DE69921354D1 - Hin- und hergehende linear poliermaschine mit ladbarem halter - Google Patents
Hin- und hergehende linear poliermaschine mit ladbarem halterInfo
- Publication number
- DE69921354D1 DE69921354D1 DE69921354T DE69921354T DE69921354D1 DE 69921354 D1 DE69921354 D1 DE 69921354D1 DE 69921354 T DE69921354 T DE 69921354T DE 69921354 T DE69921354 T DE 69921354T DE 69921354 D1 DE69921354 D1 DE 69921354D1
- Authority
- DE
- Germany
- Prior art keywords
- wafer
- polishing
- loadable
- holder
- pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
- B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
- B24B47/04—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by mechanical gearing only
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/201,928 US6103628A (en) | 1998-12-01 | 1998-12-01 | Reverse linear polisher with loadable housing |
US201928 | 1998-12-01 | ||
PCT/US1999/027477 WO2000032356A1 (en) | 1998-12-01 | 1999-11-19 | Reverse linear polisher with loadable housing |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69921354D1 true DE69921354D1 (de) | 2004-11-25 |
DE69921354T2 DE69921354T2 (de) | 2005-10-13 |
Family
ID=22747860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69921354T Expired - Fee Related DE69921354T2 (de) | 1998-12-01 | 1999-11-19 | Hin- und hergehende linear poliermaschine mit ladbarem halter |
Country Status (10)
Country | Link |
---|---|
US (2) | US6103628A (de) |
EP (1) | EP1135236B1 (de) |
JP (1) | JP2002531933A (de) |
KR (1) | KR100638798B1 (de) |
CN (1) | CN1131765C (de) |
AT (1) | ATE280014T1 (de) |
AU (1) | AU1629900A (de) |
DE (1) | DE69921354T2 (de) |
TW (1) | TW425332B (de) |
WO (1) | WO2000032356A1 (de) |
Families Citing this family (59)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7449098B1 (en) | 1999-10-05 | 2008-11-11 | Novellus Systems, Inc. | Method for planar electroplating |
US7531079B1 (en) | 1998-10-26 | 2009-05-12 | Novellus Systems, Inc. | Method and apparatus for uniform electropolishing of damascene IC structures by selective agitation |
US6464571B2 (en) * | 1998-12-01 | 2002-10-15 | Nutool, Inc. | Polishing apparatus and method with belt drive system adapted to extend the lifetime of a refreshing polishing belt provided therein |
US7425250B2 (en) * | 1998-12-01 | 2008-09-16 | Novellus Systems, Inc. | Electrochemical mechanical processing apparatus |
US6468139B1 (en) * | 1998-12-01 | 2002-10-22 | Nutool, Inc. | Polishing apparatus and method with a refreshing polishing belt and loadable housing |
US6589105B2 (en) | 1998-12-01 | 2003-07-08 | Nutool, Inc. | Pad tensioning method and system in a bi-directional linear polisher |
US6475070B1 (en) | 1999-02-04 | 2002-11-05 | Applied Materials, Inc. | Chemical mechanical polishing with a moving polishing sheet |
US6244935B1 (en) * | 1999-02-04 | 2001-06-12 | Applied Materials, Inc. | Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet |
US6491570B1 (en) * | 1999-02-25 | 2002-12-10 | Applied Materials, Inc. | Polishing media stabilizer |
US6626744B1 (en) | 1999-12-17 | 2003-09-30 | Applied Materials, Inc. | Planarization system with multiple polishing pads |
US7048607B1 (en) | 2000-05-31 | 2006-05-23 | Applied Materials | System and method for chemical mechanical planarization |
US6520833B1 (en) | 2000-06-30 | 2003-02-18 | Lam Research Corporation | Oscillating fixed abrasive CMP system and methods for implementing the same |
