社東芝 半導体製造装置
TWI772330B (zh) * 2016-10-14 2022-08-01 荷蘭商蜆殼國際研究所 用於定量分析氣態製程流之方法及設備
US10184496B2 (en) * 2016-12-06 2019-01-22 Airgas, Inc. Automatic pressure and vacuum clearing skid method
CN107058982B (zh) * 2017-01-23 2018-06-19 江苏菲沃泰纳米科技有限公司 一种具有多层结构防液涂层的制备方法
CN109237304A (zh) * 2018-06-04 2019-01-18 国网安徽省电力有限公司电力科学研究院 电气设备混合绝缘气体配制灌充系统
CN113262714A (zh) * 2021-05-19 2021-08-17 核工业理化工程研究院 三氟化溴和载荷气体配料方法及装置

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1298086B (de) * 1965-07-28 1969-06-26 Siemens Ag Verfahren zur Dosierung von SiCl oder SiHCl3 in einem Wasserstoffstrom bei der Silicium-Epitaxie
US3771260A (en) 1970-01-29 1973-11-13 Black Sivalls & Bryson Inc Method of vaporizing and combining a liquefied cryogenic fluid stream with a gas stream
US3751644A (en) 1972-02-22 1973-08-07 Sun Oil Co Automatic blending control system
US3856033A (en) 1973-02-22 1974-12-24 Scott Environmental Tech Dynamic gas blending
US3948281A (en) 1973-02-22 1976-04-06 Scott Environmental Technology, Inc. Gas blending using null balance analyzer
JPS55166163A (en) 1979-06-13 1980-12-25 Citizen Watch Co Ltd Controller for anesthetic gas
US4277254A (en) 1980-02-15 1981-07-07 Energy Systems, Incorporated Control system and apparatus for producing compatible mixtures of fuel gases
US5268327A (en) * 1984-04-27 1993-12-07 Advanced Energy Fund Limited Partnership Epitaxial compositions
JPS61232298A (ja) * 1985-04-04 1986-10-16 Shin Etsu Handotai Co Ltd シリコン単結晶の製造方法
US4963506A (en) * 1989-04-24 1990-10-16 Motorola Inc. Selective deposition of amorphous and polycrystalline silicon
JPH0784662B2 (ja) 1989-12-12 1995-09-13 アプライドマテリアルズジャパン株式会社 化学的気相成長方法とその装置
US5447568A (en) * 1991-12-26 1995-09-05 Canon Kabushiki Kaisha Chemical vapor deposition method and apparatus making use of liquid starting material
JP3156326B2 (ja) * 1992-01-07 2001-04-16 富士通株式会社 半導体成長装置およびそれによる半導体成長方法
US5575854A (en) 1993-12-30 1996-11-19 Tokyo Electron Limited Semiconductor treatment apparatus
US5476115A (en) 1994-03-10 1995-12-19 Praxair Technology, Inc. Automatic gas blending system
JP3122311B2 (ja) 1994-06-29 2001-01-09 東京エレクトロン株式会社 成膜処理室への液体材料供給装置及びその使用方法
US5495875A (en) 1994-12-01 1996-03-05 Scott Specialty Gases, Inc. System for continuous blending of a liquid into a gas
US5761911A (en) * 1996-11-25 1998-06-09 American Air Liquide Inc. System and method for controlled delivery of liquified gases
US5789309A (en) * 1996-12-30 1998-08-04 Memc Electronic Materials, Inc. Method and system for monocrystalline epitaxial deposition
JPH10306377A (ja) * 1997-05-02 1998-11-17 Tokyo Electron Ltd 微量ガス供給方法及びその装置
US6039809A (en) * 1998-01-27 2000-03-21 Mitsubishi Materials Silicon Corporation Method and apparatus for feeding a gas for epitaxial growth
WO1999049101A1 (en) * 1998-03-23 1999-09-30 Mattson Technology, Inc. Apparatus and method for cvd and thermal processing of semiconductor substrates

Also Published As

Publication number Publication date
JP2000223431A (ja) 2000-08-11
KR100360921B1 (ko) 2002-11-22
EP0994502A2 (de) 2000-04-19
KR20000029100A (ko) 2000-05-25
TW538207B (en) 2003-06-21
JP3329775B2 (ja) 2002-09-30
US6217659B1 (en) 2001-04-17
ATE350140T1 (de) 2007-01-15
DE69934646T2 (de) 2007-10-31
EP0994502B1 (de) 2007-01-03
SG91836A1 (en) 2002-10-15
EP0994502A3 (de) 2000-07-26
US20010009138A1 (en) 2001-07-26
US20020054956A1 (en) 2002-05-09
US6514564B2 (en) 2003-02-04

Similar Documents

Publication Publication Date Title
ATE350140T1 (de) System und verfahren zur dynamischen zufuhr von gemischtem gas
KR100265017B1 (ko) 에피택셜 성장용 기체의 공급 방법 및 그의장치
EP1211333A3 (de) Verdampfer für CVD-Anlage
DE60143639D1 (de) Vorrichtung und Verfahren zur Herstellung eines III-V-Nitridfilms
ATE497488T1 (de) Mullitkörper und verfahren zur herstellung von mullitkörpern
ATE472368T1 (de) Verfahren zur herstellung von bis(perfluoralkyl)phosphinsäuren und deren salze
ATE452433T1 (de) Vorrichtung und verfahren zum verdampfen flüssiger medien
MXPA03006984A (es) Secuencia de nucleotidos que median la fertilidad masculina y metodo de uso de la misma.
ATE299473T1 (de) Verfahren zur herstellung von salpetersäure
ATE237703T1 (de) Verfaren und reaktor zur züchtung von silizium- karbid einkristallung durch chemische dampfabscheidung
IL135550A0 (en) Method and apparatus for temperature controlled vapor deposition on a substrate
ATE519859T1 (de) Verfahren zur herstellung von ausgewählten intermolekularen quervernetzungen in nukleinsäuren und ihre verwendungen
SG137681A1 (en) Process for cvd of hf and zr containing oxynitride films
CN105463577B (zh) Iii族氮化物晶体的制造方法及制造装置
DE60322042D1 (de) Verfahren zur ausbildung einer silizium-epitaxialschicht
Weinstock et al. Branch capture reactions: Effect of recipient structure
DK88786D0 (da) Fremgangsmaade til fremstilling af borcarbidovertraek og de fremstillede overtraek
MY148606A (en) "process for obtaining a heating fluid as indirect heat source for carrying out endothermic reactions"
CN102412117A (zh) 薄膜形成方法
AU7636596A (en) Heat exchanger
WO2004055227A3 (de) Verfahren und vorrichtung zum cvd-beschichten von werkstücken
ATE302393T1 (de) Verfahren zur verwertung von abwärme aus der roheisenproduktion in drehherdöfen
RU2155712C1 (ru) Способ термической деаэрации воды
RU2147558C1 (ru) Способ вакуумной деаэрации воды
RU2148020C1 (ru) Способ термической деаэрации воды

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee