DE69917069D1 - Plasmaunterstützte gasphasenausscheidung von konjugierten polymeren - Google Patents
Plasmaunterstützte gasphasenausscheidung von konjugierten polymerenInfo
- Publication number
- DE69917069D1 DE69917069D1 DE69917069T DE69917069T DE69917069D1 DE 69917069 D1 DE69917069 D1 DE 69917069D1 DE 69917069 T DE69917069 T DE 69917069T DE 69917069 T DE69917069 T DE 69917069T DE 69917069 D1 DE69917069 D1 DE 69917069D1
- Authority
- DE
- Germany
- Prior art keywords
- glow discharge
- evaporate
- gas phase
- conjugated polymers
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/212,781 US6207239B1 (en) | 1998-12-16 | 1998-12-16 | Plasma enhanced chemical deposition of conjugated polymer |
US212781 | 1998-12-16 | ||
PCT/US1999/030069 WO2000035602A1 (en) | 1998-12-16 | 1999-12-15 | Plasma enhanced chemical deposition of conjugated polymer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69917069D1 true DE69917069D1 (de) | 2004-06-09 |
DE69917069T2 DE69917069T2 (de) | 2005-01-27 |
Family
ID=22792397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69917069T Expired - Lifetime DE69917069T2 (de) | 1998-12-16 | 1999-12-15 | Plasmaunterstützte gasphasenausscheidung von konjugierten polymeren |
Country Status (8)
Country | Link |
---|---|
US (3) | US6207239B1 (de) |
EP (1) | EP1144131B1 (de) |
JP (1) | JP2002532576A (de) |
KR (1) | KR20010101253A (de) |
AT (1) | ATE265898T1 (de) |
DE (1) | DE69917069T2 (de) |
TW (1) | TW467771B (de) |
WO (1) | WO2000035602A1 (de) |
Families Citing this family (42)
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US6224948B1 (en) * | 1997-09-29 | 2001-05-01 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
US6207239B1 (en) * | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition of conjugated polymer |
US6207238B1 (en) * | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
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US6228436B1 (en) * | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making light emitting polymer composite material |
US7198832B2 (en) * | 1999-10-25 | 2007-04-03 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US20070196682A1 (en) * | 1999-10-25 | 2007-08-23 | Visser Robert J | Three dimensional multilayer barrier and method of making |
US6866901B2 (en) | 1999-10-25 | 2005-03-15 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US6623861B2 (en) * | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
US20100330748A1 (en) | 1999-10-25 | 2010-12-30 | Xi Chu | Method of encapsulating an environmentally sensitive device |
US20090191342A1 (en) * | 1999-10-25 | 2009-07-30 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US6734038B2 (en) * | 2001-09-04 | 2004-05-11 | The Trustees Of Princeton University | Method of manufacturing high-mobility organic thin films using organic vapor phase deposition |
US20090208754A1 (en) * | 2001-09-28 | 2009-08-20 | Vitex Systems, Inc. | Method for edge sealing barrier films |
GB0207350D0 (en) * | 2002-03-28 | 2002-05-08 | Univ Sheffield | Surface |
US8808457B2 (en) | 2002-04-15 | 2014-08-19 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
US8900366B2 (en) * | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
KR100475849B1 (ko) * | 2002-04-17 | 2005-03-10 | 한국전자통신연구원 | 습식 공정에 의하여 형성된 엔캡슐레이션 박막을 갖춘유기 전기발광 소자 및 그 제조 방법 |
EP1354640A1 (de) * | 2002-04-19 | 2003-10-22 | Dürr Systems GmbH | Verfahren und Vorrichtung zum Härten einer Beschichtung |
US20040028931A1 (en) | 2002-06-26 | 2004-02-12 | Bletsos Ioannis V. | Coated sheet materials and packages made therewith |
US7510913B2 (en) * | 2003-04-11 | 2009-03-31 | Vitex Systems, Inc. | Method of making an encapsulated plasma sensitive device |
US7648925B2 (en) * | 2003-04-11 | 2010-01-19 | Vitex Systems, Inc. | Multilayer barrier stacks and methods of making multilayer barrier stacks |
CN100557074C (zh) * | 2003-04-25 | 2009-11-04 | 亚利桑那西格玛实验室公司 | 真空沉积功能化的多孔材料 |