US6561884B1 (en) * | 2000-08-29 | 2003-05-13 | Applied Materials, Inc. | Web lift system for chemical mechanical planarization |
US7220166B2 (en) * | 2000-08-30 | 2007-05-22 | Micron Technology, Inc. | Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate |
US7160176B2 (en) * | 2000-08-30 | 2007-01-09 | Micron Technology, Inc. | Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrate |
US7094131B2 (en) | 2000-08-30 | 2006-08-22 | Micron Technology, Inc. | Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material |
US7153410B2 (en) | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
US7134934B2 (en) * | 2000-08-30 | 2006-11-14 | Micron Technology, Inc. | Methods and apparatus for electrically detecting characteristics of a microelectronic substrate and/or polishing medium |
US7192335B2 (en) * | 2002-08-29 | 2007-03-20 | Micron Technology, Inc. | Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substrates |
US7153195B2 (en) | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for selectively removing conductive material from a microelectronic substrate |
US7074113B1 (en) | 2000-08-30 | 2006-07-11 | Micron Technology, Inc. | Methods and apparatus for removing conductive material from a microelectronic substrate |
US7078308B2 (en) * | 2002-08-29 | 2006-07-18 | Micron Technology, Inc. | Method and apparatus for removing adjacent conductive and nonconductive materials of a microelectronic substrate |
US7129160B2 (en) * | 2002-08-29 | 2006-10-31 | Micron Technology, Inc. | Method for simultaneously removing multiple conductive materials from microelectronic substrates |
US7112121B2 (en) | 2000-08-30 | 2006-09-26 | Micron Technology, Inc. | Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate |
US6867448B1 (en) | 2000-08-31 | 2005-03-15 | Micron Technology, Inc. | Electro-mechanically polished structure |
US6592439B1 (en) | 2000-11-10 | 2003-07-15 | Applied Materials, Inc. | Platen for retaining polishing material |
US6776695B2 (en) * | 2000-12-21 | 2004-08-17 | Lam Research Corporation | Platen design for improving edge performance in CMP applications |
US6607425B1 (en) | 2000-12-21 | 2003-08-19 | Lam Research Corporation | Pressurized membrane platen design for improving performance in CMP applications |
CN1638919A (zh) * | 2001-06-12 | 2005-07-13 | 纳托尔公司 | 用于双向抛光工件的改进的方法和设备 |
US6503131B1 (en) | 2001-08-16 | 2003-01-07 | Applied Materials, Inc. | Integrated platen assembly for a chemical mechanical planarization system |
US7121919B2 (en) * | 2001-08-30 | 2006-10-17 | Micron Technology, Inc. | Chemical mechanical polishing system and process |
US6838149B2 (en) * | 2001-12-13 | 2005-01-04 | 3M Innovative Properties Company | Abrasive article for the deposition and polishing of a conductive material |
US6776693B2 (en) | 2001-12-19 | 2004-08-17 | Applied Materials Inc. | Method and apparatus for face-up substrate polishing |
US6722946B2 (en) * | 2002-01-17 | 2004-04-20 | Nutool, Inc. | Advanced chemical mechanical polishing system with smart endpoint detection |
US20030146102A1 (en) * | 2002-02-05 | 2003-08-07 | Applied Materials, Inc. | Method for forming copper interconnects |
US20040023607A1 (en) * | 2002-03-13 | 2004-02-05 | Homayoun Talieh | Method and apparatus for integrated chemical mechanical polishing of copper and barrier layers |
US6939203B2 (en) | 2002-04-18 | 2005-09-06 | Asm Nutool, Inc. | Fluid bearing slide assembly for workpiece polishing |
US7799200B1 (en) | 2002-07-29 | 2010-09-21 | Novellus Systems, Inc. | Selective electrochemical accelerator removal |
US7138039B2 (en) * | 2003-01-21 | 2006-11-21 | Applied Materials, Inc. | Liquid isolation of contact rings |
US7087144B2 (en) * | 2003-01-31 | 2006-08-08 | Applied Materials, Inc. | Contact ring with embedded flexible contacts |
US7025861B2 (en) | 2003-02-06 | 2006-04-11 | Applied Materials | Contact plating apparatus |
US7018273B1 (en) | 2003-06-27 | 2006-03-28 | Lam Research Corporation | Platen with diaphragm and method for optimizing wafer polishing |
US20050016861A1 (en) * | 2003-07-24 | 2005-01-27 | Thomas Laursen | Method for planarizing a work piece |
US7112122B2 (en) * | 2003-09-17 | 2006-09-26 | Micron Technology, Inc. | Methods and apparatus for removing conductive material from a microelectronic substrate |
US8158532B2 (en) | 2003-10-20 | 2012-04-17 | Novellus Systems, Inc. | Topography reduction and control by selective accelerator removal |
US8530359B2 (en) | 2003-10-20 | 2013-09-10 | Novellus Systems, Inc. | Modulated metal removal using localized wet etching |
US7153777B2 (en) | 2004-02-20 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatuses for electrochemical-mechanical polishing |
US7648622B2 (en) | 2004-02-27 | 2010-01-19 | Novellus Systems, Inc. | System and method for electrochemical mechanical polishing |
US7195544B2 (en) * | 2004-03-23 | 2007-03-27 | Cabot Microelectronics Corporation | CMP porous pad with component-filled pores |
US6955588B1 (en) | 2004-03-31 | 2005-10-18 | Lam Research Corporation | Method of and platen for controlling removal rate characteristics in chemical mechanical planarization |
US20050218000A1 (en) * | 2004-04-06 | 2005-10-06 | Applied Materials, Inc. | Conditioning of contact leads for metal plating systems |
US7285195B2 (en) * | 2004-06-24 | 2007-10-23 | Applied Materials, Inc. | Electric field reducing thrust plate |
US7566391B2 (en) | 2004-09-01 | 2009-07-28 | Micron Technology, Inc. | Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media |
US20070014958A1 (en) * | 2005-07-08 | 2007-01-18 | Chaplin Ernest R | Hanger labels, label assemblies and methods for forming the same |
US8168540B1 (en) | 2009-12-29 | 2012-05-01 | Novellus Systems, Inc. | Methods and apparatus for depositing copper on tungsten |
JP2017148931A (ja) * | 2016-02-19 | 2017-08-31 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
KR102339948B1 (ko) * | 2019-07-02 | 2021-12-17 | (주)미래컴퍼니 | 연마 시스템 및 연마 방법 |
CN111955945A (zh) * | 2020-08-27 | 2020-11-20 | 代永金 | 一种中医药柜的驱动装置 |
CN116833900B (zh) * | 2023-07-31 | 2024-01-26 | 广东工业大学 | 一种用于半导体晶片化学机械抛光的磁流变弹性抛光垫、制备方法及其应用 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3113204A1 (de) * | 1981-04-02 | 1982-10-28 | Percy 3008 Garbsen Lambelet | "vorrichtung zum schleifen, schmirgeln oder polieren von werkstuecken" |
DE3643914A1 (de) * | 1986-12-22 | 1988-06-30 | Zeiss Carl Fa | Verfahren und vorrichtung zum laeppen bzw. polieren optischer flaechen |
DE69206685T2 (de) * | 1991-06-06 | 1996-07-04 | Commissariat Energie Atomique | Poliermaschine mit einem gespannten Feinschleifband und einem verbesserten Werkstückträgerkopf |
US5245796A (en) * | 1992-04-02 | 1993-09-21 | At&T Bell Laboratories | Slurry polisher using ultrasonic agitation |
JP2894153B2 (ja) * | 1993-05-27 | 1999-05-24 | 信越半導体株式会社 | シリコンウエーハの製造方法、およびその装置 |
US5650039A (en) * | 1994-03-02 | 1997-07-22 | Applied Materials, Inc. | Chemical mechanical polishing apparatus with improved slurry distribution |