JP4185015B2 (ja) * | 2003-05-12 | 2008-11-19 | 東京エレクトロン株式会社 | 気化原料の供給構造、原料気化器及び反応処理装置 |
JP4513956B2 (ja) * | 2003-07-30 | 2010-07-28 | 日本電気株式会社 | 有機高分子膜及びその製造方法 |
GB0423685D0 (en) * | 2004-10-26 | 2004-11-24 | Dow Corning Ireland Ltd | Improved method for coating a substrate |
US7767498B2 (en) | 2005-08-25 | 2010-08-03 | Vitex Systems, Inc. | Encapsulated devices and method of making |
EP1785198A1 (de) * | 2005-11-14 | 2007-05-16 | Vlaamse Instelling voor Technologisch Onderzoek | Verfahren zur Plasmaabscheidung unter atmosphärischem Druck von konjugierten polymeren Beschichtungen |
KR100729097B1 (ko) * | 2005-12-28 | 2007-06-14 | 삼성에스디아이 주식회사 | 증발원 및 이를 이용한 박막 증착방법 |
KR20080080154A (ko) * | 2005-12-29 | 2008-09-02 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 코팅 공정을 위한 물질의 분무화 방법 |
US8088502B2 (en) * | 2006-09-20 | 2012-01-03 | Battelle Memorial Institute | Nanostructured thin film optical coatings |
DE102006055077A1 (de) * | 2006-11-22 | 2008-05-29 | Eos Gmbh Electro Optical Systems | Vorrichtung zum schichtweisen Herstellen eines dreidimensionalen Objekts und Verfahren zum Einsetzen bzw. Entnehmen eines Behälters |
EP2168644B1 (de) * | 2008-09-29 | 2014-11-05 | Applied Materials, Inc. | Verdampfer für organische Materialien und Verfahren zum Verdampfen organischer Materialien |
US9337446B2 (en) * | 2008-12-22 | 2016-05-10 | Samsung Display Co., Ltd. | Encapsulated RGB OLEDs having enhanced optical output |
US9184410B2 (en) | 2008-12-22 | 2015-11-10 | Samsung Display Co., Ltd. | Encapsulated white OLEDs having enhanced optical output |
US20100167002A1 (en) * | 2008-12-30 | 2010-07-01 | Vitex Systems, Inc. | Method for encapsulating environmentally sensitive devices |
KR100946598B1 (ko) | 2009-04-24 | 2010-03-09 | 주식회사 엘파니 | 플라스마 처리를 이용한 전도성 고분자용 고체 도판트, 그의 제조 방법 및 장치, 및 전도성 고분자의 고상 도핑 방법 |
CN102473854B (zh) * | 2009-07-31 | 2013-04-17 | Udc爱尔兰有限责任公司 | 用于有机器件的沉积材料以及用于制备有机器件的方法 |
US8590338B2 (en) * | 2009-12-31 | 2013-11-26 | Samsung Mobile Display Co., Ltd. | Evaporator with internal restriction |
EP2522034A1 (de) * | 2010-01-06 | 2012-11-14 | Dow Global Technologies LLC | Feuchtigkeitsresistente pv-module mit elastomerer polysiloxanschutzschicht |
TWI560919B (en) * | 2011-08-25 | 2016-12-01 | Univ Nat Tsing Hua | Method for enhancing optoelectronic properties of conjugated polymers |
US9144623B2 (en) * | 2013-11-06 | 2015-09-29 | Chung-Ping Lai | Refrigerator with plasma device |
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-
1998
- 1998-12-16 US US09/212,781 patent/US6207239B1/en not_active Expired - Lifetime
-
1999
- 1999-12-15 EP EP99966362A patent/EP1144131B1/de not_active Expired - Lifetime
- 1999-12-15 AT AT99966362T patent/ATE265898T1/de not_active IP Right Cessation
- 1999-12-15 KR KR1020017007557A patent/KR20010101253A/ko not_active Application Discontinuation
- 1999-12-15 TW TW088121956A patent/TW467771B/zh not_active IP Right Cessation
- 1999-12-15 DE DE69917069T patent/DE69917069T2/de not_active Expired - Lifetime
- 1999-12-15 JP JP2000587902A patent/JP2002532576A/ja active Pending
- 1999-12-15 WO PCT/US1999/030069 patent/WO2000035602A1/en not_active Application Discontinuation
-
2001
- 2001-03-19 US US09/811,871 patent/US6544600B2/en not_active Expired - Lifetime
- 2001-05-11 US US09/854,017 patent/US6509065B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6207239B1 (en) | 2001-03-27 |
KR20010101253A (ko) | 2001-11-14 |
EP1144131B1 (de) | 2004-05-06 |
US6544600B2 (en) | 2003-04-08 |
DE69917069T2 (de) | 2005-01-27 |
US20020071911A1 (en) | 2002-06-13 |
US6509065B2 (en) | 2003-01-21 |
TW467771B (en) | 2001-12-11 |
ATE265898T1 (de) | 2004-05-15 |
EP1144131A1 (de) | 2001-10-17 |
WO2000035602A1 (en) | 2000-06-22 |
US20010033901A1 (en) | 2001-10-25 |
JP2002532576A (ja) | 2002-10-02 |
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