ATE186001T1 (de) * | 1994-08-09 | 1999-11-15 | Ontrak Systems Inc | Linear poliergerät und wafer planarisierungsverfahren |
US5593344A (en) * | 1994-10-11 | 1997-01-14 | Ontrak Systems, Inc. | Wafer polishing machine with fluid bearings and drive systems |
US5908530A (en) | 1995-05-18 | 1999-06-01 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
US5762751A (en) * | 1995-08-17 | 1998-06-09 | Semitool, Inc. | Semiconductor processor with wafer face protection |
US5951373A (en) * | 1995-10-27 | 1999-09-14 | Applied Materials, Inc. | Circumferentially oscillating carousel apparatus for sequentially processing substrates for polishing and cleaning |
US5961372A (en) | 1995-12-05 | 1999-10-05 | Applied Materials, Inc. | Substrate belt polisher |
JP2830907B2 (ja) | 1995-12-06 | 1998-12-02 | 日本電気株式会社 | 半導体基板研磨装置 |
US5770521A (en) * | 1996-05-30 | 1998-06-23 | Cypress Semiconductor Corporation | Anti-shear method and system for semiconductor wafer removal |
JPH09321001A (ja) * | 1996-05-31 | 1997-12-12 | Komatsu Electron Metals Co Ltd | 半導体ウェハの研磨方法 |
US5899801A (en) * | 1996-10-31 | 1999-05-04 | Applied Materials, Inc. | Method and apparatus for removing a substrate from a polishing pad in a chemical mechanical polishing system |
US5807165A (en) * | 1997-03-26 | 1998-09-15 | International Business Machines Corporation | Method of electrochemical mechanical planarization |
US6110025A (en) | 1997-05-07 | 2000-08-29 | Obsidian, Inc. | Containment ring for substrate carrier apparatus |
US5899798A (en) | 1997-07-25 | 1999-05-04 | Obsidian Inc. | Low profile, low hysteresis force feedback gimbal system for chemical mechanical polishing |
US6113479A (en) | 1997-07-25 | 2000-09-05 | Obsidian, Inc. | Wafer carrier for chemical mechanical planarization polishing |
US6196896B1 (en) | 1997-10-31 | 2001-03-06 | Obsidian, Inc. | Chemical mechanical polisher |
-
1998
- 1998-12-01 US US09/201,928 patent/US6103628A/en not_active Expired - Lifetime
-
1999
- 1999-11-19 KR KR1020017006843A patent/KR100638798B1/ko not_active IP Right Cessation
- 1999-11-19 JP JP2000585032A patent/JP2002531933A/ja not_active Withdrawn
- 1999-11-19 DE DE69921354T patent/DE69921354T2/de not_active Expired - Fee Related
- 1999-11-19 AU AU16299/00A patent/AU1629900A/en not_active Abandoned
- 1999-11-19 EP EP99959045A patent/EP1135236B1/de not_active Expired - Lifetime
- 1999-11-19 CN CN998139920A patent/CN1131765C/zh not_active Expired - Fee Related
- 1999-11-19 WO PCT/US1999/027477 patent/WO2000032356A1/en active IP Right Grant
- 1999-11-19 AT AT99959045T patent/ATE280014T1/de not_active IP Right Cessation
- 1999-12-07 TW TW088120885A patent/TW425332B/zh not_active IP Right Cessation
-
2000
- 2000-05-22 US US09/576,064 patent/US6207572B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1135236B1 (de) | 2004-10-20 |
WO2000032356A1 (en) | 2000-06-08 |
AU1629900A (en) | 2000-06-19 |
CN1131765C (zh) | 2003-12-24 |
TW425332B (en) | 2001-03-11 |
DE69921354T2 (de) | 2005-10-13 |
KR20010089531A (ko) | 2001-10-06 |
EP1135236A1 (de) | 2001-09-26 |
KR100638798B1 (ko) | 2006-10-25 |
ATE280014T1 (de) | 2004-11-15 |
JP2002531933A (ja) | 2002-09-24 |
US6103628A (en) | 2000-08-15 |
US6207572B1 (en) | 2001-03-27 |
CN1329533A (zh) | 2002-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: ASM NUTOOL,INC., FREMONT, CALIF., US |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: KOHLER SCHMID MOEBUS PATENTANWAELTE, 70565 STUTTGART |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |